US3527574A - Growth of sapphire filaments - Google Patents
Growth of sapphire filaments Download PDFInfo
- Publication number
- US3527574A US3527574A US582420A US3527574DA US3527574A US 3527574 A US3527574 A US 3527574A US 582420 A US582420 A US 582420A US 3527574D A US3527574D A US 3527574DA US 3527574 A US3527574 A US 3527574A
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- US
- United States
- Prior art keywords
- melt
- growth
- alumina
- seed
- filaments
- Prior art date
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- Expired - Lifetime
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
- C30B15/24—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using mechanical means, e.g. shaping guides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/34—Edge-defined film-fed crystal-growth using dies or slits
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/20—Aluminium oxides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1036—Seed pulling including solid member shaping means other than seed or product [e.g., EDFG die]
Definitions
- refractory materials exhibit improved mechanical properties when produced in fiber or filament form and that composite materials consisting of :solid matrices reinforced by such fibers have enormous potential usefulness in the fabrication of strong heat resistant components for turbines, jet engines, missiles, rockets and other high performance equipment.
- a number of different refractory materials have been suggested for use as a reinforcing or strengthening elements, including boron, borides, carbides, nitrides and oxides, such as SiC, Zr O B C, MgO, BeO and A1 0 a-Alumina is of particular interest because of its high melting point, high modulus of elasticity and tensile strength.
- Another object of this invention is to grow a-alumina filaments from the melt.
- Growth of crystalline material from an open melt customarily occurs in one of two dif ferent ways. In one case growth occurs above the surface of the melt, typically according to the Czochralski technique. In the other case growth occurs below the surface of the melt. The latter method is known as dendritic growth and occurs only in a supercooled melt. As a :seed grows down into the body of the melt, it is withdrawn at a rate sufficient to keep the growth section below the melt surface.
- Typical of the successful prior art processes involving dendritic growth from the melt are those developed for growing silicon and germanium.
- a more specific object is to provide a method and apparatus adapted to produce u-alumina in filaments of extended length by continuous dendritic growth from the melt.
- a further specific object is to produce sapphire and ruby filaments by continuous dendritic growth from the melt.
- Sapphire is pure a-alurnina in single crystal form whereas ruby is a-alumina with some of the aluminum atoms in its crystal lattice replaced by chromium.
- a melt of tat-alumina establishing a thermal distribution within the melt conducive to dendritic propagation vertically in the melt, introducing a seed into a supercooled region of the melt for a period suflicient for dendritic growth to be initiated, and then withdrawing the seed at a rate approximately equal to the rate at which a-alumina dendrite grows downward into the melt.
- Proper thermal distribution within the melt is achieved by novel means located on top of the melt but designed so as not to interfere with withdrawal of the seed and the a-alumina filament grown thereon.
- FIG. 1 is an elevational sectional view, partly in schematic form, of a preferred apparatus for carrying out the process of this invention.
- FIG. 2 is a magnified sectional view of part of the apparatus of FIG. 1.
- a-alumina dendrites can be made to propagate vertically into the melt and that aalumina can be pulled from the melt as a continuous filament by providing a plate of selected material that floats on the surface of the melt and has an orifice through which the grown crystal can be pulled.
- This orifice plate does not function as a die, i.e., the melt is not extruded through its orifice; instead the floating orifice plate appears to function as a heat shield in that it modifies the thermal distribution within the melt in a manner conducive to vertical rather than horizontal propagation of dendrites.
- the illustrated apparatus comprises a vertically moveable horizontal bed 2 on which is supported a furnace enclosure consisting of two ooncentric-spaced quartz tubes 4 and 6. At its bottom end the inner tube 4 is positioned in an L-gasket 5 in the bed. Surrounding tube 4 is a sleeve '8 that screws into collar 10. Between sleeve 8 and collar 10 is an O-ring 12 and a spacer 13. The O-ring 12 is compressed against tube '4 to form a seal. The upper end of sleeve 8 is spaced from tube 4 so as to accommodate the bottom end of tube 6.
- Tube 6 is secured in place by an O-ring 14 and a spacer 15 compressed between a collar 16 that screws onto sleeve 8.
- Sleeve 8 is provided with an inlet port fitted with a flexible pipe 20.
