US3180808A - Nickel plating bath - Google Patents
Nickel plating bath Download PDFInfo
- Publication number
- US3180808A US3180808A US327102A US32710263A US3180808A US 3180808 A US3180808 A US 3180808A US 327102 A US327102 A US 327102A US 32710263 A US32710263 A US 32710263A US 3180808 A US3180808 A US 3180808A
- Authority
- US
- United States
- Prior art keywords
- nickel
- class
- bath
- brightener
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 97
- 229910052759 nickel Inorganic materials 0.000 title claims description 48
- 238000007747 plating Methods 0.000 title claims description 22
- 238000009713 electroplating Methods 0.000 claims description 5
- 239000011260 aqueous acid Substances 0.000 claims description 4
- -1 alkyl radicals Chemical class 0.000 description 28
- 238000000576 coating method Methods 0.000 description 24
- 239000011248 coating agent Substances 0.000 description 21
- 238000005260 corrosion Methods 0.000 description 13
- 230000007797 corrosion Effects 0.000 description 13
- GPUMPJNVOBTUFM-UHFFFAOYSA-N naphthalene-1,2,3-trisulfonic acid Chemical compound C1=CC=C2C(S(O)(=O)=O)=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC2=C1 GPUMPJNVOBTUFM-UHFFFAOYSA-N 0.000 description 11
- 159000000000 sodium salts Chemical class 0.000 description 11
- 239000002131 composite material Substances 0.000 description 10
- 125000004433 nitrogen atom Chemical group N* 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 5
- 229910052736 halogen Chemical group 0.000 description 5
- 150000002367 halogens Chemical group 0.000 description 5
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 5
- XNMQEEKYCVKGBD-UHFFFAOYSA-N 2-butyne Chemical compound CC#CC XNMQEEKYCVKGBD-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 4
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 4
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 235000019270 ammonium chloride Nutrition 0.000 description 3
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 125000002349 hydroxyamino group Chemical group [H]ON([H])[*] 0.000 description 3
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N 1H-imidazole Chemical compound C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 2
- 239000005864 Sulphur Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000006056 electrooxidation reaction Methods 0.000 description 2
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 2
- 229940124530 sulfonamide Drugs 0.000 description 2
- 150000003456 sulfonamides Chemical class 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- HQLVRJJDJGNYQW-UHFFFAOYSA-N 1-prop-1-enylimidazole Chemical compound CC=CN1C=CN=C1 HQLVRJJDJGNYQW-UHFFFAOYSA-N 0.000 description 1
- PQZMMHPATJFNNP-UHFFFAOYSA-N 1-prop-1-ynylimidazole Chemical compound CC#CN1C=CN=C1 PQZMMHPATJFNNP-UHFFFAOYSA-N 0.000 description 1
- MLMGJTAJUDSUKA-UHFFFAOYSA-N 2-ethenyl-1h-imidazole Chemical compound C=CC1=NC=CN1 MLMGJTAJUDSUKA-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 210000004534 cecum Anatomy 0.000 description 1
- SMVRDGHCVNAOIN-UHFFFAOYSA-L disodium;1-dodecoxydodecane;sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O.CCCCCCCCCCCCOCCCCCCCCCCCC SMVRDGHCVNAOIN-UHFFFAOYSA-L 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- KLYHSJRCIZOUHE-UHFFFAOYSA-N hept-3-yne Chemical compound CCCC#CCC KLYHSJRCIZOUHE-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- RAYTXPDVKZFUEI-UHFFFAOYSA-N non-4-yne Chemical compound CCCCC#CCCC RAYTXPDVKZFUEI-UHFFFAOYSA-N 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- GROJOWHVXQYQGN-UHFFFAOYSA-N tetradecyl sulfonic acid Chemical compound CCCCC(CC)CCC(CC(C)C)OS(O)(=O)=O GROJOWHVXQYQGN-UHFFFAOYSA-N 0.000 description 1
- LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/16—Acetylenic compounds
Definitions
- the uppermost layer or coatingv of the composite has an electrode potential lower than the lowermost layer or coating, i.e., the coating next adjacent the basis metal to be protected.
- intermediate layers of differing electrode potential have also been provided but like the known double layer systems the uppermost layer has an electrode potential lower than the layer nextadjacent to it.
- a nickel composite coating having a high luster and corrosion resistance is obtained by employing a lowermost layer of electrodeposited nickel having an electrode potential sufficiently great to reduce corrosion effected in industrial atmospheres.
