US2577364A - Rhodium plating - Google Patents
Rhodium plating Download PDFInfo
- Publication number
- US2577364A US2577364A US44978A US4497848A US2577364A US 2577364 A US2577364 A US 2577364A US 44978 A US44978 A US 44978A US 4497848 A US4497848 A US 4497848A US 2577364 A US2577364 A US 2577364A
- Authority
- US
- United States
- Prior art keywords
- rhodium
- electrolyte
- acid
- per liter
- phenol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010948 rhodium Substances 0.000 title claims description 37
- 229910052703 rhodium Inorganic materials 0.000 title claims description 36
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 title claims description 36
- 238000007747 plating Methods 0.000 title description 4
- 239000003792 electrolyte Substances 0.000 claims description 44
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 43
- 239000002253 acid Substances 0.000 claims description 22
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 20
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 18
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 10
- 150000003284 rhodium compounds Chemical group 0.000 claims description 10
- 239000002659 electrodeposit Substances 0.000 claims description 9
- 230000007062 hydrolysis Effects 0.000 claims description 8
- 238000006460 hydrolysis reaction Methods 0.000 claims description 8
- YWFDDXXMOPZFFM-UHFFFAOYSA-H rhodium(3+);trisulfate Chemical compound [Rh+3].[Rh+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O YWFDDXXMOPZFFM-UHFFFAOYSA-H 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 6
- WMFZVLIHQVUVGO-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanol Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(O)C1=CC=CC=C1 WMFZVLIHQVUVGO-UHFFFAOYSA-N 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- 229960003742 phenol Drugs 0.000 description 22
- 239000002184 metal Substances 0.000 description 15
- 229910052751 metal Inorganic materials 0.000 description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229910021653 sulphate ion Inorganic materials 0.000 description 6
- 239000001117 sulphuric acid Substances 0.000 description 6
- 235000011149 sulphuric acid Nutrition 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 5
- 229910019142 PO4 Inorganic materials 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 4
- 239000010452 phosphate Substances 0.000 description 4
- 238000007865 diluting Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- KTEDZFORYFITAF-UHFFFAOYSA-K rhodium(3+);trihydroxide Chemical compound [OH-].[OH-].[OH-].[Rh+3] KTEDZFORYFITAF-UHFFFAOYSA-K 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 2
- YXJYBPXSEKMEEJ-UHFFFAOYSA-N phosphoric acid;sulfuric acid Chemical compound OP(O)(O)=O.OS(O)(=O)=O YXJYBPXSEKMEEJ-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000006071 cream Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
- C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
Definitions
- the electrodeposition of, rhodium onto other metals for decorativecor tarnish-resisting purposes is commonly eiiectedwithstheuse of electrolytes of the kindicontaining as the essential constituent rhodium sulphate .or rhodiumphosphate or a mixture ofi-thes'etwo'comp'ounds together with varying proportions .of. free sulphuric acid or free phosphoric .acid or a mixture thereof.
- the free acid is" necessary to prevent hydrolysis of the rhodium compounds in the electrolyte with consequentprecipitation of rhodium hydroxide.
- the free acid must always be enough to prevent hydrolysis of rhodium compounds, as those skilled in the art will understand.
- Increase in the free acid content above, .say, .20 milliliters of spulphuric acid per liter decreases the current efilciency and so is time-consuming and uneconomic.
- the current density must, of course, be high enough to ensure that the metal on which the deposit is being made will not be chem cally attacked, but maybe-less'than 2 amps/dmP.
- the higher temperatures should be used, e. g.- atlea'st 40 C. with a concentration as high as 0.4 gram of phenol per liter.
- the current efiiciency falls ofi rapidly as the concentration-of phenol increases, the reduction being more marked at room temperature than at higher temperatures, so the high temperatures are desirable for this reason.
- the electrolyte tends to deteriorate if the cathodic current densityv is high.
- the electrolyte prepared as described was then used to deposit rhodium onto cathodes of polished nickel, and the results shown by Table I were obtained.
- concentrations of phenol quoted above are illustrative and may be varied under appropriate operating conditions and still give satisfactory plating.
- the efiect of variation in the phenol content is shown by the following example.
- EXAMPLE IV A phosphate electrolyte was made by dissolving rhodium hydroxide in phosphoric acid and diluting the phosphate solution to give a concentration, per liter, of 2 grams of rhodium and 20 mls. of phosphoric acid. On electrolysing this solution with a current density of 4 amps./dm. the results shown in Table IV were obtained.
