US3005931A - Ion gun - Google Patents

Ion gun Download PDF

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Publication number
US3005931A
US3005931A US18461A US1846160A US3005931A US 3005931 A US3005931 A US 3005931A US 18461 A US18461 A US 18461A US 1846160 A US1846160 A US 1846160A US 3005931 A US3005931 A US 3005931A
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plasma
anode
ion gun
cathode
annulus
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US18461A
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Raphael A Dandl
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Priority to US18461A priority Critical patent/US3005931A/en
Priority to GB1183/61A priority patent/GB916854A/en
Priority to NL260940A priority patent/NL260940A/xx
Priority to FR856787A priority patent/FR1284926A/fr
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/22—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma for injection heating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/10—Duoplasmatrons ; Duopigatrons

Definitions

  • This invention relates to apparatus for the production of an electrically neutral ionized plasma. Such a plasma may be used in a variety of accelerators, mass spectrometers, high temperattnechetniealreactors, and other electrical devices.
  • a plasma In conventional practice, a plasma is usually accompanied by an energetic electron beam, and the plasma is commonly contaminated with varying amounts, of neutral gas particles. Collision processes of the neutral gas particles and other attendant phenomenon seriously alter the behavior of the plasma and :may render such a plasma demonstrt for various uses.
  • a plasma may be generated by electron bombardment of gas molecules as in an arc discharge such as disclosed in the application of John S. Luce, Serial No. 833,897, drafted August 14, 1959, now Patent No. 2,956,195, issued October 11, 1960.
  • the discharge of this application and other similar discharges are not free of objectionable neutral gas particles. Still another characteristic of these prior discharges is that the voltage applied between widely spaced electrodes to produce the discharges causes contaminants :from the electrodes to be introduced into the .ICC
  • the ion gun of this invention is considered suitable for providing a plasma toV be utilized in Va variety of devices characteristically similar in that a plasma, i.e., an electrlcally neutral mixture of ions and electrons, is employed therein for sundry purposes.
  • a plasma i.e., an electrlcally neutral mixture of ions and electrons
  • thermonuclear iields are of interest in-the thermonuclear iields and for experimental purposes; while charged ion beams, which may be produced by charge separation and/or charged particle acceleration treatment of neutral plasdischarges and also causes electric iields within the dismas, 'may be @56d ill Cllalged Particle aclel'als, maSS charges, particularly along the discharge, thus--resalting-inw.SQGCIGDJGCIS and the llli-V certain instabilities therein.
  • xuse Vof Widely spaced electrodes in these prior discharges resulted in the necessity for providing very special baboards and differential pumping means to insure stability of the discharges,
  • FIG. 1 is a cross sectional view of a preferred embodiment of the-inventicnandsn- FIG. 2 is a cross sectional view of chine utilizing the device of FIG. l.
  • the above objects have been accomplished in the present invention by providing an evacuated system in which f there is contained an ion gun for producing a plasma and a region where the plasma isto be utilized.
  • the ion gun comprises an anode and a cathode mounted in concentric relationship with a narrow annulus therebetween.
  • the facing surfaces of the rear portions of the anode and cathode are recessed to form an annular manifold.
  • an annular intermediate electrode Positioned within this manifold is an annular intermediate electrode aligned with the annulus between the anode and cathode. Gas is fed to the manifold and an arc discharge is established between the anode and cathode.
  • a pressure differential is established along theV annulus by the evacuated system and a uniform magnetic iield is established so that the -eld lines traverse and are parallel to a mirror type mau
  • the ion gun Y 1n a magnetic mirror type thermonuclear machine.
  • the ion gun is positioned at about center of one of the magnetic -mirror regions ⁇ to assure as uniform a magnetic iield as possible in the manifold and annulus regions of the ion gun.
  • the resultant hollow plasma will follow the field lines and will terminate against some form of bathe placed in or near theV second magnetic mirror region.
  • This plasma may then be used as a means for lthe breakup of molecular ions causing atomic ions to be formed and magneticallyl trapped within the Ihollow plasma, the plasma wall acting as a shield for the trapped atomic ions against the instreaming of neutral particles from the iwalls of the machine, in a manner similar to that set forth in the application of lohn S. Luce, Serial No.- 833,897, namelydrAlugust 14,1959, entitled, Hollow Carbon Arc Discharge, now Patent No. 2,956,195, issued October 11,Y 1960.
  • FIG. l one embodiment of the subject'device is shown.
  • An anode electrode 1 and a cathode electrode 2 are mounted in concentric relationship with a narrow annuluskS therebetween.
