US2265829A - Development of lithographic plates - Google Patents

Development of lithographic plates Download PDF

Info

Publication number
US2265829A
US2265829A US223523A US22352338A US2265829A US 2265829 A US2265829 A US 2265829A US 223523 A US223523 A US 223523A US 22352338 A US22352338 A US 22352338A US 2265829 A US2265829 A US 2265829A
Authority
US
United States
Prior art keywords
plate
developer
resist
solution
lithographic plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US223523A
Inventor
William H Wood
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Harris Corp
Original Assignee
Harris Seybold Potter Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Harris Seybold Potter Co filed Critical Harris Seybold Potter Co
Priority to US223523A priority Critical patent/US2265829A/en
Application granted granted Critical
Publication of US2265829A publication Critical patent/US2265829A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00Preparing for use and conserving printing surfaces
    • B41N3/08Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development

Definitions

  • the deep etched areas are treated with material, commonly referred to as a lacquer, to render them receptive to ink.
  • material commonly referred to as a lacquer
  • the light-hardened areas of the resist which during etching have served to protect the nonimage areas of the plate, are removed by a cleanup solution.
  • the plate is then given a desensitizing etch to make the non-image areas receptive to water and is ready for printing.
  • improved procedure and materials are involved, such as to afford more easy manipulation and control, and more reliable and positive action, and making possible the production of plates having improved longevity, definition, fidelity and uniformity.
  • the invention comprises the features hereinafter fully described, and particularly pointed out in the claims, the following description setting forth in detail certain illustrative embodiments of the invention, these being indicative however, of but a few of the various ways in which the principle of the invention may be employed.
  • I may employ the commonly used materials such as glue or gum arabic.
  • the coating as in accordance with my copending application Ser. No. 329,564 may be employed, such combination yielding particular advantages over the previously known materials, thereby making possible an improved receptivity to action of the developer materials.
  • the resist material whether of the preferred composition as indicated, or of other composition, suitably sensitized with a soluble bichromate or the like as usual, is applied to the metal plate: and the further treatment to be described is next in order.
  • the coated metal plate (the metal being usual or as preferred, zinc, aluminum, etc.), having been exposed to light and the subject matter which is to be reproduced, is treated with the developer.
  • the commonly used developer heretofore for removing the unhardened portions of the resist after exposure to light is a concentrated solution, about 50 B., of calcium chloride containing a small percentage of lactic acid; and following the developer, anhydrous alcohol is used to remove the residue of the developer remaining on the plate. Calcium chloride however can react with the alcohol wash to form salts which are insoluble, and these remaining on the plate during the subsequent etching process not only prevent uniform etching action but prevent proper adherence of theink-receptive lacquer which is later applied, causing the latter to lift from the plate.
  • the lactic acid reacts with the zinc or aluminum of the plate to form salts which are insoluble and have a similar harmful effect on the subsequent treatment.
  • a further disadvantage of a developer of such type is that it acts slowly, ordinarily requiring at least five minutes time.
  • the magnesium chloride solution may be to 72 per cent MgClzfiHzO and the hydroxydicarboxylic acid 2.5 to 5 per cent.
  • Magnesium chloride is very soluble in anhydrous alcohol, and for instance may form up to a fifty per cent solution, and therefore alcohol may be used to remove the residue of such material from the plate without any danger that an insoluble. salt will be formed and left on the surface. Removal of the unexposed resist proceeds also much faster with magnesium chloride than with previous developer materials, being complete in from one to three minutes.
  • the dihydroxy acid of the developer such as malic acid. reacts to some extent with the metal of the plate, but salts so produced are soluble in alcohol and hence are readily removed by the alcohol wash.
  • the preferred developer material produces these advantages when applied in connection with the heretofore known resists such as gum or gumglue or with other preferred resist.
  • the plate is deepetched.
  • zinc plates are etched with a solution of anhydrous alcohol and hydrochloric acid and aluminum plates are etched with a concentrated solution of iron chloride. This or other preferred etching solution may be employed.
  • the hardened resist is next removed from the nonimage areas of the plate which it has protected during the deep-etching.

