US2886414A - Process for producing finely-divided silica - Google Patents

Process for producing finely-divided silica Download PDF

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US2886414A
US2886414A US513839A US51383955A US2886414A US 2886414 A US2886414 A US 2886414A US 513839 A US513839 A US 513839A US 51383955 A US51383955 A US 51383955A US 2886414 A US2886414 A US 2886414A
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scrubbing
silica
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Robert N Secord
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Godfrey L Cabot Inc
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C01B33/184Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane by hydrolysis of tetrafluoride
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity

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  • This invention relates to a process for producing linely-divided silica from abundant, normally relatively coarse siliceous materials and includes within its scope a novel process for recovering by-product fluorides for reuse in the process. More particularly, this invention relates to 1a novel process comprising the steps of convert ing a siliceous raw material to silicon tetrauoride, hy-
  • Another important object is to provide ⁇ a practical and economical method for obtaining a substantially pure and dry silicon tetrailuoride feed for the said hydrolysis reaction, thereby permitting much greater flexibility and choice of conditionsfor the hydrolysis reaction and potential savings in heat requirements and in size of equipment.
  • Other objects of this invention will likewise appear from the detailed description of the process which follows.
  • the above reaction should be conducted at elevated temperatures since the reaction equilibrium favors the formation of silica under such conditions.
  • the minimum reaction temperature should be above 1100 F., and preferably at least about 1200 F. Reaction temperatures above '15 00 F. are required to approach reasonably cornplete reaction. Regardless, however, of the temperature at which the above reaction is, in fact, conducted, the economy of the process depends upon the eicient recovery of the by-product HF and any unreacted Sil-'f4l and effective reuse of these uorides in supplying the SiF4 feed for the vapor phase hydrolysis step.
  • fluosilicic acid itself is highly unstable and has a significant vapor pressure even at fairly low concentrations.
  • the maximum concentration of HZSFB which can be achieved by rectification of dilute acid is about 40% 'by weight, land because of inherent instability of the acid compound the pnactical maximum concentration is only about 30%. Consequently, the employment of fluosilicic acid as a silica producing raw material in a hydrolysis reaction requires the processing of about 2 mols of HF and 19 mols of water for each mol of ultimate raw material SiF4.
  • the novel process of this invention comprises the steps of hydrolyzing silicon tetratluoride in the vapor state at elevated temperatures to obtain an aerosol of finely divided silica and gaseous products, separating the silica therefrom, and then scrubbing the gaseous products with an aqueous liquor containing siliceous raw material, e.g., silica (free and/or combined) and a relatively soluble lluoride salt, preferably potassium fluoride, to labsorb and react with the SiF4 and HF constituents in said gaseous products to form the corresponding, relatively insoluble fluosilicate salt, eg., K2SiFs.
  • siliceous raw material e.g., silica (free and/or combined) and a relatively soluble lluoride salt, preferably potassium fluoride
  • the actual starting material for the process is introduced into the process by merely mixing it into the scrubbing liquor which is being recycled for reuse.
  • the raw material may be any suitable siliceous ma- -terial'such as diatomaceous earth, quartz, tripoli, glass sand, siliceous fluorspar, etc., i.e., preferably a relatively pure but normally coarse silica which is in plentiful supply. Since this siliceous raw material will be carried in the scrubbing liquor largely in the form of a. suspension, it should be ground sufficiently fine for easy maintenance in this form.
  • the scrubbing liquor will then generally consist of a slurry of siliceous raw material in an aqueous solution ofthe selected fluoride salt, which may be any having a solubility in water relative to that of the corresponding fluosilicate sufficiently great for efflcient operation, preferably at least about 5 times greater.
  • the selected fluoride salt which may be any having a solubility in water relative to that of the corresponding fluosilicate sufficiently great for efflcient operation, preferably at least about 5 times greater.
  • Suitable are uorides of rubidium, aluminum, and sodium, for example, although potassium fluoride is clearly preferred because it is available at reasonable cost and is very soluble while potassium iluosilicate is only very slightly soluble and decomposes on heating within a convenient range of temperatures.
  • silica, water, and/or fluoride e.g., inthe form of hydrofluoric or iluosilicic acid
  • silica, water, and/or fluoride can also advantageously be added to the .recycled scrubbing liquor to make up for any losses of same, although other addition points may serve as well for these make-up materials.
