US3719854A - Tungsten alloy x-ray target - Google Patents

Tungsten alloy x-ray target Download PDF

Info

Publication number
US3719854A
US3719854A US00053334A US3719854DA US3719854A US 3719854 A US3719854 A US 3719854A US 00053334 A US00053334 A US 00053334A US 3719854D A US3719854D A US 3719854DA US 3719854 A US3719854 A US 3719854A
Authority
US
United States
Prior art keywords
tungsten
percent
target
ray
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US00053334A
Inventor
K Sedlatschek
R Machenschalk
B Natter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schwarzkopf Technologies Corp
Original Assignee
Schwarzkopf Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schwarzkopf Technologies Corp filed Critical Schwarzkopf Technologies Corp
Application granted granted Critical
Publication of US3719854A publication Critical patent/US3719854A/en
Anticipated expiration legal-status Critical
Assigned to SCHWARZKOPF TECHNOLOGIES CORPORATION, A CORP. OF MD reassignment SCHWARZKOPF TECHNOLOGIES CORPORATION, A CORP. OF MD CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). EFFECTIVE ON 05/21/1991 Assignors: SCHWARZKOPF DEVELOPMENT CORPORATION, A CORP. OF MD
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12778—Alternative base metals from diverse categories
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
    • Y10T428/12826—Group VIB metal-base component
    • Y10T428/12833—Alternative to or next to each other
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
    • Y10T428/12826—Group VIB metal-base component
    • Y10T428/1284—W-base component

