US20170144890A1 - Glycoxy silanes as a source of silica and silicate precipitates - Google Patents
Glycoxy silanes as a source of silica and silicate precipitates Download PDFInfo
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- US20170144890A1 US20170144890A1 US15/425,981 US201715425981A US2017144890A1 US 20170144890 A1 US20170144890 A1 US 20170144890A1 US 201715425981 A US201715425981 A US 201715425981A US 2017144890 A1 US2017144890 A1 US 2017144890A1
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 172
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 86
- 150000004756 silanes Chemical class 0.000 title abstract description 7
- 239000002244 precipitate Substances 0.000 title description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 title 1
- 239000011148 porous material Substances 0.000 claims abstract description 9
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 4
- 238000009826 distribution Methods 0.000 claims abstract 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 33
- 239000002253 acid Substances 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 9
- 238000004090 dissolution Methods 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 6
- -1 silicon alkoxide Chemical class 0.000 claims description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical group [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 3
- 239000000908 ammonium hydroxide Substances 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 239000000706 filtrate Substances 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 3
- 150000000185 1,3-diols Chemical class 0.000 claims description 2
- 238000001914 filtration Methods 0.000 claims description 2
- 230000003472 neutralizing effect Effects 0.000 claims 5
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims 3
- 125000005210 alkyl ammonium group Chemical group 0.000 claims 2
- 229920005862 polyol Polymers 0.000 claims 2
- 150000003077 polyols Chemical class 0.000 claims 2
- 238000004064 recycling Methods 0.000 claims 2
- 150000004072 triols Chemical class 0.000 claims 2
- 150000000180 1,2-diols Chemical class 0.000 claims 1
- 150000000190 1,4-diols Chemical class 0.000 claims 1
- 229910014571 C—O—Si Inorganic materials 0.000 claims 1
- 150000003863 ammonium salts Chemical class 0.000 claims 1
- 150000002009 diols Chemical class 0.000 claims 1
- 230000003301 hydrolyzing effect Effects 0.000 claims 1
- 238000005406 washing Methods 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 26
- 230000015572 biosynthetic process Effects 0.000 abstract description 6
- 239000002245 particle Substances 0.000 abstract description 6
- 230000000035 biogenic effect Effects 0.000 abstract description 4
- 239000002105 nanoparticle Substances 0.000 abstract 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 27
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 239000000463 material Substances 0.000 description 18
- 239000000243 solution Substances 0.000 description 18
- 238000001556 precipitation Methods 0.000 description 16
- VKUFFYZDPJYMKO-UHFFFAOYSA-J 2-hydroxyacetate silicon(4+) Chemical compound [Si+4].OCC([O-])=O.OCC([O-])=O.OCC([O-])=O.OCC([O-])=O VKUFFYZDPJYMKO-UHFFFAOYSA-J 0.000 description 15
- 238000003756 stirring Methods 0.000 description 11
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000000843 powder Substances 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 7
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 6
- 238000000605 extraction Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000001157 Fourier transform infrared spectrum Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000002243 precursor Substances 0.000 description 5
- 238000003980 solgel method Methods 0.000 description 5
- 239000010457 zeolite Substances 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 229940075620 somatostatin analogue Drugs 0.000 description 4
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 239000011260 aqueous acid Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000007832 Na2SO4 Substances 0.000 description 2
- 229910003910 SiCl4 Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 150000004703 alkoxides Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 2
- 150000003384 small molecules Chemical class 0.000 description 2
- 239000002352 surface water Substances 0.000 description 2
- 0 *O[Si](O*)(O*)O*.C.Cl[Si](Cl)(Cl)Cl.O=[Si]=O.[SiH4].[SiH4].[SiH4] Chemical compound *O[Si](O*)(O*)O*.C.Cl[Si](Cl)(Cl)Cl.O=[Si]=O.[SiH4].[SiH4].[SiH4] 0.000 description 1
- KPJPQCZXXMMMDC-UHFFFAOYSA-N CCO[Si](OCC)(OCC)OCC.OCCCO.OCCCO[Si](OCCCO)(OCCCO)OCCCO Chemical compound CCO[Si](OCC)(OCC)OCC.OCCCO.OCCCO[Si](OCCCO)(OCCCO)OCCCO KPJPQCZXXMMMDC-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- AEMRFAOFKBGASW-UHFFFAOYSA-M Glycolate Chemical compound OCC([O-])=O AEMRFAOFKBGASW-UHFFFAOYSA-M 0.000 description 1
- BPRRBPGBYAWIIM-UHFFFAOYSA-L O=S(=O)(O)O.O=S(=O)(O[Na])O[Na].O=[Si](O[Na])O[Na].O=[Si](O[Na])O[Na].O=[Si]=O.O=[Si]=O.O[Si](O)(O)O.O[Si](O)(O)O Chemical compound O=S(=O)(O)O.O=S(=O)(O[Na])O[Na].O=[Si](O[Na])O[Na].O=[Si](O[Na])O[Na].O=[Si]=O.O=[Si]=O.O[Si](O)(O)O.O[Si](O)(O)O BPRRBPGBYAWIIM-UHFFFAOYSA-L 0.000 description 1
