US3139393A - Electrodeposition - Google Patents

Electrodeposition Download PDF

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Publication number
US3139393A
US3139393A US70924A US7092460A US3139393A US 3139393 A US3139393 A US 3139393A US 70924 A US70924 A US 70924A US 7092460 A US7092460 A US 7092460A US 3139393 A US3139393 A US 3139393A
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US
United States
Prior art keywords
nickel
bright
semi
phenylpropiolamide
bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US70924A
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English (en)
Inventor
John A Hartman
Passal Frank
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
M&T Chemicals Inc
Original Assignee
M&T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NL271581D priority Critical patent/NL271581A/xx
Application filed by M&T Chemicals Inc filed Critical M&T Chemicals Inc
Priority to US70924A priority patent/US3139393A/en
Priority to GB34715/61A priority patent/GB996599A/en
Priority to FR877871A priority patent/FR1304964A/fr
Priority to DEM50949A priority patent/DE1208593B/de
Application granted granted Critical
Publication of US3139393A publication Critical patent/US3139393A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt

Definitions

  • semi-bright nickel deposits are electrodeposited from aqueous acid nickel plating baths containing as the brightening additive a small but effective amount of phenylpropiolic acid or phenylpropiolamide.
  • Baths from which the semi-bright nickel deposits are obtained in accordance with the present invention have excellent leveling and covering power.
  • the deposit is relatively ductile, and in appearance, is finely grained, milky, and lustrous.
  • the deposit appears to be columnar in nature as contrasted with the general lamellar-type deposit characteristic of bright nickel. It has been found to have excellent corrosion resistance.
  • the deposit may be buffed to a bright finish or it may be used as the basis for electrodeposition of a bright nickel deposit, resulting in a corrosion resistant duplex nickel electrodeposit.
  • baths for electroplating nickel contain nickel sulfate; a chloride, usually nickel chloride; a bufiering agent, usually boric acid; and a wetting agent, e.g., sodium lauryl sulfate, sodium lauryl ether sulfate, and sodium 7-ethyl- 2-methyl-4-undecanol sulfate.
  • Such baths include the well-known Watts bath and other baths containing as the source of the nickel a combination of nickel fluoborate with nickel sulfate and nickel chloride, or a combination of nickel fluoborate with nickel chloride.
  • a Watts-type bath containing about 300 g./l. (grams per liter) of nickel sulfate and about 60 g./ 1. of nickel chloride is preferred.
  • Watts-type baths are generally within the concentration range noted in Table I.
  • Nickel chloride 30 to 120 g./l.
  • Boric acid 30 to 50 g./l.
  • Temperature 30 to 65 C. pH 2.5 to 4.5 electrometric.
  • acetylacetone between 0.5 g./l. and 5 g./l., and preferably 2 g./l. to 4 g./l.
  • acetylacetone between 0.5 g./l. and 5 g./l., and preferably 2 g./l. to 4 g./l.
  • methylhydroxybutanone between 0.5 g./l. to 3 g./l., and preferably 1 g./l. to 2 g./l.
  • diacetone alcohol between 0.5 g./l. and 2 g./l., and preferably 1 g./l. to 2 g./l.
  • 2- butene-1,4-di0l between 0.1 g./l.