  • the hydrolysis by-product gas stream from which the silica product has previously been recovered is stripped as completely as possible of usable constituents. This involves absorption of hydrogen fluoride, unconverted silicon tetrailuoride and unrecovered silica in the scrubbing slurry described above, while the permanent gases such as nitrogen, hydrogen, oxygen, etc., and associated water vapors, etc., are discharged as waste from the top of the scrubber,
  • the scrubbing step like most conventional gas absorption operations, can be carried out most practicably on a commercial scale at or near ordinary atmospheric pressure, although other pressures can, of course, be used and elevated pressures actually tend to increase absorption efficiency somewhat.
  • the recovery of SiF4 and HF vapors by absorption, as with most gases, is also favored by conducting the scrubbing operation at reduced ternperatures.
  • substantially all of the Sil-I4 and HF vapors can be recovered by operating the scrubbing step at any temperature up to about the boiling point of water at the pressure in use.
  • the most reactive silica may be in solution in the form of silicate ions (SiOf) and the initial HF reaction may be more properly Written as follows:
  • siliceous raw material is supplied in combination with the solution of selected fluoride salt and that substantially all of the fluoride by-products from the hydrolysis reaction are thus effectively absorbed and safely and surely trapped in said combination scrubbing liquor because of their rapid reaction to form-the corresponding insoluble uosilicate.
  • silicate can be easily separated from the liquid portion of the liquor as a wet solid, c g., as a iilter cake, which is an ideal physical condition for the next stages of handling, i.e. for reduction to dryness and use as a source of substantially dry SiF4 for the hydrolysis reaction.
  • the filter cake as obtained from the scrubbing liquor is advantageously Washed with water to remove unreacted excess metal iiuoride which is returned to the process by adding the wash water to original iiltrate while the washed filter cake is dried preferably at atmospheric pressure and a temperature at least slightly over C.
  • the filter cake, after drying, is calcined at above about 800 C. to decompose the iluosilicate and separate out the retained silicon tetrafluoride which is conducted as a substantially dry vapor to the hydrolysis step shortly to be described.
  • the nonvolatilized remainder of the cake now a glassy melt consisting mainly of silica, iluoride salt remaining from the decomposition of uosilicate, and a small proportion of undecomposed iiuosilicate is cooled, ground, reslurried in the aqueous filter efuent and recycled to make up of additional scrubbing slurry.
  • This slurry now requires only replacement of the siliceous material reacted in the previous -cycle and any lost lluorides in order to be restored to original scrubbing strength.
  • hydrolysis may be effected by commingling the SiF4 with superheated steam or with the water-containing products of combustion of hydrogen or other hydrogen-containing fuel (preferably gaseous), either in furnace or in an open llame impinged against a relatively cool surface.
  • the silicon tetrafluoride is hydrolyzed to nely divided silica as much as possible of which is separated from the gaseous products by appropriate known means such as cyclone separators, bag or ceramic ilters and the like or adherence to the surface against which impinged.
  • scrubbing liquor is delivered from mixing and make-up 2 tank 20 to scrubber 16 through inletpipe ,2'1 with ya f composition of: .f
  • concentrated iluosilicic acid i.e., about 315% by Weight.
  • This stream consists of 1 S102 1.2 K y KzSiFs. 2.5 KF; v 8.7 H20 87.0
  • the stream contains:
  • the Water used to Wash the resultant Wet lter cake in lter 22 consists of:
  • the combined filtrate and Wash water i,'e. the total lter efuent from lter 22 is returned to the mixing and make-up tank 20.
  • This stream contains: 1
  • the washed but still wet filter cake solids which are p delivered from the lter 22 to dryerf24 contain:
  • Thel yvolatile matter driven olf in the dryer, vvhichis heated to about C., consists of: c
  • the fused solid residue from calciner 26 is cooled and sent to the grinder 30 after whichit isreturned through lconduit 32 to the mixing and. make-up tank 20.
  • This stream consists of:
  • High temperature water vapor for the hydrolysis of the Sil-T4 is supplied by burning hydrogen in the hydrolyzer 10 to which saidvSiF., is fed.
  • the materials supplied to burners feed pipes '36 consist of vH2 Y 42.4 O2 24.2 as air N2 78.8
  • siliceous raw material contains appreciable -amounts of nonsiliceous impurity of the type which forms insoluble fluorides, such for example as calcium or barium, it may be decidedly preferable to avoid any appreciable excess of silica inthe scrubbing liquor system so lthat the insoluble fluoride can be recovered substan-V tially free of silica.
  • the dotted lines in therdrawing indicate how, in the case of such impure siliceous raw materials, the process could be modiiied by interposing a settling tank 38 between theV grinder .30 and the make-up tank 20.
  • the fluid effluent from the filter 22 would then be mixed with the ground material in tank 36 in order to take up soluble uorides, etc., while the insoluble impurity would be settled out and discharged as waste through line 34.
