US3474284A - High frequency tantalum attenuation in traveling wave tubes - Google Patents
High frequency tantalum attenuation in traveling wave tubes Download PDFInfo
- Publication number
- US3474284A US3474284A US604847A US3474284DA US3474284A US 3474284 A US3474284 A US 3474284A US 604847 A US604847 A US 604847A US 3474284D A US3474284D A US 3474284DA US 3474284 A US3474284 A US 3474284A
- Authority
- US
- United States
- Prior art keywords
- helix
- tantalum
- electron
- traveling wave
- wave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052715 tantalum Inorganic materials 0.000 title description 31
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 title description 31
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 24
- 239000010408 film Substances 0.000 description 20
- 239000000463 material Substances 0.000 description 19
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 18
- 229910052799 carbon Inorganic materials 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- 229910002804 graphite Inorganic materials 0.000 description 11
- 239000010439 graphite Substances 0.000 description 11
- 238000010849 ion bombardment Methods 0.000 description 10
- 238000010894 electron beam technology Methods 0.000 description 9
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 230000006866 deterioration Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 229910002091 carbon monoxide Inorganic materials 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000010494 dissociation reaction Methods 0.000 description 4
- 230000005593 dissociations Effects 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 230000003993 interaction Effects 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000001902 propagating effect Effects 0.000 description 4
- 230000008016 vaporization Effects 0.000 description 4
- 238000009834 vaporization Methods 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000002238 attenuated effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000002035 prolonged effect Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000002459 sustained effect Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 230000002542 deteriorative effect Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012552 review Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- -1 hydrogen ions Chemical class 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000002296 pyrolytic carbon Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
- H01J23/16—Circuit elements, having distributed capacitance and inductance, structurally associated with the tube and interacting with the discharge
- H01J23/24—Slow-wave structures, e.g. delay systems
- H01J23/30—Damping arrangements associated with slow-wave structures, e.g. for suppression of unwanted oscillations
Definitions
- the high frequency attenuator in a traveling wave tube and in other devices, in which the attenuator issubject disadvantageously to electron and/or ion bombardment, comprises a coating containing the element tantalum, e.g., either pure tantalum or tantalum nitride.
- an electron beam is, projected in close proximity to a slow-wave structure, such as a conductive helix, with interaction taking place between the electron beam and the field of an electromagnetic wave propagatingon the helix.
- a slow-wave structure such as a conductive helix
- a more specific object of the present invention is to reduce the effects of sustained particle bombardment of the attenuation coating of a traveling wave tube.
- a traveling wave tube comprising an electron gun for projecting a beam of electrons toward a collector.
- An elongated slow-wave structure such as a wire helix, which extends between the electron gun and the collector, surrounds the beam path and is coupled at its input end to a signal source and at its output end to a load.
- the tube is provided with a focusing structure for constraining the flow of electrons to a path entirely within the slow- Wave structure.
- Feedback energy is attenuated by a coating of lossy material on a portion of the helix.
- a helix loss material capable of extended operation without change of loss characteristic, but not until recently was the cause of the aforementioned deterioration determined to be electron and ion bombardment of the loss material.
- the helix loss material should have a low vaporization pressure, a high melting point, and should preferably be a material having comparatively high resistivity.
- a portion of the slowwave structure is coated with a film of tantalum or tantalum nitride for attenuating feedback energy.
- tantalum and tantalum nitride possess a sufiiciently high melting point, low vaporization pressure, and high resistivity to meet the above requirements.
- a thin film of either tantalum or tantalum nitride on the helix and support rods provide the desired loss characteristics without deteriorating as" a result of electron and ion bombardment.
- traveling wave tubes are well I if energy propagation-along the helix is not carefully controlled.
- the major cause of instability in a traveling wave tube is the reflection of electromagnetic wave energy due to impedance mismatches in the output, section of the helix. Subsequent and repeated reflections, of course, cause oscillations in the tube. These reflected waves are usually suppressed by an attenuation coating along. Part of the helix. It is common practice to include on part of the helix a lossy material, typically a thin coating of graphite or carbon composition, which absorbs and dissipates the reflected Wave energy.
- the input signal energy is maintained through the loss section because at that location much of the input signal wave energy exists on the beam as spacecharge waves and can therefore propa-, gate freely. It has been observed-however, that the loss characteristics in tubes of this type tend to deteriorate in time, such deterioration being the result of susained-electron and ion bombardment of the attenuation coating. The deterioration of the loss characteristics causes the traveling wave tube to self-oscillate and thus renders it completely useless.
