US20250076047A1 - Sensor, sensor system, and electronic device - Google Patents

Sensor, sensor system, and electronic device Download PDF

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Publication number
US20250076047A1
US20250076047A1 US18/731,984 US202418731984A US2025076047A1 US 20250076047 A1 US20250076047 A1 US 20250076047A1 US 202418731984 A US202418731984 A US 202418731984A US 2025076047 A1 US2025076047 A1 US 2025076047A1
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United States
Prior art keywords
region
opposing
annular portion
width
radial direction
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US18/731,984
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English (en)
Inventor
Daiki Ono
Hideaki Murase
Fumito MIYAZAKI
Yasushi Tomizawa
Kei Masunishi
Kengo UCHIDA
Etsuji Ogawa
Fumitaka ISHIBASHI
Jumpei Ogawa
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Toshiba Corp
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Toshiba Corp
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Assigned to KABUSHIKI KAISHA TOSHIBA reassignment KABUSHIKI KAISHA TOSHIBA ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: OGAWA, ETSUJI, ISHIBASHI, FUMITAKA, MASUNISHI, KEI, MIYAZAKI, FUMITO, MURASE, HIDEAKI, OGAWA, JUMPEI, ONO, DAIKI, TOMIZWA, YASUSHI, UCHIDA, KENGO
Publication of US20250076047A1 publication Critical patent/US20250076047A1/en
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
    • B81B3/004—Angular deflection
    • B81B3/0045—Improve properties related to angular swinging, e.g. control resonance frequency
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5705—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/567—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using the phase shift of a vibration node or antinode
    • G01C19/5677—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using the phase shift of a vibration node or antinode of essentially two-dimensional [2D] vibrators, e.g. ring-shaped vibrators
    • G01C19/5684—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using the phase shift of a vibration node or antinode of essentially two-dimensional [2D] vibrators, e.g. ring-shaped vibrators the devices involving a micromechanical structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/02—Sensors
    • B81B2201/0228—Inertial sensors
    • B81B2201/0242—Gyroscopes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/04—Electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/05—Type of movement
    • B81B2203/056—Rotation in a plane parallel to the substrate

Definitions

  • Embodiments described herein relate generally to a sensor, a sensor system, and an electronic device.
  • sensors having a MEMS (Micro Electro Mechanical Systems) structure.
  • electronic devices and the like are controlled based on information obtained by sensors. It is desired to improve the characteristics of sensors.
  • FIG. 1 is a schematic plan view illustrating a sensor according to a first embodiment
  • FIG. 2 is a schematic plan view illustrating a part of the sensor according to the first embodiment
  • FIG. 3 is a schematic cross-sectional view illustrating the sensor according to the first embodiment
  • FIG. 4 is a schematic cross-sectional view illustrating the sensor according to the first embodiment
  • FIG. 5 is a schematic cross-sectional view illustrating the sensor according to the first embodiment
  • FIG. 6 is a schematic cross-sectional view illustrating the sensor according to the first embodiment
  • FIG. 7 is a schematic plan view illustrating a part of the sensor according to the first embodiment
  • FIG. 8 is a schematic plan view illustrating a sensor according to the first embodiment
  • FIG. 9 is a schematic plan view illustrating a sensor according to the first embodiment.
  • FIG. 10 is a schematic plan view illustrating a sensor according to the first embodiment
  • FIG. 11 is a schematic diagram illustrating an electronic device according to a second embodiment
  • FIGS. 12 A to 12 H are schematic views illustrating applications of the electronic device according to the embodiment.
  • FIGS. 13 A and 13 B are schematic views illustrating applications of the sensor according to the embodiment.
  • a sensor includes a base including a first face, a fixed portion fixed to the first face, a movable portion supported by the fixed portion, a first fixed electrode, and a first opposing fixed electrode.
  • a first gap is provided between the first face and the movable portion.
  • the fixed portion includes a first center in a first plane parallel to the first face.
  • the movable portion includes a first annular portion and a second annular portion.
  • the first fixed electrode includes a first region and a second region.
  • the first opposing fixed electrode includes a first opposing region and a second opposing region. The first region is provided between the second annular portion and the first annular portion.
  • the first opposing region is provided between the second annular portion and the first region.
  • the second region is provided between the second annular portion and the first annular portion.
  • the second opposing region is provided between the second annular portion and the second region.
  • a first region width of the first region in a radial direction which is parallel to the first plane and passes through the first center, is different from a second region width of the second region in the radial direction.
  • a first opposing region width of the first opposing region in the radial direction is different from a second opposing region width of the second opposing region in the radial direction.
