US3440387A - High frequency heating system with inductive plasma - Google Patents

High frequency heating system with inductive plasma Download PDF

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Publication number
US3440387A
US3440387A US594114A US3440387DA US3440387A US 3440387 A US3440387 A US 3440387A US 594114 A US594114 A US 594114A US 3440387D A US3440387D A US 3440387DA US 3440387 A US3440387 A US 3440387A
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US
United States
Prior art keywords
high frequency
heating system
inductor
frequency heating
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US594114A
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English (en)
Inventor
Werner Gartner
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US Philips Corp
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US Philips Corp
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Filing date
Publication date
Application filed by US Philips Corp filed Critical US Philips Corp
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Publication of US3440387A publication Critical patent/US3440387A/en
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/02—Induction heating
    • H05B6/04—Sources of current
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
    • H05H1/18—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields wherein the fields oscillate at very high frequency, e.g. in the microwave range, e.g. using cyclotron resonance

Definitions

  • the present invention relates to a high frequency heating system using ionized gas or plasma as the heating medium. More particularly, the invention relates to an improved ignition circuit for supplying high frequency energy to the discharge plasma,
  • variable impedance for example, an adjustable capacitor, is connected between the coupling coil and the inductor, as is shown, for example, in the French patent specification 1,371,963,
  • the two capacitances are tuned with the inductance of the inductor to the resonance frequency. In this way, a considerably higher reactive power that is always sufiicient to initiate ignition, and a considerably improved stabilisation, are obtained.
  • a variation of the capacitances may be obtained by adding or subtracting further capacitances, whereas the inductance of the inductor may be varied by changing the distance between the turns.
  • the figure shows a conventional high frequency generator.
  • the high frequency energy thereof is coupled out by means of the coil 2.
  • the coil is connected to a resonant circuit formed 'by the series capacitance 3, the inductor 4 and the capacitance 5 connected in parallel therewith.
  • the inductor 4 supplies the high frequency energy to the plasma.
  • the mode of operation of the arrangement can be varied.
  • a comparatively high capacitance 3, for example, provides a rapid action, and a low capacitance 3 provides a slow action of the system,
  • An avejrage action is obtained, for example, when the ratio between the two capacitances is about 1:1.
  • a high frequency plasma induction heating system wherein the improvement comprises a stabilized ignition circuit for the system comprising, a source of high frequency power of a given frequency, an induction coil for generating the high frequency plasma field, first and second capacitors, means connecting said first and second capacitors in series and in parallel with said coil, respectively, to form a resonant circuit therewith that is tuned on the inductive side of the resonance curve, the resonant frequency of said resonant circuit being approximately the same as said given frequency of the high frequency power source, and means for coupling the output of said high frequency source to the input of said resonant circuit.
  • said high frequency power source comprises an oscillator having an inductor and a capacitor connected to form a parallel.

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Induction Heating (AREA)
  • Furnace Details (AREA)
  • Plasma Technology (AREA)
  • Arc Welding Control (AREA)
  • Compositions Of Oxide Ceramics (AREA)
US594114A 1965-11-12 1966-11-14 High frequency heating system with inductive plasma Expired - Lifetime US3440387A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEP0038111 1965-11-12

Publications (1)

Publication Number Publication Date
US3440387A true US3440387A (en) 1969-04-22

Family

ID=7375687

Family Applications (1)

Application Number Title Priority Date Filing Date
US594114A Expired - Lifetime US3440387A (en) 1965-11-12 1966-11-14 High frequency heating system with inductive plasma

Country Status (8)

Country Link
US (1) US3440387A (sv)
AT (1) AT273330B (sv)
BE (1) BE689622A (sv)
CH (1) CH454300A (sv)
DE (1) DE1514322C3 (sv)
GB (1) GB1139049A (sv)
NL (1) NL6615715A (sv)
SE (1) SE300663B (sv)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0022404A1 (fr) * 1979-07-04 1981-01-14 Instruments S.A. Générateur de plasma
US6399927B1 (en) * 1998-05-05 2002-06-04 Chapel Et Cie Method and device for high frequency treatment of products, related materials and uses

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5288971A (en) * 1991-08-09 1994-02-22 Advanced Energy Industries, Inc. System for igniting a plasma for thin film processing
JP2002533868A (ja) 1997-10-14 2002-10-08 アドバンスト・エナジー・インダストリーズ・インコーポレイテッド 早い電圧増加によるプラズマ点火を目的としたシステム

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB667657A (en) * 1950-04-26 1952-03-05 Westinghouse Electric Int Co Improvements in or relating to high frequency heating systems
DE896399C (de) * 1950-10-27 1953-11-12 Westinghouse Electric Corp Schaltung zur Erzeugung einer im wesentlichen konstanten Verbraucherspannung in Hochfrequenzheizsystemen fuer primaere dielektrische Beheizungen
US2662162A (en) * 1951-01-12 1953-12-08 Hartford Nat Bank & Trust Co High-frequency furnace
US3277265A (en) * 1963-01-22 1966-10-04 Soc De Traitements Electrolytiques Et Electrothermiques Plasma heating systems
US3340415A (en) * 1964-10-31 1967-09-05 Philips Corp Induction gas ionizer having a rotatable envelope
US3353060A (en) * 1964-11-28 1967-11-14 Hitachi Ltd High-frequency discharge plasma generator with an auxiliary electrode

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB667657A (en) * 1950-04-26 1952-03-05 Westinghouse Electric Int Co Improvements in or relating to high frequency heating systems
DE896399C (de) * 1950-10-27 1953-11-12 Westinghouse Electric Corp Schaltung zur Erzeugung einer im wesentlichen konstanten Verbraucherspannung in Hochfrequenzheizsystemen fuer primaere dielektrische Beheizungen
US2662162A (en) * 1951-01-12 1953-12-08 Hartford Nat Bank & Trust Co High-frequency furnace
US3277265A (en) * 1963-01-22 1966-10-04 Soc De Traitements Electrolytiques Et Electrothermiques Plasma heating systems
US3340415A (en) * 1964-10-31 1967-09-05 Philips Corp Induction gas ionizer having a rotatable envelope
US3353060A (en) * 1964-11-28 1967-11-14 Hitachi Ltd High-frequency discharge plasma generator with an auxiliary electrode

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0022404A1 (fr) * 1979-07-04 1981-01-14 Instruments S.A. Générateur de plasma
FR2460589A1 (fr) * 1979-07-04 1981-01-23 Instruments Sa Generateur de plasma
US6399927B1 (en) * 1998-05-05 2002-06-04 Chapel Et Cie Method and device for high frequency treatment of products, related materials and uses

Also Published As

Publication number Publication date
NL6615715A (sv) 1967-05-16
SE300663B (sv) 1968-05-06
BE689622A (sv) 1967-04-14
AT273330B (de) 1969-08-11
DE1514322C3 (de) 1974-06-06
DE1514322B2 (de) 1973-11-15
GB1139049A (en) 1969-01-08
CH454300A (de) 1968-04-15
DE1514322A1 (de) 1969-09-04

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