- FIG. 1 is a partial sectional view of a traveling wave tube employing the principles of the invention
- FIG. 2 is a section taken along line 2-2 of FIG. 1;
- FIG. 3 is an enlarged view of part of the helix and helix support structure of the traveling wave tube of FIG. 1;
- FIG. 4 is a graph comparing the effect of electron bombardment on the attenuation characteristics of tanta--
- a traveling Wave tube package 10 the purpose of which is to amplify electromagnetic Waves which are transmitted tothe tube p by an input waveguide 11 as shown by the arrow.
- an output wave guide 12 Located near the opposite end of the device is an output wave guide 12 for abstracting amplified electromagnetic waves from the traveling wave tube and transmitting them to an appropriate load as indicated by the other arrow.
- Extending between the input and output waveguides is a con ductive wire helix 13 which surrounds theflcentral axis of the device.
- An electron beam is formed and projected along the central axis by an electron gun 14 of a Wellknown type which includes a cathode 15, abeam-forming.
- Theelectron beam is collected by a collector electrode 18 located at the end of the helix 13 opposite the electron gun 14.
- the electron beam is projected in close proximity to the conductive helix with interaction taking place between the electron beam and the field of an electromagnetic.
- the helix 13 is mounted by three support rods 19 which are shown in more detail in FIGS. 2 and 3.
- a periodic magnetic structure 20 surrounding both the rods 19 and the helix 13 focuses the beam and constrains it to flow along the central axis to the collector 18.
- Other known focusing structures can be used, if so desired.
- the major cause of instability in a traveling wave tube is the tendency of wave energy to be reflected from the output end of the helix 13 back toward the input end and thereby to cause oscillations within the device.
- the reflected waves are usually suppressed by an attenuation coating along part of the helix 13.
- a lossy material typically a thin coating of graphite or carbon composition, which absorbs and dissipates the reflected wave energy.
- Such helix loss materials should have a low vaporization pressure, a high melting point, and should preferably be a material having comparatively high resistivity.
- the resistivity of graphite at 20 C. for instance, is 800 microhm-cm.
- the helix 13 and the support rods 19 are coated along a discrete region with a layer 21 of tantalum or tantalum nitride for absorbing reflected electromagnetic wave energy; this is best seen in FIG. 3.
- Both tantalum and tantalum nitride have a sufiiciently high melting point, low vaporization pressure, and resistivities of about microhm-cm. and 100 microhmcm., respectively, at C. to meet the above preferred characteristics.
- the lower resistivity of tantalum means that tantalum films are made correspondingly thinner in order to attain a desired attenuation.
- a typical thickness of the tantalum layer is 500 angstrom units.
- the tantalum or tantalum nitride layer 21 attenuates the reflected energy is best understood by considering a single turn of the helix 13 in the loss region defined by the layer 21. As reflected electromagnetic wave energy travels from the output end of the helix 13 toward the input end, it encounters the turn of the helix and therein produces an electric field. The ends of the turn are electrically connected through the layer 21 on the support rods 19. The electric fields produced by the reflected waves in the turn of the helix are effectively shunted through the layer 21 and thereby attenuated. Thus the layer 21 acts as a load to the electric fields in the helix in much the same way that a resistor acts as a load when connected across a battery. Also of importance is the attenuation of surface currents produced in the helix by the reflected energy. Since these currents travel on the helix surface, they are attenuated by the layer 21 on the surface of the helix itself.
- the loss material be very carefully applied 50 that it effectively acts as a reflectionless absorber of waves traveling toward the input end, while minimally affecting the growing wave traveling toward the output end.
- the density of the loss material should be tapered in the direction of the output end so that reflected-backward traveling waves are gradually absorbed.
- the total length of the loss section should be minimized to give the smallest possible interference with the growing wave.
- tantalum is deposited preferably by means of a sputtering chamber comprising an electrode having a cylindrical inner surface coated with tantalum which surrounds the helix.
- the helix is masked so as to define a loss region and the masks are flared to allow a tapered transition of resistance of the tantalum film. Tantalum is sputtered onto the helix by establishing a gaseous discharge between the electrode and the helix. By similar techniques well known in the art, tantalum nitride films can be sputtered onto the helix.