  • the anode 1 is mounted on a conducting electrode support 4 which, in turn, is mounted supported in one end wall of the housing 20.
  • Cathode 2 is mounted directly uponv the end of a second support tube 6 which, in turn, is insulatingly supported in the one end wall of housing 20.
  • - 'I'he facing surfaces of the rear portionsnof the anode and cathode are recessed to form an annular manifold 7.
  • an intermediate cylindrical electrode 8 Positioned within this manifold 7 is an intermediate cylindrical electrode 8 which is mountedon a conducting electrode support 9.
  • This tube 10 is insulatingly supported in the one end wall of housing 20.
  • An exact spacing of this intermediate electrode 8 with respect to the anode 1 and cathode 2 is accomplished bythe insertion of an annular rinsulator 11 between support tube 10 and support tube ,5, andthe concentric annular insulator 12f between support tube 6 and the electrode support 9, A vgas-tight ⁇ seal between these components is provided by the insertion of Q-rmgs or similar seals 13 therebetween.
  • Electrode support 4 is provided with an axial passageway 1n whlch a tube 14 is disposed. This passageway communicates with an axial passageway 15 in anode 1. Passageway 15, in turn, communicates with radial passageways 16 m anode 1. Feed gas, such as hydrogen or deuterlum, for example, is fed from a gas supply 21 through tube 14, passageways 15 and 16 into the manifold 7.
  • the housing 20 forms' a chamber 29 which is evacuated by means of a vacuum pump, not shown, connected to a member 22 communicating with the chamber 29.
  • Tube 6, which supports cathode 2, ⁇ is connected by an electrical lead 28 to the negative terminal of a variable D.C. supply 27.
  • Tube 5, which is electrically connected -to anode 1 is connected by lead 24, switch 2 5, and lead y26 to the positive terminal of supply 27.
  • Thenegative terminal of the supply 27 is grounded, as shown.
  • a uniform magnetic lield is provided by a concentric electromagnetic coil 2.3 disposed around the housing Coil 23 is energized by a source of D.C. potential, not shown.
  • the magnetic field lines provided by this electro.- magnet are in axial alignment -withthe annulus 3 b etween the cathode 2 and anode 1.
  • a baille 17 is disposed in confronting relation to the electrodes of the ion gun and is mounted on the other end of housing 20 by an insulator 18. Battle 17 may be grounded by a lead 19, and a switch 76, if desired.
  • the length of the anode andv cathode is 21/2 in.; diameter of anode is 11A in.; thickness of annulus 3 is Af; in.; effective length of anode and cathode is l in.; outside diameter of cathode is 2 in.; effective length of intermediate electrode 8 is 1% in.; thickness of intermediate electrode is 1/15 in.; inside diameter of manifold 7 is 3:4; in.; and outside diameter of manifold 7 is 1% in.
  • the electrodes 1, 2 and 8 are machined from graphite stock, and the electrode supports and support tubes are copper. Steatite is used as the insulating material-for ⁇ members 11 and 12.
  • the outside diameter of the inter-- mediate electrode 8 is 1% in., so that the outer surface thereof is aligned with the inner surface of the annulus 3.
  • the electrodes may be constructed vfrom stainless steel
  • the insulating members may be constructed from any of conventional inert insulating materials
  • the dimensions of the electrodes and the annulus therebetween may be made larger or smaller with substantially the same-operating results if operating parameters are modified accordingly.
  • the ion gun is aligned in a uniform magnetic eld, for example 3000 gauss, so that iield lines traverse and are parallel to, the annulus 3.
  • the region external Vto the ion gun in the chamber Z9 is evacuated to about 8 X10-5 mm. Hg or less. r[he pressure in the manifold 7 is at a higher value than in chamber 29 during the time the device is producing a plasma. Gas is admitted to the manifold 7 vfrom gas supply 21 through passageways 14, 15, 16.
  • a voltage is applied between the anode 1 and cathode 2 by means of supply 27, and when this voltage reaches about 800 volts, a gas discharge is struck between these electrodes.
  • the discharge can be initiated at lower voltages when the magnetic eld is higher.
  • the voltage is then raised to an operating value of about 1800 volts.
  • the current flow between the anode and cathode is then about 0.2 ampere for the spacing and pressure cited above.
  • an ion plasma is formed along the magnetic field lines within and external to the ion gun.
  • the gas drawn through this annulus by this pressure differential is substantially ionized by the arc discharge between the anode and cathode.
  • the plasma thus emerging from the ion gun is relatively uncontaminated by neutral particles.
  • the plasma will follow the field lines until it strikes the electrode or baille 17.
  • the aim 17 may be used as a reflecting electrode for the plasma which strikes it when the switch 76 is opened, or alternately it may be used as a collector electrode for the plasma when the switch 76 is closed.
  • the ⁇ plasma of ions produced in the operation of the above-described device doesnot haveany applied axial potential gradient therealong.
  • the absence of such an applied potential gradient substantially eliminates extraneous electrical iields, particularly longitudinal fields.
