US3313934A - Field ion source for mass spectrometry with elongated emitter - Google Patents
Field ion source for mass spectrometry with elongated emitter Download PDFInfo
- Publication number
- US3313934A US3313934A US345407A US34540764A US3313934A US 3313934 A US3313934 A US 3313934A US 345407 A US345407 A US 345407A US 34540764 A US34540764 A US 34540764A US 3313934 A US3313934 A US 3313934A
- Authority
- US
- United States
- Prior art keywords
- field
- ion source
- ion
- wire
- emission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004949 mass spectrometry Methods 0.000 title claims description 7
- 150000002500 ions Chemical class 0.000 claims description 79
- 230000009021 linear effect Effects 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 239000011888 foil Substances 0.000 description 9
- 239000007789 gas Substances 0.000 description 7
- 238000010884 ion-beam technique Methods 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000010276 construction Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000012634 fragment Substances 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 2
- 238000009530 blood pressure measurement Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000001819 mass spectrum Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 241000581364 Clinitrachus argentatus Species 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
Definitions
- the invention is based on the observation that field strength of 1 10 and 5 10 volts per cm. are necessary only for the rare gases, such as helium, neon and argon, and a few permanent gases, such as hydrogen, oxygen, carbon monoxide and methane, but that for the by far predominant majority of all molecules it is suflicient to apply field strengths of about 2x10 to 3 volts/ cm. to effect field ionisation.
- the emitters for producing the field for the purpose of field ionisation are so constructed and disposed that the emission zone has an extent which is many times as great as corresponds to its small radius of curvature and preferably ha the form of an elongated curved surface.
- the emission properties of an ion source with emitters of this type differ considerably from those of previously known field ion sources and are distinguished from the latter by substantial advantages.
- the fluctuations of that fraction of the field ion current which passes through the limiting outlet gap of the field ion source are about 10 times smaller with thin Wires than with emission points, in the event of the same low field strength prevailing at the emission point as on a 2.5 wire on application of a voltage of 14 kv.
- This field strength is known as threshold field strength.
- the current fluctuations measured at the ion detector of a mass spectrometer amount to about i0.7% of the measured value when using emitting wires, Whereas the measured value of the ion current emitted from a point and measured at the ion detector fluctuates by -100% or more at the threshold strength.
- a simple emitting point can therefore not be used for analytical purposes at the threshold field strength, but the field strength must be increased apice proximately by the factor 2 in order to achieve con stancy, to within about i5%, of the ion current emitted by a single point and measured at the mass spectrometer detector. Even with .still higher field strengths, the accuracy of measurement of 20.7%; which can be achieved with wires, is not possible with individual points.
- the desired value of the current emitted at the wire can be adjusted by an R-C member in the circuit of the Wire emitter.
- the time constant amounts to about 10 seconds.
- Brief variations (time constant about 0 second) from the desired value can be reduced by a differential voltage regulator which controls the ion beam intensity through the voltage of a pair of deflector plates.
- the molecule fragment formation in the case of field ionisation when using emitting wires is substantially smaller under normal operating conditions than when using emission points.
- the c H -fragment (mass 29) can be used in the case of n-paraflins.
- the frequency of the C H +-fragment of n-hexane in the case of wire emission is only about 1% of the mother ions, but in the case of point emission is at least 10% ofthe mother ions.
- the reproducibility of the mass spectra over long periods of time is substantially better in the case of wire emission than with point emission.
- point emission reproducibility depends greatly on the macroscopic shape of the point and hence on the angle distribution of the ion emission.
- the geometrical shape of the point varies in the course of long periods of time, for example by passing from a paraboloid to a hyperboloid or truncated conical shape; wire and knife edges on the other hand retain their circular sym-' metry even over longer periods of time.
- FIGURE 1 shows a field emission source according to the invention, in axial section
- FIGURE 2 a partial elevation corresponding to FIG- URE 1 and showing the emitter arrangement on a larger scale, turned through in relation to FIGURE 1,
- FIGURE 3 'a front elevation corresponding to FIG- URE 2
- FIGURE 4 a form of construction of the emitter ar-' rangement with a group of parallel wires
- FIGURE 5 a front elevation corresponding to FIG- URE 4, p
- FIGURE 6 a form of construction of the emitter arrangement with a group of parallel metal foils, I
- FIGURE 7 a front elevation corresponding to FIG URE 6, and 7 FIGURE 8, a form of construction of the emitter ar rangement with a group or freely extended wires.
