US20220135533A1 - Process for synthesizing 2-hydroxy-6-((2-(1-isopropyl-1h-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde - Google Patents
Process for synthesizing 2-hydroxy-6-((2-(1-isopropyl-1h-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde Download PDFInfo
- Publication number
- US20220135533A1 US20220135533A1 US17/571,762 US202217571762A US2022135533A1 US 20220135533 A1 US20220135533 A1 US 20220135533A1 US 202217571762 A US202217571762 A US 202217571762A US 2022135533 A1 US2022135533 A1 US 2022135533A1
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- United States
- Prior art keywords
- compound
- methyl
- chloro
- pyrrolidinone
- nai
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims abstract description 83
- 230000002194 synthesizing effect Effects 0.000 title claims abstract description 17
- FWCVZAQENIZVMY-UHFFFAOYSA-N 2-hydroxy-6-[[2-(2-propan-2-ylpyrazol-3-yl)pyridin-3-yl]methoxy]benzaldehyde Chemical compound CC(C)N1N=CC=C1C1=NC=CC=C1COC1=CC=CC(O)=C1C=O FWCVZAQENIZVMY-UHFFFAOYSA-N 0.000 title abstract description 18
- 150000001875 compounds Chemical class 0.000 claims abstract description 158
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 70
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 claims description 68
- 238000000634 powder X-ray diffraction Methods 0.000 claims description 62
- 125000000217 alkyl group Chemical group 0.000 claims description 54
- 239000011541 reaction mixture Substances 0.000 claims description 34
- 229910000030 sodium bicarbonate Inorganic materials 0.000 claims description 34
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 claims description 33
- 235000017557 sodium bicarbonate Nutrition 0.000 claims description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 31
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 30
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 29
- 238000005804 alkylation reaction Methods 0.000 claims description 27
- 230000005855 radiation Effects 0.000 claims description 27
- 230000003197 catalytic effect Effects 0.000 claims description 25
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 24
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 claims description 24
- 239000002253 acid Substances 0.000 claims description 22
- 125000004187 tetrahydropyran-2-yl group Chemical group [H]C1([H])OC([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 claims description 17
- 239000001257 hydrogen Substances 0.000 claims description 16
- 229910052739 hydrogen Inorganic materials 0.000 claims description 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 16
- BUDQDWGNQVEFAC-UHFFFAOYSA-N Dihydropyran Chemical group C1COC=CC1 BUDQDWGNQVEFAC-UHFFFAOYSA-N 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- 238000011065 in-situ storage Methods 0.000 claims description 6
- DLEDOFVPSDKWEF-UHFFFAOYSA-N lithium butane Chemical group [Li+].CCC[CH2-] DLEDOFVPSDKWEF-UHFFFAOYSA-N 0.000 claims description 6
- MZRVEZGGRBJDDB-UHFFFAOYSA-N n-Butyllithium Substances [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 claims description 6
- ZDYVRSLAEXCVBX-UHFFFAOYSA-N pyridinium p-toluenesulfonate Chemical compound C1=CC=[NH+]C=C1.CC1=CC=C(S([O-])(=O)=O)C=C1 ZDYVRSLAEXCVBX-UHFFFAOYSA-N 0.000 claims description 6
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims description 4
- 230000029936 alkylation Effects 0.000 claims description 3
- 150000007522 mineralic acids Chemical class 0.000 claims description 3
- 239000000543 intermediate Substances 0.000 abstract description 8
- 102000001554 Hemoglobins Human genes 0.000 abstract 1
- 108010054147 Hemoglobins Proteins 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 201000010099 disease Diseases 0.000 abstract 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 208000007056 sickle cell anemia Diseases 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 37
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 22
- -1 1 Chemical class 0.000 description 21
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 18
- 0 *Oc1cccc(O*)c1C=O Chemical compound *Oc1cccc(O*)c1C=O 0.000 description 17
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 17
- 230000015572 biosynthetic process Effects 0.000 description 17
- 238000003786 synthesis reaction Methods 0.000 description 17
- 239000000047 product Substances 0.000 description 11
- 239000007787 solid Substances 0.000 description 10
- DGXAGETVRDOQFP-UHFFFAOYSA-N 2,6-dihydroxybenzaldehyde Chemical compound OC1=CC=CC(O)=C1C=O DGXAGETVRDOQFP-UHFFFAOYSA-N 0.000 description 9
- 238000010511 deprotection reaction Methods 0.000 description 9
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 239000012074 organic phase Substances 0.000 description 7
- 239000002002 slurry Substances 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- 238000002425 crystallisation Methods 0.000 description 6
- 230000008025 crystallization Effects 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- CZNAXKQIUMAWPD-UHFFFAOYSA-N 3-(chloromethyl)-2-(2-propan-2-ylpyrazol-3-yl)pyridine dihydrochloride Chemical compound Cl.Cl.CC(C)n1nccc1-c1ncccc1CCl CZNAXKQIUMAWPD-UHFFFAOYSA-N 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000011780 sodium chloride Substances 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- MEKOFIRRDATTAG-UHFFFAOYSA-N 2,2,5,8-tetramethyl-3,4-dihydrochromen-6-ol Chemical compound C1CC(C)(C)OC2=C1C(C)=C(O)C=C2C MEKOFIRRDATTAG-UHFFFAOYSA-N 0.000 description 3
- AWBFONKUPONBFE-UHFFFAOYSA-N 2,6-bis(1-ethoxyethoxy)benzaldehyde Chemical compound C(C)OC(C)OC1=C(C=O)C(=CC=C1)OC(C)OCC AWBFONKUPONBFE-UHFFFAOYSA-N 0.000 description 3
- BPGAMNWTEOXDIN-UHFFFAOYSA-N CCc1cccnc1-c1ccnn1C(C)C Chemical compound CCc1cccnc1-c1ccnn1C(C)C BPGAMNWTEOXDIN-UHFFFAOYSA-N 0.000 description 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 150000007529 inorganic bases Chemical class 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 235000009518 sodium iodide Nutrition 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- FXKDDCBFUOGTQM-UHFFFAOYSA-N [2-(2-propan-2-ylpyrazol-3-yl)pyridin-3-yl]methanol Chemical compound CC(C)N1N=CC=C1C1=NC=CC=C1CO FXKDDCBFUOGTQM-UHFFFAOYSA-N 0.000 description 2
- 239000008346 aqueous phase Substances 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 235000019439 ethyl acetate Nutrition 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- LCEDQNDDFOCWGG-UHFFFAOYSA-N morpholine-4-carbaldehyde Chemical compound O=CN1CCOCC1 LCEDQNDDFOCWGG-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000012453 solvate Substances 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical group [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- HMPDWSBKPCOQDW-UHFFFAOYSA-N (2-chloropyridin-3-yl)methanol Chemical compound OCC1=CC=CN=C1Cl HMPDWSBKPCOQDW-UHFFFAOYSA-N 0.000 description 1
- ZKZJXVGTTZXHGX-UHFFFAOYSA-N 1-propan-2-yl-5-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)pyrazole Chemical compound CC(C)N1N=CC=C1B1OC(C)(C)C(C)(C)O1 ZKZJXVGTTZXHGX-UHFFFAOYSA-N 0.000 description 1
- QPYWTEPJJSGXST-UHFFFAOYSA-N 2-chloro-4-methylbenzenesulfonyl bromide Chemical compound ClC1=C(S(=O)(=O)Br)C=CC(=C1)C QPYWTEPJJSGXST-UHFFFAOYSA-N 0.000 description 1
- ATEDQANYWGMZND-UHFFFAOYSA-N CC(C)n1nccc1-c1ncccc1CCl Chemical compound CC(C)n1nccc1-c1ncccc1CCl ATEDQANYWGMZND-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PRMLMDSFLIHHSO-UHFFFAOYSA-N Cc1ncccc1CO Chemical compound Cc1ncccc1CO PRMLMDSFLIHHSO-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- HMHZTYYTZHCTOW-UHFFFAOYSA-N [2-(2-propan-2-ylpyrazol-3-yl)pyridin-3-yl]methanol hydrochloride Chemical compound Cl.CC(C)n1nccc1-c1ncccc1CO HMHZTYYTZHCTOW-UHFFFAOYSA-N 0.000 description 1
- 125000003172 aldehyde group Chemical group 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 238000010936 aqueous wash Methods 0.000 description 1
- 238000010533 azeotropic distillation Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 1
- 229910000024 caesium carbonate Inorganic materials 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- USVZFSNDGFNNJT-UHFFFAOYSA-N cyclopenta-1,4-dien-1-yl(diphenyl)phosphane (2,3-dichlorocyclopenta-1,4-dien-1-yl)-diphenylphosphane iron(2+) Chemical group [Fe++].c1cc[c-](c1)P(c1ccccc1)c1ccccc1.Clc1c(cc[c-]1Cl)P(c1ccccc1)c1ccccc1 USVZFSNDGFNNJT-UHFFFAOYSA-N 0.000 description 1
- NXQGGXCHGDYOHB-UHFFFAOYSA-L cyclopenta-1,4-dien-1-yl(diphenyl)phosphane;dichloropalladium;iron(2+) Chemical compound [Fe+2].Cl[Pd]Cl.[CH-]1C=CC(P(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1.[CH-]1C=CC(P(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 NXQGGXCHGDYOHB-UHFFFAOYSA-L 0.000 description 1
- 238000013480 data collection Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000006170 formylation reaction Methods 0.000 description 1
- 239000012458 free base Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical compound [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 125000004192 tetrahydrofuran-2-yl group Chemical group [H]C1([H])OC([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 229940124597 therapeutic agent Drugs 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/33—Heterocyclic compounds
- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/435—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom
- A61K31/44—Non condensed pyridines; Hydrogenated derivatives thereof
- A61K31/4427—Non condensed pyridines; Hydrogenated derivatives thereof containing further heterocyclic ring systems
- A61K31/4439—Non condensed pyridines; Hydrogenated derivatives thereof containing further heterocyclic ring systems containing a five-membered ring with nitrogen as a ring hetero atom, e.g. omeprazole
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
- C07C45/65—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by splitting-off hydrogen atoms or functional groups; by hydrogenolysis of functional groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C47/00—Compounds having —CHO groups
- C07C47/52—Compounds having —CHO groups bound to carbon atoms of six—membered aromatic rings
- C07C47/56—Compounds having —CHO groups bound to carbon atoms of six—membered aromatic rings containing hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C47/00—Compounds having —CHO groups
- C07C47/52—Compounds having —CHO groups bound to carbon atoms of six—membered aromatic rings
- C07C47/56—Compounds having —CHO groups bound to carbon atoms of six—membered aromatic rings containing hydroxy groups
- C07C47/565—Compounds having —CHO groups bound to carbon atoms of six—membered aromatic rings containing hydroxy groups all hydroxy groups bound to the ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C47/00—Compounds having —CHO groups
- C07C47/52—Compounds having —CHO groups bound to carbon atoms of six—membered aromatic rings
- C07C47/575—Compounds having —CHO groups bound to carbon atoms of six—membered aromatic rings containing ether groups, groups, groups, or groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B2200/00—Indexing scheme relating to specific properties of organic compounds
- C07B2200/13—Crystalline forms, e.g. polymorphs
Definitions
- Compound (Ia) has been synthesized by certain methods starting with 2,6-dihydroxbenzaldehyde (compound (1)) where each hydroxyl moiety is protected with an unbranched, straight-chain alkyl or alkoxyalkyl such as, for example, methyl or methoxymethyl.