- ATQAIQVGMWXBKO-UHFFFAOYSA-O O=[Si]=O.OCCO.OCCO[Si-]1OCCO1.OCCO[Si-]1OCCO1.OCCO[Si](OCCO)(OCCO)OCCO.OCCO[Si](OCCO)(OCCO)OCCO.OCCO[Si](OCCO)(OCCO)OCCO.OCCO[Si]1(OCCO)OCCO1.OCCO[Si]1(OCC[OH2+])OCCO1.[CH3+].[CH3+].[CH3+] Chemical compound O=[Si]=O.OCCO.OCCO[Si-]1OCCO1.OCCO[Si-]1OCCO1.OCCO[Si](OCCO)(OCCO)OCCO.OCCO[Si](OCCO)(OCCO)OCCO.OCCO[Si](OCCO)(OCCO)OCCO.OCCO[Si]1(OCCO)OCCO1.OCCO[Si]1(OCC[OH2+])OCCO1.[CH3+].[CH3+].[CH3+] ATQAIQVGMWXBKO-UHFFFAOYSA-O 0.000 description 1
- WCCZFKOMDWLVQT-UHFFFAOYSA-N O=[Si]=O.OCCO[Si-]1OCCO1.OCCO[Si](OCCO)(OCCO)OCCO.[CH3+] Chemical compound O=[Si]=O.OCCO[Si-]1OCCO1.OCCO[Si](OCCO)(OCCO)OCCO.[CH3+] WCCZFKOMDWLVQT-UHFFFAOYSA-N 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910007156 Si(OH)4 Inorganic materials 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 238000003916 acid precipitation Methods 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000012700 ceramic precursor Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 125000004404 heteroalkyl group Chemical group 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229910001387 inorganic aluminate Inorganic materials 0.000 description 1
- 229910052909 inorganic silicate Inorganic materials 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000013335 mesoporous material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000008450 motivation Effects 0.000 description 1
- 238000006384 oligomerization reaction Methods 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000000135 prohibitive effect Effects 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000012686 silicon precursor Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000000235 small-angle X-ray scattering Methods 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000012703 sol-gel precursor Substances 0.000 description 1
- 239000002195 soluble material Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000000352 supercritical drying Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
- C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B39/00—Compounds having molecular sieve and base-exchange properties, e.g. crystalline zeolites; Their preparation; After-treatment, e.g. ion-exchange or dealumination
- C01B39/02—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof; Direct preparation thereof; Preparation thereof starting from a reaction mixture containing a crystalline zeolite of another type, or from preformed reactants; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/14—Pore volume
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Definitions
- silica containing materials tetramethoxy or tetraethoxy silanes (TMOS or TEOS). These precursor materials combined with either an acid or base catalyst and water to hydrolyze the precursor to form a variety of silica-containing materials.
- Polymeric silica contains residual alkoxy groups that can be used to form thin films or spinning fibers or used for processing mesoporous silicas or zeolitic materials with the addition of template molecules.
- secondary alkoxides of other metals for example aluminum, titanium, hafnium and zirconium alkoxides may be added to make mixed-metal sol-gel derived “hybrid materials.”
- organic monomers or polymers or organic functionalized silicon alkoxides such as R—Si(OEt) 3 or R 2 Si(OEt) 2 may be used to introduce organic groups into the resulting mixed-metal sol-gel derived “hybrid materials.”
- Organic/Inorganic Hybrid Materials MRS Symp. Ser. Vol. 519, R. M. Laine, C. Sanchez, C. J. Brinker, E. Giannelis eds. December 1998; Organic/Inorganic Hybrid Materials 2000, MRS Symp. Ser. Vol. 628, R. M. Laine, C. Sanchez, and C. J. Brinker, eds. Mater. Res.
- Precursors of silicon based materials are typically not water soluble and must be hydrolyzed in a solvent that allows them to become miscible in water so that efficient hydrolysis can be obtained.
- TMOS and TEOS are typically hydrolyzed in water/MeOH or EtOH mixtures to create a single phase solution.
- researchers have made modified precursors by treating TMOS or TEOS with ligands that transform them into water-soluble materials.
- TMOS or TEOS are reacted with ethylene glycol or propylene glycol and a catalyst to form water soluble alkoxides that are hydrolyzed to produce silica-modified hybrid materials or mixed metal systems and/or mesoporous materials. See, for example N. Hüsing and U.
- alkoxysilanes derived primarily by the direct reaction of alcohols with silicon metal as suggested in reaction (1) below wherein some form of catalyst is used to promote the reaction.
- the alkoxy silane Si(OR 4 ) is made by a more expensive route, reaction (2), that requires handling toxic and polluting SiCl 4 .
- SiCl 4 is prepared from reaction of Si metal with HCl, as in reaction (3).
- Silicon metal is made by carbothermal reduction of SiO 2 and carbon as suggested by reaction, (4), however the exact process is more complex and the yields are not quantitative.
