US4147667A - Photoconductor for GaAs laser addressed devices - Google Patents

Photoconductor for GaAs laser addressed devices Download PDF

Info

Publication number
US4147667A
US4147667A US05/869,194 US86919478A US4147667A US 4147667 A US4147667 A US 4147667A US 86919478 A US86919478 A US 86919478A US 4147667 A US4147667 A US 4147667A
Authority
US
United States
Prior art keywords
photoconductor
amorphous
gaas laser
atomic percent
prepared
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US05/869,194
Inventor
Jacques P. Chevallier
Charles R. Guarnieri
Aare Onton
Harold Wieder
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IBM Information Products Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Priority to US05/869,194 priority Critical patent/US4147667A/en
Priority to CA314,676A priority patent/CA1111536A/en
Priority to JP14797978A priority patent/JPS5498588A/en
Priority to IT31082/78A priority patent/IT1160377B/en
Priority to EP78101834A priority patent/EP0003237B1/en
Priority to DE7878101834T priority patent/DE2862265D1/en
Priority to AT0934578A priority patent/AT371949B/en
Application granted granted Critical
Publication of US4147667A publication Critical patent/US4147667A/en
Assigned to MORGAN BANK reassignment MORGAN BANK SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: IBM INFORMATION PRODUCTS CORPORATION
Assigned to IBM INFORMATION PRODUCTS CORPORATION, 55 RAILROAD AVENUE, GREENWICH, CT 06830 A CORP OF DE reassignment IBM INFORMATION PRODUCTS CORPORATION, 55 RAILROAD AVENUE, GREENWICH, CT 06830 A CORP OF DE ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: INTERNATIONAL BUSINESS MACHINES CORPORATION
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
    • H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic Table
    • H01L31/204—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic Table including AIVBIV alloys, e.g. SiGe, SiC
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0376—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors
    • H01L31/03762—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors including only elements of Group IV of the Periodic Table
    • H01L31/03765—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors including only elements of Group IV of the Periodic Table including AIVBIV compounds or alloys, e.g. SiGe, SiC
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/09—Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/095—Devices sensitive to infrared, visible or ultraviolet radiation comprising amorphous semiconductors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/548—Amorphous silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • This invention relates to photoconductors and more particularly photoconductors sensitive to illumination at about 1.5 eV.
  • Infrared sensitive photoconductors having high dark resistivity and fast response times are of interest for applications involving high speed photoactivated devices. It is particularly useful to have photoconductors which are sensitive to gallium arsenide, GaAs, lasers, which have a peak emitting energy at about 1.5 eV.
  • Crystalline Si-Ge alloys have been prepared as reported by Braunstein in Physical Review, Vol. 130, page 869 in 1963. These alloys, however, did not exhibit any significant photoconductivity.
  • a preferred embodiment of this invention is amorphous Si x Ge 1-x H y , where x ranges from 0.78 to 0.93 and y ranges from 14 to 20 atomic percent.
  • This material is a good photoconductor at 1.5 eV and it has a high dark resistivity of about 10 8 ohm-cm and a rapid response, i.e., a mobility of 5 ⁇ 10 -2 cm 2 /Vs.
  • FIG. 1 illustrates the photoconductor in the vicinity of the absorption edge for 3 compositions in accordance with this invention, compared to amorphous silicon containing comparable amounts of hydrogen incorporated therein.
  • an improved photoconductor for GaAs laser addressed devices which is sensitive to illumination at about 1.5 eV is an amorphous material containing silicon, hydrogen and a material taken from the group consisting of Ge, Sn and Pb.
  • the structure for this amorphous alloy is Si x A 1-x H y where A is taken from the group consisting of Ge, Sn and Pb, x equals 0.50 to 0.99 and y equals 1 to 50 atomic percent.
  • a preferred element in the amorphous silicon alloy is germanium, Ge.
  • a preferred concentration of germanium is when x equals 0.78 to 0.93.
  • a preferred concentration of H is when y is 5 to 35 atomic percent.
  • the addition of a compound from the group, for example, germanium appears to shift the absorption edge of the amorphous silicon further into the infrared region without altering either the response time or the dark resistivity which would be obtained with amorphous silicon, thereby making a sensitivity match to the GaAs wavelength of about 1.5 eV.
  • the amorphous alloys of this invention may be prepared by the glow discharge process or alternatively in a sputtering system with the appropriate elements in a carrier gas containing hydrogen. Both methods are familiar to those skilled in the art.
  • an amorphous alloy such as Si-GeH is prepared by simultaneously introducing silane and germane into the chamber in the glow discharge process.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Light Receiving Elements (AREA)