- compound (1) 2,6-dihydroxbenzaldehyde
- an unbranched, straight-chain alkyl or alkoxyalkyl such as, for example, methyl or methoxymethyl.
- various methods of deprotection of the hydroxyl group were employed to synthesize compound (1) used in the synthesis and production of Compound (Ia).
- the deprotection processes used lead to unwanted polymerization and decomposition reactions of compound (1)—attributed, in part, to the conditions used for deprotection of the hydroxy groups.
- each R is —CH(CH 2 R 1 )—OR 2 or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl with an acid to provide a compound (1) and wherein R 1 is hydrogen or alkyl and R 2 is alkyl;
- LG is a leaving group under alkylation reacting conditions
- a process for synthesizing Compound (Ia) comprising performing Steps (i) and (ii) of the first aspect in sequence, including embodiments and subembodiments of aspect 1 described herein, thereby synthesizing Compound (Ia).
- a process for synthesizing Compound (Ia) the process comprising performing Steps (i), (ii), and (iii) of the first aspect in sequence, including embodiments and subembodiments of aspect 1 described herein, thereby obtaining Compound (Ia).
- each R in compounds of formulae (2) and (4) is —CH(CH 2 R 1 )—OR 2 (where R 1 is hydrogen or alkyl and R 2 is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl to provide a compound of formula (2) above.
- each R is —CH(CH 2 R 1 )—OR 2 (wherein R 1 is hydrogen or alkyl and R 2 is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl, the process comprising:
- each R is —CH(CH 2 R 1 )—OR 2 (where R 1 is hydrogen or alkyl and R 2 is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl, the process comprising:
- each R is —CH(CH 2 R 1 )—OR 2 (where R 1 is hydrogen or alkyl and R 2 is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl;
- LG is a leaving group under alkylation reacting conditions
- a process of synthesizing Compound (Ia) the process comprising performing Steps (a), (b), and (c) or (b) and (c) of the fourth aspect in sequence, including embodiments and subembodiments of aspect 4 described herein.
- a process of synthesizing Compound (Ia) the process comprising performing Steps (a), (b), (c), and (d), or (b), (c), and (d) of the fourth aspect in sequence, including embodiments and subembodiments of aspect 4 described herein.
- first and fourth aspects further include synthesizing compound (3) from the intermediate compound (6) as provided in the seventh aspect described herein.
- each R is tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl.
- each R is —CH(CH 2 R 1 )—OR 2 (wherein R 1 is hydrogen or alkyl and R 2 is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl.
- R 3 and R 4 are independently alkyl or together form —(CR′R′′) 2 where R′ and R′′ are independently alkyl;
- FIG. 1 is a XRPD pattern for crystalline Form I of Compound (Ia).
- FIG. 2 is a XRPD pattern for crystalline Form II of Compound (Ia).
- Alkyl means a linear saturated monovalent hydrocarbon radical of one to six carbon atoms or a branched saturated monovalent hydrocarbon radical of three to six carbon atoms, e.g., methyl, ethyl, propyl, 2-propyl, butyl, pentyl, and the like.
- “Substantially pure” as used herein in connection with the polymorphic form refers to a compound such as Compound (Ia) wherein at least 70% by weight of the compound is present as the given polymorphic form.
- the phrase “Compound (Ia) is substantially pure Form I or II” refers to a solid state form of Compound (Ia) wherein at least 70% by weight of Compound (Ia) is in Form I or II respectively.
- at least 80% by weight of Compound (Ia) is in Form I or II respectively.
- at least 85% by weight of Compound (Ia) is in Form I or II respectively.
- at least 90% by weight of Compound (Ia) is in Form I or II respectively.
- at least 95% by weight of Compound (Ia) is in Form I or II respectively.
- at least 99% by weight of Compound (Ia) is in Form I or II respectively.
- the process of the first aspect further comprises formylating a compound of formula (4):
- each R is —CH(CH 2 R 1 )—OR 2 wherein R 1 is hydrogen or alkyl and R 2 is alkyl or R is tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl to provide a compound of formula (2).
- each R is the same.
- the tetrahydropyran-2-yl moiety is unsubstituted.
- the tetrahydropyran-2-yl moiety is substituted with one, two, or three alkyl.
- each R is —CH(CH 2 R 1 )—OR 2 (where R 1 is hydrogen or alkyl and R 2 is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl.
- the 3,4-dihydro-2H-pyran moiety is unsubstituted. In another subembodiment of embodiment (b), the 3,4-dihydro-2H-pyran moiety is substituted with one, two or three alkyl.
- the acid is hydrochloric acid, sulfuric acid, trifluoroacetic acid, methanesulfonic acid, or ethanesulfonic acid.
- the acid is hydrochloric acid.
- the reaction is performed at a pH of less than about: 4, 3, 2, or 1.
- the reaction is performed at a pH of about 1 to about 3.
- the reaction is performed at a pH greater than 1.
- the reaction is performed at a pH less than 1.
- the compound (2) is treated in-situ with the organic or inorganic acid to synthesize compound (1).
- the reaction is carried out in an organic solvent such as tetrahydrofuran, methyl tetrahydrofuran, ethyl ether, or dioxane.
- the reaction is carried out in an organic solvent such as tetrahydrofuran.
- the reaction is carried out at temperatures less than 30° C.+/ ⁇ 5° C., preferably the reaction is carried out at temperatures less than about 20° C.
- the deprotection is performed in a shorter amount of time than previous synthetic routes.
- the shortened deprotection time can reduce polymerization or decomposition of the intermediate compound (1) and/or, (2) as described herein.
- LG is chloro, bromo, tosylate, mesylate, or triflate.
- LG can preferably be chloro.
- LG is chloro and the reaction is carried out in the presence of a non-nucleophilic organic base (such as pyridine, trimethylamine, N-methyl-2-pyrrolidone, and diisopropylethylamine in the presence of a weak inorganic base such as sodium bicarbonate, potassium bicarbonate, cesium carbonate, and the like).
- a non-nucleophilic organic base such as pyridine, trimethylamine, N-methyl-2-pyrrolidone, and diisopropylethylamine
- the weak inorganic base is sodium bicarbonate.
- LG is chloro and the reaction is carried out in the presence of pyridine and a weak inorganic base such as sodium bicarbonate.
- the reaction is carried out in N-methyl-2-pyrrolidinone.
- LG is chloro and the reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and catalytic amount of NaI.
- the reaction is carried out at between 40° C. to 50° C.
- the reaction is carried out at between 43° C. to 45° C.
- the reaction mixture is treated with water and then seeded with Compound (Ia) Form I at 40° C. to 50° C., preferably 40° to 46° C. to give Compound (Ia) as substantially pure Form I, preferably Compound (Ia) is at least 95% by weight pure Form I.
