US3428456A - Antistatic photographic materials - Google Patents

Antistatic photographic materials Download PDF

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Publication number
US3428456A
US3428456A US460819A US3428456DA US3428456A US 3428456 A US3428456 A US 3428456A US 460819 A US460819 A US 460819A US 3428456D A US3428456D A US 3428456DA US 3428456 A US3428456 A US 3428456A
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US
United States
Prior art keywords
antistatic
carbon atoms
alkyl
photographic
layers
Prior art date
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Expired - Lifetime
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US460819A
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English (en)
Inventor
Herbert Grabhofer
Hans Ulrich
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Agfa Gevaert NV
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Agfa AG
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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • G03C1/856Phosphorus compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/06Phosphorus compounds without P—C bonds
    • C07F9/22Amides of acids of phosphorus
    • C07F9/24Esteramides
    • C07F9/2404Esteramides the ester moiety containing a substituent or a structure which is considered as characteristic
    • C07F9/2408Esteramides the ester moiety containing a substituent or a structure which is considered as characteristic of hydroxyalkyl compounds

Definitions

  • antistatic agents to, silver halide emulsion layers and/or auxiliary layers, such as protective or backing layers, of photographic materials in order to avoid electrostatic charging.
  • a certain antistatic effect can be produced by means of the inorganic salts which already are present in the emulsions, such as sodium chloride, potassium bromide or sodium nitrate, all of which have a high electrical conductivity and are thus able to dissipate locally occurring electric charges.
  • the protective action obtained with these salts generally is insufficient. More effective substances are required to impart a lowest possible charging capacity to the film as well as -a high conductivity.
  • the further object is to provide photographic materials with at least one light-sensitive silver halide emulsion layer which have improved antistatic properties.
  • Sluitable compounds include .those of the following formu a:
  • R and R represent hydrogen, alkyl, preferably having up to 12 carbon atoms, cycolalkyl, such as cyclohexyl, aryl, preferably a phenyl or a naphthyl, phenyl alkyl such as benzyl or phenyl ethyl or R :and R together can stand for the ring members, preferably methylene groups, necessary to complete a 5 or 6-membered heterocyclic ring,
  • R" represents alkyl, preferably with 12 to 20 carbon atoms, aryl, preferably a radial of the benzene series, more particular phenyl, which can be substituted with alkyl or olefinically unsaturated alkyl, preferably having between 1 and 20 carbon atoms, halogen, such as chloride and bromide, alkoxy groups having up to 12 carbon atoms and the like, which is substituted by an alkyl or alkylene radical with 1 to 12 carbon atoms,
  • A represents alkylene radicals with 2 to 4 carbon atoms, advantageously ethylene radicals, which can be partially replaced by propylene and/or butylene radicals,
  • n an integer from 1 to 40, advantageously 1 to
  • the antistatic effect of the compounds of the present invention is unexpected because similar amido phosphoric acid esters with glycols or polyalkylene glycols with terminal 'hydroxy groups do not act as antistatic agents.
  • preferred compounds are etherified at the end of the alkylene glycol chain with a substituent containing a long-chained alkyl group having between 12 and 20 carbon atoms and with polyalkylene glycol chains containing between 6 and 12 alkylene glycol units.
  • the present antistatic agents are added to the photographic layers, more especially the protective layers for silver halide emulsion layers, advantageously in quantities from 1 to 25 percent by weight, calculated on the dry weight of binding agent of the layers, which binding agent is preferably gelatine.
  • glycol ethers of the following general formula wherein R" and A have the above meaning are reacted according to common practice with an amidophosphoric acid dihalide or lower aliphatic ester in a molar ratio of about 2:1 in the presence of bases, such as pyridine.
  • amidophosphoric acid diahalides used for the aforesaid reaction can be substituted in the amide group by alkyl radicals, advantageously those with 1 to 6 carbon atoms, by aryl radicals, particularly phenyl radicals, which in their turn can be substituted by alkyl groups, alkoxy groups, phenoxy groups, halogen atoms or other substituents, or by aralkyl groups, such as benzyl.
  • the nitrogen atom of the amide group can form part of a heterocyclic ring, e.g. piperidine or morpholine.
  • amidophosphoric acid dihalides or esters are those of the following formulae:
  • the electrostatic charging in volts per cm. (v./cm.) is determined by means of the rotating field strength measuring instrument according to Schwenkhagen and the electric surface resistivity in ohms is determined with the Schneiden instrument.
  • Example 2 A protective layer containing 12 g. of gelatine per litre of casting solution was cast in a thickness of 1 mu onto gelatino-silver halide emulsion layer of a photographic material.
  • the protective layer solution ready for casting had 3 g. per litre of the compounds mentioned above added thereto and the casting was carried out in the same way. The following measurement results were obtained, using the test methods described above:
  • R and R taken alone each represent hydrogen, alkyl, cycloalkyl, phenyl, naphthyl and phenylalkyl; R and R together represent the ring members necessary to complete a heterocyclic ring having 5 to 6 ring members;
  • R" stands for a member of the group consisting of alkyl and aryl;
  • A represents alkylene radicals having between 2 to 4 carbon atoms and it stands for an integer from 1 to 40.
  • a light-sensitive photographic element containing at least one light-sensitive silver halide gelatin emulsion layer said photographic element having at least one layer containing an effective amount of an antistatic agent comprising a diester of amido-phosphoric acid having the formula wherein R and R when taken alone stand for hydrogen, alkyl having up to 12 carbon atoms, cycloalkyl, phenyl, naphthyL benzyl or phenyl ethyl,
  • R and R together stand for the atoms necessary to complete a 5 or 6 membered ring
  • R" stands for alkyl having from 12 to carbon atoms, phenyl or substituted products thereof wherein the substituents are saturated or unsaturated alkyl having up to 20 carbon atoms, halogen or alkoxy having up 0 12 carbon atoms,
  • A stands for alkylene having from 2 to 4 carbon atoms and n stands for an integer from 1 to 40,

