US3864126A - Organic photoconductor with carboxy group containing fluorene or fluorore - Google Patents
Organic photoconductor with carboxy group containing fluorene or fluorore Download PDFInfo
- Publication number
- US3864126A US3864126A US431730A US43173074A US3864126A US 3864126 A US3864126 A US 3864126A US 431730 A US431730 A US 431730A US 43173074 A US43173074 A US 43173074A US 3864126 A US3864126 A US 3864126A
- Authority
- US
- United States
- Prior art keywords
- fluorenone
- carboxylic acid
- compounds
- mol
- vinylcarbazole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 title description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 title description 3
- 150000001875 compounds Chemical class 0.000 claims abstract description 42
- 239000000463 material Substances 0.000 claims abstract description 32
- 230000001235 sensitizing effect Effects 0.000 claims description 8
- 125000003545 alkoxy group Chemical group 0.000 abstract description 7
- 125000000217 alkyl group Chemical group 0.000 abstract description 7
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 7
- 229910052760 oxygen Inorganic materials 0.000 abstract description 6
- CUONGYYJJVDODC-UHFFFAOYSA-N malononitrile Chemical group N#CCC#N CUONGYYJJVDODC-UHFFFAOYSA-N 0.000 abstract description 5
- 125000002252 acyl group Chemical group 0.000 abstract description 4
- 125000003118 aryl group Chemical group 0.000 abstract description 4
- 125000004093 cyano group Chemical group *C#N 0.000 abstract description 4
- 229910052736 halogen Inorganic materials 0.000 abstract description 4
- 150000002367 halogens Chemical class 0.000 abstract description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract description 4
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 abstract description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 3
- 125000003282 alkyl amino group Chemical group 0.000 abstract description 3
- 125000001691 aryl alkyl amino group Chemical group 0.000 abstract description 3
- 125000003710 aryl alkyl group Chemical group 0.000 abstract description 3
- 125000002102 aryl alkyloxo group Chemical group 0.000 abstract description 3
- 125000001769 aryl amino group Chemical group 0.000 abstract description 3
- 125000004104 aryloxy group Chemical group 0.000 abstract description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 3
- 239000001257 hydrogen Substances 0.000 abstract description 3
- 239000001301 oxygen Substances 0.000 abstract description 3
- -1 chlorobutyl ester Chemical class 0.000 description 18
- 239000002904 solvent Substances 0.000 description 12
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 10
- 239000002253 acid Substances 0.000 description 9
- 229920001577 copolymer Polymers 0.000 description 7
- 238000000921 elemental analysis Methods 0.000 description 7
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
- VHQGURIJMFPBKS-UHFFFAOYSA-N 2,4,7-trinitrofluoren-9-one Chemical compound [O-][N+](=O)C1=CC([N+]([O-])=O)=C2C3=CC=C([N+](=O)[O-])C=C3C(=O)C2=C1 VHQGURIJMFPBKS-UHFFFAOYSA-N 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 5
- 150000001408 amides Chemical class 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- HLZKNKRTKFSKGZ-UHFFFAOYSA-N tetradecan-1-ol Chemical compound CCCCCCCCCCCCCCO HLZKNKRTKFSKGZ-UHFFFAOYSA-N 0.000 description 4
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- TUTWLYPCGCUWQI-UHFFFAOYSA-N decanamide Chemical compound CCCCCCCCCC(N)=O TUTWLYPCGCUWQI-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 229920006267 polyester film Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical class C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 2
