US4052209A - Semiconductive and sensitized photoconductive compositions - Google Patents
Semiconductive and sensitized photoconductive compositions Download PDFInfo
- Publication number
- US4052209A US4052209A US05/556,400 US55640075A US4052209A US 4052209 A US4052209 A US 4052209A US 55640075 A US55640075 A US 55640075A US 4052209 A US4052209 A US 4052209A
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- photoconductive
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- polymeric binder
- dye
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Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/30—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0601—Acyclic or carbocyclic compounds
- G03G5/0605—Carbocyclic compounds
- G03G5/0607—Carbocyclic compounds containing at least one non-six-membered ring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0601—Acyclic or carbocyclic compounds
- G03G5/0609—Acyclic or carbocyclic compounds containing oxygen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/12—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/50—Photovoltaic [PV] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/141—Organic polymers or oligomers comprising aliphatic or olefinic chains, e.g. poly N-vinylcarbazol, PVC or PTFE
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/141—Organic polymers or oligomers comprising aliphatic or olefinic chains, e.g. poly N-vinylcarbazol, PVC or PTFE
- H10K85/146—Organic polymers or oligomers comprising aliphatic or olefinic chains, e.g. poly N-vinylcarbazol, PVC or PTFE poly N-vinylcarbazol; Derivatives thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- Semiconductor materials are electronic conductors whose resistivity at room temperature is between 10 -2 and 10 9 ohm-cm and in which the electrical charge carrier concentration increases with temperature increases over some temperature range.
- Important semiconductor materials include silicon, germanium, selenium, cuprous oxide, silicon carbide, lead sulfide, lead telluride, zinc oxide, cadmium sulfide, etc. They are also used in a wide variety of technological areas such as rectifiers, photoconductors, transistors, modulators, detectors, thermistors and solar energy conversion.
- semiconductive materials and especially semiconductive materials whose electronic properties can be varied, are of significant commercial interest.
- Both the photoconductive layer and the receptor layer may be either transparent or opaque to visible radiation, however, if the resultant imaged layer is intended for projection purposes, the final imaged layer must of course be transmissive of visible radiation.
- the semiconductive and photoconductive art has recognized these problems. Many different materials have been suggested as semiconductive additives or sensitizers for photoconductive systems (see U.S. Pat. No. 3,037,861, June 5, 1962), but the sensitizers used to date have not significantly reduced the sensitivity problems of photoconductive systems and the additives have not greatly improved semiconductive materials. Neither the range of sensitivity nor the speed of such sensitized elements has been altered to the extent accomplished in the practice of this invention. Furthermore, with the increased sensitivity of photoconductive elements in the practice of this invention, novel structures and novel utilities can be found for photoconductive elements which allow their use, for example, in xerographic processes, Magne-dynamic and other electrostatic processes.
- binder material there are a variety of different constructions which can be used for photoconductive elements depending upon the particular properties and response required from the element. At a minimum, of course, there must be a binder material. In general, these are organic polymeric materials of high dielectric strength such as polyvinyl toluene, polystyrene, poly-halostyrene and copolymers thereof, polyvinyl toluene and substituted PVT - butadiene copolymers, polyacrylates and copolymers thereof, epoxy resins, polycarbonate resins.
- organic polymeric materials of high dielectric strength such as polyvinyl toluene, polystyrene, poly-halostyrene and copolymers thereof, polyvinyl toluene and substituted PVT - butadiene copolymers, polyacrylates and copolymers thereof, epoxy resins, polycarbonate resins.
- a particularly useful class of binders are the organic photoconductors such as poly-N-vinyl carbazole, polyanthracene polyvinylacenaphthalene, poly 2,9-methylene fluorene polyvinyl ferrocene, polybenzocarbazole, polybenzoanthracene.
- the photoconductive layer(s) must be associated with the improved classes of sensitizing dyes, but the structure of many elements will remain otherwise the same as those conventionally used in the art.
