US3758390A - Novel cromium plating compositions - Google Patents
Novel cromium plating compositions Download PDFInfo
- Publication number
- US3758390A US3758390A US00154703A US3758390DA US3758390A US 3758390 A US3758390 A US 3758390A US 00154703 A US00154703 A US 00154703A US 3758390D A US3758390D A US 3758390DA US 3758390 A US3758390 A US 3758390A
- Authority
- US
- United States
- Prior art keywords
- chromium
- per liter
- acid
- grams per
- electroplating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007747 plating Methods 0.000 title abstract description 26
- 239000000203 mixture Substances 0.000 title abstract description 20
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract description 64
- 229910052804 chromium Inorganic materials 0.000 abstract description 64
- 239000011651 chromium Substances 0.000 abstract description 64
- SUMDYPCJJOFFON-UHFFFAOYSA-N isethionic acid Chemical compound OCCS(O)(=O)=O SUMDYPCJJOFFON-UHFFFAOYSA-N 0.000 abstract description 35
- 238000009713 electroplating Methods 0.000 abstract description 29
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 abstract description 23
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 abstract description 21
- 229910052751 metal Inorganic materials 0.000 abstract description 20
- 239000002184 metal Substances 0.000 abstract description 20
- 238000000034 method Methods 0.000 abstract description 20
- AGGIJOLULBJGTQ-UHFFFAOYSA-N sulfoacetic acid Chemical compound OC(=O)CS(O)(=O)=O AGGIJOLULBJGTQ-UHFFFAOYSA-N 0.000 abstract description 18
- 229940045996 isethionic acid Drugs 0.000 abstract description 11
- 230000002378 acidificating effect Effects 0.000 abstract description 9
- 239000003054 catalyst Substances 0.000 abstract description 8
- 150000001845 chromium compounds Chemical class 0.000 abstract description 5
- 229910001430 chromium ion Inorganic materials 0.000 abstract description 5
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 abstract description 5
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 28
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 28
- -1 fluoride ions Chemical class 0.000 description 12
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 239000011669 selenium Substances 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 229910052711 selenium Inorganic materials 0.000 description 7
- 229940091258 selenium supplement Drugs 0.000 description 7
- 239000010410 layer Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- QCCDYNYSHILRDG-UHFFFAOYSA-K cerium(3+);trifluoride Chemical compound [F-].[F-].[F-].[Ce+3] QCCDYNYSHILRDG-UHFFFAOYSA-K 0.000 description 4
- UBXAKNTVXQMEAG-UHFFFAOYSA-L strontium sulfate Chemical compound [Sr+2].[O-]S([O-])(=O)=O UBXAKNTVXQMEAG-UHFFFAOYSA-L 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- QYHFIVBSNOWOCQ-UHFFFAOYSA-N selenic acid Chemical compound O[Se](O)(=O)=O QYHFIVBSNOWOCQ-UHFFFAOYSA-N 0.000 description 2
- MCAHWIHFGHIESP-UHFFFAOYSA-N selenous acid Chemical compound O[Se](O)=O MCAHWIHFGHIESP-UHFFFAOYSA-N 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 229940045998 sodium isethionate Drugs 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- 235000011152 sodium sulphate Nutrition 0.000 description 2
