US3506547A - Nickel-iron electrolytes containing hydrolyzing metal ions and process of electro-depositing ferromagnetic films - Google Patents
Nickel-iron electrolytes containing hydrolyzing metal ions and process of electro-depositing ferromagnetic films Download PDFInfo
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- US3506547A US3506547A US668561A US3506547DA US3506547A US 3506547 A US3506547 A US 3506547A US 668561 A US668561 A US 668561A US 3506547D A US3506547D A US 3506547DA US 3506547 A US3506547 A US 3506547A
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- bath
- ions
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- iron
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Links
- 238000000034 method Methods 0.000 title description 26
- 230000008569 process Effects 0.000 title description 13
- 238000000151 deposition Methods 0.000 title description 10
- 229910021645 metal ion Inorganic materials 0.000 title description 10
- 230000005294 ferromagnetic effect Effects 0.000 title description 8
- 239000003792 electrolyte Substances 0.000 title description 5
- 230000003301 hydrolyzing effect Effects 0.000 title description 5
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 title description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 58
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 44
- 238000007747 plating Methods 0.000 description 30
- 239000010408 film Substances 0.000 description 27
- 229910052742 iron Inorganic materials 0.000 description 24
- 229910052759 nickel Inorganic materials 0.000 description 22
- 150000002500 ions Chemical class 0.000 description 18
- -1 Fe++ ion Chemical class 0.000 description 17
- 150000001455 metallic ions Chemical class 0.000 description 16
- 150000003839 salts Chemical class 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 9
- 229910003271 Ni-Fe Inorganic materials 0.000 description 8
- 230000005291 magnetic effect Effects 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 229910052761 rare earth metal Inorganic materials 0.000 description 8
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 230000007062 hydrolysis Effects 0.000 description 7
- 238000006460 hydrolysis reaction Methods 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000007792 addition Methods 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 6
- 229910001448 ferrous ion Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 238000004070 electrodeposition Methods 0.000 description 5
- 238000009713 electroplating Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052684 Cerium Inorganic materials 0.000 description 4
- 229910052691 Erbium Inorganic materials 0.000 description 4
- 229910052693 Europium Inorganic materials 0.000 description 4
- 229910052688 Gadolinium Inorganic materials 0.000 description 4
- 229910052689 Holmium Inorganic materials 0.000 description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 4
- 229910052779 Neodymium Inorganic materials 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229910052771 Terbium Inorganic materials 0.000 description 4
- 229910052769 Ytterbium Inorganic materials 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910052735 hafnium Inorganic materials 0.000 description 4
- 229910052746 lanthanum Inorganic materials 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- 229910052727 yttrium Inorganic materials 0.000 description 4
- 229910052765 Lutetium Inorganic materials 0.000 description 3
- 229910052777 Praseodymium Inorganic materials 0.000 description 3
- 229910052775 Thulium Inorganic materials 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 235000003891 ferrous sulphate Nutrition 0.000 description 3
- 239000011790 ferrous sulphate Substances 0.000 description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 150000002910 rare earth metals Chemical class 0.000 description 3
- 229910052692 Dysprosium Inorganic materials 0.000 description 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical class [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 2
- 229910052772 Samarium Inorganic materials 0.000 description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 2
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 2
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 2
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 2
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 2
- 150000002815 nickel Chemical class 0.000 description 2
- 229910001453 nickel ion Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 2
- 229940081974 saccharin Drugs 0.000 description 2
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 2
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 2
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000004876 x-ray fluorescence Methods 0.000 description 2
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 2
- 229940074969 ytterbium Drugs 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 241000497917 Axinyssa ambrosia Species 0.000 description 1
- 235000000509 Chenopodium ambrosioides Nutrition 0.000 description 1
- 235000005490 Chenopodium botrys Nutrition 0.000 description 1
- 244000098897 Chenopodium botrys Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical class [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- ILOTUXNTERMOJL-UHFFFAOYSA-K thulium(iii) chloride Chemical compound Cl[Tm](Cl)Cl ILOTUXNTERMOJL-UHFFFAOYSA-K 0.000 description 1
- 229910001432 tin ion Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/24—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids
- H01F41/26—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids using electric currents, e.g. electroplating
Definitions
- the method is one for electroplating magnetic films of nickel iron alloys using conventional plating baths in which there is added metallic ions having hydrolysis constants in a pH range of from pH 2 to pH 7.