  • Another technique'which could be used for removing insoluble impurity from the lsystem is the following. Tworelatively large mix and make-up tanks 20 could be used in parallel with thisrstage of the operation being carried batchwise.
  • tluosilicic acid is recommended as a particularly convenient form of adding make-up materials, particularly when silica, fluorides and Water make-up are all required
  • the form in which these make-up materials may be added is not at all limited, although, of course, it is preferable that they ⁇ be' added in a form which is as free as possible from ingredients which tend to interfere or cause diiiculties if present in the system.
  • the raw material silica and the makeup materials are all shown as being added at one point, namely, the mixing and make-up tank 20. While such procedure is usually convenient, it is not necessary and it should be understood that introduction of ingredients can be made at many other points in the system.
  • theraw material silica can be added at any point in the scrubbing liquor system, while the make-up materials can be added at almost any point in the entire system, provided they are in the proper form. For example, as gases or vapors, they can even be introduced into the gaseous stream of the system.
  • the method of recovering and reusing the by-product, uorinecontaining gases from said hydrolysis reaction after their separation froml the finely-divided solid silica product which comprises scrubbing the gases from said hydrolysis reaction with a uid slurry formed bymixing a crude siliceous material with an aqueous solution of a fluoride salt of a metal selected from the group consisting of potassium, sodium, rubidium and aluminum thereby precipitating the uorine values of said gases in the form of the relatively insolubleuosilicate salt of said metal, filtering ⁇ the liquid eluent from said scrubbing step to remove the precipitated and insoluble solids lfrom the liquid portion of same, calcining said removed solids to decompose the uosilicate salt of said metal contained therein into silicon fluoride vapors andl a solid residue containing the flu
  • a process for converting vcrude siliceous raw material into inely-divided, substantially pure silica which comprises suspending said crude siliceous raw material in an aqueous solution of a uoride salt of a metal selected from thegroup consisting of potassium, sodium, rubidium and aluminum to form aslurry, conducting a hydrolysis reaction of silicon iiuoride vapors with water vapor at an elevated temperature to form timely-divided silica suspeudedy in gaseous media containing by-product fluorine values,kremoving the iinely-divided silica product from the said gaseous media, then scrubbing the said gaseous media with the original slurry of siliceous solids in an aqueous solution of fluoride salt of said metal prepared in the iirst step described above thereby converting the uorine values in said gaseous mediainto the relatively insoluble iiuosilicate salt of said metal, filtering the liquid elu

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Description

May 12, 1959 R. N. sEcoRD PROCESS FOR PRODUCINGv FINELY-DIVIDED SILICA Filed June 7, 1955 United States Patent Ohce 2,886,414 Patented May 12, 1 959 PROCESS FOR PRODUCING FlNELY-DIVIDED SILICA Robert N. Secord,v North Reading, Mass., assignor to Godfrey L. Cabot, Inc., Boston, Mass., a corporation of Massachusetts 'Application June` 7, 1955, Serial No. 513,839
Claims. (Cl. 23-182) This invention relates to a process for producing linely-divided silica from abundant, normally relatively coarse siliceous materials and includes within its scope a novel process for recovering by-product fluorides for reuse in the process. More particularly, this invention relates to 1a novel process comprising the steps of convert ing a siliceous raw material to silicon tetrauoride, hy-
drolyzing the silicon tetrailuoride to silica, recovering the by-product uorides and reacting these recovered liluorides with additional siliceous raw material to produce dry from the vapor phase hydrolysis of silicon tetrailuoride at elevated temperatures, thereby increasing the over-all net conversion of silicon fluoride to fine silica. Another important object is to provide \a practical and economical method for obtaining a substantially pure and dry silicon tetrailuoride feed for the said hydrolysis reaction, thereby permitting much greater flexibility and choice of conditionsfor the hydrolysis reaction and potential savings in heat requirements and in size of equipment. Other objects of this invention will likewise appear from the detailed description of the process which follows.
As described in the above-mentioned patent the silicaforming reaction proceeds according to the following equation: l
The above reaction should be conducted at elevated temperatures since the reaction equilibrium favors the formation of silica under such conditions. The minimum reaction temperature should be above 1100 F., and preferably at least about 1200 F. Reaction temperatures above '15 00 F. are required to approach reasonably cornplete reaction. Regardless, however, of the temperature at which the above reaction is, in fact, conducted, the economy of the process depends upon the eicient recovery of the by-product HF and any unreacted Sil-'f4l and effective reuse of these uorides in supplying the SiF4 feed for the vapor phase hydrolysis step.