  • FIG. 1 is a schematic plan view illustrating a sensor according to a first embodiment.
  • FIG. 2 is a schematic plan view illustrating a part of the sensor according to the first embodiment.
  • FIGS. 3 to 6 are schematic cross-sectional views illustrating the sensor according to the first embodiment.
  • FIG. 3 is a sectional view taken along the line A 1 -A 2 in FIG. 2 .
  • FIG. 4 is a sectional view taken along the line A 3 -A 4 in FIG. 2 .
  • FIG. 5 is a sectional view taken along the line the A 5 -A 6 in FIG. 2 .
  • FIG. 6 is a sectional view taken along the line A 7 -A 8 in FIG. 2 .
  • a sensor 110 includes a base 50 s , a fixed portion 10 F, a movable portion 10 M, a first fixed electrode 31 A, and a first opposing fixed electrode 31 B.
  • the base 50 s includes a first face 50 a .
  • the fixed portion 10 F is fixed to the first face 50 a .
  • the movable portion 10 M is supported by the fixed portion 10 F.
  • a first gap G 1 is provided between the first face 50 a and the movable portion 10 M.
  • an insulating member 55 is provided on the first face 50 a .
  • the fixed portion 10 F is provided on the insulating member 55 .
  • the insulating member 55 is not provided between the first face 50 a and the movable portion 10 M.
  • the movable portion 10 M is electrically conductive.
  • the movable portion 10 M may include, for example, conductive silicon.
  • the fixed portion 10 F is electrically conductive.
  • the fixed portion 10 F may include, for example, conductive silicon.
  • the fixed portion 10 F is electrically connected to the movable portion 10 M.
  • the insulating member 55 may include, for example, silicon oxide.
  • the fixed portion 10 F includes a first center 10 C in a first plane PL 1 parallel to the first face 50 a.
  • a direction perpendicular to the first plane PL 1 is defined as a Z-axis direction.
  • One direction perpendicular to the Z-axis direction is defined as an X-axis direction.
  • a direction perpendicular to the Z-axis direction and the X-axis direction is defined as a Y-axis direction.
  • the first plane PL 1 is parallel to the X-Y plane.
  • the movable portion 10 M includes a first annular portion 11 and a second annular portion 12 .
  • the second annular portion 12 is provided between the fixed portion 10 F and the first annular portion 11 .
  • the first annular portion 11 may be provided between the fixed portion 10 F and the second annular portion 12 .
  • the first fixed electrode 31 A includes a first region r 1 and a second region r 2 .
  • the first opposing fixed electrode 31 B includes a first opposing region s 1 and a second opposing region s 2 .
  • the first region r 1 is provided between the second annular portion 12 and the first annular portion 11 .
  • the first opposing region s 1 is provided between the second annular portion 12 and the first region r 1 .
  • the second region r 2 is provided between the second annular portion 12 and the first annular portion 11 .
  • the second opposing region s 2 is provided between the second annular portion 12 and the second region r 2 .
  • a width (length) of the first region r 1 in a radial direction Dr parallel to the first plane PL 1 and passing through the first center 10 C is defined as a first region width wr 1 .
  • a width (length) of the second region r 2 in the radial direction Dr is defined as a second region width wr 2 .
  • the first region width wr 1 is different from the second region width wr 2 .
  • a width (length) of the first opposing region s 1 in the radial direction Dr is defined as a first opposing region width ws 1 .
  • a width (length) of the second opposing region s 2 in the radial direction Dr is defined as a second opposing region width ws 2 .
  • the first opposing region width ws 1 is different from the second opposing region width ws 2 .
  • the first region width wr 1 is wider than the second region width wr 2 .
  • the first opposing region width ws 1 is narrower than the second opposing region width ws 2 .
  • a plurality of fixed electrodes 30 are provided in the sensor 110 .
  • the plurality of fixed electrodes 30 are fixed to the first face 50 a .
  • the first fixed electrode 31 A and the first opposing fixed electrode 31 B are included in the plurality of fixed electrodes 30 .
  • a signal including an alternating component is applied between a part of the plurality of fixed electrodes 30 20 and the movable portion 10 M.
  • the movable portion 10 M vibrates.
  • an external force is applied to the movable portion 10 M vibrating, the vibration state changes.
  • the change in the vibration state is detected as a 25 change in capacitance, for example.
  • the change in the vibration state due to external forces are caused by, for example, Coriolis force.
  • the change in the vibration state can be detected, for example, by another part of the plurality of fixed electrodes 30 .
  • the signal may be supplied by the controller 70 , for example.
