US2179097A - Cathode ray tube electrode structures - Google Patents
Cathode ray tube electrode structures Download PDFInfo
- Publication number
- US2179097A US2179097A US189718A US18971838A US2179097A US 2179097 A US2179097 A US 2179097A US 189718 A US189718 A US 189718A US 18971838 A US18971838 A US 18971838A US 2179097 A US2179097 A US 2179097A
- Authority
- US
- United States
- Prior art keywords
- deflection
- plates
- box
- cathode ray
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004020 conductor Substances 0.000 description 26
- 238000010894 electron beam technology Methods 0.000 description 13
- 239000004568 cement Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- HWSISDHAHRVNMT-UHFFFAOYSA-N Bismuth subnitrate Chemical compound O[NH+]([O-])O[Bi](O[N+]([O-])=O)O[N+]([O-])=O HWSISDHAHRVNMT-UHFFFAOYSA-N 0.000 description 1
- 206010013710 Drug interaction Diseases 0.000 description 1
- 241001529742 Rosmarinus Species 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229960001482 bismuth subnitrate Drugs 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/70—Arrangements for deflecting ray or beam
- H01J29/72—Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines
- H01J29/74—Deflecting by electric fields only
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T403/00—Joints and connections
- Y10T403/47—Molded joint
- Y10T403/477—Fusion bond, e.g., weld, etc.
Definitions
- My invention relates to cathode ray tubes and particularly to means for deflecting an electron beam over a target or fluorescent screen in two mutually perpendicular directions.
- cathode ray tubes for use in television transmission and reception and for Oscilloscopes, it is customary to deflect the electron beam in two mutually perpendicular directions to trace the desired pattern on the target which in television transmitting tubes is usually of the photosensitive mosaic type while in television receiving tubes and oscllloscopes the target is usually a fluorescent screen which becomes luminescent under the bombardment of the electrons in the beam.
- This two way deflection may be accomplished by electrostatic or electromagnetic fields or combinations of the two but for tracing high frequency phenomena on Oscilloscopes and for certain applications in television it is desirable to use electrostatic deflection because of the linear response obtainable over high ranges of frequency.
- the conventional two way electrostatic deflection system in which two mutually perpendicular deflection flelds are placed at different positions along the electron beam trajectory, has somedisadvantages: the beam length and consequently the length of the tube is greater than would be necessary if the two sets of deflection plates were in the same region; the width of the beam trace is increased, inasmuch, as the diameter of the electron beam at the screen is proportional to the distance between the electron source and the screen; and the inter action between the two electrostatic deflection flelds introduces fringing effects between the fields which tend to defocus the electron beam as it passes through and is deflected by these fields.
- One object of my invention is to accomplish two way deflection with all the deflection plates located in the same region along the beam path, and without fringing and defocusing effects.
- a further object is to avoid inherent disadvantages of the conventional electrostatic deflection system for cathode ray tubes.
- the electrostatic deflection system for cathode ray tubes is in the form of an open ended box having semiconducting walls of uniform resistivity joined at their edges, and positioned to permit the beam to pass through the box end to end.
- the deflection potentials are impressed on diagonally opposite corners of the box, the potential on each corner of the box at any instant being the same at all points along the corner. With corners of equal length and the deflection potentials thus applied symmetrically the radial deflection gradient within the box is homogeneous for all directions and magnitudes of the radial deflection gradient.
- Figure l is a diagrammatic view of a cathode ray tube incorporating my invention.
- Figure 2 is a greatly enlarged perspective view of the deflection structure incorporated in the tube shown in Figure 1;
- Figure 3 is a perspective view of one modification of the structure shown in Figure 2, and;
- Figure 4 is a diagram indicating the operation of the deflection structure shown in Figure 2.
- the tube comprises a highly evacuated glass envelope or bulb l with the tubular arm or neck section enclosing the conventional type electron gun and a frusto-conical section closed at the end remote from the gun structure and provided with a fluorescent screen or target 2 adapted to be rendered luminescent under the impact of the electron beam.
- the electron gun assembly in the neck section of the bulb I is of the conventional type and comprises a cathode 3 from which an electron stream may be drawn, a control electrode 4 connected to the usual biasing battery, and the first anode 5 maintained positive with respect to the cathode 3.