Previously, the method of recovery and recycling that has been tried (see, for example, U.S. Patent No. 2,631,- 083 to Engelsen et al.) involves the recovery of HF and SiF4 in a water absorption system land subsequent reaction with siliceous raw material for as complete conversion as possible to HZSFG. This dilute iiuosilicic acid solution must then be concentrated and decomposed to provide SiF4 vapors for the hydrolysis reaction.
However, as is well known, fluosilicic acid itself is highly unstable and has a significant vapor pressure even at fairly low concentrations. Thus, because of azeotrope formation, the maximum concentration of HZSFB which can be achieved by rectification of dilute acid is about 40% 'by weight, land because of inherent instability of the acid compound the pnactical maximum concentration is only about 30%. Consequently, the employment of fluosilicic acid as a silica producing raw material in a hydrolysis reaction requires the processing of about 2 mols of HF and 19 mols of water for each mol of ultimate raw material SiF4. Obviously, then, a vast amount of heat is required to raise the temperature of the total mixture to the optimum range, about 1200 to 1500 F., most of which heat is wasted on elements thereof which do not contribute to the reaction. Furthermore, the presence of the HF in the hydrolysis zone is not favorable to the formation of'silica.
It is obviously highly desirable to provide a method of recovering and recycling fluorides in which SiF4 can be fed to the hydrolysis zone free of HF and excess attendant water. This is one of the accomplishments of the processof this invention. In fact, by means of the process of this invention, it is possible to feed substantially dry and, if desired, heated SiF4 tothe hydrolysis reaction, or to effect lany desired degree of predilution thereof for flexibility and control of finished silica product quality.
Not only does my invention provide a concentrated SiF4 feed stre'am to the hydrolysis Zone but it also features improved eiciency, safety and completeness of recovery of by-product HF as Well as of the unreacted SiF4 from the hydrolysis reaction which accomplishments contribute extensively to the economic advantages of my novel process. It is, therefore, immediately apparent that my process constitutes an important advance in the 'art over prior art processes involving the use of fluosilicic acid as an intermediate raw material. A
The novel process of this invention comprises the steps of hydrolyzing silicon tetratluoride in the vapor state at elevated temperatures to obtain an aerosol of finely divided silica and gaseous products, separating the silica therefrom, and then scrubbing the gaseous products with an aqueous liquor containing siliceous raw material, e.g., silica (free and/or combined) and a relatively soluble lluoride salt, preferably potassium fluoride, to labsorb and react with the SiF4 and HF constituents in said gaseous products to form the corresponding, relatively insoluble fluosilicate salt, eg., K2SiFs. The use of a fluoride salt, the solubility of which is several fold that of the corresponding fluosilicate, results in the formation of a 1 fluosilicate salt which can be preferentially separated out of the scrubber eflluent, Washed if desired, calcined to drive oft SiF4 vapors which are returned as feed for the original hydrolysis step, and reincorporated in the scrubbing liquor for recycle and reuse. Once the process has been started, fluoride values can be recovered and recycled over and over again. The process is clearly suitable for continuous operation and is largely self-sustaining except for the continuous introduction of siliceous raw material to the scrubbing liquor and the addition of minor amounts of fluoride to make up inevitable losses from the system.
Going into more detail, the actual starting material for the process, that is, the crude siliceous raw material, is introduced into the process by merely mixing it into the scrubbing liquor which is being recycled for reuse. The raw material may be any suitable siliceous ma- -terial'such as diatomaceous earth, quartz, tripoli, glass sand, siliceous fluorspar, etc., i.e., preferably a relatively pure but normally coarse silica which is in plentiful supply. Since this siliceous raw material will be carried in the scrubbing liquor largely in the form of a. suspension, it should be ground sufficiently fine for easy maintenance in this form. The scrubbing liquor will then generally consist of a slurry of siliceous raw material in an aqueous solution ofthe selected fluoride salt, which may be any having a solubility in water relative to that of the corresponding fluosilicate sufficiently great for efflcient operation, preferably at least about 5 times greater. Suitable are uorides of rubidium, aluminum, and sodium, for example, although potassium fluoride is clearly preferred because it is available at reasonable cost and is very soluble while potassium iluosilicate is only very slightly soluble and decomposes on heating within a convenient range of temperatures. Additional silica, water, and/or fluoride, e.g., inthe form of hydrofluoric or iluosilicic acid, can also advantageously be added to the .recycled scrubbing liquor to make up for any losses of same, although other addition points may serve as well for these make-up materials.