- FIGS. (I-VII) illustrate various physical constructions which are contemplated for the photoconductive elements of the present invention.
- FIG. I shows a photoconductive element comprising a photoconductive layer superposed on a substrate (In this construction, the substrate must have some conductive properties which would enable discharge upon light exposure of the photoconductive layer).
- FIG. II shows a photoconductive element respectively comprising a substrate, conductor layer, and photoconductive layer respectively.
- FIG. III shows a photoconductive element respectively comprising a substrate, photoconductor and sensitizing dye containing layer. This construction differs from that of FIG. II in that the dye and photoconductive materials are separated, the manner of application of the dye layer (e.g., coating with a solution of the dye) is such that the dye does not penetrate into the photoconductive layer.
- FIG. IV shows a photoconductive element respectively comprising a substrate, conductor layer, barrier layer and photoconductive layer.
- the barrier layer provides protection between the photoconductive layer and conductive layer where those layers may be reactive with each other or where reduced conductivity and increased dielectric strength is desired in the element.
- FIG. V shows a photoconductive element respectively comprising a substrate, semi-conductive layer, conductor layer and photoconductive layer.
- This configuration may also have a second semi-conductive layer on the reverse side of the substrate.
- the first semi-conductive layer may act both to increase adhesion and to increase the efficiency of charge dissipation in the photoconductive layer.
- the second semi-conductor layer decreases the likelihood of charges developing on the substrate backside especially in reproductive processes where both sides of the element are charged.
- FIG. VI shows a photoconductive element respectively comprising a piezo/pyroelectric polymer layer, a photoconductor layer, and a conductor layer.
- FIG. VII shows a photoconductive element respectively comprising a substrate, photoconductor layer and a hydro/oleophilic semi-conductor layer. This construction is suitable for use as the element in an electrostatic printing process. In the imaged film, the areas in which the toner powder is fused would act as the ink receiving substrate, resulting in a lithographic plate.
- the photoconductive layers utilized in the practice of this invention are preferably organic, polymeric, polynuclear thermoplastic resins and their copolymers (e.g., poly(N-vinyl carbazole) or a vinyl carbazole/vinyl acetate copolymer) and the sensitizing dyes used in the practice of this invention.
- organic, polymeric, polynuclear thermoplastic resins and their copolymers e.g., poly(N-vinyl carbazole) or a vinyl carbazole/vinyl acetate copolymer
- Other sensitizing dyes known in the art such as those disclosed by German Pat. No.
- 1,068,115 may be used, as well as other additives known to be useful in photoconductive constructions such as film improving agents (e.g., plasticizers, adhesion promoters, hardeners, and other thermoplastics such as epoxy resins and polycarbonates), organic acids to enhance color image formation by oxidation of leuco dyes (e.g., bis(trifluoromethyl-sulfonyl-methane)), photohalogens (e.g., tristribromo-s-triazene), and Lewis acids to aid conduction.
- film improving agents e.g., plasticizers, adhesion promoters, hardeners, and other thermoplastics such as epoxy resins and polycarbonates
- organic acids to enhance color image formation by oxidation of leuco dyes e.g., bis(trifluoromethyl-sulfonyl-methane)
- photohalogens e.g., tristribromo-s-triazene
- Lewis acids to aid
- the conductor layer can essentially be any layer of material with conductive properties such as a metal coating (e.g., Al, Cu, Ag, Cr, etc.), inorganic metal oxide (e.g., iron oxides, indium oxide, stannous oxide), an inorganic salt (e.g., copper iodides), and electroconductive resins (including particulate-filled resins), such as the polyvinylbenzene pyridium chlorides (c.f. Italian Pat. No. 767,082, Issued May 15, 1967 and Italian Pat. No. 801,584, Issued Feb. 1, 1968) and sulfonated polyvinyl toluenes.
- a metal coating e.g., Al, Cu, Ag, Cr, etc.