- the electrons emitted from the oathode 3 are directed through the first anode 5 and concentrated into an electron scanning beam focused on the surface of the target 2 by a second anode 6 which is preferably a conductive coating on the inner surface of the neck section extending between the first anode B and the fluorescent screen 2.
- the first anode 5 and the second anode 6 are maintained at the desired positive potentials with respect to the cadahode 5 by a battery I.
- the electron beam is deflected from its normal path as it leaves the first anode of. the electron gun by electrostatic deflection structure of box-like form made of semi-conducting material and located between the end of the first anode I and the target 2, with means for maintaining each corner of the box at substantially the same potential throughout its length.
- the electrostatic deflection structure preferably comprises four rectangular plates I051 I, I2 and I3 assembled to form an open ended box having a cross-section which is rectangular, meaning any quadrilateral figure having four right angles and including a square.
- the four plates consist of semi-conducting material and are of the same resistivity throughout.
- the box is constructed so that a potential impressed on a corner is the same at all points along the comer preferably by extending along the length of the corner a conductor embedded in or joined to the plates at the corner.
- a convenient way of making the box is to bevel the plates at their longitudinal edges and join them at the longitudinal bevelled edges with an electrically conducting cement. It is usually desirable to make the deflection box with sides of equal width and therefore of square cross-section normal to the undeflected path of the electron beam through the box to obtain equal deflection sensitivity in both directions of deflection, although for certain applications the adjoining sides may be made of unequal width to obtain unequal deflection sensitivities; for example the width of the plates l0 and I! may be less than or greater'than the width of plates Ii and i3.
- the plates I 0-l 3 are of semi-conducting material, or of a porous material which may be impregnated with electrically conducting material to render themsemi-conductive, and of a width and length which gives the desired defiection sensitivity.
- a plate material I have found particularly advantageous a ceramic body of high porosity such as a body of alumina particles sintered together with a suitable bonding agent. Sintered alumina having a porosity of about 44%. is particularly suitable and is known commercially as Norton RA 225 Alundum.
- the material is cut to the desired size, bevelled along two opposite edges, and cemented together along the bevelled edges with electrically conducting cement I4 such as burnished silver paste, or other conducting material, to form the box-like structure shown in Figure 2.
- Electrically conducting cement I4 such as burnished silver paste, or other conducting material
- Silver paste suitable for this purpose may comprise fifteen parts of finely powdered silver, 10 parts of Burgundy pitch, and one part of bismuth subnitrate mixed with sufficient solvent such as oil of rosemary to yield a workable paste cement.
- the contiguous edges of the plates forming the box-like structure are pref erably bevelled at an angle of approximately 45 with the plane of the plate, and cemented together with the electrically conducting cement H.
- the cement l4 extends the length of the corners and provides means for impressing a single potential at all points along each corner and is of loidal graphite in boiling water, and allowed to soak up the suspension for a period of about one minute.
- the impregnating material may be deflocculated graphite, such as the material commercially known as "Aquadag, which is particularly good for this purpose.
- Aquadag the material commercially known as "Aquadag”
- the proportion of Aquadag to water is not critical, and the specific resistance of the material comprising the plates l0-l3 may be varied over a wide range by varying the concentration of the Aquadag suspension.
- the electrical resistivity of the plates be made as uniform as possible, so that if the resistivity obtained by following the above treatment is less than desired, I increase it to the desired value by dipping the electrode in water several times, each dipping followed by drying, rather than by decreasing the concentration of the Aquadag" in the suspension.
- Figure 3 shows a deflection structure made in accordance with my invention which is particularly adapted to compensate keystone distortion effects which are introduced when the plane of the target 2 is not perpendicular to the longitudinal axis of the tube.
- the target is at .an acute angle such as an angle of 60 with the longitudinal axis of the tube, represented in the figure as the center line IS
- the outline of the area scanned by the cathode ray beam has a keystone shape rather than the desired rectangular shape.
- This keystone distortion may be compensated for by so forming the deflection structure that the cathode ray beam is under the influence of the electrostatic deflection fields for a greater period of time when the beam is directed toward that portion of the target which is nearer the electron gun.
- the tubular deflection structure is formed as an obliquely truncated rectangular prism, with two diagonally opposite corners of equal length, and the other two corners of unequal length.
- the plates Hi -l3 are each shaped so that two edges are parallel, the third edge perpendicular to the two parallel edges and the fourth edge at an angle other than 90 with the parallel edges.
- the term right trapezoid will be used to define the shape of the plates when formed in this manner.