- LADXKQRVAFSPTR-UHFFFAOYSA-M sodium;2-hydroxyethanesulfonate Chemical compound [Na+].OCCS([O-])(=O)=O LADXKQRVAFSPTR-UHFFFAOYSA-M 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- PMYDPQQPEAYXKD-UHFFFAOYSA-N 3-hydroxy-n-naphthalen-2-ylnaphthalene-2-carboxamide Chemical compound C1=CC=CC2=CC(NC(=O)C3=CC4=CC=CC=C4C=C3O)=CC=C21 PMYDPQQPEAYXKD-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- ZUHFXGOGKYCXSS-UHFFFAOYSA-L azanium calcium hydrogen sulfate sulfate Chemical compound S(=O)(=O)([O-])[O-].[NH4+].S(=O)(=O)([O-])O.[Ca+2] ZUHFXGOGKYCXSS-UHFFFAOYSA-L 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- GHLITDDQOMIBFS-UHFFFAOYSA-H cerium(3+);tricarbonate Chemical compound [Ce+3].[Ce+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O GHLITDDQOMIBFS-UHFFFAOYSA-H 0.000 description 1
- OZECDDHOAMNMQI-UHFFFAOYSA-H cerium(3+);trisulfate Chemical compound [Ce+3].[Ce+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O OZECDDHOAMNMQI-UHFFFAOYSA-H 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- ZBIBSMMVRNDSNI-UHFFFAOYSA-N diazanium;selenate Chemical compound [NH4+].[NH4+].[O-][Se]([O-])(=O)=O ZBIBSMMVRNDSNI-UHFFFAOYSA-N 0.000 description 1
- VUTVQPHOXHSGOQ-UHFFFAOYSA-N dibutyl selenite Chemical compound [Se](=O)(OCCCC)OCCCC VUTVQPHOXHSGOQ-UHFFFAOYSA-N 0.000 description 1
- ZSHZKWMAWDFOFB-UHFFFAOYSA-N diethyl selenate Chemical compound [Se](=O)(=O)(OCC)OCC ZSHZKWMAWDFOFB-UHFFFAOYSA-N 0.000 description 1
- UEJBTVZPRCSFBM-UHFFFAOYSA-N diethyl selenite Chemical compound CCO[Se](=O)OCC UEJBTVZPRCSFBM-UHFFFAOYSA-N 0.000 description 1
- FUVBDADKCJGLAB-UHFFFAOYSA-N dimethyl selenate Chemical compound CO[Se](=O)(=O)OC FUVBDADKCJGLAB-UHFFFAOYSA-N 0.000 description 1
- NTEFHFJOCXLHIX-UHFFFAOYSA-N dimethyl selenite Chemical compound CO[Se](=O)OC NTEFHFJOCXLHIX-UHFFFAOYSA-N 0.000 description 1
- RNGFNLJMTFPHBS-UHFFFAOYSA-L dipotassium;selenite Chemical compound [K+].[K+].[O-][Se]([O-])=O RNGFNLJMTFPHBS-UHFFFAOYSA-L 0.000 description 1
- JGNIZAMBYUZLLC-UHFFFAOYSA-N dipropan-2-yl selenite Chemical compound CC(C)O[Se](=O)OC(C)C JGNIZAMBYUZLLC-UHFFFAOYSA-N 0.000 description 1
- BVTBRVFYZUCAKH-UHFFFAOYSA-L disodium selenite Chemical compound [Na+].[Na+].[O-][Se]([O-])=O BVTBRVFYZUCAKH-UHFFFAOYSA-L 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- INHCSSUBVCNVSK-UHFFFAOYSA-L lithium sulfate Inorganic materials [Li+].[Li+].[O-]S([O-])(=O)=O INHCSSUBVCNVSK-UHFFFAOYSA-L 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- YAZJAPBTUDGMKO-UHFFFAOYSA-L potassium selenate Chemical compound [K+].[K+].[O-][Se]([O-])(=O)=O YAZJAPBTUDGMKO-UHFFFAOYSA-L 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- VBKNTGMWIPUCRF-UHFFFAOYSA-M potassium;fluoride;hydrofluoride Chemical compound F.[F-].[K+] VBKNTGMWIPUCRF-UHFFFAOYSA-M 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 229960001881 sodium selenate Drugs 0.000 description 1
- 235000018716 sodium selenate Nutrition 0.000 description 1
- 239000011655 sodium selenate Substances 0.000 description 1
- 229960001471 sodium selenite Drugs 0.000 description 1
- 235000015921 sodium selenite Nutrition 0.000 description 1
- 239000011781 sodium selenite Substances 0.000 description 1
- BFXAWOHHDUIALU-UHFFFAOYSA-M sodium;hydron;difluoride Chemical compound F.[F-].[Na+] BFXAWOHHDUIALU-UHFFFAOYSA-M 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- RBTVSNLYYIMMKS-UHFFFAOYSA-N tert-butyl 3-aminoazetidine-1-carboxylate;hydrochloride Chemical compound Cl.CC(C)(C)OC(=O)N1CC(N)C1 RBTVSNLYYIMMKS-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
Definitions
- At least one chromium compound providing hexavalent chromium ions for electroplating chromium; at least one catalyst selected from the group comprising sulfate ions and fluoride ions, and
- This invention relates to a novel process for the electrodeposition of chromium and to the novel chromium deposits formed thereby.