- FKNIDKXOANSRCS-UHFFFAOYSA-N 2,3,4-trinitrofluoren-1-one Chemical compound C1=CC=C2C3=C([N+](=O)[O-])C([N+]([O-])=O)=C([N+]([O-])=O)C(=O)C3=CC2=C1 FKNIDKXOANSRCS-UHFFFAOYSA-N 0.000 description 2
- HDVGAFBXTXDYIB-UHFFFAOYSA-N 2,7-dinitrofluoren-9-one Chemical compound C1=C([N+]([O-])=O)C=C2C(=O)C3=CC([N+](=O)[O-])=CC=C3C2=C1 HDVGAFBXTXDYIB-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000007859 condensation product Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229940043348 myristyl alcohol Drugs 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 150000004961 triphenylmethanes Chemical class 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- TUBQDCKAWGHZPF-UHFFFAOYSA-N 1,3-benzothiazol-2-ylsulfanylmethyl thiocyanate Chemical compound C1=CC=C2SC(SCSC#N)=NC2=C1 TUBQDCKAWGHZPF-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- LKFXYYLRIUSARI-UHFFFAOYSA-N 1,3-thiazol-5-amine Chemical compound NC1=CN=CS1 LKFXYYLRIUSARI-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- NXRIDTLKJCKPOG-UHFFFAOYSA-N 1,4-dihydroimidazole-5-thione Chemical class S=C1CN=CN1 NXRIDTLKJCKPOG-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- VEUMBMHMMCOFAG-UHFFFAOYSA-N 2,3-dihydrooxadiazole Chemical compound N1NC=CO1 VEUMBMHMMCOFAG-UHFFFAOYSA-N 0.000 description 1
- RUABHNUOARCNBP-UHFFFAOYSA-N 2,4,5-trinitrofluoren-9-one Chemical compound O=C1C2=CC=CC([N+]([O-])=O)=C2C2=C1C=C([N+](=O)[O-])C=C2[N+]([O-])=O RUABHNUOARCNBP-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- KOPSRPJRQRDJAV-UHFFFAOYSA-N 2-ethenyldibenzothiophene Chemical compound C1=CC=C2C3=CC(C=C)=CC=C3SC2=C1 KOPSRPJRQRDJAV-UHFFFAOYSA-N 0.000 description 1
- PPJDSJPSCDUDQR-UHFFFAOYSA-N 3,3,5-triphenyl-1,2-dihydropyrazole Chemical compound C1(=CC=CC=C1)C1(C=C(NN1)C1=CC=CC=C1)C1=CC=CC=C1 PPJDSJPSCDUDQR-UHFFFAOYSA-N 0.000 description 1
- CAAMSDWKXXPUJR-UHFFFAOYSA-N 3,5-dihydro-4H-imidazol-4-one Chemical compound O=C1CNC=N1 CAAMSDWKXXPUJR-UHFFFAOYSA-N 0.000 description 1
- NLWWHMRHFRTAII-UHFFFAOYSA-N 4-(1,3-benzoxazol-2-yl)-n,n-dimethylaniline Chemical compound C1=CC(N(C)C)=CC=C1C1=NC2=CC=CC=C2O1 NLWWHMRHFRTAII-UHFFFAOYSA-N 0.000 description 1
- UXKQNCDDHDBAPD-UHFFFAOYSA-N 4-n,4-n-diphenylbenzene-1,4-diamine Chemical compound C1=CC(N)=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 UXKQNCDDHDBAPD-UHFFFAOYSA-N 0.000 description 1
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 1
- XJGFWWJLMVZSIG-UHFFFAOYSA-N 9-aminoacridine Chemical compound C1=CC=C2C(N)=C(C=CC=C3)C3=NC2=C1 XJGFWWJLMVZSIG-UHFFFAOYSA-N 0.000 description 1
- OOWDQTDDYREURW-UHFFFAOYSA-N 9-ethenyl-3-methylcarbazole Chemical compound C1=CC=C2C3=CC(C)=CC=C3N(C=C)C2=C1 OOWDQTDDYREURW-UHFFFAOYSA-N 0.000 description 1
- AFQYQSWTVCNJQT-UHFFFAOYSA-N 9-oxofluorene-4-carboxylic acid Chemical compound O=C1C2=CC=CC=C2C2=C1C=CC=C2C(=O)O AFQYQSWTVCNJQT-UHFFFAOYSA-N 0.000 description 1
- 101100264195 Caenorhabditis elegans app-1 gene Proteins 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical class C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- WZELXJBMMZFDDU-UHFFFAOYSA-N Imidazol-2-one Chemical class O=C1N=CC=N1 WZELXJBMMZFDDU-UHFFFAOYSA-N 0.000 description 1
- 125000000174 L-prolyl group Chemical group [H]N1C([H])([H])C([H])([H])C([H])([H])[C@@]1([H])C(*)=O 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- RSPISYXLHRIGJD-UHFFFAOYSA-N OOOO Chemical compound OOOO RSPISYXLHRIGJD-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- 235000010678 Paulownia tomentosa Nutrition 0.000 description 1
