US3749656A - Method of making an article having a hard and ornamental coating - Google Patents
Method of making an article having a hard and ornamental coating Download PDFInfo
- Publication number
- US3749656A US3749656A US00133382A US3749656DA US3749656A US 3749656 A US3749656 A US 3749656A US 00133382 A US00133382 A US 00133382A US 3749656D A US3749656D A US 3749656DA US 3749656 A US3749656 A US 3749656A
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- United States
- Prior art keywords
- tantalum
- carbide
- coating
- workpiece
- coated
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- Expired - Lifetime
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- 239000011248 coating agent Substances 0.000 title abstract description 14
- 238000000576 coating method Methods 0.000 title abstract description 14
- 238000004519 manufacturing process Methods 0.000 title description 5
- 239000000843 powder Substances 0.000 abstract description 32
- 229910003468 tantalcarbide Inorganic materials 0.000 abstract description 32
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 abstract description 31
- 238000000034 method Methods 0.000 abstract description 23
- 239000011247 coating layer Substances 0.000 abstract description 18
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 abstract description 15
- 229910052715 tantalum Inorganic materials 0.000 abstract description 10
- 239000006185 dispersion Substances 0.000 abstract description 9
- 238000001652 electrophoretic deposition Methods 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 9
- 150000003482 tantalum compounds Chemical class 0.000 abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 8
- 238000010438 heat treatment Methods 0.000 abstract description 7
- 239000012736 aqueous medium Substances 0.000 abstract description 4
- 239000003960 organic solvent Substances 0.000 abstract description 4
- 229910052751 metal Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 15
- 239000011230 binding agent Substances 0.000 description 10
- 150000001247 metal acetylides Chemical class 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- 235000010443 alginic acid Nutrition 0.000 description 7
- 229920000615 alginic acid Polymers 0.000 description 7
- 229910052799 carbon Inorganic materials 0.000 description 6
- 239000002609 medium Substances 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 229940072056 alginate Drugs 0.000 description 5
- 229910017052 cobalt Inorganic materials 0.000 description 5
- 239000010941 cobalt Substances 0.000 description 5
- -1 for example Chemical compound 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 5
- 229910052721 tungsten Inorganic materials 0.000 description 5
- 239000010937 tungsten Substances 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000001962 electrophoresis Methods 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- FHVDTGUDJYJELY-UHFFFAOYSA-N 6-{[2-carboxy-4,5-dihydroxy-6-(phosphanyloxy)oxan-3-yl]oxy}-4,5-dihydroxy-3-phosphanyloxane-2-carboxylic acid Chemical compound O1C(C(O)=O)C(P)C(O)C(O)C1OC1C(C(O)=O)OC(OP)C(O)C1O FHVDTGUDJYJELY-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 239000011812 mixed powder Substances 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 229910052723 transition metal Inorganic materials 0.000 description 3
- 150000003624 transition metals Chemical class 0.000 description 3
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical compound C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 2
- QIJNJJZPYXGIQM-UHFFFAOYSA-N 1lambda4,2lambda4-dimolybdacyclopropa-1,2,3-triene Chemical compound [Mo]=C=[Mo] QIJNJJZPYXGIQM-UHFFFAOYSA-N 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910039444 MoC Inorganic materials 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 229910026551 ZrC Inorganic materials 0.000 description 2
- OTCHGXYCWNXDOA-UHFFFAOYSA-N [C].[Zr] Chemical compound [C].[Zr] OTCHGXYCWNXDOA-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000005275 alloying Methods 0.000 description 2
- 239000010962 carbon steel Substances 0.000 description 2
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- WHJFNYXPKGDKBB-UHFFFAOYSA-N hafnium;methane Chemical compound C.[Hf] WHJFNYXPKGDKBB-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 150000002823 nitrates Chemical class 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910003470 tongbaite Inorganic materials 0.000 description 2
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910009043 WC-Co Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000010407 ammonium alginate Nutrition 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- VQLYBLABXAHUDN-UHFFFAOYSA-N bis(4-fluorophenyl)-methyl-(1,2,4-triazol-1-ylmethyl)silane;methyl n-(1h-benzimidazol-2-yl)carbamate Chemical compound C1=CC=C2NC(NC(=O)OC)=NC2=C1.C=1C=C(F)C=CC=1[Si](C=1C=CC(F)=CC=1)(C)CN1C=NC=N1 VQLYBLABXAHUDN-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000010310 metallurgical process Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 108060006613 prolamin Proteins 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/02—Electrophoretic coating characterised by the process with inorganic material
Definitions
- the method comprises providing a dispersion of fine powders of tantalum or tantalum compound or mixed fine powders of the same with other materials in water, aqueous medium or organic solvent, applying a direct current voltage to the surface of a workpiece to be coated to thus cause electrophoretic deposition of the fine powders thereon, heating the coated surface at high temperatures in vacuum or in a reducing or inert atmosphere and thereby forming a coating layer consisting mainly of tantalum carbide.