Abstract

An improved photoconductor for GaAs laser addressed devices sensitive to illumination at about 1.5 eV is an amorphous material containing silicon, hydrogen and a material taken from the group consisting of Ge, Sn and Pb. A preferred embodiment of this invention is amorphous Six Ge1-x Hy where x equals 0.78 to 0.93 and y equals 14-20 atomic percent.

Description

FIELD OF THE INVENTION
This invention relates to photoconductors and more particularly photoconductors sensitive to illumination at about 1.5 eV.
BRIEF DESCRIPTION OF PRIOR ART
Infrared sensitive photoconductors having high dark resistivity and fast response times are of interest for applications involving high speed photoactivated devices. It is particularly useful to have photoconductors which are sensitive to gallium arsenide, GaAs, lasers, which have a peak emitting energy at about 1.5 eV.
The preparation of amorphous silicon and amorphous germanium by the glow discharge method was reported by Chittick in the Journal of Non-crystalline Solids, Vol. 3 (1970) pgs. 255-270. Chittick reported that the amorphous silicon which contained hydrogen incorporated therein as the result of being prepared by the glow discharge process was a very good photoconductor in the spectral range above 2 eV. However, the photoconductivity dropped off significantly at values below 2 eV and was relatively weak at 1.5 eV, the wavelength of the GaAs laser. Chittick also reported that the amorphous germanium prepared by the same method and containing hydrogen therein had no measurable photoconductivity and had a low dark resistivity.
Crystalline Si-Ge alloys have been prepared as reported by Braunstein in Physical Review, Vol. 130, page 869 in 1963. These alloys, however, did not exhibit any significant photoconductivity.
It was reported by Beaglehole in the Journal of Non-Crystalline Solids, Vol. 4, page 272 in 1970 that amorphous Si-Ge alloys that had been prepared by the co-evaporation method did not exhibit any significant photoconductivity. The amorphous Si-Ge alloys prepared by this method did not have any hydrogen incorporated therein as a result of the method by which it was formed.
SUMMARY OF THE INVENTION
It is a primary object of this invention to provide a photoconductor with improved response in the infrared.
It is still another object of this invention to provide a photoconductor being sensitive at the wavelength of the GaAs laser, that is, 1.5 eV.
It is a further object of this invention to provide a photoconductor sensitive at 1.5 eV that has fast response and high dark resistivity.
These and other objects are accomplished by an amorphous Six A1-x Hy alloy where A is taken from the group consisting of Ge, Sn and Pb, and where x=0.50 to 0.99 and y=1 to 50 atomic percent. A preferred embodiment of this invention is amorphous Six Ge1-x Hy, where x ranges from 0.78 to 0.93 and y ranges from 14 to 20 atomic percent. This material is a good photoconductor at 1.5 eV and it has a high dark resistivity of about 108 ohm-cm and a rapid response, i.e., a mobility of 5×10-2 cm2 /Vs.
Other objects of this invention will be apparent from the following detailed description, reference being made to the accompanying drawing wherein various embodiments of the invention are shown.
BRIEF DESCRIPTION OF THE DRAWING
FIG. 1 illustrates the photoconductor in the vicinity of the absorption edge for 3 compositions in accordance with this invention, compared to amorphous silicon containing comparable amounts of hydrogen incorporated therein.
DESCRIPTION OF THE ILLUSTRATIVE EMBODIMENTS
In accordance with this invention, an improved photoconductor for GaAs laser addressed devices which is sensitive to illumination at about 1.5 eV is an amorphous material containing silicon, hydrogen and a material taken from the group consisting of Ge, Sn and Pb. The structure for this amorphous alloy is Six A1-x Hy where A is taken from the group consisting of Ge, Sn and Pb, x equals 0.50 to 0.99 and y equals 1 to 50 atomic percent.
A preferred element in the amorphous silicon alloy is germanium, Ge. A preferred concentration of germanium is when x equals 0.78 to 0.93. A preferred concentration of H is when y is 5 to 35 atomic percent. The addition of a compound from the group, for example, germanium, appears to shift the absorption edge of the amorphous silicon further into the infrared region without altering either the response time or the dark resistivity which would be obtained with amorphous silicon, thereby making a sensitivity match to the GaAs wavelength of about 1.5 eV.
The amorphous alloys of this invention may be prepared by the glow discharge process or alternatively in a sputtering system with the appropriate elements in a carrier gas containing hydrogen. Both methods are familiar to those skilled in the art. Preferably, an amorphous alloy such as Si-GeH is prepared by simultaneously introducing silane and germane into the chamber in the glow discharge process.
EXAMPLE NO. 1
A film 1 to 3 microns thick of amorphous Six Ge1-x Hy, where x is 0.93 and y is between 14 and 20 atomic percent, was prepared by the RF glow discharge decomposition of silane and germane gases. The mixed gases were reacted at 310 mTorr pressure, the flow rate was 0.6 Scc/S and a net RF power of 24 watts was employed. The substrate temperature was maintained constant at 250° C. Hydrogen is present in this glow discharge process. The photoconductivity showing the shifting of the absorption edge further into the infrared is shown in FIG. 1 where it is compared with an amorphous silicon alloy having a similar amount of hydrogen incorporated therein.
EXAMPLES 2 and 3
Films containing germanium and having 0.78 silicon and 0.54 silicon, respectively, were prepared by the method described above under Example 1. The photoconductivity of these two materials is set forth in FIG. 1.
As illustrated in FIG. 1, all three alloys, examples 1, 2 and 3, prepared in accordance with this invention, shift the absorption edge further into the infrared. Furthermore, this is accomplished without altering either the resistivity or the response time of the material. These three alloys have a sensitivity at the GaAs wavelength of 1.5 eV which is greater than that for the amorphous silicon material containing hydrogen only.
Although preferred embodiments of this invention have been described, it is understood that numerous variations may be made in accordance with the principles of this invention.