- FIG. 1 This typical industrial process scheme used to make 1000 ton/year quantities of precipitated silica is shown in FIG. 1 . Note that considerable CO 2 is released into the atmosphere during this process. In addition, considerable amounts of Na 2 SO 4 are produced as waste products that must be disposed of, thereby adding to the costs of the process.
- the first reaction step produces molten sodium silicate at high temperature that is thereafter acidified with an acid such as H 2 SO 4 .
- the result is an aqueous solution of sodium sulfate and some form of silicic acid, such as Si(OH) 4 or oligomers thereof.
- the current invention includes a process wherein a biogenic silica is dissolved using a catalytic amount of base rather than a stoichiometric amount in a solvent that is typically a 1,2 or 1,3 diol which coordinates with the silica to form alkoxysilanes of the type Si(OR) 4 where R is some group chosen from —CH 2 —, —CH 2 O—, —CH(R′)—, —CH(R′)O—, —CH(OH)— and where R 1 is alkyl, aryl, heteroalkyl, hetoraryl and alternate forms known to those skilled in the art.
- the by-product water is distilled out to drive the dissolution reaction. This method of dissolution is that described in patent application Ser. No. 61/587,188 by the same inventors and is specifically incorporated by reference herein.
- This method of dissolution uses catalytic amounts of base to dissolve silica and produces water soluble alkoxysilanes, typically glycoxy silanes.
- the dissolution reaction requires temperatures much less than 1400° C. and typically less than 300° C. Because the resulting product is water soluble, the use of a second solvent to hydrolyze the resulting alkoxysilane is normally unnecessary.
- the amount of acid required is only that necessary to neutralize the catalytic amount of base used in the dissolution reaction.
- precipitation can be effected simply by adding water without base or by contacting the dissolved glyoxysilianes with a CO 2 rich atmosphere such as is produced in the burning of rice hulls.
- This is the reverse of reaction (9) (below) used to synthesize glycolato silicates.
- the cost of base and acid needed to produce precipitated silica is much less than traditional methods.
- a further advantage of using the reverse of reaction (9) is that following filtration of the precipitated silica, the recovered liquid is still quite basic and can be reused in the dissolution process of reaction (9) with fresh biogenic silica.
- a further advantage is that the resulting alkoxysilanes are either simple liquids or oligomers whose viscosity can be controlled by the extent of oligomerization. Consequently, the viscosity of the mostly water-soluble intermediate can be adjusted to control the rate and degree of growth of silica particle during precipitation.
- FIG. 1 is a flow chart of a prior art Precipitated silica production flowchart.
- FIG. 2 is an FTIR spectrum of silica precipitated per the process described in Example 1.
- FIG. 3 is a TGA/DTA of silica precipitated in acid water from Example 1.
- FIG. 4 is an FTIR spectrum of silica precipitated per the process described in Example 2.
- FIG. 5 is a TGA/DTA of silica precipitated in hot water from Example 2.
- FIG. 6 is an FTIR spectrum of silica precipitated in hot water per the process described in Example 3.
- FIG. 7 is a TGA/DTA of silica precipitated in accordance with Example 3.
- FIG. 8 is an FTIR spectrum at silica precipitated per the process described in Example 4.
- FIG. 9 is a TGA/DTA of silica precipitated in accordance with Example 4.
- FIG. 10 is an FTIR spectrum of precipitated silica made by H 2 SO 4 addition.
- FIG. 11 is an FTIR of silica precipitated by acetic acid addition.
- FIG. 12 is a TGA/DTA of silica precipitated by reverse acid addition when the acid is acetic acid.
- FIG. 13 is an FTIR of silica precipitated by acetic acid addition.
- FIG. 14 is a TGA/DTA of silica precipitated by reverse acid addition where the acid is acetic acid.
- FIG. 15 is a TGA/DTA of silica made by reverse acid addition where the acid is acetic acid.
- the resulting mixture of glycoxysilane and silicon glycolate from reaction (9) can be treated with anhydrous acid to neutralize the base leaving pure Si(EGH) 4 as in reaction (10).
- the as-formed reaction solution can be treated with excess water with or without added acid or CO 2 to perform the reverse of reaction (9) and precipitate silica as seen in reaction (11). It is also possible to remove the salt impurities by ion exchange before or after precipitation to make high purity silicon glycolates and/or precipitated silica. The degree of purity will be defined by the care in which the impurities are removed and/or the purity of the reactants and vessels in which reaction is effected.
- Distilled water (4.5 L) was introduced to a 12-L-reactor, equipped with a mechanical stirrer and heating mantle, and pre-heated to 80°. Then, silicon glycolate solution (3570 g, CY ⁇ 8 wt %) was added with vigorous stirring. Sufficient sulfuric acid (10%) was added to bring the pH to 5. The mixture was then left stirring vigorously at 80° C. 1 h.