Definitions

  • ABSTRACT This invention relates to alloys useful in X-ray targets comprising tungsten and one or more of technetium, rhodium, ruthenium and palladium.
  • the portion of the surface of the target that is bombarded by electrons can be referred to as the focal track.
  • the material of which the target surface area of focal track is produced is quite important.
  • the material must be of the proper type to both withstand the temperatures of operation and to be an X-ray emitter of sufficient intensity.
  • the material must have sufficient ductility to withstand conditions of repeated operation.
  • One of the problems frequently encountered with X-ray targets is the roughening of the surface thereby diminishing the efficiency of X-ray emission and rendering emission erratic.
  • Tungsten is a material commonly used in X-ray targets because of its high melting point, high density and large atomic number.
  • the performance of tungsten can be improved by using alloying additions of other transition metals with high melting point and atomic number such as rhenium, osmium, iridium and platinum.
  • Such alloying additives have been found to reduce roughening and permit longer use as well as higher loads without excess dose losses.
  • the present invention involves the discovery that an even greater improvement in the performance of X-ray targets can be achieved by the alloying with tungsten of a small quantity of one or more of technetium, rhodium, ruthenium and palladium.
  • the resultant alloy yields significant and unexpected advantages to tungsten X-ray targets despite the fact that their atomic numbers are lower than tungsten and lower than those of the previously used alloying additives.
  • the primary improvement is that much less roughening of the surface occurs with the tungsten alloys of this invention upon exposure to service as compared to tungsten alone.
  • X-ray targets made of a tungsten-rhenium alloy are particularly satisfactory for use and they, too, are improved in the same fashion by the addition of a small quantity of one or more of the alloying additives of this invention.
  • X-ray targets made of tungsten and one or more of osmium, iridium and platinum with or without rhenium are also improved.
  • the entire target need not be made of the tungsten alloys of this invention but, instead, the target can be a composite of a base having applied thereon a thin focal track, i.e., a surface of bombardment of electrons, made of the tungsten alloys of this invention.
  • Molybdenum is a suitable material for a base of this type.
  • Other bases including tungsten itself or tungsten-molybdenum alloys may also be employed as is conventional in the art.
  • the base may be made of graphite.
  • an intermediate layer between the graphite and the tungsten alloy for the purpose of preventing the formation of the brittle tungsten carbide.
  • a suitable intermediate layer can be made of such materials as, for example, rhenium or osmium. Such an intermediate layer should have a thickness on the order of2 to 10 microns.
  • the total thickness of the tungsten alloy layer in the focal track should be between about 0.1 mm and A typical rotating X-ray target of the type that could be used in commercial X-ray tubes will have a molybdenum base of approximately 6 mm thickness and a focal track of the tungsten alloy of this invention of approximately 1.2 mm thickness.
  • the amount of alloying additive employed in the tungsten alloys of this invention need not be very great.
  • the content of technetium, rhodium, ruthenium and palladium in the tungsten alloy may be as low as about 0.01 percent by weight.
  • the upper limit is determined by the solubility of the alloying additives in tungsten, e.g., 20 percent for technetium, 5 percent for rhodium, 15 percent for ruthenium and 4 percent for palladium, all by weight.
  • the best results are generally achieved when the tungsten alloy contains from about 0.1 to about 5 percent weight of ruthenium or technetium or from about 0.1 to about 2 percent by weight of rhodium or palladium.
  • the total quantity should not exceed 5 percent by weight of the alloy.
  • the tungsten alloys of the invention can also contain up to about 10 percent rhenium for the purpose of improving physical properties such as, for example, the cold ductility of the alloy. Where rhenium is employed, the minimum amount of rhenium to have an appreciable effect should be at least about 0.5 percent by weight of the alloy. Similarly, where desired, amounts of up to 5 percent osmium, up to 5 percent platinum and up to 2 percent iridium by weight can be present in the alloy of this invention for the purpose of improving target performance. Where osmium is employed, a minimum of about 0.1 percent by weight can be used, and where platinum or iridium is employed, a minimum of about 0.05 percent by weight can be used.
  • the method of producing the alloy of the invention is conveniently carried out by powder metallurgical techniques.
  • powders of the various alloy components can be mixed together, compressed and sintered under vacuum or inert atmosphere at an appropriate sintering temperature to cause alloy formation.
  • the sintering temperature will generally be in the range of from about l600 to 2400 C., preferably on the order of about 2000 C.
  • the tungsten alloys can be first formed by any conventional technique and applied to the base of the target by flame spraying, by vapor deposition and subsequent diffusion annealing or by any other method that is convenient.
  • tungsten powder is desired for use in a powder metallurgical system, it can be obtained conveniently by reducing a mixture of a powdered tungsten compound such as tungsten trioxide or ammonium tungstate.
  • the other alloying components can be obtained by conventional means.
  • powders employed can have particle sizes in the range of l to 50 microns.
  • a convenient rotating target for use in an X-ray tube can be made, for example, by preparing a die and filling it to the predetermined level with molybdenum powder of particle size range 2 to microns, i.e., where a molybdenum base is desired for the target. On top of this, a homogeneous mixture of 2 to 10 microns tungsten powder and 1.5 percent by weight of l to 6 microns rhodium powder is placed in the die. Thereupen a pressure of about 4 tons per square centimeter is employed to compact the powder in the die. The green compacts thus formed are then sintered under a high degree of vacuum or in an inert atmosphere such as hydrogen, helium or argon, at a temperature of about 2000 C. for 2 hours, and thereupon cooled under the protective atmosphere. The anode is then given its final shape by forging and grinding.
  • molybdenum powder of particle size range 2 to microns i.e., where a molybdenum base
  • X-ray tube target comprising a base and a focal track positioned thereon for electron impact, said focal track having enhanced resistance to roughening under electron bombardment as a result of fabrication from an alloy comprising tungsten with at least one alloying additive from the group consisting of technetium, rhodium and ruthenium.
  • An X-ray target as in claim 1 also having alloyed with tungsten an amount of rhenium of up to 10 percent by weight of the tungsten alloy.

Landscapes

  • Powder Metallurgy (AREA)
  • Solid Thermionic Cathode (AREA)

Abstract

This invention relates to alloys useful in X-ray targets comprising tungsten and one or more of technetium, rhodium, ruthenium and palladium.