In the scrubbing zone the hydrolysis by-product gas stream from which the silica product has previously been recovered, is stripped as completely as possible of usable constituents. This involves absorption of hydrogen fluoride, unconverted silicon tetrailuoride and unrecovered silica in the scrubbing slurry described above, while the permanent gases such as nitrogen, hydrogen, oxygen, etc., and associated water vapors, etc., are discharged as waste from the top of the scrubber,
The scrubbing step, like most conventional gas absorption operations, can be carried out most practicably on a commercial scale at or near ordinary atmospheric pressure, although other pressures can, of course, be used and elevated pressures actually tend to increase absorption efficiency somewhat. The recovery of SiF4 and HF vapors by absorption, as with most gases, is also favored by conducting the scrubbing operation at reduced ternperatures. However, in the present case substantially all of the Sil-I4 and HF vapors can be recovered by operating the scrubbing step at any temperature up to about the boiling point of water at the pressure in use. In fact, depending upon the amount of permanent gases in the by-product gases subjected to the scrubbing treatment and the amount of water vapor which one wishes to have carried out in said permanent gases discharging from the scrubber, it is often desirable to conduct the scrubbing operation at temperatures considerably above ambient temperatures. In any case, not only do the byproduct gases generally contain some of the heat acquired in the hydrolysis step, but also, the absorption and subsequent reaction of HF and SiF4 in the scrubbing liquor generate still more heat. It is obvious then, that the temperature in the scrubbing zone naturally tends to rise. Therefore, another reason it may prove desirable to conduct the scrubbing operation at elevated temperatures, e.g., 120 to 200 F., is in order to avoid special cooling problems (of either the by-product gases, the recycled scrubbing slurry, or both).
The net result of the reaction of the absorbed SiF4 and HF with the siliceous raw material and the selected fluoride salt is, of course, the formation of the corresponding relatively insoluble iluosilicate. While the exact mechanism of the various reactions or reaction steps involved is not known, the results may be demonstrated by the following chemical equations:
It should be emphasized that the above equations are merely indicative of the over-all changes involved and are not intended as explanations of the exact reaction mechanism. For example, it might be that the SiF.; reacts iirst with H2O according to the reaction,
4 and that the HZSiFG-then reacts with KF, thus:
2H2siF6+4KF 2KZSiF6+2HF (4) and that the HF from (4) and that absorbed from the byproduct gases react with SiO2 from (3) and from the original scrubbing liquor to give:
6HF-l-SiO2- H2SiF6-l-2H2O (5) the H2SiF6 thus formed then reacting with more KF according to (4), and so on.
On the other hand, especially if the scrubbing liquor is alkaline, the most reactive silica may be in solution in the form of silicate ions (SiOf) and the initial HF reaction may be more properly Written as follows:
6HF+SiO3= SiF6=+3H2O after which more suspended silica goes into solution and reacts, etc.
In any case, it will now be seen that the full amount of siliceous raw material required is supplied in combination with the solution of selected fluoride salt and that substantially all of the fluoride by-products from the hydrolysis reaction are thus effectively absorbed and safely and surely trapped in said combination scrubbing liquor because of their rapid reaction to form-the corresponding insoluble uosilicate. silicate can be easily separated from the liquid portion of the liquor as a wet solid, c g., as a iilter cake, which is an ideal physical condition for the next stages of handling, i.e. for reduction to dryness and use as a source of substantially dry SiF4 for the hydrolysis reaction.
The filter cake as obtained from the scrubbing liquor is advantageously Washed with water to remove unreacted excess metal iiuoride which is returned to the process by adding the wash water to original iiltrate while the washed filter cake is dried preferably at atmospheric pressure and a temperature at least slightly over C. In any case, the filter cake, after drying, is calcined at above about 800 C. to decompose the iluosilicate and separate out the retained silicon tetrafluoride which is conducted as a substantially dry vapor to the hydrolysis step shortly to be described. The nonvolatilized remainder of the cake, now a glassy melt consisting mainly of silica, iluoride salt remaining from the decomposition of uosilicate, and a small proportion of undecomposed iiuosilicate is cooled, ground, reslurried in the aqueous filter efuent and recycled to make up of additional scrubbing slurry. This slurry now requires only replacement of the siliceous material reacted in the previous -cycle and any lost lluorides in order to be restored to original scrubbing strength.
The silicon tetrauoride vapors from the calcination of the filter cake are now fed to an appropriate hydrolysis reaction zone such as is described in the above-identified Engelson and Secord patent or in U.S. Patent No. 2,535,036, Broughton. The type of reactor employed for the hyrolysis step is not critical for the purposes of the process of this invention. Thus, hydrolysis may be effected by commingling the SiF4 with superheated steam or with the water-containing products of combustion of hydrogen or other hydrogen-containing fuel (preferably gaseous), either in furnace or in an open llame impinged against a relatively cool surface. In any such process step the silicon tetrafluoride is hydrolyzed to nely divided silica as much as possible of which is separated from the gaseous products by appropriate known means such as cyclone separators, bag or ceramic ilters and the like or adherence to the surface against which impinged.