- a basic agent (ammonium hydroxide) was added until the pH was adjusted to 8. Vigorous stirring was continued for 1 h more. Finally the mixture was cooled and filtered. The obtained white silica was then washed in hot methanol and then filtered. The white silica powder was oven dried at 70° C. for 2-5 days and then milled with zirconia media for 3 h.
- the FTIR and TGA analyses are shown in FIGS. 10 and 11 .
- the precipitated silica may also be obtained as a zeolite.
- Zeolites are crystalline solids structures made of silicon, aluminum and oxygen that form a framework with cavities and internal channels where cations, water and/or small molecules may reside.
- Zeolites exhibit an open 3D framework made of SiO 4 and AlO 4 tetrahedra linked to each other by sharing all the oxygen atoms to form regular intra-crystalline cavities and channels of molecular dimensions.
- a defining feature of zeolites is that their frameworks are made up of 4-coordinated atoms forming tetrahedra.
- the framework structure may contain linked cages, cavities or channels, which are big enough to allow small molecules to enter. The system of large voids explains the consistent low specific density of these compounds.
- the voids are interconnected and form long wide channels of various sizes depending on the compound. These channels allow the easy drift of the resident ions and molecules into and out of the structure.
- the aluminosilicate framework is negatively charged and attracts the positive cations that reside in cages to compensate for the negative charge of the framework.
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Abstract
The present invention discloses glycoxy silanes as a source of silica and silica precipitated by advantageous chemical reactions preferably beginning with biogenic silica. Alkoxy C—O—S1 are hydrolyzed in a controlled fashion to nucleate formation of nanoparticles of silica. The growth rate of the particles is controlled by various parameters such that particles of known sizes, size distributions, specific surface areas and pore sizes and size distributions are recovered.
Description
- This application claims the benefit of and is a divisional of U.S. patent application Ser. No. 13/744,326 filed on Jan. 17, 2013, which claims the benefit of Provisional Application No. 61/587,188 filed Jan. 17, 2012 and U.S. Provisional Application No. 61/587,501 filed Jan. 17, 2012, which applications are incorporated herein by reference.
- The open and the patent literature on sol-gel processing of silica containing materials is extensive. Most of the chemical compounds used as a precursors to silica containing materials are either tetramethoxy or tetraethoxy silanes (TMOS or TEOS). These precursor materials combined with either an acid or base catalyst and water to hydrolyze the precursor to form a variety of silica-containing materials. Polymeric silica contains residual alkoxy groups that can be used to form thin films or spinning fibers or used for processing mesoporous silicas or zeolitic materials with the addition of template molecules. Also, secondary alkoxides of other metals for example aluminum, titanium, hafnium and zirconium alkoxides may be added to make mixed-metal sol-gel derived “hybrid materials.”
- Alternately, organic monomers or polymers or organic functionalized silicon alkoxides such as R—Si(OEt)3 or R2Si(OEt)2 may be used to introduce organic groups into the resulting mixed-metal sol-gel derived “hybrid materials.” Organic/Inorganic Hybrid Materials, MRS Symp. Ser. Vol. 519, R. M. Laine, C. Sanchez, C. J. Brinker, E. Giannelis eds. December 1998; Organic/Inorganic
Hybrid Materials 2000, MRS Symp. Ser. Vol. 628, R. M. Laine, C. Sanchez, and C. J. Brinker, eds. Mater. Res. Soc., 2001; Organic/Inorganic Hybrid Materials 2002, MRS Symp. Ser. Vol. 726, C. Sanchez, R. M. Laine, S. Yang and C. J. Brinker, eds. Mater. Res. Soc., December 2002; D. W. Schaeffer, Science 243 (1989) 1023-1027. - Precursors of silicon based materials are typically not water soluble and must be hydrolyzed in a solvent that allows them to become miscible in water so that efficient hydrolysis can be obtained. For example, TMOS and TEOS are typically hydrolyzed in water/MeOH or EtOH mixtures to create a single phase solution. Occasionally, researchers have made modified precursors by treating TMOS or TEOS with ligands that transform them into water-soluble materials. TMOS or TEOS are reacted with ethylene glycol or propylene glycol and a catalyst to form water soluble alkoxides that are hydrolyzed to produce silica-modified hybrid materials or mixed metal systems and/or mesoporous materials. See, for example N. Hüsing and U. Schubert, “Formation and Structure of Porous Gel Networks from Si(OMe)4 in the Presence of A(CH2)nSi(OR)3 (A) Functional Group) Chem. Mater. 1998, 10, 3024-3032; V. Torma, H. Peterlik, U. Bauer, W. Rupp, N. Hüsing, S. Bernstorff, M. Steinhart, G. Goerigk, U. Schubert, “Mixed Silica Titania Materials Prepared from a Single-Source Sol-Gel Precursor: A Time-Resolved SAXS Study of the Gelation, Aging, Supercritical Drying, and Calcination Processes,” Chem. Mater. 