- the lowermost nickel-containing layer is obtained by using a nickel in which A and A are selected from the group consisting 3,180,803 i atented Apr. 27, 1%65 of lower alkyl radicals and 31:0-1, R and R are selected from the group consisting of H, OH,
- X is selected from the group consisting of hydrogen and a halogen
- n is an'integer equal to the number of quaternary N atoms in' R and R with the proviso that the compound contain at least one quaternary N atom.
- the novel brightener of this invention is generally used in amounts between 0.1 to 10 millimoles per liter of bath solution and preferably between 0.2 to 2.0 millimoles per liter of solution.
- the process of the invention involves operating a bath at conventional nickel plating temperatures ranging from about 30 C. to as high as C. with a range of 40-65 C. being especially desirable.
- the pH of the plating bath can range from around 1.5 to 5.0 with 3.0 to 5.0 being found especially suitable in the majority of cases.
- Practically all baths for electroplating nickel contain nickel sulfate, 21 chloride, usually nickel chloride; a budering agent, usually boric acid; and a wetting agent, e.g., sodium lauryl sulfate, sodium lauryl ether sulfate, and 7-ethyl-2-methyl-4 undecanol sulfate.
- Such types of baths include the well-known Watts-type bath and high chloride type bath.
- the Watts bath solution to which the brightener of the second class of this invention can be added typically comprises around 300 grams per liter of nickel sulfate, 60 grams per later of nickel chloride and 40 grams per liter of boric acid.
- the foregoing bath composition and specified operating conditions are not critical in the basic Watts bath solution and the particular temperature and pH thereof may vary within the indicated ranges Without adverse effect.
- Considerable latitude is also permissible in respect to the types and concentrations of the nickel salts employed, for instance, as the source of the nickel, a combination of nickel iluoborate with nickel sulfate and nickel chloride, or a combination of nickel fluoborate with nickel chloride can be used.
- the upper nickel layer of the composite coating may be deposited from a basic bath similar to the ones used for plating the lowermost layer but it should include a brightener of the first class preferably an organic sulfoncompound such as p-tolucne sulfonamide, o-benzoyl sulfimide, benzene sulfonamide, naphthalene sulphonic acid, benzene sulphonic acid, Z-butyne, 1,4-disulphonic acid, or allyl sulphonic acid together with Z-butyne 1,4-dioxyethanesulphonic acid.
- the organic sulphoncompound will be present in amounts ranging from 1 to 10 grams per liter of solution.
- the upper nickel layer of the composite coating can contain a second brightener of the second class, i.e., one which is different from the novel secondary brighteners of this invention provided in the lower nickel layer.
- a second brightener of the second class are: l-propargyl amino ethylene imidazol, Z-propenyl imidazol, Z-ethynyl imidazol, 2-vinyl imidazol, 2-propenyl-3-diethylene-diauxin-imidazol, 2-(5- phenylethenyl)-3-(fl-hydroxyethyl) imidazol, 3-propynyl imidazol, 2-propenyl-3-(fl-hydroxyethyl) imidazol, 3- propenyl imidazol, 2-propenyl-3-arnino ethyl imidazol, 2- propenyl-3-butyl imidazol, 2 propenyl 4,5 dimethylimida
- novel brightener of the second class of this invention advantageously is used to produce a lowermost coating on a base metal, the lowermost coating being superimposed by one or more coatings preferably of bright nickel to effect a composite coating, it can also advantageously be employed as a single coating to produce a ductile and corrosion resistant sulphur-free coating for a basis metal having a chemical resistance generally about 2.5 times greater than that exhibited by conventional semi-bright coatings.
- a brightener of the first class can be provided to the plating bath containing the novel brighteners of the second class of this invention and especially effective brighteners of the first class are aromatic sulphonic acid compounds which when so included produce a sulphur-containing nickel coating possessing favorable stress-free properties as well as good ductility and corrosion resistance characteristics.
- aromatic sulphonic acid compounds which when so included produce a sulphur-containing nickel coating possessing favorable stress-free properties as well as good ductility and corrosion resistance characteristics.
- the addition of the sodium salt of naphthalene trisulphonic acid for example, is quite effective.
- Other triand dinaphthalene sulphonics may likewise be employed.
- Such other agents include naphthol and sulphonic acids, naphthalamine sulphonic acids, toluidine sulphonic acids and tolidine sulphonic acids or their salts.
- aromatic sulphonic acid compounds can be employed in amounts ranging from 0.5 to 25 grams per liter of bath solution.
- an aqueous acidic nickelcontaining bath was made up with the specified components. Electrodeposition was carried out by passing electric current through an electric circuit comprising an anode and a sheet metal or rod cathode, both immersed in the bath. The baths were agitated, usually by a moving cathode.