The accompanying drawing is a flow diagram of a preferred embodiment of the process of this invention. In the following description of the process with reference to the drawing representative data are included on the quantitative flows involved for a typical commerciall This insoluble iluo- Y Hydrolysis products formed in hydrolyzerjl' are, after separation of kproduct silica in lter`12, conducted A through line 14y tok scrubber 16 with a composition of:
A.. v 4 HF I I 25.6 H2O 2 29.6 N2 Y.. SO2 I Exhaust v'gasesk discharged from scrubber`16 through flue 18..'have l a composition ofz' H20 30.0 S1112, 0.2 HF
scrubbing liquor is delivered from mixing and make-up 2 tank 20 to scrubber 16 through inletpipe ,2'1 with ya f composition of: .f
, i D Siliceous raw materialV (including make-up silica) and vmake-up fluoride and water are introduced into the'sys= temthrough pipe 23 in amounts of: f
(These components are added lmost[conveniently as about 6.0 lb. mols/hr. of silica and about 160 lbs./ hr. of
concentrated iluosilicic acid, i.e., about 315% by Weight.
Of the` liquor discharged from the bottom of scrubber 16, that not needed in the remainder of the process is recycled directly to slurry make-up tank 20. This stream consists of 1 S102 1.2 K y KzSiFs. 2.5 KF; v 8.7 H20 87.0
G The remainder of the liquor' from scrubber 16' which is not recycled is sent instead to filter 22. In the present example, the stream contains:
The Water used to Wash the resultant Wet lter cake in lter 22 consists of:
The combined filtrate and Wash water, i,'e. the total lter efuent from lter 22 is returned to the mixing and make-up tank 20. This stream contains: 1
, 1 ;2si1=6 0.05 KF 12.9
The washed but still wet filter cake solids which are p delivered from the lter 22 to dryerf24 contain:
SO2 1 5.4 KZSFG 11.05 KF 3.4v
Thel yvolatile matter driven olf in the dryer, vvhichis heated to about C., consists of: c
operated at a temperature'of about 800 to 1000 C., is conducted to the hydrolyzer 10 through conduit 28. This stream consists'of: v
SiF4
The fused solid residue from calciner 26 is cooled and sent to the grinder 30 after whichit isreturned through lconduit 32 to the mixing and. make-up tank 20. This stream consists of:
S102 f5.4 K2siF2 f 0.45 ,KF 24.6
High temperature water vapor for the hydrolysis of the Sil-T4 is supplied by burning hydrogen in the hydrolyzer 10 to which saidvSiF., is fed. The materials supplied to burners feed pipes '36, consist of vH2 Y 42.4 O2 24.2 as air N2 78.8
A. P f' The solid finely-divided product collected in and re'- v vmoved from lter 12 consists of:
SiO2 6.0
vIt willbe seen that, in the above example, the full strength scrubbing slurry (C) contains some excess silica and potassium fluoride over the stoichiometric require-- ment for reaction with all the Sil-T4 land HFin'the gas stream with which said slurry is contacted. Unreacted SiO2 land4 KF, therefore, circulate continuously aroundV throughout the'scrubbing liquor cycle outlined above, e.g., in the liquor (F) recycled directly to the mixing and make-up tank 20 and in the filter eluent (I), etc. While the presence of such excess reactants tends to insure the maximum recovery of SiF4 and HF from the gas stream subjected to the scrubbing treatment, it is not only feasible kbut may actually also be more economic in some instances to'operate without such excess reactants. In fact, if the siliceous raw material contains appreciable -amounts of nonsiliceous impurity of the type which forms insoluble fluorides, such for example as calcium or barium, it may be decidedly preferable to avoid any appreciable excess of silica inthe scrubbing liquor system so lthat the insoluble fluoride can be recovered substan-V tially free of silica. The dotted lines in therdrawing indicate how, in the case of such impure siliceous raw materials, the process could be modiiied by interposing a settling tank 38 between theV grinder .30 and the make-up tank 20. The fluid effluent from the filter 22 would then be mixed with the ground material in tank 36 in order to take up soluble uorides, etc., while the insoluble impurity would be settled out and discharged as waste through line 34. Another technique'which could be used for removing insoluble impurity from the lsystem is the following. Tworelatively large mix and make-up tanks 20 could be used in parallel with thisrstage of the operation being carried batchwise. That is, while one `batch-ofA slurry is being fed to the scrubber from one tank another batch would be prepared in the other. In this way the various recycle streams would be mixed together and the insoluble impurity settled out and removed before f the make-up materials were added.
