US4271210A - Method of forming transmissive, porous metal oxide optical layer of a vitreous substrate - Google Patents
Method of forming transmissive, porous metal oxide optical layer of a vitreous substrate Download PDFInfo
- Publication number
- US4271210A US4271210A US06/116,329 US11632980A US4271210A US 4271210 A US4271210 A US 4271210A US 11632980 A US11632980 A US 11632980A US 4271210 A US4271210 A US 4271210A
- Authority
- US
- United States
- Prior art keywords
- substrate
- layer
- solution
- metal oxide
- refraction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/27—Oxides by oxidation of a coating previously applied
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1245—Inorganic substrates other than metallic
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/30—Auxiliary coatings, e.g. anti-reflective coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/214—Al2O3
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/425—Coatings comprising at least one inhomogeneous layer consisting of a porous layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/111—Deposition methods from solutions or suspensions by dipping, immersion
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/322—Oxidation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Definitions
- the present invention relates to forming a light transmissive, porous metal oxide optical layer having a low index of refraction upon a vitreous substrate. More particularly the invention relates to providing an antireflective coating or layer on a light transmissive substrate, such as a cathode ray tube glass faceplate, or a glass solar collector.
- a light transmissive substrate such as a cathode ray tube glass faceplate, or a glass solar collector.
- this reflection can be eliminated or minimized, a corresponding increase in the efficiency of light transmission can be effected for the device.
- n c index of coating
- n 1 index of medium
- n 2 index of substrate
- the problem can be attacked in another direction. Since the index of refraction of a material is related to its density, which can be lowered by introducing porosity, the index can also be lowered. It is required, however, that the pore size must be substantially smaller than the wavelength of the light and the pore distribution must be homogeneous in order not to affect the light transmission and cause scattering.
- n and d are the index and density of the non-porous or coating material
- n' and d' are index and density of the porous material.
- FIG. 1 shows how the index of refraction of TiO 2 , Al 2 O 3 and SiO 2 varies with porosity.
- Transparent, porous metal oxide has been produced from clear solutions derived from metal alkoxides.
- Preparation of colloidal and polymerized solutions which produced continuous transparent oxide films and bodies at low temperature have been presented by the inventor in "Alumina Sol Preparation From Alkoxides" from The American Ceramic Society Bulletin, Vol. 54, No. 3, pp. 289-290, and "Monolithic Glass Formation by Chemical Polymerization", Journal of Material Science Vol. 14 pp. 1843-1849 (1979).
- a method of forming a transparent, porous, low index of refraction metal oxide layer on a vitreous substrate is detailed.
- a clear sol containing a preferred concentration of metal oxide is prepared, and the substrate is placed in the sol and withdrawn at a rate which leaves a polymerized metal hydroxide layer on the glass substrate, which film is approximately a quarter-wave optically thick.
- the thin porous layer on the substrate is then heated to convert the layer to metal oxide at a temperature of 300°-500° C.
- the metal oxide is selected from one of aluminum oxide, silicon dioxide, and titanium dioxide.
- FIG. 1 is plot of the index of refraction as a function of porosity for aluminum oxide, silicon dioxide, and titanium dioxides.
- FIG. 2 is a plot of the reflectivity in percent as a function of wavelength in microns for a glass substrate alone, and for one with a low index of refraction porous metal oxide layer thereon.
- a clear solution sol is prepared by hydrolyzing an aluminum alkoxide, Al(OR) 3 , such as aluminum secondary butoxide, Al(OC 4 H 9 ) 3 .
- an aluminum alkoxide Al(OR) 3
- Al(OC 4 H 9 ) 3 aluminum secondary butoxide
- one mole of the aluminum secondary butoxide is vigorously stirred into about 2000 ml of double-distilled, deionized water at a temperature of 70° C. The temperature is raised to about 80° C., and 3.6 grams of acetic acid is introduced after the slurry is stirred for 10-15 minutes to complete hydrolysis of the aluminum alkoxide.
- the resultant mixture is kept at 80°-100° C. until it is peptized to a clear solution.
- the clear solution is cooled.
- the vitreous glass tube faceplate or other such glass substrate which is to be coated is then dipped into this solution and withdrawn at a rate of about 7 centimeters per minute. A gel like coating remains on the glass substrate.
- This gel coated glass substrate is then pyrolyzed or heated at from 300°-500° C. to form a porous aluminum oxide layer which is about 1100-1200 Angstroms thick on the glass substrate, with the pore size between oxide particle of less than about 100 Angstroms, and with the porosity of the layer being above 40 percent and up to 64 percent.
- This porous aluminum oxide layer has an index of refraction of about 1.32 and has been as low as 1.318.
- the pore size for the aluminum oxide should be less than about 100 Angstroms to prevent scattering of light.
- This low index of refraction porous aluminum oxide layer may be deposited on one or both sides of the glass substrate, with a suitable masking layer provided on the substrate surface which is not to be coating.
- the metal alkoxide derived aqueous solution has a concentration of equivalent oxide which is about 1 to 3 percent based on the weight equivalent of aluminum oxide.
- concentration of equivalent oxide which is about 1 to 3 percent based on the weight equivalent of aluminum oxide.
- aluminum alkoxides can be used and aluminum isopropoxide in an example.
- the acid used for peptizing the solution can be varied, with the concentration such that about 0.1 mole of acid is used per mole of alkoxide, with at least 0.03 mole of acid per mole of alkoxide being necessary. While acetic acid has been found particularly effective other noncomplexing acids such as nitric, hydrochloric, and perchloric have been utilized.
