US3619390A - Aqueous electrolytic stripping bath to remove metal coatings from bases of steel - Google Patents
Aqueous electrolytic stripping bath to remove metal coatings from bases of steel Download PDFInfo
- Publication number
- US3619390A US3619390A US10034A US3619390DA US3619390A US 3619390 A US3619390 A US 3619390A US 10034 A US10034 A US 10034A US 3619390D A US3619390D A US 3619390DA US 3619390 A US3619390 A US 3619390A
- Authority
- US
- United States
- Prior art keywords
- bath
- grams
- aqueous electrolytic
- electrolytic stripping
- per liter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 24
- 229910000831 Steel Inorganic materials 0.000 title claims abstract description 16
- 239000010959 steel Substances 0.000 title claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 13
- 239000002184 metal Substances 0.000 title claims abstract description 13
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 claims abstract description 26
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims abstract description 18
- 235000019270 ammonium chloride Nutrition 0.000 claims abstract description 9
- SOIFLUNRINLCBN-UHFFFAOYSA-N ammonium thiocyanate Chemical compound [NH4+].[S-]C#N SOIFLUNRINLCBN-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000005708 Sodium hypochlorite Substances 0.000 claims abstract description 6
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 claims abstract description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 48
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 29
- 150000007524 organic acids Chemical class 0.000 claims description 28
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 18
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 17
- 235000011054 acetic acid Nutrition 0.000 claims description 16
- 229910052759 nickel Inorganic materials 0.000 claims description 15
- -1 alkali metal salts Chemical class 0.000 claims description 13
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 12
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 12
- 150000003839 salts Chemical class 0.000 claims description 11
- 150000001412 amines Chemical class 0.000 claims description 8
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 239000011651 chromium Substances 0.000 claims description 5
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 claims description 5
- 229910052718 tin Inorganic materials 0.000 claims description 5
- 239000011135 tin Substances 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- 239000011701 zinc Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- 229910052793 cadmium Inorganic materials 0.000 claims description 4
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 4
- 235000015165 citric acid Nutrition 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 239000004310 lactic acid Substances 0.000 claims description 4
- 235000014655 lactic acid Nutrition 0.000 claims description 4
- 235000006408 oxalic acid Nutrition 0.000 claims description 4
- SATVIFGJTRRDQU-UHFFFAOYSA-N potassium hypochlorite Chemical compound [K+].Cl[O-] SATVIFGJTRRDQU-UHFFFAOYSA-N 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 claims description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 3
- KBKZYWOOZPIUJT-UHFFFAOYSA-N azane;hypochlorous acid Chemical compound N.ClO KBKZYWOOZPIUJT-UHFFFAOYSA-N 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 229930003836 cresol Natural products 0.000 claims description 3
- 150000003863 ammonium salts Chemical class 0.000 claims description 2
- MIHINWMALJZIBX-UHFFFAOYSA-N cyclohexa-2,4-dien-1-ol Chemical compound OC1CC=CC=C1 MIHINWMALJZIBX-UHFFFAOYSA-N 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 abstract description 13
- 239000010953 base metal Substances 0.000 abstract description 11
- 230000003628 erosive effect Effects 0.000 abstract description 11
- 239000010935 stainless steel Substances 0.000 abstract description 10
- 229910000760 Hardened steel Inorganic materials 0.000 abstract description 4
- 150000002989 phenols Chemical class 0.000 abstract description 4
- 239000002585 base Substances 0.000 description 23
- 239000000654 additive Substances 0.000 description 6
- 230000000996 additive effect Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000006172 buffering agent Substances 0.000 description 4
- 235000005985 organic acids Nutrition 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical group C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229910002651 NO3 Inorganic materials 0.000 description 3
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 150000001805 chlorine compounds Chemical class 0.000 description 3
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 3