- 240000002834 Paulownia tomentosa Species 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000002820 allylidene group Chemical group [H]C(=[*])C([H])=C([H])[H] 0.000 description 1
- 229960001441 aminoacridine Drugs 0.000 description 1
- 229940058303 antinematodal benzimidazole derivative Drugs 0.000 description 1
- 229940054021 anxiolytics diphenylmethane derivative Drugs 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- LFYJSSARVMHQJB-QIXNEVBVSA-N bakuchiol Chemical compound CC(C)=CCC[C@@](C)(C=C)\C=C\C1=CC=C(O)C=C1 LFYJSSARVMHQJB-QIXNEVBVSA-N 0.000 description 1
- JPYQFYIEOUVJDU-UHFFFAOYSA-N beclamide Chemical compound ClCCC(=O)NCC1=CC=CC=C1 JPYQFYIEOUVJDU-UHFFFAOYSA-N 0.000 description 1
- 150000001556 benzimidazoles Chemical class 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229920005556 chlorobutyl Polymers 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 125000006840 diphenylmethane group Chemical class 0.000 description 1
- ILRSCQWREDREME-UHFFFAOYSA-N dodecanamide Chemical compound CCCCCCCCCCCC(N)=O ILRSCQWREDREME-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- HSEMFIZWXHQJAE-UHFFFAOYSA-N hexadecanamide Chemical compound CCCCCCCCCCCCCCCC(N)=O HSEMFIZWXHQJAE-UHFFFAOYSA-N 0.000 description 1
- ALBYIUDWACNRRB-UHFFFAOYSA-N hexanamide Chemical compound CCCCCC(N)=O ALBYIUDWACNRRB-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 1
- HOBCFUWDNJPFHB-UHFFFAOYSA-N indolizine Chemical class C1=CC=CN2C=CC=C21 HOBCFUWDNJPFHB-UHFFFAOYSA-N 0.000 description 1
- XJTQJERLRPWUGL-UHFFFAOYSA-N iodomethylbenzene Chemical compound ICC1=CC=CC=C1 XJTQJERLRPWUGL-UHFFFAOYSA-N 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229940073584 methylene chloride Drugs 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- PXSXRABJBXYMFT-UHFFFAOYSA-N n-hexylhexan-1-amine Chemical compound CCCCCCNCCCCCC PXSXRABJBXYMFT-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- LYRFLYHAGKPMFH-UHFFFAOYSA-N octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(N)=O LYRFLYHAGKPMFH-UHFFFAOYSA-N 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 150000003336 secondary aromatic amines Chemical class 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C205/00—Compounds containing nitro groups bound to a carbon skeleton
- C07C205/49—Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups
- C07C205/57—Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups having nitro groups and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
- C07C205/61—Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups having nitro groups and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton the carbon skeleton being further substituted by doubly-bound oxygen atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0601—Acyclic or carbocyclic compounds
- G03G5/0609—Acyclic or carbocyclic compounds containing oxygen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0601—Acyclic or carbocyclic compounds
- G03G5/0618—Acyclic or carbocyclic compounds containing oxygen and nitrogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
- C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
- C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
- C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
- C07C2603/18—Fluorenes; Hydrogenated fluorenes
Definitions
- the above drawback may be avoided by adding to the organic photoconductive member electro acceptive compounds which are called rr acid or Lewis acid.