- the method involves the preparing of an electrolytic bath comprising a nickel salt, an iron salt, an electrolyte and metal ions selected from the group consisting of aluminum, magnesium, and a rare earth metal.
- the substrate to be plated is immersed in the above bath and subjected to an electrolytic action.
- the plated film has uniform proportions of nickel and iron throughout the film thickness. Additionally, the plating bath is stable over a wide range of temperatures.
- This invention relates to a method of electroplating magnetic films and to an improved electroplating bath therefor.
- this initial iron-rich deposit becomes a severe problem. This is especially so in terms of the magnetostriction of the deposited film, since zero magnetostriction is achieved with alloys including approximately 80% nickel and iron. When the alloy varies by any considerable degree from these proportions, it does not exhibit zero magneto striction. Additionally, the prior art Ni-Fe plating baths are unstable especially when used at high temperatures. For example, such baths can be used only for about 1 to 2 hours, after which they become opaque due to the hydrolysis and oxidation of ferrous ions.
- the current is thereafter reduced in time, and the shape of the current pulse is controlled so that the initial current of high magnitude is sufficient to cause more nickel to be deposited at that time and, thereafter, a sufiicient amount of nickel as the current is decreased, so that the proportions of nickel and iron remain essentially constant throughout the thickness of the film.
- Patent No. 1,960,029 to Alexander G. Russell discloses an electrodeposition method in which the ratio of the metals to be deposited in the alloy is maintained constant in solution by providing separate anodes of nickel and iron and adjusting the anode areas in the solution so that the current flows through the anode in the proper amount to replace the metal removed from the solution at the cathode.
- this method employs a conventional plating bath to which has been added metal ions exhibiting hydrolysis i.e., metal ions which form precipitable hydroxides, in the pH range of from pH 2 to pH 7 and having a deposition potential more negative than Fe and Ni, so that no electrodeposition of the additive occurs. Additionally, the prepared bath may be used for periods far in excess of the prior art plating bath without appreciable decomposition thereof.
- FIG. 1 is a plot of nickel and iron deposition versus the concentration of a rare earth metal ion.
- FIG. 2 is a plot of the ferric iron concentration variation with time for a conventional plating bath and for the plating bath of this invention.
- FIG. 3 is a plot of the percentage of iron deposited versus current density.
- FIG. 4 is a plot of the composition gradient versus time for the bath composition of this invention.
- the plating bath preferably contains simple salts of iron, nickel, and a metal selected from the group consisting of aluminum, magnesium, lanthanum, cerium, praseodymium, erbium, europium, gadolinium, hafnium, lutetium, neodymium, scandium, samarium, thulium, yttrium, ytterbium, holmium, terbium, and other rare earth metal ions hydrolyzing in a pH range of from pH 2 and pH 7.
- a metal selected from the group consisting of aluminum, magnesium, lanthanum, cerium, praseodymium, erbium, europium, gadolinium, hafnium, lutetium, neodymium, scandium, samarium, thulium, yttrium, ytterbium, holmium, terbium, and other rare earth metal ions hydrolyzing in a pH range of from pH 2 and
- Iron is initially added as a ferrous salt, such as ferrous chloride (FeCl AH O), ferrous sulphate, or as other simple salts of iron.
- the ferrous salt is present in amounts sufficient to produce -Fe++ ions in concentrations of from to 0.5 mole per liter.
- Nickel is preferably added to the plating bath as nickel chloride (NiCl .6H O).
- the nickel salt used is present in sufficient amounts to produce Ni++ ions in concentrations of from 0.1 to 0.5 mole per liter.
- nickel species may appear as free nickel ions, nickel amine complexes, nickel chelates, nickel addition agent complexes, and nickel complex with other added metal salts.
- Nickel may be added in the form of other salts, as an illustrative example, nickel sulphate, provided precipitation does not occur.
- the form in which nickel exists in a given system depends upon many factors, such as nickel concentration, pH, ammonium ion concentration, chelate agent concentration, iron concentration, addition agent concentration, complexing agent concentration, temperature, and concentration of other metals.