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)

Description

Patented Dec. 9, 1941 DEVELOPMENT OF LITHOGRAPHIC PLATES William H. Wood, Bedford, Ohio, assignor to Harris-Seybold-Potter Company, Cleveland, Ohio, a corporation of Ohio No Drawing. Application August 6, 1938,
Serial No. 223,523
4 Claims.
In the manufacture of deep-etch lithographic plates it is customary to coat a cleaned and counter-etched zinc or aluminum plate with a resist which is sensitive to light, and the plate is then exposed to light in the form of the subiect matter which is to be reproduced, such that in those areas where no image is desired on the finished plate the resist is hardened; then the unhardened areas of the resist are removed by a developing agent so as to leave the image portions of the plate clean. A so-called deep-etching solution is then applied to the plate and allowed to attack the exposed image areas until 1 the metal is etched away to the desired depth, and
after drying, the deep etched areas are treated with material, commonly referred to as a lacquer, to render them receptive to ink. Subsequently the light-hardened areas of the resist, which during etching have served to protect the nonimage areas of the plate, are removed by a cleanup solution. The plate is then given a desensitizing etch to make the non-image areas receptive to water and is ready for printing. In accordance with the present invention, improved procedure and materials are involved, such as to afford more easy manipulation and control, and more reliable and positive action, and making possible the production of plates having improved longevity, definition, fidelity and uniformity.
To the accomplishment of the foregoing and related ends, the invention, then, comprises the features hereinafter fully described, and particularly pointed out in the claims, the following description setting forth in detail certain illustrative embodiments of the invention, these being indicative however, of but a few of the various ways in which the principle of the invention may be employed.
In the preparation of plates in accordance with my invention, I may employ the commonly used materials such as glue or gum arabic. Preferably, however, the coating as in accordance with my copending application Ser. No. 329,564 may be employed, such combination yielding particular advantages over the previously known materials, thereby making possible an improved receptivity to action of the developer materials.
The resist material, whether of the preferred composition as indicated, or of other composition, suitably sensitized with a soluble bichromate or the like as usual, is applied to the metal plate: and the further treatment to be described is next in order.
The coated metal plate (the metal being usual or as preferred, zinc, aluminum, etc.), having been exposed to light and the subject matter which is to be reproduced, is treated with the developer. The commonly used developer heretofore for removing the unhardened portions of the resist after exposure to light, is a concentrated solution, about 50 B., of calcium chloride containing a small percentage of lactic acid; and following the developer, anhydrous alcohol is used to remove the residue of the developer remaining on the plate. Calcium chloride however can react with the alcohol wash to form salts which are insoluble, and these remaining on the plate during the subsequent etching process not only prevent uniform etching action but prevent proper adherence of theink-receptive lacquer which is later applied, causing the latter to lift from the plate. Also, the lactic acid reacts with the zinc or aluminum of the plate to form salts which are insoluble and have a similar harmful effect on the subsequent treatment. A further disadvantage of a developer of such type is that it acts slowly, ordinarily requiring at least five minutes time. Preferably therefore I apply to the exposed plate as developer material a concentrated solution of magnesium chloride containing a small proportion of a hydroxydicarboxylic acid, such as malic acid, or somewhat less desirably tartaric acid. For example the magnesium chloride solution may be to 72 per cent MgClzfiHzO and the hydroxydicarboxylic acid 2.5 to 5 per cent. Magnesium chloride is very soluble in anhydrous alcohol, and for instance may form up to a fifty per cent solution, and therefore alcohol may be used to remove the residue of such material from the plate without any danger that an insoluble. salt will be formed and left on the surface. Removal of the unexposed resist proceeds also much faster with magnesium chloride than with previous developer materials, being complete in from one to three minutes. The dihydroxy acid of the developer, such as malic acid. reacts to some extent with the metal of the plate, but salts so produced are soluble in alcohol and hence are readily removed by the alcohol wash. The preferred developer material produces these advantages when applied in connection with the heretofore known resists such as gum or gumglue or with other preferred resist.
Following removal of the unhardened portions of the resist by the developer, the plate is deepetched. According to customary procedure, zinc plates are etched with a solution of anhydrous alcohol and hydrochloric acid and aluminum plates are etched with a concentrated solution of iron chloride. This or other preferred etching solution may be employed.
Having etched the plate by the usual or the preferred etching materials as indicated, the hardened resist is next removed from the nonimage areas of the plate which it has protected during the deep-etching.
Other modes of applying the principle of the invention may be employed, change :being made as regards the details described, provided the features stated in any of the following claims, or the equivalent of such, be employed.
I therefore particularly point out and distinctly claim as my invention:
1. In a process of making lithographic plates, treating an exposed sensitized lithographic plate with a solution of magnesium chloride modified by containing a small amount of a hydroxydicarboxylic acid.
2. In a process of making lithographic plates, treating an exposed sensitized lithographic plate with a solution of magnesium chloride and a small amount of malic acid.
3. In a process of making lithographic plates, treating an exposed sensitized lithographic plate with a solution containing magnesium chloride 65 to 72 per cent and a hydroxydicarboxylic acid 2.5 to 5 per cent.
4. In a process of making lithographic plates, treating an exposed sensitized lithographic plate with a solution containing magnesium chloride (i5 to 72 per cent and malic acid 2.5 to 5 per cent.
WILLIAM H. WOOD.
US223523A 1938-08-06 1938-08-06 Development of lithographic plates Expired - Lifetime US2265829A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US223523A US2265829A (en) 1938-08-06 1938-08-06 Development of lithographic plates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US223523A US2265829A (en) 1938-08-06 1938-08-06 Development of lithographic plates