2005, 17, 3146-3153; D. Brandhuber, V. Torma, C. Raab, H. Peterlik, A. Kulak, Nicola Hüsing, “Glycol-Modified Silanes in the Synthesis of Mesoscopically Organized Silica Monoliths with Hierarchical Porosity,” Chem. Mater. 2005, 17, 4262-4271; S. Hartmann, D. Brandhuber, N. Hüsing, “Glycol-Modified Silanes: Novel Possibilities for the Synthesis of Hierarchically Organized (Hybrid) Porous Materials,” Acc. Chem. Res. 2007, 40, 885-894; M. Weinberger, “Organosilica Monoliths with Multiscale Porosity: Detailed Investigation of their formation and their potential as ceramic precursors,” Dokter der Wissenschaft, November 9 (2009); M. Weinberger, S. Puchegger, T. Fröschl, F. Babonneau, H. Peterlik, N. Hüsing, “Sol-Gel Processing of a Glycolated Cyclic Organosilane and Its Pyrolysis to Silicon Oxycarbide Monoliths with Multiscale Porosity and Large Surface Areas,” Chem. Mater. 2010, 22, 1509-1520; T. Nakamura, H. Yamada, Y. Yamada, A. Gürtanyel, S. Hartmann, Nicola Hüsing, K. Yano, “New Strategy Using Glycol-Modified Silane to Synthesize Monodispersed Mesoporous Silica Spheres Applicable to Colloidal Photonic Crystals, Langmuir 2010, 26, 2002-2007; Y. Suzuki, M. Kakihana, “New Water Soluble and Handy Silicon Precursor for Synthesis of (Y,Ce,Gd)2SiO5 Phosphor,” IOP Conference Series: Materials Sci. and Eng. 2009, 1 012012; K. Matsumara, M. Asai, S. Ichinohe, “Preparation of Water-Soluble Organic Silicon Compounds,” U.S. Pat. No. 6,077,966, Jun. 20, 2000; and H. Eck, M. Roth, “Aqueous redispersible powders which contain a water-soluble polymer and at least one organic silicon compound and process for preparing the same.” U.S. Pat. No. 4,704,416 November 1987.
- These examples use alkoxysilanes derived primarily by the direct reaction of alcohols with silicon metal as suggested in reaction (1) below wherein some form of catalyst is used to promote the reaction. Occasionally, the alkoxy silane Si(OR4) is made by a more expensive route, reaction (2), that requires handling toxic and polluting SiCl4. It is important to note that SiCl4 is prepared from reaction of Si metal with HCl, as in reaction (3). Silicon metal is made by carbothermal reduction of SiO2 and carbon as suggested by reaction, (4), however the exact process is more complex and the yields are not quantitative.
- Furthermore, the cost of making Si(OR)4 and the resulting commercial production of precipitated silica is usually prohibitive because of the carbothermal reduction step. An exception is the production of precipitated silica used for polishing silicon wafers for chip manufacture where purities equal to or greater than 99.999999 (“eight 9s”) are needed and TMOS or TEOS can be distilled to these purities.
- For these reasons, existing processes that use TEOS (or TMOS) or water soluble silica modified materials derived by substitution as shown in reaction (5) are usually mere academic exercises that are not suitable for large scale, efficient, commercial use.
- To date, little commercial motivation exists to develop synthetic/processing routes to large quantities of precipitated silicas from these alkoxysilanes because of the multistep, high temperature reaction costs of the starting materials. Consequently, the major route to precipitated silicas is the series of reactions (6)-(8):
- This typical industrial process scheme used to make 1000 ton/year quantities of precipitated silica is shown in
FIG. 1 . Note that considerable CO2 is released into the atmosphere during this process. In addition, considerable amounts of Na2SO4 are produced as waste products that must be disposed of, thereby adding to the costs of the process. - Referring to
FIG. 1 , the first reaction step produces molten sodium silicate at high temperature that is thereafter acidified with an acid such as H2SO4. The result is an aqueous solution of sodium sulfate and some form of silicic acid, such as Si(OH)4 or oligomers thereof. - This is a high temperature process requiring stoichiometric amounts of base and acid to effect precipitation. Precipitation occurs in an aqueous environment that produces large concentrations of byproduct salts such as Na2SO4. The resulting silica powders such as HISIL 223 have salt contamination typically less than 2 wt %.
- The current invention includes a process wherein a biogenic silica is dissolved using a catalytic amount of base rather than a stoichiometric amount in a solvent that is typically a 1,2 or 1,3 diol which coordinates with the silica to form alkoxysilanes of the type Si(OR)4 where R is some group chosen from —CH2—, —CH2O—, —CH(R′)—, —CH(R′)O—, —CH(OH)— and where R1 is alkyl, aryl, heteroalkyl, hetoraryl and alternate forms known to those skilled in the art. In the process of dissolution, the by-product water is distilled out to drive the dissolution reaction. This method of dissolution is that described in patent application Ser. No. 61/587,188 by the same inventors and is specifically incorporated by reference herein.
- This method of dissolution uses catalytic amounts of base to dissolve silica and produces water soluble alkoxysilanes, typically glycoxy silanes. The dissolution reaction requires temperatures much less than 1400° C. and typically less than 300° C. Because the resulting product is water soluble, the use of a second solvent to hydrolyze the resulting alkoxysilane is normally unnecessary.