- inorganic metal oxide e.g., iron oxides, indium oxide, stannous oxide
- an inorganic salt e.g., copper iodides
- electroconductive resins including particulate-filled resins
- the substrate in most constructions can be any support material such as paper, thermoplastic resin (polyesters, acetates, vinylchlorides, polycarbonates, etc.), polymer matrix, etc.
- the substrate may be insulative or conductive, with a high or low dielectric constant depending upon the particular imaging process.
- the dyes useful in the practice of this invention are three or four membered carbon rings or ethylenic groups (i.e., ⁇ C ⁇ C ⁇ ) having at least two quinoid benzene rings bonded thereto, with all remaining ring carbons having valences satisfied as part of a carbonyl moiety.
- quino-, and quinoid benzene refers to a quinoid ring having one exocyclic double bond satisfied by an oxygen ##STR1##
- These quino groups bonded to the three and four membered rings and ethylenic groups may bear substituents no more electron withdrawing than chlorine in positions ortho to the quinoid benzene carbonyl group (i.e., substituents X 1 and X 2 may be independently positioned only as shown below): ##STR2## wherein X 1 and X 2 are groups no more electron withdrawing than chlorine.
- substituents on the quinoid benzene group for example include alkyl and alkoxy (straight or branched, preferably having C 1 - C 20 groups), phenyl, phenoxy, halophenyl, C 1 - C 10 alkyl and alkoxy substituted phenyl, halo-substituted straight and branched alkyl (having no more than one halo atom per carbon atom), amino, iodo, bromo, chloro, carboxyl, carbamyl, and amido groups.
- the substituents can serve to provide stability to the compound by preventing unwanted reduction of the quinoid group and also to improve solubility of the dye (e.g., long chain hydrocarbon groups for better non-polar solvent solubility, and polar groups for better polar solvent solubility).
- the dyes themselves are preferably used in concentrations in normal coating solvents of 0.5 ⁇ 10 -6 moles of dye per mole of photoconductor up to the solubility limit of the dye. When used as a semiconductor additive, whatever concentration of dye in the binder is effective for the purpose intended is the required amount. At a minimum, a concentration of dye which alters the conductive properties of the binder without dye by 20% would be an effective amount.
- ortho substituents It is furthermore generally preferred in the ortho substituents to have no more than 20 carbon atoms and no more than 4 heteroatoms in the substituent group.
- the dyes may alternatively represented by the following formulae: ##STR3## wherein A is a quinoid benzene group, and B is either a quinoid benzene group or an oxygen atom.
- PVK polyvinylcarbazole
- TQCP hexa(t-butyl)triquinocyclopropane
- the coated aluminum was corona charged in the negative mode, imagewise light exposed, and immersed in a liquid developer consisting of a non-polar hydrocarbon medium such as kerosene having dispersed therein pigments of #4852 Zulu Blue 818-026-16 (from Harshaw Chemical Co.)
- a liquid developer consisting of a non-polar hydrocarbon medium such as kerosene having dispersed therein pigments of #4852 Zulu Blue 818-026-16 (from Harshaw Chemical Co.)
- the element was removed after a short period of time and a high quality, high definition positive reading colored image was observed.
- TQCP Hexa(t-butyl)triquinocyclopropane
- 1.0 inch diameter discs are punched out of the photoconductive samples and inserted into the receiving elements of an electrostatic voltmeter such as MK Systems Model 169C "Stati-Tester” which electrostatically charges, allows dark decay, exposes the element to light, and measures the photoresponse and records it on a two-dimensional abscissa-ordinant graph. Both negative and positive charging and dark current measurement time for predetermined periods may be obtained. Illumination is at an intensity of 15 fc for a predetermined period of time.
- Such apparatus provides measures of retained charge at any time in the sequence of physical steps and thus measures all changes in the charge during the process.