  • the controller 70 may detect the change in the vibration 30 state.
  • the first fixed electrode 31 A faces the first annular portion 11 .
  • the first opposing fixed electrode 31 B faces the second annular portion 12 .
  • each of the first fixed electrode 31 A and the first opposing fixed electrode 31 B is provided with a wide region and a narrow region.
  • a connecting member for example, a bonding wire
  • a connecting member can be stably connected to the wide region.
  • stable electrical connection can be obtained.
  • highly accurate detection with suppressed noise can be obtained.
  • a sensor with improved characteristics can be provided.
  • the first region r 1 and the second region r 2 may be exchanged with each other.
  • a wide region and a narrow region are provided.
  • the first annular portion 11 may be inside the second annular portion 12 .
  • one of a first condition and a second condition may be satisfied.
  • the first condition the first region width wr 1 is wider than the second region width wr 2
  • the first opposing region width ws 1 is narrower than the second opposing region width ws 2
  • the second condition the first region width wr 1 is narrower than the second region width wr 2
  • the first opposing region width ws 1 is wider than the second opposing region width ws 2 .
  • the second region r 2 is continuous with the first region r 1 .
  • the second opposing region s 2 may be continuous with the first opposing region s 1 .
  • a direction from the second opposing region s 2 to the first region r 1 is along a circumferential direction Dc centered on the first center 10 C.
  • the second opposing region s 2 faces the first region r 1 .
  • the first fixed electrode 31 A may further include a third region r 3 .
  • the first opposing fixed electrode 31 B may further include a third opposing region s 3 .
  • the third region r 3 is provided between the second annular portion 12 and the first annular portion 11 . At least a part of the third opposing region s 3 is provided between the second annular portion 12 and the third region r 3 .
  • the first opposing region s 1 is provided between the second opposing region s 2 and the third opposing region s 3 .
  • the first region width wr 1 is different from a third region width wr 3 of the third region r 3 in the radial direction Dr.
  • a first opposing region width ws 1 is different from the third opposing region width ws 3 of the third opposing region s 3 in the radial direction Dr.
  • the first region width wr 1 is wider than the second region width wr 2 .
  • the first opposing region width ws 1 is narrower than the second opposing region width ws 2 .
  • the first region width wr 1 is wider than the third region width wr 3 .
  • the first opposing region width ws 1 is narrower than the third opposing region width ws 3 .
  • the first region width wr 1 may be narrower than the second region width wr 2 , and the first opposing region width ws 1 may be wider than the second opposing region width ws 2 .
  • the first region width wr 1 is narrower than the third region width wr 3
  • the first opposing region width ws 1 is wider than the third opposing region width ws 3 .
  • the first region r 1 is provided between the second region r 2 and the third region r 3 .
  • the first opposing region s 1 is provided between the second opposing region s 2 and the third opposing region s 3 .
  • a first ratio of a first absolute value of a difference between the first region width wr 1 and the second region width wr 2 to the first region width wr 1 may be not less than 0.9 and not more than 30.
  • a second ratio of a second absolute value of a difference between the first opposing region width ws 1 and the second opposing region width ws 2 to the first opposing region width ws 1 may be not less than 0.9 and not more than 30.
  • the second region width wr 2 may be not less than 0.05 times and not more than 30 the first region width wr 1 .
  • the third region width wr 3 may be not less than 0.8 times and not more than 1.2 times the second region width wr 2 .
  • the second opposing region width ws 2 may be not less than 0.05 times and not more than 30 times the first opposing region width ws 1 .
  • the third opposing region width ws 3 may be not less than 0.8 times and not more than 1.2 times the second opposing region width ws 2 .
  • FIG. 7 is a schematic plan view illustrating a part of the sensor according to the first embodiment.
  • a length of the second opposing region s 2 in the circumferential direction Dc centered on the first center 10 C is defined as a second opposing region length Ls 2 .
  • a length of the third opposing region s 3 in the circumferential direction Dc is defined as a third opposing region length Ls 3 .
  • the second opposing region length Ls 2 may be, for example, not less than 0.8 times and not more than 1.2 times the third opposing region length Ls 3 .
  • the second opposing region length Ls 2 may be substantially the same as the third opposing region length Ls 3 , for example. Good symmetrical vibration can be obtained. For example, noise is suppressed. Highly accurate detection becomes easy.
  • a length of the first region r 1 in the circumferential direction Dc is defined as a first region length Lr 1 .
  • the first region length Lr 1 may be, for example, not less than 0.1 times and not more than 10 times the second opposing region length Ls 2 .