- the examples utilizing the novel brighteners of the second class of this invention resulted in a nickel coating with favorable ductility and corrosion resistance properties.
- a brightener of the first class i.e., an aromatic sulphonic compound
- the resulting sulphur-containing nickel coating also exhibited favorable stress-free properties.
- a composite coating was produced which resulted in wholly electrochemical corrosion resistance in severe industrial atmospheres.
- Nickel sulfate g./l 300 Nickel chloride g./l 60 Boric acid g./1 40 Sodium lauryl sulfate g./l 0.2-0.5 pH 3.0-5.0 Temperature C 40-63 Current density amperes/dm. 1-10
- Example 1 Propargyl-hydroxy-ammonium bromide mmol/l 0.2
- Example 2 Propargyl-hydroxy-ammonium bromide mmol/l 0.5 Sodium salt of naphthalene trisulphonic acid g./l 10
- Example 3 Propargyl-dihydroxy-ammonium bromide -mmol/L- 0.5 Sodium salt of naphthalene trisulphonic acid g./l 10
- Example 4 1-hydroxy-2-butyne-N-hydroxy ammonium chloride mmol/l 0.2 Sodium salt of naphthalene trisulphonic acid g./l l
- Example 5 1-hydroxy-2-butyne-N-hydroxy ammonium chloride mmol/l 0.5 Sodium salt of naphthalene trisulphonic acid g./l 10
- Example 6 1-hydroxy-Z-butyne-N-dihydroxy ammonium chloride mmol/1 0.2
- Example 7 2-butyne, 1,4-N-hydroxy ammonium chloride mmol/l 0.5 Sodium salt of naphthalene trisulphonic acid g./l 10
- Example 8 4-nonyne, 1,9-N-dihydroxy ammonium chloride mmol/l 0.5
- Example 9 Propargyl dihydroxy ammonium chloride -mmol/L- 0.5 Sodium salt of naphthalene trisulphonic acid g./l 10
- Example 10 3-heptyne, 1,7-N-l1ydroxy ammonium chloride mmol/l 10
- Example 1 Propargyl dihydroxy ammonium hydroxide mmol/l 0.1 Sodium salt of naphthalene trisulphonic acid g./l 0.5
- Example 12 [BI-NICKEL PLATE] Lower plate: Propargyl hydroxy ammonium bromide mmol/l 0.5 Upper plate: Same basic bath as for lower plate except that 2 grams per liter of one or more of the following brighteners of the first class: p-toluene sulfonamide, o-benzoyl sulfimide, benzene sulfonamide, naphthalene sulphonic acid, benzene sulphonic acid together with 0.001 g./l of a brightener of the second class such as propargylaminoethylene imidazol are dissolved in the bath.
- a brightener of the second class such as propargylaminoethylene imidazol
- Example 13 [BI-NICKEL PLATE] Lower plate: Propargyl dihydroxy ammonium bromide mmol/l 10 Sodium salt of naphthalene trisulphonic acid g./l 10 Sodium saecarate -g./1 0.5
- Upper plate Same basic bath as for lower plate except that 10 grams per liter of one or more of the following brighteners of the first class: ptoluene sulfonamide, o-benzoyl sulfidide, benzene sulfonamide, naphthalene sulphonic acid and benzene sulphonic acid together with 0.001 g./l of a brightener of the second class such as S-propynyl imidazol are dissolved in the bath.
- a brightener of the second class such as S-propynyl imidazol
- An aqueous acid bath solution for electroplating nickel containing at least one nickel salt as a source of nickel which plating solution includes a brightener of the second class having the structural formula in which A and A are selected from the group consisting of lower alkyl radicals and y is equal to to 1; R and R are selected from the group consisting of H, OH, NH OH, NH(0H) X is selected from the group consisting of halogen and OH and n is an integer equal to the number of quaternary N atoms in R and K With the proviso that at least one of R and R contains a quaternary N atom.
- a nickel plating solution as defined in claim 1 which further includes an aromatic sulfonic acid compound in amounts sufiicient to provide stress-free properties to the electroplated nickel.
- An aqueous acid bath solution for electroplating nickel containing at least one nickel salt as a source of nickel, which plating solution includes a brightener of the second class having the structural formula:
- a and A are selected from the group consisting of lower alkyl radicals and y is equal to 0 to 1; R and R are selected from the group consisting of H, OH, NH OI-I, NH(OH) X is selected from the group consisting of halogen and OH and n is an integer equal to the number of quaternary N atoms in R and R with the proviso that at least one of R and R contains a quaternary N atom, said brightener of the second class being present in amounts from 0.1 to 10 mmols. per liter of solution and an aromatic sulfonic acid compound in amounts of 0.5 to 25 grams per liter of said solution.