- the process of the first aspect, Step (iii), fourth aspect Step (e) and embodiments (a), (b), (c) and (d) and subembodiments contained therein is wherein-, the crystallization of Compound (Ia) is carried out at 45+/ ⁇ 5° C. to 55+/ ⁇ 5° C. or at 45° C. to 55° C., and the solvent is n-heptane and methyl tert-butyl ether to provide substantially pure Compound (Ia) Form II.
- at least 95% by wt of Compound (Ia) is Form II.
- at least 98% by wt of Compound (Ia) is Form II.
- at least 99% by wt of Compound (Ia) is Form II.
- each R is —CH(CH 3 )—O—CH 2 CH 3 , —CH(C 2 H 5 )—O—CH 2 CH 3 .
- each R is —CH(CH 3 )—O—CH 2 CH 3 .
- each R is tetrahydropyran-2-yl optionally substituted with one or two methyl.
- R is tetrahydrofuran-2-yl.
- each R is tetrahydropyran-2-yl is substituted with one methyl.
- the process of the third and fourth aspects, embodiments (a)-(e), and subembodiments contained therein is wherein, the acid used in the conversion of compound (5) to the compound of formula (4) is a weak acid such as p-toluenesulfonic acid or pyridinium tosylate.
- the acid is pyridinium tosylate.
- embodiments (a)-(i) and subembodiments contained therein is wherein the formylating agent is n-BuLi and DMF, or n-formylmorpholine.
- the formylating agent is n-BuLi and DMF.
- the reaction is carried out in THF.
- the process of the seventh aspect is wherein the palladium catalyst is dichloro[1,1′-bis(diphenylphosphino)ferrocene]palladium(II) or its dichloromethane adduct.
- R 3 and R 4 together form —C(CH 3 ) 2 —C(CH 3 ) 2 — and X is halo.
- R 3 and R 4 together form —C(CH 3 ) 2 —C(CH 3 ) 2 — and X is chloro.
- Form I of Compound (Ia) can be characterized by a XRPD pattern comprising X-ray powder diffraction peak (Cu K ⁇ radiation) at one or more of 12.94°, 15.82°, 16.110, 16.74°, 17.67°, 25.19°, 25.93° and 26.48 ⁇ 0.2 ⁇ 2 ⁇ .
- Form I of Compound (Ia) is characterized by an X-ray powder diffraction pattern (Cu K ⁇ radiation) substantially similar to that of FIG. 1 .
- the Form I of the free base of Compound (Ia) is characterized by a XRPD pattern comprising at least two X-ray powder diffraction peaks (Cu K ⁇ radiation) selected from 12.94°, 15.82°, 16.11°, 16.74°, 17.67°, 25.19°, 25.93° and 26.48° (each ⁇ 0.2° 2 ⁇ ).
- the Form I of Compound (Ia) is characterized by a XRPD pattern comprising at least three X-ray powder diffraction peaks (Cu K ⁇ radiation) selected from 12.94°, 15.82°, 16.11°, 16.74°, 17.67°, 25.19°, 25.93° and 26.48° (each ⁇ 0.2° 2 ⁇ ).
- Form I is characterized by a XRPD pattern comprising 1, 2, 3, 4, or more peaks as tabulated below in Table 1 that lists the XRPD peak positions and relative intensities of major XRPD peaks for Form I of Compound (Ia).
- Form II of Compound (Ia) can be characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu K ⁇ radiation at one or more of 13.44°, 14.43°, 19.76°, 23.97° ⁇ 0.2° 2 ⁇ .
- Form II of Compound (Ia) is characterized by a XRPD pattern comprising a X-ray powder diffraction pattern (Cu K ⁇ radiation) substantially similar to that of FIG. 2 .
- Form II of Compound (Ia) is characterized by a XRPD pattern comprising at least two X-ray powder diffraction peak (Cu K ⁇ radiation) selected from 13.44°, 14.43°, 19.76°, 23.97° 2 ⁇ (each ⁇ 0.2° 2 ⁇ ).
- Form II of Compound (Ia) is characterized by a XRPD pattern comprising at least three X-ray powder diffraction peaks (Cu K ⁇ radiation) selected from 13.44°, 14.43°, 19.76°, and 23.97° 2 ⁇ (each ⁇ 0.2° 2 ⁇ ).
- Form II of Compound (Ia) is characterized by a XRPD pattern comprising X-ray powder diffraction peaks (Cu K ⁇ radiation) selected from 13.44°, 14.43°, 19.76°, and 23.97° 2 ⁇ (each ⁇ 0.2° 2 ⁇ ).
- Form II is characterized by 1, 2, 3, 4, or more peaks as tabulated below in Table 2 that lists the XRPD peak positions and relative intensities of major XRPD peaks for Form II of Compound (Ia).
- the processes described herein can be used for synthesizing Compound (Ia) at a manufacturing scale synthesis (e.g., at least 0.05, 0.1, 0.2, 0.3, 0.4, 0.5, 1, 2, 3, 4, 5, 10, 20, 25, 50, 100, or more kg amounts).
- the processes described herein can be useful for larger scale syntheses (e.g., at least 0.05, 0.1, 0.2, 0.3, 0.4, 0.5, 1, 2, 3, 4, 5, 10, 20, 25, 50, 100, or more kg amounts) which retain the physical properties, purity, efficacy, a combination thereof, or all thereof, of Compound (Ia).
- the processes described herein surprisingly reduce polymerization of compound (1) and surprisingly reduce polymerization intermediates during the synthesis of Compound (Ia).
- the polymerization can be reduced by at least 5%, 10%, 20%, 25%, 50%, 75%, 80%, 90%, 95% or more compared to previous synthesis routes as described herein.
- the processes described herein surprisingly reduce decomposition reactions during the synthesis of (and deprotection of) compound (1).
- the decomposition reactions can be reduced by at least 5%, 10%, 20%, 25%, 50%, 75%, 80%, 90%, 95% or more compared to previous synthesis routes as described herein.
- the processes described herein can increase the purity of the final product of Compound (Ia) by at least 5%, 10%, 20%, 25%, 50%, 75%, 80%, 90%, 95%, 97%, 99% or more compared to previous synthesis routes as described herein.
- XRPD patterns were collected with a PANalytical X′Pert3 X-ray Powder Diffractometer using an incident beam of Cu K ⁇ radiation (K ⁇ 1 ( ⁇ ): 1.540598, K ⁇ 2 ( ⁇ ): 1.544426 K ⁇ 2/K ⁇ 1 intensity ratio: 0.50, tube setting at 45 kV, 40 mA).
- a continuous scan mode between 3 and 40 (°2 ⁇ ) with a scan speed of 50 s per step and a step size of 0.0263 (°2 ⁇ ) in reflection mode was used.
- the diffractometer was configured using the symmetric Bragg-Brentano geometry. Data collection used Data Collector Version® 4.3.0.161 and Highscore Plus® version 3.0.0.
- Tetrahydrofuran 700 mL was added to resorcinol (170 g, 1.54 mol, 1 eq.) under inert gas protection, followed by addition of pyridinium tosylate (3.9 g, 15.4 mmol, 0.01 eq.), THF 65 mL) and the reaction mixture was cooled down to 0-5° C. Within 1-1.5 h ethylvinyl ether (444 mL, 4.63 mol, 3.0 eq.) was added while maintaining a temperature ⁇ 5° C. After the addition was complete the reaction mixture was allowed to reach room temperature within 1.5 h. The reaction was stirred overnight, cooled down to 10-15° C., and 510 mL of 1 ⁇ 2 sat.
- a batch preparation was performed using solvent swap and was completed faster than other known methods for synthesizing Compound (Ia) with better purity and yield.
- the deprotection sequence allowed in-situ use of compound (2).
- tetrahydrofuran 207 L was added to resorcinol (46 kg, 0.42 kmol, 1 eq.) followed by addition of pyridinium tosylate (1.05 kg, 4.2 mol, 0.01 eq.), and the reaction mixture was cooled down to 0-5° C.
- ethylvinyl ether 90.4 kg, 120.5 L, 125 kmol, 3.0 eq.
- the reaction was stirred overnight, cooled down to 10-15° C., and 138 L of aqueous 4% NaHCO 3 was added while maintaining the reaction solution below 20° C.
- the phases were separated.
- the organic phase was washed once with 115 L of water and once with 125.2 kg of a 12.5% NaCl solution.
- the organic layer was dried by azeotropic distillation with THF to a water content value ⁇ 0.05% (by weight) to yield bis-EOE-protected resorcinol (106.2 kg, 0.42 kmol) as a solution in THF.
- An advantage over previously reported protection procedures is that the bis-EOE-protected resorcinol product does not need to be isolated as a neat product.
- the product-containing THF solution can be used directly in the next reaction step thus increasing throughput and reducing impurity formation.
- Bis-EOE-protected resorcinol solution (assumption is 100% conversion) was added under inert gas protection to suitable reactor.
- the reaction mixture was cooled down to ⁇ 10° C. to ⁇ 5° C. and n-BuLi (117.8 kg, 25% in heptane, 1.1 eq.) was added.