- the thickness of the gel coating and resultant porous aluminum oxide coating is primarily determined by the concentration of aluminum alkoxide in solution, and by the rate at which the glass substrate is pulled from the solution.
- the quarter-wavelength desired thickness for 6000 Angstrom light at the refractive index of about 1.32 is about 1100-1200 Angstroms, but uniform coatings of from 1000-1400 Angstroms result in significantly reduced reflectivity.
- an alky phenoxypolyethoxy ethanol based colloidal nonionic surfactant Triton X-102, a trademarked material of Rohm & Haas Corporation was added in amounts of 30-50 mg per liter of solution to prevent beading of alumina particles on the glass.
- the lowest index of refraction coatings are obtained when glycol or other liquid alaphatic alcohol has been substituted for the aqueous medium in the original hydrolyzing step.
- porous layers of silicon dioxide and titanium dioxide can likewise be formed from solution.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Metallurgy (AREA)
- Geochemistry & Mineralogy (AREA)
- Ceramic Engineering (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Combustion & Propulsion (AREA)
- General Engineering & Computer Science (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
A method of forming an optically clear, thin metal oxide, porous layer on a vitreous glass substrate, with this metal oxide layer having a low index of refraction. A clear colloidal solution is prepared using metal alkoxide and the substrate is dipped in this solution. The concentration of metal oxide equivalent in the solution, and the rate of withdrawal of the glass substrate from the solution are controlled to form the porous metal oxide layer on the substrate with the layer being about a quarter-wavelength optically thick. This low index of refraction metal oxide layer forms an effective antireflective layer on a vitreous substrate of higher index of refraction, and minimize reflection from the substratemetal oxide layer interface.
Description
This is a continuation-in-part of application Ser. No. 088,280, filed Oct. 25, 1979, now abandoned.
The present invention relates to forming a light transmissive, porous metal oxide optical layer having a low index of refraction upon a vitreous substrate. More particularly the invention relates to providing an antireflective coating or layer on a light transmissive substrate, such as a cathode ray tube glass faceplate, or a glass solar collector. When light passes through the interface between two mediums of differing index of refraction, such as the interface between a cathode ray tube faceplate and air on the viewing side, there is a reflection of some portion of the light. This reflected light is effectively not transmitted and is a transmission loss. For soda-lime glass faceplates, this transmission loss can be of the order of 4-8% which reduces the efficiency of the device.
If this reflection can be eliminated or minimized, a corresponding increase in the efficiency of light transmission can be effected for the device. For a cathode ray tube, this means more of the phosphor-generated light will be available to the viewer, i.e., a higher screen brightness.
It is known that coating a transmissive substrate with a light transmissive film is one way of eliminating reflectance.
For a coated surface, the minimum reflection is given by ##EQU1## nc =index of coating n1 =index of medium
n2 =index of substrate
From the above equation it follows that, in an air or vacuum medium (n1 ≃1) in order for the reflectivity to be zero (Rm =0), the relation between the indices of the substrate and coating must be: ##EQU2## and the thickness of the film, t, must also meet the quarter-wave optical thickness requirement ##EQU3## where λm =wavelength of minimum reflectivity
This means that an antireflective film on glass having an index of refraction of 1.52, must have an index of around 1.23 from the above. This low index requirement makes it practically impossible to design a single layer inorganic antireflective film on glass, since the lowest index inorganic material MgF2 has an index of 1.38 which reduces the minimum reflection to about 1.2% and has been widely used in the industry.
However, the problem can be attacked in another direction. Since the index of refraction of a material is related to its density, which can be lowered by introducing porosity, the index can also be lowered. It is required, however, that the pore size must be substantially smaller than the wavelength of the light and the pore distribution must be homogeneous in order not to affect the light transmission and cause scattering.
The density and index of refraction in these materials are related by: ##EQU4## where n and d are the index and density of the non-porous or coating material, and n' and d' are index and density of the porous material. The above equation can be written in terms of porosity as ##EQU5## where P=percent porosity.
In order to make a film with an index of 1.23, for example if the dense material is glass with an index of 1.52, a porosity of approximately 59% is needed. FIG. 1 shows how the index of refraction of TiO2, Al2 O3 and SiO2 varies with porosity. Transparent, porous metal oxide has been produced from clear solutions derived from metal alkoxides. Preparation of colloidal and polymerized solutions which produced continuous transparent oxide films and bodies at low temperature have been presented by the inventor in "Alumina Sol Preparation From Alkoxides" from The American Ceramic Society Bulletin, Vol. 54, No. 3, pp. 289-290, and "Monolithic Glass Formation by Chemical Polymerization", Journal of Material Science Vol. 14 pp. 1843-1849 (1979).
A method of forming a transparent, porous, low index of refraction metal oxide layer on a vitreous substrate is detailed. A clear sol containing a preferred concentration of metal oxide is prepared, and the substrate is placed in the sol and withdrawn at a rate which leaves a polymerized metal hydroxide layer on the glass substrate, which film is approximately a quarter-wave optically thick. The thin porous layer on the substrate is then heated to convert the layer to metal oxide at a temperature of 300°-500° C. The metal oxide is selected from one of aluminum oxide, silicon dioxide, and titanium dioxide.
FIG. 1 is plot of the index of refraction as a function of porosity for aluminum oxide, silicon dioxide, and titanium dioxides.