- FIG. 1 illustrate semi-diagrammatically the construction of a field ion source having an emitting Wire
- the field ion source illustrated consists of the conventional manner of a two-part substantially cylindrical glass container 1a, 1b with flange connection 2, which is open at the bottom and by means of a flange 3 can be connected to the separating tube 4 of a mass spectrometer or other vacuum apparatus.
- a passage 5 is provided in the wall of the spectrometer tube, this passage being connected to a high vacuum pump and leading to the vacuum space of the source of ions.
- an ion chamber 7 is provided in which the ions are formed.
- a gas sup-ply pipe 8 consisting of Covar glass and a Vakon tube fused thereto, is connected by a screw connection to the ion chamber 7.
- Covar is a glass available from Corning Glass Works of New York suitable for being combined with Vakon metal available from Vakuum Schmelze of Hanau, West Germany, to provide an essentially vacuum-tight combination.
- the composition of Vakon is 29% nickel, 18% cobalt and 53% iron.
- the ion chamber 7 contains an emitter 9 in the form of a Wollaston wire having a diameter of 2.5 and a free length of 5 mm., this wire being held at its ends by conductors 10.
- a Wollaston wire is a drawn silver wire of about 0.11 mm. diameter having a core, for example of platinum, of about l-5 microns (1-4 '10' cm). This wire is situated opposite a cathode 11 which contains a slot 12 the maximum dimensions of which are mm. length and 1 mm. width. The wire is at about +4 kv. in relation to earth and the cathode at about l0 kv.
- an elongated emission zone corresponding to the effective length of the wire is thus formed, the ion formation occurring in this Zone.
- an electrostatic lens consisting of the cathode 11 and two other lens electrodes 13 and 14
- the ions formed are taken out of the ion chamber and the divergent ion beam thus formed is focused onto the admission slot of the mass spectrometer tube 4.
- the lens' electrode 13 is at a voltage between and a few hundred volts in relation to earth and the lens electrode 14 is at earth potential.
- the ion beam is adjusted in two directions perpendicular to one another by pairs of deflection plates 15 and 16.
- the pair of plates 16 also acts as a lens for focusing the ion beam in the direction in which the magnetic field of the mass spectrometer does not have a focusing action.
- the mean potential at the pair of plates 16 is made a few hundred volts positive in relation to earth. The adjustment of this lens potential is very critical.
- All gaseous, liquid, or solid compounds which have a vapour pressure of at least 10* torr between 20 and 150 C. can be passed into the ionisation zone in the vapour condition.
- the ion zone can be heated during operation to 150 C., or in special cases to 350 C.
- Solids or liquids having vapour pressures below 10- torr can be vapourised into the ionisation space in an electric furnaoe at the side of the electrode 11.
- Wollaston wires are suitable for forming field ions on wires.
- the platinum cores of the Wollaston wire should have a diameter of 2.5a. 5,u wires give a comparable emission only at a voltage of about kv.
- Wollaston wires are prepared by etching away the silver coating, for example in concentrated nitric acid. The remaining micropoints are etched away by very brief alternating current electrolysis (20 volts) in aqua regia, utilising a protective resistance of a few kiloohms. It has been found that Wollaston Wire is better etched by electrolysis in a potassium cyanide solution than by nitric acid.
- a l-molar KCn solution is made, the Wollaston wire is connected as anode, and a 1 mm. platinum wire used as cathode.
- the direct current voltage applied amounts to 3 volts, a l-kiloohm resistor being connected in series.
- After-treatment by alternating current electrolysis in aqua regia is then not necessary.
- the length of the emitting wire advantageously amounts to only about 38 mm., since with a greater length mechanical vibrations ofthe fine wire may be disturbing. Longer wires may be supported at intervals or supported over their entire length on a support of insulating material. Wires having diameter below 2.5; require lower voltages for field ionisation, but are more liable to destruction.
- the emission zone may also be formed by the edge of a razor blade or similar emitter bodies or by the edge of a foil, the thickness of which corresponds to the desired radius of the emission zone to be formed.
- Sharp metal knife edges particularly those of fine razor blades, generally require pulling tensions at least twice as great in order to achieve the same field strength as 2.5 1 wires. Exceptions are only a few selected examples which at a pulling voltage of 14 kv. supply the same ion current as 2.5 wires. Extremely thin metal foils are therefore to be preferred to razor blades in respect of field ion production.