Description

United States Patent 1 Sedlatschek et a1.
[ 1 March 6, 1973 1 1 TUNGSTEN ALLOY X-RAY TARGET [75] Inventors: Karl Sedlatschek; Rudolf A. Machenschalk; Bernd Natter, all of Reutte/Tirol, Austria [73] Assignee: Schwarzkopf Development Corporation, New York, NY.
22 Filed: July 8,1970
21 App1.No.:53,334
[30} Foreign Application Priority Data [58] Field of Search .....313/330, 55, 60, 311; 75/176 [56] References Cited UNITED STATES PATENTS 8/1968 Elsas ..313/330 11/1970 Bougle ..313/330 FOREIGN PATENTS OR APPLICATIONS 1,032,118 6/1966 Great Britain ..313/330 OTHER PUBLICATIONS Goetz et al., A Constitution Diagram for the Tungsten-Palladium System." 61 Chem. Abstracts 5310b (1964) Merrimen et al., Preparation of Unusual Refractory Powders by Flame Processes. 68 Chem. Abstract 32502k (1968) Goetz et al., A Constitution Diagram for the Tungsten-Palladium System. J. Less-Common Metals, Vol. 6, No. 5, 345-53 (1964).
Merrimen et a1., Preparation of Unusual Refractory Powders by Flame Processes," Proc. Conf. Chem. Vapor Deposition Refract. Metals (1967).
Hayden et al., The Activated Sintering of Tungsten with Group VIII Elements," Journal of the Electrochemical Society, Vol. 110, No. 7, July 1963, pp. 805-810.
Primary Examiner-David Schonberg Assistant Examiner-Paul R. Miller Attorney-Morgan, Finnegan, Durham & Pine [57] ABSTRACT This invention relates to alloys useful in X-ray targets comprising tungsten and one or more of technetium, rhodium, ruthenium and palladium.
16 Claims, No Drawings TUNGSTEN ALLOY X-RAY TARGET X-ray equipment is in wide use for a variety of purposes. Various means are employed to bombard electrons onto a positively charged surface which is conveniently referred to either as an anode or as an X-ray target. There are various types of targets available on the market. These include stationary targets and rotating targets. In general, the X-rays are produced when the electrons hit the surface of the anode or target under appropriate X-ray generating conditions.
The portion of the surface of the target that is bombarded by electrons can be referred to as the focal track.
The material of which the target surface area of focal track is produced is quite important. The material must be of the proper type to both withstand the temperatures of operation and to be an X-ray emitter of sufficient intensity. In addition, the material must have sufficient ductility to withstand conditions of repeated operation. One of the problems frequently encountered with X-ray targets is the roughening of the surface thereby diminishing the efficiency of X-ray emission and rendering emission erratic.
Tungsten is a material commonly used in X-ray targets because of its high melting point, high density and large atomic number. The performance of tungsten can be improved by using alloying additions of other transition metals with high melting point and atomic number such as rhenium, osmium, iridium and platinum. Such alloying additives have been found to reduce roughening and permit longer use as well as higher loads without excess dose losses.
The present invention involves the discovery that an even greater improvement in the performance of X-ray targets can be achieved by the alloying with tungsten of a small quantity of one or more of technetium, rhodium, ruthenium and palladium. The resultant alloy yields significant and unexpected advantages to tungsten X-ray targets despite the fact that their atomic numbers are lower than tungsten and lower than those of the previously used alloying additives. Even very small quantities of the alloying additives of this invention, on the order of one-tenth of one per cent by weight, when alloyed with tungsten, produce X-ray targets that are characterized by a noticeably improved service life. The primary improvement is that much less roughening of the surface occurs with the tungsten alloys of this invention upon exposure to service as compared to tungsten alone. X-ray targets made of a tungsten-rhenium alloy are particularly satisfactory for use and they, too, are improved in the same fashion by the addition of a small quantity of one or more of the alloying additives of this invention. Also improved by the addition of a small quantity of the alloying additive of this invention are X-ray targets made of tungsten and one or more of osmium, iridium and platinum with or without rhenium.
As is the case in known X-ray targets, for example, in rotating targets, the entire target need not be made of the tungsten alloys of this invention but, instead, the target can be a composite of a base having applied thereon a thin focal track, i.e., a surface of bombardment of electrons, made of the tungsten alloys of this invention. Molybdenum is a suitable material for a base of this type. Other bases including tungsten itself or tungsten-molybdenum alloys may also be employed as is conventional in the art. For example, the base may be made of graphite. However, where a graphite base is employed, there should be an intermediate layer between the graphite and the tungsten alloy for the purpose of preventing the formation of the brittle tungsten carbide. A suitable intermediate layer can be made of such materials as, for example, rhenium or osmium. Such an intermediate layer should have a thickness on the order of2 to 10 microns.
Where a composite X-ray target is employed made of a base and a focal track of the tungsten alloy of this invention, the total thickness of the tungsten alloy layer in the focal track should be between about 0.1 mm and A typical rotating X-ray target of the type that could be used in commercial X-ray tubes will have a molybdenum base of approximately 6 mm thickness and a focal track of the tungsten alloy of this invention of approximately 1.2 mm thickness.