- Aluminum, magnesium, and the above rare earth elements have an appreciable effect on the plating bath; and it is preferably added to the bath in the form of a simple salt.
- the choice of salts is dependent upon the ability of the given salt to dissolve in the plating bath, and that the metallic ion hydrolyzes before nickel and ferrous ions.
- the nitrates, chlorides, sulphates, etc. are salts that are found to be satisfactory.
- the rare earth metals are generally acquired as their sesquioxides, which are converted into one of the above mentioned salts.
- the chloride salt of the rare earth metal is prepared by dissolving the sesquioxide in hot concentrated HCl, which is subsequently evaporated. The residue are crystals of the rare earth metal chloride.
- the above salts are added to the bath in amounts of from 7 l0- to 1X10 mole per liter.
- the pH of the bath is limited to a range of 1.5 to 7.
- other additives, such as boric acid and saccharin may also be added to the bath.
- Example I Several plating baths were prepared having the following composition: 0.2 mole of NiSO 0.2 mole of FeSo 10 gms. of H BO /liter and 2 10- mole of H 80 in one liter of water. Thulium chloride was added to each of the severally prepared baths in amounts sufficient to provide Tinions in the range of 1 10- to 1 10' A current having a current density of ma./
- Example II The experiments of Example I were repeated except that Sc+++ ions were used in place of the Tm+++ ions in the same concentrations indicated. A curve of the results obtained was plotted, which closely approximated that shown in FIG. 1.
- Example III The experiments of Example I were repeated except that Lu+++ ions were used in place of the T m+++ ions in the same concentrations indicated. A curve of the results obtained was plotted. The curve showed similar results to the curve shown in FIG. 1.
- FIG. 2 Shown in FIG. 2 is the effect of the presence or absence of the Al ion on the rate of hydrolysis and oxidation of the Fe++ ions in baths 1 and 2.
- the curve represented by the triangular points (bath 1) shows that the hydrolysis and oxidation of ferrous ions in the presence of aluminum ions proceeds at a much lower rate when compared to the representative curve of the conventional bath 2 (circular points). This effect is not simply due to the lowering of the pH, since equivalent additions of sulfuric acid to bath 1 do not produce a similar effect.
- EXAMPLE V A substrate was immersed in a plating bath consisting of 0.4 mole of nickel sulphate, 0.2 mole of ferrous sulphate, 10 grams of H BO 10 mole of H SO 2X10- mole of Al(NO and one gram of Na-saccharine per liter. The plating bath was heated to a temperature of about 95 C. Nitrogen was continuously bubbled into the solution. A current having a varying current density from 15 to 35 milliamperes/centimeters was applied. The resulting films had a bright appearance. It was found that the plating bath remained completely free of any iron oxide deposits for 3 /2 hours.
- the composition of the plated filn1 varies from 15% to 31% Fe.
- This range of Fe composition can be plated from a conventional bath, only it the bath contains an Fe concentration as low as 1X10 mole.
- This experiment demonstrates that with the addition of Al the iron content of the bath can be maintained at a much higher level and that the iron concentration of the bath does not have to be controlled as closely as in the case of plating from a conventional bath.
- FIG. 4 shows that the iron composition gradients, which are commonly found in conventional constant current plating, do not occur in high temperature plating with the presence of aluminum, "magnesium, or a rare earth metal ion, i.e., the iron composition deposited from the baths of this invention remains relatively constant throughout the plating operation.
- Example VI The experiment of Example V was repeated except that 0.2 mole of MgSo .7H O was substituted for the Results similar to those of Example V were obtained.
- Salts of cerium, erbium, europium, gadolinium, hafnium, lanthanum, neodymium, samarium, terbium, yttrium, holmium, praseodymium, dysprosium and ytter bium can be added in similar baths given in Examples I to V1 in amounts such that that metal ion was present in a concentration range of from 1 l0- to 1 10 mole per liter. Since all metal ion additions had similar effects on plate composition and bath stability, it is thought that the hydrolysis of the added metal ions is mainly responsible for the effects observed.
- An aqueous electrolytic bath for use in the process of deposition of a ferromagnetic coating on an electrical- 1y conductive substrate, said bath having a pH in the range of from 1.3 to 7 and including as essential constituents ferrous ions in a concentration in the range of 1X10 to 5 10- mole/1., Ni++ ions in a concentration in the range of 1X10 to 5 10- mole/l.