  • the plasma of ions produced by the device described above does not have certain of the objectionable electrical liields which are characteristic of conventional gas-fed are discharges of the prior art.
  • the device of this invention may be operated at higher voltages and currents, and when so operated, cooling means for the elec-V trodes may be required. ⁇ When required, cooling coils would be mounted on the -electrode supports.
  • the housing 20 may be eliminated and an evacuated region of such apparatus may provide the hereinbefore-mentioned means providing an evacuated system.
  • the principles of the ion gun discussed above may be used in a mirror type machine such as disclosed in the embodiment of FIG. 2.
  • a similar type of mirror machine is described in U. S. Patent No. 2,920,234, issued January 5, 1960, to John S. Luce, entitled, Device and Method for Producing a High Intensity Arc Discharge.
  • the ion gun is positionedin one of the magnetic mirror regions such that the magnetic Ifield lines traverse the annulus between the anode and cathode and are substantially parallel with this annulus.
  • the mirror machine of FIG. 2 of the present application comprises an inner chamber 59 and two end chambers 60 and 61.
  • the inner chamber 59 is connected through an opening 63 to a .vacuum pump, not shown.
  • the inner chamber 59 is enclosed by means of a liner 65.
  • the liner .65 may be constructed from stainless steel or Inconel, for example.
  • the inner chamber 59 is enclosed with an outer enclosure 30.
  • Enclosure 30 is provided with an opening 62 in communication with one of the end charnbers 60, and is provided with an opening 64 in communication with the other end chamber 61. Openings 62, 64 are connected to separate vacuum pumps, not shown, for evacuating chambers 60 and 6&1, respectively.
  • Disposed in one end of enclosure 30 is an ion gun assembly consisting of an anode 31, and a cathode 32, defining an annulus 33 therebetween. Cathode -32 is supported by an annular tubular member 36.
  • the anode 31 is supported by the annular tubular member 35.
  • an intermediate electrode 3S Disposed within a manifold 37 between the anode and cathode is an intermediate electrode 3S. This electrode 38 is connected to a concentric tubular member 4i).
  • Disposed about the tubular member 36 of the -ion gun assembly is an annular section of insulating material 73 which supports the concentric tubular members of the gun assembly and entends through the one end of the enclosure 3i).
  • Gas is supplied to the manifold 37 of the ion gun from a gas source 51, through a tube 44, and then through passageways in the anode 31.
  • the members 35, 4t) and 36 are disposed in concentric relation with respect to each other and are held in a suitable spaced relation with respect to each other by insulating means in the same manner as in the device of FIG. 1.
  • Member 36 which is electricdly connected to the cathode 32, is connected to a source of D.C. supply v5'2" by a lead 5S.
  • the other side of DC. supply 57 is connected by a lead 56 to the member 35, which is in electrical contact with the anode 31.
  • rIlle D.C. supply 57 is a Variable D C. supply for supplying operating voltage between the cathode and anode.
  • the anode, cathode, and intermediate electrode of the ion gun are positioned in the center of a magnetic mirror region provided byA an annular electromagnetic' coil
  • a second annularV electromagnetic mirror coil 66 is provided iat the other end ⁇ of the device and is mounted in concentric relation to a baflie or plate 47. This plate 47 is grounded through a plate support member 74, lead 49, and switch 75.
  • the coils 66 and 66 are energized by a source of D.C. potential, not shown.
  • the member 74 is encompassed or surrounded with an insulating material 43 which extends through the other end of the enclosure 30.
  • Disposed between the annular electromagnetic coil 66 and the plate 47 are a plurality of annular admirations 68. These baffles 68 are insulatingly mounted on an extension of the inner' liner 65.
  • the arc discharge is established in an identical manner to that described above for lFIG. l.
  • the pressure diiferential across the annulus 33 between the manifold 37 and the innerachambcriris Such 35.10...
  • the magnetic iield strength is about 3000 gaussfthe voltage aQIlQSSJhS e160- trode at operating value is about 1800 volts, and a plasma of about 3X1()11 particles/cc. is obtainable.
  • the plasma beam 72 of FIG. 2 is substantially free of neutral gas particles because of the fact that the gas is substantially ionized by the arc discharge in the annulus 33 before it leaves the ion gun.
  • This plasma beam 72 may be used as a dissociating mechanism in the same manner as seti-forth in theaforementioned Patent No. 2,956,195.
  • a.Y When the plasma as shown in FIG. 2 is used as a dissociating mechanism, a.Y
  • the n atomic ions will be magnetically trapped due to the effect of the coniining magnetic field and will form a ring of atomic ions. This trapping principle is -fully set forth in the co-pending -application of John S. Luce, Serial No. 728,754, tiled April 15, 1958.
  • the plasma beam 72 of FIG. 2 is considered to be superior to the hollow car on arc discharge of the aforementioned Patent No. 2,956,195, for the reason lthat the plasma 72 isessentially lfree of neutral gas particles, and therefore, when used as a dissociating mechanism, will not introduce extraneous matter or neutral particles into the plasma of atomic ions formed in thetdissociating process.
