US3529965A - Irradiation-sensitive material adapted for development by aqueous developer solution - Google Patents

Irradiation-sensitive material adapted for development by aqueous developer solution Download PDF

Info

Publication number
US3529965A
US3529965A US570407A US3529965DA US3529965A US 3529965 A US3529965 A US 3529965A US 570407 A US570407 A US 570407A US 3529965D A US3529965D A US 3529965DA US 3529965 A US3529965 A US 3529965A
Authority
US
United States
Prior art keywords
sensitive
light
irradiation
water
sensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US570407A
Other languages
English (en)
Inventor
Eduard Roell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of US3529965A publication Critical patent/US3529965A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/005Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/04Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
    • G03C1/043Polyalkylene oxides; Polyalkylene sulfides; Polyalkylene selenides; Polyalkylene tellurides
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/135Cine film

Definitions

  • the present invention relates to light-sensitive material and more particularly to light-sensitive material based upon light-sensitive compounds such as diazo compounds and to a process of producing such a material.
  • Light-sensitive material which utilizes the light-sensitivity of diazo compounds for producing photographic pictures are prepared according to the following two basically different processes:
  • Both the diazo compound and the coupling agent are applied to or incorporated into the picture carrier or support. Development after exposure is mainly carried out by means of gaseous ammonia.
  • the diazo compound is applied to or incorporated into the picture carrier. After exposure, of said light-sensitive carrier or support, the picture is developed by a treatment with an aqueous solution which contains the coupling agent.
  • the diazo compound is directly incorporated into the picture carrier or support.
  • the diazo compound is incorporated into a separate layer which is applied to the picture carrier or support.
  • gelatin and other water-swellable substances such as polyvinyl alcohol, carboxy methyl cellulose, and others, have been suggested as layer-forming material. Polymers, which are soluble in organic solvents may also be used for this purpose.
  • the diazo copying process has been used for cinematographic purposes by means of the so-called ozaphan film.
  • the diazo compound is incorporated into the picture carrier or support itself. Due thereto it is necessary to keep the carrier or support extremely thin. This excludes the general usefulness of this type of film.
  • (l) Layers containin the light-sensitive diazo compound and consisting of water-swellable colloids or polymers have a relatively low melting point when swollen and, therefore, will not permit processing with developers at a higher temperature.
  • an especially inexpensive coupling agent namely fl-naphthol, is sufficiently soluble in hot water only, i.e., in water of a temperature above C.
  • Another object of the present. invention is to provide a simple and effective process of making such a light-sensitive material.
  • a further object of the present invention is to provide a process of using such a new and valuable light-sensitive copying material.
  • the light-sensitive material according to the present invention comprises a picture carrier or support provided with a light-sensitive layer which combines the good properties of gelatin, such as its high absorptive power for aqueous solutions, with those of lacquer coatings, such as their high mechanical strength properties, their insensitivity to high temperatures, and their shortened drying time.
  • a mixture of said two components is prepared and is used as binding agent for the light-sensitive compound, such as the diazo compound.
  • a mixture of gelatin and lacquer forming substances is prepared by using said lacquer-forming substances in the form of their aqueous dispersions.
  • Suitable aqueous dispersions are, for instance, the commercial latex-like preparations.
  • the following components are mixed with each other in a suitable proportion in order to produce highly resistant layers, which permit rapid development at a high temperature:
  • Hydrophilic, water-soluble or at least water-swellable, film-forming colloids such as gelatin, polyvinyl alcohol, polyacrylate, polyvinyl pyrrolidone, carboxy methyl cellulose, and the like.
  • Hydrophobic, substantially water-insoluble materials serving as supporting framework for said hydrophilic colloids such as butadiene copolymers, or other copolymers with acrylonitrile, polyvinyl acetate, polyvinyl propionate, polyvinyl chloride and other lacquer-forming substances. These materials are-used in the form of their aqueous latex-like dispersions which are miscible with said hydrophilic colloids and, after drying, yield a film meeting the requirements of light-sensitive layers, namely transparency, homogeneous surface, castability.