- the length of the freely extended wire is for example 8 mm. In that case additional supporting is not required. Such supporting would reduce the field strength. Since the width of the ion beam in a normal mass spectrometer is only of the .order of 8 mm., additional supporting need therefore not be considered for applications of the field ion source to mass spectrometers. Additional supporting would be required only in pressure measuring instruments in which the length of the emission wire could in certain circumstances be a multiple of 8 Amongst a number of possible applications of a field ion source with fine wires or knife edges for field production, mention will be made here only of the application to mass spectrometer analyses and to total and partial pressure measurement.
- this field ion source is very suitable for chemical analysis with the aid of the mass spectrometer.
- pressures below a few 10- torr in the ionization chamber periodically condensed layers are built up and torn down on the emitted wires or knife edges, so that the ion current fluctuates periodically. This can be avoided if the total pressure in the ion source in an analysis always amounts to about 10* torr. At this pressure a thicker condensed layer forms on the emission wire or knife edge and leads to a stable ion current reproducible over a long period of time.
- the ion currents are proportional to the partial pressure of the components, provided that the components are chemically not too dissimilar. If however this condition is not complied with, a large excess of an inert solvent is added to the mixture, this solvent greatly reducing the deviations from proportionality of the ion currents to the partial pressures.
- the field ion emission on fine wires or knife edges may be used for measuring the total or partial pressure of vapours of inorganic or organic compounds in rare gases and permanent gases such as H 0 CO, CH
- the total ion current is exactly proportional to pressure at pressures 'below 10- torr.
- Field ionisation probability is at least a factor 1,000 smaller for the abovementioned rare gases and some permanent gases than for inorganic or organic vapours.
- a simple ion source, in which the total emission of a wire or knife edge is measured, may therefore be used for total or partial pressure measurement.
- the emission zone may also be formed of a linear or areal group of a large number of apices (points or elongated apices), the radius of curvature of which, like that of the wire, is preferably equal to about 2.5
- Such emission zones may be formed either, as illustrated in FIGURES 4 or 5, by fixing a plurality of thin wires 9 on an insulating body 17 in a parallel arrangement or, as illustrated in FIGURES 6 and 7, alternately superimposing thin metal foils 18 and insulating foils 19 and bounding them on one side by a sharp cut, so that that side becomes the emitter.
- a lO-wire emitter can also for example be produced by freely extending wires.
- the distance between the etched wires is 0.2 mm. It is not possible first to weld the unetched Wollaston wires on the carriers and then etch them all at the same time. Each wire must therefore be prepared separately and finally all the wires must be joined together. This is done by welding a single Wollaston wire 9 on a U-shaped metal plate 20 of a thickness of 0.2 mm. corresponding to the spacing of the wires (V2A sheet)see FIGURE 8.
- a groove 21 of a depth of about 0.1 mm. is engraved close beneath the ends of the two arms 20a and 20b of the U-shaped plate.
- the weld point is given a coat of Zapon varnish in order to avoid the detaching of the Wire ends from the plate during the etching operation.
- the plate with the Wollaston wire welded in position is then introduced into the etching solution.
- the Zapon varnish is removed again by means of an organic solvent.
- the plates have bores 22 so that all 10 plates can. be pushed one after the other on to the guide bolts of a support of V2A steel. The plates are pressed together by tightening the screws of the support.
- the emission zone may be differently shaped from the examples given, if the ion optical system is constructed accordingly.
- the emitter must however always be so constructed and disposed that an emission zone is formed the total extent of which is many times as great as corresponds to its smaller radius of curvature.
- the emission zone may be a doubly curved surface having the radii of curvature r and r with the condition that r must be great in relation to R and in the limit case must be infinite, and that the extent of the emission zone in the direction in which it is only slightly curved or not curved at all must be great in relation to its extent in the direction in which it is greatly curved.