  • acetylacetone is preferred because of its low cost and adequate solubility characteristics (in excess of 20 g./l. in a Watts bath).
  • Phenylpropiolle acid 0. 2 Phenylpropiolamide 0. 2 do 0.05 Phenylpropiolic acid 0.1 Phenylpropiolamide. 0. 45 6 Phenylpropiolie acid- 0.3 7 Phenylpropiolamide 0. 2
  • both phenylpropiolic acid and phenylpropiolamide act as auxiliary brighteners in conjunction with the conventional sulfonated organic Secondary brighteners such as saccharin, sulfonated dibenzothiophene dioxide, and in conjunction with such primary brighteners as the heterocyclic, aliphatic, and aromatic nitriles, triphenylmethane, etc., to yield mirror-bright nickel.
  • the semi-bright nickel electrodeposits are usually plated on copper or a copper alloy basis metal. However, they may be electrodeposited directly on such metals as iron, steel, etc.
  • a Watts-type electrolytic bath for the electrodeposition of semi-bright nickel containing as the semi-bright additive (A) between 0.1 g./l. and 0.3 g./l. of phenylpropiolamide; together with (B) one auxiliary additive selected from the following group of five compounds in the amount indicated in parenthesis following the specified compound: acetonylacetone (0.5 g./l. to g./ 1.); acetylacetone (0.5 g./l. to 5 g./l.); methylhydroxybutanone (0.5 g./l. to 3 g./l.); diacetone alcohol (0.5 g./l. to 2 g./l.); and 2- butene-1,4-diol (0.1 g./l. to 0.2 g./l.).
  • A between 0.1 g./l. and 0.3 g./l. of phenylpropiolamide
  • B one auxiliary additive selected from the following group of five compounds in
  • An aqueous electrolytic bath for the electrodeposition of semi-bright nickel consisting essentially of about 300 g./l. of nickel sulfate, about 60 g./1. of nickel chloride, and about 45 g./l. of boric acid, and containing as the semi-bright additive between 0.1 g./l. and 0.3 g./l.
  • a process for electroplating semi-bright nickel comprising electrodepositing nickel from a Watts-type electroplating bath containing'as the semi-bright additive
  • phenylpropiolamide in an amount between 0.025 g./l.
  • a process for electroplating semi-bright nickel comprising electrodepositing nickel from a Watts-type electroplating bath containing as the semi-bright additive (A) phenylpropiolamide in an amount between 0.025 g./l. and 0.5 g./l.; together with (B) one auxiliary additive selected from the following group of five compounds in the amount indicated in parentheses following the specified compound:'acetonylacetone (0.5 g./l. to 5 g./l.); acetylacetone (0.5 g./l. to 5 g./l.); methylhydroxybutanone (0.5 g./l. to 3 g./l.); diacetone alcohol (0.5 g./l. to 2 g./l.); and 2-butene-L4-diol (0.1 to 0.2 g./l.).
  • A phenylpropiolamide in an amount between 0.025 g./l. and 0.5 g./l.
  • B one
  • a process for electroplating semi-bright nickel comprising electrodepositing nickel from a Watts-type electroplating bath containing as thesemi-bright additive (A). phenylpropiolamide in an amount between 0.1 g./l. and 0.3 g./l.; together with (B) one auxiliary additive selected from the following group of five compounds inthe amount indicated in parenthesis following the specified compound: acetonylacetone (2 g./l. to 4 g./l.); acetylacetone (2 g./l. to 4 g./l); methylhydroxybutanone (1 g./l. to 2 g./l.); diacetone alcohol (1 g./l. to 2 g./l.); and 2-butene-l,4-diol (0.1 g./l. to 0.15 g./l.).