It should be pointed out that regardless of whether the make-up of the slurry is carried out continuously or batchwise; that portion of the slurry which is recycled directly from the bottom of the scrubber'tower 16 can, if desired, be returnedV directly to the'top of the tower instead of to the make-up 4and mix tank 20.- Many other modifications of the process as illustrated in the accompanying drawings are possible as will be obvious to one skilled in the art, in view of the typical moditications described herein.
Although in the above example, tluosilicic acid is recommended as a particularly convenient form of adding make-up materials, particularly when silica, fluorides and Water make-up are all required, it should be understood that the form in which these make-up materials may be added is not at all limited, although, of course, it is preferable that they `be' added in a form which is as free as possible from ingredients which tend to interfere or cause diiiculties if present in the system. Moreover, in the above example, the raw material silica and the makeup materials are all shown as being added at one point, namely, the mixing and make-up tank 20. While such procedure is usually convenient, it is not necessary and it should be understood that introduction of ingredients can be made at many other points in the system. Thus, theraw material silica can be added at any point in the scrubbing liquor system, while the make-up materials can be added at almost any point in the entire system, provided they are in the proper form. For example, as gases or vapors, they can even be introduced into the gaseous stream of the system.
Having described my invention, together with preferred embodiments thereof, what I claim as new and desire to secure by U.S. Letters Patent is:
1. In a process for producing finely-divided silica by the hydrolysis of silicon uoride in the vapor phase, the method of recovering and reusing the by-product, uorinecontaining gases from said hydrolysis reaction after their separation froml the finely-divided solid silica product which comprises scrubbing the gases from said hydrolysis reaction with a uid slurry formed bymixing a crude siliceous material with an aqueous solution of a fluoride salt of a metal selected from the group consisting of potassium, sodium, rubidium and aluminum thereby precipitating the uorine values of said gases in the form of the relatively insolubleuosilicate salt of said metal, filtering `the liquid eluent from said scrubbing step to remove the precipitated and insoluble solids lfrom the liquid portion of same, calcining said removed solids to decompose the uosilicate salt of said metal contained therein into silicon fluoride vapors andl a solid residue containing the fluoride salt of said metal, removing and recycling, the substantially pure `silicon fluoride vapors thus evolved to the said hydrolysis reaction, and recycling the solid residue of uoride salt of said metal as Well as the liquid filtrate removed from said scrubbing step effluent to the make-up of additional fluid slurry for said scrubbing step.
2. The process of claim l in which the metal is potassium. n
3. The process of claim 1' in which the metal is sodium.
4. The process of 'claim '1 in. which the metal is rubidium.
5. The process of claim l in which the metal is aluminum; Y'
6. A process for converting vcrude siliceous raw material into inely-divided, substantially pure silica which comprises suspending said crude siliceous raw material in an aqueous solution of a uoride salt of a metal selected from thegroup consisting of potassium, sodium, rubidium and aluminum to form aslurry, conducting a hydrolysis reaction of silicon iiuoride vapors with water vapor at an elevated temperature to form timely-divided silica suspeudedy in gaseous media containing by-product fluorine values,kremoving the iinely-divided silica product from the said gaseous media, then scrubbing the said gaseous media with the original slurry of siliceous solids in an aqueous solution of fluoride salt of said metal prepared in the iirst step described above thereby converting the uorine values in said gaseous mediainto the relatively insoluble iiuosilicate salt of said metal, filtering the liquid eluent from said scrubbing step to .remove the insoluble 4solids therefrom, recycling the filtrate to the above slurry make-up step, calcining the iiltered-olf solids to'decompose said uosilicate salt into silicon fluoride vapors and a solid residue of the liuoride salt of said metal, recycling the silicon lluoride vapors to said hydrolysis reaction step, and recycling the solid residue of the fluoride salt of said metal to the original slurryl make-up step.
7. TheA process of claim 6 in which vthe metal is potassium. 1
8. Theiprocess of claim 6in which the metal is sodium.
9. The process of claim 6 in which the metal is rubidium.
10.` The process of claim 6 in which the metal vs aluminum.
References Cited in the iile of this patent UNITED STATES PATENTS 2,535,036v Y Broughton Dec; 26, 1950 2,631,083 Engelson et al. Mar. 10, 1953 OTHER REFERENCES Mellor: Comprehensive Treatise on Inorganic and Theoretical Chemistry, vol.` VI, 1925, page 944.

