US4478676A - Method for decreasing radial temperature gradients of crystal growth melts utilizing radiant energy absorptive materials and crystal growth chambers comprising such materials - Google Patents
Method for decreasing radial temperature gradients of crystal growth melts utilizing radiant energy absorptive materials and crystal growth chambers comprising such materials Download PDFInfo
- Publication number
- US4478676A US4478676A US06/415,764 US41576482A US4478676A US 4478676 A US4478676 A US 4478676A US 41576482 A US41576482 A US 41576482A US 4478676 A US4478676 A US 4478676A
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- US
- United States
- Prior art keywords
- oxide
- melt
- crystal growth
- dysprosium
- crucible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 51
- 239000000155 melt Substances 0.000 title claims abstract description 40
- 238000000034 method Methods 0.000 title claims abstract description 27
- 239000000463 material Substances 0.000 title abstract description 13
- 230000003247 decreasing effect Effects 0.000 title 1
- 239000011810 insulating material Substances 0.000 claims abstract description 23
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 21
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 claims abstract description 19
- 229910052692 Dysprosium Inorganic materials 0.000 claims abstract description 17
- 230000005855 radiation Effects 0.000 claims abstract description 17
- 238000009413 insulation Methods 0.000 claims abstract description 15
- 239000006096 absorbing agent Substances 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 10
- 229910003440 dysprosium oxide Inorganic materials 0.000 claims description 25
- NLQFUUYNQFMIJW-UHFFFAOYSA-N dysprosium(iii) oxide Chemical compound O=[Dy]O[Dy]=O NLQFUUYNQFMIJW-UHFFFAOYSA-N 0.000 claims description 24
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 16
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 16
- 230000006872 improvement Effects 0.000 claims description 7
- 229910003452 thorium oxide Inorganic materials 0.000 claims description 4
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 3
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 3
- ZCUFMDLYAMJYST-UHFFFAOYSA-N thorium dioxide Chemical compound O=[Th]=O ZCUFMDLYAMJYST-UHFFFAOYSA-N 0.000 claims description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 25
- 239000012212 insulator Substances 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- 229910052741 iridium Inorganic materials 0.000 description 4
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 239000011819 refractory material Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000005457 Black-body radiation Effects 0.000 description 1
- WZECUPJJEIXUKY-UHFFFAOYSA-N [O-2].[O-2].[O-2].[U+6] Chemical compound [O-2].[O-2].[O-2].[U+6] WZECUPJJEIXUKY-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- DNNLEMIRRGUGOZ-UHFFFAOYSA-N oxygen(2-);thorium(4+) Chemical class [O-2].[O-2].[Th+4] DNNLEMIRRGUGOZ-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000006100 radiation absorber Substances 0.000 description 1
- 239000012857 radioactive material Substances 0.000 description 1
- 210000003625 skull Anatomy 0.000 description 1
- 229910000439 uranium oxide Inorganic materials 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1068—Seed pulling including heating or cooling details [e.g., shield configuration]
Definitions
- the present invention relates to the art of monocrystalline body formation utilizing melts, e.g. the well-known Czochralski, Bridgeman or Kyropoulos techniques.
- Czochralski the monocrystalline body is formed by pulling a crystal from a melt contained within a crucible. Insulating material, specifically zirconia, is generally placed around the crucible.
- the present invention pertains to a new insulating material which is an efficient absorber of near infrared radiation emitted by the melt at the elevated temperatures of boule formation.
- Dysprosium-containing compounds and specifically dysprosium oxide alone or combined with other refractories such as zirconium, hafnium and thorium oxides is disclosed.
- the radial temperature gradients of crystal-forming melts within Czochralski crystal growth apparatuses can be reduced by utilizing the insulating material of the invention with attendant improvement in crystal quality. It has also been discovered that the power of the RF coil used to form and maintain the melt is reduced where the insulating matter selected is an efficient absorber of the near infrared radiant energy emitted by the crucible and melt at the temperature levels of crystal pulling.
- the invention comprises a method for reducing the temperature gradients in an heated body emitting radiant energy.
- the method of the invention comprises insulating said body by placing thereabout a refractory insulating material comprising an efficient absorber of the radiant energy emitted by said heated body.
- the method of the invention is especially useful for crystal growth systems. Such systems are particularly sensitive to temperature gradients within the melts. Melt formulations, which may include fluxes dependent on the specific crystal growth system involved, are formed and maintained at elevated temperatures. Energy loss in the form of radiant energy emission is substantial in such crystal growth systems.
- a more specific embodiment of the invention relates to an insulated crystal growth chamber for pulling unicrystalline compositions from a melt utilizing the Czochralski technique, wherein the insulating material comprises an efficient absorber of near infrared radiation emitted by the melt and crucible at the temperatures of boule formation.