- the film was cut into different samples and tested for photoresponse in an electrophotographic mode and provided the following data when negatively corona charged with 100 ma for 10 seconds with a 5 second dark decay time and 15 foot candles/second with a tungsten filament source at 2850° K:
- the composite shows the utility of the construction as an endless belt in an electrophotographic copy apparatus.
- the following procedures were used in making all samples used in these examples.
- the described polymers were dissolven in chlorobenzene to form a 10% by weight solution.
- the described amounts of additives, if any, were thoroughly mixed into the solution which was then spin-coated onto a 4 mil polyester film having a vapor deposited aluminum film thereon.
- the coatings in all cases were about 1.0 mil thick.
- Viii. polymethylmethacrylate, 0.4% hexa-t-butyl triquinocyclopropane, and 0.4% tetraphenyl-p-phenylenediamine.
- Xiii polyvinyltoluene containing 5 ⁇ 10 -4 moles of both hexa-t-butyl triquinocyclopropane and tetraphenyl-p-phenylenediamine.
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Priority Applications (16)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/556,400 US4052209A (en) | 1975-03-07 | 1975-03-07 | Semiconductive and sensitized photoconductive compositions |
ZA761084A ZA761084B (en) | 1975-03-07 | 1976-02-24 | Semiconductive and sensitized photoconductive composition |
AR262426A AR219235A1 (es) | 1975-03-07 | 1976-02-27 | Composicion semiconductora y fotoconductora sensibilizada y un elemento semiconductor y fotoconductor sensibilizado que incorpora a dicha composicion |
CA247,243A CA1074169A (fr) | 1975-03-07 | 1976-03-05 | Substance a proprietes semi-conductrices, a base d'un liant polymerique et d'une matrice contenant des noyaux benzeniques a forme quinoide |
DE2609149A DE2609149C2 (de) | 1975-03-07 | 1976-03-05 | Halbleitende Masse und ihre Verwendung |
GB8977/76A GB1545796A (en) | 1975-03-07 | 1976-03-05 | Photoconductive compositions |
BE164915A BE839263A (fr) | 1975-03-07 | 1976-03-05 | Compositions semi-conductrices et photoconductrices |
FR7606270A FR2303316A1 (fr) | 1975-03-07 | 1976-03-05 | Compositions semi-conductrices et photoconductrices a base de polymere et de colorant quinonique |
BR7601346A BR7601346A (pt) | 1975-03-07 | 1976-03-05 | Composicao semicondutora |
JP51024048A JPS51117039A (en) | 1975-03-07 | 1976-03-05 | Semiconductor composition |
CH280476A CH620697A5 (fr) | 1975-03-07 | 1976-03-05 | |
SE7603029A SE409513B (sv) | 1975-03-07 | 1976-03-05 | Halvledande bindemedelskomposition till anvendning vid fotoledande element |
IT48434/76A IT1057315B (it) | 1975-03-07 | 1976-03-05 | Composizioni semi conduttrici e foto conduttrici sensibilizzate ed oggetti ottenuti con tali composizioni |
SE767608690A SE406513B (sv) | 1975-03-07 | 1976-08-03 | Optiskt filter |
US05/743,171 US4134764A (en) | 1975-03-07 | 1976-11-19 | Semiconductive and sensitized photoconductive compositions |
US05/957,663 US4222902A (en) | 1975-03-07 | 1978-11-03 | Semiconductive and sensitized photoconductive compositions |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/556,400 US4052209A (en) | 1975-03-07 | 1975-03-07 | Semiconductive and sensitized photoconductive compositions |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US05/743,171 Division US4134764A (en) | 1975-03-07 | 1976-11-19 | Semiconductive and sensitized photoconductive compositions |