  • the mechanical strength properties and the perme ability for aqueous solutions of light-sensitive layers prepared from such mixtures is dependent upon the respective proportion of the components in the mixture. By selecting suitable proportions it is possible to adjust to the specific requirements in any desired manner the mechanical properties as well as the permeability of the layer to aqueous solutions and to control the speed of development.
  • diazo compounds Since the purpose of the present invention is primarily the production of an inexpensive material for making film copies, it is the preferred procedure to use diazo compounds as light-sensitive substances.
  • the layers composed according to the present invention as described hereinabove may also be used as carrier or support for other light-sensitive materials such as light-sensitive silver, iron, chromium salts and the like light-sensitive inorganic and organic compounds, provided their properties are adapted to the desired purpose.
  • light-sensitive materials such as light-sensitive silver, iron, chromium salts and the like light-sensitive inorganic and organic compounds, provided their properties are adapted to the desired purpose.
  • a further advantage of the layers according to the present invention which swell in aqueous solutions only to a slight extent, is to be seen in the fact that, in contrast to conventional gelatin layers, the drying process, after processing the light-sensitive material, is shortened considerably.
  • the high mechanical resistance of the lightsensitive layers permits to remove most of the adhering water by mechanically wiping it off.
  • the small amounts of water which are contained in the only slightly swollen layer are evaporated within a very short period of time, especially since the high temperature resistance of the layer permits drying at a very considerably higher temperture than heretofore possible with gelatin layers.
  • a latex containing a styrene-butadiene copolymer as it is sold, for instance, as Latex GRS III by the firm B. F. Goodrich Chemical Co., is adjusted to a solids content by diluting it with water (Solution B).
  • 250 cc. of Solution A, 250 cc. of Solution B, and 250 cc. of Solution C are processed at a temperature of about 35 C. to a homogeneous mixture. After filtration to eliminate impurities and air bubbles, the resulting filtered solution is cast upon a support of cellulose triacetate provided with the conventional subbing coating. Conventional emulsion casting machines are used for this purpose. After drying, a film of high mechanical strength at a processing temperature between 70 C. and 80 C. is obtained. Such a light-sensitive material, after exposure,
  • diazo compound used in the preceding example there may be employed other light-sensitive diazo compounds, such as the 4-diazonium dialkyl anilines, N-acyl derivatives of mono-diazotized p-phenylene diamine, 4-diazonium-2,5-dialkoxy diphenyls, 4-diazonium-2,5-dialkoxy diphenyl sulfides, and others as they are conventionally used in light-sensitive materials of the diazo type.
  • diazo compounds such as the 4-diazonium dialkyl anilines, N-acyl derivatives of mono-diazotized p-phenylene diamine, 4-diazonium-2,5-dialkoxy diphenyls, 4-diazonium-2,5-dialkoxy diphenyl sulfides, and others as they are conventionally used in light-sensitive materials of the diazo type.
  • light-sensitive compounds which have proved to be useful in the claimed light-sensitive material are, for instance, silver halogenides, and iron salts.
  • Compounds which are sensitive to other types of irradiation than to light are, for instance, silver halogenides which are sensitive to X-rays and also to ultraviolet rays. They may also be used for the purpose of the present invention.
  • Water-swellable film-forming colloids in place of gelatin, polyvinyl alcohol, carboxy methyl cellulose, and others.
  • Water insoluble polymers which are soluble in suitable organic solvents and which are useful as supporting framework for the water-swellable colloid are not only the styrene-butadiene polymer latex but also polyethylene, polypropylene, chlorinated rubber, alkyd resins.
  • coupling agents there are used the known coupling agents such as all phenols capable of coupling with diazo compounds such as p-naphthol, phloroglucinol, resorcinol, either along or in mixture with each other.
  • the supporting layer may not only consist of cellulose acetate but also of other film-forming materials as they are known in photographic films.
  • the proportion of water-swellable material and waterinsoluble framework material used as carrier for the light-sensitive compound may be between about 1:0.2 and 1:4 and preferably between 120.3 and 120.7 depending upon the desired properties of the resulting lightsensitive material.
  • Irradiation-sensitive material adapted for development by aqueous developer solutions, said material consisting of a supporting water-insoluble film base and a layer sensitive to irradiation on said film base, said irradiation-sensitive layer consisting of an intimate mixture of (a) gelatin, and
  • An irradiation-sensitive casting solution for providing an irradiation-sensitive layer which, on casting upon a supporting film base, forms therewith an irradiation-sensitive material adapted for development by aqueous developer solutions, said casting solution consisting of an intimate mixture of (a) an aqueous gelatin solution,