- 150000003335 secondary amines Chemical class 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 150000003512 tertiary amines Chemical class 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical class NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 150000003141 primary amines Chemical class 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- MGSRCZKZVOBKFT-UHFFFAOYSA-N thymol Chemical compound CC(C)C1=CC=C(C)C=C1O MGSRCZKZVOBKFT-UHFFFAOYSA-N 0.000 description 2
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 1
- 239000005695 Ammonium acetate Substances 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- 239000005844 Thymol Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 235000019257 ammonium acetate Nutrition 0.000 description 1
- 229940043376 ammonium acetate Drugs 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- JACMPVXHEARCBO-UHFFFAOYSA-N n-pentylpentan-1-amine Chemical compound CCCCCNCCCCC JACMPVXHEARCBO-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 229920000768 polyamine Chemical class 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 125000001453 quaternary ammonium group Chemical class 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229960000790 thymol Drugs 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F5/00—Electrolytic stripping of metallic layers or coatings
Definitions
- ammonium chloride, sodium hypochlorite and ammonium thiocyanate are effective accelerators for stripping stainless steel, and watersoluble phenols are effective as accelerators for stripping nitrided or hardened steels. Erosion is slightly less at pH between 6.0 and 6.8 than at pH 5.0 to 6.0, and at pH below 5.0, erosion is substantial.
- This invention relates to novel aqueous baths for the electrolytic stripping of metal coatings, namely nickel, chromium, zinc, tin, copper, cadmium and silver coatings, from bases of stainless steels such as chromium steel, nickel steel and chrome-nickel steel, and from bases of hardened or nitrided steels, and to electrolytic stripping methods employing the baths.
- the invention relates to novel aqueous baths which have almost universal stripping utility for electrolytic removal of metal coatings from stainless or nitrided or hardened steels, these aqueous baths containing ammonium or alkali nitrate in an amount of from to 150 grams per liter, preferably from 20 to 100 grams per liter, the baths being buffered to a critical pH of between 5.0 and 6.8, preferably 6.0 and 6.8, with a water-soluble organic acid suchas acetic acid, oxalic acid, citric acid and lactic acid, or with a water-soluble amine salt of these organic acids such as triethanolamine salt, ethylenediamine salt and the like, and an accelerator which speeds stripping while it is especially adapted to protect the base of steel from corrosive action during and after the stripping operation.
- a critical pH between 5.0 and 6.8, preferably 6.0 and 6.8
- a water-soluble organic acid suchas acetic acid, oxalic acid, citric acid and
- the accelerator is preferably a water-soluble chlorine-containing compound, such as ammonium chloride, sodium chloride, potassium hypochlorite, etc., which is added to the bath in an amount of at least 0.5 grams per liter.
- Ammonium thiocyanate may be used as the accelerator in the same proportions.
- the accelerator is preferably a water-soluble phenol which is added to the bath in an amount of from about 0.2 to about 30 cubic centimeters per liter.
- the phenol may be monovalent or polyvalent (l, 2 or 3 hydroxyl groups in the benzene ring) and alkyl homologues may be used.
- the known galvanic baths work on the basis of the stripping action of an aqueous solution of ammonium nitrate in highly acid medium, and these known baths have proved to be suitable to achieve short stripping times.
- these baths attack the base metal, especially when the baths are operated at a pH of below 5.0 down to about pH 3.0, this pH range being obtained by adjustment with nitric acid and amines.
- the pH of the ammonium nitrate bath is raised so that the bath can be operated at just below the neutral point, e.g. with a pH range of about 6.0 to about 6.8, the base metal is not so much attacked but the time for complete stripping is increased to a point where the step becomes uneconomical and where time schedules cannot be maintained.
- the stripping time is considerably shorter, but the chemical attacks on the base metal increase. Therefore, it is essential to operate the known ammonium nitrate bath in a mean pH range of 4.0 to 5.0 to reach a tolerable compromise in which relatively long stripping times are accepted in order to restrict erosion of the base metal within acceptable limits.