- This invention relates to articles having an ornamental coating which is golden colored, beautiful and hard so that it is hardly scratched and to a method of making such articles.
- Gold platings have a beautiful and gold lustre, but are soft and readily scratched.
- WC-Co cemented carbides called non-scratch, have been used for ornaments, for example, watch frames.
- Electrophoretic deposition has been put to practical use, for example, in coating a surface with an aqueous paint by electrodeposition using water as a dispersing medium or in electrodepositing fine powder of alumina on a heater of electronic tube. Furthermore, the utilization of electrophoretic deposition has been proposed as disclosed in Japanese patent publication No. 8951/1963, US. Pat. No. 3,171,192 and Journal of the Electrochemical Society vol. 109, No. 10, pp. 923-927.
- the feature of the method of forming a coating according to the invention consists in providing a dispersion of fine powders of tantalum or tantalum compounds or mixed fine powders of the same with other materials in water, aqueous medium or organic solvent, immersing a workpiece to be coated as one electrode in said dispersion, applying a direct current voltage of several ten to several hundred volts to said workpiece to thus cause electrophoretic deposition of the fine powders thereon, heating the coated surface at high temperatures in vacuum or in a reducing or inert atmosphere and thereby forming a coating layer consisting mainly of tantalum carbide.
- the materials to be coated according to the invention include cemented carbides such as tungsten carbide-cobalt and tungsten carbide-cobalt with titanium carbide, tantalum carbide, molybdenum carbide, hafnium carbide, zirconium carbide, chromium carbide and/or vanadium carbide, high melting point metals such as tungsten and molybdenum, steels such as stainless steel and carbon steel, cermets and pure iron.
- cemented carbides such as tungsten carbide-cobalt and tungsten carbide-cobalt with titanium carbide, tantalum carbide, molybdenum carbide, hafnium carbide, zirconium carbide, chromium carbide and/or vanadium carbide, high melting point metals such as tungsten and molybdenum, steels such as stainless steel and carbon steel, cermets and pure iron.
- tantalum or a tantalum compound besides tantalum carbide for example, tantalum hydride or tantalum oxide
- the material to be coated contains carbon
- the composition of the thus obtained coating layer comprises tantalum carbide as a main component and a transition metal such as iron group metal or copper as a binder metal.
- a transition metal such as iron group metal or copper
- this binder metal exceeds 50%, the hardness lowers to a large extent. Thus it is desired to hold the binder metal less than 50%.
- carbides besides tantalum carbide, borides and nitrides may be contained therein as far as they do not deteriorate the beautiful color of tantalum carbide.
- Preparation of the above mentioned dispersion of tantalum or tantalum compound may be carried out, as occasion demands, with addition of a small amount of a colloidal ion forming material, for example, alginates such as sodium, calcium, magnesium and ammonium alginates, nitrates such as aluminum nitrate, and sulfates to a dispersing medium, in particular, water or aqueous dispersing medium.
- a tantalum containing electrodeposited film excellent in adhesiveness can be obtained at a low voltage of several ten volts. An amount of about 0.05% based on the dispersing medium is sufficient.
- the alginate added to a dispersing medium is dissociated into alginate ion and metal ion, the alginate ion adhering to tantalum or tantalum compound, for example, tantalum hydride fine grains followed by electrophoresis to the surface of a workpiece to be coated as anode.
