US3046131A - Photographic material containing light sensitive quinone diazides - Google Patents
Photographic material containing light sensitive quinone diazides Download PDFInfo
- Publication number
- US3046131A US3046131A US71518258A US3046131A US 3046131 A US3046131 A US 3046131A US 71518258 A US71518258 A US 71518258A US 3046131 A US3046131 A US 3046131A
- Authority
- US
- United States
- Prior art keywords
- water
- layer
- water soluble
- soluble salt
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/162—Protective or antiabrasion layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31844—Of natural gum, rosin, natural oil or lac
Definitions
- This invention relates to an improved light-sensitive material which is especially useful in the field of reproduction. More particularly it relates to laminated material comprising a support layer an intermediate layer containing a light-sensitive and water-insoluble substance and a coating of a water-soluble substance.
- Water-insoluble diazo compounds belonging to the group of the so-called diazo anhydrides otherwise known as quinone diazides have been found to be well suited for sensitizing a base material for making images which can be used as stencils or after inking with greasy printing ink, as printing plates.
- the water-insoluble diazo compounds, in solution with organic solvents are coated in a thin layer on a support layer, preferably on metal foils or plates. After the layers have been dried and exposed to light under a pattern the exopsed material can be developed with dilute kaline solutions to show a positive image from a positive master and a negative image from a negative master, or when certain of the water-insoluble diazo anhydrides are used, development may be accomplished with dilute acids. Development with acid reacting agents provides positive images from negative masters and negative images from positive masters.
- the lightsensitive layers for example such layers as have been produced from water-insoluble quinone diazides, often show a feeble coloring in those areas of the layer that are not covered by the pattern and that contact the glass of the copying frame.
- This coloring may be caused by heat radiation from the glass but whatever its cause it is disadvantageous in that it is very ditficult to remove and may cause a coloring of the background of the copies drawn from the image.
- the protective coating may be produced by applying to the surface of the light-sensitive layer by means of, for example, a brush or a plate-whirler, an aqueous solution of dextrine, gum arabic, mesquite gum, tragacanth, water-soluble salts of pectic acid and alginic acid, water-soluble cellulose others, such as methylcellulose, hydroxyethylcellulose, water-soluble salts of carboxyalkyl cellulose, water soluble salts of carboxy alkyl starch, glue, albumen, pepton, water-soluble caseinates, polyvinyl alcohol, polyvinylpyrolidone, polyacrylamides, water-soluble salts of polyacrylic acids or other water-soluble polymerization products, which are capable of forming films. After drying the solution which has been applied covers the lightsensitive layer as a protective coating.
- aqueous solutions containing 0.2 to of the colloidal substances and showing an approximately neutral re ction are suited for producing the colloidal coating.
- the presence of the protective coating prevents the direct contact between the light-sensitive layer and the glass of the copying apparatus.
- Another important advantage of the coating is that it protects the thin light-sensitive diazo layer from being damaged by friction, dust or direct contact with the fingers. If the light-sensitive layer is not protected and is touched by the man handling it, then fingerprints become reproduced on the copies during the printing and especially in the cases where the negative working process is followed.
- the coating also improves development of the image because it provides for improved wetting of the exposed layer.
- wetting or emulsifying agents such as alkyl substituted naphthalene sulfonic acids, saponins or sulfonates of high molecular aliphatic alcohols to the solutions of watersoluble film forming substances improves the formation of a uniform coating and the development of the images.
- a 1.5% solution of the a-naphthylester of naphthoquinone-( 1,2)-diazide-( 2)-5-sulfonic acid in glycol-mono methylether is coated as for example, with the use of rollers as a thin layer on an aluminum foil which has been mechanically roughened. After drying the layer, a 4 to 6% aqueous solution of gum arabic or dextrine is applied to the layered foil in the same manner and then dried.
- the material thus obtained is exposed to light under a master and subsequently developed with a 3% aqueous solution of trisodium phosphate. From a positive master a positive image is obtained. A perfectly clean background is obtained in those areas which had not been protected by the master and which contacted the glass.
- esters or amides of a quinone diazide sulfonic acid may be used for the formation of the light-sensitive layer underneath the water-soluble layer.
- the u-naphthylester of naphthoquinone-(1,2)-diazzide-(2)-5-sulfonic acid is produced in the following manner:
- a 1% solution of the naphthoquinone-(l,2)-diazide- (2)-4-sulfonic acid ester of 7-hydroxy-2-e'thyl-N-(n-propyl)naphth'o-1,2:4,5-imidazole in glycolmonomethylether is whirl-coated onto a roughened or superficially oxidized aluminum foil.
- a 5% aqueous solution of dextrine or a 1% aqueous solution of polyvinyl-alcohol mixed with a small quantity of a saponin is coated onto the dried layer by means of a cotton swab and dried.
- the light-sensitive material thus obtained is exposed to light under a transparent negative; then the exposed layer is developed by wiping over with a 2.5% phosphoric acid with the aid of a cotton swab and the developer is removed by rinsing the layer with water. After rubbing in with greasy printing ink the thus obtained positive image may be used for printing in the usual manner.