- the upper ends of tubes 4 and 6 are secured in a head 22 so that they remain stationary when the bed is lowered.
- Head 22 has an outlet port with a flexible pipe 24.
- head 22 includes means similar to sleeve 8, O-rings 12 and 14, and collars 10 and 16 for holding the two tubes in concentric sealed relation. Pipes and 24 are connected to a pump (not shown) that continuously circulates cooling water through the space between the two quartz tubes.
- the interior of the furnace enclosure is connected by a pipe 28 to a vacuum pump or to a regulated source of inert gas such as argon or helium.
- the furnace enclosure also is surrounded by an RF. heating coil 30 that is coupled to a controllable 500 kc. power supply (not shown) of conventional construction.
- the heating coil may be moved up or down along the length of the furnace enclosure and means (not shown) are provided for supporting the coil in any selected elevation.
- the circulating water not only keeps the inner quartz tube at a safe temperature but also absorbs most of the infrared energy and thereby makes visual observation of crystal growth more comfortable to the observer.
- the head 22 is adapted to provide entry into the furnace enclosure of an elongate pulling rod 32 that is connected to and forms part of a conventional crystal pulling mechanism represented schematically at 34.
- the pulling mechanism 34 is adapted to move pulling rod 32 axially and also to rotate it on its axis, both at controlled rates.
- Pulling rod 32 is disposed coaxially with the quartz tubes 4 and 6 and its lower end has an extension in the form of a metal rod 36 that is adapted to function as a holder for a seed crystal 38.
- a cylindrical heat susceptor 40 made of carbon.
- the top end of susceptor 40 is open but its bottom end is closed off by an end wall.
- the susceptor is supported on a tungsten rod 42 that is mounted in bed 2.
- Supported within susceptor 40 on a short tungsten rod 44 is a crucible 46 adapted to contain a suitable supply of alumina 48.
- the crucible is made of a material that will withstand the operating temperatures and will not react with or dissolve in the molten alumina. In the illustrated embodiment the crucible is made of molybdenum, but it also may be made of iridium or some other material with similar properties with respect to molten alumina.
- the molybdenum crucible must be spaced from the susceptor since there is a eutectic reaction between carbon and molybdenum at about 2200 C.
- the inside of the crucible is of constant diameter and may have a hemispherical bottom.
- a cylindrical radiation shield 50 made of carbon cloth is wrapped around the carbon susceptor. The carbon cloth does not appear to couple directly to the RF. field but greatly reduces the heat loss from the carbon susceptor. At a given RF. power setting the shield 50 increases the susceptor temperature by as much as 500" C.
- the crucible contains a heat shield in the form of an orifice plate 52 that is made of molybdenum and floats on the surface of the melt.
- the orifice plate is made with smooth polished surfaces and preferably has a thickness in the range of 0.25 to 1 mm.
- the plate is shaped to conform to the interior of the crucible and as shown in FIG. 2 is sized so as to provide clearance suflicient for it to float evenly on the melt and to move down in the crucible as the melt is depleted. A clearance of about 0.010 inch suffices.
- the orifice plate has a centrally located circular orifice 54.
- the orifice has a diameter of about inch, but equally satisfactory results have been obtained with orifices measuring & inch.
- An orifice larger than A inch also may be used provided its crosssectional area is not so large with respect to the overall size of the plate to prevent the latter from establishing the proper thermal distribution in the melt.
- tit-alumina seed crystal 38 is mounted in holder 36 with its C-axis aligned parallel to the holders path of movement.
- a quantity of substantially pure a-alumina is placed in crucible 46, orifice plate 52 is placed on top of the alumina, and then the crucible is placed within susceptor 40 on tungsten rod 44.
- Access to the seed holder and the susceptor is achieved by lowering bed 2 away from the furnace enclosure and lowering the seed holder to below the bottom end of tube 4. With the bed restored to the position of FIG.
- cooling water is introduced between the Walls of the two quartz tubes, and the enclosure is evacuated and then filled with helium. The latter is kept at a pressure of about 1 atmosphere thereafter. Then the RF. coil is energized and operated so that the u-alumina is brought to a molten condition. It is to be noted that the orifice plate does not sink into the melt but floats at its surface, even though the plates density is greater than that of the melt. The reason for this is that the melt does not wet molybdenum.