- Dysprosium ion, specifically trivalent dysprosium is the preferred material and suitably the dysprosium is present in the form of dysprosium oxide.
- the insulating material may also comprise both dysprosium oxide and other refractories such as zirconium oxide, hafnium oxide and thorium oxide. Also where suitable other refractories such as uranium oxide, a radioactive material, may be used. In such mixtures the mole ratio of dysprosium oxide to refractory oxide is suitably greater than 1:5. Most preferably the weight ratio of dysprosium oxide to refractory oxide is at least about 1:1.
- Yet another embodiment of the invention pertains to a method of crystal growth in accordance with the Czochralski technique wherein a unicrystalline boule is pulled from a melt formed in a crucible having insulation around the sides thereof which absorbs a substantial portion of the near infrared radiation emitted radially outward from the melt into the insulation.
- the temperature at which the melt is maintained is within the range of about 1600° C. to about 2500° C.
- dysprosium may be used as a component of the insulation to absorb radiation emitted radially outward from the melt.
- Dysprosium is a most suitable insulator where the melt temperature is within the range of about 2200° K. to about 2400° K and the insulation may comprise both dysprosium oxide and zirconium oxide, such mixture suitably being one wherein the mole ratio of dysprosium oxide to zirconium oxide is at least about 1:5.
- FIG. 1 is a longitudinal section of a Czochralski growth chamber with bell jar cover and base plate not shown.
- FIG. 2 is a graphical representation of the % transmittance of a 1 mm thickness of a typical dysprosium and zirconium oxide single crystal compound of the invention.
- FIG. 3 is a graphical representation of a Black Body Curve for radiation emitted at a temperature of 2300° K.
- the insulation of the invention is a material which is an efficient absorber of radiant energy of the frequency emitted at the temperature of crystal pulling.
- Trivalent dysprosium meets this requirement and has been found to be a most effective insulator in the form of the oxide, suitably in combination with zirconia in amounts of about 20% or higher by weight of dysprosium oxide.
- an efficient absorber of radiant energy emitted at the temperature of crystal pulling is a material which absorbs a substantial amount of the near infrared radiant energy emissions (black body radiation) or stated in the alternative a material which has a low percentage of transmittance of radiant energy near the infrared wave lengths being emitted at the temperatures of boule formation.
- the elevated temperature range for the formation of single crystals of high melting oxides within which the process of the invention is particularly useful falls within the range of from about 1600° C. to 2500° C.
- wavelengths of the radiation emitted are assumed to correspond to the black-body curve at the operative temperature--in the case of crystal formation using the Czochralski technique, the temperature of boule formation.
- the near-infrared wavelengths falling in the range of from about 0.8 ⁇ m to about 10 ⁇ m represent the predominant source of radiant energy emissions from the system (see FIG. 3 for the black-body curve at 2300° K.)
- the material is generally selected to have a % transmittance for 1 mm thickness of about 25% or less, preferably 10% or less, with 0% being the optimum. In the case of crystal formation the material selected should not interfere with the radio frequency energy transmitted from the heating coil, and should also be stable at the temperatures at which crystal formation is effected.
- the specific physical form of the insulating material which is selected may vary depending on the preference of the user so long as the insulation is stable at the elevated temperatures of crystal formation and possesses the property of efficiently absorbing radiation emitted by the crucible and/or melt at the involved temperatures.
- the insulating material may be used in any form desired.
- dysprosium oxide which has been found to be a very effective absorber of radiant energy emitted by the melt in Nd:YAG crystal growth furnaces at boule forming conditions, can be used in the form of powder or particles sintered together to produce a preselected shape adapted to retain a crucible within which melt is formed.
- insulating materials of the invention such as the aforementioned dysprosium oxide can be combined with other insulating materials.
- dysprosium oxide can be combined with zirconia, the latter zirconia being the insulating material of choice in the prior art for single crystal growth devices.
- Zirconium oxide is a material which is almost transparent to the radiation emitted from furnaces operating at the elevated temperatures of crystal formation which are in the near 2300° K. range; however, the presence of dysprosium oxide either in physical admixture with zirconium oxide or combined with zirconium oxide in crystalline form dramatically lowers insulating material transmittance of radiant energy radiating outward from the melt and crucible.
- FIG. 1 A typical arrangement for achieving and maintaining the melt at constant temperature for a crystal pulling is illustrated in FIG. 1.
- a bed of granular ZrO 2 insulation (2) Supported on said bed is an iridium crucible (3), covered with iridium crucible cover (4).
- An insulating material comprised by Dy 2 O 3 and ZrO 2 (5) is placed between the side of the crucible and the quartz tube.