- the helix loss characteristic be maintained throughout the operating life of the tube; This requirement is necessary because the loss material is very carefully applied during the manufacturing to minimize interference with propagating space-charge waves while effectively absorbing electromagnetic waves on the helix. It has been found that in conventional tubes utilizing graphite or other carbon compositions as a loss material,the loss characteristic tends to change during extended tube operation. It has further been found that this change results from electron and ion bombardment of the graphite or carbon composition which in time reduces the wave loss and tends to make the tube unstable and completely useless. I have found, however, that a sputtered tantalum or tantalum nitride film on helix and support rods provides the desired loss characteristics without deteriorating as a result of particle bombardment.
- the sputtering rate of carbon in a hydrogen discharge is 262 milligrams per amp-hour, a relatively rapid 'rate; however, it is not known if this rate is valid for the particular carbon composition used on the helix and at the possible partial pressures of hydrogen existent in the tube.
- the sputtering rate of tantalum in a hydrogen discharge is only 16 mg./amp-hour, reflecting the fact that tantalum is much heavier than carbon and therefore is not so easily dislodged by colliding hydrogen ions.
- a second possibility is a cyclic reaction in which carbon monoxide and/or carbon dioxide, which are released from the thermionic cathode, dissociate under electron bombardment to release atomic oxygen which attacks the graphite film.
- the atomic oxygen combines with carbon atoms of the graphite forming carbon monoxide and/or carbon dioxide which in turn dissociate under electron bombardment, thus beginning the cycle again.
- the erosion of evaporated carbon film by oxygen atoms produced in a discharge tube is described by J. Strenznewski and J. Turkevich, in the paper The Reaction of Carbon with Oxygen Atoms, Proc. of the 3rd Carbon Conference, pp. 273-287. They find that the reaction rate depends directly on oxygen atom concentration and is independent of the temperature in the range 20-100 C. What role electron bombardment plays in accelerating this reaction is not clear; however, the dissociation of CO by electron-impact has been observed by W. W.-
- FIG. 4 The effect of electron bombardment on the attenuation characteristics of several helix loss materials is shown in FIG. 4.
- Tests were performed on traveling Wave tubes having helices coated with the following loss materials: (I) sputtered tantalum film; (II) sputtered tantalum film having length and film thickness both less than those of the tantalum film of (I); (III) sputtered tantalum nitride film; (IV) and (V) sprayed Aquadag; and (VI) pyrolytically deposited carbon film.
- the tubes were operated at normal voltages, with the output terminated and no R.F. excitation.
- the electron beam was perturbed by distorting the magnetic focusing field in the attenuator section.
- FIG. 4 (V) shows graphically the role of electron bombardment in causing deterioration of graphite films.
- the electron beam was focused properly, and the attenuation during this interval did not change. Outside of that interval, however, the electron beam was perturbed, resulting in a decrease in attenuation of the graphite film. It is clear from the test results shown in FIG. 4 that only the sputtered tantalum (I and II) and tantalum nitride (III) films have loss characteristics that are substantially unaffected by prolonged electron and ion bombardment.
- Tubes with helices; having sputtered tantalum and tantalum nitride films have been successfully life tested.
- traveling wave tubes operated under normal conditions, with five watts of power being dissipated in a tantalum nitride attenuator have exhibited no substantial degradation for 2000 hours.
- traveling wave tubes in accordance with the invention remain stable for periods of time far in excess of those previously attainable.
- tantalum and tantalum nitride are also useful as loss materials on other slow-wave structures and, in fact, in any device, such as a magnetron or cross-field amplifier, in which the loss material is subjected to sustained particle bombardment. Numerous other embodiments and modifications may be made by those skilled in the art without departing from the spirit and scope of the invention.
- the nose cones of space vehicles are coated with pyrolytic carbon which upon reentry reacts With the ionized atmosphere.
- pyrolytic carbon which upon reentry reacts With the ionized atmosphere.
- tantalum or tantalum nitride would not so react, thereby maintaining the integrity of the nose cone.
- a transmission system for propagating energy in a first direction and including a source of electrons and means for projecting said electrons for interaction with said propagating energy;
- said absorbing means comprising a coating including the element tantalum, said coating being free of other metallic deposits and having loss characteristics that are substantially unaffected by prolonged electron and/or ion bombardment thereof. 2. The combination of claim 1 wherein said coating comprises substantially pure tantalum.
- said transmission system comprises a slow-wave structure of a traveling wave tube.