- the alginate tends to deposit. During the same time, it becomes a colloid and acts as a paste to strengthen the electrodepositing effect as well as an adhesive between the workpiece and fine powder.
- a film of uniform thickness can be formed on parts of complex shape or sharp angle and the thickness of the electrodeposited film can be freely controlled, for example, ranging from several microns to several hundred microns.
- the coating layer consisting of the electrodeposited fine powder sinters densely and adheres strongly to the base member during the next heating treatment.
- tantalum carbide fine powder an alloying or solid solution making reaction with the surface layer of a workpiece to be coated takes place intimately, whilst, in the case of using tantalum or tantalum compound fine powder besides tantalum carbide, a carbonization reaction with previously mixed carbon, diffused carbon from a workpiece to be coated or carbon in atmosphere proceeds.
- the base member is of cemented carbides, in particular, its binder metal for example, cobalt moves during heating like capilarity and, consequently, the coating layer containing the moved binder metal is obtained.
- a material to be the binder metal may previously be electrodeposited.
- the metal penetrates through tantalum carbide by capilarity, liquid phase sintering taking place, even if the powder to be electrodeposited contains no binder metal.
- a metal capable of forming a low melting point liquid phase with tantalum carbide may previously be plated onto a workpiece.
- Example 1 Tantalum carbide powder of -200 mesh was ballmilled by wet process for 3 hours and dried. g. of the resulting powder was taken and dispersed in a mixed solution of 50 ml. of methylene chloride, 30 ml. of isopropyl alcohol and 20 ml. of nitromethane. 0.1 g. of prolamin was added thereto and stirred for 3 hours.
- a nickel plate was used as anode and an insert (12.7 mm. square, 4.8 mm. thickness) of K20 cemented carbides (WC-7% Co) was held by a narrow copper wire as cathode. 200 volts direct current at milliamperes was applied across the electrodes for 60 seconds to effect electrophoresis. The thus coated insert was then dried in the air and held at 1350 C. for 1 hour in a vacuum furnace mm. Hg).
- the resulting coating layer was a uniform and completely dense layer of about 100 microns, which gave a beautiful golden color when lapped.
- Example 2 A commercially sold tantalum hydride powder of 325 mesh was ball-milled by wet process for 15 hours to obtain a colloidal powder of tantalum hydride. 15 g. of the resulting powder was taken and dispersed in 300 ml. of water. Moreover, I g. of powdered sodium alginate was dissolved in 500 ml. of water to prepare a solution and 10 ml. of this solution was added to the dispersion with agitation. A copper plate was used as cathode and an insert (12.7 mm. square, 4.8 mm. thickness) of K20 cemented carbides (WC-7% Co) was held by a narrow copper wire as anode.
- K20 cemented carbides WC-7% Co
- the resulting coating layer was a uniform layer of about 60 microns, which gave a beautiful golden color when lapped. X-ray diffraction showed nothing on the surface of the insert but the diffraction figure of tantalum carbide.
- Example 3 A commercially sold tantalum hydride powder of 325 mesh was mixed with 5% of Cobalt powder and 6.2% of carbon powder and ball-milled by wet process for 24 hours to obtain a colloidal mixed powder.
- a workpiece of molybdenum was used as anode in place of K20 cemented carbides and subjected to electrodeposition under the similar condition to that of Example 2. The thus coated workpiece was then dried in the air and held at 1350 C. for 30 minutes in a hydrogen furnace.
- the resulting coating layer was a uniform layer of about 50 microns in thickness, which gave a beautiful gold color when lapped.
- Example 4 Tantalum carbide powder of -200 mesh and 10% of electrolytic copper powder of mesh were ball-milled by wet process for 24 hours.
- the colloidal mixed powder was subjected to electrodeposition to a workpiece of carbon steel (0.30% carbon) used as cathode in place of K20 cemented carbides under the similar condition to that of Example 1.
- the thus coated workpiece was then dried in the air and heated at 1150 C. for 20 minutes in a hydrogen furnace.
- the resulting coating layer was lapped to thus give a beautiful golden color.
