US20220325718A1 - Turbomolecular vacuum pump - Google Patents
Turbomolecular vacuum pump Download PDFInfo
- Publication number
- US20220325718A1 US20220325718A1 US17/642,543 US202017642543A US2022325718A1 US 20220325718 A1 US20220325718 A1 US 20220325718A1 US 202017642543 A US202017642543 A US 202017642543A US 2022325718 A1 US2022325718 A1 US 2022325718A1
- Authority
- US
- United States
- Prior art keywords
- vacuum pump
- turbomolecular vacuum
- regulation valve
- pump according
- face
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000006073 displacement reaction Methods 0.000 claims abstract description 7
- 239000002245 particle Substances 0.000 claims description 36
- 239000004065 semiconductor Substances 0.000 description 8
- 239000007789 gas Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005086 pumping Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
- F04D19/042—Turbomolecular vacuum pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D29/00—Details, component parts, or accessories
- F04D29/40—Casings; Connections of working fluid
- F04D29/52—Casings; Connections of working fluid for axial pumps
- F04D29/522—Casings; Connections of working fluid for axial pumps especially adapted for elastic fluid pumps
- F04D29/524—Casings; Connections of working fluid for axial pumps especially adapted for elastic fluid pumps shiftable members for obturating part of the flow path
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D29/00—Details, component parts, or accessories
- F04D29/70—Suction grids; Strainers; Dust separation; Cleaning
- F04D29/701—Suction grids; Strainers; Dust separation; Cleaning especially adapted for elastic fluid pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D27/00—Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids
- F04D27/02—Surge control
- F04D27/0253—Surge control by throttling
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2210/00—Working fluids
- F05D2210/10—Kind or type
- F05D2210/12—Kind or type gaseous, i.e. compressible
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2250/00—Geometry
- F05D2250/50—Inlet or outlet
- F05D2250/51—Inlet
Definitions
- the present invention relates to a turbomolecular vacuum pump, in particular for pumping an enclosure for manufacturing semiconductor components whose pressure is controlled by means of a regulation valve.
- Turbomolecular vacuum pumps are notably employed in semiconductor component fabrication processes, to maintain a high vacuum in enclosures in a very clean environment, as free of particles as possible. Indeed, the particles in suspension in the atmosphere or produced by the processes taking place in the enclosure can hamper the production of the electronic circuits on the silicon wafers. It is therefore essential to limit the particle concentration to a very low threshold in the enclosure to guarantee a good productivity. This is all the more important as the fineness of the geometries of the fabricated products continues to diminish.
- a regulation valve with variable conductance called “pendulum” valve, arranged at the suction side of the turbomolecular vacuum pump.
- the flat disc of the valve is displaced in a plane parallel to the inlet of the vacuum pump, thus more or less covering the inlet surface of the vacuum pump.
- the degree of opening of the valve makes it possible to vary the pumped flow and therefore the pressure in the enclosure.
- the movements of the valve in its casing can generate friction, notably at the seals, potentially constituting sources of particle formation.
- Some turbomolecular vacuum pumps are known to include an integrated regulation valve.
- the valve can be actuated axially towards and away from the suction orifice of the pump.
- these devices offer the advantage of discharging the pumped flow more uniformly into the enclosure, of not reducing the conductance in open position and of generating less particles.
- the friction surfaces of the integrated valve are reduced compared to the disc sliding in the casing of a pendulum valve.
- the integrated valve that can be displaced axially facing the inlet orifice forms a screen that makes it possible to reduce the return of the particles into the enclosure by bouncing on the blades of the turbomolecular vacuum pump.
- One of the aims of the present invention is to propose a turbomolecular vacuum pump that can improve the pumping of the particles in an enclosure in which the pressure is controlled by a regulation valve, notably a semiconductor component fabrication enclosure.
- the subject of the invention is a turbomolecular vacuum pump comprising a stator, a rotor configured to rotate in the stator about an axis of rotation and a regulation valve configured to modify the inlet conductance of said vacuum pump by axial displacement towards or away from a suction orifice of said vacuum pump, characterized in that the face of the regulation valve facing the suction orifice has a hollow form.
- the speed of displacement of the radial blades of the turbomolecular vacuum pump is proportional to the radial distance to the centre.
- the turbomolecular vacuum pump can have one or more features defined hereinbelow, taken alone or in combination.
- the hollow form of the face is for example conical or concave.
- only a periphery of the face is curved or inclined.