Publications (1)
Publication Number | Publication Date |
---|---|
US4052209A true US4052209A (en) | 1977-10-04 |
Family
ID=24221194
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US05/556,400 Expired - Lifetime US4052209A (en) | 1975-03-07 | 1975-03-07 | Semiconductive and sensitized photoconductive compositions |
US05/743,171 Expired - Lifetime US4134764A (en) | 1975-03-07 | 1976-11-19 | Semiconductive and sensitized photoconductive compositions |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US05/743,171 Expired - Lifetime US4134764A (en) | 1975-03-07 | 1976-11-19 | Semiconductive and sensitized photoconductive compositions |
Country Status (13)
Country | Link |
---|---|
US (2) | US4052209A (fr) |
JP (1) | JPS51117039A (fr) |
AR (1) | AR219235A1 (fr) |
BE (1) | BE839263A (fr) |
BR (1) | BR7601346A (fr) |
CA (1) | CA1074169A (fr) |
CH (1) | CH620697A5 (fr) |
DE (1) | DE2609149C2 (fr) |
FR (1) | FR2303316A1 (fr) |
GB (1) | GB1545796A (fr) |
IT (1) | IT1057315B (fr) |
SE (1) | SE409513B (fr) |
ZA (1) | ZA761084B (fr) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4133821A (en) * | 1977-03-15 | 1979-01-09 | Wisconsin Alumni Research Foundation | Alkylidenediquinocyclopropanes and Diarylcyclopropenes and method for preparation |
US4205005A (en) * | 1977-08-11 | 1980-05-27 | Minnesota Mining And Manufacturing Company | Anthraquino-cycloalkane dyes |
US4222902A (en) * | 1975-03-07 | 1980-09-16 | Minnesota Mining And Manufacturing Company | Semiconductive and sensitized photoconductive compositions |
US4282297A (en) * | 1978-12-14 | 1981-08-04 | Dennison Manufacturing Company | Charge transfer imaging |
US4448492A (en) * | 1982-12-23 | 1984-05-15 | Minnesota Mining And Manufacturing Company | Cycloalkyl-type isotropic dyes for liquid crystal display devices |
US4511492A (en) * | 1983-10-19 | 1985-04-16 | Uop Inc. | Electrically conducting aromatic azopolymers and method of preparation |
US4585895A (en) * | 1985-02-20 | 1986-04-29 | Xerox Corporation | Processes for the preparation of mixed squaraine compositions |
US4670188A (en) * | 1984-03-02 | 1987-06-02 | Seiko Instruments & Electronics Ltd. | Electrically conductive high molecular resin composition for electrodeposition coating |
US4746756A (en) * | 1985-06-24 | 1988-05-24 | Xerox Corporation | Photoconductive imaging members with novel fluorinated squaraine compounds |
US5284705A (en) * | 1990-09-06 | 1994-02-08 | Garland Floor Co. | Antistatic coating comprising tin-oxide-rich pigments and process and coated substrate |
US20040108501A1 (en) * | 2002-12-09 | 2004-06-10 | Cheung Patrick K. | Self aligned memory element and wordline |
US20050048406A1 (en) * | 2003-08-26 | 2005-03-03 | Eastman Kodak Company | Method of patterning an electroconductive layer on a support |
US9956118B2 (en) | 2014-09-15 | 2018-05-01 | 3M Innovative Properties Company | Personal protective system tool communication adapter |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2908123A1 (de) * | 1978-03-03 | 1979-09-06 | Canon Kk | Bildaufzeichnungsmaterial fuer elektrophotographie |
JPS55127561A (en) * | 1979-03-26 | 1980-10-02 | Canon Inc | Image forming member for electrophotography |
EP0058840B1 (fr) * | 1981-02-23 | 1985-07-03 | Minnesota Mining And Manufacturing Company | Composés donneurs d'électrons et matériaux photoconducteurs transporteurs de charge |
