US2423729A - Vaporization of substances in a vacuum - Google Patents

Vaporization of substances in a vacuum Download PDF

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Publication number
US2423729A
US2423729A US314565A US31456540A US2423729A US 2423729 A US2423729 A US 2423729A US 314565 A US314565 A US 314565A US 31456540 A US31456540 A US 31456540A US 2423729 A US2423729 A US 2423729A
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United States
Prior art keywords
rays
substance
vaporized
space
substances
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Expired - Lifetime
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US314565A
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English (en)
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Ruhle Rudolf
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Priority claimed from DEB186400D external-priority patent/DE764927C/de
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S164/00—Metal founding
    • Y10S164/04—Dental

Definitions

  • This invention relates to a method of and ap paratus for vaporizing substances in a vacuum.
  • the metal to be used for coating is vaporized and deposited on the object to be treated.
  • the necessary heat is supplied to the metal through the medium of a crucible which is brought to the required temperature in suitable manner, for instance by electric resistance heating.
  • the invention overcomes these troubles by placing the substance to be vaporized directly in the path of electronic rays which of themselves produce the heat needed for vaporization on striking the substance. As the supply of heat by conduction is eliminated, the temperature developed in the substance to be vaporized is higher than the ambient temperature. Compared with the known methods, during the application of which a certain amount of heat conducted away by the crucible or radiated in the wrong direction does not reach the substance to be vaporized, the method suggested by the invention causes the heat required for vaporization to be produced by electron bombardment at the very place where it is needed.
  • the method and the yield obtainable by its application can be improved still more by placing the substance in the path of electronic rays that are concentrated or otherwise focused by suitable means.
  • the invention provides for alignment of the rays and their concentration on the substance to be vaporized with the aid of electron-optical means whereby the intensity of radiation and thus the amount of energy consumed per unit area at the vaporization point are increased.
  • the substance to be vaporized is preferably in troduced into thejet or beam of rays at a point where the beam has a relatively smallcross seetion and the intensity per unit area is therefore very great, the most favorable position in this respect being obtained by placing the substance in the electron-optical image point of the emitting cathode.
  • the cathode preierably comprises an electronemitting source of high intensity, both hot and cold electrodes being usable which require, however, difierent gas pressures. If a hot cathode is employed, pressure on the filament must be eX- traordinarily low, since small quantities of residual gas will soon destroy the wire, slight traces of water vapor being for instance capable of causing decomposition of a tungsten wire within a very short time. In case of an unheated cathode the pressure prevailing in the space surrounding it should not be too low, as otherwise the ions required for the gas discharge will be lacking,
  • the vacuum should be chosen so as to insure good vaporization and the production of a clean deposit. A poor vacuum will yield of course poor deposits whilst any excess will be uneconomical.
  • the source of electrons is disposed in a space in which the pressure difiers from that found in the space where the substance to be vaporized is kept.
  • pressure in the cathode space must be lower than in the vapor space Whilst in case of a cold cathode pressure conditions are reversed.
  • Both spaces are preferably separated by a partition possessing a narrowly apertured diaphragm.
  • air is continuously supplied to the higher pressure space and removed by pumping from the lower pressure space. Through the diaphragm an air current is then produced which by its size determines the pressure ratio. may be used which does not combine with the substance to be vaporized, the vapor and the deposited layer.
  • a plurality of diaphragms may be installed, one after another, which act like a labyrinth packing, that is to say, the pressure heads in the spaces between the diaphragms are varied by degrees from one working space to the other.
  • the spaces between the diaphragms may be connected to vacuum pumps if necessary, and if only one. diaphragm is used, a suction connection may be provided near it for the higher pres- Instead of air, a gas tron lens system and, at a suitable point, brought v again into the narrowing jet of rays for the substance to be vaporized.
  • substances of low thermal conductivity may be directly inserted in the beam of rays in the form of blocks or similarly shaped bodies without requiring a crucible, etc.
  • the electronic rays would soon melt a hole in the substance, the position of the latter must be altered periodically.
  • the electronic rays may be strictly electrically controlled by providing in known manner electric or magnetic fields the variation of which serves to regulate the direction of the beam.
  • the substance to be vaporized may further be fed to the point of impact of the rays at uniform speed and practically without interruption.