- the angle of curvature of the face of the regulation valve is for example between 2° and 20°, such as between 5° and 10°.
- the hollow face of the regulation valve can include a particle trap.
- the stator can comprise an inlet annular flange situated on the side of the suction orifice with which the regulation valve is configured to cooperate to modify the inlet conductance and which is intended to be connected to an enclosure.
- the internal wall of the inlet annular flange can have a flared form, of revolution about the axis of rotation.
- the flared form of the internal wall of the inlet annular flange is for example tapered.
- the angle of inclination of the internal wall is for example equal to the angle of curvature.
- the angle of inclination of the internal wall is for example between 2° and 20°, such as between 5° and 10°.
- the inlet annular flange can have a diameter of 150 mm or 350 mm.
- the internal wall of the inlet annular flange can include a particle trap.
- the turbomolecular vacuum pump can comprise at least one actuator situated outside the stator and configured to displace the regulation valve.
- FIG. 1 shows a schematic axial cross-sectional view of an exemplary embodiment of a turbomolecular vacuum pump.
- FIG. 2 shows a similar view of the turbomolecular vacuum pump of
- FIG. 1 for another position of the regulation valve.
- FIGS. 1 and 2 illustrate an exemplary embodiment of a turbomolecular vacuum pump 1 .
- a turbomolecular vacuum pump 1 comprises, as is known per se, a stator 2 in which a rotor 3 rotates at high speed by axial rotation, about an axis of rotation I-I, for example a rotation at more than thirty thousand revolutions per minute, such as, for example, at more than ninety thousand revolutions per minute.
- the turbomolecular vacuum pump 1 comprises a turbomolecular stage 4 and a molecular stage 5 situated downstream of the turbomolecular stage 4 in the direction of circulation of the pumped gases.
- the pumped gases flow first of all in the turbomolecular stage 4 , then in the molecular stage 5 , to be then discharged through a discharge orifice 8 of the vacuum pump 1 .
- the suction orifice 6 of the turbomolecular vacuum pump 1 through which the pumped gases enter is situated at the inlet of the turbomolecular stage 4 .
- An inlet annular flange 7 for example encircles the suction orifice 6 to connect the vacuum pump 1 to an enclosure 11 , such as a semiconductor enclosure intended to receive the silicon wafers on which electronic circuits are fabricated.
- a substrate-holder 18 of a semiconductor enclosure 11 is schematically represented in FIG. 1 .
- the rotor 3 here comprises, on the one hand, one or more stages of radial blades 9 a which rotate facing fixed radial blades 9 b of the stator 2 in the turbomolecular stage 4 and, on the other hand, a Holweck skirt 10 which rotates facing helical grooves of the stator 2 in the molecular stage 5 .
- the radial blades 9 a, 9 b of the rotor 3 and of the stator 2 are inclined to guide the pumped gas molecules to the molecular stage 5 .
- the Holweck skirt 10 is formed by a smooth cylinder.
- the helical grooves of the stator 2 make it possible to compress and guide the pumped gases to the discharge orifice 8 .
- the rotor 3 is driven in rotation in the stator 2 by an internal motor 12 , for example arranged under the Holweck skirt 10 .
- a purge gas can be injected into the vacuum pump 1 to purge and cool the discharge and/or the internal motor 12 .
- the rotor 3 is guided laterally and axially by magnetic or mechanical bearings.
- the rotor 3 is produced in a single piece (one-piece), for example in aluminium material.
- the stator 2 is for example made of aluminium material.
- the turbomolecular vacuum pump 1 further comprises a regulation valve 13 configured to modify the inlet conductance of the vacuum pump 1 by axial displacement, that is to say displacement parallel to the axis of rotation I-I of the rotor 3 , towards or away from the suction orifice 6 of the vacuum pump 1 .
- the regulation valve 13 has a disc form that can close the suction orifice 6 of the vacuum pump 1 .
- the regulation valve 13 is for example configured to cooperate with the inlet annular flange 7 to modify the inlet conductance.
- An example of another positioning of the regulation valve 13 is schematically represented by dotted lines in FIG. 2 .
- This configuration of the regulation valve 13 notably makes it possible to bring the suction orifice 6 as close as possible to the internal volume of the enclosure 11 . Furthermore, the regulation valve 13 that can be displaced axially facing the inlet orifice 6 forms a screen that makes it possible to reduce the return of the particles into the enclosure 11 through bounce on the blades of the vacuum pump 1 .