- the a-alumina is brought to a temperature slightly above its melting point which is in the range of 2040 to 2050 C.
- the height of the meniscus 56 of the alumina in orifice 54 is an inverse function of the diameter of the orifice and typically is almost flush with the top surface of the orifice plate.
- the temperature of the melt is adjusted accordingly and the seed again is brought into contact with the melt. At the proper melt temperature, dendritic growth will occur on the end of the seed. Thereafter the seed is withdrawn at a speed corresponding to the rate at which the dendrite growth propagates down into the melt. If the seed continues to be withdrawn at the proper speed, the growth will be continuous until the melt is depleted. The orifice plate will settle within the crucible as the alumnia is depleted. The maximum length has been limited only by the maximum pulling distance afforded by pulling mechanism 34.
- the habit of thefilament-like crystals produced according to the foregoing method has shown variations that can be generalized into four different types, all of which have been grown using a sapphire seed crystal oriented with its C-axis parallel to the axis of the seed holder.
- One habit is characterized by a rather uniform outer surface and a circular cross-section.
- the other habits all have more or less rectangular cross-sections, but the outer surface of one has irregular undulations, another is stepped longitudinally, and the third appears to be twisted longitudinally. All of these different habits have easily discernible features.
- the filaments appear to be single crystals, some samples show evidence of a twin morphology.
- Laue X-ray back reflection photographs of some sample filaments reveal certain interesting facts.
- One Laue back reflection photograph of a filament grown on a C-axis oriented sapphire seed revealed three-fold symmetry except that each reflection was split into three or four spots. This suggests the presence of three or four crystals with their C-axis approximately parallel to the filament axis but slightly misoriented with respect to each other. Other filaments give still more complex patterns but generally still with the features of three-fold symmetry.
- a Laue back reflection of a sapphire filament grown onto a tungsten seed did not display any apparent three-fold symmetry along the filament axis.
- a further interesting phenomenon is that the crosssectional shape and sizes of the filaments do not conform to the shape and size of the orifice through which they are pulled. This is different from what occurs in other crystal growing processes where a melt is extruded through a die.
- the germanium ribbon pulled from the melt through a carbon die has a cross-section of the same shape and substantially the same area as the die passage exit.
- the difference is attributable to the fact that in my process the crystal grows dendritically down into the melt, i.e., the solid/liquid interface of the fila ment is below the melt surface, while in the process of Vogel et al., the molten material solidifies within or above the die passage.
- the orifice plate used in my process does not shape the filament, except insofar as the plate shapes the temperature gradients.
- the filament shape appears to be affected by the temperature gradients, the average temperature of the melt, and the orientation of the seed crystal.
- the rate of pull appears to affect the size of the filament and to some extent its shape.
- the molybdenum orifice plate has a lower total emissivity than alumina at temperatures in the order of 2000 C. Accordingly it is believed that this property enables the floating plate to act as a heat shield which limits the heat loss from the melt surface and thereby controls the radial and longitudinal temperature gradients in the immediate vicinity of the small surface of the melt exposed within the orifice.
- the heat shielding effect of the floating plate not only establishes the correct temperature distribution required to promote propagation vertically but also permits the melt to be supercooled in the region where the seed is introduced, an essential condition for dendritic growth.
- the floating molybdenum plate serves the dual function of providing an effective heat shield and an exposed central growth orifice of any chosen diameter.
- a definite indication of the fact that growth is dendritic is the speed at which the filament may be pulled from the melt.
- I have pulled filaments at speeds up to about mm./min. using a floating plate with an orifice having a diameter of inch. This is substantially in excess of the one inch/min. speed employed in growing germanium strip crystal using the process of Vogel et al., cited above. It is believed that growth rates substantially faster than 150 mm./min. can be achieved if the heat loss from the filament (primarily radiative in the apparatus and process described above) is augmented by forced convection. It also is to be appreciated that with proper control, simultaneous growth of a plurality of filaments from a common melt may be achieved using an orifice plate with a number of orifices located so that each meniscus is at approximately the same temperature.
- the seed crystal may also be mounted so that its C-axis is at an angle to the axis of the crystal holder.
- a twinned seed may be used. It also is to be understood that the process need not be carried out in a helium or argon atmosphere; instead the furnace enclosure may be evacuated to a suitable level.