US4367274A (en) * | 1981-02-23 | 1983-01-04 | Minnesota Mining And Manufacturing Company | Sensitized organic electron donor bis-benzocarbazole compounds |
DE3507379A1 (de) * | 1985-03-02 | 1986-11-06 | Basf Ag, 6700 Ludwigshafen | Optisches aufzeichnungsmedium |
US20030228534A1 (en) * | 2002-05-31 | 2003-12-11 | Jiayi Zhu | Organophotoreceptor with a light stabilizer |
EP2180029B1 (fr) * | 2008-10-23 | 2011-07-27 | Novaled AG | Composés de Radialène et leur utilisation |
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US3158475A (en) * | 1960-03-31 | 1964-11-24 | Gevaert Photo Prod Nv | Electrophotographic material |
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US3485624A (en) * | 1966-06-07 | 1969-12-23 | Eastman Kodak Co | Photoconductive properties of poly-n-vinyl carbazole |
US3617270A (en) * | 1968-06-20 | 1971-11-02 | Agfa Gevaert Ag | Sensitization of an inorganic photoconductive layer with 1, 3- and 1, 2-squario acid methine dyes |
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-
1975
- 1975-03-07 US US05/556,400 patent/US4052209A/en not_active Expired - Lifetime
-
1976
- 1976-02-24 ZA ZA761084A patent/ZA761084B/xx unknown
- 1976-02-27 AR AR262426A patent/AR219235A1/es active
- 1976-03-05 SE SE7603029A patent/SE409513B/xx not_active IP Right Cessation
- 1976-03-05 IT IT48434/76A patent/IT1057315B/it active
- 1976-03-05 DE DE2609149A patent/DE2609149C2/de not_active Expired
- 1976-03-05 CA CA247,243A patent/CA1074169A/fr not_active Expired
- 1976-03-05 BE BE164915A patent/BE839263A/fr not_active IP Right Cessation
- 1976-03-05 GB GB8977/76A patent/GB1545796A/en not_active Expired
- 1976-03-05 CH CH280476A patent/CH620697A5/de not_active IP Right Cessation
- 1976-03-05 FR FR7606270A patent/FR2303316A1/fr active Granted
- 1976-03-05 BR BR7601346A patent/BR7601346A/pt unknown
- 1976-03-05 JP JP51024048A patent/JPS51117039A/ja active Granted
- 1976-11-19 US US05/743,171 patent/US4134764A/en not_active Expired - Lifetime
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US3158475A (en) * | 1960-03-31 | 1964-11-24 | Gevaert Photo Prod Nv | Electrophotographic material |
US3408185A (en) * | 1965-01-18 | 1968-10-29 | Xerox Corp | Electrophotographic materials and method employing photoconductive resinous charge transfer complexes |
US3485624A (en) * | 1966-06-07 | 1969-12-23 | Eastman Kodak Co | Photoconductive properties of poly-n-vinyl carbazole |
US3617270A (en) * | 1968-06-20 | 1971-11-02 | Agfa Gevaert Ag | Sensitization of an inorganic photoconductive layer with 1, 3- and 1, 2-squario acid methine dyes |
US3764315A (en) * | 1972-07-24 | 1973-10-09 | Xerox Corp | Ambipolar electrophotographic plate |
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Cited By (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4222902A (en) * | 1975-03-07 | 1980-09-16 | Minnesota Mining And Manufacturing Company | Semiconductive and sensitized photoconductive compositions |
US4133821A (en) * | 1977-03-15 | 1979-01-09 | Wisconsin Alumni Research Foundation | Alkylidenediquinocyclopropanes and Diarylcyclopropenes and method for preparation |
US4205005A (en) * | 1977-08-11 | 1980-05-27 | Minnesota Mining And Manufacturing Company | Anthraquino-cycloalkane dyes |
US4282297A (en) * | 1978-12-14 | 1981-08-04 | Dennison Manufacturing Company | Charge transfer imaging |
