US3867192A - Electron beam recording - Google Patents

Electron beam recording Download PDF

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US3867192A
US3867192A US335671A US33567173A US3867192A US 3867192 A US3867192 A US 3867192A US 335671 A US335671 A US 335671A US 33567173 A US33567173 A US 33567173A US 3867192 A US3867192 A US 3867192A
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electron beam
compound
group
electron
dye precursor
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Theofiel Eveline Hermans
Gerard Albert Delzenne
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Agfa Gevaert NV
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Agfa Gevaert NV
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/733Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds with macromolecular compounds as photosensitive substances, e.g. photochromic

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  • the present invention relates to recording media suited for the recording of information in the form of a modulated electron beam.
  • Electron sensitive layers wherein following exposure to electron beam radiation a visible color change can be developed, are known already, e.g. from the US. Pat. No. 3,331,076 and 3,370,981.
  • a'recording medium which comprises a substrate, preferably an electrically conductive substrate, on'which is super-imposed a layer containing an oil-soluble amino azo indicator dye in basic form and a highly halogenated polymeric binder.
  • Highly halogenated polymers are preferred as electron beam sensitive substances for they act as a relatively nonvolatile source of hydrochloric acid when struck by high energy electrons and do not liberate such acid under visible light conditions.
  • a disadvantage associated with said recording medium is in the fact that the amino azo indicator dyes are inherently coloured. which makes them unsuited for producing images with a colourless image background.
  • a still further object of the present invention is to provide a process for producing a visible record or image by means of a modulated electron beam.
  • an electron beamsensitive recording material that has a practically negligible sensitivity to ultra-violet radiation and visible light, said material comprising:
  • A at least one dye precursor compound, which is capable of forming a dye when being in working relationship with an electron beam-exposed compound of the group cited under (B), and
  • halogen-containing polymer undergoing dehy-v drohalogenation on electron beam impact, and/or an organic compound containing one or two halogen atoms linked to a same carbon atom, which is further linked to at least one electron-withdrawing group. and/or an organic compound that contains at least one non-halogencarrying carbon atom bound to at least one hydrogen atom and at least two electronwithdrawing groups, and/or a polyhalogenated aromatic hydroxy compound.
  • a monovalent aromatic group e.g., a phenyl group and a -OCOR group in which R is an organic group
  • a suitable polyhalogenated aromatic hydroxy compound is e.g. 4,4-dihydroxy-3,3',5,5- tetrabromodiphenyl-2,2-propane.
  • the coating mixture contains the compounds (A) and (B) in a 1:2 molar ratio.
  • the coating is effected in such a way that 025g of compound (A) are present per length (A) in nm, in the range of 330 to 680 nm is represented in the accompanying drawing.
  • the emitted photon energy ofthat lamp at a distance of 15 cm from the centre of the lamp is approximately 10 erg per sq.cm.
  • the thus exposed recording medium does not show in the visible light range (400 nm 700 nm) a spectral density increase of more than 0.2 it is particularly useful when it possesses a sufficient sensitivity to be visibly changed by electron beam impact.
  • Recording materials having an already very useful electron beam-sensitivity are capable of yielding a visible mark with an optical density ofat least 0.5 when struck by an electron beam that is accelerated with a potential difference of 20 kV and strikes the recording layer with a charge of l.l0 -Coulomb per sq.cm.
  • Preferred colorless dye precursor compounds for use according t o the present invention are spiropyran compounds containing at least one pyran ring having in the orthoand meta-position to the oxygen atom an ad jacent benzo, or naphtho ring or other higher aromatic polycyclic condensed ring system including these condensed rings or ring systems in substituted form, e.g. an
  • anthraccno or a phenanthreno ring system as is present e.g. in a spirodibenzopyran, a spirodinaphtopyran, a spirobenzonaphthopyran, a 1.3.3 trimethylindolinobenzospiropyran, a 1,3 .3- trimethylindolinonaphthospiropyran or such spiropyrans containing condensed aromatic nuclei of the anthracene or phenanthrene type.