- the novel bath of the present invention is provided with two critical additional components.
- the first component is a buffering agent which brings the nitrate bath to an operational pH range of 5.0 to 6.8, preferably 6.0 to 6.8, the buffering agent being a salt of an organic acid, such as ammonium acetate, or the neutralization product of an amine (triethanolamine) and an organic acid (acetic acid).
- the second component is an accelerator.
- a water-soluble chlorine compound and/or a water-soluble thiocyanate com- I pound constitute accelerators which are added to the bath in relatively small quantities.
- an aromatic hydrocarbon compound with hydroxyl groups bonded directly on the benzene nucleus is added in relatively small quantities, whereby the base is bright, clean and free from corrosion after stripping.
- the bath is adjusted to a pH just below the neutral point which is pH 7.0, to thereby provide assurance that there will be no appreciable erosion of the base metal.
- buffering agents include water-soluble salts of acetic acid, citric acid, lactic acid and oxalic acid, or the neutralization products of monovalent or polyvalent amines which are formed by the addition of the above-mentioned organic acids. Ethylene diamine or triethanolamine are illustrative of suitable amines.
- the water-soluble salts are alkali metal, ammonium, primary, secondary or tertiary amine, quaternary ammonium or polyamine salts which are preferably of low volatility to make them convenient to use.
- the primary amines such as monoethanolamine, butylamine, hexylamine, the secondary amines such as diamylamine and diethanolamine, and the tertiary amines such as dimethylaniline, triethylamine, tripropylamine are exemplary of aliphatic and aromatic amines which can be employed.
- Tetramethyl ammonium hydroxide is an example of a basic substance which can be added to make the organic acid salt for buffering purposes.
- the salt be of a substantially nonvolatile amine which may be a primary, secondary or tertiary amine, for example, monoethanolamine, diethanolamine or triethanolamine.
- bulTering agent results in considerable extension of the stripping time, and this is counteracted by the second critical additive, the accelerating agent. Practical experience has shown that extremely short stripping times can be achieved by combining the first and second critical additives, while completely avoiding erosion of the base metal.
- the second additive the accelerator comprising a chlorine compound and/or thiocyanate or the phenolic compound
- the accelerator comprising a chlorine compound and/or thiocyanate or the phenolic compound
- lf nickel is alloyed with chromium, zinc, tin, etc.
- the accelerating action is afforded by the additive is critical, particularly for dull-finished and semimatte nickel coatings. Since this second additive does not detract from the stripping of any of the other metal coatings, the invention provides a universal bath a pH just below neutrality.
- bases to be treated e.g. between those bases of stainless steel and those of hardened or nitrided steel, for the second additive.
- ammonium chloride and sodium hypochlorite exemplify water-soluble chlorine compounds
- ammonium thiocyanate exemplifies an equivalent accelerator.
- monovalent or polyvalent phenols phenol, dihydroxy benzene, trihydroxy benzene
- homologues of phenol cresol, thymol, xylenol
- a bath for stripping nickel coatings from bases of stainless steel preferably contains, per liter of finished bath solution:
- a bath for stripping nickel coatings, in particular, from bases of hardened or nitrided steel preferably contains, per liter of finished bath solution:
- organic acids sufficient to adjust to a pH range of from 5.0 to 6.8, preferably 6.0 to 6.8.
- the bath is used for electrolytic stripping with the article connected as an anode and the stripping may be carried out at a temperature of 20-90" C., preferably 50-90 C., under a current density of to 30 amperes per square centimeter and a voltage of about -20 volts.
- the potassium hypochlorite, sodium hypochlorite or ammonium hypochlorite can be used interchangeably.
- Nickel coatings with a thickness of 30 microns are likewise stripped completely from the base within l minute without erosion of the base metal.