- the invention has several other advantages.
- the apparatus for producing the thermal conditions essential to dendritic growth is simple and the floating orifice plate is not restricted to use with the particular furnace design illustrated in the drawings but may be employed in other apparatus adapted to pull crystals from a melt.
- Another advantage is that the process may be used to grow ruby filaments.
- the most important advantage is that it provides a new and useful form of [Jr-alumina, i.e., extended filaments.
- I have grown sapphire filaments measuring 6 inches in length and 0.13 to 0.50 mm. in diameter at pulling rates up to 150 mm./min.
- sample sapphire filaments produced in the manner described above have been found to have an elastic modulus of 3050 10 p.s.i. (as measured by the vibrating Reed technique), a flexure modulus of 25x10 p.s.i., and a tensile strength of at least 125,000 p.s.i.
- filament is not limited to a crystalline product of circular cross-section but also embraces polygonal cross-sections.
- Apparatus for producing a filament of crystalline alpha-alumina comprising a furnace enclosure, a crucible in said enclosure adapted to contain a supply of alumina, means for heating said crucible to melt said alumina and hold it at a selected temperature above its melting point, said crucible including a plate with an orifice that is adapted to float on the surface of said melt and to reduce radiative heat loss from said melt so as to produce in said melt a thermal distribution conducive to crystal growth propagated vertically in a region of said melt exposed by said orifice, said crucible and plate being made of molybdenum or iridium, and means for positioning a seed crystal in said orifice so that crystal growth can occur thereon and for withdrawing said seed with its grown crystal at a rate consistent with the rate of crystal growth propagated.
- a method of producing a filment of crystalline alphaalumina comprising providing in a crucible made of molybdenum or iridium a melt of alumina and a plate floating in said melt at the surface thereof, said plate having an aperture and being made of molybdenum or iridium, adjusting the temperature of said melt so that crystal growth propagating vertically will occur on a seed introduced into a region of said melt exposed by said aperture inserting a seed crystal into said region by way of said aperture for a period of time sufiicient for crystal growth to occur thereon, and pulling said seed upwardly away from said melt at a speed not exceeding the rate at which said crystal growth propagates vertically so that successive accretions of grown crystal form an extended filament.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US58242066A | 1966-09-27 | 1966-09-27 |
Publications (1)
Publication Number | Publication Date |
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US3527574A true US3527574A (en) | 1970-09-08 |
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Family Applications (1)
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US582420A Expired - Lifetime US3527574A (en) | 1966-09-27 | 1966-09-27 | Growth of sapphire filaments |
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Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3655415A (en) * | 1968-12-31 | 1972-04-11 | Union Carbide Corp | Asteriated synthetic corundum gem stones and method and apparatus for their production |
US3939003A (en) * | 1972-09-07 | 1976-02-17 | The United States Of America As Represented By The Secretary Of The Army | Fabrication of metal-ceramic composites |
US4025386A (en) * | 1974-12-20 | 1977-05-24 | Union Carbide Corporation | Method for producing r-plane single crystal alpha alumina in massive form having substantially circular cross-section |
US4096025A (en) * | 1974-02-21 | 1978-06-20 | The United States Of America As Represented By The Secretary Of The Army | Method of orienting seed crystals in a melt, and product obtained thereby |
US4224099A (en) * | 1978-08-10 | 1980-09-23 | Union Carbide Corporation | Method for producing R-plane single crystal alpha alumina |
US4286025A (en) * | 1979-03-12 | 1981-08-25 | Grant Zigurd A | Detector for thermoluminescence dosimetry |
US5114528A (en) * | 1990-08-07 | 1992-05-19 | Wisconsin Alumni Research Foundation | Edge-defined contact heater apparatus and method for floating zone crystal growth |