Claims (6)

What is claimed is:
1. A photoconductor sensitive to illumination from a GaAs laser at about 1.5 eV comprising
amorphous Six A1-x Hy
where A is selected from the group consisting of Ge, Sn and Pb
x=0.50 to 0.99
y=1 to 50 atomic percent.
2. A photoconductor as described in claim 1 wherein A is Ge.
3. A photoconductor as described in claim 2 wherein y=5 to 35 atomic percent.
4. A photoconductor as described in claim 2 wherein y=14 to 20 atomic percent.
5. A photoconductor as described in claim 2 wherein x=0.78 to 0.93.
6. A photoconductor as described in claim 5 wherein y=14 to 20 atomic percent.
US05/869,194 1978-01-13 1978-01-13 Photoconductor for GaAs laser addressed devices Expired - Lifetime US4147667A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
US05/869,194 US4147667A (en) 1978-01-13 1978-01-13 Photoconductor for GaAs laser addressed devices
CA314,676A CA1111536A (en) 1978-01-13 1978-10-30 Photoconductor for gaas laser addressed devices
JP14797978A JPS5498588A (en) 1978-01-13 1978-12-01 Photoconductive element
IT31082/78A IT1160377B (en) 1978-01-13 1978-12-21 PERFECTED PHOTOCONDUCTOR
EP78101834A EP0003237B1 (en) 1978-01-13 1978-12-23 Use of an amorphous alloy of silicon and germanium as against gallium-arsenide laser radiation sensitive photoconductor
DE7878101834T DE2862265D1 (en) 1978-01-13 1978-12-23 Use of an amorphous alloy of silicon and germanium as against gallium-arsenide laser radiation sensitive photoconductor
AT0934578A AT371949B (en) 1978-01-13 1978-12-28 SENSITIVE PHOTOConductors AGAINST GALLIUM ARSENIDE LASER RADIATION

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/869,194 US4147667A (en) 1978-01-13 1978-01-13 Photoconductor for GaAs laser addressed devices

Publications (1)

Publication Number Publication Date
US4147667A true US4147667A (en) 1979-04-03

Family

ID=25353100

Family Applications (1)

Application Number Title Priority Date Filing Date
US05/869,194 Expired - Lifetime US4147667A (en) 1978-01-13 1978-01-13 Photoconductor for GaAs laser addressed devices

Country Status (7)