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
US570407A 1965-08-10 1966-08-05 Irradiation-sensitive material adapted for development by aqueous developer solution Expired - Lifetime US3529965A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DER0041292 1965-08-10

Publications (1)

Publication Number Publication Date
US3529965A true US3529965A (en) 1970-09-22

Family

ID=7406320

Family Applications (1)

Application Number Title Priority Date Filing Date
US570407A Expired - Lifetime US3529965A (en) 1965-08-10 1966-08-05 Irradiation-sensitive material adapted for development by aqueous developer solution

Country Status (3)

Country Link
US (1) US3529965A (de)
BE (1) BE682763A (de)
DE (1) DE1572155A1 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3779758A (en) * 1969-03-25 1973-12-18 Photocircuits Corp Photosensitive process for producing printed circuits employing electroless deposition
US3915709A (en) * 1973-04-13 1975-10-28 Gaf Corp Backwetting coating for diazo microfilm
US4075015A (en) * 1975-08-14 1978-02-21 Swiss Aluminium Ltd. Light sensitive mass and process for its production

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA667235A (en) * 1963-07-23 Rienzi B. Parker, Jr. Light-scattering photographic image
US3228769A (en) * 1961-05-04 1966-01-11 Minnesota Mining & Mfg Photosensitive copy-sheet comprising zinc oxide and a diazonium compound and method of copying
US3301679A (en) * 1963-05-31 1967-01-31 Gen Aniline & Film Corp Two-component diazotype light-sensitive photoprinting material susceptible to thermal development

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA667235A (en) * 1963-07-23 Rienzi B. Parker, Jr. Light-scattering photographic image
US3228769A (en) * 1961-05-04 1966-01-11 Minnesota Mining & Mfg Photosensitive copy-sheet comprising zinc oxide and a diazonium compound and method of copying
US3301679A (en) * 1963-05-31 1967-01-31 Gen Aniline & Film Corp Two-component diazotype light-sensitive photoprinting material susceptible to thermal development

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3779758A (en) * 1969-03-25 1973-12-18 Photocircuits Corp Photosensitive process for producing printed circuits employing electroless deposition
US3915709A (en) * 1973-04-13 1975-10-28 Gaf Corp Backwetting coating for diazo microfilm
US4075015A (en) * 1975-08-14 1978-02-21 Swiss Aluminium Ltd. Light sensitive mass and process for its production

Also Published As

Publication number Publication date
DE1572155A1 (de) 1970-01-02
BE682763A (de) 1966-12-20

Similar Documents

Publication Publication Date Title
US3032414A (en) System of photographic reproduction
US2675313A (en) Photographic reproduction process
US3525621A (en) Antistatic photographic elements
US2341877A (en) Sublayers for film elements and preparation thereof
GB1103864A (en) Reprographic process
US3408192A (en) Light-sensitive diazotype compositions and elements
US3529965A (en) Irradiation-sensitive material adapted for development by aqueous developer solution
US3770431A (en) Photographic elements containing ballasted resorcinols
US3507678A (en) Process for the production of a matted photographic material
US2603564A (en) Light sensitive diazotype layer containing a white opacifying pigment
US2734825A (en) morgan
US2773768A (en) Light-sensitive diazotype material
US3466173A (en) Silver halide element containing a developer and aromatic sulfinic acid stabilizers
US3704154A (en) Process for producing photographic materials
US3832181A (en) Photosensitive silver halide material containing a hydrophilic colloid hardened with a combination of formaldehyde and bis(vinylsulfonyl-methyl)ether
US3544322A (en) Photosensitive dispersion in a hydrophilic binder incorporating a stabilizer
US2500028A (en) Fine-grained bichromate sensitized photographic material
US2542560A (en) Diazotypes on plastic surfaced carrier containing 5,5' diresorcinol
US2437868A (en) Diazotype layers containing resorcinol monoesters
US3161511A (en) Methacrylonitrile vehicle for vesicular photography and method of using same
US3647448A (en) Light-sensitive halocarbon and phenol derivative composition
US3544321A (en) Stabilization of organic photosensitive material
US3512978A (en) Diazosulfonate composition,copying material,and method of use
US2462534A (en) Light-sensitive photographic elements
US3503742A (en) Desensitization of photosensitive materials by subjecting the non-image areas to ammonia