US3795593A - Chromium plating - Google Patents
Chromium plating Download PDFInfo
- Publication number
- US3795593A US3795593A US00334311A US3795593DA US3795593A US 3795593 A US3795593 A US 3795593A US 00334311 A US00334311 A US 00334311A US 3795593D A US3795593D A US 3795593DA US 3795593 A US3795593 A US 3795593A
- Authority
- US
- United States
- Prior art keywords
- chloro
- acid
- bath
- chromium
- microcracking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title abstract description 47
- 229910052804 chromium Inorganic materials 0.000 title abstract description 45
- 239000011651 chromium Substances 0.000 title abstract description 45
- 238000007747 plating Methods 0.000 title description 24
- 239000002253 acid Substances 0.000 abstract description 14
- 150000003839 salts Chemical class 0.000 abstract description 12
- 238000009713 electroplating Methods 0.000 abstract description 5
- 229910001430 chromium ion Inorganic materials 0.000 abstract description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 16
- QUEKGYQTRJVEQC-UHFFFAOYSA-N 2516-96-3 Chemical compound OC(=O)C1=CC([N+]([O-])=O)=CC=C1Cl QUEKGYQTRJVEQC-UHFFFAOYSA-N 0.000 description 12
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 12
- 230000002378 acidificating effect Effects 0.000 description 12
- VCHSXYHBMFKRBK-UHFFFAOYSA-N 4771-47-5 Chemical class OC(=O)C1=CC=CC(Cl)=C1[N+]([O-])=O VCHSXYHBMFKRBK-UHFFFAOYSA-N 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 11
- 239000011734 sodium Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 8
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 8
- -1 fluoride anions Chemical class 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 8
- 229910052708 sodium Inorganic materials 0.000 description 8
- 150000001450 anions Chemical class 0.000 description 7
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 7
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 7
- QAYNSPOKTRVZRC-UHFFFAOYSA-N 99-60-5 Chemical compound OC(=O)C1=CC=C([N+]([O-])=O)C=C1Cl QAYNSPOKTRVZRC-UHFFFAOYSA-N 0.000 description 5
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 4
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 125000001309 chloro group Chemical group Cl* 0.000 description 4
- 238000005336 cracking Methods 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052700 potassium Inorganic materials 0.000 description 4
- 239000011591 potassium Substances 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- UBXAKNTVXQMEAG-UHFFFAOYSA-L strontium sulfate Chemical compound [Sr+2].[O-]S([O-])(=O)=O UBXAKNTVXQMEAG-UHFFFAOYSA-L 0.000 description 4
- ZMEJRPKJAMJHCX-UHFFFAOYSA-N 1-chloro-3-nitropropane Chemical compound [O-][N+](=O)CCCCl ZMEJRPKJAMJHCX-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- QYHFIVBSNOWOCQ-UHFFFAOYSA-N selenic acid Chemical compound O[Se](O)(=O)=O QYHFIVBSNOWOCQ-UHFFFAOYSA-N 0.000 description 3
- 239000011669 selenium Substances 0.000 description 3
- 229910052711 selenium Inorganic materials 0.000 description 3
- MCAHWIHFGHIESP-UHFFFAOYSA-N selenous acid Chemical compound O[Se](O)=O MCAHWIHFGHIESP-UHFFFAOYSA-N 0.000 description 3
- HRYRVCUBGVCXKL-UHFFFAOYSA-N 2-chloro-1-nitropropane Chemical compound CC(Cl)C[N+]([O-])=O HRYRVCUBGVCXKL-UHFFFAOYSA-N 0.000 description 2
- QWIWYBUPJLCBSE-UHFFFAOYSA-N 3-chloro-2-nitrobenzenesulfonic acid Chemical class OS(=O)(=O)C1=CC=CC(Cl)=C1[N+]([O-])=O QWIWYBUPJLCBSE-UHFFFAOYSA-N 0.000 description 2
- BKFXSOCDAQACQM-UHFFFAOYSA-N 3-chlorophthalic acid Chemical compound OC(=O)C1=CC=CC(Cl)=C1C(O)=O BKFXSOCDAQACQM-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- 229910018487 Ni—Cr Inorganic materials 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 2
- 239000012047 saturated solution Substances 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RVXJIYJPQXRIEM-UHFFFAOYSA-N 1-$l^{1}-selanyl-n,n-dimethylmethanimidamide Chemical compound CN(C)C([Se])=N RVXJIYJPQXRIEM-UHFFFAOYSA-N 0.000 description 1
- XEKUXTMJEFPWCG-UHFFFAOYSA-N 1-chloro-1-nitropropane Chemical class CCC(Cl)[N+]([O-])=O XEKUXTMJEFPWCG-UHFFFAOYSA-N 0.000 description 1
- XMZRJPITAOAPLJ-UHFFFAOYSA-N 1-chloro-2-nitroethane Chemical compound [O-][N+](=O)CCCl XMZRJPITAOAPLJ-UHFFFAOYSA-N 0.000 description 1