  • the first region length Lr 1 may be, for example, not less than 0.8 times and not more than 1.2 times the second opposing region length Ls 2 .
  • the movable portion 10 M may include a plurality of first connect portions 21 .
  • the plurality of first connect portions 21 extend along the radial direction Dr.
  • the plurality of first connect portions 21 connect the first annular portion 11 and the second annular portion 12 .
  • the first fixed electrode 31 A and the first opposing fixed electrode 31 B are provided between one of the plurality of first connect portions 21 and another one of the plurality of first connect portions 21 .
  • the other one of the plurality of first connect portions 21 is next to the one of the plurality of first connect portions 21 in the circumferential direction Dc.
  • the senor 110 may further include a second fixed electrode 32 A and a second opposing fixed electrode 32 B.
  • the movable portion 10 M may further include a third annular portion 13 .
  • the second annular portion 12 is provided between the third annular portion 13 and the first annular portion 11 .
  • the third annular portion 13 is provided between the fixed portion 10 F and the second annular portion 12 .
  • the second fixed electrode 32 A includes a fourth region r 4 and a fifth region r 5 .
  • the second opposing fixed electrode 32 B includes a fourth opposing region s 4 and a fifth opposing region s 5 .
  • the fourth region r 4 is provided between the third annular portion 13 and the second annular portion 12 .
  • the fourth opposing region s 4 is provided between the third annular portion 13 and the fourth region r 4 .
  • the fifth region r 5 is provided between the third annular portion 13 and the second annular portion 12 .
  • the fifth opposing region s 5 is provided between the third annular portion 13 and the fifth region r 5 .
  • a fourth region width wr 4 of the fourth region r 4 in the radial direction Dr is different from a fifth region width wr 5 of the fifth region r 5 in the radial direction Dr.
  • a fourth opposing region width ws 4 of the fourth opposing region s 4 in the radial direction Dr is different from a fifth opposing region width ws 5 of the fifth opposing region s 5 in the radial direction Dr.
  • each of the second fixed electrode 32 A and the second opposing fixed electrode 32 B a wide region and a narrow region are provided. Electrical connections become easier. Noise is suppressed and highly accurate detection becomes possible.
  • the first region width wr 1 is wider than the second region width wr 2 .
  • the first opposing region width ws 1 is narrower than the second opposing region width ws 2 .
  • the fourth region width wr 4 is narrower than the fifth region width wr 5 .
  • the fourth opposing region width ws 4 is wider than the fifth opposing region width ws 5 .
  • the second fixed electrode 32 A may further include a sixth region r 6 .
  • the second opposing fixed electrode 32 B may further include a sixth opposing region s 6 .
  • the sixth region r 6 is provided between the third annular portion 13 and the second annular portion 12 .
  • At least a part of the sixth opposing region s 6 is provided between the third annular portion 13 and the sixth region r 6 .
  • At least a part of the fourth region r 4 is provided between the fifth region r 5 and the sixth region r 6 .
  • the fourth region width wr 4 is different from a sixth region width wr 6 of the sixth region r 6 in the radial direction Dr.
  • the fourth opposing region width ws 4 is different from a sixth opposing region width ws 6 of the sixth opposing region s 6 in the radial direction Dr.
  • the first region width wr 1 is wider than the second region width wr 2 .
  • the first opposing region width ws 1 is narrower than the second opposing region width ws 2 .
  • the fourth region width wr 4 is narrower than the fifth region width wr 5 .
  • the fourth opposing region width ws 4 is wider than the fifth opposing region width ws 5 .
  • the fourth region width wr 4 is narrower than the fifth region width wr 5 .
  • the fourth opposing region width ws 4 is wider than the fifth opposing region width ws 5 .
  • the fourth region width wr 4 is narrower than the sixth region width wr 6 .
  • the fourth opposing region width ws 4 is wider than the sixth opposing region width ws 6 .
  • the fifth region r 5 is provided between the fifth opposing region s 5 and the second region r 2 .
  • the second opposing region s 2 is provided between the fifth region r 5 and the second region r 2 .
  • FIG. 8 is a schematic plan view illustrating a sensor according to the first embodiment.
  • the configurations of the first fixed electrode 31 A and the first opposing fixed electrode 31 B are different from the configuration in the sensor 110 .
  • the configuration of the sensor 111 except for this may be the same as the configuration of the sensor 110 .
  • the sensor 111 also includes the base 50 s , the fixed portion 10 F, the movable portion 10 M, the first fixed electrode 31 A, and the first opposing fixed electrode 31 B.
  • the first gap G 1 is provided between the first face 50 a of the base 50 s and the movable portion 10 M (see FIGS. 3 to 6 ).