- the reaction mixture is dissolved in water and by neutralizing the aqueous solution with the aid of hydrochloric acid the crude 7-hydroxy 2 ethyl 1(or 3) N (n propyl) naphtho 1,2:4,5-imidazole is separated out.
- the imidazole is purified by recrystallization from alcohol and then has a melting point of 250 to 251 C.
- the exposed layer After exposing the dried layer under a positive pattern, the exposed layer is developed with a 3% aqueous solution of trisodium-phosphate and then rinsed with water.
- the positive image thus obtained can be used, in the usual way, for printing in a customary offset printing machine. This process guarantees prints free from tone, whereas plates not coated with alginate show some tone wherever they come into contact with the glass plate of the copying machine.
- condensation product of 2 moles of naphthoquinone-(1,2)-diazide-(2)-5-sulfochloride and 1 mole of 2,2'-dihydroxy-l,l'-dinaphthylmethane can be prepared in a manner similar to that described in Example 1 and the product corresponds to the following structural formula:
- V o ll ll may, @Nz
- a mechanically roughened alu- -rninum foil is coated with a solution containing 2% naphthoquinone-( 1,2 -diaZide-( 2 -5 -sulfonic acid-p-xylide and 0.2% 1phenyl-3-methylpyrazolon-5, dissolved in glycolmonornethylether.
- the coated side of the foil is exposed to light under a positive pattern.
- the exposed oil is r t s e e t9 he i fl en a mo ia gas whereby a positive image of the pattern appears.
- the background of the image is cleared by treating the coated side of the toil with a solution of 5% aqueous disodium-phosphate.
- the toll is then rinsed with water.
- the image side of the foil is briefly treated with a solution of gum arabic in phosphoric acid (10 g. phosphoric acid and g. gum arabic to one liter of water).
- the foil can then be used for printing in the offset machine. Prints which are free from tone are obtained, in contrast to foils prepared without any sodium polyacrylate coating which are strongly toning wherever, during the printing process, they have come into direct contact with the glass of the copying machine.
- the above mentioned p-xylidide can be produced in I the usual way by causing naphthoquinone-(1,2)diazide- (2)-5-sulfonic acid to react with xylidine in an organic solvent in the presence of acid binding substances.
- Laminated material for use in photography consisting of a support layer, an intermediate layer of light sensitive material comprising a water insoluble quinone diazide, and a top coat consisting essentially of a substance of the group consisting of dextrine, gum arabic, mesquite gum, water-soluble salt of the group consisting of pectic acid and alginic acid, water soluble cellulose ether, water soluble salt of carboxy alkyl cellulose, water soluble salt of carboxy alkyl starch, glue, albumen, pepton, water soluble, caseinate, polyvinylalcohol, polyvinylpyrolidone, polyacrylamide, and water soluble salt of poly-acrylic acid.
- Laminated material for use in photography consisting of a support layer, an intermediate layer comprising a water insoluble quinone diazide, and a top coat consisting essentially of dextrin.
- Laminated material for use in photography consisting of a support layer, an intermediate layer comprising a water insoluble quinone diazide, and a top coat consisting essentially of polyvinyl alcohol.
- Laminated material for use in photography consisting of a support layer, an intermediate layer comprising a water insoluble quinone diazide, and a top coat consisting essentially of gum arabic.
- Laminated material for use in photography consisting of a support layer, an intermediate layer comprising a water insoluble quinone diazide, and a top coat consisting essentially of alginic acid.
- Laminated material for use in photography consisting of a support layer, an intermediate layer comprising a water insoluble quinone diazide, and a top coat consisting essentially of a water soluble salt of carboxyl alkyl cellulose.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEK12749A DE918848C (de) | 1952-01-05 | 1952-01-05 | Unter Verwendung von Diazoverbindungen hergestelltes lichtempfindliches Material |
Publications (1)
Publication Number | Publication Date |
---|---|
US3046131A true US3046131A (en) | 1962-07-24 |
Family
ID=25793124
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US71518258 Expired - Lifetime US3046131A (en) | 1952-01-05 | 1958-02-14 | Photographic material containing light sensitive quinone diazides |
Country Status (7)
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3868254A (en) * | 1972-11-29 | 1975-02-25 | Gaf Corp | Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants |
US4093463A (en) * | 1977-02-22 | 1978-06-06 | Eastman Kodak Company | Water soluble binder overcoat on vesicular element containing N2 -releasing agent |
US4168979A (en) * | 1974-03-19 | 1979-09-25 | Fuji Photo Film Co., Ltd. | Light-sensitive printing plate with matt overlayer |