Publications (1)

Publication Number Publication Date
US2265829A true US2265829A (en) 1941-12-09

Family

ID=22836878

Family Applications (1)

Application Number Title Priority Date Filing Date
US223523A Expired - Lifetime US2265829A (en) 1938-08-06 1938-08-06 Development of lithographic plates

Country Status (1)

Country Link
US (1) US2265829A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2564414A (en) * 1949-05-14 1951-08-14 Interchem Corp Developer for bichromated colloids
US2678275A (en) * 1950-11-22 1954-05-11 Printing Dev Inc Developer composition for lithographic plates
US3284202A (en) * 1961-08-11 1966-11-08 Litho Chemical And Supply Co I Lithographic plate, its preparation and treatment solution therefor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2564414A (en) * 1949-05-14 1951-08-14 Interchem Corp Developer for bichromated colloids
US2678275A (en) * 1950-11-22 1954-05-11 Printing Dev Inc Developer composition for lithographic plates
US3284202A (en) * 1961-08-11 1966-11-08 Litho Chemical And Supply Co I Lithographic plate, its preparation and treatment solution therefor

Similar Documents

Publication Publication Date Title
DE2530422C2 (en) Process for the production of printing forms, plates for printed circuits, integrated circuits or the like.
DE2547905A1 (en) LIGHT-SENSITIVE COPY MATERIAL
EP0009031A1 (en) Desensitizing solution and process for treating a diazo photosensitive printing plate.
US2882153A (en) Planographic printing plate
US2291854A (en) Lithographic plate and method of producing it
US2270712A (en) Etching lithographic plates
US2265829A (en) Development of lithographic plates
GB564753A (en)
JPH0258618B2 (en)
GB1501194A (en) Photoresist process
GB1575200A (en) Printing plates
US2220252A (en) Method of preparing planographic plates
US3458371A (en) Composition and process for powderless etching
US2572228A (en) Etch for offset plate making
US3118765A (en) Lithographic product comprising lightsensitive diazido stilbene sulfonic acid salt
US2732796A (en) Printing plates
GB225015A (en) Improvements in the production of printing surfaces
US2564414A (en) Developer for bichromated colloids
US3348948A (en) Presensitized deep etch lithographic plates
US3105783A (en) Process of preparing printing plates
EP0551300A1 (en) Printing plate protectant
US1938667A (en) Printing plate
US3737314A (en) Manufacture of printing elements by a photoresist chemical etching system
US2333221A (en) Etching solution for lithographic plates
US2334405A (en) Method of making deep-etched lithographic plates