The amount of alloying additive employed in the tungsten alloys of this invention need not be very great. The content of technetium, rhodium, ruthenium and palladium in the tungsten alloy may be as low as about 0.01 percent by weight. The upper limit is determined by the solubility of the alloying additives in tungsten, e.g., 20 percent for technetium, 5 percent for rhodium, 15 percent for ruthenium and 4 percent for palladium, all by weight. The best results are generally achieved when the tungsten alloy contains from about 0.1 to about 5 percent weight of ruthenium or technetium or from about 0.1 to about 2 percent by weight of rhodium or palladium. Preferably, where mixtures of alloying additives of this invention are employed, the total quantity should not exceed 5 percent by weight of the alloy.
The tungsten alloys of the invention can also contain up to about 10 percent rhenium for the purpose of improving physical properties such as, for example, the cold ductility of the alloy. Where rhenium is employed, the minimum amount of rhenium to have an appreciable effect should be at least about 0.5 percent by weight of the alloy. Similarly, where desired, amounts of up to 5 percent osmium, up to 5 percent platinum and up to 2 percent iridium by weight can be present in the alloy of this invention for the purpose of improving target performance. Where osmium is employed, a minimum of about 0.1 percent by weight can be used, and where platinum or iridium is employed, a minimum of about 0.05 percent by weight can be used.
The method of producing the alloy of the invention is conveniently carried out by powder metallurgical techniques. For example, powders of the various alloy components can be mixed together, compressed and sintered under vacuum or inert atmosphere at an appropriate sintering temperature to cause alloy formation. The sintering temperature will generally be in the range of from about l600 to 2400 C., preferably on the order of about 2000 C. Alternatively, the tungsten alloys can be first formed by any conventional technique and applied to the base of the target by flame spraying, by vapor deposition and subsequent diffusion annealing or by any other method that is convenient.
Where tungsten powder is desired for use in a powder metallurgical system, it can be obtained conveniently by reducing a mixture of a powdered tungsten compound such as tungsten trioxide or ammonium tungstate. The other alloying components can be obtained by conventional means. In general, powders employed can have particle sizes in the range of l to 50 microns.
A convenient rotating target for use in an X-ray tube can be made, for example, by preparing a die and filling it to the predetermined level with molybdenum powder of particle size range 2 to microns, i.e., where a molybdenum base is desired for the target. On top of this, a homogeneous mixture of 2 to 10 microns tungsten powder and 1.5 percent by weight of l to 6 microns rhodium powder is placed in the die. Thereupen a pressure of about 4 tons per square centimeter is employed to compact the powder in the die. The green compacts thus formed are then sintered under a high degree of vacuum or in an inert atmosphere such as hydrogen, helium or argon, at a temperature of about 2000 C. for 2 hours, and thereupon cooled under the protective atmosphere. The anode is then given its final shape by forging and grinding.
What is claimed is:
1. X-ray tube target comprising a base and a focal track positioned thereon for electron impact, said focal track having enhanced resistance to roughening under electron bombardment as a result of fabrication from an alloy comprising tungsten with at least one alloying additive from the group consisting of technetium, rhodium and ruthenium.
2. An X-ray target as in claim 1 wherein the amount of alloying additive is within the range from about 0.01 percent by weight of the tungsten alloy to the maximum solubility of the additive in tungsten.
3. An X-ray target as in claim 1 wherein the alloying additive is rhodium.
4. An S-ray target as in claim 3 wherein the rhodium is present in an amount of up to 5 percent by weight of the tungsten alloy.
5. An alloying additive as in claim 3 wherein the rhodium is present in an amount from 0.1 percent to 2 percent by weight of the tungsten alloy.
6. An X-ray target as in claim 1 wherein the alloying additive is technetium.
7. An X-ray target as in claim 6 wherein the technetium is present in an amount of up to 20 percent by weight of the tungsten alloy.
8. An alloying additive as in claim 6 wherein the technetium is present in an amount of 0.1 to 5 percent by weight of the tungsten alloy.
9. An X-ray target as in claim 1 wherein the alloying additive is ruthenium.
10. An X-ray target as in' claim 9 wherein the ruthenium is present in an amount of up to 15 percent by weight of the tungsten alloy.
11. An alloying additive as in claim 9 wherein the ruthenium is present in an amount from 0.1 to 5 percent by weight of the tungsten alloy.
12. An X-ray target as in claim 1 also having alloyed with tungsten an amount of rhenium of up to 10 percent by weight of the tungsten alloy.
13. An X-ray tube target as in claim 1 wherein the said alloy also contains minor amounts of at least one metal from the group consisting of rhenium, platinum, iridium a'nd osmium.
14. An X-ray tube target as in claim 13 wherein the base comprises molybdenum.
15. An X-ray tube target as In claim 13 wherein the base comprises graphite.
16. An X-ray tube target as in claim 15 wherein there is an intermediate layer interposed between the graphite and the focal track, said intermediate layer being of a material capable of preventing reaction between tungsten and graphite.