US5370078A (en) * | 1992-12-01 | 1994-12-06 | Wisconsin Alumni Research Foundation | Method and apparatus for crystal growth with shape and segregation control |
US5458083A (en) * | 1992-05-29 | 1995-10-17 | Chichibu Cement Co., Ltd. | Growth method for a rod form of single oxide crystal |
US20070056508A1 (en) * | 2003-04-23 | 2007-03-15 | Tsuguo Fukuda | Apparatus for producing fluoride crystal |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3002824A (en) * | 1956-11-28 | 1961-10-03 | Philips Corp | Method and apparatus for the manufacture of crystalline semiconductors |
FR1293744A (en) * | 1961-05-24 | 1962-05-18 | Western Electric Co | Process for the growth of single crystals of corundum and gallium oxide |
US3124489A (en) * | 1960-05-02 | 1964-03-10 | Method of continuously growing thin strip crystals | |
US3224840A (en) * | 1962-11-16 | 1965-12-21 | Gen Telephone & Elect | Methods and apparatus for producing crystalline materials |
US3291650A (en) * | 1963-12-23 | 1966-12-13 | Gen Motors Corp | Control of crystal size |
US3291571A (en) * | 1963-12-23 | 1966-12-13 | Gen Motors Corp | Crystal growth |
US3291574A (en) * | 1963-12-23 | 1966-12-13 | Gen Motors Corp | Semiconductor crystal growth from a domical projection |
US3298795A (en) * | 1964-03-23 | 1967-01-17 | Westinghouse Electric Corp | Process for controlling dendritic crystal growth |
-
1966
- 1966-09-27 US US582420A patent/US3527574A/en not_active Expired - Lifetime
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3002824A (en) * | 1956-11-28 | 1961-10-03 | Philips Corp | Method and apparatus for the manufacture of crystalline semiconductors |
US3124489A (en) * | 1960-05-02 | 1964-03-10 | Method of continuously growing thin strip crystals | |
FR1293744A (en) * | 1961-05-24 | 1962-05-18 | Western Electric Co | Process for the growth of single crystals of corundum and gallium oxide |
US3224840A (en) * | 1962-11-16 | 1965-12-21 | Gen Telephone & Elect | Methods and apparatus for producing crystalline materials |
US3291650A (en) * | 1963-12-23 | 1966-12-13 | Gen Motors Corp | Control of crystal size |
US3291571A (en) * | 1963-12-23 | 1966-12-13 | Gen Motors Corp | Crystal growth |
US3291574A (en) * | 1963-12-23 | 1966-12-13 | Gen Motors Corp | Semiconductor crystal growth from a domical projection |
US3298795A (en) * | 1964-03-23 | 1967-01-17 | Westinghouse Electric Corp | Process for controlling dendritic crystal growth |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3655415A (en) * | 1968-12-31 | 1972-04-11 | Union Carbide Corp | Asteriated synthetic corundum gem stones and method and apparatus for their production |
US3939003A (en) * | 1972-09-07 | 1976-02-17 | The United States Of America As Represented By The Secretary Of The Army | Fabrication of metal-ceramic composites |
US4096025A (en) * | 1974-02-21 | 1978-06-20 | The United States Of America As Represented By The Secretary Of The Army | Method of orienting seed crystals in a melt, and product obtained thereby |
US4025386A (en) * | 1974-12-20 | 1977-05-24 | Union Carbide Corporation | Method for producing r-plane single crystal alpha alumina in massive form having substantially circular cross-section |
US4224099A (en) * | 1978-08-10 | 1980-09-23 | Union Carbide Corporation | Method for producing R-plane single crystal alpha alumina |
US4286025A (en) * | 1979-03-12 | 1981-08-25 | Grant Zigurd A | Detector for thermoluminescence dosimetry |
US5114528A (en) * | 1990-08-07 | 1992-05-19 | Wisconsin Alumni Research Foundation | Edge-defined contact heater apparatus and method for floating zone crystal growth |
US5458083A (en) * | 1992-05-29 | 1995-10-17 | Chichibu Cement Co., Ltd. | Growth method for a rod form of single oxide crystal |
US5370078A (en) * | 1992-12-01 | 1994-12-06 | Wisconsin Alumni Research Foundation | Method and apparatus for crystal growth with shape and segregation control |
US20070056508A1 (en) * | 2003-04-23 | 2007-03-15 | Tsuguo Fukuda | Apparatus for producing fluoride crystal |
US20110000423A1 (en) * | 2003-04-23 | 2011-01-06 | Stella Chemifa Corporation | Method for producing fluoride crystal |
US8333838B2 (en) | 2003-04-23 | 2012-12-18 | Stella Chemifa Corporation | Method for producing fluoride crystal |
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