- a method of making articles having a hard and attractive, golden colored-coating comprising dispersing a fine powder of tantalum carbide in a liquid medium selected from the group consisting of water, an aqueous medium and an organic solvent, immersing a workpiece of WC-base cemented carbides in the dispersion, applying a direct current voltage to the surface of said workpiece to cause electrophoretic deposition of the fine powder of tantalum carbide thereupon, removing the thuscoated workpiece from the dispersion and heating the coated surface at high temperatures in a vacuum or in a reducing or inert atmosphere, thereby forming a coating layer of tantalum carbide on the surface of the workp1ece.
- said workpiece consists of tungsten carbide-cobalt with at least one member selected from the group consisting of titanium carbide, tantalum carbide, molybdenum carbide, hafnium carbide, zirconium carbide, chromium carbide and vanadium carbide.
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- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Powder Metallurgy (AREA)
Abstract
BEAUTIFUL AND GOLDEN COLORED ARTICLES ARE EFFECTIVELY MADE BY COATING OF TANTALUM CARBIDE ACCORDING TO THE INVENTION. THE COATING IS SO HARD THAT IT IS HARDLY SCRATCHED. THE METHOD COMPRISES PROVIDING A DISPERSION OF FINE POWDERS OF TANTALUM OR TANTALUM COMPOUND OR MIXED FINE POWDERS OF THE SAME WITH OTHER MATERIALS IN WATER AQUEOUS MEDIUM OR ORGANIC SOLVENT, APPLYING A DIRECT CURRENT VOLTAGE TO THE SURFACE OF A WORKPIECE TO BE COATED TO THUS CAUSE ELECTROPHORETIC DEPOSITION OF THE FINE POWDERS THEREON, HEATING THE COATED SURFACE AT HIGH TEMPERATURES IN VACUUM OR IN A REDUCING OR INERT ATMOSPHERE AND THEREBY FORMING A COATING LAYER CONSISTING MAINLY OF TANTALUM CARBIDE.
Description
United States Patent 3,749,656 METHOD OF MAKING AN ARTICLE HAVING A HARD AND ORNAMENTA'L COATING Akio Hara and Shuji Yazu, Itami, .lapan, assignors to Sumitomo Electric Industries, Ltd., Osaka, Japan N0 Drawing. Filed Apr. 12, 1971, Ser. No. 133,382 Claims priority, application Japan, Apr. 20, 1970, 45/32,950 Int. Cl. B01k 5/02; C23b 13/00 US. Cl. 204-181 9 Claims ABSTRACT OF THE DISCLOSURE Beautiful and golden colored articles are effectively made by coating of tantalum carbide according to the invention. The coating is so hard that it is hardly scratched. The method comprises providing a dispersion of fine powders of tantalum or tantalum compound or mixed fine powders of the same with other materials in water, aqueous medium or organic solvent, applying a direct current voltage to the surface of a workpiece to be coated to thus cause electrophoretic deposition of the fine powders thereon, heating the coated surface at high temperatures in vacuum or in a reducing or inert atmosphere and thereby forming a coating layer consisting mainly of tantalum carbide.
BRIEF SUMMARY OF THE INVENTION This invention relates to articles having an ornamental coating which is golden colored, beautiful and hard so that it is hardly scratched and to a method of making such articles.
Gold platings have a beautiful and gold lustre, but are soft and readily scratched. Of late, WC-Co cemented carbides, called non-scratch, have been used for ornaments, for example, watch frames.
It is an object of the invention to provide parts or articles having a coating layer consisting mainly of tantalum carbide, based on the fact that tantalum carbide has a beautiful and gold color.
The above mentioned parts or articles of the invention are favourably compared with those the whole of which consists of an alloy consisting mainly of tantalum carbide in the following points:
(1) Very expensive tantalum carbide can be saved and, therefore, the production cost of equivalent articles is markedly reduced.
(2) Since TaC base alloys are very hard, articles consisting mainly of the same produced by the powder metallurgical or melting process are hardly machinable. For ornaments, in particular, there are various size and complex shaped articles, which are hardly machinable. This disadvantage can be overcome by selecting suitably a high machinability workpiece to be coated according to the invention, which is previously machined into a desirable shape.
It is another object of the invention to provide a method of forming a coating layer consisting mainly of tantalum carbide.