- a field ion source for mass spectrometry comprising means defining an ion chamber
- inlet means coupled to said ion chamber for introducing matter into said ion chamber
- an emitter in said chamber for forming field ions from said matter and having an emission zone defining a small radius of curature
- said emitter defining a linear distance many times as large as the distance defined by said small radius of curvature
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEA42368A DE1283567B (de) | 1963-02-19 | 1963-02-19 | Feldemissionsionenquelle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3313934A true US3313934A (en) | 1967-04-11 |
Family
ID=6933048
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US345407A Expired - Lifetime US3313934A (en) | 1963-02-19 | 1964-02-17 | Field ion source for mass spectrometry with elongated emitter |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3313934A (enrdf_load_stackoverflow) |
| DE (1) | DE1283567B (enrdf_load_stackoverflow) |
| FR (1) | FR1383384A (enrdf_load_stackoverflow) |
| GB (1) | GB1052902A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3582645A (en) * | 1966-11-19 | 1971-06-01 | Varian Mat Gmbh | Combined field and impact ionization source for mass spectrometers |
| US3610985A (en) * | 1970-11-09 | 1971-10-05 | Hughes Aircraft Co | Ion source having two operative cathodes |
| US3906280A (en) * | 1972-06-22 | 1975-09-16 | Max Planck Gesellschaft | Electron beam producing system for very high acceleration voltages and beam powers |
| US3956711A (en) * | 1973-11-23 | 1976-05-11 | The United States Of America As Represented By The Secretary Of The Navy | Traveling wave transverse electron beam for laser pumping |
| EP2721400A4 (en) * | 2011-06-16 | 2015-01-07 | Smiths Detection Montreal Inc | LOOP IONIZATION SOURCE |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4936961A (en) * | 1987-08-05 | 1990-06-26 | Meyer Stanley A | Method for the production of a fuel gas |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2062124A (en) * | 1932-04-01 | 1936-11-24 | Gen Electric | Method of coating filaments and similar articles |
| US2764707A (en) * | 1955-07-22 | 1956-09-25 | Richard B Crawford | Ion source |
| US2809314A (en) * | 1956-01-27 | 1957-10-08 | High Voltage Engineering Corp | Field emission ion source |
| US2816242A (en) * | 1953-05-19 | 1957-12-10 | Schlumberger Well Surv Corp | Neutron sources |
| US2847328A (en) * | 1957-03-04 | 1958-08-12 | James E Cline | Method of making thorium oxide cathodes |
| US2930917A (en) * | 1957-02-23 | 1960-03-29 | Commissariat Energie Atomique | Ion sources |
| US3173248A (en) * | 1960-11-07 | 1965-03-16 | Litton Systems Inc | Ionization and plasma acceleration apparatus |
-
0
- GB GB1052902D patent/GB1052902A/en active Active
-
1963
- 1963-02-19 DE DEA42368A patent/DE1283567B/de not_active Withdrawn
-
1964
- 1964-02-17 US US345407A patent/US3313934A/en not_active Expired - Lifetime
- 1964-02-19 FR FR964319A patent/FR1383384A/fr not_active Expired
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2062124A (en) * | 1932-04-01 | 1936-11-24 | Gen Electric | Method of coating filaments and similar articles |
| US2816242A (en) * | 1953-05-19 | 1957-12-10 | Schlumberger Well Surv Corp | Neutron sources |
| US2764707A (en) * | 1955-07-22 | 1956-09-25 | Richard B Crawford | Ion source |
| US2809314A (en) * | 1956-01-27 | 1957-10-08 | High Voltage Engineering Corp | Field emission ion source |
| US2930917A (en) * | 1957-02-23 | 1960-03-29 | Commissariat Energie Atomique | Ion sources |
| US2847328A (en) * | 1957-03-04 | 1958-08-12 | James E Cline | Method of making thorium oxide cathodes |
| US3173248A (en) * | 1960-11-07 | 1965-03-16 | Litton Systems Inc | Ionization and plasma acceleration apparatus |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3582645A (en) * | 1966-11-19 | 1971-06-01 | Varian Mat Gmbh | Combined field and impact ionization source for mass spectrometers |
| US3610985A (en) * | 1970-11-09 | 1971-10-05 | Hughes Aircraft Co | Ion source having two operative cathodes |
| US3906280A (en) * | 1972-06-22 | 1975-09-16 | Max Planck Gesellschaft | Electron beam producing system for very high acceleration voltages and beam powers |
| US3956711A (en) * | 1973-11-23 | 1976-05-11 | The United States Of America As Represented By The Secretary Of The Navy | Traveling wave transverse electron beam for laser pumping |
| EP2721400A4 (en) * | 2011-06-16 | 2015-01-07 | Smiths Detection Montreal Inc | LOOP IONIZATION SOURCE |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1283567B (de) | 1968-11-21 |
| FR1383384A (fr) | 1964-12-24 |
| GB1052902A (enrdf_load_stackoverflow) |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: FINNIGAN MAT GMBH, BARKHAUSEN-STRASSE 2, 2800 BREM Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:VARIAN MAT GMBH;REEL/FRAME:004068/0713 Effective date: 19820903 |