- An electron discharge device comprising: a source of electrons; an electron collector; means for projecting the electrons in the form of a beam from said source to said collector; means for focusing the beam of electrons; a slow-wave structure surrounding the beam path and support means therefor; said slow-wave structure having input and output ends; means for coupling electromagnetic wave energy to the input end of said slow-wave structure; means for extracting electromagnetic wave energy from the output end of said slow-wave structure; said output end having a discontinuity which inherently reflects wave energy; means for attenuating the reflected wave energy along a discrete portion of said slow-wave structure; said attenuating means being subject to electron and/ or ion bombardment; said attenuating means comprising a thin film having the element tantalum and having loss characteristics that are substantially unaffected by prolonged electron and/or ion bombardment thereof, said thin film being free of other metallic deposits, said slowwave structure being in
- said slow-wave structure comprises a wire helix
- said support means comprises a plurality of rods each substantially coextensive with said :helix and abutting against said helix
- said thin film is deposited onto a portion of said helix and said support rods.
- said thin film comprises substantially pure tantalum.
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- Microwave Tubes (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US49893065A | 1965-10-20 | 1965-10-20 | |
US60484766A | 1966-12-27 | 1966-12-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3474284A true US3474284A (en) | 1969-10-21 |
Family
ID=40291304
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US604847A Expired - Lifetime US3474284A (en) | 1965-10-20 | 1966-12-27 | High frequency tantalum attenuation in traveling wave tubes |
Country Status (5)
Country | Link |
---|---|
US (1) | US3474284A (en)) |
BE (1) | BE708349A (en)) |
FR (1) | FR94934E (en)) |
GB (1) | GB1208139A (en)) |
NL (1) | NL6714142A (en)) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3874922A (en) * | 1973-08-16 | 1975-04-01 | Boeing Co | Tantalum thin film resistors by reactive evaporation |
US5038076A (en) * | 1989-05-04 | 1991-08-06 | Raytheon Company | Slow wave delay line structure having support rods coated by a dielectric material to prevent rod charging |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114147357B (zh) * | 2021-12-20 | 2023-12-01 | 中国科学院空天信息创新研究院 | 用于行波管的输出窗及其制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2497496A (en) * | 1943-01-15 | 1950-02-14 | Gen Electric | Electrode structure for electric discharge devices or lamps |
US2720609A (en) * | 1948-02-10 | 1955-10-11 | Csf | Progressive wave tubes |
US2771565A (en) * | 1952-08-19 | 1956-11-20 | Itt | Traveling wave tubes |
US3368103A (en) * | 1964-05-20 | 1968-02-06 | Rca Corp | Resistor comprising spaced metal coatings on a resistive layer and traveling wave tube utilizing the same |
-
1966
- 1966-12-27 US US604847A patent/US3474284A/en not_active Expired - Lifetime
-
1967
- 1967-10-18 NL NL6714142A patent/NL6714142A/xx unknown
- 1967-11-28 GB GB54027/67A patent/GB1208139A/en not_active Expired
- 1967-12-21 BE BE708349D patent/BE708349A/xx unknown
- 1967-12-27 FR FR94934D patent/FR94934E/fr not_active Expired
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2497496A (en) * | 1943-01-15 | 1950-02-14 | Gen Electric | Electrode structure for electric discharge devices or lamps |
US2720609A (en) * | 1948-02-10 | 1955-10-11 | Csf | Progressive wave tubes |
US2771565A (en) * | 1952-08-19 | 1956-11-20 | Itt | Traveling wave tubes |
US3368103A (en) * | 1964-05-20 | 1968-02-06 | Rca Corp | Resistor comprising spaced metal coatings on a resistive layer and traveling wave tube utilizing the same |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3874922A (en) * | 1973-08-16 | 1975-04-01 | Boeing Co | Tantalum thin film resistors by reactive evaporation |
US5038076A (en) * | 1989-05-04 | 1991-08-06 | Raytheon Company | Slow wave delay line structure having support rods coated by a dielectric material to prevent rod charging |
Also Published As
Publication number | Publication date |
---|---|
GB1208139A (en) | 1970-10-07 |
BE708349A (en)) | 1968-05-02 |
NL6714142A (en)) | 1968-06-28 |
FR94934E (fr) | 1970-01-23 |
DE1566037B2 (de) | 1972-08-31 |
DE1566037A1 (de) | 1972-03-09 |
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