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Manufacture And Refinement Of Metals (AREA)
US70924A 1960-11-22 1960-11-22 Electrodeposition Expired - Lifetime US3139393A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
NL271581D NL271581A (enrdf_load_stackoverflow) 1960-11-22
US70924A US3139393A (en) 1960-11-22 1960-11-22 Electrodeposition
GB34715/61A GB996599A (en) 1960-11-22 1961-09-27 Improvements in or relating to nickel plating
FR877871A FR1304964A (fr) 1960-11-22 1961-11-03 Procédé et bain pour le dépôt électrolytique du nickel
DEM50949A DE1208593B (de) 1960-11-22 1961-11-21 Saures galvanisches Nickelbad zum Abscheiden halbglaenzender UEberzuege

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US70924A US3139393A (en) 1960-11-22 1960-11-22 Electrodeposition

Publications (1)

Publication Number Publication Date
US3139393A true US3139393A (en) 1964-06-30

Family

ID=22098183

Family Applications (1)

Application Number Title Priority Date Filing Date
US70924A Expired - Lifetime US3139393A (en) 1960-11-22 1960-11-22 Electrodeposition

Country Status (5)

Country Link
US (1) US3139393A (enrdf_load_stackoverflow)
DE (1) DE1208593B (enrdf_load_stackoverflow)
FR (1) FR1304964A (enrdf_load_stackoverflow)
GB (1) GB996599A (enrdf_load_stackoverflow)
NL (1) NL271581A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3349015A (en) * 1963-07-17 1967-10-24 M & T Chemicals Inc Electrodeposition of bright nickel
US3449398A (en) * 1963-07-17 1969-06-10 M & T Chemicals Inc Cyanoalkyl phenylpropiolamides
US3990955A (en) * 1974-02-04 1976-11-09 The International Nickel Company, Inc. Electrodeposition of hard nickel
US20080060945A1 (en) * 2004-04-21 2008-03-13 Rudolf Linde Production of a Structured Hard Chromium Layer and Production of a Coating
US20100112376A1 (en) * 2002-11-29 2010-05-06 Federal-Mogul Burscheid Gmbh Production of structured hard chrome layers
US20110115167A1 (en) * 2008-04-04 2011-05-19 Federal-Mogul Burscheid Gmbh Structured chrome solid particle layer and method for the production thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB525848A (en) * 1939-03-02 1940-09-05 Udylite Corp Improvements in or relating to the electro-deposition of nickel
US2781305A (en) * 1953-08-14 1957-02-12 Udylite Res Corp Electrodeposition of nickel
FR1141135A (fr) * 1956-01-18 1957-08-26 Perfectionnements à l'obtention de dépôts métalliques par électrolyse
US2849353A (en) * 1955-02-08 1958-08-26 Hanson Van Winkle Munning Co Bright nickel plating

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE848890C (de) * 1950-09-27 1952-09-08 W Kampschulte & Cie Dr Verfahren zur elektrolytischen Herstellung hochglaenzender Nickelueberzuege
US2800441A (en) * 1955-10-04 1957-07-23 Udylite Res Corp Electrodeposition of nickel

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB525848A (en) * 1939-03-02 1940-09-05 Udylite Corp Improvements in or relating to the electro-deposition of nickel
GB525847A (en) * 1939-03-02 1940-09-05 Udylite Corp Improvements in or relating to the electro-deposition of nickel
US2781305A (en) * 1953-08-14 1957-02-12 Udylite Res Corp Electrodeposition of nickel
US2849353A (en) * 1955-02-08 1958-08-26 Hanson Van Winkle Munning Co Bright nickel plating
FR1141135A (fr) * 1956-01-18 1957-08-26 Perfectionnements à l'obtention de dépôts métalliques par électrolyse

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3349015A (en) * 1963-07-17 1967-10-24 M & T Chemicals Inc Electrodeposition of bright nickel
US3449398A (en) * 1963-07-17 1969-06-10 M & T Chemicals Inc Cyanoalkyl phenylpropiolamides
US3990955A (en) * 1974-02-04 1976-11-09 The International Nickel Company, Inc. Electrodeposition of hard nickel
US20100112376A1 (en) * 2002-11-29 2010-05-06 Federal-Mogul Burscheid Gmbh Production of structured hard chrome layers
US8277953B2 (en) 2002-11-29 2012-10-02 Federal-Mogul Burscheid Gmbh Production of structured hard chrome layers
US20080060945A1 (en) * 2004-04-21 2008-03-13 Rudolf Linde Production of a Structured Hard Chromium Layer and Production of a Coating
US8110087B2 (en) * 2004-04-21 2012-02-07 Federal-Mogul Burscheid Gmbh Production of a structured hard chromium layer and production of a coating
US20110115167A1 (en) * 2008-04-04 2011-05-19 Federal-Mogul Burscheid Gmbh Structured chrome solid particle layer and method for the production thereof
US8337687B2 (en) 2008-04-04 2012-12-25 Federal-Mogul Burscheid Gmbh Structured chrome solid particle layer and method for the production thereof

Also Published As

Publication number Publication date
NL271581A (enrdf_load_stackoverflow)
FR1304964A (fr) 1962-09-28
GB996599A (en) 1965-06-30
DE1208593B (de) 1966-01-05

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