US4448492A (en) * | 1982-12-23 | 1984-05-15 | Minnesota Mining And Manufacturing Company | Cycloalkyl-type isotropic dyes for liquid crystal display devices |
EP0115136A2 (fr) * | 1982-12-23 | 1984-08-08 | Minnesota Mining And Manufacturing Company | Colorants isotropiques du type cycloalkyle pour dispositifs d'affichage à cristaux liquides |
EP0115136A3 (fr) * | 1982-12-23 | 1986-02-12 | Minnesota Mining And Manufacturing Company | Colorants isotropiques du type cycloalkyle pour dispositifs d'affichage à cristaux liquides |
US4511492A (en) * | 1983-10-19 | 1985-04-16 | Uop Inc. | Electrically conducting aromatic azopolymers and method of preparation |
US4670188A (en) * | 1984-03-02 | 1987-06-02 | Seiko Instruments & Electronics Ltd. | Electrically conductive high molecular resin composition for electrodeposition coating |
US4585895A (en) * | 1985-02-20 | 1986-04-29 | Xerox Corporation | Processes for the preparation of mixed squaraine compositions |
US4746756A (en) * | 1985-06-24 | 1988-05-24 | Xerox Corporation | Photoconductive imaging members with novel fluorinated squaraine compounds |
US5284705A (en) * | 1990-09-06 | 1994-02-08 | Garland Floor Co. | Antistatic coating comprising tin-oxide-rich pigments and process and coated substrate |
US20040108501A1 (en) * | 2002-12-09 | 2004-06-10 | Cheung Patrick K. | Self aligned memory element and wordline |
WO2004053930A2 (fr) * | 2002-12-09 | 2004-06-24 | Advanced Micro Devices, Inc. | Element memoire et ligne de mots a alignement automatique |
WO2004053930A3 (fr) * | 2002-12-09 | 2004-08-12 | Advanced Micro Devices Inc | Element memoire et ligne de mots a alignement automatique |
US7220985B2 (en) | 2002-12-09 | 2007-05-22 | Spansion, Llc | Self aligned memory element and wordline |
US20070224724A1 (en) * | 2002-12-09 | 2007-09-27 | Spansion Llc | Self aligned memory element and wordline |
US7645632B2 (en) | 2002-12-09 | 2010-01-12 | Spansion Llc | Self aligned memory element and wordline |
US20050048406A1 (en) * | 2003-08-26 | 2005-03-03 | Eastman Kodak Company | Method of patterning an electroconductive layer on a support |
WO2005022968A1 (fr) * | 2003-08-26 | 2005-03-10 | Eastman Kodak Company | Formation de motifs sur une couche electroconductrice disposee sur un support |
US6872500B2 (en) | 2003-08-26 | 2005-03-29 | Eastman Kodak Company | Method of patterning an electroconductive layer on a support |
US9956118B2 (en) | 2014-09-15 | 2018-05-01 | 3M Innovative Properties Company | Personal protective system tool communication adapter |
US11090192B2 (en) | 2014-09-15 | 2021-08-17 | 3M Innovative Properties Company | Personal protective system tool communication adapter |
Also Published As
Publication number | Publication date |
---|---|
GB1545796A (en) | 1979-05-16 |
SE7603029L (sv) | 1976-09-08 |
FR2303316A1 (fr) | 1976-10-01 |
BR7601346A (pt) | 1976-09-14 |
ZA761084B (en) | 1977-02-23 |
JPS51117039A (en) | 1976-10-14 |
DE2609149A1 (de) | 1976-09-09 |
IT1057315B (it) | 1982-03-10 |
FR2303316B1 (fr) | 1981-04-30 |
BE839263A (fr) | 1976-09-06 |
DE2609149C2 (de) | 1987-03-26 |
CH620697A5 (fr) | 1980-12-15 |
JPS6132666B2 (fr) | 1986-07-28 |
CA1074169A (fr) | 1980-03-25 |
SE409513B (sv) | 1979-08-20 |
AR219235A1 (es) | 1980-07-31 |
US4134764A (en) | 1979-01-16 |
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