- the composition of the bath changes during use since the bath liquid is entrained by the articles dipped therein and removed to reduce the volume which makes it necessary to replenish the liquid. Also, as a result of the decomposition by the hydrogen which is released at the cathode, the ammonium nitrate decomposes. In addition, the components of the bath form complexes with the coating metals which are stripped, and this depletes the bath. Consequently, for prolonged operation, the bath must be monitored with regard to its strength, composition, and pH value, and must be replenished according to the consumption ofthe individual components.
- An aqueous electrolytic stripping bath to remove metal coatings from stainless steel comprising: ammonium nitrate and/or an amine nitrate salt as the sole stripping component in an amount of from 5 to 200 grams per liter; said bath being buffered with a water-soluble salt of an organic acid to a pH range of about 5.0 to about 6.8, preferably 6.0 to 6.8, and a water-soluble accelerator in an amount of from 0.5 to 10 grams per liter, said accelerator increasing the stripping rate of the ammonium nitrate under a current density of 5 to 30 amperes per square centimeter in a temperature range of 2090 C. and being selected from the group consisting of watensoluble organic or inorganic compounds, ammonium thiocyanate and alkali metal thiocyanate.
- aqueous electrolytic stripping bath as claimed in claim 1, wherein said water-soluble salt of an organic acid is selected from the group consisting of alkali metal salts and ammonium salts.
- An aqueous electrolytic stripping bath to remove nickel coatings from hardened and nitrided steels comprising: ammonium nitrate or an amine nitrate salt asthe sole stripping component in an amount of from 5 to 200 grams per liter; said bath being buffered with a water-soluble amine salt of an organic acid to a pH range of about 5.0 to about 6.8, preferably 6.0 to 6.8, and a water-soluble phenol as the accelerator for stripping in an amount of from about 0.2 to about 30 grams per liter, said phenol accelerator increasing the rate of removal of nickel by the ammonium nitrate under a current density of5 to 30 amperes per square centimeter in a temperature range of 5090 C.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- ing And Chemical Polishing (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19691908625 DE1908625B2 (de) | 1969-02-21 | 1969-02-21 | Bad zu elektrolytischen abloesen von metallueberzuegen von grundkoerpern aus rostfreiem stahl |
| DE19691963415 DE1963415C3 (de) | 1969-12-18 | Bad zum elektrolytischen Ablösen von Metallüberzügen von Grundkörpern aus rostfreiem Stahl |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3619390A true US3619390A (en) | 1971-11-09 |
Family
ID=25757034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US10034A Expired - Lifetime US3619390A (en) | 1969-02-21 | 1970-02-09 | Aqueous electrolytic stripping bath to remove metal coatings from bases of steel |
Country Status (12)
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4111767A (en) * | 1977-12-07 | 1978-09-05 | Okuno Chemical Industry Co., Ltd. | Electrolytic stripping bath for removing metal coatings from stainless steel base materials |
| US4233124A (en) * | 1979-10-29 | 1980-11-11 | Oxy Metal Industries Corporation | Electrolytic stripping bath and process |