  • the fixed portion 10 F includes the first center 10 C in the first plane PL 1 parallel to the first face 50 a.
  • the movable portion 10 M includes the plurality of annular portions 10 and the plurality of connect portions 20 .
  • the plurality of annular portions 10 are provided around the fixed portion 10 F with the first center 10 C as the center.
  • the plurality of annular portions 10 include the first annular portion 11 , the second annular portion 12 , and the third annular portion 13 .
  • the second annular portion 12 is provided between the fixed portion 10 F and the first annular portion 11 .
  • the third annular portion 13 is provided between the fixed portion 10 F and the second annular portion 12 .
  • the plurality of connect portions 20 include the first connect portion 21 , a second connect portion 22 , and a third connect portion 23 .
  • the first connect portion 21 is provided between the second annular portion 12 and the first annular portion 11 and connects the second annular portion 12 and the first annular portion 11 .
  • the first connect portion 21 is along a first radial direction Dr 1 .
  • the first radial direction Dr 1 passes through the first center 10 C and is along the first plane PL 1 .
  • the second connect portion 22 is provided between the third annular portion 13 and the second annular portion 12 and connects the third annular portion 13 and the second annular portion 12 .
  • the second connect portion 22 is along a second radial direction Dr 2 .
  • the second radial direction Dr 2 passes through the first center 10 C and is along the first plane PL 1 .
  • the third connect portion 23 is provided between the second annular portion 12 and the first annular portion 11 and connects the second annular portion 12 and the first annular portion 11 .
  • the third connect portion 23 is along a third radial direction Dr 3 .
  • the third radial direction Dr 3 passes through the first center 10 C and is along the first plane PL 1 .
  • the second radial direction Dr 2 crosses the first radial direction Dr 1 .
  • the third radial direction Dr 3 crosses the first radial direction Dr 1 and the second radial direction Dr 2 .
  • An angle (first angle) between the second radial direction Dr 2 and the first radial direction Dr 1 is smaller than an angle (second angle) between the third radial direction Dr 3 and the first radial direction Dr 1 .
  • the first angle is substantially 1 ⁇ 2 of the second angle.
  • the first fixed electrode 31 A includes the first region r 1 and the second region r 2 .
  • the first opposing fixed electrode 31 B includes the first opposing region s 1 and the second opposing region s 2 .
  • the first region r 1 is provided between the second annular portion 12 and the first annular portion 11 .
  • the first opposing region s 1 is provided between the second annular portion 12 and the first region r 1 .
  • the second region r 2 is provided between the second annular portion 12 and the first annular portion 11 .
  • the second opposing region s 2 is provided between the second annular portion 12 and the second region r 2 .
  • the first annular portion 11 includes a first cross position p 1 that crosses the second radial direction Dr 2 .
  • the second annular portion 12 includes a second cross position p 2 that crosses the second radial direction Dr 2 .
  • a first radial gap g 1 is provided between the first cross position p 1 and the second cross position p 2 , between the first region r 1 and the second region r 2 , and between the first opposing region s 1 and the second opposing region s 2 .
  • first region r 1 , second region r 2 , first opposing region s 1 , and second opposing region s 2 are provided in a region surrounded by the first connect portion 21 , the third connect portion 23 , the second annular portion 12 and the first annular portion 11 .
  • desired vibration in the second annular portion 12 and the first annular portion 11 can be obtained.
  • the vibration state of the second annular portion 12 and the first annular portion 11 can be accurately detected.
  • a sensor capable of improving characteristics can be provided. For example, the influence of noise included in the electrical signal applied to the fixed electrodes 30 can be suppressed.
  • the first region r 1 and the second region r 2 are on one circumferential direction Dc.
  • the first opposing region s 1 and the second opposing region s 2 are on one circumferential direction Dc.
  • the first opposing region s 1 and the first region r 1 are on one radial direction Dr.
  • the second opposing region s 2 and the second region r 2 are on one radial direction Dr.
  • These four independent electrode regions form one set.
  • a plurality of sets may be arranged along the circumferential direction Dc.
  • the first region r 1 , the second region r 2 , the first opposing region s 1 , and the second opposing region s 2 have an arc shape extending along the circumferential direction Dc.
  • the connect portion 20 is not provided between the first cross position p 1 and the second cross position p 2 .
  • the movable portion 10 M has high flexibility. Vibration can be effectively generated.
  • the plurality of connect portions 20 extend along the radial direction Dr.
  • FIG. 9 is a schematic plan view illustrating a sensor according to the first embodiment.