  • the device of FIG. 2 will-produce -a plasma with Vless contaminants from'electrode materials than plasmas produced by prior arc discharges. Also, there are less baffling and diiferentialV pumping problems withV the device of FIG. 2 than there are for prior arc discharges. In addition, there are less electric fields produced in FIG.
  • the plasma beam 72 will serve as -a means for preventing the instreaming of neutral particles from the walls of the machine, in a manner similar to that set forth in the aforementioned Patent No. 2,956,195.
  • the gas supplied to the ion gun of FIG. 2 may be hydrogen, for example, deuterium, tritium, or mixtures thereof.
  • 'Ihe pressure in chamber 59 is maintained ⁇ at a value of about 3 1O5.rnm. Hg, and the pressure in the end chambers and 61 is maintained at a value of about 1x10-4 mm. Hg, for example. For some applications, lower pressures may be desirable.
  • the accelerator tube 7 is energized by a suitable/high Voltage generator.
  • the beam 71 of Wmolulanions mayihellqb or Dj, for egiample, 'andiale injected from the source 69 and through the accelerator 70 with an energy of about 600 kev.
  • An improved ion gun comprising a container, an ion gun assembly disposed in one end of said container, said ion gun assembly comprising an anode and -a cathode mounted in concentric relationship with a narrow annulus therebetween, an anode support member connected to said anode and mounted in one end of said container, a cathode support member mounted to said cathode and disposed in said one end of said container, the rear portions of said anode and cathode being recessed to form an annular manifold, an intermediate electrode positioned within said manifold, a support member connected to said intermediate electrode and extending into said one end of said container, means for insulatingly supporting said support members in concentric relation with respect to each other, means for insulating said support members from said one end of said container, a source of gas supply, a gas supply feed tube connected to said gas source and extending through said member supporting said anode, -an axial passageway within said anode connccted to radial passage
  • Y 2 The ion gun set forth in claim l, wherein the magnetic eld strength is about 3000 gauss, the region adjacent to the face of the electrodes of the ion gun is evacuated to about 8 l0r5 mm. Hg, the gas supplied to said manifold from said gas source is hydrogen, the voltage applied between the anode and cathode is about 1800 volts, said intermediate electrode being electrically oating, and the current ow between the anode and cathode being about 0.2 ampere, whereby said plasma beam provided by said ion gun has a density of about 3 X 1011 particles/ cc. Y
  • An improved ion gun comprising a container, means connected to said container for evacuating said container, an ion gun assembly disposed in one end of said container, said ion gun assembly comprising an anode and a. concentricallydisposed cathode deiining an annulus between said anode and said cathode, the rear portions of said anode and said cathode defining a recessed manifold, an intermediate electrode positioned within said manifold and aligned with said annulus, a source of feed gas, means for feeding gas from said source into the interior of said manifold at a controlled rate, means connected to said anode, said cathode, and said intermediate electrode for supporting them, said supporting means being mounted within one end of said container, Vmeans for providing a containing magnetic field within said container to provide magnetic eld lines that are parallel to and in alignment with the annulus between said anode and said cathode, a source of variable D.C.
  • the container is provided with a central chamber and two end chambers, said ion gun assembly electrodes being positioned in one end of said central chamber, a baille disposed in the other end of the central chamber, said magnetic eld being provided by a pair of electromagnetic mirror coils, one of said mirror coils being disposed in concentric relation to the electrodes of said ion gun assembly, the other mirror coil being disposed in concentric relation to said baffle, said evacuating means being connected to each of said respective central chamber and said end chambers.
  • the device set forth in claim 4 wherein the central chamber is evacuated to a pressure of about 3 l05 mm. Hg, the voltage across said anode and said cathode is about 1800 volts, the gas fed to the said manifoldis hydrogen, the magnetic iield strength supplied by said magnetic mirror coils is about 3000 gauss, said end chambers being maintained at a pressure of about 1x10-4 mm. Hg, whereby the plasma ejected from said ion gun assembly is substantially free from neutral gas particles, said plasma following the magnetic held lines provided by said mirror coils until said plasma contacts said baille.
  • RaphaellLA RaphaellLA. Dandl It is hereby certified that error appears in the above numbered patent requiring correction and that the said Letters Patent should read as corrected below.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Plasma Technology (AREA)
US18461A 1960-03-29 1960-03-29 Ion gun Expired - Lifetime US3005931A (en)