- phosphate and rhodium sulfate in an amount suiiicient to provide said electrolyte with about 0.5 to about 5 grams per liter of rhodium, and free acid from the group consisting of phosphoric acid and sulfuric acid in an amount sufficient to prevent hydrolysis of the rhodium compound but not exceeding about 20 milliliters per liter of electrolyte; the improvement which comprises incorporating in said electrolyte about 0.07 to about 0.5 gram per liter of phenol whereby thick, light-colored and bright rhodium electro-deposits are obtained atthicknesses of at least about 10 millionths of an inch on metal surfaces by employing the aforesaid phenol -containingacid electrolyte.
- a process for the production of thick, bright electro-deposits of rhodium on metal which comprises establishing a rhodium-plating electrolyte containing about 0.5 to about 5 grams per liter of rhodium provided by at least one rhodium compound from the group consisting of rhodium phosphate and rhodium sulfate, acid from the group consisting of phosphoric acid and sulfuric acid in an amount sufficient to prevent hydrolysis of the rhodium but not exceeding more than about 20 milliliters of acid per liter of electrolyte, about 0.07 to about 0.5 gram per liter of phenol; and electrolytically depositing rhodium from said electrolyte onto said metal at a current density between about 2 and about 4 amperes per square decimeter and at a temperature between about room temperature and about 60 C. to produce thick, light-colored and bright rhodium electrodeposits at thicknesses of at least about 10 millionths of an inch on said metal immer
- An electrolyte for use in obtaining thick electro-deposits of bright rhodium on metal which comprises an aqueous, acid bath containing about 2 grams per liter of rhodium provided by at least one rhodium compound from the group consisting of rhodium phosphate and rhodium sulfate, acid from the group consisting of phosphoric acid and sulfuric acid in an amount sufficient to prevent hydrolysis of the rhodium but not exceeding about 20 milliliters of acid per liter of electrolyte, and about 0.07 to about 0.5 gram per liter of phenol whereby thick, light-colored and bright rhodium electro-deposits at thicknesses of at least about 10 millionths of an inch can be obtained on metal surfaces when employing the aforesaid phenol-containing, aqueous, acid electrolyte in electro-depositing rhodium onto metal surfaces.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB23022/47A GB626429A (en) | 1947-08-19 | 1947-08-19 | Improvements relating to rhodium plating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2577364A true US2577364A (en) | 1951-12-04 |
Family
ID=10188832
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US44978A Expired - Lifetime US2577364A (en) | 1947-08-19 | 1948-08-18 | Rhodium plating |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US2577364A (en(2012)) |
| BE (1) | BE484442A (en(2012)) |
| DE (1) | DE809739C (en(2012)) |
| FR (1) | FR970542A (en(2012)) |
| GB (1) | GB626429A (en(2012)) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1895675A (en) * | 1931-01-09 | 1933-01-31 | Us Smelting Refining & Mining | Electrodeposition of metals |
| US1981820A (en) * | 1931-08-27 | 1934-11-20 | Baker & Co Inc | Process of electrodepositing rhodium, bath and method of preparing the same |
| GB446393A (en) * | 1935-06-04 | 1936-04-29 | Heraeus Gmbh W C | Method for the production of dark electrolytic deposits of rhodium |
| US2078014A (en) * | 1934-01-17 | 1937-04-20 | Du Pont | Screen manufacture |
| US2119304A (en) * | 1935-08-01 | 1938-05-31 | Eaton Detroit Metal Company | Electroplating |
| US2250556A (en) * | 1940-11-26 | 1941-07-29 | United Chromium Inc | Electrodeposition of copper and bath therefor |
-
0
- BE BE484442D patent/BE484442A/xx unknown
-
1947
- 1947-08-19 GB GB23022/47A patent/GB626429A/en not_active Expired
-
1948
- 1948-08-18 FR FR970542D patent/FR970542A/fr not_active Expired
- 1948-08-18 US US44978A patent/US2577364A/en not_active Expired - Lifetime
-
1949
- 1949-07-26 DE DEP49999A patent/DE809739C/de not_active Expired
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1895675A (en) * | 1931-01-09 | 1933-01-31 | Us Smelting Refining & Mining | Electrodeposition of metals |
| US1981820A (en) * | 1931-08-27 | 1934-11-20 | Baker & Co Inc | Process of electrodepositing rhodium, bath and method of preparing the same |
| US2078014A (en) * | 1934-01-17 | 1937-04-20 | Du Pont | Screen manufacture |
| GB446393A (en) * | 1935-06-04 | 1936-04-29 | Heraeus Gmbh W C | Method for the production of dark electrolytic deposits of rhodium |
| US2119304A (en) * | 1935-08-01 | 1938-05-31 | Eaton Detroit Metal Company | Electroplating |
| US2250556A (en) * | 1940-11-26 | 1941-07-29 | United Chromium Inc | Electrodeposition of copper and bath therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| GB626429A (en) | 1949-07-14 |
| BE484442A (en(2012)) | |
| FR970542A (fr) | 1951-01-05 |
| DE809739C (de) | 1951-08-02 |
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