| US4264420A (en) * | 1979-10-29 | 1981-04-28 | Oxy Metal Industries Corporation | Electrolytic stripping bath and process |
| DE3318598A1 (de) * | 1982-05-27 | 1983-12-01 | Occidental Chemical Corp., 48089 Warren, Mich. | Bad und verfahren fuer die elektrolytische entfernung von ueberzuegen aus kupfer, kupferlegierung oder chrom von einem eisenhaltigen grundmetall |
| US5279771A (en) * | 1990-11-05 | 1994-01-18 | Ekc Technology, Inc. | Stripping compositions comprising hydroxylamine and alkanolamine |
| US5302261A (en) * | 1991-03-18 | 1994-04-12 | Noranda Inc. | Power assisted dezincing of galvanized steel |
| US5302260A (en) * | 1990-10-15 | 1994-04-12 | Noranda Inc. | Galvanic dezincing of galvanized steel |
| US5419779A (en) * | 1993-12-02 | 1995-05-30 | Ashland Inc. | Stripping with aqueous composition containing hydroxylamine and an alkanolamine |
| US6110881A (en) * | 1990-11-05 | 2000-08-29 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| US20040018949A1 (en) * | 1990-11-05 | 2004-01-29 | Wai Mun Lee | Semiconductor process residue removal composition and process |
| US20060003909A1 (en) * | 1993-06-21 | 2006-01-05 | Lee Wai M | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| EP1418256A3 (en) * | 2002-10-21 | 2006-03-08 | General Electric Company | A method for partially stripping a coating from the surface of a substrate, and related apparatus and compositions |
| US7205265B2 (en) | 1990-11-05 | 2007-04-17 | Ekc Technology, Inc. | Cleaning compositions and methods of use thereof |
| US20100065098A1 (en) * | 2005-06-23 | 2010-03-18 | Jorn Budde | Heating apparatus comprising a thermoelectric module |
| CN104088007A (zh) * | 2014-07-11 | 2014-10-08 | 湖南纳菲尔新材料科技股份有限公司 | 一种用于烧结钕铁硼磁体表面镍钨磷电镀层退镀的退镀液及退镀液的应用和退镀工艺 |
| CN106392227A (zh) * | 2016-09-12 | 2017-02-15 | 河海大学常州校区 | 一种钛合金表面微弧放电去除毛刺的方法 |
| CN113755938A (zh) * | 2021-10-09 | 2021-12-07 | 哈尔滨工业大学 | 一种利用超声辅助电解等离子体去除金属表面涂层的方法 |
| US11649558B2 (en) * | 2015-03-13 | 2023-05-16 | Okuno Chemical Industries Co., Ltd. | Electrolytic stripping agent for jig |
| WO2023104999A1 (en) * | 2021-12-08 | 2023-06-15 | Atotech Deutschland GmbH & Co. KG | Aqueous stripping composition for electrolytically removing a metal deposit from a substrate |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH583302A5 (enrdf_load_stackoverflow) * | 1974-10-22 | 1976-12-31 | Bloesch W Ag | |
| SE7602713L (sv) * | 1975-06-18 | 1976-12-19 | Hoechst Ag | Bad for elektrolytisk franskiljning av metaller |
| JPS52134552U (enrdf_load_stackoverflow) * | 1976-04-08 | 1977-10-13 | ||
| US4264419A (en) * | 1979-10-09 | 1981-04-28 | Olin Corporation | Electrochemical detinning of copper base alloys |
| US4400248A (en) * | 1982-03-08 | 1983-08-23 | Occidental Chemical Corporation | Electrolytic stripping process |
| JPH01149935U (enrdf_load_stackoverflow) * | 1988-04-05 | 1989-10-17 | ||
| CN101812719B (zh) * | 2010-04-02 | 2012-01-04 | 上海元豪表面处理有限公司 | 低碱度电解去毛刺溶液、其制备方法及使用方法 |
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| US2200782A (en) * | 1935-05-23 | 1940-05-14 | Metal & Thermit Corp | Detinning |
| US2588566A (en) * | 1948-02-04 | 1952-03-11 | Curtiss Wright Corp | Electrolytic process for stripping copper |
| US2797194A (en) * | 1954-07-26 | 1957-06-25 | Western Electric Co | Method of electrolytically recovering precious metals from other metal bases |