FIG. 2 is a plot of the reflectivity in percent as a function of wavelength in microns for a glass substrate alone, and for one with a low index of refraction porous metal oxide layer thereon.
A clear solution sol is prepared by hydrolyzing an aluminum alkoxide, Al(OR)3, such as aluminum secondary butoxide, Al(OC4 H9)3. For example, one mole of the aluminum secondary butoxide is vigorously stirred into about 2000 ml of double-distilled, deionized water at a temperature of 70° C. The temperature is raised to about 80° C., and 3.6 grams of acetic acid is introduced after the slurry is stirred for 10-15 minutes to complete hydrolysis of the aluminum alkoxide.
The resultant mixture is kept at 80°-100° C. until it is peptized to a clear solution. The clear solution is cooled.
The vitreous glass tube faceplate or other such glass substrate which is to be coated is then dipped into this solution and withdrawn at a rate of about 7 centimeters per minute. A gel like coating remains on the glass substrate. This gel coated glass substrate is then pyrolyzed or heated at from 300°-500° C. to form a porous aluminum oxide layer which is about 1100-1200 Angstroms thick on the glass substrate, with the pore size between oxide particle of less than about 100 Angstroms, and with the porosity of the layer being above 40 percent and up to 64 percent. This porous aluminum oxide layer has an index of refraction of about 1.32 and has been as low as 1.318. The pore size for the aluminum oxide should be less than about 100 Angstroms to prevent scattering of light.
This low index of refraction porous aluminum oxide layer may be deposited on one or both sides of the glass substrate, with a suitable masking layer provided on the substrate surface which is not to be coating.
The metal alkoxide derived aqueous solution has a concentration of equivalent oxide which is about 1 to 3 percent based on the weight equivalent of aluminum oxide. A variety of aluminum alkoxides can be used and aluminum isopropoxide in an example.
The acid used for peptizing the solution can be varied, with the concentration such that about 0.1 mole of acid is used per mole of alkoxide, with at least 0.03 mole of acid per mole of alkoxide being necessary. While acetic acid has been found particularly effective other noncomplexing acids such as nitric, hydrochloric, and perchloric have been utilized.
It has been discovered that the thickness of the gel coating and resultant porous aluminum oxide coating is primarily determined by the concentration of aluminum alkoxide in solution, and by the rate at which the glass substrate is pulled from the solution. The quarter-wavelength desired thickness for 6000 Angstrom light at the refractive index of about 1.32 is about 1100-1200 Angstroms, but uniform coatings of from 1000-1400 Angstroms result in significantly reduced reflectivity.
At low alkoxide concentrations an alky phenoxypolyethoxy ethanol based colloidal nonionic surfactant, Triton X-102, a trademarked material of Rohm & Haas Corporation was added in amounts of 30-50 mg per liter of solution to prevent beading of alumina particles on the glass.
In general the lowest index of refraction coatings are obtained when glycol or other liquid alaphatic alcohol has been substituted for the aqueous medium in the original hydrolyzing step.
While aluminum oxide was used in the above example, it should be understood that porous layers of silicon dioxide and titanium dioxide can likewise be formed from solution.
Claims (3)
1. Method of forming a substantially transparent, porous thin layer of aluminum oxide on a vitreous substrate, which aluminum oxide layer has an index of refraction substantially less than that of the vitreous substrate, which method comprises:
(a) preparing a clear solution from aluminum alkoxide, which solution is peptized or polymerized with the aluminum maintained in a clear soluble form in a concentration of about 1 to 3% based on the equivalent weight of aluminum oxide;
(b) dipping the vitreous substrate in the clear solution and withdrawing the substrate therefrom at a rate of about seven centimeters per minute to deposit a layer of the clear solution on the vitreous substrate;
(c) pyrolyzing the layer on the substrate by heating to a temperature of from 300°-500° C. to form the porous aluminum oxide layer of low index of refraction, a porosity of greater than 40%, and pore size of less than about 100 angstroms, and a layer thickness of approximately an optical quarter wave.
2. The method set forth in claim 1, wherein a nonionic surfactant colloidal alky phenoxypolyethoxy ethanol surfactant is added to the solution.