- NH OH, NH(OH) X is selected from the group consisting of halogen and OH and n is an integer equal to the number of quaternary N atoms in R and R with the proviso that at least one of R and R contains a quaternary N atom.
- the process of producing nickel deposits of improved ductility and corrosion resistance characteristics on a metal base which comprises electroplating nickel from an aqueous acid bath containing nickel mainly in the form of a soluble inorganic salt, in the presence of a brightener of the second class having the formula in which A and A are selected from the group consisting of lower alkyl radicals and y is equal to 0 to 1; R and R are selected from the group consisting of H, OH, NH OH, NH(OH) X is selected from the group consisting of halogen and OH and n is an integer equal to the number of quaternary N atoms in R and R with the proviso that at least one of R and R contains a quaternary N atom, said brightener of the second class being present in amounts from 0.1 to 10 mmols. per liter of solution and an aromatic sulphonic acid compound in amounts of 0.5 to 25 grams per liter of solution.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE5909/63A SE302227B (en:Method) | 1963-05-28 | 1963-05-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3180808A true US3180808A (en) | 1965-04-27 |
Family
ID=20267505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US327102A Expired - Lifetime US3180808A (en) | 1963-05-28 | 1963-11-29 | Nickel plating bath |
Country Status (4)
Country | Link |
---|---|
US (1) | US3180808A (en:Method) |
DE (1) | DE1496802A1 (en:Method) |
GB (1) | GB1068567A (en:Method) |
SE (1) | SE302227B (en:Method) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4102755A (en) * | 1973-06-01 | 1978-07-25 | Langbein-Pfanhauser Werke Ag | Method of and electrolytic bath for the electrodeposition of semibright nickel and nickel-cobalt coatings upon a metal surface |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4077855A (en) * | 1976-05-04 | 1978-03-07 | Francine Popescu | Bright nickel electroplating bath and process |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2879211A (en) * | 1956-11-16 | 1959-03-24 | Hanson Van Winkle Munning Co | Electroplating duplex nickel coatings |
US2905602A (en) * | 1954-11-05 | 1959-09-22 | Dehydag Gmbh | Production of metal electrodeposits |
US3006822A (en) * | 1957-05-08 | 1961-10-31 | Langbein Pfanhauser Werke Ag | Electro-deposition of nickel coatings |
US3079436A (en) * | 1955-11-25 | 1963-02-26 | Rohm & Haas | Bis-quaternary ammonium compounds |
US3090733A (en) * | 1961-04-17 | 1963-05-21 | Udylite Res Corp | Composite nickel electroplate |
US3094561A (en) * | 1959-06-04 | 1963-06-18 | Sahyun | Halocinnamyl quaternary ammonium compounds |
-
1963
- 1963-05-28 SE SE5909/63A patent/SE302227B/xx unknown
- 1963-11-29 US US327102A patent/US3180808A/en not_active Expired - Lifetime
-
1964
- 1964-05-27 DE DE19641496802 patent/DE1496802A1/de active Pending
- 1964-05-27 GB GB21978/64A patent/GB1068567A/en not_active Expired
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2905602A (en) * | 1954-11-05 | 1959-09-22 | Dehydag Gmbh | Production of metal electrodeposits |
US3079436A (en) * | 1955-11-25 | 1963-02-26 | Rohm & Haas | Bis-quaternary ammonium compounds |
US2879211A (en) * | 1956-11-16 | 1959-03-24 | Hanson Van Winkle Munning Co | Electroplating duplex nickel coatings |
US3006822A (en) * | 1957-05-08 | 1961-10-31 | Langbein Pfanhauser Werke Ag | Electro-deposition of nickel coatings |
US3094561A (en) * | 1959-06-04 | 1963-06-18 | Sahyun | Halocinnamyl quaternary ammonium compounds |
US3090733A (en) * | 1961-04-17 | 1963-05-21 | Udylite Res Corp | Composite nickel electroplate |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4102755A (en) * | 1973-06-01 | 1978-07-25 | Langbein-Pfanhauser Werke Ag | Method of and electrolytic bath for the electrodeposition of semibright nickel and nickel-cobalt coatings upon a metal surface |
Also Published As
Publication number | Publication date |
---|---|
GB1068567A (en) | 1967-05-10 |
SE302227B (en:Method) | 1968-07-08 |
DE1496802A1 (de) | 1969-04-30 |
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