- the reaction mixture was agitated at ⁇ 5° C.-0° C. for 30-40 min and then DMF (39.7 kg, 0.54 kmol, 1.3 eq.) was added at ⁇ 10° C. to ⁇ 5° C.
- the pH of the quenched solution was adjusted to ⁇ 1 with aqueous HCl (6M, ca 95.9 kg) and the reaction mixture stirred at ambient temperature for 16 h. After the reaction was complete the organic phase was separated and 279.7 kg of methyl tert butyl ether was added. The organic phase was washed once with aqueous 1N HCl (299 kg), once with aqueous 12.5% NaCl (205.8 kg) and once with 189 kg of water and then concentrated to a volume of ca. 69 L. To the slurry was added 164 kg of acetonitrile and the solution was concentrated in vacuo at T ⁇ 45° C. to a final volume of ca. 69 L.
- the slurry was heated to re-dissolve the solids.
- the solution was seeded at 60-65° C. to initiate crystallization of the product and cooled slowly to RT over 8 hrs.
- the slurry was cooled down to ⁇ 20° C. to ⁇ 15° C. and agitated at this temperature for 1-2 h.
- the product was isolated by filtration and washed with DCM (50.3 kg, pre-cooled to ⁇ 20° C. to ⁇ 15° C.) and dried under a stream of nitrogen to yield 2,6-dihydroxybenzaldehyde as a yellow solid. Yield: 37.8 kg (0.27 kmol, 65.4% Yield).
- the described telescoped approach from deprotection to crystallization increases the throughput and integrity of the product.
- reaction mixture was cooled to room temperature, diluted with deionized water, and the phases were separated.
- the organic layer was extracted with 2 N HCl (10 vol) and the phases were separated.
- the aqueous phase was washed with MTBE.
- the pH of the aqueous phase was adjusted to 8-9 with 6 N NaOH.
- the product was extracted into EtOAc, treated with Darco G-60 for 30 to 60 min, dried over MgSO 4 , filtered through Celite®, and concentrated to give (2-(1-isopropyl-1H-pyrazol-5-yl)pyridin-3-yl)methanol as a brown oil.
- a suitably equipped reactor was charged with (2-(1-isopropyl-1H-pyrazol-5-yl)pyridin-3-yl)methanol hydrochloride salt (1 equivalent) and purified water.
- An aqueous sodium bicarbonate solution (8% NaHCO 3 ) was added slowly to maintain the solution temperature between 17° C. to 25° C.
- the reaction mixture was stirred at 17° C. to 25° C. and dichloromethane was added and the organic layer was separated.
- DCM solution was then distilled under atmospheric conditions at approximately 40° C. and the volume was reduced. DCM was added the reactor and the contents of the reactor are stirred at 20° C. to 30° C. until a clear solution is formed.
- a suitably equipped reactor was charged with 3-(chloromethyl)-2-(1-isopropyl-1H-pyrazol-5-yl)pyridine dihydrochloride salt (1 equivalent), sodium iodide (0.05 equivalent), sodium bicarbonate (4 equivalent), 1-methyl-2-pyrrolidinone (NMP), and 2,6-dihydroxy-benzaldehyde (1 to 1.05 equiv.).
- the reaction mixture was heated slowly to 40° C. to 50° C. and stirred until the reaction was complete. Water was then added and the reaction mixture was cooled and maintained at 17° C. to 25° C. When the water addition was complete, the reaction mixture was stirred at 17° C. to 25° C. and slowly cooled to 0° C. to 5° C.
- a suitably equipped reactor was charged with 3-(chloromethyl)-2-(1-isopropyl-1H-pyrazol-5-yl)pyridine bishydrochloride salt (1 equivalent), sodium iodide (0.05 equivalent), sodium bicarbonate (3 to 4 equivalent), 1-methyl-2-pyrrolidinone (7 equivalent, NMP), and 2,6-dihydoxybenzaldehyde (1.05 equivalent).
- the reaction mixture was heated to 40° C. to 50° C. and stirred until the reaction was complete. Water (5 equivalent) was then added while maintaining the contents of the reactor at 40° C. to 46° C.
- a suitably equipped reactor with an inert atmosphere was charged with crude 2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde (from Example 3 above) and MTBE and the contents stirred at 17° C. to 25° C. until dissolution was achieved.
- the reaction solution was passed through a 0.45 micron filter and MTBE solvent volume reduced using vacuum distillation at approximately 50° C.
- the concentrated solution was heated to 55° C. to 60° C. to dissolve any crystallized product. When a clear solution was obtained, the solution was cooled to 50° C. to 55° C. and n-heptane was added.
Abstract
Disclosed herein are processes for synthesizing 2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde (also referred to herein as Compound (I)) and intermediates used in such processes. Compound (I) binds to hemoglobin and increases its oxygen affinity and hence can be useful for the treatment of diseases such as sickle cell disease.
Description
- Compound (Ia) has been synthesized by certain methods starting with 2,6-dihydroxbenzaldehyde (compound (1)) where each hydroxyl moiety is protected with an unbranched, straight-chain alkyl or alkoxyalkyl such as, for example, methyl or methoxymethyl. Following installation of the aldehyde group, various methods of deprotection of the hydroxyl group were employed to synthesize compound (1) used in the synthesis and production of Compound (Ia). However, the deprotection processes used lead to unwanted polymerization and decomposition reactions of compound (1)—attributed, in part, to the conditions used for deprotection of the hydroxy groups. The undesired byproducts yield complex mixtures, lower yields of Compound (Ia), and require significant effort to purify Compound (Ia) to a degree acceptable for use as a part of a therapeutic agent, thus rendering the above processes impractical for commercial scale synthesis of Compound (Ia).
- Provided herein are processes for the synthesis of Compound (Ia):
- that employ a protecting group sequence and mild reaction conditions to obtain compound (1) in a manner that suppresses unwanted polymerization and decomposition reactions and enables commercial scale synthesis of Compound (Ia).
- In one aspect, provided is a process of synthesizing compound (1):
- the process comprising:
- Step (i): treating a compound of formula (2):
- where each R is —CH(CH2R1)—OR2 or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl with an acid to provide a compound (1) and wherein R1 is hydrogen or alkyl and R2 is alkyl;
- Step (ii): optionally converting compound (1) to Compound (Ia):
- by reacting compound (1) with a compound of formula (3):
- where LG is a leaving group under alkylation reacting conditions; and
- Step (iii): optionally crystallizing Compound (Ia) from heptane and methyl tert-butyl ether at 400+/−5° C. to 55+/−5° C., preferably at 450+/−5° C. to 55+/−5° C.
- Further provided herein is a process for synthesizing Compound (Ia), the process comprising performing Steps (i) and (ii) of the first aspect in sequence, including embodiments and subembodiments of aspect 1 described herein, thereby synthesizing Compound (Ia). Further provided herein is a process for synthesizing Compound (Ia), the process comprising performing Steps (i), (ii), and (iii) of the first aspect in sequence, including embodiments and subembodiments of aspect 1 described herein, thereby obtaining Compound (Ia).
- Provided herein in a second aspect, is a process of synthesizing a compound of formula (2):
- the process comprising formylating a compound of formula (4):
- wherein each R in compounds of formulae (2) and (4) is —CH(CH2R1)—OR2 (where R1 is hydrogen or alkyl and R2 is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl to provide a compound of formula (2) above.
- Provided herein in a third aspect, is a process of synthesizing a compound of formula (4):
- wherein each R is —CH(CH2R1)—OR2 (wherein R1 is hydrogen or alkyl and R2 is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl, the process comprising:
- reacting compound (5):
- with a vinyl ether of formula CHR1═CHOR2 (wherein R1 is hydrogen or alkyl and R2 is alkyl) or 3,4-dihydro-2H-pyran optionally substituted with one, two or three alkyl, in the presence of a weak acid to provide a compound of formula (4) above.
- Provided in a fourth aspect is a process of synthesizing compound (1):
- wherein each R is —CH(CH2R1)—OR2 (where R1 is hydrogen or alkyl and R2 is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl, the process comprising:
- Step (a): reacting compound (5):
- with a vinyl ether of formula CHR1═CHOR2 (wherein R1 is hydrogen or alkyl and R2 is alkyl) or 3,4-dihydro-2H-pyran optionally substituted with one, two or three alkyl, in the presence of a weak acid to provide a compound of formula (4):
- wherein each R is —CH(CH2R1)—OR2 (where R1 is hydrogen or alkyl and R2 is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl;
- Step (b): treating compound (4) in situ with a formylating agent to provide a compound of formula (2):
- Step (c): treating the compound of formula (2) in situ with an acid to provide compound (1) above;
- Step (d): optionally converting compound (1) to Compound (Ia):
- by reacting compound (1) with a compound of formula (3)
- where LG is a leaving group under alkylation reacting conditions; and
- Step (e): optionally crystallizing Compound (Ia) from heptane and methyl tert-butyl ether at 40°+/−5° C. to 55+/−5° C., preferably at 45°+/−5° C. to 55+/−5° C.