- electro acceptive compounds which are called rr acid or Lewis acid.
- the addition of less than lmol% of an electron acceptive compound to an organic photoconductive material provides particularly high photosensitivity for the range of ultraviolet rays.
- a large amountof electron acceptive compound is added, i.e. 49 to 123 mol% of trinitro fluorenone as the electron acceptive compound is added to poly-9-vinylcarbazole of organic photoconductive material to provide high sensitivity for white light.
- the electron acceptor compounds as used in such sensitizing methods have strong polar groups, they are generally insoluble in organic solvents or easily crystallized. Thus, the kinds of solvents which can be used, are disadvantageously limited and it is therefore difficult to select arbitarily in preparing a photosensitive layer a suitable solvent for the preparation conditions thereof.
- the electron acceptor compounds crystallize markedly easily when their solvents vaporize at coating step, it is difficult to form an even photosensitive layer.
- the electron acceptor compounds are slightly soluble, the amount of the electron acceptor compound to be added, is limited and it often follows that the sensitizing effect of the electron acceptor compound cannot be completely attained in practical usages.
- the comparativity of the electron acceptor compound with the organic photoconductive material is low, the electron acceptor compound crystallizes on the surface of photosensitive layer after a relatively short storage period, and now they cannot be used.
- An object of this invention is to provide novel electron acceptor compounds which can be used as a sensitizer in com hination with organic photoconductive matcrials.
- Another object of this invention is to improve the solubility of electron acceptor compounds in organic solvents so as to increase the amount of the electron acceptor compound to be added and the kinds of solvents to be used.
- R l COR 2 X i i wherein R R and R are nitro, cyano, halogen, trifluoromethyl, acyl, lower alkyl, lower alkoxy, aryl, aralkyl, or hydrogen; X is oxygen or malononitrile group connected by double bond; R is substituted or nonsubstituted, alkyloxy, alkylamino, aralkyloxy; aralkylamino, aryloxy or arylamino group containing 4 to 30 carbon atoms; and R R and R may be the same or different and furthermore the carbon number of the lower alkyl or lower alkoxy group is preferably 1 to 6 from the standpoint of easy production.
- the additional advantage which is brought about by using the above compounds, is that there may be reduced or completely removed plasticizers which are added in the preparation of photosensitive layer and which are apt to reduce the sensitivity of the photosensitive layer.
- the above compounds may be generally prepared from the corresponding 9-fluorenone carboxylic acids and 9-fluorenone carboxylic acid ester or amide derivatives may be prepared according to conventional methods of preparing ester or amide.
- 9-dicyanomethylene fluorenone carboxylic acid ester and amide derivatives may be prepared by reacting the corresponding 9- fluorenone carboxylic acid with malononitrile and thereafter esterifying or forming amido, or by reacting 9-fluorenone carboxylic acid esteror amido derivatives with malononitrilef
- the typical methods of preparing the above compounds are givenbelow.
- fluorenone-4- Organic photoconductive materials as herein used are preferably such as to act as the electron donative member as the above compounds when combined with organic photoconductive materials can act as the electron acceptor member.
- they include low molucular type organic photoconductive materials such as amyl hydrazone derivatives, oxadiazole derivatives, pyrazoline derivatives, imidazolone derivatives, imidazolinethione derivatives, benzimidazole derivatives, benzoxazole derivatives, and benthiazole deriva tives; polymer containing heterocylic ring such as carbazole ring or polynulclear aromatic rings such as naphthalene ring or anthrathene ring which are disclosed for example in Japanese Pat. Publication Nos. 10966/1959, 812/1961, 18674/1967. 25230/1967 and the like.