- This invention also relates to chromium surface layers on wearing parts and touching parts in relative motion, such as piston rings in cylinders, bearings, and turbine edges.
- An object of the present invention is to provide a chromium bearing surface which has quick break-in characteristics while retaining the excellent wearing qualities and long life of such surfaces.
- Another object of this invention is to provide a process for electrodepositing bright decorative chromium plate.
- This invention relates to novel compositions and to a process for electroplating decorative chromium plate onto a basis metal which comprises passing current from an anode to a cathode at least a portion of which contains a conductive metal layer through an aqueous acidic chromium plating solution containing:
- At least one chromium compound providing hexavalent chromium ions for electroplating chromium; at least one catalyst selected from the group comprising fluoride ions and sulfate ions, and
- the chromium electroplating bath compositions of the invention contain about 100-600 grams per liter of chromic acid (expressed as CrO and preferably about 100200 grams per liter of chromic acid.
- the plate produced by the novel process of this invention is highly satisfactory with respect to its unusually bright decorative appearance.
- this invention is a 3,758,390 Patented Sept. 11, 1973 methodof forming a bearing surface upon a substrate comprising a duplex plating of two disparate kinds of chromium comprising:
- this invention relates to a piston ring comprising an inner annular portion, an intermediate contiguous hard chromium portion, and an outer annular portion of microcracked chromium.
- isethionates such as sodium isethionate
- sulfoacetic acid While sulfoacetic acid itself imparts homogeneous microcracking, isethionates, such as sodium isethionate, are readily oxidized to sulfoacetic acid by the chromic acid plating bath and also effect enhanced microcracking of chromium. Thus it has been found that sulfoacetic acid has been found to produce a very different structure in heavy chromium deposits.
- the amount of sulfoacetic acid added to the chromic acid bath should be between 1 gram per liter and 10 grams per liter, preferably about 3 grams per liter.
- Sulfate ions may be added to the chromium electroplating bath in the form of suitable sulfate compounds such as strontium sulfate (SrSO sulfuric acid (H 50 lithium sulfate (Li SO ammonium sulfate calcium sulfate (CaS0 etc.
- strontium sulfate SrSO sulfuric acid (H 50 lithium sulfate (Li SO ammonium sulfate calcium sulfate (CaS0 etc.
- the chromium electroplating process uses temperatures of 30-70 C. with a chromic acid bath containing 600 grams per liter of chromic acid (as CrO).
- CrO chromic acid bath containing 600 grams per liter of chromic acid
- the ratio of chromic acid to sulfate ion (CrO :SO should be maintained at 50-550z1, typically ISO-300:1 and preferably about 200: 1.
- the aqueous chromium plating bath contains active fluoride.
- Active fluoride is fluoride ion in the form exhibiting catalytic activity in the bath.
- Active fluoride may be in the form of simple fluoride, F-, or complex fluoride. Where complex fluorides are employed, one mole of complex fluoride may be considered equivalent to one mole of simple fluoride ion, i.e. both contribute approximately one mole of active fluoride to the bath.
- the active fluoride may be selected from the group consisting of fluoride (F'), and complex fluorides including fluosilicate or silicofluoride (SiF fluoborate (BF4"), fluoaluminate (AIF fluophosphate (PFg'), fluozirconate (ZrF and fluotitanate (TiF Fluosilicate may be the most preferred active fluoride.
- fluoride F'
- complex fluorides including fluosilicate or silicofluoride (SiF fluoborate (BF4"), fluoaluminate (AIF fluophosphate (PFg'), fluozirconate (ZrF and fluotitanate (TiF Fluosilicate may be the most preferred active fluoride.
- the active fluoride may typically be present in the aqueous chromium plating bath in the amount of about 0.0005- 0.l5 mole per liter. Preferably 0.01-0.05 mole per liter of active fluoride may be present.
- the active fluoride may be introduced into the bath by dissolving therein a salt or an acid of the active fluoride. Preferably, an alkali metal salt may be employed.
- suitable sources of active fluoride include sodium fluoride, potassium silicofluoride, fluoboric acid, sodium fluoaluminate, potassium fluophosphate, sodium bifluoride, potassium bifluoride, sodium fluotitanate, sodium fluozirconate, ammonium fluoslicate, and lithium fluosilicate.