- Additionally, to obtain precipitated silica, the amount of acid required, is only that necessary to neutralize the catalytic amount of base used in the dissolution reaction. However, precipitation can be effected simply by adding water without base or by contacting the dissolved glyoxysilianes with a CO2 rich atmosphere such as is produced in the burning of rice hulls. This is the reverse of reaction (9) (below) used to synthesize glycolato silicates. Thus, the cost of base and acid needed to produce precipitated silica is much less than traditional methods. A further advantage of using the reverse of reaction (9) is that following filtration of the precipitated silica, the recovered liquid is still quite basic and can be reused in the dissolution process of reaction (9) with fresh biogenic silica.
- A further advantage is that the resulting alkoxysilanes are either simple liquids or oligomers whose viscosity can be controlled by the extent of oligomerization. Consequently, the viscosity of the mostly water-soluble intermediate can be adjusted to control the rate and degree of growth of silica particle during precipitation.
-
FIG. 1 is a flow chart of a prior art Precipitated silica production flowchart. -
FIG. 2 is an FTIR spectrum of silica precipitated per the process described in Example 1. -
FIG. 3 is a TGA/DTA of silica precipitated in acid water from Example 1. -
FIG. 4 is an FTIR spectrum of silica precipitated per the process described in Example 2. -
FIG. 5 is a TGA/DTA of silica precipitated in hot water from Example 2. -
FIG. 6 is an FTIR spectrum of silica precipitated in hot water per the process described in Example 3. -
FIG. 7 is a TGA/DTA of silica precipitated in accordance with Example 3. -
FIG. 8 is an FTIR spectrum at silica precipitated per the process described in Example 4. -
FIG. 9 is a TGA/DTA of silica precipitated in accordance with Example 4. -
FIG. 10 is an FTIR spectrum of precipitated silica made by H2SO4 addition. -
FIG. 11 is an FTIR of silica precipitated by acetic acid addition. -
FIG. 12 is a TGA/DTA of silica precipitated by reverse acid addition when the acid is acetic acid. -
FIG. 13 is an FTIR of silica precipitated by acetic acid addition. -
FIG. 14 is a TGA/DTA of silica precipitated by reverse acid addition where the acid is acetic acid. -
FIG. 15 is a TGA/DTA of silica made by reverse acid addition where the acid is acetic acid. - It is well known that the rate of precipitation of silica can be controlled by pH, temperature and also solution viscosity, R. K. Iler, The chemistry of silica; John Wiley & Sons: New York, 1979, C. J. Brinker, G. Scherer Sol-Gel science: The Physics and Chemistry of Sol-Gel Processing, Academic Press, Boston, 1990, Sol-Gel Science and Technology; E. J. A. Pope, S. Sakka, L. C. Klein, Eds.; Amer. Cer. Soc., Ohio, 1997) which in turn controls the physical properties of the resulting precipitated silica. Control of viscosity in silica precipitation is not a traditionally used to control particle properties.
- The reactions below enable the creation of precipitated silicas from glycoxysilanes.
- Thus, for example, the resulting mixture of glycoxysilane and silicon glycolate from reaction (9) can be treated with anhydrous acid to neutralize the base leaving pure Si(EGH)4 as in reaction (10). Alternately, the as-formed reaction solution can be treated with excess water with or without added acid or CO2 to perform the reverse of reaction (9) and precipitate silica as seen in reaction (11). It is also possible to remove the salt impurities by ion exchange before or after precipitation to make high purity silicon glycolates and/or precipitated silica. The degree of purity will be defined by the care in which the impurities are removed and/or the purity of the reactants and vessels in which reaction is effected.
- The following examples illustrate several methods of precipitating silica.