- the vacuum pump 1 further comprises at least one actuator 14 configured to displace the regulation valve 13 .
- the at least one actuator 14 is for example situated outside the stator 2 .
- actuators 14 evenly distributed around the inlet annular flange 7 , such as two or four pairwise diametrically opposite actuators 14 .
- the regulation valve 13 is also easy to dismantle for maintenance.
- the face 15 of the regulation valve 13 situated facing the suction orifice 6 has a hollow form.
- the hollow form of the face 15 is for example concave, that is to say curved over the entire face 15 with the apex of the hollow coinciding with the axis of rotation I-I.
- the hollow form of the face 15 is conical.
- only a periphery of the face 15 is curved or inclined, such as tapered, to form a face 15 having a hollow form, the centre of the face 15 being for example flat.
- the speed of displacement of the radial blades 9 a of the turbomolecular vacuum pump 1 is proportional to the radial distance to the centre.
- the angle of curvature ⁇ of the face 15 of the regulation valve 13 is for example between 2° and 20°, such as between 5° and 10° ( FIG. 1 ). This value of the angle of curvature ⁇ makes it possible to guide the particles 16 striking the face 15 of the regulation valve 13 towards the suction orifice 6 of the vacuum pump 1 in a typical semiconductor enclosure 11 geometry.
- an internal wall 17 of the inlet annular flange 7 has a flared form, of revolution about the axis of rotation I-I, such as tapered.
- the funnel-form internal wall 17 guides the particles 16 which hit it towards the face 15 of the regulation valve 13 , which itself guides the bounce of the particles towards the suction orifice 6 of the turbomolecular vacuum pump 1 .
- the angle of inclination ⁇ of the tapered internal wall 17 is advantageously equal to the angle of curvature ⁇ . It is for example between 2° and 20°, such as between 5° and 10°. These values of the angle of inclination ⁇ make it possible to guide the particles 16 striking the internal wall 17 towards the face 15 of the regulation valve 13 in a typical semiconductor enclosure 11 geometry.
- the turbomolecular vacuum pump 1 thus has substantially the same diameter as that of a semiconductor enclosure 11 intended to receive the silicon wafers on which electronic circuits are fabricated. That makes it possible to limit the pumping capacity losses through the connections between the enclosure and the vacuum pump and to make the pumping uniform in the enclosure 11 .
- the hollow face 15 of the regulation valve 13 includes a particle trap 19 .
- the particles can thus be adsorbed by the particle trap 19 or the contact with the particle trap 19 can make it possible to significantly reduce their kinetic energy.
- the particle trap 19 comprises, for example, an adhesive coating at least partially covering a body of the regulation valve 13 for example made of metallic material, such as of aluminium.
- the hollow form is then defined by the body of the regulation valve 13 , the adhesive coating following the form of the body.
- the particle trap 19 comprises a porous ceramic.
- the hollow form is defined by the porous ceramic and/or the body of the regulation valve 13 .
- the particle trap 19 comprises, for example, an adhesive coating at least partially covering a body of the inlet annular flange 7 .
- the flared form of the internal wall 17 is then defined by the body of the inlet annular flange 7 , the adhesive coating following the form of the body.
- the particle trap 19 comprises a porous ceramic.
- the flared form is defined by the porous ceramic and/or the body of the internal wall 17 .
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Non-Positive Displacement Air Blowers (AREA)
- Structures Of Non-Positive Displacement Pumps (AREA)
Abstract
A turbomolecular vacuum pump is provided, including: a stator; a rotor configured to rotate in the stator about an axis of rotation; and a regulation valve configured to modify an inlet conductance of the turbomolecular vacuum pump by axial displacement towards or away from a suction orifice of the turbomolecular vacuum pump, a face of the regulation valve facing the suction orifice having a hollow form.
Description
- The present invention relates to a turbomolecular vacuum pump, in particular for pumping an enclosure for manufacturing semiconductor components whose pressure is controlled by means of a regulation valve.
- The generation of a high vacuum in an enclosure requires the use of vacuum pumps of turbomolecular type, composed of a stator in which a rotor is driven in rapid rotation, for example a rotation at more than ninety thousand revolutions per minute.
- Turbomolecular vacuum pumps are notably employed in semiconductor component fabrication processes, to maintain a high vacuum in enclosures in a very clean environment, as free of particles as possible. Indeed, the particles in suspension in the atmosphere or produced by the processes taking place in the enclosure can hamper the production of the electronic circuits on the silicon wafers. It is therefore essential to limit the particle concentration to a very low threshold in the enclosure to guarantee a good productivity. This is all the more important as the fineness of the geometries of the fabricated products continues to diminish.