- the aqueous chromium plating bath also contains sulfate ion, typically in the amount of about 0.2-5.0 grams per liter and preferably 0.3-4.0 gram per liter, say 13 grams per liter.
- sulfate ion improves the microcrack effect and the appearance of the chromium deposit and lowers plating time.
- the sulfate ion may be provided by dissolving in the bath sulfuric acid or a salt thereof having sufiicient solubility to produce the desired concentration.
- Suitable sources of sulfate ion include sulfuric acid, sodium sulfate, potassium sulfate, magnesium sulfate, strontium sulfate, calcium sulfate, etc.
- the bath may contain common ion salts, e.g. K Sr+ Ca++, La+++, and other rare earth cations or mixtures thereof to limit the solubility of the catalyst ions to a desirable value in a self-regulating system.
- the highly preferred aqueous chromium plating baths contain, in addition to chromic acid, sulfate, at least one member of the group consisting of sulfoacetic acid, isethionate and isethionic acid, active fluoride; selenium in soluble form. Soluble selenium may be introduced into the bath by dissolving therein a compound containing selenium which is soluble in the bath.
- Illustrative useful compounds include selenic acid and salts thereof, such as sodium selenate, ammonium selenate, potassium selenate, selenous acid and salts thereof, such as sodium selenite, potassium selenite; lower alkyl esters of selenic acid and selenous acid such as dimethyl selenate, diethyl selenate, di-n-propyl selenate, di-sec-butyl selenate, dimethyl selenite, diethyl selenite, di-isopropyl selenite, di-n-butyl selenite, etc.
- Other compounds capable of contributing selenium in soluble form may also be employed.
- the most preferred form of solubleselenium is selenate.
- the selenium is present in the bath in the amount of 50 10* mole per liter Se and preferably 3 l0- mole per liter Se.
- the baths containing selenium, preferably selenate, within the noted ranges produce an exceptionally dense, fine microcrack pattern on cathodes plated according to the process of this invention.
- the most highly preferred aqueous chromium plating baths may contain chromic acid, active fluoride preferably fluosilicate, sulfate, and selenium, preferably selenate.
- the aqueous chromium plating bath may contain:
- Cerous ions may be added to the bath in the form of salts such as cerium carbonate, cerium fluoride, cerium sulfate, etc.
- cerium fluoride CeF is employed in combination with fluoride, fluoride-containing and/ or sulfate catalysts
- the chromium plating bath composition (containing 100-600 grams per liter of CrO may be saturated with CeF Such saturation is provided to obtain self-regulation of the catalyst content of the bath.
- CeF cerous salts including complex fluoride salts
- a chromium plating solu-- tion containing 100-600 grams per liter Cr0 to form a chromic acid solution which contains an excess of undissolved cerium fluoride (CeF).
- EXAMPLE 1 -A 550 milliliter Hull Cell was used with an ordinary bath containing 200 grams per liter of chromic acid and 2.0 grams per liter of sulfate and 3.0 grams per liter of sulfoacetic acid to plate brass Hull Cell panels which had been nickel plated at 10 amperes for 10 minutes. After nickel plating the panels were given a water rinse, acid dip (10% sulfuric acid) and another water rinse. The panels were then placed in a slotted Hull Cell in a polyvinyl chloride tank and plated at 8 amperes for 8 minutes. The effect of adding 3 grams per liter of sulfoacetic acid to this ordinary bath was that of enhanced microcracking.
- Example 2 With the addition of 6 grams per liter of sulfoacetic acid using the same procedure as in Example 1, except that the plating time was 6 minutes, again enhanced microcracking was attained, substantiating that the microcracked chromium of this invention was useful for break-in and other lubricity-demanding applications.
- a process for electroplating chromium plate onto a basis metal which comprises passing current from an anode to a cathode at least a portion of which contains a conductive metal layer through an aqueous acidic chromium plating solution containing:
- aqueous acidic chromium plating solution contains about 200-350 grams per liter of chromic acid and about 3 grams per liter of at least one member of the group consisting of sulfoacetic acid, isethionate and isethionic acid.