3. The method set forth in claim 1, wherein glycol or liquid aliphatic alcohol is included in the solution as a suspension medium.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/116,329 US4271210A (en) | 1979-10-25 | 1980-01-28 | Method of forming transmissive, porous metal oxide optical layer of a vitreous substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US8828079A | 1979-10-25 | 1979-10-25 | |
US06/116,329 US4271210A (en) | 1979-10-25 | 1980-01-28 | Method of forming transmissive, porous metal oxide optical layer of a vitreous substrate |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US8828079A Continuation-In-Part | 1979-10-25 | 1979-10-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
US4271210A true US4271210A (en) | 1981-06-02 |
Family
ID=26778505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US06/116,329 Expired - Lifetime US4271210A (en) | 1979-10-25 | 1980-01-28 | Method of forming transmissive, porous metal oxide optical layer of a vitreous substrate |
Country Status (1)
Country | Link |
---|---|
US (1) | US4271210A (en) |
Cited By (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4446171A (en) * | 1982-02-12 | 1984-05-01 | Owens-Illinois, Inc. | Process of making glass articles having antireflective coating |
EP0125639A1 (en) * | 1983-05-13 | 1984-11-21 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Porous ceramic thin film and process for preparing the same |
EP0193269A2 (en) * | 1985-01-25 | 1986-09-03 | Minnesota Mining And Manufacturing Company | Silica coating |
US4731264A (en) * | 1986-10-03 | 1988-03-15 | Ppg Industries, Inc. | Sol-gel compositions containing silane and alumina |
US4732879A (en) * | 1985-11-08 | 1988-03-22 | Owens-Corning Fiberglas Corporation | Method for applying porous, metal oxide coatings to relatively nonporous fibrous substrates |
EP0263428A2 (en) | 1986-10-03 | 1988-04-13 | Ppg Industries, Inc. | Organosiloxane/metal oxide coatings |
US4753827A (en) * | 1986-10-03 | 1988-06-28 | Ppg Industries, Inc. | Abrasion-resistant organosiloxane/metal oxide coating |
US4754012A (en) * | 1986-10-03 | 1988-06-28 | Ppg Industries, Inc. | Multi-component sol-gel protective coating composition |
US4799963A (en) * | 1986-10-03 | 1989-01-24 | Ppg Industries, Inc. | Optically transparent UV-protective coatings |
US4814017A (en) * | 1986-10-03 | 1989-03-21 | Ppg Industries, Inc. | Aqueous organoalkoxysilane/metal oxide sol-gel compositions |
EP0358338A2 (en) * | 1988-08-12 | 1990-03-14 | Alcan International Limited | Method and composition for surface treatment |
US4931312A (en) * | 1986-02-10 | 1990-06-05 | North American Philips Corporation | Sol-gel process for producing liminescent thin film, and film so produced and devices utilizing same |
US4970097A (en) * | 1989-03-16 | 1990-11-13 | Owens-Corning Fiberglas Corporation | Method for forming abrasion resistant coating on fibrous glass substrate |
US5115023A (en) * | 1987-12-16 | 1992-05-19 | Ppg Industries, Inc. | Siloxane organic hybrid polymers |
US5140498A (en) * | 1991-04-19 | 1992-08-18 | Westinghouse Electric Corp. | Method of producing a wound thin film capacitor |
US5153027A (en) * | 1991-06-10 | 1992-10-06 | Ford Motor Company | Preparation of differential thickness coatings by dip coating where the substrate is pivoted |
WO1994023315A1 (en) * | 1993-04-05 | 1994-10-13 | Commissariat A L'energie Atomique | Method for producing thin films having optical and abrasion resistance properties |
US5401579A (en) * | 1987-12-16 | 1995-03-28 | Ppg Industries, Inc. | Siloxane organic hybrid polymers |
US5585186A (en) * | 1994-12-12 | 1996-12-17 | Minnesota Mining And Manufacturing Company | Coating composition having anti-reflective, and anti-fogging properties |
US5652477A (en) * | 1995-11-08 | 1997-07-29 | Chunghwa Picture Tubes, Ltd. | Multilayer antistatic/antireflective coating for display device |
US5696629A (en) * | 1993-06-14 | 1997-12-09 | Forschungszentrum Julich Gmbh | Optical component comprising layers of porous silicon |
US5698266A (en) * | 1993-04-05 | 1997-12-16 | Commissariat A L'energie Atomique | Process for the production of thin coatings having optical and abrasion resistance properties |
WO1998034876A1 (en) * | 1997-02-10 | 1998-08-13 | Commissariat A L'energie Atomique | Inorganic polymeric material with tantalic acid anhydride base, in particular with high refractive index, mechanically abrasionproof, method of manufacture, optical materials comprising such material |
FR2762097A1 (en) * | 1997-04-10 | 1998-10-16 | Corning Sa | Optical article with anti=reflective coating |
US5846650A (en) * | 1996-05-10 | 1998-12-08 | Minnesota Mining And Manufacturing Company | Anti-reflective, abrasion resistant, anti-fogging coated articles and methods |
US5873931A (en) * | 1992-10-06 | 1999-02-23 | Minnesota Mining And Manufacturing Company | Coating composition having anti-reflective and anti-fogging properties |
EP0897898A2 (en) * | 1997-08-16 | 1999-02-24 | MERCK PATENT GmbH | Method for the deposition of optical layers |
US5885657A (en) * | 1994-06-23 | 1999-03-23 | Creavis Gesellschaft Fur Technologie Und Innovation Mbh | Production of ceramic layers and their use |