  • the configurations of the first fixed electrode 31 A and the first opposing fixed electrode 31 B are different from the configuration in the sensor 110 .
  • the configuration of the sensor 112 except for this may be the same as the configuration of the sensor 110 .
  • the sensor 112 also includes the base 50 s , the fixed portion 10 F, the movable portion 10 M, the first fixed electrode 31 A, and the first opposing fixed electrode 31 B.
  • the first gap G 1 is provided between the first face 50 a of the base 50 s and the movable portion 10 M (see FIGS. 3 to 6 ).
  • the fixed portion 10 F includes the first center 10 C in the first plane PL 1 parallel to the first face 50 a.
  • the movable portion 10 M includes the plurality of annular portions 10 and the plurality of connect portions 20 .
  • the plurality of annular portions 10 are provided around the fixed portion 10 F with the first center 10 C as the center.
  • the plurality of annular portions 10 include the first annular portion 11 , the second annular portion 12 , and the third annular portion 13 .
  • the second annular portion 12 is provided between the fixed portion 10 F and the first annular portion 11 .
  • the third annular portion 13 is provided between the fixed portion 10 F and the second annular portion 12 .
  • the second annular portion 12 is next to the first annular portion 11 .
  • the third annular portion 13 is next to the second annular portion 12 .
  • the plurality of connect portions 20 include the first connect portion 21 and the second connect portion 22 .
  • the first connect portion 21 and the second connect portion 22 are provided between the third annular portion 13 and the first annular portion 11 .
  • the first connect portion 21 and the second connect portion 22 connect the third annular portion 13 , the second annular portion 12 , and the first annular portion 11 .
  • the first connect portion 21 is along the first radial direction Dr 1 .
  • the first radial direction Dr 1 passes through the first center 10 C and is along the first plane PL 1 .
  • the second connect portion 22 is along the second radial direction Dr 2 .
  • the second radial direction Dr 2 passes through the first center 10 C and is along the first plane PL 1 .
  • the second radial direction Dr 2 crosses the first radial direction Dr 1 .
  • the second radial direction Dr 2 is inclined with respect to the first radial direction Dr 1 .
  • the first fixed electrode 31 A includes the first region r 1 and the second region r 2 .
  • the first opposing fixed electrode 31 B includes the first opposing region s 1 and the second opposing region s 2 .
  • the first region r 1 is provided between the second annular portion 12 and the first annular portion 11 .
  • the first opposing region s 1 is provided between the second annular portion 12 and the first region r 1 .
  • the second region r 2 is provided between the second annular portion 12 and the first annular portion 11 .
  • the second opposing region s 2 is provided between the second annular portion 12 and the second region r 2 .
  • the second connect portion 22 passes between the first region r 1 and the second region r 2 and between the first opposing region s 1 and the second opposing region s 2 .
  • the sensor 112 In the sensor 112 , three of the annular portions 10 are continuously connected by the first connect portion 21 . The three of the annular portions 10 are continuously connected by the second connect portion 22 . For example, it is easy to obtain a high intensity signal. By a high strength signal, noise is suppressed. In the sensor 112 as well, a sensor with improved characteristics can be provided.
  • the first region r 1 , the second region r 2 , the first opposing region s 1 , and the second opposing region s 2 have an arc shape extending along the circumferential direction Dc.
  • the plurality of connect portions 20 may further include the third connect portion 23 .
  • the third connect portion 23 is provided between the third annular portion 13 and the first annular portion 11 and connects the third annular portion 13 , the second annular portion 12 , and the first annular portion 11 .
  • the third connect portion 23 is along the third radial direction Dr 3 .
  • the third radial direction Dr 3 passes through the first center 10 C and extends along the first plane PL 1 .
  • the third radial direction Dr 3 crosses the first radial direction Dr 1 and the second radial direction Dr 2 .
  • the angle (first angle) between the second radial direction Dr 2 and the first radial direction Dr 1 is smaller than the angle (second angle) between the third radial direction Dr 3 and the first radial direction Dr 1 .
  • the first angle is substantially 1 ⁇ 2 of the second angle.
  • first region r 1 and the first opposing region s 1 are provided between the first connect portion 21 and the second connect portion 22 .
  • the second region r 2 and the second opposing region s 2 are provided between the second connect portion 22 and the third connect portion 23 .
  • the first region r 1 and the second region r 2 are on one circumferential direction Dc.
  • the first opposing region s 1 and the second opposing region s 2 are on one circumferential direction Dc.
  • the first opposing region s 1 and the first region r 1 are on one radial direction Dr.
  • the second opposing region s 2 and the second region r 2 are on one radial direction Dr.
  • These four independent electrode regions form one set.
  • a plurality of sets may be arranged along the circumferential direction Dc.
  • FIG. 10 is a schematic plan view illustrating a sensor according to the first embodiment.
  • FIG. 10 illustrates the fixed portion 10 F and the movable portion 10 M.
  • the movable portion 10 M includes the first structure 41 .
  • the first structure 41 is connected to the first annular portion 11 .
  • the first annular portion 11 is provided between the fixed portion 10 F and the first structure 41 .
  • the first structure 41 functions as a mass body, for example. It becomes easier to obtain stable vibrations. For example, noise can be suppressed.
  • the movable portion 10 M may include the second structure 42 .
  • the second structure 42 is provided between the fixed portion 10 F and the first annular portion 11 .
  • the second structure 42 is connected to the first annular portion 11 , for example.
  • the second structure 42 may be connected to one of the plurality of connect portions 20 .
  • the second structure 42 functions as a mass body, for example. Noise is suppressed.
  • the movable portion 10 M may further include a first radial structure 28 p .
  • the first radial structure 28 p is connected to one of the plurality of annular portions 10 .
  • the first radial structure 28 p is connected to the fourth annular portion 14 .
  • the first radial structure 28 p extends from the one of the plurality of annular portions 10 along the first radial direction Dr 1 .
  • the first radial structure 28 p is separated from another one of the plurality of annular portions 10 in the first radial direction Dr 1 .
  • the first radial structure 28 p is separated from a fifth annular portion 15 in the first radial direction Dr 1 .
  • the other one of the plurality of annular portions 10 is next to the one of the plurality of annular portions 10 among the plurality of annular portions 10 .
  • the other one of the plurality of annular portions 10 is closest to the one of the plurality of annular portions 10 among the plurality of annular portions 10 .
  • the movable portion 10 M may further include a second radial structure 28 q .
  • the second radial structure 28 q is connected to the one of the plurality of annular portions 10 .
  • the second radial structure 28 q is connected to the fifth annular portion 15 .
  • the second radial structure 28 q extends from the other one of the plurality of annular portions 10 toward the one of the plurality of annular portions 10 along the first radial direction Dr 1 .
  • the second radial structure 28 q extends from the fifth annular portion 15 toward the fourth annular portion 14 along the first radial direction Dr 1 .
  • the second radial structure 28 q is separated from the first radial structure 28 p in the first radial direction Dr 1 .
  • the overall mass distribution can be made uniform without connect portions for the plurality of annular portions 10 being adjacent. It becomes easier to obtain higher characteristics.
  • the movable portion 10 M can vibrate with an appropriate degree of freedom. Vibration with a stable state can be obtained. The signal strength based on the vibration becomes high. Highly sensitive detection becomes possible.
  • the sensor 120 may include an inner structure 48 .
  • the inner structure 48 is fixed to the first face 50 a .
  • the fixed portion 10 F is provided around the inner structure 48 . Electrical connections may be made via the inner structure 48 .
  • the inner structure 48 includes a first inner structure 48 a and a second inner structure 48 b .
  • the inner structure 48 (for example, the first inner structure 48 a and the second inner structure 48 b ) may be electrically insulated from the fixed portion 10 F and the movable portion 10 M. At least a part of the inner structure 48 (for example, the first inner structure 48 a and the second inner structure 48 b , etc.) is electrically connected to the fixed portion 10 F or the movable portion 10 M maybe connected by wiring for electrical connection.
  • the plurality of annular portions 10 include the first annular portion 11 , the second annular portion 12 , the third annular portion 13 , the fourth annular portion 14 , and the fifth annular portion 15 .
  • the number of the plurality of annular portions 10 is arbitrary.
  • a second embodiment relates to an electronic device.
  • FIG. 11 is a schematic diagram illustrating an electronic device according to a second embodiment.
  • an electronic device 310 includes the sensors according to the first to third embodiments and the circuit processor 170 .
  • the sensor 110 is drawn as the sensor.
  • the circuit processor 170 is configured to control a circuit 180 based on the signal S 1 obtained from the sensor.
  • the circuit 180 is, for example, a control circuit for a drive device 185 .
  • the circuit 180 for controlling the drive device 185 can be controlled with high accuracy.
  • the sensor system 210 includes the sensor (for example, the sensor 110 ) according to the first embodiment and a detection target member 81 .
  • the sensor 110 is fixed to the detection target member 81 .
  • the sensor 110 can detect a signal from the detection target member 81 .