- metallic ions having negative deposition potentials such that said metallic ions do not codeposit from said bath with said Ni++ and said Fe++ ions, said metallic ions being selected from the group consisting of Al, Ce, Er, Eu, Gd, Hf, La, Lu, Nd, Sc, Sm, Tm, Tb, Y, Yb, Dy, Pr and Ho, and being present in the range of about 1 10- to 1X 10- mole per liter.
- a process for depositing a ferromagnetic thin film comprising the steps of:
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- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
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Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US66856167A | 1967-09-18 | 1967-09-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3506547A true US3506547A (en) | 1970-04-14 |
Family
ID=24682823
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US668561A Expired - Lifetime US3506547A (en) | 1967-09-18 | 1967-09-18 | Nickel-iron electrolytes containing hydrolyzing metal ions and process of electro-depositing ferromagnetic films |
Country Status (4)
Country | Link |
---|---|
US (1) | US3506547A (enrdf_load_stackoverflow) |
DE (1) | DE1796184A1 (enrdf_load_stackoverflow) |
FR (1) | FR1582679A (enrdf_load_stackoverflow) |
GB (1) | GB1227220A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4101388A (en) * | 1977-03-30 | 1978-07-18 | M & T Chemicals Inc. | Prevention of anode bag clogging in nickel iron plating |
US4231847A (en) * | 1978-06-21 | 1980-11-04 | Trw Inc. | Electrodeposition of nickel-iron alloys having a low temperature coefficient and articles made therefrom |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1837355A (en) * | 1926-09-08 | 1931-12-22 | Bell Telephone Labor Inc | Electrodeposition of alloys |
US1960029A (en) * | 1931-11-19 | 1934-05-22 | Bell Telephone Labor Inc | Electrodeposition of alloys |
US3047475A (en) * | 1958-09-25 | 1962-07-31 | Burroughs Corp | Method for producing magnetic materials |
US3138785A (en) * | 1959-05-21 | 1964-06-23 | Ibm | Deposited magnetic memory array |
US3255033A (en) * | 1961-12-28 | 1966-06-07 | Ibm | Electroless plating of a substrate with nickel-iron alloys and the coated substrate |
US3271274A (en) * | 1962-10-31 | 1966-09-06 | Sperry Rand Corp | Electrodeposition of a ternary alloy of nickel, iron and molybdenum |
-
1967
- 1967-09-18 US US668561A patent/US3506547A/en not_active Expired - Lifetime
-
1968
- 1968-08-27 GB GB1227220D patent/GB1227220A/en not_active Expired
- 1968-08-28 FR FR1582679D patent/FR1582679A/fr not_active Expired
- 1968-09-17 DE DE19681796184 patent/DE1796184A1/de active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1837355A (en) * | 1926-09-08 | 1931-12-22 | Bell Telephone Labor Inc | Electrodeposition of alloys |
US1960029A (en) * | 1931-11-19 | 1934-05-22 | Bell Telephone Labor Inc | Electrodeposition of alloys |
US3047475A (en) * | 1958-09-25 | 1962-07-31 | Burroughs Corp | Method for producing magnetic materials |
US3138785A (en) * | 1959-05-21 | 1964-06-23 | Ibm | Deposited magnetic memory array |
US3255033A (en) * | 1961-12-28 | 1966-06-07 | Ibm | Electroless plating of a substrate with nickel-iron alloys and the coated substrate |
US3271274A (en) * | 1962-10-31 | 1966-09-06 | Sperry Rand Corp | Electrodeposition of a ternary alloy of nickel, iron and molybdenum |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4101388A (en) * | 1977-03-30 | 1978-07-18 | M & T Chemicals Inc. | Prevention of anode bag clogging in nickel iron plating |
US4231847A (en) * | 1978-06-21 | 1980-11-04 | Trw Inc. | Electrodeposition of nickel-iron alloys having a low temperature coefficient and articles made therefrom |
Also Published As
Publication number | Publication date |
---|---|
FR1582679A (enrdf_load_stackoverflow) | 1969-10-03 |
GB1227220A (enrdf_load_stackoverflow) | 1971-04-07 |
DE1796184A1 (de) | 1972-03-30 |
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