WO2000000854A1 (en) * | 1998-06-30 | 2000-01-06 | Universität Konstanz | Method for producing anti-reflection coatings |
EP0973639A1 (en) * | 1997-04-10 | 2000-01-26 | Corning Incorporated | Optical article with anti-reflecting coating, corresponding coating material and coating method |
US6040053A (en) * | 1996-07-19 | 2000-03-21 | Minnesota Mining And Manufacturing Company | Coating composition having anti-reflective and anti-fogging properties |
US6165594A (en) * | 1998-01-15 | 2000-12-26 | 3M Innovative Properties Company | Multilayer, temperature resistant, composite label |
US6180248B1 (en) | 1987-12-16 | 2001-01-30 | Ppg Industries Ohio, Inc. | Siloxane organic hybrid polymers |
US6180188B1 (en) | 1997-02-10 | 2001-01-30 | Commissariat A L'energie Atomique | Method for preparing a multilayer optical material with crosslinking-densifying by ultraviolet radiation |
US6264859B1 (en) | 1986-10-03 | 2001-07-24 | Ppg Industries Ohio, Inc. | Optically transparent UV-protective coatings |
EP1123753A2 (en) * | 1999-12-07 | 2001-08-16 | Air Products And Chemicals, Inc. | Mesoporous ceramic films having reduced dielectric constants |
US6383559B1 (en) | 1995-12-07 | 2002-05-07 | Fuji Photo Film Co., Ltd. | Anti-reflection film and display device having the same |
US6410173B1 (en) | 1998-11-30 | 2002-06-25 | Denglas Technologies, Llc | Antireflection coatings and other multilayer optical coatings for heat-treatable inorganic substrates and methods for making same |
US20020102396A1 (en) * | 1999-12-07 | 2002-08-01 | Macdougall James Edward | Mesoporous films having reduced dielectric constants |
AT410603B (en) * | 1997-12-23 | 2003-06-25 | Forschungszentrum Juelich Gmbh | OPTICAL COMPONENT |
EP1329433A1 (en) * | 2001-10-24 | 2003-07-23 | Centro De Investigaciones Energeticas Medioambientales Y Tecnologicas (C.I.E.M.A.T.) | Sol-gel process for the preparation of porous coatings, using precursor solutions prepared by polymeric reactions |
WO2003097547A1 (en) | 2002-05-21 | 2003-11-27 | Interfloat Corporation | Method and use of a device for coating plate-shaped substrates |
US20040057142A1 (en) * | 2002-07-10 | 2004-03-25 | Denglas Technologies, L.L.C. | Method of making stress-resistant anti-reflection multilayer coatings containing cerium oxide |
FR2865219A1 (en) * | 2004-01-20 | 2005-07-22 | Peugeot Citroen Automobiles Sa | Coating substrate with metal oxide, e.g. for catalysis, comprises use of colloidal solution applied to substrate in thixotropic form |
US20050233135A1 (en) * | 2004-04-15 | 2005-10-20 | Iyer Pradeep S | Dew resistant coatings |
DE102005020168A1 (en) * | 2005-04-28 | 2006-11-02 | Schott Ag | Coating glass or ceramic substrate with anti-reflective layer using sol-gel process, employs e.g. silicon-aluminum mixed oxide with adsorbed hydrophobe present in sol-gel binder |
US20100261009A1 (en) * | 2009-03-31 | 2010-10-14 | Schott Ag | Transparent glass or glass ceramic pane with a layer that reflects infrared radiation |
WO2018002193A1 (en) | 2016-06-29 | 2018-01-04 | Koninklijke Philips N.V. | Light guides with low refractive coating to be used in water |
EP3431867A1 (en) | 2017-07-18 | 2019-01-23 | Koninklijke Philips N.V. | Light guides with coating for use in water |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3941719A (en) * | 1972-08-17 | 1976-03-02 | Owens-Illinois, Inc. | Transparent activated nonparticulate alumina and method of preparing same |
US4132919A (en) * | 1977-12-12 | 1979-01-02 | Lockheed Missiles & Space Company, Inc. | Absorbing inhomogeneous film for high contrast display devices |
US4161560A (en) * | 1976-12-23 | 1979-07-17 | Leybold-Heraeus Gmbh & Co. Kg | Method of producing antireflective coatings on acrylic glasses, optical bodies produced by this method and the use of such optical bodies |
-
1980
- 1980-01-28 US US06/116,329 patent/US4271210A/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3941719A (en) * | 1972-08-17 | 1976-03-02 | Owens-Illinois, Inc. | Transparent activated nonparticulate alumina and method of preparing same |
US4161560A (en) * | 1976-12-23 | 1979-07-17 | Leybold-Heraeus Gmbh & Co. Kg | Method of producing antireflective coatings on acrylic glasses, optical bodies produced by this method and the use of such optical bodies |
US4132919A (en) * | 1977-12-12 | 1979-01-02 | Lockheed Missiles & Space Company, Inc. | Absorbing inhomogeneous film for high contrast display devices |
Non-Patent Citations (5)
Title |
---|
Yoldas, "A Transparent Porous Alumina" Ceramic Bulletin, vol. 54, No. 3, pp. 286-288, (1975). * |
Yoldas, "Alumina Sol Preparation from Alkoxides" Ceramic Bulletin, vol. 54, No. 3, pp. 289-290, (1975). * |
Yoldas, "Hydrolysis of Aluminum Alkoxides and Bayerite Conversion" J. Appl. Chem. Biotechnol, 1973, 23, pp. 803-809. * |
Yoldas, "Monolithic Glass Formation by Chemical Polymerization" J. Mat. Sci. 14 (1979) pp. 1843-1849. * |
Yoldas, "Preparation of Glasses and Ceramics from Metal-Organic Compounds" J. Mat. Sci. 12 (1977), pp. 1203-1208. * |