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US18461A US3005931A (en) 1960-03-29 1960-03-29 Ion gun
GB1183/61A GB916854A (en) 1960-03-29 1961-01-11 Ion gun
NL260940A NL260940A (en(2012)) 1960-03-29 1961-02-07
FR856787A FR1284926A (fr) 1960-03-29 1961-03-24 Appareil pour la production de plasma ionisé électriquement neutre

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Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3104345A (en) * 1961-12-07 1963-09-17 John M Wilcox Plasma generator for a highly ionized electrical plasma
US3131276A (en) * 1961-03-10 1964-04-28 Ass Elect Ind Control of low pressure d.c. arc discharges
US3152959A (en) * 1962-06-06 1964-10-13 Charles C Damm Injection method and apparatus for controlled fusion devices
US3156622A (en) * 1961-07-17 1964-11-10 Milton M Hill Apparatus for heating ions in a plasma
US3189523A (en) * 1961-03-27 1965-06-15 Avco Corp Means for producing high temperature plasma
US3233404A (en) * 1962-04-02 1966-02-08 Csf Ion gun with capillary emitter fed with ionizable metal vapor
US3255379A (en) * 1963-07-26 1966-06-07 Giannini Scient Corp Apparatus and method for generating light
US3257579A (en) * 1959-05-04 1966-06-21 Csf Particle-confining devices having magnetic mirrors
US3289026A (en) * 1964-01-07 1966-11-29 Raymond C Elton High intensity reproducible shock radiation source
US3353061A (en) * 1967-04-10 1967-11-14 Kenneth D Davis High temperature plasma generator having means for providing current flow through plasma discharge
US3453488A (en) * 1965-05-20 1969-07-01 Xerox Corp Plasma arc electrodes
US3453469A (en) * 1965-05-20 1969-07-01 Xerox Corp Multi-level vacuum pumping system for plasma containment device
US3462633A (en) * 1967-01-03 1969-08-19 Marcus A Mccoy Energy burst generating element
US3895602A (en) * 1973-02-20 1975-07-22 Thomson Csf Apparatus for effecting deposition by ion bombardment
DE3900252C1 (en(2012)) * 1989-01-05 1990-05-23 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
US5003226A (en) * 1989-11-16 1991-03-26 Avco Research Laboratories Plasma cathode
EP1095217A4 (en) * 1998-06-29 2006-08-02 Tokyo Electron Ltd VACUUM PUMP FOR PLASMA
US20080143228A1 (en) * 2003-08-07 2008-06-19 Koninklijke Philips Electronics N.V. Extreme Uv and Soft X Ray Generator