- aqueous acidic chromium plating solution contains about 200-400 grams per liter of chromic acid, about 1-4 grams per liter of cerous salt, and wherein the chromic acid to sulfate ion ratio is 100-550: 1.
- composition for electroplating chromium plate onto a basis metal which comprises:
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15470371A | 1971-06-18 | 1971-06-18 | |
| US00262151A US3804728A (en) | 1971-06-18 | 1972-06-12 | Novel chromium plating compositions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3758390A true US3758390A (en) | 1973-09-11 |
Family
ID=26851696
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US00154703A Expired - Lifetime US3758390A (en) | 1971-06-18 | 1971-06-18 | Novel cromium plating compositions |
| US00262151A Expired - Lifetime US3804728A (en) | 1971-06-18 | 1972-06-12 | Novel chromium plating compositions |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US00262151A Expired - Lifetime US3804728A (en) | 1971-06-18 | 1972-06-12 | Novel chromium plating compositions |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US3758390A (enrdf_load_stackoverflow) |
| AU (1) | AU465824B2 (enrdf_load_stackoverflow) |
| DE (1) | DE2229883A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2142014B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1378973A (enrdf_load_stackoverflow) |
| NL (1) | NL7208359A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3943040A (en) * | 1974-09-20 | 1976-03-09 | The Harshaw Chemical Company | Microcracked chromium from a bath using an organic sulfur compound |
| US4810336A (en) * | 1988-06-21 | 1989-03-07 | M&T Chemicals Inc. | Electroplating bath and process for depositing functional, at high efficiencies, chromium which is bright and smooth |
| US4828656A (en) * | 1987-02-09 | 1989-05-09 | M&T Chemicals Inc. | High performance electrodeposited chromium layers |
| US4927506A (en) * | 1989-09-14 | 1990-05-22 | Atochem North America, Inc. | High-performance electrodeposited chromium layers formed at high current efficiencies |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2529511A1 (fr) * | 1982-07-02 | 1984-01-06 | Nouel Jean Marie | Plaques offset a base acier et a multicouches de chrome |
| DE3402554A1 (de) * | 1984-01-26 | 1985-08-08 | LPW-Chemie GmbH, 4040 Neuss | Abscheidung von hartchrom auf einer metallegierung aus einem waessrigen, chromsaeure und schwefelsaeure enthaltenden elektrolyten |
| US4588481A (en) * | 1985-03-26 | 1986-05-13 | M&T Chemicals Inc. | Chromium plating bath for producing non-iridescent, adherent, bright chromium deposits at high efficiencies and substantially free of cathodic low current density etching |
| RU2125125C1 (ru) * | 1997-12-24 | 1999-01-20 | Малинин Владимир Федорович | Способ электролитического хромирования |
| RU2125126C1 (ru) * | 1998-01-27 | 1999-01-20 | Малинин Владимир Федорович | Способ электролитического хромирования в низкоконцентрированном электролите |
| DE102005059367B4 (de) * | 2005-12-13 | 2014-04-03 | Enthone Inc. | Elektrolytzusammensetzung und Verfahren zur Abscheidung rissfreier, korrosionsbeständiger und harter Chrom- und Chromlegierungsschichten |
| RU2762695C1 (ru) * | 2020-11-20 | 2021-12-22 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский автомобильно-дорожный государственный технический университет (МАДИ)" | Способ электролитического хромирования |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1255874A (fr) * | 1959-05-28 | 1961-03-10 | Metal & Thermit Corp | Procédé de chromage électrolytique |
| FR1407483A (fr) * | 1963-09-11 | 1965-07-30 | Udylite Corp | Perfectionnements aux bains de chromage électrolytique |
| US3745097A (en) * | 1969-05-26 | 1973-07-10 | M & T Chemicals Inc | Electrodeposition of an iridescent chromium coating |
| US3634211A (en) * | 1969-10-06 | 1972-01-11 | M & T Chemicals Inc | Process for electroplating chromium and electrolytes therefor |
-
1971