  • the vessel which is necessary in this arrangement, will then contain a certain amount of molten material the weight of which is utilized for regulating feed.
  • operation may be such that the increasing weight of the vessel actuates either a switch or a stopping device which interrupts feed until a portion of the molten metal is vaporized, whereupon the lightened vessel releases the switch or device in reversed direction and thereby starts feeding again.
  • Figure 1 shows a vaporizing vessel provided with an electron lens system and a hot cathode.
  • Fig. 2 shows a vaporizing vessel provided with a diaphragm, two electron lens systems and a cold cathode.
  • Fig. 3 shows a vessel provided with a substance to be vaporized that is movably disposed and means for electrically influencing the course of the rays.
  • Fig. 4 shows a vaporizing vessel provided with a plurality of diaphragm and continued feed of material to the place of vaporization.
  • the vacuum vessel I accommodates in its upper portion a filament 2 serving as cathode.
  • a block 4 of material to be vaporized rests on a support 3, 5 designates the discharge connection for a vacuum pump.
  • the objects to be subjected to the coating action of the vapor are located at 6 and I.
  • the vessel I from the filament 2 in various directions are refracted by an electron lens having the form of a coil Ill toward the block 4 and impinge upon its surface at I I.
  • the construction shown in Fig. 2 possesses, in addition to the electron lens III, a second electron lens I0 and a diaphragm I2. Projected from a cold cathode I3 at an angle of a few degrees, the electronic rays 9 are refracted by the electron lens Ill toward the diaphragm I2 and focused in the rear of the latter by the electron lens I9 at I I on the block 4 in the same way as shown in Fig. 1.
  • a connection I 4 air or a gas is continuously supplied in quantities that can be regulated by a valve 38, and drawn off through the connection 5.
  • the pressure in the upper portion I5 of the vessel I is therefore greater than in the lower space I6.
  • Fig. 3 shows the lower portion II of a vacuum vessel in which the block 4 rests on a rotatable table I9 driven by a small motor 2
  • a rotatable table I9 driven by a small motor 2
  • two plates 22, 23 are provided between which the electronic ray 9 controlled by the coil I0 extends and to which voltage can be applied so as to permit displacement of the point of impact II on the block 4.
  • a switch 35 is provided which is normally closed.
  • is shown to contain a small amount of molten material 36.
  • an excessive quantity thereof will accumulate in the crucible 3
  • the switch 35 is opened and the drive of the feed rolls 29, 30 stopped.
  • the crucible is drawn up by the spring 34 and the switch 35 closed so that feeding can continue.
  • the method of vaporizing substances in a vacuum comprising producing electronic rays, subjecting vaporizable substances to the direct heating action of said electronic rays by placing the substances in the direct path of the rays, thereby causing the rays to impinge on the substance and develop the heat required for vaporization directly therein by said electronic rays, partitioning into two spaces the area between the point where the rays are produced and the position of the substances to be vaporized so as to inhibit interchange of pressure while permitting unimpeded passage of the electronic rays through said partition, and producing a constant air current between said spaces to maintain difference in pressure between them by the continual supply of air to one space and removal of air from the other space.
  • the method of vaporizing a substance in a vacuum comprising producing electronic rays with a source located within a zone maintained at sub-atmospheric pressure, placing a vaporizable substance within said zone in spaced relation to said source of electronic rays, and modifying the normal path of travel of rays emitted by said source by passing rays from the source through a field of force to converge and concentrate said rays onto the vaporizable substance whereby to heat the latter and cause it to vaporize.
  • the method of vaporizing a substance of a vaporizable character in a vacuum comprising producing electronic rays with a source located within ta, zone maintained at sub-atmospheric pressure, concentrating rays emitted by said source into a ray bundle and bringing the rays in the bundle to a focus by passing rays emitted by said source through a field of magnetic force, and subjecting a vaporizable substance within said zone to the action of the concentrated rays by placing the substance directly in the path of the rays in said bundle at a position where the bundle is of small cross section whereby to heat and vaporize the substance.
  • the method of vaporizing substances of low heat conductivity in a vacuum comprising producing electronic rays, subjecting a vaporizable substance to the heating action of said rays by directing the rays on to an area on a surface of said substance and into impact with that portion of the surface within said area whereby to cause the rays to heat and vaporize said substance, causing the path of travel of said rays to traverse the area of the surface, and additionally moving said substance with respect to the path of travel of the rays so as to bring said rays into impact with different areas on said surface.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
US314565A 1939-02-22 1940-01-18 Vaporization of substances in a vacuum Expired - Lifetime US2423729A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEB186400D DE764927C (de) 1939-02-22 1939-02-22 Verfahren zur Verdampfung im Vakuum