As a method of coating high melting point metals, graphites and steels with TaC base alloys, plasma melt spraying and electroplating are well known. In the method by melt spraying, the adhesive strength between a base member and coating layer and the strength of a coating layer itself are not sufficient. This method cannot be applied to base members of complex shape and, further, requires expensive apparatus. In the method by electroplating, on the other hand, carbide grains such as tantalum carbide are deposited simultaneously with electroplating of a binder metal such as nickel, resulting in that the quantity of the binder metal in a coating is so much that the color peculiar to tantalum carbide is lost.
3,749,656 Patented July 31, 1973 In the method utilizing electrophoretic deposition ac cording to the invention, a very dense, uniform and beautiful coating layer consisting mainly of tantalum carbide is economically obtained. Electrophoretic deposition has been put to practical use, for example, in coating a surface with an aqueous paint by electrodeposition using water as a dispersing medium or in electrodepositing fine powder of alumina on a heater of electronic tube. Furthermore, the utilization of electrophoretic deposition has been proposed as disclosed in Japanese patent publication No. 8951/1963, US. Pat. No. 3,171,192 and Journal of the Electrochemical Society vol. 109, No. 10, pp. 923-927.
DETAILED DESCRIPTION OF THE INVENTION We, the inventors, have succeeded in, by utilization of the electrophoretic deposition of this kind, that powders of tantalum or tantalum compounds, or their mixed powder with other materials are bonded to a base member such as high melting point materials, heat resistant alloys, cemented carbides, cermets, steels and pure iron and then subjected to a high temperature treatment at 1000 C. or higher, thereby promoting alloying reaction or solid solution making reaction of the bonded powder layer with the surface layer of the base member. That is to say, the feature of the method of forming a coating according to the invention consists in providing a dispersion of fine powders of tantalum or tantalum compounds or mixed fine powders of the same with other materials in water, aqueous medium or organic solvent, immersing a workpiece to be coated as one electrode in said dispersion, applying a direct current voltage of several ten to several hundred volts to said workpiece to thus cause electrophoretic deposition of the fine powders thereon, heating the coated surface at high temperatures in vacuum or in a reducing or inert atmosphere and thereby forming a coating layer consisting mainly of tantalum carbide.
The materials to be coated according to the invention include cemented carbides such as tungsten carbide-cobalt and tungsten carbide-cobalt with titanium carbide, tantalum carbide, molybdenum carbide, hafnium carbide, zirconium carbide, chromium carbide and/or vanadium carbide, high melting point metals such as tungsten and molybdenum, steels such as stainless steel and carbon steel, cermets and pure iron.
When tantalum or a tantalum compound besides tantalum carbide, for example, tantalum hydride or tantalum oxide is used, it is necessary to form tantalum carbide during the step of heating. In case where the material to be coated contains carbon, it is not necessary always to add fine powder of carbon, but, in general, a predetermined amount of fine carbon powder is preferably added to a starting powder followed by electrophoretic deposition.
The composition of the thus obtained coating layer comprises tantalum carbide as a main component and a transition metal such as iron group metal or copper as a binder metal. When this binder metal exceeds 50%, the hardness lowers to a large extent. Thus it is desired to hold the binder metal less than 50%. Moreover, carbides besides tantalum carbide, borides and nitrides may be contained therein as far as they do not deteriorate the beautiful color of tantalum carbide.
Preparation of the above mentioned dispersion of tantalum or tantalum compound may be carried out, as occasion demands, with addition of a small amount of a colloidal ion forming material, for example, alginates such as sodium, calcium, magnesium and ammonium alginates, nitrates such as aluminum nitrate, and sulfates to a dispersing medium, in particular, water or aqueous dispersing medium. In this case, a tantalum containing electrodeposited film excellent in adhesiveness can be obtained at a low voltage of several ten volts. An amount of about 0.05% based on the dispersing medium is sufficient. In the case of alginate, the alginate added to a dispersing medium is dissociated into alginate ion and metal ion, the alginate ion adhering to tantalum or tantalum compound, for example, tantalum hydride fine grains followed by electrophoresis to the surface of a workpiece to be coated as anode. With increase of the concentration of the dispersing system through aggregation of the power approaching the surface of a workpiece, the alginate tends to deposit. During the same time, it becomes a colloid and acts as a paste to strengthen the electrodepositing effect as well as an adhesive between the workpiece and fine powder.