- To control the pressure inside these enclosures, use is generally made of a regulation valve with variable conductance called “pendulum” valve, arranged at the suction side of the turbomolecular vacuum pump. The flat disc of the valve is displaced in a plane parallel to the inlet of the vacuum pump, thus more or less covering the inlet surface of the vacuum pump. The degree of opening of the valve makes it possible to vary the pumped flow and therefore the pressure in the enclosure. However, the movements of the valve in its casing can generate friction, notably at the seals, potentially constituting sources of particle formation.
- These particles generated by the valve or by the process taking place in the enclosure can be struck by the blades of the turbomolecular vacuum pump rotating at high speed instead of being sucked and driven to the discharge. The particles can then bounce back on the blades and return into the enclosure where they can contaminate the silicon wafers on which the electronic circuits are produced.
- Some turbomolecular vacuum pumps are known to include an integrated regulation valve. In these devices, the valve can be actuated axially towards and away from the suction orifice of the pump. Compared to the pendulum valves, these devices offer the advantage of discharging the pumped flow more uniformly into the enclosure, of not reducing the conductance in open position and of generating less particles. Indeed, the friction surfaces of the integrated valve are reduced compared to the disc sliding in the casing of a pendulum valve. Furthermore, the integrated valve that can be displaced axially facing the inlet orifice forms a screen that makes it possible to reduce the return of the particles into the enclosure by bouncing on the blades of the turbomolecular vacuum pump.
- One of the aims of the present invention is to propose a turbomolecular vacuum pump that can improve the pumping of the particles in an enclosure in which the pressure is controlled by a regulation valve, notably a semiconductor component fabrication enclosure.
- To this end, the subject of the invention is a turbomolecular vacuum pump comprising a stator, a rotor configured to rotate in the stator about an axis of rotation and a regulation valve configured to modify the inlet conductance of said vacuum pump by axial displacement towards or away from a suction orifice of said vacuum pump, characterized in that the face of the regulation valve facing the suction orifice has a hollow form.
- With a face of the regulation valve situated facing the suction orifice having a hollow form, the particles struck by the radial blades of the vacuum pump that bounce on the regulation valve are mostly redirected towards the centre of the suction orifice. That reduces the probability of the particles returning into the enclosure.
- Furthermore, the speed of displacement of the radial blades of the turbomolecular vacuum pump is proportional to the radial distance to the centre. By guiding the particles which bounce towards the axis of rotation, the kinetic energy of the particles is reduced, which reduces the probability of the multiple bounces.
- The turbomolecular vacuum pump can have one or more features defined hereinbelow, taken alone or in combination.
- The hollow form of the face is for example conical or concave.
- According to an exemplary embodiment, only a periphery of the face is curved or inclined.
- The angle of curvature of the face of the regulation valve is for example between 2° and 20°, such as between 5° and 10°.
- The hollow face of the regulation valve can include a particle trap.
- The stator can comprise an inlet annular flange situated on the side of the suction orifice with which the regulation valve is configured to cooperate to modify the inlet conductance and which is intended to be connected to an enclosure.
- The internal wall of the inlet annular flange can have a flared form, of revolution about the axis of rotation.
- The flared form of the internal wall of the inlet annular flange is for example tapered.
- The angle of inclination of the internal wall is for example equal to the angle of curvature.
- The angle of inclination of the internal wall is for example between 2° and 20°, such as between 5° and 10°.
- The inlet annular flange can have a diameter of 150 mm or 350 mm.
- The internal wall of the inlet annular flange can include a particle trap.
- The turbomolecular vacuum pump can comprise at least one actuator situated outside the stator and configured to displace the regulation valve.
- Other features and advantages of the invention will emerge from the following description, given by way of example, which is in no way limiting, in light of the attached drawings in which:
-
FIG. 1 shows a schematic axial cross-sectional view of an exemplary embodiment of a turbomolecular vacuum pump. -
FIG. 2 shows a similar view of the turbomolecular vacuum pump of -
FIG. 1 for another position of the regulation valve. - In these figures, the elements that are identical bear the same reference numbers.
- The following embodiments are examples. Although the description refers to one or more embodiments, that does not necessarily mean that each reference relates to the same embodiment, or that the features apply only to a single embodiment. Simple features of different embodiments can also be combined or swapped to provide other embodiments.