Claims (15)

1. X-ray tube target comprising a base and a focal track positioned thereon for electron impact, said focal track having enhanced resistance to roughening under electron bombardment as a result of fabrication from an alloy comprising tungsten with at least one alloying additive from the group consisting of technetium, rhodium and ruthenium.
2. An X-ray target as in claim 1 wherein the amount of alloying additive is within the range from about 0.01 percent by weight of the tungsten alloy to the maximum solubility of the additive in tungsten.
3. An X-ray target as in claim 1 wherein the alloying additive is rhodium.
4. An S-ray target as in claim 3 wherein the rhodium is present in an amount of up to 5 percent by weight of the tungsten alloy.
5. An alloying additive as in claim 3 wherein the rhodium is present in an amount from 0.1 percent to 2 percent by weight of the tungsten alloy.
6. An X-ray target as in claim 1 wherein the alloying additive is technetium.
7. An X-ray target as in claim 6 wherein the technetium is present in an amount of up to 20 percent by weight of the tungsten alloy.
8. An alloying additive as in claim 6 wherein the technetium is present in an amount of 0.1 to 5 percent by weight of the tungsten alloy.
9. An X-ray target as in claim 1 wherein the alloying additive is ruthenium.
10. An X-ray target as in claim 9 wherein the ruthenium is present in an amount of up to 15 percent by weight of the tungsten alloy.
11. An alloying additive as in claim 9 wherein the ruthenium is present in an amount from 0.1 to 5 percent by weight of the tungsten alloy.
12. An X-ray target as in claim 1 also having alloyed with tungsten an amount of rhenium of up to 10 percent by weight of the tungsten alloy.
13. An X-ray tube target as in claim 1 wherein the said alloy also contains minor amounts of at least one metal from the group consisting of rhenium, platinum, iridium and osmium.
14. An X-ray tube target as in claim 13 wherein the base comprises molybdenum.
15. An X-ray tube target as in claim 13 wherein the base comprises graphite.
US00053334A 1969-07-24 1970-07-08 Tungsten alloy x-ray target Expired - Lifetime US3719854A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT716969A AT289967B (en) 1969-07-24 1969-07-24 Anode for X-ray tubes