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2211020A (en) * 1987-10-10 1989-06-21 Wallach Eric Robert Microprobe mass analyser
DE10248055B4 (de) * 2002-10-11 2012-02-23 Spectro Analytical Instruments Gmbh & Co. Kg Methode zur Anregung optischer Atom-Emission und apparative Vorrichtung für die spektrochemische Analyse

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2920235A (en) * 1958-07-24 1960-01-05 Persa R Bell Method and apparatus for producing intense energetic gas discharges
US2920234A (en) * 1958-05-27 1960-01-05 John S Luce Device and method for producing a high intensity arc discharge

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2920234A (en) * 1958-05-27 1960-01-05 John S Luce Device and method for producing a high intensity arc discharge
US2920235A (en) * 1958-07-24 1960-01-05 Persa R Bell Method and apparatus for producing intense energetic gas discharges

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3257579A (en) * 1959-05-04 1966-06-21 Csf Particle-confining devices having magnetic mirrors
US3131276A (en) * 1961-03-10 1964-04-28 Ass Elect Ind Control of low pressure d.c. arc discharges
US3189523A (en) * 1961-03-27 1965-06-15 Avco Corp Means for producing high temperature plasma
US3156622A (en) * 1961-07-17 1964-11-10 Milton M Hill Apparatus for heating ions in a plasma
US3104345A (en) * 1961-12-07 1963-09-17 John M Wilcox Plasma generator for a highly ionized electrical plasma
US3233404A (en) * 1962-04-02 1966-02-08 Csf Ion gun with capillary emitter fed with ionizable metal vapor
US3152959A (en) * 1962-06-06 1964-10-13 Charles C Damm Injection method and apparatus for controlled fusion devices
US3255379A (en) * 1963-07-26 1966-06-07 Giannini Scient Corp Apparatus and method for generating light
US3289026A (en) * 1964-01-07 1966-11-29 Raymond C Elton High intensity reproducible shock radiation source
US3453488A (en) * 1965-05-20 1969-07-01 Xerox Corp Plasma arc electrodes
US3453469A (en) * 1965-05-20 1969-07-01 Xerox Corp Multi-level vacuum pumping system for plasma containment device
US3462633A (en) * 1967-01-03 1969-08-19 Marcus A Mccoy Energy burst generating element
US3353061A (en) * 1967-04-10 1967-11-14 Kenneth D Davis High temperature plasma generator having means for providing current flow through plasma discharge
US3895602A (en) * 1973-02-20 1975-07-22 Thomson Csf Apparatus for effecting deposition by ion bombardment
DE3900252C1 (en(2012)) * 1989-01-05 1990-05-23 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
US5003226A (en) * 1989-11-16 1991-03-26 Avco Research Laboratories Plasma cathode
EP1095217A4 (en) * 1998-06-29 2006-08-02 Tokyo Electron Ltd VACUUM PUMP FOR PLASMA
US20080143228A1 (en) * 2003-08-07 2008-06-19 Koninklijke Philips Electronics N.V. Extreme Uv and Soft X Ray Generator
US7734014B2 (en) * 2003-08-07 2010-06-08 Koninklijke Philips Electronics N.V. Extreme UV and soft X ray generator

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NL260940A (en(2012)) 1964-05-11
GB916854A (en) 1963-01-30

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