- the structure is mounted in a tube having an inclined target preferably with the apex of the truncated prism toward the target.
- the electrical connections for applying the deflection potentials to diagonally opposite corners of the box may conveniently be made by drilling small holes in the cement atthe corners, filling the holes with additional cement, inserting the wires or leads I5 and I8 which are used as electrical conductors and supports for the assembly, and firing the assembly with the inserted leads in a vacuum furnace operated at 500 C. for approximately 30 minutes to set the cement.
- This firing step may be avoided however if the leads are attached at the time the plates are cemented together to form the box.
- the deflection box may be made from some other porous non-conducting material than Alundum and may be made semi-conducting by impregnating it with a desired amount of
- the impregnating material may be a solution containing a metal salt following the application of which the assembly may be fired in vacuum to reduce the metal salt to metal thereby rendering the non-conductor partially conducting.
- the plates III-43 of porous material they may be made of non-porous material which is coated on the inner surface with a conducting material having the desired electrical resistance.
- the relative dimensions of the deflection box may be varied through wide limits to satisfy the requirements of any particular application.
- Deflection structure using plates two inches long and one inch wide has given a deflection sensitivity of I connected to the electrical conductor along the longitudinal junction of plates II], II and I 2, I3 respectively while the horizontal deflection potentials are applied through the current carrying leads I6 and I8 to the conductor along the longitudinal junction between plates II, I2 and I0, I3.
- Figure 4 is a diagram indicating various conditions of operation, the central circle representing the target 2, with an inscribed rectangle 20 in dashed lines representing the boundaries of the pattern traced on the target by the electron beam.
- a square 2I representing diagrammatically the projection of the deflection structure on the target 2 and within the square 2
- the area swept out by the beam as it leaves the deflection structure, represented by the rectangle 22, is a miniature of the area swept out by the beam on the target and represented by the rectangle 20.
- the eight dots on the rectangle 22 correspond in position to those on the rectangle 20 and represent eight positions assumed by the electron beam both as it leaves the deflection structure and as it impinges on the target.
- Eight conditions of operation are shown in Sub Figures A to H inelusive, the squares surrounding the circle or target 2 representing eight views of the cross-section of the structure shown in Figure 2, the horizontal and vertical deflection potentials shown as being impressed upon the diagonally opposite corners.
- the dashed parallel lines in Sub Figures A to F represent parallel planes of equipotential regions which extend from end to end of the deflection box and are shown merely as an aid to describe the operation under various conditions.
- Sub Figure A indicates the operation of the deflection system with horizontal and vertical deflection potentials applied to the box for projecting the electron beam toward the upper left hand corner of the fluorescent screen or target 2.
- Horizontal deflection potentials are applied to the system such as 40 volts positive to the control lead I6, and 40 volts negative to the lead I8, to
- Sub Figure B indicates the position at which the beam impinges on the target with similar horizontal deflection potentials but with no vertical deflection potentials. This condition of deflection potentials produces impingement of the beam at the center left hand edge of the target 2 while under the same horizontal deflection conditions but with the vertical deflection potentials shown in A reversed, the beam impinges on the screen at the lower left hand corner as indicated in Sub Figure C.
- Sub Figures D, E and F indicate the operation of the deflection structure with vertical and horizontal deflection potentials as in A, B and C but with the polarity of the horizontal deflection potentials reversed. 'These conditions produce beam deflection to the upper right, center right and lower right portions of the target 2. With no horizontal potentials applied to the leads I6 and structure operates because of potential differences or gradients set up along the inner surfaces of the electrodes or deflection plates when current is made to flow in the vertical and horizontal deflection circuits.
- the two mutually perpendicular deflection flelds are applied co-incidentally and produce a uniform radial deflection gradient with no defocusing effects due to interaction between the two flelds and since the overall length of the deflection system is less than one-halt that of the conventional system where the plates are eflective over different portions of the path of the electron beam, the electron gun may be moved up closer to the screen to give a smaller and more intense beam trace.
- a tubular cathode ray electrostatic deflection structure comprising four nonmetallic rectangular plates of electrically semi-conductive material joined at their contiguous edges to form an open ended box enclosing an area of square cross-section, and an electrical conductor having a negligible resistance in comparison with that of the semi-conductive material extending along each corner of the box and electrically connected throughout its length to the adjoining plates to produce when each corner is energized a potential gradient in the semi-conductive material between adjacent edges of the box.