Cited By (85)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4446171A (en) * | 1982-02-12 | 1984-05-01 | Owens-Illinois, Inc. | Process of making glass articles having antireflective coating |
EP0125639A1 (en) * | 1983-05-13 | 1984-11-21 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Porous ceramic thin film and process for preparing the same |
EP0193269A2 (en) * | 1985-01-25 | 1986-09-03 | Minnesota Mining And Manufacturing Company | Silica coating |
US4816333A (en) * | 1985-01-25 | 1989-03-28 | Minnesota Mining And Manufacturing Company | Silica coating |
EP0193269A3 (en) * | 1985-01-25 | 1989-03-08 | Minnesota Mining And Manufacturing Company | Silica coating |
US4732879A (en) * | 1985-11-08 | 1988-03-22 | Owens-Corning Fiberglas Corporation | Method for applying porous, metal oxide coatings to relatively nonporous fibrous substrates |
US4931312A (en) * | 1986-02-10 | 1990-06-05 | North American Philips Corporation | Sol-gel process for producing liminescent thin film, and film so produced and devices utilizing same |
US4799963A (en) * | 1986-10-03 | 1989-01-24 | Ppg Industries, Inc. | Optically transparent UV-protective coatings |
US4754012A (en) * | 1986-10-03 | 1988-06-28 | Ppg Industries, Inc. | Multi-component sol-gel protective coating composition |
US4753827A (en) * | 1986-10-03 | 1988-06-28 | Ppg Industries, Inc. | Abrasion-resistant organosiloxane/metal oxide coating |
US4814017A (en) * | 1986-10-03 | 1989-03-21 | Ppg Industries, Inc. | Aqueous organoalkoxysilane/metal oxide sol-gel compositions |
EP0263428A2 (en) | 1986-10-03 | 1988-04-13 | Ppg Industries, Inc. | Organosiloxane/metal oxide coatings |
US4731264A (en) * | 1986-10-03 | 1988-03-15 | Ppg Industries, Inc. | Sol-gel compositions containing silane and alumina |
US6355189B1 (en) | 1986-10-03 | 2002-03-12 | Ppg Industries Ohio, Inc. | Optically transparent UV-protective coatings |
US6264859B1 (en) | 1986-10-03 | 2001-07-24 | Ppg Industries Ohio, Inc. | Optically transparent UV-protective coatings |
US6469119B2 (en) | 1987-12-16 | 2002-10-22 | Ppg Industries Ohio, Inc. | Siloxane organic hybrid polymers |
US5401579A (en) * | 1987-12-16 | 1995-03-28 | Ppg Industries, Inc. | Siloxane organic hybrid polymers |
US5115023A (en) * | 1987-12-16 | 1992-05-19 | Ppg Industries, Inc. | Siloxane organic hybrid polymers |
US6180248B1 (en) | 1987-12-16 | 2001-01-30 | Ppg Industries Ohio, Inc. | Siloxane organic hybrid polymers |
EP0358338A2 (en) * | 1988-08-12 | 1990-03-14 | Alcan International Limited | Method and composition for surface treatment |
AU625900B2 (en) * | 1988-08-12 | 1992-07-16 | Alcan International Limited | Method and composition for surface treatment |
EP0358338A3 (en) * | 1988-08-12 | 1990-04-11 | Alcan International Limited | Method and composition for surface treatment |
US4970097A (en) * | 1989-03-16 | 1990-11-13 | Owens-Corning Fiberglas Corporation | Method for forming abrasion resistant coating on fibrous glass substrate |
US5140498A (en) * | 1991-04-19 | 1992-08-18 | Westinghouse Electric Corp. | Method of producing a wound thin film capacitor |
EP0518474A1 (en) * | 1991-06-10 | 1992-12-16 | Ford Motor Company Limited | Process for preparing differential thickness coatings on substrates |
US5153027A (en) * | 1991-06-10 | 1992-10-06 | Ford Motor Company | Preparation of differential thickness coatings by dip coating where the substrate is pivoted |
US5997621A (en) * | 1992-10-06 | 1999-12-07 | Minnesota Mining And Manufacturing Co. | Coating composition having anti-reflective and anti-fogging properties |
US5873931A (en) * | 1992-10-06 | 1999-02-23 | Minnesota Mining And Manufacturing Company | Coating composition having anti-reflective and anti-fogging properties |
WO1994023315A1 (en) * | 1993-04-05 | 1994-10-13 | Commissariat A L'energie Atomique | Method for producing thin films having optical and abrasion resistance properties |
FR2703791A1 (en) * | 1993-04-05 | 1994-10-14 | Commissariat Energie Atomique | A method of manufacturing thin films with optical properties and abrasion resistance properties. |
US5698266A (en) * | 1993-04-05 | 1997-12-16 | Commissariat A L'energie Atomique | Process for the production of thin coatings having optical and abrasion resistance properties |
US5696629A (en) * | 1993-06-14 | 1997-12-09 | Forschungszentrum Julich Gmbh | Optical component comprising layers of porous silicon |
US5885657A (en) * | 1994-06-23 | 1999-03-23 | Creavis Gesellschaft Fur Technologie Und Innovation Mbh | Production of ceramic layers and their use |
US5585186A (en) * | 1994-12-12 | 1996-12-17 | Minnesota Mining And Manufacturing Company | Coating composition having anti-reflective, and anti-fogging properties |
US5723175A (en) * | 1994-12-12 | 1998-03-03 | Minnesota Mining And Manufacturing Company | Coating composition having anti-reflective and anti-fogging properties |
US5652477A (en) * | 1995-11-08 | 1997-07-29 | Chunghwa Picture Tubes, Ltd. | Multilayer antistatic/antireflective coating for display device |
US6383559B1 (en) | 1995-12-07 | 2002-05-07 | Fuji Photo Film Co., Ltd. | Anti-reflection film and display device having the same |