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
US460819A 1964-06-19 1965-06-02 Antistatic photographic materials Expired - Lifetime US3428456A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEA0046356 1964-06-19

Publications (1)

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US3428456A true US3428456A (en) 1969-02-18

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US460819A Expired - Lifetime US3428456A (en) 1964-06-19 1965-06-02 Antistatic photographic materials

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US (1) US3428456A (de)
BE (1) BE665615A (de)
CH (1) CH450158A (de)
DE (1) DE1447580A1 (de)
FR (1) FR1437268A (de)
GB (1) GB1113807A (de)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3655387A (en) * 1970-09-15 1972-04-11 Eastman Kodak Co Antistatic photographic compositions
US4272616A (en) * 1978-06-07 1981-06-09 Fuji Photo Film Co., Ltd. Photographic radiation-sensitive materials having improved antistatic property
US4416830A (en) * 1979-08-30 1983-11-22 Gesellschaft Fur Biotechnologische Forschung Mbh (Gbf) Polyether phosphoric acids or esters
US5174923A (en) * 1989-02-03 1992-12-29 Eastman Kodak Company Cyclic phosphazene and salt antistatic composition
EP0638842A1 (de) * 1993-07-27 1995-02-15 Minnesota Mining And Manufacturing Company Härten gelatinehaltiger Schichten

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4971897A (en) * 1989-02-03 1990-11-20 Eastman Kodak Company Photographic silver halide element containing cyclic phosphazene and salt antistatic composition

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3264108A (en) * 1963-03-19 1966-08-02 Gen Aniline & Film Corp Antistatic photographic film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3264108A (en) * 1963-03-19 1966-08-02 Gen Aniline & Film Corp Antistatic photographic film

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3655387A (en) * 1970-09-15 1972-04-11 Eastman Kodak Co Antistatic photographic compositions
US4272616A (en) * 1978-06-07 1981-06-09 Fuji Photo Film Co., Ltd. Photographic radiation-sensitive materials having improved antistatic property
US4416830A (en) * 1979-08-30 1983-11-22 Gesellschaft Fur Biotechnologische Forschung Mbh (Gbf) Polyether phosphoric acids or esters
US5174923A (en) * 1989-02-03 1992-12-29 Eastman Kodak Company Cyclic phosphazene and salt antistatic composition
EP0638842A1 (de) * 1993-07-27 1995-02-15 Minnesota Mining And Manufacturing Company Härten gelatinehaltiger Schichten
US5470699A (en) * 1993-07-27 1995-11-28 Minnesota Mining And Manufacturing Company Hardening of gelatin-containing layers

Also Published As

Publication number Publication date
BE665615A (de) 1965-12-20
CH450158A (de) 1968-01-15
FR1437268A (fr) 1966-04-29
DE1447580A1 (de) 1968-12-19
GB1113807A (en) 1968-05-15

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