- To a dry 12-L-reactor, equipped with a mechanical stirrer, was added 1600 g of silicon glycolate solution (≈20 wt % silica). Thereafter 2.6 L of aqueous acid pH<4 was added with vigorous stirring. After addition, the reaction mixture was stirred for an additional 30 min and the resulting precipitated silica filtered off. This recovered silica was stirred in methanol (15 h), then washed with a 10% HCl solution, filtered and washed with cold water. It was then dried at 65° C. for 3 days. The yields minus mechanical losses are ≈80% with typical specific surface areas (SSA=700 m2/g). The FTIR and TGA analyses are shown in
FIGS. 2 and 3 . - To a dry 12-L-reactor, equipped with a mechanical stirrer, was added 3265 g of concentrated silicon glycolate solution, CY (Clean Yield)≈21 wt %, with vigorous stirring to 4 L of water pre-heated to 80° C. The solution was stirred for 1 h, cooled down and filtered. The obtained silica was then stirred in 3 L of hot HCl (10%) for 2 h, filtered and washed with cold water giving an 85% yield of white powder after drying at 65° C. The SSA was found to be 225 m2/g. The FTIR and TGA analyses are shown in
FIGS. 4 and 5 . In this example, the particle surfaces are highly hydrated but this surface water can be removed by heating at 200° C. as suggested by the TGA data. - To a dry 12-L-reactor, equipped with a mechanical stirrer and a heating mantle, was added 1440 g of concentrated silicon glycolate solution, CY≈15 wt % with vigorous stirring to 2.5 L of water pre-heated to 80° C. The solution was stirred for 1 h, cooled down and filtered. The recovered filtrate can be recycled directly to dissolve biogenic silica per reaction (9). The obtained silica was then stirred in 2 L of hot HCl (10%) for 2 h and filtered and washed with cold water giving an 83% yield of white powder after drying at 65° C. overnight. The SSA was found to be 470 m2/g. The FTIR and TGA analyses are shown in
FIGS. 6 and 7 . In this example, the particle surfaces are highly hydrated but this surface water can be removed by heating at 200° C. as suggested by the TGA data. - Water (700 ml) was added to a beaker and subjected to rapid stirring. This water was heated to 70° C. and then 236 g of silicon glycolate solution (CY=15 wt %) was added. The water/silicon glycolate mixture was heated to 80° with continuous agitation C for 1-2 h. Hydrochloric acid (10% solution) was added until the pH was adjusted to 5 and then the temperature was raised to 85°-90° C. The mixture was stirred for another 75 min and then filtered. The isolated silica was washed with cold water until the pH was 7. The precipitated silica was then washed with methanol, filtered and dried at 60° C. for 24 h resulting in an 86 wt % yield of a white powder with SSAs of 180-250 m2/g. The FTIR and TGA analyses are shown in
FIGS. 8 and 9 . - Distilled water (4.5 L) was introduced to a 12-L-reactor, equipped with a mechanical stirrer and heating mantle, and pre-heated to 80°. Then, silicon glycolate solution (3570 g, CY˜8 wt %) was added with vigorous stirring. Sufficient sulfuric acid (10%) was added to bring the pH to 5. The mixture was then left stirring vigorously at 80° C. 1 h.
- In an “aging” step, a basic agent (ammonium hydroxide) was added until the pH was adjusted to 8. Vigorous stirring was continued for 1 h more. Finally the mixture was cooled and filtered. The obtained white silica was then washed in hot methanol and then filtered. The white silica powder was oven dried at 70° C. for 2-5 days and then milled with zirconia media for 3 h. The FTIR and TGA analyses are shown in
FIGS. 10 and 11 . - Silicon glycolate (60 g, CY=15 wt. %) was added drop-wise to 160 mL of water pre-heated to 80° C. Acetic acid was added to decrease the pH to 5 and the suspension was left to stir for 1 h at 80° C. Ammonium hydroxide was then added to increase the pH to 8 and the suspension was left to stir for 1 h. Finally the suspension was cooled and filtered. The obtained white silica was then washed in hot methanol and then filtered. The silica powder was oven dried at 70° C. overnight and then dried at 250° C. for 35 min. The silica was obtained in 90% yield (8.1 g obtained, theoretical yield 9 g). The FTIR and TGA analyses are shown in
FIGS. 11 and 12 . - The precipitated silica may also be obtained as a zeolite. Zeolites are crystalline solids structures made of silicon, aluminum and oxygen that form a framework with cavities and internal channels where cations, water and/or small molecules may reside. Zeolites exhibit an open 3D framework made of SiO4 and AlO4 tetrahedra linked to each other by sharing all the oxygen atoms to form regular intra-crystalline cavities and channels of molecular dimensions. A defining feature of zeolites is that their frameworks are made up of 4-coordinated atoms forming tetrahedra. The framework structure may contain linked cages, cavities or channels, which are big enough to allow small molecules to enter. The system of large voids explains the consistent low specific density of these compounds. In zeolites used for various applications, the voids are interconnected and form long wide channels of various sizes depending on the compound. These channels allow the easy drift of the resident ions and molecules into and out of the structure. The aluminosilicate framework is negatively charged and attracts the positive cations that reside in cages to compensate for the negative charge of the framework.
- Distilled water (150 mL) was introduced to a 1-L-reactor, equipped with a magnetic stirrer and a heating mantle, and pre-heated to 80°. Then, silicon glycolate solution (55 g, CY˜17 wt %) was added with vigorous stirring. Then, 15 mL of acetic acid (10%) was added drop-wise. The mixture was left stirring vigorously at 80° C. for 30 min. The mixture was cooled down and filtered. The obtained white silica was then washed in hot methanol and filtered. The silica powder was oven dried at 70° C. overnight, and at 250° C. for 30 min. The FTIR and TGA analyses are shown in
FIGS. 13 and 14 . - The following references disclose general principles of sol-gel processing of silica containing materials and are specifically incorporated by reference.
-
- 1. R. K. Iler, The chemistry of silica; John Wiley & Sons: New York, 1979.
- 2. C. J. Brinker, G. Scherer Sol-Gel science: The Physics and Chemistry of Sol-Gel Processing, Academic Press, Boston, 1990.