Publications (1)

Publication Number Publication Date
US3719854A true US3719854A (en) 1973-03-06

Family

ID=3593363

Family Applications (1)

Application Number Title Priority Date Filing Date
US00053334A Expired - Lifetime US3719854A (en) 1969-07-24 1970-07-08 Tungsten alloy x-ray target

Country Status (7)

Country Link
US (1) US3719854A (en)
AT (1) AT289967B (en)
CH (1) CH504778A (en)
DE (1) DE2025578A1 (en)
FR (1) FR2054101A5 (en)
GB (1) GB1264566A (en)
NL (1) NL7010850A (en)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3836808A (en) * 1972-06-28 1974-09-17 Siemens Ag Rotary anode for an x-ray tube
US3894239A (en) * 1973-09-04 1975-07-08 Raytheon Co Monochromatic x-ray generator
US4004174A (en) * 1973-11-02 1977-01-18 Tokyo Shibaura Electric Co., Ltd. Rotary anode structure for an X-ray tube
US4119879A (en) * 1977-04-18 1978-10-10 General Electric Company Graphite disc assembly for a rotating x-ray anode tube
FR2388402A1 (en) * 1977-04-18 1978-11-17 Gen Electric COMPOSITE SUBSTRATE FOR X-RAY TUBE ROTATING ANODE
USRE31369E (en) * 1977-04-18 1983-09-06 General Electric Company Method for joining an anode target comprising tungsten to a graphite substrate
USRE31560E (en) * 1977-04-18 1984-04-17 General Electric Company Graphite disc assembly for a rotating x-ray anode tube
USRE31568E (en) * 1977-04-18 1984-04-24 General Electric Company Composite substrate for rotating x-ray anode tube
US4641334A (en) * 1985-02-15 1987-02-03 General Electric Company Composite rotary anode for X-ray tube and process for preparing the composite
US4645121A (en) * 1985-02-15 1987-02-24 General Electric Company Composite rotary anode for X-ray tube and process for preparing the composite
US4689810A (en) * 1985-02-15 1987-08-25 General Electric Company Composite rotary anode for X-ray tube and process for preparing the composite
US4777643A (en) * 1985-02-15 1988-10-11 General Electric Company Composite rotary anode for x-ray tube and process for preparing the composite
US4920012A (en) * 1989-06-09 1990-04-24 General Electric Company Articles having coatings of fine-grained and/or equiaxed grain structure
US5204891A (en) * 1991-10-30 1993-04-20 General Electric Company Focal track structures for X-ray anodes and method of preparation thereof
US6045682A (en) * 1998-03-24 2000-04-04 Enthone-Omi, Inc. Ductility agents for nickel-tungsten alloys
US6237677B1 (en) 1999-08-27 2001-05-29 Delphi Technologies, Inc. Efficiency condenser