- An electrostatic deflection structure for a cathode ray tube comprising iour rectangular nonmetallic plates of electrically semi-conducting materialhaving' aresistance of at least 4000 ohms/cm ⁇ , and metal conductors interposed between and joined to the plates at the corners to form an open ended box enclosing an area of rectangular cross-section.
- An electrostatic deflection structure for a cathode ray tube comprising an open ended box including four nonmetallic plates of semi-conducting material and of rectangular'cross-section and means including an electrical conductor of low electrical resistance in comparison with that of the semi-conducting material electrically connected to the box along each corner for maintaining each corner 0! the box at substantially the same potential throughout its length.
- a tubular electrostatic structure for a cathode ray tube comprising four rectangular nonmetallic plates of electrically semi-conducting material having a resistance of approximately 4000 ohms/cmP joined at their contiguous edges to form a box enclosing an area of rectangular cross-section, and means extending along each corner of the box to impress a single potential at all points along each corner.
- a tubular electrostatic deflection structure for a cathode ray tube comprising four rectangular plates oi material having a resistance of approximately 4000 ohms/cm? forming an enclosure having a rectangular cross-section and each having two opposite edges beveled, said plates having their contiguous edges cemented together along the beveled edges with electrically conductive material of negligible resistance with respect to that of the plates extending the length of said edges.
- a tubular electrostatic deflection structure for a cathode ray tube comprising tour rectangular plates having an electrical resistance of at least 4000 ohms/cm each having two opposite edges beveled at an angle of approximately 45 to the plane of the plate, electrical conductors in electrical contact with and extending along the beveled edges to form an enclosure having a rectangular cross-section, and means to apply an electric potential to each of said conductors.
- a tubular electrostatic deflection structure 'ior a cathode ray tube comprising tour electrically semi-conductive plates having a resistance of at least 4000 ohms/cm? joined along their contiguous edges to form a box having the shape of an obliquely truncated rectangular prism and electrical conductors of negligible electrical resistance extending along and in electrical contact with the said contiguous edges, the surface 01 said conductors exposed to the interior of said box being negligible in comparison with the area of said plates.
- a cathode ray deflection structure comprising four electrically semi-conductive plates having a resistance of at least'4000 ohms/cm. each having the shape of a right trapezoid joined along their parallel edges with electrically conductive material of negligible resistance in comparison with that of the plates to form a tubular obliquely truncated rectangular prism.
- a tubular electrostatic deflection structure for a cathode ray tube comprising an open ended box of electrically semi-conductive material having a resistance of at least 4000 ohms/cm. having the shape of an obliquely truncated rectangular I prismwith two of the diagonal corners of equal 'joined at their edges to form an open ended electrode assembly of rectangular cross-section,
- a cathode ray tube including in an evacuated envelope an electron gun, a target and a tubular electrostatic deflection structure between said electron gun and said target and surrounding a portion of the path between said gun and said target, said structure comprising an open ended box havingtour nonmetallic plates of semiconducting material having an electrical resistance of at least 4000 ohms/cm; and of rectangular cross-section and means extending alongand adjacent each corner of the box to impress a de- RUSSELL R. LAW.