US4197128A (en) * | 1973-05-29 | 1980-04-08 | Fuji Photo Film Co., Ltd. | Light-sensitive O-quinone diazide containing copying material |
US4200463A (en) * | 1975-12-19 | 1980-04-29 | Motorola, Inc. | Semiconductor device manufacture using photoresist protective coating |
US4268611A (en) * | 1974-03-19 | 1981-05-19 | Fuji Photo Film Co., Ltd. | Contact photographic process for producing a planographic printing plate |
US4292392A (en) * | 1976-02-25 | 1981-09-29 | Fuji Photo Film Co., Ltd. | Protective layer of fatty acid or nylon on photosensitive resin for metal-image forming element |
WO1986007473A1 (en) * | 1985-06-03 | 1986-12-18 | Fairmount Chemical Co., Inc. | Contrast enhancement layer |
US4784936A (en) * | 1985-10-24 | 1988-11-15 | General Electric Company | Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer |
US5188924A (en) * | 1984-05-14 | 1993-02-23 | Kabushiki Kaisha Toshiba | Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE516716A (US08124317-20120228-C00026.png) * | 1952-01-05 | 1900-01-01 | ||
US3046114A (en) * | 1955-03-01 | 1962-07-24 | Azoplate Corp | Diazo compounds and printing plates manufactured therefrom |
DE4040117C2 (de) * | 1990-12-13 | 1994-02-17 | Fotochem Werke Gmbh | Stahlenempfindliches Material für die Elektronenstrahl- und Röntgenstrahllithographie und Verfahren zur Trockenentwicklung des Materials |
US5506090A (en) * | 1994-09-23 | 1996-04-09 | Minnesota Mining And Manufacturing Company | Process for making shoot and run printing plates |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE497135A (US08124317-20120228-C00026.png) * | 1949-07-23 | |||
BE516716A (US08124317-20120228-C00026.png) * | 1952-01-05 | 1900-01-01 | ||
US2667415A (en) * | 1948-10-15 | 1954-01-26 | Azoplate Corp | Process for producing positive photolithographic printing foils |
US2702243A (en) * | 1950-06-17 | 1955-02-15 | Azoplate Corp | Light-sensitive photographic element and process of producing printing plates |
-
0
- BE BE516716D patent/BE516716A/xx unknown
- NL NL77599D patent/NL77599C/xx active
-
1952
- 1952-01-05 DE DEK12749A patent/DE918848C/de not_active Expired
-
1953
- 1953-01-01 GB GB9453A patent/GB735129A/en not_active Expired
- 1953-01-03 FR FR1069408D patent/FR1069408A/fr not_active Expired
- 1953-01-05 CH CH311827D patent/CH311827A/de unknown
-
1958
- 1958-02-14 US US71518258 patent/US3046131A/en not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2667415A (en) * | 1948-10-15 | 1954-01-26 | Azoplate Corp | Process for producing positive photolithographic printing foils |
BE497135A (US08124317-20120228-C00026.png) * | 1949-07-23 | |||
US2702243A (en) * | 1950-06-17 | 1955-02-15 | Azoplate Corp | Light-sensitive photographic element and process of producing printing plates |
BE516716A (US08124317-20120228-C00026.png) * | 1952-01-05 | 1900-01-01 |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3868254A (en) * | 1972-11-29 | 1975-02-25 | Gaf Corp | Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants |
US4197128A (en) * | 1973-05-29 | 1980-04-08 | Fuji Photo Film Co., Ltd. | Light-sensitive O-quinone diazide containing copying material |
US4217407A (en) * | 1973-05-29 | 1980-08-12 | Fuji Photo Film Co., Ltd. | Light-sensitive O-quinone diazide containing copying material |
US4207106A (en) * | 1973-05-29 | 1980-06-10 | Fuji Photo Film Co., Ltd. | Positive working O-quinone diazide photocopying process with organic resin overlayer |
US4168979A (en) * | 1974-03-19 | 1979-09-25 | Fuji Photo Film Co., Ltd. | Light-sensitive printing plate with matt overlayer |
US4268611A (en) * | 1974-03-19 | 1981-05-19 | Fuji Photo Film Co., Ltd. | Contact photographic process for producing a planographic printing plate |
US4200463A (en) * | 1975-12-19 | 1980-04-29 | Motorola, Inc. | Semiconductor device manufacture using photoresist protective coating |
US4292392A (en) * | 1976-02-25 | 1981-09-29 | Fuji Photo Film Co., Ltd. | Protective layer of fatty acid or nylon on photosensitive resin for metal-image forming element |
FR2381339A1 (fr) * | 1977-02-22 | 1978-09-15 | Eastman Kodak Co | Produit photographique formateur d'image vesiculaire |
US4093463A (en) * | 1977-02-22 | 1978-06-06 | Eastman Kodak Company | Water soluble binder overcoat on vesicular element containing N2 -releasing agent |
US5188924A (en) * | 1984-05-14 | 1993-02-23 | Kabushiki Kaisha Toshiba | Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt |
WO1986007473A1 (en) * | 1985-06-03 | 1986-12-18 | Fairmount Chemical Co., Inc. | Contrast enhancement layer |
US4784936A (en) * | 1985-10-24 | 1988-11-15 | General Electric Company | Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer |
Also Published As
Publication number | Publication date |
---|---|
BE516716A (US08124317-20120228-C00026.png) | 1900-01-01 |
DE918848C (de) | 1954-10-07 |
FR1069408A (fr) | 1954-07-07 |
CH311827A (de) | 1955-12-15 |
GB735129A (en) | 1955-08-17 |
NL77599C (US08124317-20120228-C00026.png) | 1954-10-15 |
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