Country Link
US (1) US4147667A (en)
EP (1) EP0003237B1 (en)
JP (1) JPS5498588A (en)
AT (1) AT371949B (en)
CA (1) CA1111536A (en)
DE (1) DE2862265D1 (en)
IT (1) IT1160377B (en)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4255686A (en) * 1978-05-19 1981-03-10 Hitachi, Ltd. Storage type photosensor containing silicon and hydrogen
EP0039219A1 (en) * 1980-04-25 1981-11-04 Hitachi, Ltd. Light sensitive screen and devices including the same
US4340506A (en) * 1978-07-26 1982-07-20 Tdk Electronics Co., Ltd. Photoelectric transfer device
US4360821A (en) * 1978-08-18 1982-11-23 Hitachi, Ltd. Solid-state imaging device
US4365015A (en) * 1979-08-20 1982-12-21 Canon Kabushiki Kaisha Photosensitive member for electrophotography composed of a photoconductive amorphous silicon
WO1983002254A1 (en) * 1981-12-31 1983-07-07 Western Electric Co Optical recording media
US4397933A (en) * 1978-12-28 1983-08-09 Canon Kabushiki Kaisha Hydrogenated amorphous silicon photoconductive layer
FR2535902A1 (en) * 1982-11-04 1984-05-11 Canon Kk PHOTOCONDUCTIVE ELEMENT
US4451546A (en) * 1982-03-31 1984-05-29 Minolta Camera Kabushiki Kaisha Photosensitive member
US4471042A (en) * 1978-05-04 1984-09-11 Canon Kabushiki Kaisha Image-forming member for electrophotography comprising hydrogenated amorphous matrix of silicon and/or germanium
US4489149A (en) * 1980-05-08 1984-12-18 Minolta Camera Kabushiki Kaisha Electrophotographic amorphous silicon member
US4490450A (en) * 1982-03-31 1984-12-25 Canon Kabushiki Kaisha Photoconductive member
US4491626A (en) * 1982-03-31 1985-01-01 Minolta Camera Kabushiki Kaisha Photosensitive member
US4565731A (en) * 1978-05-04 1986-01-21 Canon Kabushiki Kaisha Image-forming member for electrophotography
US4673628A (en) * 1979-03-26 1987-06-16 Canon Kabushiki Kaisha Image forming member for electrophotography
US4711857A (en) * 1986-08-28 1987-12-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Tailorable infrared sensing device with strain layer superlattice structure
US4843439A (en) * 1985-08-28 1989-06-27 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Tailorable infrared sensing device with strain layer superlattice structure

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2441264A1 (en) * 1978-11-08 1980-06-06 Hitachi Ltd RADIATION SENSITIVE SCREEN
JPS6323858Y2 (en) * 1981-01-31 1988-06-30
JPS58102970A (en) * 1981-12-16 1983-06-18 Konishiroku Photo Ind Co Ltd Laser recorder
JPS605025U (en) * 1983-06-22 1985-01-14 株式会社日立ホームテック Microwave oven output switching device
JPS605024U (en) * 1983-06-22 1985-01-14 株式会社日立ホームテック Microwave oven output switching device
JPS605023U (en) * 1983-06-22 1985-01-14 株式会社日立ホームテック Microwave oven output switching device
US4579797A (en) * 1983-10-25 1986-04-01 Canon Kabushiki Kaisha Photoconductive member with amorphous germanium and silicon regions, nitrogen and dopant
JPS61205948A (en) * 1985-03-08 1986-09-12 Canon Inc Photoreceptor
JPH0750332B2 (en) * 1985-09-03 1995-05-31 株式会社リコー Electrophotographic photoreceptor
JPH0441542Y2 (en) * 1987-12-28 1992-09-30
JPH087448B2 (en) * 1988-04-28 1996-01-29 シャープ株式会社 Method for manufacturing electrophotographic photoreceptor
JPH07117764B2 (en) * 1988-04-04 1995-12-18 シャープ株式会社 Method for manufacturing electrophotographic photoreceptor
JPH07117762B2 (en) * 1988-06-28 1995-12-18 シャープ株式会社 Method for manufacturing electrophotographic photoreceptor
JPH07120060B2 (en) * 1988-11-29 1995-12-20 シャープ株式会社 Method for manufacturing electrophotographic photoreceptor
JPH07117763B2 (en) * 1988-06-30 1995-12-18 シャープ株式会社 Method for manufacturing electrophotographic photoreceptor
CN101550495B (en) * 2008-04-02 2010-11-10 北京有色金属研究总院 Preparation method of silicon-germanium alloy material