US5846650A (en) * | 1996-05-10 | 1998-12-08 | Minnesota Mining And Manufacturing Company | Anti-reflective, abrasion resistant, anti-fogging coated articles and methods |
US6040053A (en) * | 1996-07-19 | 2000-03-21 | Minnesota Mining And Manufacturing Company | Coating composition having anti-reflective and anti-fogging properties |
FR2759360A1 (en) * | 1997-02-10 | 1998-08-14 | Commissariat Energie Atomique | INORGANIC POLYMERIC MATERIAL BASED ON TANTALOUS OXIDE ESPECIALLY HAVING A HIGH REFRACTION INDEX, MECHANICALLY RESISTANT TO ABRASION, METHOD FOR MANUFACTURING SAME, AND OPTICAL MATERIAL COMPRISING SAID MATERIAL |
WO1998034876A1 (en) * | 1997-02-10 | 1998-08-13 | Commissariat A L'energie Atomique | Inorganic polymeric material with tantalic acid anhydride base, in particular with high refractive index, mechanically abrasionproof, method of manufacture, optical materials comprising such material |
US6387517B1 (en) | 1997-02-10 | 2002-05-14 | Commissariat A L'energie Atomique | Inorganic polymer material with tantalic acid anhydride base, in particular with high refractive index, mechanically abrasionproof, method of manufacture, optical materials comprising such material |
US6180188B1 (en) | 1997-02-10 | 2001-01-30 | Commissariat A L'energie Atomique | Method for preparing a multilayer optical material with crosslinking-densifying by ultraviolet radiation |
EP0973639A4 (en) * | 1997-04-10 | 2000-07-19 | Corning Inc | Optical article with anti-reflecting coating, corresponding coating material and coating method |
EP0973639A1 (en) * | 1997-04-10 | 2000-01-26 | Corning Incorporated | Optical article with anti-reflecting coating, corresponding coating material and coating method |
FR2762097A1 (en) * | 1997-04-10 | 1998-10-16 | Corning Sa | Optical article with anti=reflective coating |
EP0897898A3 (en) * | 1997-08-16 | 1999-03-10 | MERCK PATENT GmbH | Method for the deposition of optical layers |
EP0897898A2 (en) * | 1997-08-16 | 1999-02-24 | MERCK PATENT GmbH | Method for the deposition of optical layers |
AT410603B (en) * | 1997-12-23 | 2003-06-25 | Forschungszentrum Juelich Gmbh | OPTICAL COMPONENT |
US6455998B1 (en) | 1998-01-15 | 2002-09-24 | 3M Innovative Properties Company | Multilayer temperature resistant composite label for a cathode ray tube |
US6214250B1 (en) | 1998-01-15 | 2001-04-10 | 3M Innovative Properties Company | Multilayer, temperature resistant, composite label |
US6251212B1 (en) | 1998-01-15 | 2001-06-26 | 3M Innovative Properties Company | Multilayer, temperature resistant, composite label |
US6165594A (en) * | 1998-01-15 | 2000-12-26 | 3M Innovative Properties Company | Multilayer, temperature resistant, composite label |
US6582805B1 (en) | 1998-01-15 | 2003-06-24 | 3M Innovative Properties Company | Multilayer, temperature resistant, composite label |
WO2000000854A1 (en) * | 1998-06-30 | 2000-01-06 | Universität Konstanz | Method for producing anti-reflection coatings |
US6605229B2 (en) | 1998-06-30 | 2003-08-12 | Universitat Konstanz | Process for producing antireflection coatings |
US6410173B1 (en) | 1998-11-30 | 2002-06-25 | Denglas Technologies, Llc | Antireflection coatings and other multilayer optical coatings for heat-treatable inorganic substrates and methods for making same |
US6656522B2 (en) | 1998-11-30 | 2003-12-02 | Denglas Technologies, Llc | Methods for making antireflection coatings for heat-treatable inorganic substrates |
US20020102396A1 (en) * | 1999-12-07 | 2002-08-01 | Macdougall James Edward | Mesoporous films having reduced dielectric constants |
US6942918B2 (en) | 1999-12-07 | 2005-09-13 | Air Products And Chemicals, Inc. | Mesoporous films having reduced dielectric constants |
US20030157311A1 (en) * | 1999-12-07 | 2003-08-21 | Macdougall James Edward | Mesoporous films having reduced dielectric constants |
EP1123753A2 (en) * | 1999-12-07 | 2001-08-16 | Air Products And Chemicals, Inc. | Mesoporous ceramic films having reduced dielectric constants |
EP1123753A3 (en) * | 1999-12-07 | 2004-04-28 | Air Products And Chemicals, Inc. | Mesoporous ceramic films having reduced dielectric constants |
US6818289B2 (en) | 1999-12-07 | 2004-11-16 | Air Products And Chemicals, Inc. | Mesoporous films having reduced dielectric constants |
EP1329433A1 (en) * | 2001-10-24 | 2003-07-23 | Centro De Investigaciones Energeticas Medioambientales Y Tecnologicas (C.I.E.M.A.T.) | Sol-gel process for the preparation of porous coatings, using precursor solutions prepared by polymeric reactions |
ES2191542A1 (en) * | 2001-10-24 | 2003-09-01 | Ct Investig Energeticas Ciemat | Sol-gel process for the preparation of porous coatings, using precursor solutions prepared by polymeric reactions |
WO2003097547A1 (en) | 2002-05-21 | 2003-11-27 | Interfloat Corporation | Method and use of a device for coating plate-shaped substrates |
US20040057142A1 (en) * | 2002-07-10 | 2004-03-25 | Denglas Technologies, L.L.C. | Method of making stress-resistant anti-reflection multilayer coatings containing cerium oxide |
WO2005075702A2 (en) * | 2004-01-20 | 2005-08-18 | Peugeot Citroën Automobiles SA | Method for depositing a metal oxide coating on a substrate |