Landscapes
- Electrolytic Production Of Metals (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US189718A US2179097A (en) | 1938-02-10 | 1938-02-10 | Cathode ray tube electrode structures |
CH207926D CH207926A (de) | 1938-02-10 | 1939-02-09 | Elektrische Entladungsröhre mit elektrostatischer Ablenkung. |
NL91890A NL52448C (fr) | 1938-02-10 | 1939-02-09 | |
GB4437/39A GB525000A (en) | 1938-02-10 | 1939-02-10 | Improvements in or relating to deflecting electrode structures for cathode ray tubes |
DER104504D DE749574C (de) | 1938-02-10 | 1939-02-11 | Elektrostatische Ablenkeinrichtung fuer Kathodenstrahlroehren mit vier um den gleichen Strahlabschnitt angeordneten Ablenkplatten |
FR850591D FR850591A (fr) | 1938-02-10 | 1939-02-20 | Perfectionnements aux dispositifs déflecteurs pour tubes à rayon cathodique |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US189718A US2179097A (en) | 1938-02-10 | 1938-02-10 | Cathode ray tube electrode structures |
GB4437/39A GB525000A (en) | 1938-02-10 | 1939-02-10 | Improvements in or relating to deflecting electrode structures for cathode ray tubes |
FR850591T | 1939-02-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
US2179097A true US2179097A (en) | 1939-11-07 |
Family
ID=22698484
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US189718A Expired - Lifetime US2179097A (en) | 1938-02-10 | 1938-02-10 | Cathode ray tube electrode structures |
Country Status (6)
Country | Link |
---|---|
US (1) | US2179097A (fr) |
CH (1) | CH207926A (fr) |
DE (1) | DE749574C (fr) |
FR (1) | FR850591A (fr) |
GB (1) | GB525000A (fr) |
NL (1) | NL52448C (fr) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2455992A (en) * | 1947-01-25 | 1948-12-14 | Du Mont Allen B Lab Inc | Cathode-ray tube amusement device |
US2617076A (en) * | 1948-01-13 | 1952-11-04 | Motorola Inc | Electrostatic deflection system |
US2654851A (en) * | 1952-01-24 | 1953-10-06 | Scalise Dominic Theodore | Beam deflector |
US2681426A (en) * | 1952-03-06 | 1954-06-15 | Motorola Inc | Deflection system |
US2745034A (en) * | 1955-02-02 | 1956-05-08 | Rodney F Simons | Frequency analyzer |
US2766398A (en) * | 1953-04-03 | 1956-10-09 | Itt | Electron discharge device |
US2817044A (en) * | 1949-06-23 | 1957-12-17 | Siemens Ag | Unsymmetrical electrostatic deflection device for electron radiation tubes |
US3226594A (en) * | 1960-07-08 | 1965-12-28 | Joseph W Griffith | Electron beam multiplication tube |
US3323000A (en) * | 1964-01-06 | 1967-05-30 | Mancebo Lloyd | Electrostatic deflection system |
US4556823A (en) * | 1983-07-28 | 1985-12-03 | International Business Machines Corporation | Multi-function charged particle apparatus |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL83700C (fr) * | 1942-03-24 | |||
GB2117965A (en) * | 1982-02-05 | 1983-10-19 | Philips Electronic Associated | Electron beam deflector for a flat display tube |
GB2249995B (en) * | 1990-11-21 | 1995-03-01 | Linx Printing Tech | Electrostatic deflection of charged particles |
-
1938
- 1938-02-10 US US189718A patent/US2179097A/en not_active Expired - Lifetime
-
1939
- 1939-02-09 NL NL91890A patent/NL52448C/xx active
- 1939-02-09 CH CH207926D patent/CH207926A/de unknown
- 1939-02-10 GB GB4437/39A patent/GB525000A/en not_active Expired
- 1939-02-11 DE DER104504D patent/DE749574C/de not_active Expired
- 1939-02-20 FR FR850591D patent/FR850591A/fr not_active Expired
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2455992A (en) * | 1947-01-25 | 1948-12-14 | Du Mont Allen B Lab Inc | Cathode-ray tube amusement device |
US2617076A (en) * | 1948-01-13 | 1952-11-04 | Motorola Inc | Electrostatic deflection system |
US2817044A (en) * | 1949-06-23 | 1957-12-17 | Siemens Ag | Unsymmetrical electrostatic deflection device for electron radiation tubes |
US2654851A (en) * | 1952-01-24 | 1953-10-06 | Scalise Dominic Theodore | Beam deflector |
US2681426A (en) * | 1952-03-06 | 1954-06-15 | Motorola Inc | Deflection system |
US2766398A (en) * | 1953-04-03 | 1956-10-09 | Itt | Electron discharge device |
US2745034A (en) * | 1955-02-02 | 1956-05-08 | Rodney F Simons | Frequency analyzer |
US3226594A (en) * | 1960-07-08 | 1965-12-28 | Joseph W Griffith | Electron beam multiplication tube |
US3323000A (en) * | 1964-01-06 | 1967-05-30 | Mancebo Lloyd | Electrostatic deflection system |
US4556823A (en) * | 1983-07-28 | 1985-12-03 | International Business Machines Corporation | Multi-function charged particle apparatus |
Also Published As
Publication number | Publication date |
---|---|
GB525000A (en) | 1940-08-20 |
CH207926A (de) | 1939-12-15 |
FR850591A (fr) | 1939-12-20 |
NL52448C (fr) | 1942-05-15 |
DE749574C (de) | 1944-11-25 |
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