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3279954A (en) * 1961-06-09 1966-10-18 Rca Corp Thermoelectric device having silicongermanium alloy thermoelement
US3966470A (en) * 1973-08-22 1976-06-29 Veb Pentacon Dresden Photo-conductive coating containing Ge, S, and Pb or Sn
US3979271A (en) * 1973-07-23 1976-09-07 Westinghouse Electric Corporation Deposition of solid semiconductor compositions and novel semiconductor materials

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2953529A (en) * 1957-04-01 1960-09-20 Rca Corp Semiconductive radiation-sensitive device
US3105906A (en) * 1959-11-24 1963-10-01 Rca Corp Germanium silicon alloy semiconductor detector for infrared radiation

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3279954A (en) * 1961-06-09 1966-10-18 Rca Corp Thermoelectric device having silicongermanium alloy thermoelement
US3979271A (en) * 1973-07-23 1976-09-07 Westinghouse Electric Corporation Deposition of solid semiconductor compositions and novel semiconductor materials
US3966470A (en) * 1973-08-22 1976-06-29 Veb Pentacon Dresden Photo-conductive coating containing Ge, S, and Pb or Sn

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
"Optical Properties of Amorphous Si-Ge Alloys Prepared by the Glow Discharge Process", A. Onton et al., San Diego Meeting of the American Physical Society, Mar. 21-24, 1977. *
Journal of Non-Crystalline Solids, 13 (1973/74) 55-68, "Photoconductivity and Absorption in Amorphous Si." *
Journal of Non-Crystalline Solids, 3 (1970), 225-270, "Properties of Glow-Discharge Deposited Amorphous Germanium and Silicon." *
Journal of Non-Crystalline Solids, 4 (1970) 272-278, "The Fundamental Absorption of Amorphous Ge, Si and GeSi Alloys." *

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4664998A (en) * 1978-05-04 1987-05-12 Canon Kabushiki Kaisha Electrophotographic image forming member having hydrogenated amorphous photoconductive layer including carbon
US5753936A (en) * 1978-05-04 1998-05-19 Canon Kabushiki Kaisha Image forming member for electrophotography
US4830946A (en) * 1978-05-04 1989-05-16 Canon Kabushiki Kaisha CVD process for forming an image forming member for electrophotography
US4471042A (en) * 1978-05-04 1984-09-11 Canon Kabushiki Kaisha Image-forming member for electrophotography comprising hydrogenated amorphous matrix of silicon and/or germanium
US5573884A (en) * 1978-05-04 1996-11-12 Canon Kabushiki Kaisha Image-forming member for electrophotography
US4745041A (en) * 1978-05-04 1988-05-17 Canon Kabushiki Kaisha CVD process for forming semiconducting film having hydrogenated germanium matrix
US4565731A (en) * 1978-05-04 1986-01-21 Canon Kabushiki Kaisha Image-forming member for electrophotography
US4255686A (en) * 1978-05-19 1981-03-10 Hitachi, Ltd. Storage type photosensor containing silicon and hydrogen
US4340506A (en) * 1978-07-26 1982-07-20 Tdk Electronics Co., Ltd. Photoelectric transfer device
US4360821A (en) * 1978-08-18 1982-11-23 Hitachi, Ltd. Solid-state imaging device
US4397933A (en) * 1978-12-28 1983-08-09 Canon Kabushiki Kaisha Hydrogenated amorphous silicon photoconductive layer
US4877709A (en) * 1979-03-26 1989-10-31 Canon Kabushiki Kaisha Image forming member for electrophotography
US4701394A (en) * 1979-03-26 1987-10-20 Canon Kabushiki Kaisha Image forming member for elecrophotography
US4673628A (en) * 1979-03-26 1987-06-16 Canon Kabushiki Kaisha Image forming member for electrophotography
US4737428A (en) * 1979-03-26 1988-04-12 Canon Kabushiki Kaisha Image forming process for electrophotography
US4365015A (en) * 1979-08-20 1982-12-21 Canon Kabushiki Kaisha Photosensitive member for electrophotography composed of a photoconductive amorphous silicon
EP0039219A1 (en) * 1980-04-25 1981-11-04 Hitachi, Ltd. Light sensitive screen and devices including the same
US4419604A (en) * 1980-04-25 1983-12-06 Hitachi, Ltd. Light sensitive screen
US4489149A (en) * 1980-05-08 1984-12-18 Minolta Camera Kabushiki Kaisha Electrophotographic amorphous silicon member
WO1983002254A1 (en) * 1981-12-31 1983-07-07 Western Electric Co Optical recording media
US4490450A (en) * 1982-03-31 1984-12-25 Canon Kabushiki Kaisha Photoconductive member
US4491626A (en) * 1982-03-31 1985-01-01 Minolta Camera Kabushiki Kaisha Photosensitive member
US4451546A (en) * 1982-03-31 1984-05-29 Minolta Camera Kabushiki Kaisha Photosensitive member
FR2535902A1 (en) * 1982-11-04 1984-05-11 Canon Kk PHOTOCONDUCTIVE ELEMENT
US4843439A (en) * 1985-08-28 1989-06-27 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Tailorable infrared sensing device with strain layer superlattice structure
US4711857A (en) * 1986-08-28 1987-12-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Tailorable infrared sensing device with strain layer superlattice structure