  • spiropyrans the pyran rings, the condensed benzo rings, the condensed higher aromatic rings as CH CONHf group, an acyl group, eg acetyl, halogen, nitro, hydroxy, alkoxy, ar'yloxy or a substituent linking the carbon atoms in 3,3-pos'ition in the spiropyran system together e.g. a (CH ),,-chain wherein n is 2 or 3.
  • acyl group e.g acetyl, halogen, nitro, hydroxy, alkoxy, ar'yloxy or a substituent linking the carbon atoms in 3,3-pos'ition in the spiropyran system together e.g. a (CH ),,-chain wherein n is 2 or 3.
  • each of R, R R,, R R R and R' represents hydrogen, an aliphatic group including a substituted aliphatic group e.g. a-(C C20) alkyl group including such an alkyl group in substituted form, more particularly a methyl, ethyl, propyl, amyl or hexadecyl groupor halogenated alkyl group, an acyl group e.g. acetyl, halogen, nitro, hydroxy, an alkoxy or aryloxy group, a phenyl group or a-substituted phenyl group, piperidyl, an alkylene ester group e.g. a CH COOC H group, an al kylene carboxyl group e.g. a CH COOH group, an alkylene carbonamide group or such a group in which the carbonamide group is substitutedeg. a
  • R and R together represent a (CH chain wherein n 2, or 3 to link the carbon atoms in the'3 and 3' positions together.
  • Preferred spiropyran compounds are spirodinaphtho- 45 pyrans and spirobenzonaphthopyrans including such compounds wherein the naphthoand/or benzo ring(s) N is (are) substituted.
  • a g R' An illustrativelist of particularly useful spiropyran 3 compounds is given in the following Table 1.
  • the pyrylium salt formed is separated by suction, washed with ethanol and thereupon brought into suspension in 300 ml of ethanol.
  • the crystalline product obtained is separated by suetion, washed with water and dried.
  • spiropyran compound is recrystallized from 600 ml of benzene and again separated and dried under reduced pressure at 5()-6(lC.
  • R represents an'organic group, e.g. a saturated or unsaturated aliphatic group e.g. an alkyl group including a substituted alkyl group or an aryl group including a substituted aryl group, or represents together with R the necessary atoms to close a homocyclic ring, e.g. a cyclohexylen-Z-one ring,
  • R represents hydrogen, a lower alkyl group e.g. methyl, a substituted lower alkyl group e.g. benzyl, a phenyl group including a substituted phenyl group, or phenyloxy,
  • R having the significance as defined above,
  • Z represents the necessary atoms to close a homocyclic nucleus including a substituted homocyclic nucleus, e.g. a benzene or a naphthalene nucleus including a substituted benzene or naphthalene nucleus,
  • R represents a lower alkyl (C -C group, and n is 1 or 2.
  • Table 2 contains an illustrative list of compounds according to the above general formula (I) with their melting point.
  • the compounds of general formula (I) may be prcrine concentration ranges preferably from about 20 to pared e.g. according to: 55 percent, more preferably from about 35 to about 55 Heilbron and Whitworth, J. Chem. Soc. 123, 243 percent by weight of the polymer.
  • substances suitable for acid formation comprises or-
  • a suitable compound according to the general forganic compounds containing one or two halogen atoms mula (ll) has the following structure: e.g. chlorine, bromine or iodine linked to a same carbon atom that is further linked to at least one electronwithdrawing group e.g.
  • reaction mixture is kept at room teml @-CO-?H-CO-NH-@ 1 5 perature for 24 h.
  • the dark green solution obtained is 4 Cl poured into 200 ml of water. A sticky green product separates. The supernatant water layer is removed and the residue treated with 50 ml of methanol so that the residue solidifies. The solid obtained is pulverised and washed again with 50 ml of methanol.
  • a first preferred class of electron beam-sensitive compounds (B) are highly halogenated polymers that Br liberate hydrogen halide upon electron bombardment.
  • the molecular weight is therefore preferably above 1000 and more preferably above 10,000.
  • Preferred polymers contain in addition to hydrogen at least 25 percent by weight of labile halogen selected an, from the group of chlorine and bromine.
  • the halogenated polymers are preferably soluble in fairly highly volatile organic solvents e.g. acetone, Z-butanone, methyl ethyl ketone and tetrahydrofuran.