Claims (1)

1. IN A PROCESS FOR PRODUCING FINELY-DIVIDED SILICA BY THE HRDROLYSIS OF SILICON FLUORIDE IN THE VAPOR PHASE, THE METHOD OF RECOVERING AND REUSING THE BY-PRODUCT, FLUORINECONTAINING GASES FROM SAID HYDROLYSIS REACTION AFTER THERI SEPARATION FROM THE FINELY-DIVIDED SOLID SILICA PARODUCT WHICH COMPRISES SCRUBBING THE GASES FROM SAID HYDROLYSIS REACTION WITH A FLUID SLURRY FORMED BY MIXING A CRUDE SILICEOUS MATERIAL WITH AN AQUEOUS SOLSUTION OF A FLUORIDE SALT OF A METAL SELECTED FROM THE GROUP CONSISTING OF POTASSIUM, SODIUM, RUBIDIUM AND ALUMINUM THEREBY PRECIPITATING THE FLUORINE VALVES OF SAID GASES IN THE FORM OF THE RELATIVELY INSOLUBLE FLUOSILICATE SALT OF SAID METAL FILTERING THE LIQUID EFFLUENT FROM SAID SCRUBBING STEP TO REMOVING THE PRECIPITATED AND INNSOLUBLE SOLIDS FROM THE LIQUID PORTION OF SAME, CALCINING SAID REMOVED SOLIDS TO DECOMPOSE THE FLUOSILICATE SALT OF SAID REMOVED SOLIDS TO THEREIN INTO SILICON FLUORIDE VAPORS AND A SOLID RESIDUE AFIG-01 CONTAINING THE FLUORIDE SALT OF SAID METAL, REMOVING AND RECYCLING THE SUBSTANTIALLY PURE SILICON FLUORIDE VAPORS THUS EVOLVED TO THE SAID HYDROLYSIS REACTION, AND RECYCLING THE SOLID RESIDUE OF FLUORIDE SALT OF SAID METAL AS WELL AS THE LIQUID FILTRATE REMOVED FROM SAID SCRUBBING STEP EFFLUENT TO THE MAKE-UP OF ADDITIONAL FLUID SLURRY FOR SAID SCRUBBING STEP.
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3065050A (en) * 1957-08-28 1962-11-20 Baeumert Paul August Franz Process of producing fluorine compounds from fluorine-containing minerals and the like
US3087787A (en) * 1957-09-12 1963-04-30 Flemmert Gosta Lennart Process for the production of hydrogen fluoride
US3110562A (en) * 1960-01-26 1963-11-12 Hooker Chemical Corp Process for recovery of hf and sio2 from waste gases
US3123497A (en) * 1964-03-03 Process for depositing silicon dioxide dielectric coatings
US3459673A (en) * 1967-10-10 1969-08-05 Owens Illinois Inc Preparation of luminescent silica glass modified with a rare earth metal
US3660025A (en) * 1970-07-01 1972-05-02 Cities Service Co Manufacture of pigmentary silica
US4206189A (en) * 1977-01-04 1980-06-03 Belov Viktor Y Method of producing hydrogen fluoride and silicon dioxide from silicon tetra-fluoride

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2535036A (en) * 1946-09-03 1950-12-26 Cabot Godfrey L Inc Manufacture of finely divided silica
US2631083A (en) * 1952-01-19 1953-03-10 Cabot Godfrey L Inc Production of calcium fluoride and silica

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2535036A (en) * 1946-09-03 1950-12-26 Cabot Godfrey L Inc Manufacture of finely divided silica
US2631083A (en) * 1952-01-19 1953-03-10 Cabot Godfrey L Inc Production of calcium fluoride and silica

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3123497A (en) * 1964-03-03 Process for depositing silicon dioxide dielectric coatings
US3065050A (en) * 1957-08-28 1962-11-20 Baeumert Paul August Franz Process of producing fluorine compounds from fluorine-containing minerals and the like
US3087787A (en) * 1957-09-12 1963-04-30 Flemmert Gosta Lennart Process for the production of hydrogen fluoride
US3110562A (en) * 1960-01-26 1963-11-12 Hooker Chemical Corp Process for recovery of hf and sio2 from waste gases
US3459673A (en) * 1967-10-10 1969-08-05 Owens Illinois Inc Preparation of luminescent silica glass modified with a rare earth metal
US3660025A (en) * 1970-07-01 1972-05-02 Cities Service Co Manufacture of pigmentary silica
US4206189A (en) * 1977-01-04 1980-06-03 Belov Viktor Y Method of producing hydrogen fluoride and silicon dioxide from silicon tetra-fluoride

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