| US2937940A (en) * | 1957-07-01 | 1960-05-24 | Eltex Chemical Corp | Selective stripping of electroplated metals |
| US3207683A (en) * | 1962-02-05 | 1965-09-21 | Coussinets Ste Indle | Process of electrolytic surface treatment of metals |
| US3542658A (en) * | 1967-04-27 | 1970-11-24 | Dillenberg Bergische Metall | Electrolytic bath containing ammonium nitrate and a phenol |
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1969
- 1969-02-21 DE DE19691908625 patent/DE1908625B2/de not_active Ceased
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- 1970-01-12 BE BE744297D patent/BE744297A/xx unknown
- 1970-01-28 AT AT76370A patent/AT297441B/de not_active IP Right Cessation
- 1970-01-28 AT AT242571A patent/AT298190B/de not_active IP Right Cessation
- 1970-01-28 AT AT242471A patent/AT298189B/de not_active IP Right Cessation
- 1970-01-29 CH CH129470A patent/CH552680A/xx not_active IP Right Cessation
- 1970-01-29 CA CA073405A patent/CA918597A/en not_active Expired
- 1970-01-29 CH CH922172A patent/CH555893A/xx not_active IP Right Cessation
- 1970-02-09 US US10034A patent/US3619390A/en not_active Expired - Lifetime
- 1970-02-13 JP JP45012530A patent/JPS502859B1/ja active Pending
- 1970-02-19 SE SE02111/70A patent/SE364527B/xx unknown
- 1970-02-20 ES ES376740A patent/ES376740A1/es not_active Expired
- 1970-02-20 FR FR7006108A patent/FR2031582B1/fr not_active Expired
- 1970-02-20 GB GB8353/70A patent/GB1243937A/en not_active Expired
- 1970-02-20 NL NL7002391A patent/NL7002391A/xx unknown
-
1971
- 1971-11-10 JP JP46089724A patent/JPS5018862B1/ja active Pending
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2200782A (en) * | 1935-05-23 | 1940-05-14 | Metal & Thermit Corp | Detinning |
| US2588566A (en) * | 1948-02-04 | 1952-03-11 | Curtiss Wright Corp | Electrolytic process for stripping copper |
| US2797194A (en) * | 1954-07-26 | 1957-06-25 | Western Electric Co | Method of electrolytically recovering precious metals from other metal bases |
| US2937940A (en) * | 1957-07-01 | 1960-05-24 | Eltex Chemical Corp | Selective stripping of electroplated metals |
| US3207683A (en) * | 1962-02-05 | 1965-09-21 | Coussinets Ste Indle | Process of electrolytic surface treatment of metals |
| US3542658A (en) * | 1967-04-27 | 1970-11-24 | Dillenberg Bergische Metall | Electrolytic bath containing ammonium nitrate and a phenol |
Cited By (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4111767A (en) * | 1977-12-07 | 1978-09-05 | Okuno Chemical Industry Co., Ltd. | Electrolytic stripping bath for removing metal coatings from stainless steel base materials |
| US4233124A (en) * | 1979-10-29 | 1980-11-11 | Oxy Metal Industries Corporation | Electrolytic stripping bath and process |
| US4264420A (en) * | 1979-10-29 | 1981-04-28 | Oxy Metal Industries Corporation | Electrolytic stripping bath and process |
| DE3318598A1 (de) * | 1982-05-27 | 1983-12-01 | Occidental Chemical Corp., 48089 Warren, Mich. | Bad und verfahren fuer die elektrolytische entfernung von ueberzuegen aus kupfer, kupferlegierung oder chrom von einem eisenhaltigen grundmetall |
| US5302260A (en) * | 1990-10-15 | 1994-04-12 | Noranda Inc. | Galvanic dezincing of galvanized steel |
| US6110881A (en) * | 1990-11-05 | 2000-08-29 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| US5279771A (en) * | 1990-11-05 | 1994-01-18 | Ekc Technology, Inc. | Stripping compositions comprising hydroxylamine and alkanolamine |