FR2865219A1 (en) * | 2004-01-20 | 2005-07-22 | Peugeot Citroen Automobiles Sa | Coating substrate with metal oxide, e.g. for catalysis, comprises use of colloidal solution applied to substrate in thixotropic form |
WO2005075702A3 (en) * | 2004-01-20 | 2006-04-06 | Peugeot Citroen Automobiles Sa | Method for depositing a metal oxide coating on a substrate |
US20050233135A1 (en) * | 2004-04-15 | 2005-10-20 | Iyer Pradeep S | Dew resistant coatings |
US7504156B2 (en) | 2004-04-15 | 2009-03-17 | Avery Dennison Corporation | Dew resistant coatings |
US20090252956A1 (en) * | 2004-04-15 | 2009-10-08 | Avery Dennison Corporation | Dew resistant coatings |
US9428654B2 (en) | 2004-04-15 | 2016-08-30 | Avery Dennison Corporation | Dew resistant coatings |
DE102005020168A1 (en) * | 2005-04-28 | 2006-11-02 | Schott Ag | Coating glass or ceramic substrate with anti-reflective layer using sol-gel process, employs e.g. silicon-aluminum mixed oxide with adsorbed hydrophobe present in sol-gel binder |
US8822033B2 (en) * | 2009-03-31 | 2014-09-02 | Schott Ag | Transparent glass or glass ceramic pane with a layer that reflects infrared radiation |
US20100261009A1 (en) * | 2009-03-31 | 2010-10-14 | Schott Ag | Transparent glass or glass ceramic pane with a layer that reflects infrared radiation |
WO2018002193A1 (en) | 2016-06-29 | 2018-01-04 | Koninklijke Philips N.V. | Light guides with low refractive coating to be used in water |
WO2018002205A1 (en) | 2016-06-29 | 2018-01-04 | Koninklijke Philips N.V. | Light guides with coating to be used in water |
US10906616B2 (en) | 2016-06-29 | 2021-02-02 | Koninklijke Philips N.V. | Light guides with coating to be used in water |
US11524754B2 (en) * | 2016-06-29 | 2022-12-13 | Koninklijke Philips N.V. | Light guides with low refractive coating to be used in water |
EP3431867A1 (en) | 2017-07-18 | 2019-01-23 | Koninklijke Philips N.V. | Light guides with coating for use in water |
WO2019016291A1 (en) | 2017-07-18 | 2019-01-24 | Koninklijke Philips N.V. | Light guides with coating for use in water |
US11500145B2 (en) | 2017-07-18 | 2022-11-15 | Koninklijke Philips N.V. | Light guides with coating for use in water |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4271210A (en) | Method of forming transmissive, porous metal oxide optical layer of a vitreous substrate | |
EP0597490B1 (en) | Reflectance reducing film and method of forming same on glass substrate | |
US5639517A (en) | Process for the production of thin films having optical properties | |
US6638630B2 (en) | Composition and method for a coating providing anti-reflective and anti-static properties | |
US4446171A (en) | Process of making glass articles having antireflective coating | |
US4272588A (en) | Oxide protected mirror | |
US4361598A (en) | Polymerized solutions for depositing optical oxide coatings | |
US5993898A (en) | Fabrication method and structure for multilayer optical anti-reflection coating, and optical component and optical system using multilayer optical anti-reflection coating | |
Yoldas | Investigations of porous oxides as an antireflective coating for glass surfaces | |
US4346131A (en) | Polymerized solutions for depositing optical oxide coatings | |
US4929278A (en) | Sol-gel antireflective coating on plastics | |
US5858462A (en) | Porous metal-oxide thin film and method of forming same on glass substrate | |
US4966812A (en) | Sol-gel antireflective coating on plastics | |
US6387517B1 (en) | Inorganic polymer material with tantalic acid anhydride base, in particular with high refractive index, mechanically abrasionproof, method of manufacture, optical materials comprising such material | |
US5268196A (en) | Process for forming anti-reflective coatings comprising light metal fluorides | |
US5153027A (en) | Preparation of differential thickness coatings by dip coating where the substrate is pivoted | |
US4596745A (en) | Non-glare coating | |
EP1113987B1 (en) | Process for preparing silica or silica-based thick vitreous films according to the sol-gel technique and thick films thereby obtained | |
EP0008215B1 (en) | Polymerized solutions of an oxide; method of preparation thereof; method of preparing alkoxyde coatings on substrates, such as solar cells, and product so obtained | |
JP3604387B2 (en) | Method for forming thin coating layer having optical properties and wear resistance | |
US5623375A (en) | International dielectric mirror and production process for such a mirror | |
US5552178A (en) | Method for preparing anti-reflective coating for display devices | |
EP1363142A1 (en) | Reflection reducing coating, base material and photoelectric transducer with the reflection reducing coating | |
La Serra et al. | Preparation and characterization of thin films of TiO2 PbO and TiO2 Bi2O3 compositions | |
US5208101A (en) | Anti-reflective coatings comprising light metal fluorides |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STCF | Information on status: patent grant |
Free format text: PATENTED CASE |
|
AS | Assignment |
Owner name: MICRON TECHNOLOGY, INC., IDAHO Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:WESTINGHOUSE ELECTRIC CORPORATION;REEL/FRAME:007722/0071 Effective date: 19951010 |