- Further provided herein is a process of synthesizing Compound (Ia), the process comprising performing Steps (a), (b), and (c) or (b) and (c) of the fourth aspect in sequence, including embodiments and subembodiments of aspect 4 described herein. Further provided herein is a process of synthesizing Compound (Ia), the process comprising performing Steps (a), (b), (c), and (d), or (b), (c), and (d) of the fourth aspect in sequence, including embodiments and subembodiments of aspect 4 described herein. Further provided herein is a process of synthesizing Compound (Ia), the process comprising performing Steps (a), (b), (c), (d), and (e), or (b), (c), and (d) and (e) of the fourth aspect in sequence, including embodiments and subembodiments of aspect 4 described herein. In one embodiment, the first and fourth aspects further include synthesizing compound (3) from the intermediate compound (6) as provided in the seventh aspect described herein.
- Further provided herein in a fifth aspect is an intermediate of the compound of formula (4):
- where each R is tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl.
- In a sixth aspect, provided is an intermediate of formula (2):
- where each R is —CH(CH2R1)—OR2 (wherein R1 is hydrogen or alkyl and R2 is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl.
- In a seventh aspect, provided is a process of synthesizing compound (6):
- the process comprising reacting a boronic acid compound of formula:
- where R3 and R4 are independently alkyl or together form —(CR′R″)2 where R′ and R″ are independently alkyl; with
- where X is halo or triflate, in the presence of a palladium catalyst and a base in an organic/aqueous reaction mixture. Compound (6) can be used in the synthesis of Compound (3) as described herein.
- The above aspects can be understood more fully by reference to the detailed description and examples below, which are intended to exemplify non-limiting embodiments.
-
FIG. 1 is a XRPD pattern for crystalline Form I of Compound (Ia). -
FIG. 2 is a XRPD pattern for crystalline Form II of Compound (Ia). - Unless otherwise stated, the following terms as used in the specification and claims are defined for the purposes of this application and have the following meaning:
- “Alkyl” means a linear saturated monovalent hydrocarbon radical of one to six carbon atoms or a branched saturated monovalent hydrocarbon radical of three to six carbon atoms, e.g., methyl, ethyl, propyl, 2-propyl, butyl, pentyl, and the like.
- “Optional” or “optionally” means that the subsequently described event or circumstance may but need not occur, and that the description includes instances where the event or circumstance occurs and instances in which it does not. For example, “optionally crystallizing Compound (Ia) from heptane and methyl tert-butyl ethyl” means that the crystallization may but need not be done.
- “About” as used herein means that a given amount or range includes deviations in range or amount that fall within experimental error unless indicated otherwise.
- “Substantially pure” as used herein in connection with the polymorphic form refers to a compound such as Compound (Ia) wherein at least 70% by weight of the compound is present as the given polymorphic form. For example, the phrase “Compound (Ia) is substantially pure Form I or II” refers to a solid state form of Compound (Ia) wherein at least 70% by weight of Compound (Ia) is in Form I or II respectively. In one embodiment, at least 80% by weight of Compound (Ia) is in Form I or II respectively. In another embodiment, at least 85% by weight of Compound (Ia) is in Form I or II respectively. In yet another embodiment, at least 90% by weight of Compound (Ia) is in Form I or II respectively. In yet another embodiment, at least 95% by weight of Compound (Ia) is in Form I or II respectively. In yet another embodiment, at least 99% by weight of Compound (Ia) is in Form I or II respectively.
- (a) In embodiment (a), the process of the first aspect further comprises formylating a compound of formula (4):
- wherein each R is —CH(CH2R1)—OR2 wherein R1 is hydrogen or alkyl and R2 is alkyl or R is tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl to provide a compound of formula (2).
- In a first subembodiment of embodiment (a), each R is the same. In a second subembodiment, the tetrahydropyran-2-yl moiety is unsubstituted. In a third subembodiment of embodiment (a), the tetrahydropyran-2-yl moiety is substituted with one, two, or three alkyl.
- (b) In embodiment (b) the process of embodiment (a) further comprises reacting compound (5):
- with a vinyl ether of formula CHR1═CHOR2, where R1 is hydrogen or alkyl and R2 is alkyl) or 3,4-dihydro-2H-pyran optionally substituted with one, two or three alkyl,
- in the presence of a weak acid to provide a compound of formula (4):
- wherein each R is —CH(CH2R1)—OR2 (where R1 is hydrogen or alkyl and R2 is alkyl) or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl.
- In one subembodiment of embodiment (b), the 3,4-dihydro-2H-pyran moiety is unsubstituted. In another subembodiment of embodiment (b), the 3,4-dihydro-2H-pyran moiety is substituted with one, two or three alkyl.
- (c) In embodiment (c), the process of the first aspect, Step (i), fourth aspect, Step (c), and embodiments (a) and (b)—is wherein the acid used in the removal of R group is an organic or inorganic acid. In a first subembodiment of embodiment (c), the acid is hydrochloric acid, sulfuric acid, trifluoroacetic acid, methanesulfonic acid, or ethanesulfonic acid. In a second subembodiment of embodiment (c), the acid is hydrochloric acid. In a third subembodiment of embodiment (c), including subembodiments and embodiments contained therein, the reaction is performed at a pH of less than about: 4, 3, 2, or 1. In a fourth subembodiment of embodiment (c), including subembodiments and embodiments contained therein, the reaction is performed at a pH of about 1 to about 3. In a fifth subembodiment of embodiment (c), including subembodiments and embodiments contained therein, the reaction is performed at a pH greater than 1. In a sixth subembodiment of embodiment (c), including subembodiments and embodiments contained therein, the reaction is performed at a pH less than 1. In a seventh subembodiment of embodiment (c), including subembodiments and embodiments contained therein, the compound (2) is treated in-situ with the organic or inorganic acid to synthesize compound (1). In an eight subembodiment of embodiment (c), including subembodiments and embodiments contained therein, the reaction is carried out in an organic solvent such as tetrahydrofuran, methyl tetrahydrofuran, ethyl ether, or dioxane. In a ninth subembodiment of embodiment (c), including subembodiments and embodiments contained therein, the reaction is carried out in an organic solvent such as tetrahydrofuran. In a tenth subembodiment of embodiment (c), including subembodiments and embodiments contained therein, the reaction is carried out at temperatures less than 30° C.+/−5° C., preferably the reaction is carried out at temperatures less than about 20° C. In an eleventh subembodiment of embodiment (c), including subembodiments and embodiments contained therein, the deprotection is performed in a shorter amount of time than previous synthetic routes. The shortened deprotection time can reduce polymerization or decomposition of the intermediate compound (1) and/or, (2) as described herein.
- (d) In embodiment (d), the process of the first and fourth aspects, embodiments (a), (b) and (c) and subembodiments contained therein, is wherein LG is chloro, bromo, tosylate, mesylate, or triflate. LG can preferably be chloro. In a first subembodiment of embodiment (d), LG is chloro and the reaction is carried out in the presence of a non-nucleophilic organic base (such as pyridine, trimethylamine, N-methyl-2-pyrrolidone, and diisopropylethylamine in the presence of a weak inorganic base such as sodium bicarbonate, potassium bicarbonate, cesium carbonate, and the like). In a second subembodiment of embodiment (d), the weak inorganic base is sodium bicarbonate. In a third subembodiment of embodiment (d), LG is chloro and the reaction is carried out in the presence of pyridine and a weak inorganic base such as sodium bicarbonate. In a fourth subembodiment of embodiment (d) and subembodiments and embodiments contained therein, the reaction is carried out in N-methyl-2-pyrrolidinone. In a fifth subembodiment of embodiment (d), LG is chloro and the reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and catalytic amount of NaI. In a sixth sub-embodiment of the embodiment (d) and sub-embodiments contained therein, the reaction is carried out at between 40° C. to 50° C. In a seventh sub-embodiment of the embodiment (d) and sub-embodiments contained therein, the reaction is carried out at between 43° C. to 45° C. In an eight sub-embodiment of the embodiment (d) and sub-embodiments contained therein, after the reaction is complete, the reaction mixture is treated with water and then seeded with Compound (Ia) Form I at 40° C. to 50° C., preferably 40° to 46° C. to give Compound (Ia) as substantially pure Form I, preferably Compound (Ia) is at least 95% by weight pure Form I.
- (e) In embodiment (e), the process of the first aspect, Step (iii), fourth aspect Step (e) and embodiments (a), (b), (c) and (d) and subembodiments contained therein is wherein-, the crystallization of Compound (Ia) is carried out at 45+/−5° C. to 55+/−5° C. or at 45° C. to 55° C., and the solvent is n-heptane and methyl tert-butyl ether to provide substantially pure Compound (Ia) Form II. In one embodiment, at least 95% by wt of Compound (Ia) is Form II. In one embodiment, at least 98% by wt of Compound (Ia) is Form II. In one embodiment, at least 99% by wt of Compound (Ia) is Form II.
- (f) In embodiment (f), the process of the first, second, third, fourth, fifth, and sixth aspects, embodiments (a)-(e), and subembodiments contained therein is wherein, each R is —CH(CH3)—O—CH2CH3, —CH(C2H5)—O—CH2CH3. In one subembodiment of (g), each R is —CH(CH3)—O—CH2CH3.