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3836808A (en) * 1972-06-28 1974-09-17 Siemens Ag Rotary anode for an x-ray tube
US3894239A (en) * 1973-09-04 1975-07-08 Raytheon Co Monochromatic x-ray generator
US4004174A (en) * 1973-11-02 1977-01-18 Tokyo Shibaura Electric Co., Ltd. Rotary anode structure for an X-ray tube
US4119879A (en) * 1977-04-18 1978-10-10 General Electric Company Graphite disc assembly for a rotating x-ray anode tube
FR2388402A1 (en) * 1977-04-18 1978-11-17 Gen Electric COMPOSITE SUBSTRATE FOR X-RAY TUBE ROTATING ANODE
USRE31369E (en) * 1977-04-18 1983-09-06 General Electric Company Method for joining an anode target comprising tungsten to a graphite substrate
USRE31560E (en) * 1977-04-18 1984-04-17 General Electric Company Graphite disc assembly for a rotating x-ray anode tube
USRE31568E (en) * 1977-04-18 1984-04-24 General Electric Company Composite substrate for rotating x-ray anode tube
US4641334A (en) * 1985-02-15 1987-02-03 General Electric Company Composite rotary anode for X-ray tube and process for preparing the composite
US4645121A (en) * 1985-02-15 1987-02-24 General Electric Company Composite rotary anode for X-ray tube and process for preparing the composite
US4689810A (en) * 1985-02-15 1987-08-25 General Electric Company Composite rotary anode for X-ray tube and process for preparing the composite
US4777643A (en) * 1985-02-15 1988-10-11 General Electric Company Composite rotary anode for x-ray tube and process for preparing the composite
US4920012A (en) * 1989-06-09 1990-04-24 General Electric Company Articles having coatings of fine-grained and/or equiaxed grain structure
US5204891A (en) * 1991-10-30 1993-04-20 General Electric Company Focal track structures for X-ray anodes and method of preparation thereof
US6045682A (en) * 1998-03-24 2000-04-04 Enthone-Omi, Inc. Ductility agents for nickel-tungsten alloys
US6237677B1 (en) 1999-08-27 2001-05-29 Delphi Technologies, Inc. Efficiency condenser

Also Published As

Publication number Publication date
DE2025578A1 (en) 1971-02-11
NL7010850A (en) 1971-01-26
CH504778A (en) 1971-03-15
FR2054101A5 (en) 1971-04-16
GB1264566A (en) 1972-02-23
AT289967B (en) 1971-05-10

Similar Documents

Publication Publication Date Title
US3719854A (en) Tungsten alloy x-ray target
US3660053A (en) Platinum-containing x-ray target
US2863083A (en) X-ray genenrator tubes
US3579022A (en) Rotary anode for x-ray tube
JPS58154131A (en) Impregnation type cathode
US3136907A (en) Anticathodes for X-ray tubes
US3689795A (en) Boron-containing rotating x-ray target
GB2031458A (en) X-ray tube targets
US3328626A (en) Rotary anodes of x-ray tubes
US4298816A (en) Molybdenum substrate for high power density tungsten focal track X-ray targets
US4004174A (en) Rotary anode structure for an X-ray tube
US4800581A (en) X-ray tube
US4279784A (en) Thermionic emission cathodes
EP0698280B1 (en) Dispenser cathode and method of manufacturing a dispenser cathode
US4109058A (en) X-ray tube anode with alloyed surface and method of making the same
US3697798A (en) Rotating x-ray target
US3437865A (en) Thermionic electron emitter having a porous refractory metal matrix and an alloy of active metal and mobilizer metal therein
US3737699A (en) X-ray tube having anode target layer of molybdenum rhenium alloy
CN100395363C (en) W-Re alloy rod for ion source of ion implanter and its prepn
DE69017877T2 (en) X-ray rotating anode.
US3414754A (en) Anode plate for x-ray tubes
US3351486A (en) Cathodes
US3397338A (en) Rotary anode plate for X-ray tubes
US3816079A (en) Method of producing grid electrodes for electronic discharge vessels
US3730706A (en) Strengthened cathode material and method of making

Legal Events

Date Code Title Description
AS Assignment

Owner name: SCHWARZKOPF TECHNOLOGIES CORPORATION, A CORP. OF M

Free format text: CHANGE OF NAME;ASSIGNOR:SCHWARZKOPF DEVELOPMENT CORPORATION, A CORP. OF MD;REEL/FRAME:005931/0448

Effective date: 19910517