Also Published As

Publication number Publication date
IT1160377B (en) 1987-03-11
AT371949B (en) 1983-08-10
EP0003237A1 (en) 1979-08-08
IT7831082A0 (en) 1978-12-21
EP0003237B1 (en) 1983-05-18
CA1111536A (en) 1981-10-27
JPS5498588A (en) 1979-08-03
DE2862265D1 (en) 1983-07-07
ATA934578A (en) 1982-12-15
JPS5522950B2 (en) 1980-06-19

Similar Documents

Publication Publication Date Title
US4147667A (en) Photoconductor for GaAs laser addressed devices
Reddy et al. Characterisation of CdO thin films deposited by activated reactive evaporation
Moss Lead salt photoconductors
Kruse The emergence of Hg1-xCdxTe as a modern infrared sensitive material
US4113531A (en) Process for fabricating polycrystalline inp-cds solar cells
Yudasaka et al. Indium selenide film formation by the double-source evaporation of indium and selenium
Kazmerski et al. Photoconductivity effects in CuInS2, CuInSe2 and CuInTe2 thin films
US4154631A (en) Equilibrium growth technique for preparing PbSx Se1-x epilayers
GB2038086A (en) Amorphous semiconductor devices
CA1333356C (en) Functional znse:h deposited films
Kawano et al. Effects of substrate temperature on absorption edge and photocurrent in evaporated amorphous SnS2 films
Hauschildt et al. Optically Induced Potential Fluctuations in a‐Si: H Films
US3755002A (en) Method of making photoconductive film
US3794835A (en) Image pickup device
Suda et al. Zn3P2/ITO heterojunction solar cells
US4442446A (en) Sensitized epitaxial infrared detector
Rittner Improved theory of the silicon pn junction solar cell
Sebastian The electrical properties of vacuum-evaporated stoichiometric and non-stoichiometric CdTe thin films for opto-electronic applications
Zogg et al. Epitaxial lead chalcogenide IR sensors on Si for 3-5 and 8-12μm
US4406050A (en) Method for fabricating lead halide sensitized infrared photodiodes
US4328508A (en) III-V Quaternary alloy photodiode
Nemirovsky et al. The cutoff wavelength and minority‐carrier lifetime in implanted n+‐on‐bulk p Hg1− x Cd x Te photodiodes
Neumann et al. Optical properties of amorphous CuInSe2
Caporaletti et al. The low‐temperature thermal expansion of Hg1− xCdxTe alloys
Agnihotri et al. Structural electrical and optical properties of CdSxSe1− x films

Legal Events

Date Code Title Description
AS Assignment

Owner name: IBM INFORMATION PRODUCTS CORPORATION, 55 RAILROAD

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:INTERNATIONAL BUSINESS MACHINES CORPORATION;REEL/FRAME:005678/0098

Effective date: 19910326

Owner name: MORGAN BANK

Free format text: SECURITY INTEREST;ASSIGNOR:IBM INFORMATION PRODUCTS CORPORATION;REEL/FRAME:005678/0062

Effective date: 19910327