- Representative materials used as an organic photoconductive material in the present invention are as follows:
- A. Polymer having a carbazole ring such as poly-9- vinylcarbazole, 9-vinylcarbazole copolymer, 3-nitro-9-vinylcarbazole copolymer, 3- methylamino-9-vinylcarbazole copolymer, nitrated poly-9-vinylcarbazole, 3,6-dibromo-9- vinylcarbazole copolymer, poly-9-vinyl-3- aminocarbazole, chlorinated poly-9- vinylcarbazole, thiocyanated poly-9- vinylcarbazole, cyanated poly-9-vinylcarbazole, brominated poly-9-vinylcarbazole, 3-iodo-9- vinylcarbazole copolymer, poly-3,6-diiodo-9- vinylcarbazole, poly-3-benzylideneamino-9- vinylcarbazole, 3,6-dibromo-9-vinylcarbazolc copolymer,
- Aromatic amino derivatives such as aminopolyphenyl, (allylidene) azines, N-N'-dialkyl-N, N-dibenzylphenylenediamine, N,N,N',N-tetrabenzyl-phenylenediamine, N,N-diphenyl-P- Phenylenediamine, N,N-dinaphtyl-pphenylenediamine, 4,4-dimethylaminophendiphenone.
- Diphenylmethanes and triphenylmethanes such as diphenylmethane dye dye leuco base and triphenylmethane dye leuco base.
- Heterocyclic compounds such as oxadiazole, 5- aminothiazole, 4,1,2-triazole, imidazolone, oxazole, imidazole, pyrazoline, imidazoline, polyphenylenethiazole, 1,6-methoxyphenezine, pyrazolinopyrazoline derivatives and the like.
- Compounds having a condensed ring such as benzothiazole, benzimidazole, and benzoxazole, for example, -tetraphenylhexatriene, 2-(4- diaminophenyl-benzoxazole and 2-(4- dimethylaminophenyl) benzoxazole, aminoacridine, quinoxaline, diphenylenehydrazones, pyrrocoline derivatives, 9,10-dihydroanthraoene derivatives and the like.
- benzothiazole benzimidazole
- benzoxazole for example, -tetraphenylhexatriene, 2-(4- diaminophenyl-benzoxazole and 2-(4- dimethylaminophenyl) benzoxazole, aminoacridine, quinoxaline, diphenylenehydrazones, pyrrocoline derivatives, 9,10-dihydroanthraoene derivatives and
- Condensation products such as condensation products of aldehydes and aromatic amines. reaction product of secondary aromatic amines and aromatic halides. polypyromethane-imidopoly-pphenylene-l ,3,4-oxadiazole and the like.
- Vinyl polymers except polyvinylcarbazole such as a-alkylacrylic acid, amide polymers polyvinylacridine, poly-[ l ,5-diphenyl-3-(4-vinylphenyl)-2- pyrazoline], poly-(1,5-diphenylpyrazoline), polyacenaphthylene, neuclear substituted polyacenaphthylene, polyvinylanthracene, poly-2-vinyldibenzothiophene and the like.
- Materials providing good results of sensitizing treatment of this invention among these organic photocon ductive materials are polymers having a carbazole ring and their derivatives, aromatic amino derivatives. diphenylmethane derivatives and triphenylmethane derivatives.
- the organic photoconductive materials and the compounds of this invention are dissolved in proper solvents.
- the compounds of this invention may be dissolved in numerous kinds of solvents and thus the most proper solvent may be selected from numerous solvents depending upon an organic photoconductive material to be used.
- the amount of the compound of this invention varies depending upon the purpose thereof. For example, where it is coated on a substrate such as paper, film, and the like and used as an almost colorless or almost colorless, transparent photosensitive layer, it is added within the ratio of0.01 to 10 mol, preferably 0.1 to 5 mol per mol of organic photoconductive material (if the photoconductive material is a polymer, it is calculated based upon the molecular weight of unit monomer of the polymer). In this case, high photosensitivity for ultraviolet range is provided. If high sensitivity for visible light is also required, it may be achieved by adding dye sensitizers in such an amount not to color strongly thephotosensitive layer.