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US2423729A true US2423729A (en) 1947-07-08

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US314565A Expired - Lifetime US2423729A (en) 1939-02-22 1940-01-18 Vaporization of substances in a vacuum

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US (1) US2423729A (US06653308-20031125-C00197.png)
CH (1) CH213914A (US06653308-20031125-C00197.png)
FR (1) FR868386A (US06653308-20031125-C00197.png)
IT (1) IT380674A (US06653308-20031125-C00197.png)
NL (1) NL59597C (US06653308-20031125-C00197.png)

Cited By (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2554902A (en) * 1948-03-25 1951-05-29 Nat Res Corp Thermionic discharge device control
US2621625A (en) * 1948-03-25 1952-12-16 Nat Res Corp Vapor coating device
US2778926A (en) * 1951-09-08 1957-01-22 Licentia Gmbh Method for welding and soldering by electron bombardment
US2858199A (en) * 1954-10-15 1958-10-28 Itt Crystal production
US2902583A (en) * 1955-07-06 1959-09-01 Zeiss Carl Method for working materials by means of a beam of charged particles
US2935395A (en) * 1955-02-21 1960-05-03 Stauffer Chemical Co High vacuum metallurgical apparatus and method
US2942098A (en) * 1958-08-04 1960-06-21 Stauffer Chemical Co Method for heating materials by electron bombardment in a vacuum
US2968723A (en) * 1957-04-11 1961-01-17 Zeiss Carl Means for controlling crystal structure of materials
US2976174A (en) * 1955-03-22 1961-03-21 Burroughs Corp Oriented magnetic cores
US2997760A (en) * 1957-06-10 1961-08-29 Stauffer Chemical Co Continous vaccum casting process
US3005859A (en) * 1958-04-24 1961-10-24 Nat Res Corp Production of metals
US3009050A (en) * 1957-02-18 1961-11-14 Zeiss Carl Electron beam means for initiating chemical reactions
US3016237A (en) * 1957-10-09 1962-01-09 Commissariat Energie Atomique Installation for the vaporisation, under vacuum, of the volatile constituent of an alloy
US3040112A (en) * 1960-06-03 1962-06-19 Stauffer Chemical Co Electron-beam furnace with beam emission suppressors
US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof
US3068309A (en) * 1960-06-22 1962-12-11 Stauffer Chemical Co Electron beam furnace with multiple field guidance of electrons
US3080626A (en) * 1960-05-27 1963-03-12 Stauffer Chemical Co Electron-beam furnace with magnetic guidance and flux concentrator
US3087211A (en) * 1960-05-27 1963-04-30 Stauffer Chemical Co Electron-beam furnace with opposedfield magnetic beam guidance
US3101515A (en) * 1960-06-03 1963-08-27 Stauffer Chemical Co Electron beam furnace with magnetically guided axial and transverse beams
US3105275A (en) * 1960-05-27 1963-10-01 Stauffer Chemical Co Electron-beam furnace with double-coil magnetic beam guidance
DE1172783B (de) * 1960-09-06 1964-06-25 Heurtey Sa Verfahren und Vorrichtung zur Ablenkung und Leistungsmodulation eines Elektronenbuendels in einem mit Elektronenbeschuss arbeitenden Ofen
DE1176771B (de) * 1963-07-13 1964-08-27 Dr Rer Nat Siegfried Schiller Fokussierhilfe bei Elektronenstrahl-Schmelzoefen und Verfahren zu ihrer Ausfuehrung
DE1181840B (de) * 1960-07-12 1964-11-19 Lokomotivbau Elektrotech Elektronenstrahlschmelzofen
US3181209A (en) * 1961-08-18 1965-05-04 Temescal Metallurgical Corp Foil production
US3183077A (en) * 1962-01-30 1965-05-11 Bendix Balzers Vacuum Inc Process for vacuum degassing
US3217135A (en) * 1961-12-29 1965-11-09 Radiation Dynamics Electron beam welding at atmospheric pressures
US3219435A (en) * 1959-04-24 1965-11-23 Heraeus Gmbh W C Method and apparatus for producing metal blocks by electron beams
US3237254A (en) * 1962-06-26 1966-03-01 Stauffer Chemical Co Vacuum casting
US3265801A (en) * 1960-08-22 1966-08-09 Ass Elect Ind Electron beam furnaces
US3404255A (en) * 1965-06-23 1968-10-01 Bendix Corp Source of vaporizable material for bombardment thereof by an electron bombarding means
US3417223A (en) * 1964-05-06 1968-12-17 Steigerwald Karl Heinz Welding process using radiant energy
US3428776A (en) * 1966-01-28 1969-02-18 Gen Electric Method and apparatus for extracting a charged particle beam into a higher pressure atmosphere
US3444350A (en) * 1965-10-23 1969-05-13 United Aircraft Corp Jet diffuser plate for electron beam device
US3485997A (en) * 1965-11-26 1969-12-23 Balzers Patent Beteilig Ag Process and apparatus for the thermal vaporization of mixtures of substances in a vacuum
US3634647A (en) * 1967-07-14 1972-01-11 Ernest Brock Dale Jr Evaporation of multicomponent alloys
US5552675A (en) * 1959-04-08 1996-09-03 Lemelson; Jerome H. High temperature reaction apparatus