- 1971-06-18 US US00154703A patent/US3758390A/en not_active Expired - Lifetime
-
1972
- 1972-06-12 US US00262151A patent/US3804728A/en not_active Expired - Lifetime
- 1972-06-16 GB GB2832272A patent/GB1378973A/en not_active Expired
- 1972-06-16 FR FR7221792A patent/FR2142014B1/fr not_active Expired
- 1972-06-19 AU AU43563/72A patent/AU465824B2/en not_active Expired
- 1972-06-19 DE DE19722229883 patent/DE2229883A1/de not_active Ceased
- 1972-06-19 NL NL7208359A patent/NL7208359A/xx not_active Application Discontinuation
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3943040A (en) * | 1974-09-20 | 1976-03-09 | The Harshaw Chemical Company | Microcracked chromium from a bath using an organic sulfur compound |
| US4828656A (en) * | 1987-02-09 | 1989-05-09 | M&T Chemicals Inc. | High performance electrodeposited chromium layers |
| US4810336A (en) * | 1988-06-21 | 1989-03-07 | M&T Chemicals Inc. | Electroplating bath and process for depositing functional, at high efficiencies, chromium which is bright and smooth |
| AU626133B2 (en) * | 1988-06-21 | 1992-07-23 | M And T Chemicals Inc. | Electroplating process dor depositing bright and smooth functional chromium at high efficiencies |
| US4927506A (en) * | 1989-09-14 | 1990-05-22 | Atochem North America, Inc. | High-performance electrodeposited chromium layers formed at high current efficiencies |
Also Published As
| Publication number | Publication date |
|---|---|
| NL7208359A (enrdf_load_stackoverflow) | 1972-12-20 |
| AU465824B2 (en) | 1975-10-09 |
| GB1378973A (en) | 1975-01-02 |
| AU4356372A (en) | 1974-01-03 |
| FR2142014B1 (enrdf_load_stackoverflow) | 1977-12-23 |
| DE2229883A1 (de) | 1972-12-21 |
| US3804728A (en) | 1974-04-16 |
| FR2142014A1 (enrdf_load_stackoverflow) | 1973-01-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3758390A (en) | Novel cromium plating compositions | |
| US2436316A (en) | Bright alloy plating | |
| GB2086939A (en) | Trivalent chromium electrolyte and process employing vanadium reducing agent | |
| JPS61235593A (ja) | 高い効率で玉虫色でない付着性の光沢クロム析出層を、実質的に陰極低電流密度腐食なしで形成するクロムメツキ浴 | |
| US2822326A (en) | Bright chromium alloy plating | |
| US2701234A (en) | Addition agent for copper plating | |
| US2990343A (en) | Chromium alloy plating | |
| US4673471A (en) | Method of electrodepositing a chromium alloy deposit | |
| US3661733A (en) | Chromium electroplating | |
| US3108933A (en) | Process and composition for chromium plating | |
| US4487665A (en) | Electroplating bath and process for white palladium | |
| US3654101A (en) | Novel chromium plating compositions and processes | |
| US2112818A (en) | Electrodeposition of metals | |
| US3723261A (en) | Black chromium plating process and composition | |
| US3408272A (en) | Electrodeposition of chromium | |
| US3418220A (en) | Electrodeposition of chromium and duplex micro-crack chromium coatings | |
| US2380044A (en) | Process for producing electrodeposits | |
| US3713999A (en) | Electrodeposition of chromium | |
| US2985567A (en) | Electrodeposition of black chromium coatings | |
| US3920527A (en) | Self-regulating plating bath and method for electrodepositing chromium | |
| US3909404A (en) | Composition and process for electrodepositing a black chromium deposit | |
| US3867267A (en) | Chromium plating | |
| CN109537002B (zh) | 一种超高硬度镀铬添加剂及其应用 | |
| US3778358A (en) | Zinc plating solution | |
| US2745801A (en) | Chromium plating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: ATOCHEM NORTH AMERICA, INC., PENNSYLVANIA Free format text: MERGER;ASSIGNORS:ATOCHEM INC., A CORP. OF DE.;M&T CHEMICALS INC., A CORP. OF DE., (MERGED INTO);PENNWALT CORPORATION, A CORP. OF PA., (CHANGED TO);REEL/FRAME:005305/0866 Effective date: 19891231 |
|
| AS | Assignment |
Owner name: M&T HARSHAW, P.O. BOX 6768, 2 RIVERVIEW DRIVE, SOM Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:ATOCHEM NORTH AMERICA, INC., A CORP. OF PENNSYLVANIA;REEL/FRAME:005689/0062 Effective date: 19910424 |