- (g) In embodiment (g), the process of the first, second, third, fourth, fifth, and sixth aspects, embodiments (a)-(e), and subembodiments contained therein is wherein, each R is tetrahydropyran-2-yl optionally substituted with one or two methyl. In a first subembodiment of (g), R is tetrahydrofuran-2-yl. In a second subembodiment of (g), each R is tetrahydropyran-2-yl is substituted with one methyl.
- (h) In embodiment (h), the process of the third and fourth aspects, embodiments (a)-(e), and subembodiments contained therein is wherein, the acid used in the conversion of compound (5) to the compound of formula (4) is a weak acid such as p-toluenesulfonic acid or pyridinium tosylate. In a first subembodiment of embodiment (h), the acid is pyridinium tosylate.
- (i) In embodiment (i) the process of second aspect and fourth aspect, Step (b), embodiments (a)-(i) and subembodiments contained therein, is wherein the formylating agent is n-BuLi and DMF, or n-formylmorpholine. In a first subembodiment of embodiment (i), the formylating agent is n-BuLi and DMF. In a second subembodiment of embodiment (i), including the first subembodiment of embodiment (i), the reaction is carried out in THF.
- (j) In embodiment (j) the process of the seventh aspect, is wherein the palladium catalyst is dichloro[1,1′-bis(diphenylphosphino)ferrocene]palladium(II) or its dichloromethane adduct. In a first subembodiment of embodiment (j), R3 and R4 together form —C(CH3)2—C(CH3)2— and X is halo. In a second subembodiment of embodiment (j), including the first subembodiment of embodiment (j), R3 and R4 together form —C(CH3)2—C(CH3)2— and X is chloro.
- (k) In embodiment (j) the intermediate of the fifth and sixth aspects is wherein each R is —CH(CH3)—O—CH2CH3.
- (l) In embodiment (l) the intermediate of the fifth and sixth aspects is wherein, each R is tetrahydropyran-2-yl.
- Form I of Compound (Ia) can be characterized by a XRPD pattern comprising X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.94°, 15.82°, 16.110, 16.74°, 17.67°, 25.19°, 25.93° and 26.48θ±0.2 θ2θ. In one embodiment, Form I of Compound (Ia) is characterized by an X-ray powder diffraction pattern (Cu Kα radiation) substantially similar to that of
FIG. 1 . In another embodiment, the Form I of the free base of Compound (Ia) is characterized by a XRPD pattern comprising at least two X-ray powder diffraction peaks (Cu Kα radiation) selected from 12.94°, 15.82°, 16.11°, 16.74°, 17.67°, 25.19°, 25.93° and 26.48° (each ±0.2° 2θ). In another embodiment, the Form I of Compound (Ia) is characterized by a XRPD pattern comprising at least three X-ray powder diffraction peaks (Cu Kα radiation) selected from 12.94°, 15.82°, 16.11°, 16.74°, 17.67°, 25.19°, 25.93° and 26.48° (each ±0.2° 2θ). In another embodiment, Form I is characterized by a XRPD pattern comprising 1, 2, 3, 4, or more peaks as tabulated below in Table 1 that lists the XRPD peak positions and relative intensities of major XRPD peaks for Form I of Compound (Ia). -
TABLE 1 XRPD peaks for Form I of Compound (Ia). °2θ d space (Å) Intensity (%) 5.51 ± 0.20 16.045 31.1 5.63 ± 0.20 15.696 35.5 11.17 ± 0.20 7.923 2.05 12.94 ± 0.20 6.841 3.7 15.09 ± 0.20 5.870 9.8 15.82 ± 0.20 5.600 2.3 16.11 ± 0.20 5.500 4.0 16.74 ± 0.20 5.295 100 17.67 ± 0.20 5.018 4.01 18.81 ± 0.20 4.716 2.8 19.13 ± 0.20 4.639 0.9 19.38 ± 0.20 4.581 1.0 20.41 ± 0.20 4.350 3.4 21.00 ± 0.20 4.230 2.9 21.72 ± 0.20 4.092 2.2 22.36 ± 0.20 3.976 10.6 22.86 ± 0.20 3.890 1.7 23.30 ± 0.20 3.817 1.2 25.19 ± 0.20 3.54 7.9 25.33 ± 0.20 3.516 19.1 25.93 ± 0.20 3.436 8.7 26.48 ± 0.20 3.366 3.6 28.01 ± 0.20 3.185 24.8 28.27 ± 0.20 3.157 1.49 - Form II of Compound (Ia) can be characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation at one or more of 13.44°, 14.43°, 19.76°, 23.97°±0.2° 2θ. In another embodiment, Form II of Compound (Ia) is characterized by a XRPD pattern comprising a X-ray powder diffraction pattern (Cu Kα radiation) substantially similar to that of
FIG. 2 . In another embodiment, Form II of Compound (Ia) is characterized by a XRPD pattern comprising at least two X-ray powder diffraction peak (Cu Kα radiation) selected from 13.44°, 14.43°, 19.76°, 23.97° 2θ (each ±0.2° 2θ). In another embodiment, Form II of Compound (Ia) is characterized by a XRPD pattern comprising at least three X-ray powder diffraction peaks (Cu Kα radiation) selected from 13.44°, 14.43°, 19.76°, and 23.97° 2θ (each ±0.2° 2θ). In another embodiment, Form II of Compound (Ia) is characterized by a XRPD pattern comprising X-ray powder diffraction peaks (Cu Kα radiation) selected from 13.44°, 14.43°, 19.76°, and 23.97° 2θ (each ±0.2° 2θ). - In another embodiment, Form II is characterized by 1, 2, 3, 4, or more peaks as tabulated below in Table 2 that lists the XRPD peak positions and relative intensities of major XRPD peaks for Form II of Compound (Ia).
-
TABLE 2 Major XRPD peaks for Form II of Compound (Ia). °2θ d space (Å) Intensity (%) 5.70 ± 0.20 15.494 24.8 9.64 ± 0.20 9.172 5.4 11.32 ± 0.20 7.812 12.2 11.52 ± 0.20 7.680 12.2 12.66 ± 0.20 6.992 10.3 12.90 ± 0.20 6.861 16.4 13.44 ± 0.20 6.587 28.5 14.43 ± 0.20 6.137 28.7 14.79 ± 0.20 5.991 18.3 15.38 ± 0.20 5.761 17.5 16.18 ± 0.20 5.477 16.4 16.51 ± 0.20 5.370 72.3 17.04 ± 0.20 5.205 100 18.56 ± 0.20 4.781 71.1 20.01 ± 0.20 4.437 22.5 20.31 ± 0.20 4.373 7.7 23.06 ± 0.20 3.858 16.3 23.97 ± 0.20 3.712 19.7 24.46 ± 0.20 3.639 34.1 25.06 ± 0.20 3.554 53.6 25.45 ± 0.20 3.500 88.0 26.29 ± 0.20 3.390 23.5 26.78 ± 0.20 3.329 12.6 27.07 ± 0.20 3.294 26.2 27.49 ± 0.20 3.245 5.4 28.09 ± 0.20 3.176 15.6 28.54 ± 0.20 3.128 13.44 - The processes described herein can be used for synthesizing Compound (Ia) at a manufacturing scale synthesis (e.g., at least 0.05, 0.1, 0.2, 0.3, 0.4, 0.5, 1, 2, 3, 4, 5, 10, 20, 25, 50, 100, or more kg amounts). The processes described herein can be useful for larger scale syntheses (e.g., at least 0.05, 0.1, 0.2, 0.3, 0.4, 0.5, 1, 2, 3, 4, 5, 10, 20, 25, 50, 100, or more kg amounts) which retain the physical properties, purity, efficacy, a combination thereof, or all thereof, of Compound (Ia).
- The processes described herein surprisingly reduce polymerization of compound (1) and surprisingly reduce polymerization intermediates during the synthesis of Compound (Ia). In one embodiment, the polymerization can be reduced by at least 5%, 10%, 20%, 25%, 50%, 75%, 80%, 90%, 95% or more compared to previous synthesis routes as described herein.
- The processes described herein surprisingly reduce decomposition reactions during the synthesis of (and deprotection of) compound (1). The decomposition reactions can be reduced by at least 5%, 10%, 20%, 25%, 50%, 75%, 80%, 90%, 95% or more compared to previous synthesis routes as described herein. The processes described herein can increase the purity of the final product of Compound (Ia) by at least 5%, 10%, 20%, 25%, 50%, 75%, 80%, 90%, 95%, 97%, 99% or more compared to previous synthesis routes as described herein.
- XRPD Analysis:
- XRPD patterns were collected with a PANalytical X′Pert3 X-ray Powder Diffractometer using an incident beam of Cu Kα radiation (Kα1 (Λ): 1.540598, Kα2 (Λ): 1.544426 Kα2/Kα1 intensity ratio: 0.50, tube setting at 45 kV, 40 mA). A continuous scan mode between 3 and 40 (°2Θ) with a scan speed of 50 s per step and a step size of 0.0263 (°2Θ) in reflection mode was used. The diffractometer was configured using the symmetric Bragg-Brentano geometry. Data collection used Data Collector Version® 4.3.0.161 and Highscore Plus® version 3.0.0.