In accordance with the method of coating fine powders of tantalum or tantalum compound utilizing electrophoresis, a film of uniform thickness can be formed on parts of complex shape or sharp angle and the thickness of the electrodeposited film can be freely controlled, for example, ranging from several microns to several hundred microns. The coating layer consisting of the electrodeposited fine powder sinters densely and adheres strongly to the base member during the next heating treatment. This is the most important effect of the invention, resulting in a coating layer more excellent in hardness and beauty as compared with the known method wherein a metallic layer is formed on a base member directly or by gaseous phase deposition or by electroplating and then heated at a high temperature to form a coating layer consisting of a solid solution carbide as disclosed in French Pat. 1,525,512.
In the case of using tantalum carbide fine powder, an alloying or solid solution making reaction with the surface layer of a workpiece to be coated takes place intimately, whilst, in the case of using tantalum or tantalum compound fine powder besides tantalum carbide, a carbonization reaction with previously mixed carbon, diffused carbon from a workpiece to be coated or carbon in atmosphere proceeds. When the base member is of cemented carbides, in particular, its binder metal for example, cobalt moves during heating like capilarity and, consequently, the coating layer containing the moved binder metal is obtained. Of course, a material to be the binder metal may previously be electrodeposited. When a workpiece to be coated and tantalum carbide form a low melting point liquid phase, the metal penetrates through tantalum carbide by capilarity, liquid phase sintering taking place, even if the powder to be electrodeposited contains no binder metal. In this case also, a metal capable of forming a low melting point liquid phase with tantalum carbide may previously be plated onto a workpiece.
The following examples are given in order to illustrate the invention in detail without limiting the same.
Example 1 Tantalum carbide powder of -200 mesh was ballmilled by wet process for 3 hours and dried. g. of the resulting powder was taken and dispersed in a mixed solution of 50 ml. of methylene chloride, 30 ml. of isopropyl alcohol and 20 ml. of nitromethane. 0.1 g. of prolamin was added thereto and stirred for 3 hours. A nickel plate was used as anode and an insert (12.7 mm. square, 4.8 mm. thickness) of K20 cemented carbides (WC-7% Co) was held by a narrow copper wire as cathode. 200 volts direct current at milliamperes was applied across the electrodes for 60 seconds to effect electrophoresis. The thus coated insert was then dried in the air and held at 1350 C. for 1 hour in a vacuum furnace mm. Hg).
The resulting coating layer was a uniform and completely dense layer of about 100 microns, which gave a beautiful golden color when lapped.
Example 2 A commercially sold tantalum hydride powder of 325 mesh was ball-milled by wet process for 15 hours to obtain a colloidal powder of tantalum hydride. 15 g. of the resulting powder was taken and dispersed in 300 ml. of water. Moreover, I g. of powdered sodium alginate was dissolved in 500 ml. of water to prepare a solution and 10 ml. of this solution was added to the dispersion with agitation. A copper plate was used as cathode and an insert (12.7 mm. square, 4.8 mm. thickness) of K20 cemented carbides (WC-7% Co) was held by a narrow copper wire as anode. 10 volts direct current at 0.5 milliampere was applied across the electrodes for 60 seconds to effect electrophoresis. The thus coated insert was then dried in the air and held at 1350 C. for 1 hour in a vacuum furnace (l0- mm. Hg).
The resulting coating layer was a uniform layer of about 60 microns, which gave a beautiful golden color when lapped. X-ray diffraction showed nothing on the surface of the insert but the diffraction figure of tantalum carbide.
Example 3 A commercially sold tantalum hydride powder of 325 mesh was mixed with 5% of Cobalt powder and 6.2% of carbon powder and ball-milled by wet process for 24 hours to obtain a colloidal mixed powder. A workpiece of molybdenum was used as anode in place of K20 cemented carbides and subjected to electrodeposition under the similar condition to that of Example 2. The thus coated workpiece was then dried in the air and held at 1350 C. for 30 minutes in a hydrogen furnace.
The resulting coating layer was a uniform layer of about 50 microns in thickness, which gave a beautiful gold color when lapped.