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2754259A (en) * 1952-11-29 1956-07-10 Sprague Electric Co Process and apparatus for growing single crystals
DE1154583B (de) * 1962-05-08 1963-09-19 Siemens Ag Verfahren zum Verdampfen von Isolierstoffen durch gebuendelte Elektronenstrahlen

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1326794A (en) * 1919-12-30 sinding-larsen
US1584728A (en) * 1922-04-18 1926-05-18 Case Res Lab Inc Method of manufacturing mirrors
US1942573A (en) * 1932-03-30 1934-01-09 Eclipse Machine Co Engine starter
US2047351A (en) * 1934-10-16 1936-07-14 Dispersion Cathodique En Abreg Cathode disintegration
US2097488A (en) * 1936-01-31 1937-11-02 Bell Telephone Labor Inc Piezoelectric device
US2103623A (en) * 1933-09-20 1937-12-28 Ion Corp Electron discharge device for electronically bombarding materials
GB483029A (en) * 1935-10-12 1938-04-11 Paul Alexander Improvements in and relating to the deposition of metallic films from metal vaporised in vacuo
US2123706A (en) * 1932-07-20 1938-07-12 Hygrade Sylvania Corp Method of manufacture of reflector bulbs
US2153786A (en) * 1936-07-17 1939-04-11 Alexander Process and apparatus for thermal deposition of metals
US2157478A (en) * 1936-06-17 1939-05-09 Bernhard Berghaus Method of coating articles by vaporized coating materials
US2160714A (en) * 1932-07-20 1939-05-30 Hygrade Sylvania Corp Apparatus for interiorly coating lamps, tubes, and the like

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1326794A (en) * 1919-12-30 sinding-larsen
US1584728A (en) * 1922-04-18 1926-05-18 Case Res Lab Inc Method of manufacturing mirrors
US1942573A (en) * 1932-03-30 1934-01-09 Eclipse Machine Co Engine starter
US2123706A (en) * 1932-07-20 1938-07-12 Hygrade Sylvania Corp Method of manufacture of reflector bulbs
US2160714A (en) * 1932-07-20 1939-05-30 Hygrade Sylvania Corp Apparatus for interiorly coating lamps, tubes, and the like
US2103623A (en) * 1933-09-20 1937-12-28 Ion Corp Electron discharge device for electronically bombarding materials
US2047351A (en) * 1934-10-16 1936-07-14 Dispersion Cathodique En Abreg Cathode disintegration
GB483029A (en) * 1935-10-12 1938-04-11 Paul Alexander Improvements in and relating to the deposition of metallic films from metal vaporised in vacuo
US2097488A (en) * 1936-01-31 1937-11-02 Bell Telephone Labor Inc Piezoelectric device
US2157478A (en) * 1936-06-17 1939-05-09 Bernhard Berghaus Method of coating articles by vaporized coating materials
US2153786A (en) * 1936-07-17 1939-04-11 Alexander Process and apparatus for thermal deposition of metals