  • the electronic device 310 may be at least a portion of a robot. As shown in FIG. 12 B , the electronic device 310 may be at least a portion of a machining robot provided in a manufacturing plant, etc. As shown in FIG. 12 C , the electronic device 310 may be at least a portion of an automatic guided vehicle inside a plant, etc. As shown in FIG. 12 D , the electronic device 310 may be at least a portion of a drone (an unmanned aircraft). As shown in FIG. 12 E , the electronic device 310 may be at least a portion of an airplane. As shown in FIG. 12 F , the electronic device 310 may be at least a portion of a ship. As shown in FIG. 12 A , the electronic device 310 may be at least a portion of a robot. As shown in FIG. 12 B , the electronic device 310 may be at least a portion of a machining robot provided in a manufacturing plant, etc. As shown in FIG. 12 C , the electronic device 310 may be at least a portion of an automatic
  • the electronic device 310 may be at least a portion of a submarine. As shown in FIG. 12 H , the electronic device 310 may be at least a portion of an automobile.
  • the electronic device 310 may include, for example, at least one of a robot or a moving body.
  • FIGS. 13 A and 13 B are schematic views illustrating applications of the sensor according to the embodiment.
  • a sensor 430 according to the fifth embodiment includes the sensor according to one of the first to third embodiments, and a transmission/reception part 420 .
  • the sensor 110 is illustrated as the sensor.
  • the transmission/reception part 420 is configured to transmit the signal obtained from the sensor 110 by, for example, at least one of wireless and wired methods.
  • the sensor 430 is provided on, for example, a slope surface 410 such as a road 400 .
  • the sensor 430 can monitor the state of, for example, a facility (e.g., infrastructure).
  • the sensor 430 may be, for example, a state monitoring device.
  • the sensor 430 detects a change in the state of a slope surface 410 of a road 400 with high accuracy.
  • the change in the state of the slope surface 410 includes, for example, at least one of a change in the inclination angle and a change in the vibration state.
  • the signal (inspection result) obtained from the sensor 110 is transmitted by the transmission/reception part 420 .
  • the status of a facility e.g., infrastructure
  • the sensor 430 is provided, for example, in a portion of a bridge 460 .
  • the bridge 460 is provided above the river 470 .
  • the bridge 460 includes at least one of a main girder 450 and a pier 440 .
  • the sensor 430 is provided on at least one of the main girder 450 and the pier 440 .
  • at least one of the angles of the main girder 450 and the pier 440 may change due to deterioration or the like.
  • the vibration state may change in at least one of the main girder 450 and the pier 440 .
  • the sensor 430 detects these changes with high accuracy.
  • the detection result can be transmitted to an arbitrary place by the transmission/reception part 420 . Abnormalities can be detected effectively.
  • a sensor comprising:
  • a first region length of the first region in the circumferential direction is not less than 0.1 times and not more than 10 times of the second opposing region length.
  • a sensor comprising:
  • a sensor comprising:
  • a sensor system comprising:
  • An electronic device comprising:
  • a sensor a sensor system, and an electronic device whose characteristics can be improved can be provided.
  • perpendicular and parallel refer to not only strictly perpendicular and strictly parallel but also include, for example, the fluctuation due to manufacturing processes, etc. It is sufficient to be substantially perpendicular and substantially parallel.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Pressure Sensors (AREA)
  • Gyroscopes (AREA)
US18/731,984 2023-08-29 2024-06-03 Sensor, sensor system, and electronic device Pending US20250076047A1 (en)

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US20250076089A1 (en) * 2023-08-29 2025-03-06 Kabushiki Kaisha Toshiba Sensor, sensor system, and electronic device

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AU2003259814A1 (en) * 2002-08-12 2004-02-25 The Boeing Company Isolated planar gyroscope with internal radial sensing and actuation
US7493814B2 (en) * 2006-12-22 2009-02-24 The Boeing Company Vibratory gyroscope with parasitic mode damping
JP6143430B2 (ja) * 2012-05-08 2017-06-07 三菱プレシジョン株式会社 バイアス補正機能を備えた振動型ジャイロ
US20150168146A1 (en) * 2013-12-13 2015-06-18 Sensors In Motion Planar accelerometer with internal radial sensing and actuation
CN104976995B (zh) * 2015-08-07 2018-05-25 中国人民解放军国防科学技术大学 变谐振环壁厚的嵌套环式mems振动陀螺
JP7441195B2 (ja) * 2021-04-13 2024-02-29 株式会社東芝 センサ及び電子装置

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US20250076089A1 (en) * 2023-08-29 2025-03-06 Kabushiki Kaisha Toshiba Sensor, sensor system, and electronic device

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