-
- Tetrahydrofuran (700 mL) was added to resorcinol (170 g, 1.54 mol, 1 eq.) under inert gas protection, followed by addition of pyridinium tosylate (3.9 g, 15.4 mmol, 0.01 eq.), THF 65 mL) and the reaction mixture was cooled down to 0-5° C. Within 1-1.5 h ethylvinyl ether (444 mL, 4.63 mol, 3.0 eq.) was added while maintaining a temperature≤5° C. After the addition was complete the reaction mixture was allowed to reach room temperature within 1.5 h. The reaction was stirred overnight, cooled down to 10-15° C., and 510 mL of ½ sat. NaHCO3 was added while maintaining the reaction solution below 20° C. The phases were separated. The organic phase was washed once with 425 mL of water and once with 425 mL 12.5% NaCl solution and evaporated and azeotroped with THF to give bis-EOE-protected resorcinol (401.2 g, 1.55 mol, 102% uncorrected) as a clear colorless to yellowish oil.
- Bis-EOE-protected resorcinol (390 g of, actual: 398.6 g=1.53 mol, 1 eq., corrected to 100% conversion) was added under inert gas protection to a 6 L glass vessel and THF (1170 mL) was added. The reaction mixture was cooled down to −10° C. to −5° C. and n-BuLi (625 mL, 2.7 M in heptane, 1.687 mol, 1.1 eq.) was added. The reaction mixture was agitated at −5° C.-0° C. for 30-40 min and then DMF (153.4 mL, 1.99 mmol, 1.3 eq.) was added starting at −10° C. to −5° C. The reaction mixture was stirred until complete and then quenched with 1N HCl/EtOAc. It was also discovered, inter alia, that protection with the EOE groups not only resulted in less byproducts but appeared to increase the speed of the formylation reaction to provide 2,6-bis(1-ethoxyethoxy)benzaldehyde (compound (2)).
- The mixture was worked up, phase separated and the aqueous washed with MTBE. After aqueous wash to remove salts the organic phase was concentrated to the neat oil to obtain the compound (2) as yellow oil (almost quantitative).
- A batch preparation was performed using solvent swap and was completed faster than other known methods for synthesizing Compound (Ia) with better purity and yield. The deprotection sequence allowed in-situ use of compound (2).
- To the reaction solution of Step 2 was added 1N HCl (1755 mL) while maintaining the temperature<20° C. The pH was of the solution was adjusted to pH=0.7-0.8 with 6 M HCl. The reaction mixture was stirred for 16 h. After the reaction was complete the organic phase was separated and 1560 mL of methyl tert butyl ether was added. The organic phase was washed once with 1170 mL of 1N HCl, once with 780 mL of ½ sat. NaCl solution and once with 780 mL of water and then concentrated to a volume of ˜280 mL. To the solution was added 780 mL of methyl tert butyl ether and concentrate again to 280 mL [temperature<45° C., vacuo]. To the slurry was added 780 mL of acetonitrile and the solution was concentrated in vacuo at T<45° C. to a final volume of ˜280 mL. The slurry was heated to re-dissolve the solids. The solution was cooled slowly to RT and seeded at 60-65° C. to initiate crystallization of the product. The slurry was cooled down to −20° C. to −15° C. and agitated at this temperature for 1-2 h. The product was isolated by filtration and washed with DCM (pre-cooled to −20° C. to −15° C.) and dried under a stream of nitrogen to give 2,6-dihydroxybenzaldehyde as a yellow solid. Yield: 138.9 g (1.00 mol, 65.6%).
-
- In a suitable reactor under nitrogen, tetrahydrofuran (207 L) was added to resorcinol (46 kg, 0.42 kmol, 1 eq.) followed by addition of pyridinium tosylate (1.05 kg, 4.2 mol, 0.01 eq.), and the reaction mixture was cooled down to 0-5° C. Within 1-1.5 h ethylvinyl ether (90.4 kg, 120.5 L, 125 kmol, 3.0 eq.) was added while maintaining a temperature≤5° C. After the addition was complete the reaction mixture was allowed to reach room temperature within 1.5 h. The reaction was stirred overnight, cooled down to 10-15° C., and 138 L of aqueous 4% NaHCO3 was added while maintaining the reaction solution below 20° C. The phases were separated. The organic phase was washed once with 115 L of water and once with 125.2 kg of a 12.5% NaCl solution. The organic layer was dried by azeotropic distillation with THF to a water content value<0.05% (by weight) to yield bis-EOE-protected resorcinol (106.2 kg, 0.42 kmol) as a solution in THF. An advantage over previously reported protection procedures is that the bis-EOE-protected resorcinol product does not need to be isolated as a neat product. The product-containing THF solution can be used directly in the next reaction step thus increasing throughput and reducing impurity formation.
- Bis-EOE-protected resorcinol solution (assumption is 100% conversion) was added under inert gas protection to suitable reactor. The reaction mixture was cooled down to −10° C. to −5° C. and n-BuLi (117.8 kg, 25% in heptane, 1.1 eq.) was added. The reaction mixture was agitated at −5° C.-0° C. for 30-40 min and then DMF (39.7 kg, 0.54 kmol, 1.3 eq.) was added at −10° C. to −5° C. The reaction mixture was stirred until complete and then quenched with aqueous HCl (1M, 488.8 kg) to give 2,6-bis(1-ethoxyethoxy)benzaldehyde. An advantage over previously reported procedures of using EOE protecting group is that the HCl quenched solution can be used directly in the deprotection step, and 2,6-bis(1-ethoxyethoxy)benzaldehyde does not need to be isolated as a neat oil.
- The pH of the quenched solution was adjusted to <1 with aqueous HCl (6M, ca 95.9 kg) and the reaction mixture stirred at ambient temperature for 16 h. After the reaction was complete the organic phase was separated and 279.7 kg of methyl tert butyl ether was added. The organic phase was washed once with aqueous 1N HCl (299 kg), once with aqueous 12.5% NaCl (205.8 kg) and once with 189 kg of water and then concentrated to a volume of ca. 69 L. To the slurry was added 164 kg of acetonitrile and the solution was concentrated in vacuo at T<45° C. to a final volume of ca. 69 L. The slurry was heated to re-dissolve the solids. The solution was seeded at 60-65° C. to initiate crystallization of the product and cooled slowly to RT over 8 hrs. The slurry was cooled down to −20° C. to −15° C. and agitated at this temperature for 1-2 h. The product was isolated by filtration and washed with DCM (50.3 kg, pre-cooled to −20° C. to −15° C.) and dried under a stream of nitrogen to yield 2,6-dihydroxybenzaldehyde as a yellow solid. Yield: 37.8 kg (0.27 kmol, 65.4% Yield). The described telescoped approach from deprotection to crystallization increases the throughput and integrity of the product.
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- An appropriately sized flask was purged with nitrogen and charged with (2-chloropyridin-3-yl)methanol (1.0 equiv), sodium bicarbonate (3.0 equiv), [1,1′-bis(diphenyl-phosphino)-ferrocene]dichloropalladium (5 mol %), 1-isopropyl-5-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)-1H-pyrazole (1.2 equiv), and a mixture of 2-MeTHF (17.4 vol) and deionized water (5.2 vol). The resulting solution was heated to 70° C. to 75° C. and conversion monitored by HPLC. Once the reaction was complete, the reaction mixture was cooled to room temperature, diluted with deionized water, and the phases were separated. The organic layer was extracted with 2 N HCl (10 vol) and the phases were separated. The aqueous phase was washed with MTBE. The pH of the aqueous phase was adjusted to 8-9 with 6 N NaOH. The product was extracted into EtOAc, treated with Darco G-60 for 30 to 60 min, dried over MgSO4, filtered through Celite®, and concentrated to give (2-(1-isopropyl-1H-pyrazol-5-yl)pyridin-3-yl)methanol as a brown oil.
- A suitably equipped reactor was charged with (2-(1-isopropyl-1H-pyrazol-5-yl)pyridin-3-yl)methanol hydrochloride salt (1 equivalent) and purified water. An aqueous sodium bicarbonate solution (8% NaHCO3) was added slowly to maintain the solution temperature between 17° C. to 25° C. After addition was complete, the reaction mixture was stirred at 17° C. to 25° C. and dichloromethane was added and the organic layer was separated. DCM solution was then distilled under atmospheric conditions at approximately 40° C. and the volume was reduced. DCM was added the reactor and the contents of the reactor are stirred at 20° C. to 30° C. until a clear solution is formed. The contents of the reactor were cooled to 0° C. to 5° C. and thionyl chloride was charged to the reactor slowly to maintain a temperature of ≤5° C. The reaction solution was stirred at 17° C. to 25° C. When the reaction was complete, a solution of HCl (g) in 1,4-dioxane (ca. 4 N, 0.8 equiv.) was charged to the reactor slowly to maintain the solution temperature between 17° C. and 25° C. The product 3-(chloromethyl)-2-(1-isopropyl-1H-pyrazol-5-yl)pyridine dihydrochloride salt was filtered washed with dichloromethane and dried.