  • organic solvents e.g. acetone, Z-butanone, methyl ethyl ketone and tetrahydrofuran.
  • monomers such as vinylidene chloride, and vinyl chloride, and ethylenically un-
  • the preparation of compound 1 is given in detail hereinafter.
  • Preferred vinylidene chloride polymers have a chlo- Melting point: 123C. rine content ranging from about 25 to about 73 percent
  • a third preferred class of electron beam-sensitive by weight the chlo- 7 compounds (B) that are capable of producing reactive substances suitable for acid formation comprises organic compounds that contain at least one non-halogen-carrying carbon atom bound to at least one hydrogen atom and at least two electron-withdrawing groups of which the groups so -C;N, 5N5, and -O-CO-R in which R is an organic group e.g. an alkyl, an alkenyl, an aryl or a heterocyclic group are representatives.
  • each of X, Y and Z represents an acyl radicaL'eg, a carboxylic acid or sulphonic acid acyl radical, a cyano group, a nitro group, an 'azido group, an ester group, a carbonyl alkoxy group, a carbamyl group inwherein R represents an alkyl radical including a subs'tituted alkyl radical, an aryl radical including a substituted aryl radical or a heterocyclic radical including a substituted heterocyclic radical.
  • Compound 5 is prepared e.g. according to Ber. 56B, 1380.
  • Compound 6 is prepared e.g. by oxidation with hydrogen peroxide of compound 1 described above.
  • Compound 7 is prepared. e.g. according to Ber. 47, 3334.
  • Compound 8 is prepared e.g. according to Ber. 47, 1439.
  • the recording medium may be formed as a supported layer or self-supporting film-or sheet.
  • the recording media of this invention may be prepared by mixing the dye precursor compound with the electron-beam sensitive compound and applying that mixture to a suitable support or coating base.
  • the electron beam-sensitive coating is preferably deposited from a solution as a film on a support it may be applied as a dispersion having one of the components in dispersed state in a binder solution containing the other component in dissolved form or containing both the components intimately mixed as the dispersed phase.
  • both the dye precursor compound and electron beam-sensitive substance are present in mixed form in solid grains or liquid droplets dispersed in a hydrophilic binder such as a hydrophilic colloid e.g. gelatin.
  • each mole of dye precursor compound preferably at least 1 to about 1000 acid equivalents of the electron beam-sensitive compound are used.
  • the recording element composition may contain other ingredients e.g. substances that act as fog inhibitor and substances that improve the electron beamsensitivity and increase the optical density.
  • additives improve e.g. the mechanical strength or control the coating viscosity, elasticity or gloss of the recording element.
  • anti-foggants such as triaryl compounds of group V elements e.g. triphenylstibine and sterically hindered phenols e.g. 2,6 di-tert- .butyl-p-cresol and other reducing agents or compounds accepting atmospheric oxygen.
  • Triphenylstibine and analogous compounds for the purpose of fog inhibition in a photoradical recording compound 4 system based on dye salt formation aredescribed in the United Kingdom Pat. No. 1,071,104.
  • That layer preferably is 1 pm to 50 ,um thick in dried state.
  • the support if any, is preferably electrically conductive or contains a subbing layer or interlayer with relatively high electrical conductivity.
  • Suitable supports are e.g. those used in electrophotographic materials.
  • Suitable electro-conductive plates or sheets serving as support have preferably an electrical resistivity at least times as small as that of the recording layer. Supports whose surface resistance is not higher than 10 ohm per sq. are preferred.
  • Suitable supports are conductive plates, e.g. plates of metals such as aluminium, zinc, copper, tin, iron, or lead.
  • Too highly insulating supports can be provided with a conductive subbing layer or interlayer.
  • Suitable electro-conductive interlayers for insulating supports are, e.g., vacuum-coated metal and conductive metal compound (metal oxide: or metal salt) layers such as silver, tin, aluminium, titanium dioxide and copper iodide conductive layers, transparent conductive polymer layers, e.g. applied from polymers containing quaternized nitrogen atoms, such as those described in the United Kingdom Pat. No. 950,960, or layers containing conductive particles, e.g. carbon black and metal particles dispersed ina binder.
  • the binder used for said particles has a resistivity preferably lower than 10 ohm.cm.
  • a suitable: binder for that purpose is gelatin.
  • Transparent electron beam-recording materials are produced by applying the dye-forming compounds together with a suitable binder (if necessary) from a clear solution to a conductive transparent base or a transparent insulating base coated with an electroconductive transparent interlayer.
  • resin sheets having an optical density of not more than 0.10 are preferred, e.g., a sheet made of polyethylene terephthalate or cellulose triacetate.
  • the conductive interlayer preferably consists of a metal coating, e.g., a vacuum-coated aluminium layer having an optical density of not more than 0.30 or of a conductive transparent polymer layer containing an organic polyionic polymer, e.g. a polymer containing quatcrnized nitrogen atoms such as a quatcrnized polyethyleneimine.
  • Paper sheets that have an insufficient electrical conductivity are coated or impregnated with substances enhancing their conductivity, e.g. by means of a conductive overcoat such as a metal sheet laminated thereto.
  • hygroscopic compounds and antistatic agents as described, e.g., in the United Kingdom Pat. No. 964,877, and antistatic agents of polyionic type, e.g. CALGON CONDUC- TlVE POLYMER 261 of Calgon Corporation, Inc., Pittsburgh, Pa., U.S.A., provided as a solution containing 39.1% by weight of active conductive solids, on the basis ofa conductive polymer having recurring units of the following type:
  • the applied paper sheets are preferably impermeabilized to organic solvents, e.g. by means of a watensoluble colloid or by strongly hydrating the cellulose fibers such as in glassine paper.
  • halogen-containing electron beamsensitive polymers are used that serve as binding agent for the dye precursor compound.
  • Such a layer contains preferably from 0.01 to 0.1% by weight of dye precursor compound.
  • the amount of dye precursor compound per sq.m is preferably in the range of 0.2 g to 2 g per sq.m.
  • a binding agent is used to form a sufficiently strong layer or sheet embedding these compounds in working relationship with the dye precursor compoun d(s).
  • said low molecular weight or monomeric compounds are used in excess with respect to the dye precursor compounds e.g. in a 2:1 to 20:1 molar ratio.
  • Additional films or coatings may be provided on the electron beam-sensitive element to protect it from abrasion provided they are relatively transmissive to the electron beam.
  • the electron-beam-sensitive layer is self-supporting it has not to contain a conductive backing layer when during the electron beam exposure it is held in electroconductive contact with an electrically conductive element e.g. a metal plate or roller that is grounded or kept at a different potential with respect to the electron beam.
  • an electrically conductive element e.g. a metal plate or roller that is grounded or kept at a different potential with respect to the electron beam.
  • the temperature and duration of heating can vary. In general, lower heating temperatures require longer heating times, and vice versa, in order to develop or intensify an image pattern. Heating times and temperatures are dependent upon the degree of image intensification desired or necessary. Usually temperatures below 200C and heating times no longer than 5 minutes are employed.
  • the intensity of these beams can be modulated by means well known to those skilled in the art. Since the generation and control of beams of high energy is accomplished by apparatus and methods which do not form a part of the present invention and which are well known to those of ordinary skill in the art, no detailed explanation thereof is given herein.
  • the particular type of high energy beam employed in any given instance depends, of course, upon the sensitivity and response associated with the given recording medium and upon the recording conditions.
  • the type of information stored can vary widely. For example sound track and video signals and facsimile signals can be recorded.
  • the recording process of the present invention is not limited by the information to be stored.
  • Information of various kind can be used as input for modulating an electrical signal which occasionally is obtained by means of one or more transducers.
  • Example 1 A solution was prepared having the following composition:
  • the electrical resistance of the coating was l X l Q/sq.cm at a relative humidity of 50%.
  • the electron beamsensitive coating containing the spiropyran compound was dried at 60C for 2 h.
  • the electron beam had an accelerating potential of 15 kV and a resulting target current of about 40 ,uA.
  • the electron beam was focused till forming a circular cross-sectional diameter of about 1 m in the target region.
  • the beam scanned a 0.5 mm line in a period of 5 ms.
  • the pressure maintained in the apparatus was below 10' mm Hg.
  • the scanned portions of the recording layer could be detected visually by inspection with an optical microscope and were seen as separate blue lines.
  • Example 3 A solution was prepared having the following composition:
  • the exposure to ultra-violet radiation was effected as spiropyran compound number I of Table l 20 mg electron beam-sensitive compound number 2 of Table 4 200 mg methylene chloride 5 ml 10% solution in methylene chloride of polystyrene 5 ml
  • the coating of said solution proceeded in the same way as described in Example 1 on the same support.
  • the electron beam exposure was effected with an electron beam having an accelerating potential of 20 kV and striking the recording target with a charge of 1.5 X 10 C/sq.cm (Coulomb per sq. cm).
  • the colored marks produced 9n the recording layer had an optical density measured b ehind green filter (transmission in the 500 to 600 nm wavelength range) of 0.4.
  • Example 5 Example 4 was repeated with the difference. how ever, that instead of. the electron beam-sensitive compound number'6 of Table 4. compound number 2 of Table 3 was used.
  • the colored marks produced with the electron are the colored marks produced with the electron.
  • Example 8 Example 4 was repeated with the proviso, however, that as electron beam-sensitive compound, compound number 8 of Table 4 was used and the polystyrene spiropyran compound number 'l of Table l as acid-producing compound Br CH Br I 3 -s-q-dl Br 5 r methylene chloride Thercoating of said solution was carried out as described in Example 1.
  • the electron beam exposure was effected with an electron beam having an accelerating potential of kV striking the recording target with a charge of 1.5 X 10. C/sq.cm.
  • the coloured marks produced in the recording layer had an optical density measured behind green filter (transmission in the 500 to 600 nm wavelength range) Analogous results were obtained by replacing the poly-N-vinylcarbazole by polystyrene and the polyhalogenated phenol by the electron beam-sensitive compound number 9 of Table 4.
  • Example 10 A solution was prepared having the following compositionz spiropyran compound number of Table l as electron beam-sensitive compound Br CH Br i 5 HO- Q -C- -OH Br 5 l3 methylene chloride lO polymethyl methacrylate solution in methylene chloride a styryl dye having the following structural formula The coating of said solution was carried out as described in Example 1.
  • the electron beam exposure was effected with an electron beam having an accelerating potential of 20 kV striking the recording target with a charge of 5.4 l0 C/sq.cm.
  • the colored marks produced in the recording layer had an optical density measured behind blue filter (transmission in the 400-500 nm wavelength range) of 0.54.
  • Example 11 A solution was prepared having the following com posltionz spiropyran compound number 4 of Table l 20 mg Michlers ketone 5 mg copolymer of vinyl chloride and vinylidene chloride (SO/) mg methylene chloride 10 ml The solution was knife-coated (wet coating thickness 0.127 mm) on a support as described in Example 1.
  • Example 2 The exposure to ultra-violet radiation carried out as described in Example 1 yielded an overall light blue coloration (spectral density 0.02).
  • the electron beam exposure was the same as de scribed in Example 4.
  • the electron beam exposure was effected with an electron beam having an accelerating potential of 20 kV striking the recording target with a charge of 5.10 C/sq.cm, 1
  • the colored marks produced in the recording layer had an optical density measured behind green filter (transmission in the 500-600 nm wavelength range) of 0.55.
  • An electron beam-sensitive recording material which comprises an electricallyconductive substrate and superposed thereon a layer that has a sensitivity to ultra-violet radiation not high enough to provide an optical density result in the visible spectrum range of more than 0.2 when tested under the standard test con ditions described in the specification, said layer comprising:
  • Z represents the necessary atoms to close a benzene or naphthalene nucleus
  • R represents a C -C alkyl group
  • n 1 or 2
  • An electron beam-sensitive recording material according to claim 1, wherein the said substrate has a surface resistance not lower than l X IOQ/sqcm.
  • An electron beam-sensitive recording material wherein the electron beam-sensitive compounds are used with respect to the dye precursor compound in a molar ratio of 2:1 to 20:1.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
US335671A 1972-02-29 1973-02-26 Electron beam recording Expired - Lifetime US3867192A (en)

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GB939872A GB1422157A (en) 1972-02-29 1972-02-29 Electron beam recording material

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JP (1) JPS48100139A (enrdf_load_stackoverflow)
BE (1) BE795986A (enrdf_load_stackoverflow)
DE (1) DE2308529A1 (enrdf_load_stackoverflow)
FR (1) FR2174050B1 (enrdf_load_stackoverflow)
GB (1) GB1422157A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1987002481A1 (en) * 1985-10-16 1987-04-23 Gaf Corporation Reduction of deflection errors in e-beam recording
US4913948A (en) * 1988-04-11 1990-04-03 Director-General Of The Agency Of Industrial Science And Technology Optical recording medium
US6677586B1 (en) * 2002-08-27 2004-01-13 Kla -Tencor Technologies Corporation Methods and apparatus for electron beam inspection of samples
CN107501117A (zh) * 2017-08-22 2017-12-22 三峡大学 一种含羰基的丙烯酰氧基酰胺类衍生物及其制备方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3331077A (en) * 1964-12-28 1967-07-11 Minnesota Mining & Mfg Method and medium for electron beam recording
US3331076A (en) * 1964-12-28 1967-07-11 Minnesota Mining & Mfg Method and medium for electron beam recording
US3370981A (en) * 1963-09-23 1968-02-27 Minnesota Mining & Mfg Electron beam recording medium with amino-azo indicator and halogenated polymer coating
US3425867A (en) * 1963-09-23 1969-02-04 Minnesota Mining & Mfg Electron beam recording medium with acid sensitive indicator and halogenated polymer coating
US3467951A (en) * 1964-03-18 1969-09-16 Minnesota Mining & Mfg Electron beam recording and readout process for information storage and retrieval
US3761942A (en) * 1971-07-28 1973-09-25 Ibm Low energy thermochromic image recording device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3609093A (en) * 1968-09-11 1971-09-28 Larry A Harrah Photochromic radiation dosimeter
BE787339A (nl) * 1971-09-14 1973-02-09 Agfa Gevaert Nv Fotografische registratie en reproductie van informatie

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3370981A (en) * 1963-09-23 1968-02-27 Minnesota Mining & Mfg Electron beam recording medium with amino-azo indicator and halogenated polymer coating
US3425867A (en) * 1963-09-23 1969-02-04 Minnesota Mining & Mfg Electron beam recording medium with acid sensitive indicator and halogenated polymer coating
US3467951A (en) * 1964-03-18 1969-09-16 Minnesota Mining & Mfg Electron beam recording and readout process for information storage and retrieval
US3331077A (en) * 1964-12-28 1967-07-11 Minnesota Mining & Mfg Method and medium for electron beam recording
US3331076A (en) * 1964-12-28 1967-07-11 Minnesota Mining & Mfg Method and medium for electron beam recording
US3761942A (en) * 1971-07-28 1973-09-25 Ibm Low energy thermochromic image recording device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1987002481A1 (en) * 1985-10-16 1987-04-23 Gaf Corporation Reduction of deflection errors in e-beam recording
US4668609A (en) * 1985-10-16 1987-05-26 Gaf Corporation Reduction of deflection errors in E-beam recording
US4913948A (en) * 1988-04-11 1990-04-03 Director-General Of The Agency Of Industrial Science And Technology Optical recording medium
US6677586B1 (en) * 2002-08-27 2004-01-13 Kla -Tencor Technologies Corporation Methods and apparatus for electron beam inspection of samples
CN107501117A (zh) * 2017-08-22 2017-12-22 三峡大学 一种含羰基的丙烯酰氧基酰胺类衍生物及其制备方法

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FR2174050A1 (enrdf_load_stackoverflow) 1973-10-12
FR2174050B1 (enrdf_load_stackoverflow) 1977-04-22
DE2308529A1 (de) 1973-09-06
BE795986A (nl) 1973-08-27
JPS48100139A (enrdf_load_stackoverflow) 1973-12-18
GB1422157A (en) 1976-01-21

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