-
FIGS. 1 and 2 illustrate an exemplary embodiment of aturbomolecular vacuum pump 1. - A
turbomolecular vacuum pump 1 comprises, as is known per se, astator 2 in which arotor 3 rotates at high speed by axial rotation, about an axis of rotation I-I, for example a rotation at more than thirty thousand revolutions per minute, such as, for example, at more than ninety thousand revolutions per minute. - The
turbomolecular vacuum pump 1 comprises aturbomolecular stage 4 and amolecular stage 5 situated downstream of theturbomolecular stage 4 in the direction of circulation of the pumped gases. The pumped gases flow first of all in theturbomolecular stage 4, then in themolecular stage 5, to be then discharged through adischarge orifice 8 of thevacuum pump 1. - The
suction orifice 6 of theturbomolecular vacuum pump 1 through which the pumped gases enter is situated at the inlet of theturbomolecular stage 4. An inletannular flange 7 for example encircles thesuction orifice 6 to connect thevacuum pump 1 to anenclosure 11, such as a semiconductor enclosure intended to receive the silicon wafers on which electronic circuits are fabricated. A substrate-holder 18 of asemiconductor enclosure 11 is schematically represented inFIG. 1 . - The
rotor 3 here comprises, on the one hand, one or more stages ofradial blades 9 a which rotate facing fixedradial blades 9 b of thestator 2 in theturbomolecular stage 4 and, on the other hand, a Holweckskirt 10 which rotates facing helical grooves of thestator 2 in themolecular stage 5. - The
radial blades rotor 3 and of thestator 2 are inclined to guide the pumped gas molecules to themolecular stage 5. - The Holweck
skirt 10 is formed by a smooth cylinder. The helical grooves of thestator 2 make it possible to compress and guide the pumped gases to thedischarge orifice 8. - The
rotor 3 is driven in rotation in thestator 2 by aninternal motor 12, for example arranged under the Holweckskirt 10. A purge gas can be injected into thevacuum pump 1 to purge and cool the discharge and/or theinternal motor 12. Therotor 3 is guided laterally and axially by magnetic or mechanical bearings. - The
rotor 3 is produced in a single piece (one-piece), for example in aluminium material. Thestator 2 is for example made of aluminium material. - The
turbomolecular vacuum pump 1 further comprises aregulation valve 13 configured to modify the inlet conductance of thevacuum pump 1 by axial displacement, that is to say displacement parallel to the axis of rotation I-I of therotor 3, towards or away from thesuction orifice 6 of thevacuum pump 1. - The
regulation valve 13 has a disc form that can close thesuction orifice 6 of thevacuum pump 1. Theregulation valve 13 is for example configured to cooperate with the inletannular flange 7 to modify the inlet conductance. An example of another positioning of theregulation valve 13 is schematically represented by dotted lines inFIG. 2 . - This configuration of the
regulation valve 13 notably makes it possible to bring thesuction orifice 6 as close as possible to the internal volume of theenclosure 11. Furthermore, theregulation valve 13 that can be displaced axially facing theinlet orifice 6 forms a screen that makes it possible to reduce the return of the particles into theenclosure 11 through bounce on the blades of thevacuum pump 1. - According to an exemplary embodiment, the
vacuum pump 1 further comprises at least oneactuator 14 configured to displace theregulation valve 13. The at least oneactuator 14 is for example situated outside thestator 2. - There are for example
several actuators 14 evenly distributed around the inletannular flange 7, such as two or four pairwise diametricallyopposite actuators 14. - The
actuators 14 situated outside thestator 2 and theregulation valve 13 that can be displaced axially notably make it possible to limit the phenomena of friction that can be the source of the formation of particles. Theregulation valve 13 is also easy to dismantle for maintenance. - The
face 15 of theregulation valve 13 situated facing thesuction orifice 6 has a hollow form. - The hollow form of the
face 15 is for example concave, that is to say curved over theentire face 15 with the apex of the hollow coinciding with the axis of rotation I-I. - According to another example, the hollow form of the
face 15 is conical. - According to another example, only a periphery of the
face 15 is curved or inclined, such as tapered, to form aface 15 having a hollow form, the centre of theface 15 being for example flat. - With a
face 15 of theregulation valve 13 situated facing thesuction orifice 6 having a hollow form, theparticles 16 struck by theradial blades 9 a of thevacuum pump 1 bouncing on theregulation valve 13 are mostly redirected towards the centre of thesuction orifice 6. This reduces the probability of theparticles 16 returning into theenclosure 11. - Furthermore, the speed of displacement of the