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- A suitably equipped reactor was charged with 3-(chloromethyl)-2-(1-isopropyl-1H-pyrazol-5-yl)pyridine dihydrochloride salt (1 equivalent), sodium iodide (0.05 equivalent), sodium bicarbonate (4 equivalent), 1-methyl-2-pyrrolidinone (NMP), and 2,6-dihydroxy-benzaldehyde (1 to 1.05 equiv.). The reaction mixture was heated slowly to 40° C. to 50° C. and stirred until the reaction was complete. Water was then added and the reaction mixture was cooled and maintained at 17° C. to 25° C. When the water addition was complete, the reaction mixture was stirred at 17° C. to 25° C. and slowly cooled to 0° C. to 5° C. and the resulting solids were collected by filtration. The solids were washed with a 0° C. to 5° C. 2:1 water/NMP solution, followed by 0° C. to 5° C. water. The solids were filtered and dried to give 2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde as Form I or a mixture of 2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde as Form I and NMP solvates.
- A suitably equipped reactor was charged with 3-(chloromethyl)-2-(1-isopropyl-1H-pyrazol-5-yl)pyridine bishydrochloride salt (1 equivalent), sodium iodide (0.05 equivalent), sodium bicarbonate (3 to 4 equivalent), 1-methyl-2-pyrrolidinone (7 equivalent, NMP), and 2,6-dihydoxybenzaldehyde (1.05 equivalent). The reaction mixture was heated to 40° C. to 50° C. and stirred until the reaction was complete. Water (5 equivalent) was then added while maintaining the contents of the reactor at 40° C. to 46° C. and the resulting clear solution seeded with 2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde Form I. Additional water (5 equivalent) was added while maintaining the contents of the reactor at 40° C. to 50° C., the reactor contents cooled to 15° C. to 25° C., and the reactor contents stirred for at least 1 hour at 15° C. to 25° C. The solids were collected, washed twice with 1:2 NMP:water and twice with water, and dried to yield 2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde Form I devoid of 2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde as NMP solvates.
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- A suitably equipped reactor with an inert atmosphere was charged with crude 2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde (from Example 3 above) and MTBE and the contents stirred at 17° C. to 25° C. until dissolution was achieved. The reaction solution was passed through a 0.45 micron filter and MTBE solvent volume reduced using vacuum distillation at approximately 50° C. The concentrated solution was heated to 55° C. to 60° C. to dissolve any crystallized product. When a clear solution was obtained, the solution was cooled to 50° C. to 55° C. and n-heptane was added. 2-Hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde (e.g., Form II) seeds in a slurry of n-heptane were charged and the solution was stirred at 50° C. to 55° C. The solution was cooled to 45° C. to 50° C. and n-heptane was added to the reactor slowly while maintaining a reaction solution temperature of 45° C. to 50° C. The reaction solution are stirred at 45° C. to 50° C. and then slowly cooled to 17° C. to 25° C. A sample was taken for FTIR analysis and the crystallization was considered complete when FTIR analysis confirmed 2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)-benzaldehyde Form II. The contents of the reactor were then cooled to 0° C. to 5° C. and the solids were isolated and washed with cold n-heptane and dried.
Claims (37)
1. A process of synthesizing Compound (I):
wherein each R is —CH(CH2R1)—OR2 or tetrahydropyran-2-yl optionally substituted with one, two, or three alkyl; and wherein R1 is hydrogen or alkyl, and R2 is alkyl;
with an acid to provide compound (1):
2. The process of claim 1 further comprising formylating a compound of formula (4):
3. The process of claim 2 further comprising reacting compound (5):
with a vinyl ether of formula CHR1═CHOR2 (wherein R1 is hydrogen or alkyl and R2 is alkyl), or 3,4-dihydro-2H-pyran optionally substituted with one, two or three alkyl, in the presence of a weak acid to provide the compound of formula (4):
4. The process of claim 3 wherein compound (4) prepared according to claim 3 is treated in situ with a formylating agent to provide compound (2).
5. The process of claim 4 wherein compound (2) prepared according to claim 2 is treated in situ with an acid to provide compound (1).
6. The process of claim 1 wherein Compound (I) is crystallized from heptane and methyl tert-butyl ether at 45°+/−5° C. to 55+/−5° C. to give Compound (I) in substantially pure Form II characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 13.37°, 14.37°, 19.95° or 23.92±0.2° 2θ.
7. The process of claim 4 wherein Compound (I) is crystallized from heptane and methyl tert-butyl ether at 45°+/−5° C. to 55+/−5° C. to give Compound (I) in substantially pure Form II characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 13.37°, 14.37°, 19.95° or 23.92±0.2° 2θ.
8. The process of claim 5 wherein Compound (I) is crystallized from heptane and methyl tert-butyl ether at 45°+/−5° C. to 55+/−5° C. to give Compound (I) in substantially pure Form II characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 13.37°, 14.37°, 19.950 or 23.92±0.2° 2θ.9.
9. The process of claim 6 wherein Compound (I) is crystallized at 45° C. to 55° C. to give Compound (I) wherein at least 95% by wt of Compound (I) is Form II.
10. The process of claim 7 wherein Compound (I) is crystallized at 45° C. to 55° C. to give Compound (I) wherein at least 95% by wt of Compound (I) is Form II.
11. The process of claim 8 wherein Compound (I) is crystallized at 45° C. to 55° C. to give Compound (I) wherein at least 95% by wt of Compound (I) is Form II.
12. The process of claim 1 wherein R is —CH(CH3)—O—CH2CH3 and the acid for removal of the R groups is an inorganic acid.
13. The process of claim 1 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI.
14. The process of claim 3 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI.
15. The process of claim 4 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI.
16. The process of claim 5 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI.
17. The process of claim 6 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI.
18. The process of claim 7 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI.
19. The process of claim 8 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI.
20. The process of claim 9 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI.
21. The process of claim 10 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI.
22. The process of claim 11 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI.
23. The process of claim 1 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 50° C. to give substantially pure Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.820 and 26.44°±0.2° 2θ.
24. The process of claim 4 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 50° C. to give substantially pure Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.820 and 26.44°±0.2° 2θ.
25. The process of claim 5 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 50° C. to give substantially pure Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.820 and 26.44°±0.2° 2θ.
26. The process of claim 6 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 50° C. to give substantially pure Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.820 and 26.44°±0.2° 2θ.
27. The process of claim 7 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 50° C. to give substantially pure Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.820 and 26.44°±0.2° 2θ.
28. The process of claim 8 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 50° C. to give substantially pure Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.820 and 26.44°±0.2° 2θ.
29. The process of claim 9 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 50° C. to give substantially pure Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.820 and 26.44°±0.2° 2θ.
30. The process of claim 10 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 50° C. to give substantially pure Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.820 and 26.44°±0.2° 2θ.
31. The process of claim 11 wherein R is —CH(CH3)—O—CH2CH3, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 50° C. to give substantially pure Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.820 and 26.44°±0.2° 2θ.
32. The process of claim 1 wherein R is —CH(CH3)—O—CH2CH3, the acid for the removal of R group is hydrochloric acid, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 46° C. to give Compound (I) that at least 95% by weight Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82° and 26.44°±0.2°2θ.
33. The process of claim 4 wherein R is —CH(CH3)—O—CH2CH3, the acid for the removal of R group is hydrochloric acid, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 46° C. to give Compound (I) that at least 95% by weight Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82° and 26.44°±0.2° 2θ.
34. The process of claim 5 wherein R is —CH(CH3)—O—CH2CH3, the acid for the removal of R group is hydrochloric acid, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 46° C. to give Compound (I) that at least 95% by weight Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.82° and 26.44°±0.2°2θ.
35. The process of claim 7 wherein R is —CH(CH3)—O—CH2CH3, the acid for the removal of R group is hydrochloric acid, the weak acid is pyridinium tosylate, the formylating agent is n-BuLi and DMF, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 46° C. to give Compound (I) that at least 95% by weight Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.820 and 26.44°±0.2° 2θ.
36. The process of claim 8 wherein R is —CH(CH3)—O—CH2CH3, the acid for the removal of R group is hydrochloric acid, the weak acid is pyridinium tosylate, the formylating agent is n-BuLi and DMF, LG is chloro and the alkylation reaction is carried out in N-methyl-2-pyrrolidinone in the presence of sodium bicarbonate and a catalytic amount of NaI and Compound (I) is crystallized from the reaction mixture by addition of water at 40° C. to 46° C. to give Compound (I) that at least 95% by weight Form I characterized by a XRPD pattern comprising a X-ray powder diffraction peak (Cu Kα radiation) at one or more of 12.82°, 15.74°, 16.03°, 16.63°, 17.60°, 25.14°, 25.820 and 26.44°±0.2° 2θ.
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US17/895,619 US20230219922A1 (en) | 2016-05-12 | 2022-08-25 | Process for synthesizing 2-hydroxy-6-((2-(1-isopropyl-1h-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde |
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US16/101,251 US10577345B2 (en) | 2016-05-12 | 2018-08-10 | Process for synthesizing 2-hydroxy-6-((2-(1-isopropyl-1H-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde |
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US17/571,762 US20220135533A1 (en) | 2016-05-12 | 2022-01-10 | Process for synthesizing 2-hydroxy-6-((2-(1-isopropyl-1h-pyrazol-5-yl)-pyridin-3-yl)methoxy)benzaldehyde |
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