Example 4 Tantalum carbide powder of -200 mesh and 10% of electrolytic copper powder of mesh were ball-milled by wet process for 24 hours. The colloidal mixed powder was subjected to electrodeposition to a workpiece of carbon steel (0.30% carbon) used as cathode in place of K20 cemented carbides under the similar condition to that of Example 1. The thus coated workpiece was then dried in the air and heated at 1150 C. for 20 minutes in a hydrogen furnace. The resulting coating layer was lapped to thus give a beautiful golden color.
What is claimed is:
1. A method of making articles having a hard and attractive, golden colored-coating comprising dispersing a fine powder of tantalum carbide in a liquid medium selected from the group consisting of water, an aqueous medium and an organic solvent, immersing a workpiece of WC-base cemented carbides in the dispersion, applying a direct current voltage to the surface of said workpiece to cause electrophoretic deposition of the fine powder of tantalum carbide thereupon, removing the thuscoated workpiece from the dispersion and heating the coated surface at high temperatures in a vacuum or in a reducing or inert atmosphere, thereby forming a coating layer of tantalum carbide on the surface of the workp1ece.
2. The method of claim 1 wherein a small amount of at least one member selected from the group consisting of alginates, nitrates and sulfates is added to said dispersion.
3. The method of claim 1 wherein carbon powder is added to said fine powder.
4. The method of claim 1 wherein at least one transition metal is added to said fine powder as a binder metal.
5. The method of claim 1 wherein said workpiece is previously coated with at least one transition metal.
6. The articles having a hard and ornamental coating, produced by the method of claim 1.
7. The method of claim 1 wherein said workpiece con sists of tungsten carbide-cobalt.
8. The method of claim 1 wherein said workpiece consists of tungsten carbide-cobalt with at least one member selected from the group consisting of titanium carbide, tantalum carbide, molybdenum carbide, hafnium carbide, zirconium carbide, chromium carbide and vanadium carbide.
9. A method according to claim 1 wherein the coated References Cited UNITED STATES PATENTS 12/ 1948 Williams 25027.5
11/1951 Levin 204181 X 8/1958 Fahnoe et al 204181 X 10/1958 FahnOe et a1 204-181 X 10/1966 Lynch 11746 CC 2/1967 Lewis et a1 23-208 A X 10/1969 Ramirez 204181 X JOHN H. MACK, Primary Examiner A. C. PRESCOTT, Assistant Examiner US. Cl. X.R.
workpiece is heated to a temperature of at least 1000 C. 15 117-46 CB, 46 CC, 46 CG, 61, 93.4
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP45032950A JPS5215605B1 (en) | 1970-04-20 | 1970-04-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3749656A true US3749656A (en) | 1973-07-31 |
Family
ID=12373206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US00133382A Expired - Lifetime US3749656A (en) | 1970-04-20 | 1971-04-12 | Method of making an article having a hard and ornamental coating |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US3749656A (en) |
| JP (1) | JPS5215605B1 (en) |
| CH (1) | CH521864A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011007019A1 (en) * | 2009-07-15 | 2011-01-20 | Fundacion Cidetec | Method for obtaining a ceramic coating by means of electroforetic deposition |
| US9896384B2 (en) | 2014-06-17 | 2018-02-20 | University Of Utah Research Foundation | Methods of sintering dense zeta-phase tantalum carbide |
-
1970
- 1970-04-20 JP JP45032950A patent/JPS5215605B1/ja active Pending
-
1971
- 1971-04-12 US US00133382A patent/US3749656A/en not_active Expired - Lifetime
- 1971-04-20 CH CH573271A patent/CH521864A/en not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011007019A1 (en) * | 2009-07-15 | 2011-01-20 | Fundacion Cidetec | Method for obtaining a ceramic coating by means of electroforetic deposition |
| US9896384B2 (en) | 2014-06-17 | 2018-02-20 | University Of Utah Research Foundation | Methods of sintering dense zeta-phase tantalum carbide |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5215605B1 (en) | 1977-05-02 |
| DE2119154A1 (en) | 1971-11-04 |
| CH521864A (en) | 1972-04-30 |
| DE2119154B2 (en) | 1977-03-10 |
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