radial blades 9 a of theturbomolecular vacuum pump 1 is proportional to the radial distance to the centre. By guiding theparticles 16 which bounce towards the axis of rotation I-I, the kinetic energy of theparticles 16 is reduced, which reduces the probability of multiple bounces. - The angle of curvature α of the
face 15 of theregulation valve 13, formed between a plane tangential to the apex of the hollow and a straight line passing through this apex and an edge of theface 15, is for example between 2° and 20°, such as between 5° and 10° (FIG. 1 ). This value of the angle of curvature α makes it possible to guide theparticles 16 striking theface 15 of theregulation valve 13 towards thesuction orifice 6 of thevacuum pump 1 in atypical semiconductor enclosure 11 geometry. - According to an exemplary embodiment, an
internal wall 17 of the inletannular flange 7 has a flared form, of revolution about the axis of rotation I-I, such as tapered. The funnel-forminternal wall 17 guides theparticles 16 which hit it towards theface 15 of theregulation valve 13, which itself guides the bounce of the particles towards thesuction orifice 6 of theturbomolecular vacuum pump 1. - The angle of inclination γ of the tapered
internal wall 17 is advantageously equal to the angle of curvature α. It is for example between 2° and 20°, such as between 5° and 10°. These values of the angle of inclination γ make it possible to guide theparticles 16 striking theinternal wall 17 towards theface 15 of theregulation valve 13 in atypical semiconductor enclosure 11 geometry. - Provision is for example also made for the diameter D of the inlet
annular flange 7 to be 150 mm or 350 mm. Theturbomolecular vacuum pump 1 thus has substantially the same diameter as that of asemiconductor enclosure 11 intended to receive the silicon wafers on which electronic circuits are fabricated. That makes it possible to limit the pumping capacity losses through the connections between the enclosure and the vacuum pump and to make the pumping uniform in theenclosure 11. - According to an exemplary embodiment, the
hollow face 15 of theregulation valve 13 includes aparticle trap 19. The particles can thus be adsorbed by theparticle trap 19 or the contact with theparticle trap 19 can make it possible to significantly reduce their kinetic energy. - The
particle trap 19 comprises, for example, an adhesive coating at least partially covering a body of theregulation valve 13 for example made of metallic material, such as of aluminium. The hollow form is then defined by the body of theregulation valve 13, the adhesive coating following the form of the body. - According to another example, the
particle trap 19 comprises a porous ceramic. In this case, the hollow form is defined by the porous ceramic and/or the body of theregulation valve 13. - Provision can be made for the
internal wall 17 of the inletannular flange 7 to include aparticle trap 19. - As previously, the
particle trap 19 comprises, for example, an adhesive coating at least partially covering a body of the inletannular flange 7. The flared form of theinternal wall 17 is then defined by the body of the inletannular flange 7, the adhesive coating following the form of the body. - According to another example, the
particle trap 19 comprises a porous ceramic. In this case, the flared form is defined by the porous ceramic and/or the body of theinternal wall 17.
Claims (17)
1.-14. (canceled)
15. A turbomolecular vacuum pump, comprising:
a stator;
a rotor configured to rotate in the stator about an axis of rotation; and
a regulation valve configured to modify an inlet conductance of the turbomolecular vacuum pump by axial displacement towards or away from a suction orifice of the turbomolecular vacuum pump,
wherein a face of the regulation valve facing the suction orifice has a hollow form.
16. The turbomolecular vacuum pump according to claim 15 , wherein the hollow form of the face of the regulation valve is conical.
17. The turbomolecular vacuum pump according to claim 15 , wherein the hollow form of the face of the regulation valve is concave.
18. The turbomolecular vacuum pump according to claim 15 , wherein only a periphery of the face of the regulation valve is curved or inclined.
19. The turbomolecular vacuum pump according to claim 15 , wherein an angle of curvature of the face of the regulation valve is between 2° and 20°.
20. The turbomolecular vacuum pump according to claim 15 , wherein an angle of curvature of the face of the regulation valve is between 5° and 10°.
21. The turbomolecular vacuum pump according to claim 15 , wherein the hollow face of the regulation valve includes a particle trap.
22. The turbomolecular vacuum pump according to claim 15 , wherein the stator includes an inlet annular flange disposed on a side of the suction orifice with which the regulation valve is configured to cooperate to modify the inlet conductance and which is configured to be connected to an enclosure.