- An alumina tube insulator (6) is supported on the dysprosium-containing insulation and in turn covered by an alumina tube insulator cover (7).
- the melt is heated by RF coil (8).
- a seed rod (not shown) is inserted through the alumina tube insulator cover and iridium crucible cover into the crucible.
- the vertical temperature gradients can also be diminished by utilizing growth furnace appurtenances comprising dysprosium in absorbent form or an equivalent and/or otherwise suitable efficient near infrard wavelength radiation absorber.
- the charge was heated by movement through an RF field and a melt was formed within the porous cylindrical container.
- the % transmittance of a 1 mm thickness of the foregoing material is depicted for near-infrared wavelengths; that is, wavelengths in the range of from about 0.8 ⁇ m to about 10 ⁇ m.
- the crystals were recovered by removing the solidified melt from the enclosure and broken by thermal fracturing and mechanical crushing to form grains of a size falling substantially within the range of from 1 to 5 mm.
- Thermal gradient measurement was accomplished by scanning an optical pyrometer from the center of the melt to a position one inch from the center along the radius of the crucible. Data was collected in the same chamber/station, utilizing the same geometry of insulating parts. The measurements were taken when all Nd:YAG in the crucible just melted. The temperature gradient data are listed in Table I.
- Run A denotes the observed radial thermal gradients where the ZrO 2 of the prior art was utilized.
- Runs B and C each represent runs utilizing the above-described dysprosiumcontaining zirconia surrounding the upper 2 inches of an 41/2 inch high crucible. Where the material surrounds the crucible for its entire height additional improvement has been observed.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
TABLE I
______________________________________
Measurements of Radial Thermal Gradients
Position Run Run Run
(Inches from A B C
Center of Melt)
Regular Dy Dy
______________________________________
0 1950 1950 1950
0.1 1965 1960 1960
0.2 1980 1970 1970
0.3 1985 1985 1980
0.4 1990 1990 1990
0.5 2000 2000 1990
0.6 2010 2005 1995
0.7 2015 2010 2000
0.8 2020 2015 2005
0.9 2030 2020 2010
1.0 2035 2030 2020
______________________________________
Claims (20)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/415,764 US4478676A (en) | 1982-09-07 | 1982-09-07 | Method for decreasing radial temperature gradients of crystal growth melts utilizing radiant energy absorptive materials and crystal growth chambers comprising such materials |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/415,764 US4478676A (en) | 1982-09-07 | 1982-09-07 | Method for decreasing radial temperature gradients of crystal growth melts utilizing radiant energy absorptive materials and crystal growth chambers comprising such materials |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US4478676A true US4478676A (en) | 1984-10-23 |
Family
ID=23647098
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US06/415,764 Expired - Fee Related US4478676A (en) | 1982-09-07 | 1982-09-07 | Method for decreasing radial temperature gradients of crystal growth melts utilizing radiant energy absorptive materials and crystal growth chambers comprising such materials |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US4478676A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4613486A (en) * | 1983-10-28 | 1986-09-23 | Sumitomo Electric Industrial Co., Ltd. | Semiconductor boule pulling rod |
| US4680716A (en) * | 1983-12-02 | 1987-07-14 | U.S. Philips Corporation | Automatic method and apparatus for dosing samples |
| US5162072A (en) * | 1990-12-11 | 1992-11-10 | General Electric Company | Apparatus and method for control of melt flow pattern in a crystal growth process |
| US5308446A (en) * | 1986-07-24 | 1994-05-03 | Bihuniak Peter P | Fused quartz member for use in semiconductor manufacture |
| US5394830A (en) * | 1993-08-27 | 1995-03-07 | General Electric Company | Apparatus and method for growing long single crystals in a liquid encapsulated Czochralski process |
| US8535441B2 (en) | 2010-08-03 | 2013-09-17 | Siemens Medical Solutions Usa, Inc. | Crystal growth crucible lid |
| CN103597129A (en) * | 2011-06-20 | 2014-02-19 | 新日铁住金株式会社 | Manufacturing apparatus of SiC single crystal by solution growth method, method of manufacturing SiC single crystal using the manufacturing apparatus, and crucible used in the manufacturing apparatus |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2956863A (en) * | 1956-11-28 | 1960-10-18 | Philips Corp | Apparatus for the manufacture of single crystals |
| US3180632A (en) * | 1961-10-02 | 1965-04-27 | North American Aviation Inc | Coated crucible and crucible and mold coating method |
| US3328311A (en) * | 1965-05-05 | 1967-06-27 | Du Pont | Selected luminescent molybdates and tungstates of sc., la, eu, gd, and lu |
| US3687437A (en) * | 1970-08-19 | 1972-08-29 | Dynamit Nobel Ag | Metallurgical furnaces or vessels |
| US4032390A (en) * | 1974-02-25 | 1977-06-28 | Corning Glass Works | Plural crystal pulling from a melt in an annular crucible heated on both inner and outer walls |
| US4116642A (en) * | 1976-12-15 | 1978-09-26 | Western Electric Company, Inc. | Method and apparatus for avoiding undesirable deposits in crystal growing operations |
| US4224100A (en) * | 1978-06-16 | 1980-09-23 | Litton Systems, Inc. | Method and apparatus for making crystals |
| US4249988A (en) * | 1978-03-15 | 1981-02-10 | Western Electric Company, Inc. | Growing crystals from a melt by controlling additions of material thereto |
| US4315832A (en) * | 1979-03-05 | 1982-02-16 | Hughes Aircraft Company | Process for increasing laser crystal fluorescence yield by controlled atmosphere processing |
| US4378269A (en) * | 1978-10-17 | 1983-03-29 | Vlsi Technology Research Association | Method of manufacturing a single crystal silicon rod |
-
1982
- 1982-09-07 US US06/415,764 patent/US4478676A/en not_active Expired - Fee Related
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2956863A (en) * | 1956-11-28 | 1960-10-18 | Philips Corp | Apparatus for the manufacture of single crystals |
| US3180632A (en) * | 1961-10-02 | 1965-04-27 | North American Aviation Inc | Coated crucible and crucible and mold coating method |
| US3328311A (en) * | 1965-05-05 | 1967-06-27 | Du Pont | Selected luminescent molybdates and tungstates of sc., la, eu, gd, and lu |
| US3687437A (en) * | 1970-08-19 | 1972-08-29 | Dynamit Nobel Ag | Metallurgical furnaces or vessels |
| US4032390A (en) * | 1974-02-25 | 1977-06-28 | Corning Glass Works | Plural crystal pulling from a melt in an annular crucible heated on both inner and outer walls |
| US4116642A (en) * | 1976-12-15 | 1978-09-26 | Western Electric Company, Inc. | Method and apparatus for avoiding undesirable deposits in crystal growing operations |
| US4249988A (en) * | 1978-03-15 | 1981-02-10 | Western Electric Company, Inc. | Growing crystals from a melt by controlling additions of material thereto |
| US4224100A (en) * | 1978-06-16 | 1980-09-23 | Litton Systems, Inc. | Method and apparatus for making crystals |
| US4378269A (en) * | 1978-10-17 | 1983-03-29 | Vlsi Technology Research Association | Method of manufacturing a single crystal silicon rod |
| US4315832A (en) * | 1979-03-05 | 1982-02-16 | Hughes Aircraft Company | Process for increasing laser crystal fluorescence yield by controlled atmosphere processing |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4613486A (en) * | 1983-10-28 | 1986-09-23 | Sumitomo Electric Industrial Co., Ltd. | Semiconductor boule pulling rod |
| US4680716A (en) * | 1983-12-02 | 1987-07-14 | U.S. Philips Corporation | Automatic method and apparatus for dosing samples |
| US5308446A (en) * | 1986-07-24 | 1994-05-03 | Bihuniak Peter P | Fused quartz member for use in semiconductor manufacture |
| US5162072A (en) * | 1990-12-11 | 1992-11-10 | General Electric Company | Apparatus and method for control of melt flow pattern in a crystal growth process |
| US5394830A (en) * | 1993-08-27 | 1995-03-07 | General Electric Company | Apparatus and method for growing long single crystals in a liquid encapsulated Czochralski process |
| US8535441B2 (en) | 2010-08-03 | 2013-09-17 | Siemens Medical Solutions Usa, Inc. | Crystal growth crucible lid |
| CN103597129A (en) * | 2011-06-20 | 2014-02-19 | 新日铁住金株式会社 | Manufacturing apparatus of SiC single crystal by solution growth method, method of manufacturing SiC single crystal using the manufacturing apparatus, and crucible used in the manufacturing apparatus |
| EP2722422A4 (en) * | 2011-06-20 | 2014-06-04 | Nippon Steel & Sumitomo Metal Corp | APPARATUS FOR MANUFACTURING SIC MONOCRYSTAL BY SOLUTION GROWTH PROCESS, METHOD FOR MANUFACTURING SIC MONOCRYSTAL USING SIC MONOCRYSTAL PRODUCTION APPARATUS BY SOLUTION GROWTH PROCESS AND CUTTER USED IN AN APPARATUS FOR MANUFACTURING A CIS MONOCRYSTAL BY A SOLUTION GROWTH PROCESS |
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| Date | Code | Title | Description |
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