| US6319885B1 (en) | 1990-11-05 | 2001-11-20 | Ekc Technologies, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| US20040018949A1 (en) * | 1990-11-05 | 2004-01-29 | Wai Mun Lee | Semiconductor process residue removal composition and process |
| US20040198621A1 (en) * | 1990-11-05 | 2004-10-07 | Lee Wai Mun | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| US7051742B2 (en) | 1990-11-05 | 2006-05-30 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| US7205265B2 (en) | 1990-11-05 | 2007-04-17 | Ekc Technology, Inc. | Cleaning compositions and methods of use thereof |
| US5302261A (en) * | 1991-03-18 | 1994-04-12 | Noranda Inc. | Power assisted dezincing of galvanized steel |
| US7387130B2 (en) | 1993-06-21 | 2008-06-17 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| US20060003909A1 (en) * | 1993-06-21 | 2006-01-05 | Lee Wai M | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| US20090011967A1 (en) * | 1993-06-21 | 2009-01-08 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| US7144849B2 (en) | 1993-06-21 | 2006-12-05 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| US20070078074A1 (en) * | 1993-06-21 | 2007-04-05 | Ekc Technology, Inc. | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
| US5419779A (en) * | 1993-12-02 | 1995-05-30 | Ashland Inc. | Stripping with aqueous composition containing hydroxylamine and an alkanolamine |
| EP1418256A3 (en) * | 2002-10-21 | 2006-03-08 | General Electric Company | A method for partially stripping a coating from the surface of a substrate, and related apparatus and compositions |
| US20100065098A1 (en) * | 2005-06-23 | 2010-03-18 | Jorn Budde | Heating apparatus comprising a thermoelectric module |
| US7964785B2 (en) * | 2005-06-23 | 2011-06-21 | Webasto Ag | Heating apparatus comprising a thermoelectric module |
| CN104088007A (zh) * | 2014-07-11 | 2014-10-08 | 湖南纳菲尔新材料科技股份有限公司 | 一种用于烧结钕铁硼磁体表面镍钨磷电镀层退镀的退镀液及退镀液的应用和退镀工艺 |
| CN104088007B (zh) * | 2014-07-11 | 2016-07-20 | 湖南纳菲尔新材料科技股份有限公司 | 一种用于烧结钕铁硼磁体表面镍钨磷电镀层退镀的退镀液及退镀液的应用和退镀工艺 |
| US11649558B2 (en) * | 2015-03-13 | 2023-05-16 | Okuno Chemical Industries Co., Ltd. | Electrolytic stripping agent for jig |
| CN106392227A (zh) * | 2016-09-12 | 2017-02-15 | 河海大学常州校区 | 一种钛合金表面微弧放电去除毛刺的方法 |
| CN113755938A (zh) * | 2021-10-09 | 2021-12-07 | 哈尔滨工业大学 | 一种利用超声辅助电解等离子体去除金属表面涂层的方法 |
| WO2023104999A1 (en) * | 2021-12-08 | 2023-06-15 | Atotech Deutschland GmbH & Co. KG | Aqueous stripping composition for electrolytically removing a metal deposit from a substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| AT297441B (de) | 1972-03-27 |
| BE744297A (fr) | 1970-06-15 |
| CA918597A (en) | 1973-01-09 |
| NL7002391A (enrdf_load_stackoverflow) | 1970-08-25 |
| FR2031582A1 (enrdf_load_stackoverflow) | 1970-11-20 |
| FR2031582B1 (enrdf_load_stackoverflow) | 1974-02-01 |
| DE1908625B2 (de) | 1971-08-12 |
| JPS5018862B1 (enrdf_load_stackoverflow) | 1975-07-02 |
| ES376740A1 (es) | 1972-05-16 |
| GB1243937A (en) | 1971-08-25 |
| CH552680A (de) | 1974-08-15 |
| SE364527B (enrdf_load_stackoverflow) | 1974-02-25 |
| AT298189B (de) | 1972-04-25 |
| DE1963415A1 (de) | 1971-06-24 |
| DE1963415B2 (de) | 1973-05-30 |
| AT298190B (de) | 1972-04-25 |
| DE1908625A1 (de) | 1970-11-19 |
| JPS502859B1 (enrdf_load_stackoverflow) | 1975-01-29 |
| CH555893A (de) | 1974-11-15 |
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