23. The turbomolecular vacuum pump according to claim 22 , wherein an internal wall of the inlet annular flange has a flared form, of revolution about the axis of rotation.
24. The turbomolecular vacuum pump according to claim 23 , wherein the flared form of the internal wall of the inlet annular flange is tapered.
25. The turbomolecular vacuum pump according to claim 23 , wherein an angle of inclination of the internal wall is equal to an angle of curvature of the face of the regulation valve.
26. The turbomolecular vacuum pump according to claim 23 , wherein an angle of inclination of the internal wall is between 2° and 20°.
27. The turbomolecular vacuum pump according to claim 23 , wherein an angle of inclination of the internal wall is between 5° and 10°.
28. The turbomolecular vacuum pump according to claim 23 , wherein the inlet annular flange has a diameter of 150 mm or 350 mm.
29. The turbomolecular vacuum pump according to claim 23 , wherein the internal wall of the inlet annular flange includes a particle trap.
30. The turbomolecular vacuum pump according to claim 15 , further comprising at least one actuator disposed outside the stator and configured to displace the regulation valve.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1910941A FR3101683B1 (en) | 2019-10-03 | 2019-10-03 | Turbomolecular vacuum pump |
FR1910941 | 2019-10-03 | ||
PCT/EP2020/076796 WO2021063805A1 (en) | 2019-10-03 | 2020-09-24 | Turbomolecular vacuum pump |
Publications (1)
Publication Number | Publication Date |
---|---|
US20220325718A1 true US20220325718A1 (en) | 2022-10-13 |
Family
ID=69024401
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US17/642,543 Abandoned US20220325718A1 (en) | 2019-10-03 | 2020-09-24 | Turbomolecular vacuum pump |
Country Status (7)
Country | Link |
---|---|
US (1) | US20220325718A1 (en) |
JP (1) | JP2022552791A (en) |
KR (1) | KR20220066901A (en) |
CN (1) | CN114286895A (en) |
FR (1) | FR3101683B1 (en) |
TW (1) | TW202130914A (en) |
WO (1) | WO2021063805A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7419976B2 (en) * | 2020-06-03 | 2024-01-23 | 株式会社島津製作所 | Vacuum valves, turbomolecular pumps and vacuum vessels |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6062810A (en) * | 1997-08-15 | 2000-05-16 | Ebara Corporation | Turbomolecular pump |
JP2006307823A (en) * | 2005-03-31 | 2006-11-09 | Shimadzu Corp | Turbo-molecular pump |
JP2009212177A (en) * | 2008-03-03 | 2009-09-17 | Hitachi High-Technologies Corp | Vacuum processing device |
US7837432B2 (en) * | 2005-03-02 | 2010-11-23 | Tokyo Electron Limited | Exhaust system and exhausting pump connected to a processing chamber of a substrate processing apparatus |
JP2021188724A (en) * | 2020-06-03 | 2021-12-13 | 株式会社島津製作所 | Vacuum valve, turbo molecular pump, and vacuum container |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3604228B2 (en) * | 1996-02-02 | 2004-12-22 | アネルバ株式会社 | Vacuum exhaust device |
US6217278B1 (en) * | 1997-07-25 | 2001-04-17 | Ebara Corporation | Turbomolecular pump |
JP2003269370A (en) * | 2002-03-12 | 2003-09-25 | Boc Edwards Technologies Ltd | Pump device |
JP5250201B2 (en) * | 2006-12-07 | 2013-07-31 | エドワーズ株式会社 | Vacuum pump |
JP4891178B2 (en) * | 2007-08-13 | 2012-03-07 | ルネサスエレクトロニクス株式会社 | Vacuum equipment |
JP5161694B2 (en) * | 2008-08-05 | 2013-03-13 | 株式会社日立ハイテクノロジーズ | Vacuum processing equipment |
JP5865596B2 (en) * | 2011-03-25 | 2016-02-17 | 東京エレクトロン株式会社 | Particle capturing unit, method for manufacturing the particle capturing unit, and substrate processing apparatus |
JP2013167207A (en) * | 2012-02-15 | 2013-08-29 | Ebara Corp | Turbo-molecular pump |
JP5944883B2 (en) * | 2013-12-18 | 2016-07-05 | 東京エレクトロン株式会社 | Particle backflow prevention member and substrate processing apparatus |