- FPJNQQRSBJPGHM-UHFFFAOYSA-N 1-chloro-2-nitropropane Chemical compound ClCC(C)[N+]([O-])=O FPJNQQRSBJPGHM-UHFFFAOYSA-N 0.000 description 1
- LIZCTYVUVWUZMN-UHFFFAOYSA-N 2,2,3,3-tetrachlorobutanedioic acid Chemical compound OC(=O)C(Cl)(Cl)C(Cl)(Cl)C(O)=O LIZCTYVUVWUZMN-UHFFFAOYSA-N 0.000 description 1
- GNTARUIZNIWBCN-UHFFFAOYSA-N 2-chloro-5-nitrobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC([N+]([O-])=O)=CC=C1Cl GNTARUIZNIWBCN-UHFFFAOYSA-N 0.000 description 1
- WKHILFGJMAXBNZ-UHFFFAOYSA-N 3-chloro-2-nitrobenzaldehyde Chemical class [O-][N+](=O)C1=C(Cl)C=CC=C1C=O WKHILFGJMAXBNZ-UHFFFAOYSA-N 0.000 description 1
- OXCWTTAKHWTVED-UHFFFAOYSA-N 3-chloro-2-sulfobenzoic acid Chemical class ClC=1C(=C(C(=O)O)C=CC1)S(=O)(=O)O OXCWTTAKHWTVED-UHFFFAOYSA-N 0.000 description 1
- RPKWNMFDAOACCX-UHFFFAOYSA-N 4-chloro-3-nitrobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(Cl)C([N+]([O-])=O)=C1 RPKWNMFDAOACCX-UHFFFAOYSA-N 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- ABZYEHBDHSQLHO-UHFFFAOYSA-N [chloro(diphenyl)-$l^{4}-selanyl]benzene Chemical compound C=1C=CC=CC=1[Se](C=1C=CC=CC=1)(Cl)C1=CC=CC=C1 ABZYEHBDHSQLHO-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 150000001559 benzoic acids Chemical class 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 239000010960 cold rolled steel Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 150000005338 nitrobenzoic acids Chemical class 0.000 description 1
- FXADMRZICBQPQY-UHFFFAOYSA-N orthotelluric acid Chemical compound O[Te](O)(O)(O)(O)O FXADMRZICBQPQY-UHFFFAOYSA-N 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229920000136 polysorbate Polymers 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229940000207 selenious acid Drugs 0.000 description 1
- CRDYSYOERSZTHZ-UHFFFAOYSA-N selenocyanic acid Chemical class [SeH]C#N CRDYSYOERSZTHZ-UHFFFAOYSA-N 0.000 description 1
- IYKVLICPFCEZOF-UHFFFAOYSA-N selenourea Chemical compound NC(N)=[Se] IYKVLICPFCEZOF-UHFFFAOYSA-N 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- JLGUDDVSJCOLTN-UHFFFAOYSA-N strontium;oxido-(oxido(dioxo)chromio)oxy-dioxochromium Chemical compound [Sr+2].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O JLGUDDVSJCOLTN-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
Definitions
- This invention relates to the electrodeposition of chromium from aqueous acidic hexavalent chromium solu tions. More particularly, it relates to the electrodeposition of chromium with an increased tendency to develop fine craze-cracking over a wide range of cathode current densities, through the use of halo-nitrobenzoic acids dissolved in acidic hexavalent chromium plating baths.
- the main object of this invention is to provide a method to obtain microcracked chromium plate over a wide plat ing range, and with a minimum thickness of the chromium. It has now been found that chloro-nitrobenzoic acids, as exemplified by 2-chloro-5-nitrobenzoic acid (Table 1), when added to acidic hexavalent chromium plating baths containing both sulfate and fluoride (or complex fluoride) anions as catalyst make possible the development of extensive microcracking down into the middle and low current density areas in decorative chromium plating.
- Table 1 2-chloro-5-nitrobenzoic acid
- the present invention is directed to the electrodeposi- 'tion of chromium from an aqueous acidic chromium electroplating bath comprising a source of chromium ions and an etfective microcracking amount of a halo-nitrobenzoic acid or its bath soluble salts, such as an alkali metal (such as potassium, sodium and the like), or nickel, and the like.
- microcracking is meant that the chromium deposit has from about 300 to about 3000 cracks per linear inch.
- An S shaped steel cathode with square sides instead of rounded sides and with a tab left at the top of the S is formed from a 9 inch long coldrolled steel strip that is 1.25 inches wide. It is cleaned and bright nickel plated for 15 minutes using about 40 amps./ sq. ft. on the panel, rinsed and inserted be tween two lead anodes in about three liters of the chromium plating bath kept at about Using 15 amperes on the panel (average of about amps/sq.