- high sensitivity for white light color is needed as in a master photosensitive plate and if coloration of the photosensitive plate is negligible, high ratio of 10 to mol per 100 mol of organic photoconductive mate rial may be used to provide high sensitivity for visible light.
- the solution containing the photoconductive material and the compounds of this invention may if necessary include binder resins and other additives, which are coated on a substrate or some special cases used in the form of self-substrate.
- Comparison Example 1 To the solutions prepared by dissolving 2.0g of poly9- vinylcarbazole in 30ml of the following solvents were added 2,4,7-trinitro fluorenone (TNF) of 10 mol% and 100 mol% based of poly-9-vinylcarbazole. The solubility of TNF in the solvents were measured and indicated in Table below. wherein reference symbol 0 means that TNF is soluble and X means that TNF is insoluble.
- the photosensitive layer was charged, exposed to light, and developed as in Example 1 and there was thus obtained an excellent image.
- the proper exposure amount was 550 Lux sec.
- EXAMPLE 3 A solution prepared by dissolving 2g of poly-3- methyl-9-vinylcarbazole and 38mg of 2,7,-dinitro-9- fluoroenone-4-carboxylic acid hexyl ester compound (13) in 35ml of chlorobenzene and a solution prepared by dissolving 11.6mg. of 9,9-diethyl-3,3- dicarbazolyl phenylmethyliodide (sensitizing dye) in 5ml of methylene chloride were mixed to prepare a photosensitive solution.
- the photosensitive solution was coated on a transparent polyester film on which aluminum was thinly deposited, and dried to form a transparent photosensitive film having a 6p. thick photosensitive layer.
- the photosensitive layer so prepared was charged, exposed to light and developed as in Example 1 and there was then obtained an excellent copied image. The proper exposure amount was 150 Lux sec.
- EXAMPLE 4 A solution composed of 2g of poly-9-vinylcarbazole, 4.9g of 4,5,7-trinitro-9 fluorenone-2-carboxylic acid octyl ester compound (10) and 30ml of chlorobenzene was coated on an aluminum plate to form a 10p. thick dry layer.
- the photosensitive plate so prepared was applied to a rotation type electrometer and after charging negatively at -6KV, exposed to a tungusten lamp (effective illumination intensity, 14.4 Lux Ex- Diameter PVK TNF 4,5,7-trinitro- (mm) (not added) 9-fluorenone-2- carboxylic acid octyl ester 10 mol% 100 mol% 10 mol% 100 mol% 6 O O O O O 5 0 o X o 0 4 X X X 0 0 3 X X X X 0 EXAMPLE 1 posure amount required for decaying the initial poten- A solution composed of 2g of l,3,5- tial 950V to thereof (half-decay exposure) was 4.4
- triphenylpyrazoline 2g of polyvinyl butyral resin, 70.4mg. of 7-cyano-9-fluroenone-l-carboxylic acid 4- chlorobutyl ester [compound (8)] and 50 ml ofethanol Lux sec.
- half-decay exposure was 4.0 Lux sec. and where poly- 3,6-chloro-9 -vinylcarbazole was used, the half-decay exposure was 3.6 Lux sec.
- ratio of said compound to said organic photoconductive material being 001 120 mols to 100 mols.
- Photosensitive material for electrophotography according to claim 1 in which the compound represented by the formula of claim 1 is added in a ratio of 0.01 to 10 mol per 100 mol of the organicphotoconductive material.
- Photosensitive plate for electrophotography comprising one or more organic photoconductive materials
- Photosensitive material for electrophotography comprising one or more organic photoconductive materials and one or more compounds of the formula:
- R R and R are, the same or different, nitro, cyano, halogen, trifluoromethyl, acyl, lower alkyl, lower alkoxy, aryl, aralkyl, or hydrogen;
- X is oxygen or malononitrile; and
- R is, substituted or non-substituted, alkyloxy, alkylamino, aralkyloxy, aralkylamino, aryloxy, or arylamino, containing 4 to 30 carbon atoms, the
- R R and R are, the same or different, nitro, cyano, halogen, trifluoromethyl, acyl, lower alkyl,
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Applications Claiming Priority (1)
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JP48005774A JPS4994336A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1973-01-10 | 1973-01-10 |
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US3864126A true US3864126A (en) | 1975-02-04 |
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US431730A Expired - Lifetime US3864126A (en) | 1973-01-10 | 1974-01-08 | Organic photoconductor with carboxy group containing fluorene or fluorore |
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Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4046564A (en) * | 1975-07-16 | 1977-09-06 | Xerox Corporation | Electrophotographic imaging members with photoconductive layer containing electron acceptor monomers or polymers |
US4050934A (en) * | 1975-09-22 | 1977-09-27 | Xerox Corporation | Electron acceptor monomers and polymers |
US4056391A (en) * | 1975-09-22 | 1977-11-01 | Xerox Corporation | Method for enhancing solid solution stability of electron acceptor molecules and electrophotographic compositions |
US4063947A (en) * | 1975-10-29 | 1977-12-20 | Xerox Corporation | Photoconductive insulating films comprising fluorenone-substituted oligomers |
US4105446A (en) * | 1975-01-21 | 1978-08-08 | Fuji Xerox Co., Ltd. | Organic photoconductive coating compositions containing tricyanovinyl compounds for electrophotography |
US4225692A (en) * | 1975-09-22 | 1980-09-30 | Xerox Corporation | Electron acceptor monomers and polymers |
US4584253A (en) * | 1984-12-24 | 1986-04-22 | Xerox Corporation | Electrophotographic imaging system |
US4604295A (en) * | 1983-12-22 | 1986-08-05 | Loctite Corporation | Visible light absorbing peroxy-esters |
US5153085A (en) * | 1988-10-05 | 1992-10-06 | Fuji Xerox Co., Ltd. | Electrophotographic photosensitive member and image forming process |
US6558851B1 (en) * | 1999-10-28 | 2003-05-06 | Holo Tech A.S. | Optical medium for registration of holographic interferograms |
WO2014142844A1 (en) * | 2013-03-13 | 2014-09-18 | Hewlett-Packard Development Company, L.P. | Organic photoconductors |
US9125829B2 (en) | 2012-08-17 | 2015-09-08 | Hallstar Innovations Corp. | Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds |
US9145383B2 (en) | 2012-08-10 | 2015-09-29 | Hallstar Innovations Corp. | Compositions, apparatus, systems, and methods for resolving electronic excited states |
US9867800B2 (en) | 2012-08-10 | 2018-01-16 | Hallstar Innovations Corp. | Method of quenching singlet and triplet excited states of pigments, such as porphyrin compounds, particularly protoporphyrin IX, with conjugated fused tricyclic compounds have electron withdrawing groups, to reduce generation of reactive oxygen species, particularly singlet oxygen |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US3287114A (en) * | 1961-07-24 | 1966-11-22 | Azoplate Corp | Process for the sensitization of photoconductors |
US3408190A (en) * | 1966-03-15 | 1968-10-29 | Xerox Corp | Electrophotographic plate and process employing photoconductive charge transfer complexes |
US3556785A (en) * | 1968-02-23 | 1971-01-19 | Addressograph Multigraph | Sensitizers for organic photoconductor comprising orazolone and butenolide derivatives of of fluorenone |
US3752668A (en) * | 1967-10-30 | 1973-08-14 | Addressograph Multigraph | Organic photoconductive members comprising dicyanomethylene substituted fluorene sensitizers |
-
1973
- 1973-01-10 JP JP48005774A patent/JPS4994336A/ja active Pending
-
1974
- 1974-01-08 US US431730A patent/US3864126A/en not_active Expired - Lifetime
- 1974-01-10 DE DE2401115A patent/DE2401115A1/de not_active Ceased
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3287114A (en) * | 1961-07-24 | 1966-11-22 | Azoplate Corp | Process for the sensitization of photoconductors |
US3408190A (en) * | 1966-03-15 | 1968-10-29 | Xerox Corp | Electrophotographic plate and process employing photoconductive charge transfer complexes |
US3752668A (en) * | 1967-10-30 | 1973-08-14 | Addressograph Multigraph | Organic photoconductive members comprising dicyanomethylene substituted fluorene sensitizers |
US3556785A (en) * | 1968-02-23 | 1971-01-19 | Addressograph Multigraph | Sensitizers for organic photoconductor comprising orazolone and butenolide derivatives of of fluorenone |
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4105446A (en) * | 1975-01-21 | 1978-08-08 | Fuji Xerox Co., Ltd. | Organic photoconductive coating compositions containing tricyanovinyl compounds for electrophotography |
US4046564A (en) * | 1975-07-16 | 1977-09-06 | Xerox Corporation | Electrophotographic imaging members with photoconductive layer containing electron acceptor monomers or polymers |
US4050934A (en) * | 1975-09-22 | 1977-09-27 | Xerox Corporation | Electron acceptor monomers and polymers |
US4056391A (en) * | 1975-09-22 | 1977-11-01 | Xerox Corporation | Method for enhancing solid solution stability of electron acceptor molecules and electrophotographic compositions |
US4225692A (en) * | 1975-09-22 | 1980-09-30 | Xerox Corporation | Electron acceptor monomers and polymers |
US4063947A (en) * | 1975-10-29 | 1977-12-20 | Xerox Corporation | Photoconductive insulating films comprising fluorenone-substituted oligomers |
US4604295A (en) * | 1983-12-22 | 1986-08-05 | Loctite Corporation | Visible light absorbing peroxy-esters |
US4584253A (en) * | 1984-12-24 | 1986-04-22 | Xerox Corporation | Electrophotographic imaging system |
US5153085A (en) * | 1988-10-05 | 1992-10-06 | Fuji Xerox Co., Ltd. | Electrophotographic photosensitive member and image forming process |
US6558851B1 (en) * | 1999-10-28 | 2003-05-06 | Holo Tech A.S. | Optical medium for registration of holographic interferograms |
US9145383B2 (en) | 2012-08-10 | 2015-09-29 | Hallstar Innovations Corp. | Compositions, apparatus, systems, and methods for resolving electronic excited states |
US9611246B2 (en) | 2012-08-10 | 2017-04-04 | Hallstar Innovations Corp. | Compositions, apparatus, systems, and methods for resolving electronic excited states |
US9765051B2 (en) | 2012-08-10 | 2017-09-19 | Hallstar Innovations Corp. | Compositions, apparatus, systems, and methods for resolving electronic excited states |
US9867800B2 (en) | 2012-08-10 | 2018-01-16 | Hallstar Innovations Corp. | Method of quenching singlet and triplet excited states of pigments, such as porphyrin compounds, particularly protoporphyrin IX, with conjugated fused tricyclic compounds have electron withdrawing groups, to reduce generation of reactive oxygen species, particularly singlet oxygen |
US9926289B2 (en) | 2012-08-10 | 2018-03-27 | Hallstar Innovations Corp. | Compositions, apparatus, systems, and methods for resolving electronic excited states |
US10632096B2 (en) | 2012-08-10 | 2020-04-28 | HallStar Beauty and Personal Care Innovations Company | Method of quenching singlet and triplet excited states of photodegradable pigments, such as porphyrin compounds, particularly protoporphyrin IX, with conjugated fused tricyclic compounds having electron withdrawing groups, to reduce generation of singlet oxygen |
US9125829B2 (en) | 2012-08-17 | 2015-09-08 | Hallstar Innovations Corp. | Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds |
WO2014142844A1 (en) * | 2013-03-13 | 2014-09-18 | Hewlett-Packard Development Company, L.P. | Organic photoconductors |
Also Published As
Publication number | Publication date |
---|---|
DE2401115A1 (de) | 1974-07-18 |
JPS4994336A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-09-07 |
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