- 3. Sol-Gel Science and Technology; E. J. A. Pope, S. Sakka, L. C. Klein, Eds.; Amer. Cer. Soc., Ohio, 1997.
- 4. Organic/Inorganic Hybrid Materials, MRS Symp. Ser. Vol. 519, R. M. Laine, C. Sanchez, C. J. Brinker, E. Giannelis eds. December 1998
- 5. Organic/
Inorganic Hybrid Materials 2000, MRS Symp. Ser. Vol. 628, R. M. Laine, C. Sanchez, and C. J. Brinker, eds. Mater. Res. Soc., 2001 - 6. Organic/Inorganic Hybrid Materials 2002, MRS Symp. Ser. Vol. 726, C. Sanchez, R. M. Laine, S. Yang and C. J. Brinker, eds. Mater. Res. Soc., December 2002.
- 7. D. W. Schaeffer, Science 243 (1989) 1023-1027.
Claims (15)
1. A method to precipitate silica comprising:
neutralizing an amount of base in a solution comprising a silicon alkoxide containing 10-40 wt % dissolved silica, wherein alkoxy groups are selected from the group consisting of 1,2; 1,3; 1,4 diols; and triols; and polyols and mixtures thereof; hydrolyzing alkoxy C—O—Si bonds;
recovering precipitated silica by filtration; and
recycling recovered filtrate into a dissolution process, wherein silica is dissolved in a base to produce water soluble alkoxysilanes.
2. The method of claim 1 , wherein water is added to reduce pH.
3. The method of claim 1 , further comprising the step of controlling the pH of the solution to control a parameter selected from the group consisting of surface area, pore size, size distribution, and pore volume and combinations thereof.
4. The method of claim 1 , wherein the neutralizing step comprises adding water and a sufficient amount of acid or CO2 gas to lower the pH below about 8 to control a parameter selected from the group consisting of surface area, pore size, size distribution, and pore volume and combinations thereof.
5. The method of claim 1 , wherein the neutralizing step comprises adding a sufficient amount of acid to lower the pH below 5 and adding a second base to control a parameter selected from the group consisting of surface area, pore size, size distribution, and pore volume and combinations thereof.
6. The method of claim 5 , wherein the second base is ammonium hydroxide or an ammonium salt and the precipitated silica is a crystalline solid structure.
7. The method of claim 1 , wherein the neutralizing step comprises adding a sufficient amount of acid to lower the pH below 8 and adding a long chain alkyl ammonium salt and the precipitated silica is a crystalline solid structure.
8. The method of claim 1 , wherein neutralizing the step of lowering the pH comprises adding a sufficient amount of acid to lower the pH below 5 and adding a second base comprising a short chain alkyl ammonium salt selected from the group consisting of (HOCH2CH2)N(CH3)3Cl; N(CH3)4Cl; (HOCH2CH2)N(CH3)3OH; N(CH3)4OH; and combinations thereof to yield (R4N)(OSiO1.5)8
9. The method of claim 1 , wherein the 1, 2 diol is ethylene glycol, and the 1,3 diol is propylene glycol or glycerol and combinations thereof
10. The method of claim 1 , wherein the silicon alkoxide contains approximately 20-35 wt % dissolved silica.
11. The method of claim 1 , wherein the recovering step is preformed at temperatures of −20 to 180 o C.
12. The method of claim 1 , further comprising the steps of acid washing and drying the precipitated silica to produce silica with specific surface areas in excess of 400 m2/g and pore volumes of 0.5 to 1.5 cc/g.
13. The method of claim 1 , wherein the precipitated silica is acid washed and dried to produce silica with purities ranging from 99% to 99.9999%.
14. The method of claim 1 wherein the precipitated silica is acid washed and dried to produce silica with water contents of 0.1-10 wt %.
15. The method of claim 1 further comprising the step of recycling a filtrate to recover the diols, triols or polyols.
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| US13/744,326 US9561966B2 (en) | 2012-01-17 | 2013-01-17 | Glycoxy silanes as a source of silica and silicate precipitates |
| US15/425,981 US20170144890A1 (en) | 2012-01-17 | 2017-02-06 | Glycoxy silanes as a source of silica and silicate precipitates |
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| US5833940A (en) | 1987-07-28 | 1998-11-10 | Enviroguard, Inc. | Production of soluble silicates from biogenetic silica |
| IL104722A (en) * | 1993-02-02 | 1998-04-05 | Rotem Fertilizers Ltd | Process for the manufacture of pure silica from rock containing it |
| BE1007148A3 (en) | 1993-05-17 | 1995-04-11 | Solvay | Support for catalyst, method for producing gel precursor media for catalyst, method for preparing a catalyst support, catalyst for olefin polymerization and method for olefin polymerization using the catalyst . |
| JP2853727B2 (en) | 1994-02-22 | 1999-02-03 | 日本ビクター株式会社 | Reproduction protection method and protection reproduction device |
| US6114280A (en) | 1996-05-06 | 2000-09-05 | Agritec, Inc. | Highly activated carbon from caustic digestion of rice hull ash and method |
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