- microcracking appears only on a narrow section of the high current density areas, that is, near the edges, with some spotty cracking toward the middle current density areas.
- 2-chloro-5-nitrobenzoic acid dense microcracking resulted on all but the most deeply recessed areas of the panel.
- the number of cracks per linear inch measured in various directions on most of the panel ran from about 600 to 1200, with most of the craze-cracking averaging about 800 to 1000 cracks per linear inch.
- Thermal shock such as a dip in very hot water to 200 F.) for 1 to 2 minutes or the usual final hot water rinse to aid drying, aids rapid development of microcracking.
- a highly stressed underneath nickel plate was not used, even though this further increases the microcracking tendency and makes possible the use of thinner chromium plate and still obtain extensive microcracking.
- the underneath bright nickel plate used in the above test had practically zero stress.
- the Dubpernell test that is, about a 10 minute plate at low current density from an acid copper bath applied to the chromium plate was used to identify the extent of microcracking. The chromium surface was photographed at 100 x and the extent and number of microcracks per linear inch were determined.
- the potassium salt or other silicofiuoride salts can be used to furnish a similar concentration of silicofiuoride anion.
- saturated solutions of slightly soluble silicofiuoride salts can be used, such as those of lanthanum, pradosodymium or neodymium or the mixtures, and the balance of silicofiuoride anion can be made up with small additions of sodium or potassium silicofiuoride.
- ceric (or cerous) silicofiuoride salts of limited bath-solubility are excellent, and only small concentrations or sodium or potassium silicofiuoride need to be added for optimum total concentrations (Bath B) of silicofluoride anion with respect to the low concentrations of sulfate anion for attaining a maximum cathode current density range of decorative microcracked chromium when the chloronitrobenzoic acids are present.
- the 2-chloro-5- nitrobenzoic acid or 2-chloro-4-nitrobenzoic acid should be present in these baths in their optimum concentration of about 0.5 to about 1 gram/ liter to obtain the most extensive and dense microcracking.
- silicofiuoride anion it is also possible to control the concentration of silicofiuoride anion by using a saturated solution of potassium silicofiuoride and suppressing the ionization of this salt by the use of high concentrations of potassium ions derived from high concentrations of potassium dichromate added in making up the acidic hexavalent chromium plating bath.
- silicofiuoride or fluoride anions it is possible to use other fluoride containing anions such as fluoaluminates, fluotitanates, fluozirconates, fluophosphates, fluoborates, fluoantimonates, etc., to make up the content of fluoride ion similar to that supplied by about 2 g./l.
- the sulfate anion can also be controlled by using strontium sulfate with additional strontium dichromate added to repress the ionization of the strontium sulfate. If the fluoride or complex fluoride ion is decreased in concentration, then the degree of microcracking is decreased and yet the halo-nitrobenzoic acids are still useful to extend the degree of microcrack-.
- the fluoride or complex fluoride anions are not used and the chromic acid to sulfate ratio decreased to 150 to 1 or to 100 to 1 or 75 to 1, then for decorative chromium plating where the average thickness of chromium is usually kept to about 0.1 mil as a maximum, then the use of the chloro-nitrobenzoic acids do not cause rnicrocracking. However, the chloro-nitrobenzoic acids are still useful for slightly increasing the extent of micro-cracking with thicker non-decorative use of chromium plate, that is, for engineering uses.
- micro craze-cracks of about 100 to 200 cracks per linear inch can serve to retain traces of oil and in this way decrease wear in applications involving wear surfaces as on cylinder liners or on the epitrochoidal track of Wankel rotary enigne housing.
- concentrations as high as 10 g./l., in fact up to satuartion concentrations can be used in the bright decorative chromium plating baths.
- the compounds of Table I may be added to the baths as the free acids or as salts, such as the sodium or potassium salts. In any case, in the strongly acid bath, the compounds are present predominantly as acids. Technical grades can be used.
- concentrations of the compounds of Table I as low as about 0.05 g./1. are helpful for slightly increased microcracking.
- Mixtures of the compounds of Table I can be used (see Bath B).
- the compounds of Table I are compatible with the anti-spray surfactants described in U.S. 2,750,334 and also those described in U.S. 3,432,408.
- the compounds of Table I function effectively in chromium plating baths containing a ratio of about 300/ 1., and 250/1. of chromic acid to sulfate with the same fluoride concentrations shown with Bath (A) or even with slightly higher fluoride concentrations.
- the optimum ratio of chromic acid to sulfate is around 200/l.
- the ratio is made as high as 300/1. in Bath (A)
- the blue haze in the chromium plate from Bath (C) is not as intense as when about 5 to 10 mg./l. of Se0 is added to chromium plating baths, and with concentrations of SeO above 10 mg./l. the blue haze in the decorative chromium plate may be sufficiently noticeable that in many cases it may not be acceptable for decorative plat- I ing.
- the selenium may be added as selenious oxide, selenious or selenic acids or the salts of the acids, or added as sodium or other selenocyanates, or added as a seleno organic compound such as selenourea, N,N-dimethyl selenourea, triphenyl selenium chloride, etc.
- Telluric acid does not cause the blue haze, but it is very much less effective than selenious oxide or selenious or selenic acid in. causing or aiding microcracking even when used in concentrations as high as 0.5 to even 2 or 5 g./l.
- the rate of consumption of the chloro-nitrobenzoic acids is about 0.25 g./1. or 1 gram per gallon for amp. hours per gallon.
- steel panels are plated with a half mil of bright copper and one mil of bright nickel and chromium plated with 0.03 to 0.05 mil of the usual decorative chromium plate, and these panels are compared to similar steel panels plated with the same copper and nickel plate, but with microcracked chromium of the same thickness as the control, the difference in corrosion protection to the steel on exposure in a marine or industrial atmosphere is strikmg.
- Halogen substituted organic compounds such as chloroacetic acid, trichloroacetic acid, tetrachlorosuccinic acid, chlorophthalic acid (see US. Pats. 3,505,183, 3,282,812) have been used in acidic hexavalent chromium plating baths. These compounds have no appreciable effect on causing increased microcracking of the plate from acidic chromium plating baths containing both sulfate and fluoride type catalysts.
- the chlorophthalic acids, and the chloro-sulfobenzoic acids mentioned along with other halo-organic acids in U.S. 3,505,183 were all used in concentrations of to 100 grams per liter in the acidic hexavalent chromium plating baths of high ratio of chromic acid to catalyst content. They were used for the purpose of increasing the covering power of such baths. They do not appreciably increase the microcracking of the chromium plate, and are thus completely unlike the nitro containing compounds of this invention for their effect in the chromium plating baths.
- l-chloro-l-nitroethane and 2-chloro-1-nitropropane are very effective in concentrations of about 0.1 to about 1 gram/liter which is close to the saturation concentrations in the chromium plating baths.
- the vapors from these chloronitroalkanes are toxic, and even though the 3-chloro-1- nitropropane has the highest boiling point and the least odor, it is considered to be toxic to breathe; and even if they were used in low concentrations such as about 0.1 g./l. and the balance needed for the most extensive microcracking, be made up of 0.3 to 0.4 g./l. of 2-chloro-5- nitrobenzoic acid or 0.5 to 2 g./l. of 2-chloro-5-nitrobenzenesulfonic acid, it would probably be a hazard to use these volatile compounds over a period of time, even with good ventilation.
- chloro-nitrobenzaldehydes when added to acidic hexavalent chromium plating baths are oxidized to the corresponding benzoic acids, and therefore can be added to the electroplating bath of this invention. They are expensive compounds however.
- 2-chloro-5-nitrobenzoic acid with 2-chloro-S-nitrobenzenesulfonic acid the best of the chloro-nitrobenzenesulfonic acids.
- the 3- chloro-I-nitropropanes is the most elfective of the chloronitropropanes and the least volatile.
- An aqueous acidic chromium electroplating bath comprising a source of chromium ions and an effective microcracking amount of a halo-nitrobenzoic acid or its bath soluble salts.
- a method of depositing chromium comprising passing an electric current from an anode to a cathode through the electrolyte of claim 1 for a period of time sufficient to form a microcracked chromium deposit.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US33431173A | 1973-02-21 | 1973-02-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3795593A true US3795593A (en) | 1974-03-05 |
Family
ID=23306633
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US00334311A Expired - Lifetime US3795593A (en) | 1973-02-21 | 1973-02-21 | Chromium plating |
Country Status (2)
Country | Link |
---|---|
US (1) | US3795593A (en) |
DE (1) | DE2318610A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060040124A1 (en) * | 2004-01-30 | 2006-02-23 | Kabushiki Kaisha Riken | Composite chromium plating film and sliding member having the same and method for manufacture thereof |
-
1973
- 1973-02-21 US US00334311A patent/US3795593A/en not_active Expired - Lifetime
- 1973-04-13 DE DE2318610A patent/DE2318610A1/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060040124A1 (en) * | 2004-01-30 | 2006-02-23 | Kabushiki Kaisha Riken | Composite chromium plating film and sliding member having the same and method for manufacture thereof |
US7318963B2 (en) * | 2004-01-30 | 2008-01-15 | Kabushiki Kaisha Riken | Composite chromium plating film and sliding member having the same and method for manufacture thereof |
Also Published As
Publication number | Publication date |
---|---|
DE2318610A1 (en) | 1974-08-29 |
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