Cited By (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2621625A (en) * 1948-03-25 1952-12-16 Nat Res Corp Vapor coating device
US2554902A (en) * 1948-03-25 1951-05-29 Nat Res Corp Thermionic discharge device control
US2778926A (en) * 1951-09-08 1957-01-22 Licentia Gmbh Method for welding and soldering by electron bombardment
US2858199A (en) * 1954-10-15 1958-10-28 Itt Crystal production
US2935395A (en) * 1955-02-21 1960-05-03 Stauffer Chemical Co High vacuum metallurgical apparatus and method
US2976174A (en) * 1955-03-22 1961-03-21 Burroughs Corp Oriented magnetic cores
US2902583A (en) * 1955-07-06 1959-09-01 Zeiss Carl Method for working materials by means of a beam of charged particles
US3009050A (en) * 1957-02-18 1961-11-14 Zeiss Carl Electron beam means for initiating chemical reactions
US2968723A (en) * 1957-04-11 1961-01-17 Zeiss Carl Means for controlling crystal structure of materials
US2997760A (en) * 1957-06-10 1961-08-29 Stauffer Chemical Co Continous vaccum casting process
US3016237A (en) * 1957-10-09 1962-01-09 Commissariat Energie Atomique Installation for the vaporisation, under vacuum, of the volatile constituent of an alloy
US3005859A (en) * 1958-04-24 1961-10-24 Nat Res Corp Production of metals
US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof
US2942098A (en) * 1958-08-04 1960-06-21 Stauffer Chemical Co Method for heating materials by electron bombardment in a vacuum
US5628881A (en) * 1959-04-08 1997-05-13 Lemelson; Jerome H. High temperature reaction method
US5552675A (en) * 1959-04-08 1996-09-03 Lemelson; Jerome H. High temperature reaction apparatus
US3219435A (en) * 1959-04-24 1965-11-23 Heraeus Gmbh W C Method and apparatus for producing metal blocks by electron beams
US3080626A (en) * 1960-05-27 1963-03-12 Stauffer Chemical Co Electron-beam furnace with magnetic guidance and flux concentrator
US3087211A (en) * 1960-05-27 1963-04-30 Stauffer Chemical Co Electron-beam furnace with opposedfield magnetic beam guidance
US3105275A (en) * 1960-05-27 1963-10-01 Stauffer Chemical Co Electron-beam furnace with double-coil magnetic beam guidance
DE1213547B (de) * 1960-05-27 1966-03-31 Stauffer Chemical Co Elektronenstrahlofen
US3101515A (en) * 1960-06-03 1963-08-27 Stauffer Chemical Co Electron beam furnace with magnetically guided axial and transverse beams
US3040112A (en) * 1960-06-03 1962-06-19 Stauffer Chemical Co Electron-beam furnace with beam emission suppressors
US3068309A (en) * 1960-06-22 1962-12-11 Stauffer Chemical Co Electron beam furnace with multiple field guidance of electrons
DE1181840B (de) * 1960-07-12 1964-11-19 Lokomotivbau Elektrotech Elektronenstrahlschmelzofen
US3265801A (en) * 1960-08-22 1966-08-09 Ass Elect Ind Electron beam furnaces
DE1172783B (de) * 1960-09-06 1964-06-25 Heurtey Sa Verfahren und Vorrichtung zur Ablenkung und Leistungsmodulation eines Elektronenbuendels in einem mit Elektronenbeschuss arbeitenden Ofen
US3181209A (en) * 1961-08-18 1965-05-04 Temescal Metallurgical Corp Foil production
US3217135A (en) * 1961-12-29 1965-11-09 Radiation Dynamics Electron beam welding at atmospheric pressures
US3183077A (en) * 1962-01-30 1965-05-11 Bendix Balzers Vacuum Inc Process for vacuum degassing
US3237254A (en) * 1962-06-26 1966-03-01 Stauffer Chemical Co Vacuum casting
DE1176771B (de) * 1963-07-13 1964-08-27 Dr Rer Nat Siegfried Schiller Fokussierhilfe bei Elektronenstrahl-Schmelzoefen und Verfahren zu ihrer Ausfuehrung
US3417223A (en) * 1964-05-06 1968-12-17 Steigerwald Karl Heinz Welding process using radiant energy
US3404255A (en) * 1965-06-23 1968-10-01 Bendix Corp Source of vaporizable material for bombardment thereof by an electron bombarding means
US3444350A (en) * 1965-10-23 1969-05-13 United Aircraft Corp Jet diffuser plate for electron beam device
US3485997A (en) * 1965-11-26 1969-12-23 Balzers Patent Beteilig Ag Process and apparatus for the thermal vaporization of mixtures of substances in a vacuum
US3428776A (en) * 1966-01-28 1969-02-18 Gen Electric Method and apparatus for extracting a charged particle beam into a higher pressure atmosphere
US3634647A (en) * 1967-07-14 1972-01-11 Ernest Brock Dale Jr Evaporation of multicomponent alloys

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Publication number Publication date
IT380674A (US06653308-20031125-C00197.png)
FR868386A (fr) 1941-12-29
NL59597C (US06653308-20031125-C00197.png)
CH213914A (de) 1941-03-31

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