CN105526180A (en) * | 2016-01-29 | 2016-04-27 | 天津飞旋科技研发有限公司 | Magnetic levitation compound molecular pump |
-
2019
- 2019-10-03 FR FR1910941A patent/FR3101683B1/en active Active
-
2020
- 2020-09-15 TW TW109131696A patent/TW202130914A/en unknown
- 2020-09-24 US US17/642,543 patent/US20220325718A1/en not_active Abandoned
- 2020-09-24 WO PCT/EP2020/076796 patent/WO2021063805A1/en active Application Filing
- 2020-09-24 CN CN202080059612.1A patent/CN114286895A/en active Pending
- 2020-09-24 JP JP2022520168A patent/JP2022552791A/en active Pending
- 2020-09-24 KR KR1020227010652A patent/KR20220066901A/en unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6062810A (en) * | 1997-08-15 | 2000-05-16 | Ebara Corporation | Turbomolecular pump |
US7837432B2 (en) * | 2005-03-02 | 2010-11-23 | Tokyo Electron Limited | Exhaust system and exhausting pump connected to a processing chamber of a substrate processing apparatus |
JP2006307823A (en) * | 2005-03-31 | 2006-11-09 | Shimadzu Corp | Turbo-molecular pump |
JP2009212177A (en) * | 2008-03-03 | 2009-09-17 | Hitachi High-Technologies Corp | Vacuum processing device |
JP2021188724A (en) * | 2020-06-03 | 2021-12-13 | 株式会社島津製作所 | Vacuum valve, turbo molecular pump, and vacuum container |
Non-Patent Citations (3)
Title |
---|
machine translation of JP 2006307823 to Sekida et al, published November 9, 2006 (Year: 2006) * |
machine translation of JP 2009212177 to Takahashi et al, published September 17, 2009 (Year: 2009) * |
machine translation of JP 2021188724 to Ozaki, published December 13, 2021 (Year: 2021) * |
Also Published As
Publication number | Publication date |
---|---|
TW202130914A (en) | 2021-08-16 |
FR3101683B1 (en) | 2021-10-01 |
FR3101683A1 (en) | 2021-04-09 |
JP2022552791A (en) | 2022-12-20 |
WO2021063805A1 (en) | 2021-04-08 |
KR20220066901A (en) | 2022-05-24 |
CN114286895A (en) | 2022-04-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6779969B2 (en) | Vacuum pump | |
JP6174599B2 (en) | Vacuum pump adapter and associated pumping device | |
WO2011024261A1 (en) | Turbo-molecular pump and method of manufacturing rotor | |
JP6664269B2 (en) | Heating device and turbo molecular pump | |
US20220325718A1 (en) | Turbomolecular vacuum pump | |
TW201807317A (en) | Vacuum pump | |
CN108291552B (en) | Vacuum pump, rotary vane mounted on vacuum pump, and reflection mechanism | |
KR20160102160A (en) | Vacuum exhaust mechanism, compound vacuum pump, and rotating body component | |
JP2006307823A (en) | Turbo-molecular pump | |
JPS60116895A (en) | Vacuum pump | |
US8221052B2 (en) | Turbo-molecular pump | |
JP6390098B2 (en) | Vacuum pump | |
JP2018035718A (en) | Vacuum pump and rotary cylindrical body installed at the vacuum pump | |
US20230042886A1 (en) | Vacuum pump, vacuum pump set for evacuating a semiconductor processing chamber and method of evacuating a semiconductor processing chamber | |
CN110821852B (en) | Turbo-molecular pump for mass spectrometer | |
JPS6355396A (en) | Turbo vacuum pump | |
TWI730470B (en) | Turbo molecular pump and dustproof rotor element thereof | |
JP2020122487A (en) | Vacuum pump | |
JP7247824B2 (en) | Exhaust system and vacuum pump | |
JP2007211696A (en) | Turbo-molecular pump | |
US11781553B2 (en) | Vacuum pump with elastic spacer | |
JPH05141389A (en) | Vacuum pump | |
JPH07293492A (en) | Vacuum pump | |
WO2017104541A1 (en) | Vacuum pump, and rotating blade and reflection mechanism mounted on vacuum pump | |
JP2004116354A (en) | Turbo molecular pump |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: PFEIFFER VACUUM, FRANCE Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:KAMBARA, HISANORI;VARENNES, NICOLAS;RICHIER, GILLES;SIGNING DATES FROM 20220223 TO 20220301;REEL/FRAME:059243/0752 |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: DOCKETED NEW CASE - READY FOR EXAMINATION |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |