US20150135994A1 - Solution processing of kesterite semiconductors - Google Patents
Solution processing of kesterite semiconductors Download PDFInfo
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- US20150135994A1 US20150135994A1 US14/608,600 US201514608600A US2015135994A1 US 20150135994 A1 US20150135994 A1 US 20150135994A1 US 201514608600 A US201514608600 A US 201514608600A US 2015135994 A1 US2015135994 A1 US 2015135994A1
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- hydrazine
- source
- solution
- kesterite
- film
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- 239000004065 semiconductor Substances 0.000 title description 2
- 238000010129 solution processing Methods 0.000 title 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims abstract description 109
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 22
- 239000002243 precursor Substances 0.000 claims abstract description 20
- 229910052711 selenium Inorganic materials 0.000 claims abstract description 18
- 150000007942 carboxylates Chemical class 0.000 claims abstract description 11
- 239000002245 particle Substances 0.000 claims abstract description 11
- 239000011701 zinc Substances 0.000 claims description 28
- 239000002002 slurry Substances 0.000 claims description 10
- SRWMQSFFRFWREA-UHFFFAOYSA-M zinc formate Chemical compound [Zn+2].[O-]C=O SRWMQSFFRFWREA-UHFFFAOYSA-M 0.000 claims description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 3
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 claims description 3
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 claims description 3
- 239000004246 zinc acetate Substances 0.000 claims description 3
- 239000000243 solution Substances 0.000 claims 8
- 239000011259 mixed solution Substances 0.000 claims 3
- 238000000034 method Methods 0.000 abstract description 23
- 238000000151 deposition Methods 0.000 abstract description 19
- 239000000758 substrate Substances 0.000 abstract description 16
- 238000000137 annealing Methods 0.000 abstract description 12
- 239000007787 solid Substances 0.000 abstract description 7
- 239000002904 solvent Substances 0.000 abstract description 7
- 150000001875 compounds Chemical class 0.000 abstract description 6
- 239000010408 film Substances 0.000 description 40
- 239000011669 selenium Substances 0.000 description 37
- 239000010949 copper Substances 0.000 description 25
- 239000011135 tin Substances 0.000 description 25
- 239000000976 ink Substances 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 10
- 150000004770 chalcogenides Chemical class 0.000 description 9
- 230000008021 deposition Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229910052750 molybdenum Inorganic materials 0.000 description 7
- 229910052725 zinc Inorganic materials 0.000 description 7
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- -1 chalcogenides compounds Chemical class 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 239000011733 molybdenum Substances 0.000 description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000011787 zinc oxide Substances 0.000 description 5
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 238000001878 scanning electron micrograph Methods 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- 238000000224 chemical solution deposition Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 238000004626 scanning electron microscopy Methods 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910001887 tin oxide Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005755 formation reaction Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 150000004771 selenides Chemical class 0.000 description 2
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 150000003752 zinc compounds Chemical class 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- SEUJAMVVGAETFN-UHFFFAOYSA-N [Cu].[Zn].S=[Sn]=[Se] Chemical compound [Cu].[Zn].S=[Sn]=[Se] SEUJAMVVGAETFN-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000001787 chalcogens Chemical class 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- PCRGAMCZHDYVOL-UHFFFAOYSA-N copper selanylidenetin zinc Chemical compound [Cu].[Zn].[Sn]=[Se] PCRGAMCZHDYVOL-UHFFFAOYSA-N 0.000 description 1
- WILFBXOGIULNAF-UHFFFAOYSA-N copper sulfanylidenetin zinc Chemical compound [Sn]=S.[Zn].[Cu] WILFBXOGIULNAF-UHFFFAOYSA-N 0.000 description 1
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- 238000010891 electric arc Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000013090 high-throughput technology Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000003049 inorganic solvent Substances 0.000 description 1
- 229910001867 inorganic solvent Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 239000011268 mixed slurry Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000007649 pad printing Methods 0.000 description 1
- 230000037361 pathway Effects 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000007767 slide coating Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
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- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0326—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising AIBIICIVDVI kesterite compounds, e.g. Cu2ZnSnSe4, Cu2ZnSnS4
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/28—Nitrogen-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/09—Carboxylic acids; Metal salts thereof; Anhydrides thereof
- C08K5/098—Metal salts of carboxylic acids
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Definitions
- the present disclosure relates to a method of depositing a kesterite film. More particularly, the present disclosure relates to a method of depositing a kesterite film from a precursor solution.
- Thin-film chalcogenide-based solar cells provide a promising pathway to cost parity between photovoltaic and conventional energy sources.
- Copper-zinc-tin-chalcogenide kesterites have been investigated as potential alternatives because they are based on readily available and lower cost elements.
- photovoltaic cells with kesterites even when produced using high cost vacuum-based methods, at best only ⁇ 6.7 percent efficiencies, see Katagiri, H. et al. Development of CZTS-based thin film solar cells; Thin Solid Films 517, 2455-2460 (2009).
- zinc compounds such as ZnS and ZnSe, together with most transition metals and metal chalcogenides, show negligible solubility in hydrazine-based solvent systems.
- the present disclosure discloses various methods for depositing a kesterite film; a hydrazine-based precursor solution for forming the kesterite film; and photovoltaic devices including the solution deposited kesterite film.
- a method of depositing a kesterite film comprising a compound of the formula:
- said method comprising contacting a hydrazine-based solvent, a source of Cu, a source of Sn, a source of Zn carboxylate, a source of at least one of S and Se, under conditions sufficient to form a solution substantially free of solid particles; applying the solution onto a substrate to form a thin layer; and annealing the thin layer at a temperature, pressure, and length of time sufficient to form the kesterite film.
- a method of depositing a kesterite film comprising a compound of the formula:
- said method comprising contacting hydrazine, a source of Cu, and a source of at least one of S and Se forming solution A; contacting hydrazine, a source of Sn, a source of at least one of S and Se, and a source of Zn forming dispersion B; mixing said solution A and said dispersion B under conditions sufficient to form a solution substantially free of particles; applying said solution onto a substrate to form a thin layer; and annealing the thin layer at a temperature, pressure, and length of time sufficient to form said kesterite film.
- a hydrazine-based precursor solution for forming a kesterite film comprises a source of Cu, a source of Sn, a source of Zn carboxylate, a source of at least one of S and Se; and hydrazine, wherein a dispersion of the Zn carboxylate in hydrazine is mixed with a solution comprising hydrazine and the source of Sn to solubilize and stabilize the source of the Zn carboxylate.
- a photovoltaic device comprising a top electrode having transparent conductive material; an n-type semiconducting layer; a kesterite film on said substrate formed by the method in claim 1 ; and a substrate having an electrically conductive surface.
- FIG. 1 is an X-ray diffraction pattern of mixed S—Se and pure sulfide kesterite materials prepared in Examples 1 and 2.
- FIG. 2 is a cross-sectional scanning electron microscopy image of a film prepared according to Example 1.
- FIG. 3 is a cross-sectional scanning electron microscopy image of a film prepared according to Example 2.
- FIG. 4 is a cross-sectional scanning electron microscopy image of a film prepared according to Example 3.
- the present disclosure relates to a method of depositing a hydrazine-based copper-zinc-tin-chalcogenide kesterite film having Cu, Zn, Sn, and at least one of S and Se, and more particularly to a solution deposition method of kesterite-type Cu—Zn—Sn—(Se,S) materials to form a film and improved photovoltaic devices based on these films.
- the method generally includes forming a solution including a hydrazine-based solvent, a source of Cu, a source of Sn, a source of at least one of S and Se, and a source of Zn carboxylate, wherein the solution is substantially free of solid particles; applying the solution onto a substrate to form a thin layer; and annealing at a temperature, pressure, and length of time sufficient to form the kesterite film.
- the hydrazine-based solvent includes hydrazine in an amount from about 50% by weight to about 100% by weight, amounts of about weight 70% by weight to about 100% by weight in other embodiments, and about 90% by weight to about 100% by weight in still other embodiments.
- the solvent can further include an organic or inorganic solvent.
- the ink solution may also include at least one additive each containing a metal selected from: Li, Na, K, Mg, Ca, Sr, Ba , Sb, Bi, and a combination thereof, wherein the metal is present in an amount from about 0.01 weight % to about 5 weight %.
- the kesterite film formed by the process can be represented by formula (I):
- the kesterite has the above formula wherein x, y, z and q respectively are: 0 ⁇ x ⁇ 0.5; 0 ⁇ y ⁇ 0.5; 0 ⁇ z ⁇ 1; ⁇ 0.5 ⁇ q ⁇ 0.5.
- the source of Cu is at least one of Cu, Cu 2 S and Cu 2 Se;
- the source of Sn is at least one of Sn, SnSe, SnS, SnSe 2 , SnS 2 , Sn formate and Sn acetate;
- the source of Zn carboxylate is at least one of zinc acetate and zinc formate;
- the source of S is selected from: elemental sulfur, CuS, Cu 2 S, SnS, SnS 2 , ZnS, and a mixture thereof;
- the source of Se is selected from at least one of elemental Se, SnSe 2 , and SnSe.
- the method of depositing the hydrazine-based copper-zinc-tin-chalcogenide kesterite film includes contacting hydrazine, a source of Cu, and a source of at least one of S and Se forming solution A; contacting hydrazine, a source of Sn, a source of at least one of S and Se, and a source of Zn forming dispersion B; mixing the solution A and dispersion B under conditions sufficient to form a solution substantially free of solid particles; applying the resulting solution onto a substrate to form a thin layer; and annealing at a temperature, pressure, and length of time sufficient to form the kesterite film. While not wanting to be bound by theory, it is believed that the presence of the tin chalcogenide ions promotes stabilization of the zinc in the solution.
- the step of applying in the method of the present disclosure is preferably carried out by a method selected from: spin coating, dip coating, doctor blading, curtain coating, slide coating, spraying, slit casting, meniscus coating, screen printing, ink jet printing, pad printing, flexographic printing, and gravure printing.
- the substrate is selected from: metal foil, glass, ceramics, aluminum foil coated with a layer of molybdenum, a polymer, and a combination thereof. In one embodiment, the substrate is coated with a transparent conductive coating.
- the step of annealing is preferably carried out at a temperature from about 200° C. to about 800° C. and ranges there between.
- the annealing temperature is from about 400° C. to about 600° C. and in still other embodiments, the anneal temperature is from about 500 to about 600° C.
- the step of annealing is typically carried out in an atmosphere including: at least one of N 2 , Ar, He, forming gas, and a mixture thereof. This atmosphere can further include vapors of at least one of: sulfur, selenium, and a compound thereof.
- the annealing step is carried out at an appropriate temperature that is high enough for thermal decomposition of the precursor but low enough to maintain the resulting film in an amorphous state.
- the annealing step is for an amount of time of about 1 second to about 60 minutes. More typically, the annealing step is for about 30 sec to about 20 minutes.
- the step of annealing can be carried our by any technique known to the skilled in the art, including but not limited to: furnace, hot plate, infrared or visible radiation, e.g., laser, lamp furnace, rapid thermal anneal unit, resistive heating of the substrate, heated gas stream, flame burner, electric arc and plasma jet.
- the hydrazine-based precursor solution in accordance with the present disclosure provides greater versatility to the end user to tailor the particular stoichiometry of the kesterite film by adjusting the ratios of Cu/Sn/Zn/(S, Se) sources without the need for long range diffusion as would be expected for slurry based systems. As a result, high quality and highly pure kesterite films can be obtained.
- the thickness of the applied hydrazine-based kesterite precursor layer generally ranges from about 0.2 microns to about 5 microns in most embodiments. In other embodiments, the thickness generally ranges from about 0.5 microns to about 3 microns, and in still other embodiments, the thickness ranges from about 1 microns to about 2.5 microns.
- the method of the present disclosure produces a composition which includes a solution containing hydrazine solvent, a source of Cu, a source of Sn, a source of Zn carboxylate, and a source of at least one of S and Se, which when annealed, forms a compound of the formula: Cu 2-x Zn 1+y Sn(S 1-z Se z ) 4+q wherein 0 ⁇ x ⁇ 1; 0 ⁇ y ⁇ 1; 0 ⁇ z ⁇ 1; ⁇ 1 ⁇ q ⁇ 1; and preferably a compound of the above formula wherein x, y, z and q respectively are: 0 ⁇ x ⁇ 0.5; 0 ⁇ y ⁇ 0.5; 0 ⁇ z ⁇ 1; ⁇ 0.5 ⁇ q ⁇ 0.5.
- the present disclosure further provides a photovoltaic device, including: a substrate having an electrically conductive surface; a kesterite film on the substrate formed by the method of the present disclosure; an n-type semiconducting layer; and a top electrode having a transparent conductive material.
- the substrate can be glass, plastic, polymer, ceramic, or aluminum foil, and can be coated with a molybdenum layer;
- the n-type semiconducting layer has at least one of: ZnS, CdS, InS, oxides thereof, and selenides thereof; and the transparent conductive material can be doped ZnO, indium-tin oxide (ITO), doped tin oxide, or carbon nanotubes.
- photovoltaic cells may be constructed, incorporating the solution deposition methods of this disclosure, by layering the metal chalcogenide with other materials to form a two terminal, sandwich-structure device.
- a metal contact such as molybdenum (Mo)
- the Cu 2-x Zn 1+y Sn(S 1-z Se z ) 4+q layer could then be covered with a buffer layer, which can be a metal chalcogenide such as CdS or ZnSe or an oxide such as TiO 2 .
- This buffer layer could be deposited in the same fashion as the Cu 2 ,Zn 1+y Sn(S 1-z Se z ) 4+q layer using any of the methods of the present disclosure or it could be deposited more conventionally (e.g. by chemical bath or vapor deposition techniques).
- the buffer layer would then be covered with a transparent top contact such as doped TiO 2 , indium tin oxide, or fluorine-doped tin oxide, completing the photovoltaic cell.
- the photovoltaic cell could be constructed in the reverse order, using a transparent substrate (e.g. glass or plastic) supporting a transparent conducting contact (such as doped TiO 2 , indium tin oxide, or fluorine-doped tin oxide).
- a transparent substrate e.g. glass or plastic
- a transparent conducting contact such as doped TiO 2 , indium tin oxide, or fluorine-doped tin oxide
- the buffer layer would then be deposited on this substrate and covered with the metal chalcogenide layer (such as Cu 2-x Zn 1+y Sn(S 1-z Se z ) 4+q ), and finally with a back contact (such as Mo or Au).
- the metal chalcogenide (“absorber”) layer could be deposited by the solution deposition methods described in this disclosure.
- the present disclosure further provides a photovoltaic module that includes a plurality of electrically interconnected photovoltaic devices described in the present disclosure.
- the present disclosure provides a new approach to solubilize zinc species in hydrazine-based kesterite precursor inks.
- the hydrazine-based inks are substantially free of particles and provide greater versatility to tailor the stoichiometry of the kesterite film without secondary phases being present.
- the inks can be used in a broad range of semiconductor devices, although they are especially effective in light receiving elements such as photodiodes and photovoltaic cells.
- Example 1 Mixed S—Se Kesterite Solution, Film and Device thereof.
- Zinc formate 0.36 grams (g) was dispersed in 1 milliliter (ml) hydrazine (Slurry A). Tin powder, 0.25 g and Se, 0.75 g were dissolved in 3 ml hydrazine (Solution B). Copper powder, 0.226 g and sulfur, 0.175 g were dissolved in 1.5 ml hydrazine (Solution C). Solution B was added to Slurry A, followed by Solution C and 1 ml hydrazine, forming deposition ink D.
- Solar cells were fabricated from the above-described Cu 2 ZnSn(Se,S) 4 films by deposition of 60 nanometers (nm) CdS buffer layer by chemical bath deposition, 100 nm insulating ZnO and 130 nm ITO (indium-doped zinc oxide) by sputtering, followed by Ni/Al metal contacts deposited by electron-beam evaporation.
- nm nanometers
- ITO indium-doped zinc oxide
- FIG. 1 provides X-ray diffraction patterns of the obtained S—Se kesterite film (top).
- FIG. 2 provides a scanning electron micrograph of the S—Se kesterite film. Large-grain void-free layers was observed, which is generally considered desirable for photovoltaic devices.
- Zinc formate 0.37 g was dispersed in 1 ml hydrazine (Slurry E). Tin powder, 0.26 g and S, 0.312 g were dissolved in 3 ml hydrazine (Solution F). Copper powder, 0.226 g and sulfur, 0.175 g were dissolved in 1.5 ml hydrazine (Solution G). Solution F was added to Solution E, followed by Solution G and 1 ml hydrazine, forming deposition ink H.
- FIG. 1 provides X-ray diffraction patterns of the obtained pure sulfide kesterite film (bottom).
- FIG. 3 provides a scanning electron micrograph of the pure sulfide kesterite film. Large-grain void-free layers was observed, which is generally considered desirable for photovoltaic devices.
- Zinc formate 0.735 g was dispersed in 1.5 ml hydrazine (Slurry I). Tin powder, 0.52 g and Se, 1.21 g were dissolved in 5 ml hydrazine (Solution J). Copper powder, 0.436 g and sulfur, 0.33 g were dissolved in 3 ml hydrazine (Solution K). Solution J was added to Solution K followed by 1 ml of hydrazine used to wash vial J resulting in solution L. Solution L was added to slurry I followed by 1 ml of hydrazine used to wash vial L, forming deposition ink M. One (1) ml of ink M was added to 0.1 ml HZ containing 0.07 g Se forming deposition ink N.
- one layer of ink M was spun at 800 rpm followed by six layers spun at 600 rpm and one layer of ink N spun at 500 rpm and annealed on a covered hot plate at a maximum temperature above 540 C.
- Solar cells were fabricated from the above-described Cu 2 ZnSn(Se,S) 4 films by deposition of 60 nm CdS buffer layer by chemical bath deposition, 100 nm insulating ZnO and 130 nm ITO (indium-doped zinc oxide) by sputtering, followed by Ni/Al metal contacts deposited by electron-beam evaporation.
- FIG. 4 provides a scanning electron micrograph of the S—Se kesterite film. Large-grain void-free layers was observed, which is generally considered desirable for photovoltaic devices.
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Abstract
Cu2-xZn1+ySn(S1-zSez)4+q,
Description
- The present application is a DIVISIONAL of U.S. application Ser. No. 13/644,672, filed on Oct. 4, 2012, the contents of which are incorporated herein by reference in its entirety.
- The present disclosure relates to a method of depositing a kesterite film. More particularly, the present disclosure relates to a method of depositing a kesterite film from a precursor solution.
- Large-scale production of photovoltaic devices requires high-throughput technologies and abundant environmentally friendly materials. Thin-film chalcogenide-based solar cells provide a promising pathway to cost parity between photovoltaic and conventional energy sources.
- Currently, only Cu(In,Ga)(S,Se)2 and CdTe technologies have reached commercial production and offer over 10 percent power conversion efficiency. These technologies generally employ (i) indium and tellurium, which are relatively rare elements in the earth's crust, or (ii) cadmium, which is a highly toxic heavy metal.
- Copper-zinc-tin-chalcogenide kesterites have been investigated as potential alternatives because they are based on readily available and lower cost elements. However, photovoltaic cells with kesterites, even when produced using high cost vacuum-based methods, at best only <6.7 percent efficiencies, see Katagiri, H. et al. Development of CZTS-based thin film solar cells; Thin Solid Films 517, 2455-2460 (2009).
- The commonly owned applications: U.S. Pub. App. No. 2011/0094557A1, and PCT App. No. WO 2011/051012 to Todorov et al. and a publication by T. Todorov, K. Reuter, D. B. Mitzi, Advanced Materials, (2010) Vol. 22, pages 1-4, generally describe a hydrazine-based deposition approach of depositing homogeneous chalcogenide layers from mixed slurries containing both dissolved and solid metal chalcogenide species dispersions of metal chalcogenides in systems that do not require organic binders. Upon anneal the particle-based precursors readily react with the solution component and form large-grained films with good electrical characteristics. Recently, this process achieved world-record efficiency for this class of materials of 11.1% (T. Todorov, J. Tang, S. Bag, O. Gunawan, T. Gokmen, Y. Zhu, D. B. Mitzi, “Beyond 11% Efficiency: Characteristics of State-of-the-Art Cu2ZnSn(S,Se)4 Solar Cells”, Advanced Energy Materials, early view: DOI: 10.1002/aenm.201200348).
- A major challenge in hydrazine-based copper-zinc-tin-chalcogenide kesterite processing including copper-zinc-tin-sulfide (CZTS), copper-zinc-tin-selenide (CZTSe), and copper-tin-zinc-sulfur-selenium (CZTSSe), is the poor solubility of the zinc chalcogenide-hydrazinates that generally form a solid phase in the ink. Unlike the various soluble chalcogenides compounds, zinc compounds such as ZnS and ZnSe, together with most transition metals and metal chalcogenides, show negligible solubility in hydrazine-based solvent systems. The morphology and dispersibility of the solid phase of these zinc compounds are difficult to control resulting in poor reproducibility of the hydrazine-based copper-zinc-tin-chalcogenide kesterite slurries that may cause micro-scale compositional non-uniformities, thereby potentially deteriorating device performance. Furthermore, particle-based inks may have poor compatibility with liquid-coating equipment such as slit-casting and spin coating due to non-Newtonian liquid properties of these slurries.
- A pure solution precursor ink formulation for copper-zinc-tin-chalcogenide kesterite based on DMSO solutions was previously reported (W. Ki, H. Hillhouse Adv. Energy Mater. 2011, 1, 732-735). However, maximum efficiency reached only 4.1% possibly due to difficult to eliminate impurities introduced with the selected precursors. Another example employing sol-gel solutions in methoxyethanol reports 2.2% efficiency.
- Accordingly, the present disclosure discloses various methods for depositing a kesterite film; a hydrazine-based precursor solution for forming the kesterite film; and photovoltaic devices including the solution deposited kesterite film.
- In one embodiment, a method of depositing a kesterite film comprising a compound of the formula:
-
Cu2-xZn1+ySn(S1-zSez)4+q, - wherein 0≦x≦1; 0≦y≦1; 0≦z≦1; −1≦q≦1, said method comprising contacting a hydrazine-based solvent, a source of Cu, a source of Sn, a source of Zn carboxylate, a source of at least one of S and Se, under conditions sufficient to form a solution substantially free of solid particles; applying the solution onto a substrate to form a thin layer; and annealing the thin layer at a temperature, pressure, and length of time sufficient to form the kesterite film.
- In another embodiment, a method of depositing a kesterite film comprising a compound of the formula:
-
Cu2-xZn1+ySn(S1-zSez)4+q - wherein 0≦x≦1; 0<y≦1; 0≦z≦1; −1≦q≦1, said method comprising contacting hydrazine, a source of Cu, and a source of at least one of S and Se forming solution A; contacting hydrazine, a source of Sn, a source of at least one of S and Se, and a source of Zn forming dispersion B; mixing said solution A and said dispersion B under conditions sufficient to form a solution substantially free of particles; applying said solution onto a substrate to form a thin layer; and annealing the thin layer at a temperature, pressure, and length of time sufficient to form said kesterite film.
- A hydrazine-based precursor solution for forming a kesterite film, comprises a source of Cu, a source of Sn, a source of Zn carboxylate, a source of at least one of S and Se; and hydrazine, wherein a dispersion of the Zn carboxylate in hydrazine is mixed with a solution comprising hydrazine and the source of Sn to solubilize and stabilize the source of the Zn carboxylate.
- A photovoltaic device, comprising a top electrode having transparent conductive material; an n-type semiconducting layer; a kesterite film on said substrate formed by the method in
claim 1; and a substrate having an electrically conductive surface. - The disadvantages associated with the prior art are overcome by the preferred embodiments of the present invention in which pure CZTS precursor solution substantially free of solid particles is employed.
- The disclosure may be understood more readily by reference to the following detailed description of the various features of the disclosure and the examples included therein.
- Referring now to the figures wherein the like elements are numbered alike:
-
FIG. 1 is an X-ray diffraction pattern of mixed S—Se and pure sulfide kesterite materials prepared in Examples 1 and 2. -
FIG. 2 is a cross-sectional scanning electron microscopy image of a film prepared according to Example 1. -
FIG. 3 is a cross-sectional scanning electron microscopy image of a film prepared according to Example 2. -
FIG. 4 is a cross-sectional scanning electron microscopy image of a film prepared according to Example 3. - The present disclosure relates to a method of depositing a hydrazine-based copper-zinc-tin-chalcogenide kesterite film having Cu, Zn, Sn, and at least one of S and Se, and more particularly to a solution deposition method of kesterite-type Cu—Zn—Sn—(Se,S) materials to form a film and improved photovoltaic devices based on these films.
- The method generally includes forming a solution including a hydrazine-based solvent, a source of Cu, a source of Sn, a source of at least one of S and Se, and a source of Zn carboxylate, wherein the solution is substantially free of solid particles; applying the solution onto a substrate to form a thin layer; and annealing at a temperature, pressure, and length of time sufficient to form the kesterite film.
- The hydrazine-based solvent includes hydrazine in an amount from about 50% by weight to about 100% by weight, amounts of about
weight 70% by weight to about 100% by weight in other embodiments, and about 90% by weight to about 100% by weight in still other embodiments. In addition to the hydrazine, the solvent can further include an organic or inorganic solvent. The ink solution may also include at least one additive each containing a metal selected from: Li, Na, K, Mg, Ca, Sr, Ba , Sb, Bi, and a combination thereof, wherein the metal is present in an amount from about 0.01 weight % to about 5 weight %. - The kesterite film formed by the process can be represented by formula (I):
-
Cu2-xZn1+ySn(S1-zSez)4+q, (I) - wherein 0≦x≦1; 0≦y≦1; 0≦z≦1; −1≦q≦1.
- In one embodiment, the kesterite has the above formula wherein x, y, z and q respectively are: 0≦x≦0.5; 0≦y≦0.5; 0≦z≦1; −0.5≦q≦0.5.
- In one embodiment, the source of Cu is at least one of Cu, Cu2S and Cu2Se; the source of Sn is at least one of Sn, SnSe, SnS, SnSe2, SnS2, Sn formate and Sn acetate; the source of Zn carboxylate is at least one of zinc acetate and zinc formate; the source of S is selected from: elemental sulfur, CuS, Cu2S, SnS, SnS2, ZnS, and a mixture thereof; and the source of Se is selected from at least one of elemental Se, SnSe2, and SnSe.
- In one embodiment, the method of depositing the hydrazine-based copper-zinc-tin-chalcogenide kesterite film includes contacting hydrazine, a source of Cu, and a source of at least one of S and Se forming solution A; contacting hydrazine, a source of Sn, a source of at least one of S and Se, and a source of Zn forming dispersion B; mixing the solution A and dispersion B under conditions sufficient to form a solution substantially free of solid particles; applying the resulting solution onto a substrate to form a thin layer; and annealing at a temperature, pressure, and length of time sufficient to form the kesterite film. While not wanting to be bound by theory, it is believed that the presence of the tin chalcogenide ions promotes stabilization of the zinc in the solution.
- The step of applying in the method of the present disclosure is preferably carried out by a method selected from: spin coating, dip coating, doctor blading, curtain coating, slide coating, spraying, slit casting, meniscus coating, screen printing, ink jet printing, pad printing, flexographic printing, and gravure printing.
- The substrate is selected from: metal foil, glass, ceramics, aluminum foil coated with a layer of molybdenum, a polymer, and a combination thereof. In one embodiment, the substrate is coated with a transparent conductive coating.
- The step of annealing is preferably carried out at a temperature from about 200° C. to about 800° C. and ranges there between. In other embodiments, the annealing temperature is from about 400° C. to about 600° C. and in still other embodiments, the anneal temperature is from about 500 to about 600° C. The step of annealing is typically carried out in an atmosphere including: at least one of N2, Ar, He, forming gas, and a mixture thereof. This atmosphere can further include vapors of at least one of: sulfur, selenium, and a compound thereof. In most embodiments, the annealing step is carried out at an appropriate temperature that is high enough for thermal decomposition of the precursor but low enough to maintain the resulting film in an amorphous state. Typically, the annealing step is for an amount of time of about 1 second to about 60 minutes. More typically, the annealing step is for about 30 sec to about 20 minutes. The step of annealing can be carried our by any technique known to the skilled in the art, including but not limited to: furnace, hot plate, infrared or visible radiation, e.g., laser, lamp furnace, rapid thermal anneal unit, resistive heating of the substrate, heated gas stream, flame burner, electric arc and plasma jet.
- The hydrazine-based precursor solution in accordance with the present disclosure provides greater versatility to the end user to tailor the particular stoichiometry of the kesterite film by adjusting the ratios of Cu/Sn/Zn/(S, Se) sources without the need for long range diffusion as would be expected for slurry based systems. As a result, high quality and highly pure kesterite films can be obtained.
- The thickness of the applied hydrazine-based kesterite precursor layer generally ranges from about 0.2 microns to about 5 microns in most embodiments. In other embodiments, the thickness generally ranges from about 0.5 microns to about 3 microns, and in still other embodiments, the thickness ranges from about 1 microns to about 2.5 microns.
- Thus, the method of the present disclosure produces a composition which includes a solution containing hydrazine solvent, a source of Cu, a source of Sn, a source of Zn carboxylate, and a source of at least one of S and Se, which when annealed, forms a compound of the formula: Cu2-xZn1+ySn(S1-zSez)4+q wherein 0≦x≦1; 0≦y≦1; 0≦z≦1; −1≦q≦1; and preferably a compound of the above formula wherein x, y, z and q respectively are: 0≦x≦0.5; 0≦y≦0.5; 0≦z≦1; −0.5≦q≦0.5.
- The present disclosure further provides a photovoltaic device, including: a substrate having an electrically conductive surface; a kesterite film on the substrate formed by the method of the present disclosure; an n-type semiconducting layer; and a top electrode having a transparent conductive material. The substrate can be glass, plastic, polymer, ceramic, or aluminum foil, and can be coated with a molybdenum layer; the n-type semiconducting layer has at least one of: ZnS, CdS, InS, oxides thereof, and selenides thereof; and the transparent conductive material can be doped ZnO, indium-tin oxide (ITO), doped tin oxide, or carbon nanotubes.
- For example, photovoltaic cells may be constructed, incorporating the solution deposition methods of this disclosure, by layering the metal chalcogenide with other materials to form a two terminal, sandwich-structure device. For example, one could form a layer of Cu2-xZn1+ySn(S1-zSez)4+q wherein 0≦x≦1; 0≦y≦1; 0≦z≦1; −1≦q≦1 deposited as disclosed herein on top of a metal contact, such as molybdenum (Mo), which is supported on a rigid or flexible substrate (e.g., glass, metal, plastic). The Cu2-xZn1+ySn(S1-zSez)4+q layer could then be covered with a buffer layer, which can be a metal chalcogenide such as CdS or ZnSe or an oxide such as TiO2. This buffer layer could be deposited in the same fashion as the Cu2,Zn1+ySn(S1-zSez)4+q layer using any of the methods of the present disclosure or it could be deposited more conventionally (e.g. by chemical bath or vapor deposition techniques). The buffer layer would then be covered with a transparent top contact such as doped TiO2, indium tin oxide, or fluorine-doped tin oxide, completing the photovoltaic cell.
- Alternatively, the photovoltaic cell could be constructed in the reverse order, using a transparent substrate (e.g. glass or plastic) supporting a transparent conducting contact (such as doped TiO2, indium tin oxide, or fluorine-doped tin oxide). The buffer layer would then be deposited on this substrate and covered with the metal chalcogenide layer (such as Cu2-xZn1+ySn(S1-zSez)4+q), and finally with a back contact (such as Mo or Au). In either case, the metal chalcogenide (“absorber”) layer could be deposited by the solution deposition methods described in this disclosure.
- The present disclosure further provides a photovoltaic module that includes a plurality of electrically interconnected photovoltaic devices described in the present disclosure.
- Experimental studies of zinc carboxylate dissolution in hydrazine indicated that slurries obtained by mixing of zinc acetate or zinc formate in hydrazine can be successfully dissolved by addition of tin-chalcogenide hydrazine solutions. The rest of the necessary precursors, such as Cu and other chalcogens can be added either to the initial tin solution or at a later stage. In contrast, the following alternative dissolution routes for zinc carboxylate lead in all cases to insoluble product: (i) mixing with pure hydrazine, (ii) mixing with chalcogen-hydrazine solutions, (iii) mixing with chalcogen-copper solutions. It is believed that the action of the tin chalcogenide hydrazinate ions provides zinc stabilization in solution. Ratios of (S,Se)/Sn from 3 to 4 were found suitable for solution formation while higher ratios promoted precipitate formations.
- Pure sulfide solutions were found to be more stable than selenide solutions with identical molar composition.
- Advantageously, the present disclosure provides a new approach to solubilize zinc species in hydrazine-based kesterite precursor inks. The hydrazine-based inks are substantially free of particles and provide greater versatility to tailor the stoichiometry of the kesterite film without secondary phases being present. The inks can be used in a broad range of semiconductor devices, although they are especially effective in light receiving elements such as photodiodes and photovoltaic cells.
- The following examples are presented for illustrative purposes only, and are not intended to limit the scope of the invention.
- Zinc formate, 0.36 grams (g) was dispersed in 1 milliliter (ml) hydrazine (Slurry A). Tin powder, 0.25 g and Se, 0.75 g were dissolved in 3 ml hydrazine (Solution B). Copper powder, 0.226 g and sulfur, 0.175 g were dissolved in 1.5 ml hydrazine (Solution C). Solution B was added to Slurry A, followed by Solution C and 1 ml hydrazine, forming deposition ink D.
- Six consecutive layers were spin coated at 600 revolutions per minute (rpm) on a molybdenum-coated glass and annealed on a covered hot plate at a maximum temperature above 540° C.
- Solar cells were fabricated from the above-described Cu2ZnSn(Se,S)4 films by deposition of 60 nanometers (nm) CdS buffer layer by chemical bath deposition, 100 nm insulating ZnO and 130 nm ITO (indium-doped zinc oxide) by sputtering, followed by Ni/Al metal contacts deposited by electron-beam evaporation.
- Device photovoltaic efficiency measured at 1.5 AM conditions was 6.8%, with Voc=0.404 V, Jsc=28.9 mA/cm2, Fill Factor=58.2%.
-
FIG. 1 provides X-ray diffraction patterns of the obtained S—Se kesterite film (top).FIG. 2 provides a scanning electron micrograph of the S—Se kesterite film. Large-grain void-free layers was observed, which is generally considered desirable for photovoltaic devices. - Zinc formate, 0.37 g was dispersed in 1 ml hydrazine (Slurry E). Tin powder, 0.26 g and S, 0.312 g were dissolved in 3 ml hydrazine (Solution F). Copper powder, 0.226 g and sulfur, 0.175 g were dissolved in 1.5 ml hydrazine (Solution G). Solution F was added to Solution E, followed by Solution G and 1 ml hydrazine, forming deposition ink H.
- Six consecutive layers were spin coated at 600 rpm on a molybdenum-coated glass and annealed on a covered hot plate at a maximum temperature above 540° C.
-
FIG. 1 provides X-ray diffraction patterns of the obtained pure sulfide kesterite film (bottom).FIG. 3 provides a scanning electron micrograph of the pure sulfide kesterite film. Large-grain void-free layers was observed, which is generally considered desirable for photovoltaic devices. - Zinc formate, 0.735 g was dispersed in 1.5 ml hydrazine (Slurry I). Tin powder, 0.52 g and Se, 1.21 g were dissolved in 5 ml hydrazine (Solution J). Copper powder, 0.436 g and sulfur, 0.33 g were dissolved in 3 ml hydrazine (Solution K). Solution J was added to Solution K followed by 1 ml of hydrazine used to wash vial J resulting in solution L. Solution L was added to slurry I followed by 1 ml of hydrazine used to wash vial L, forming deposition ink M. One (1) ml of ink M was added to 0.1 ml HZ containing 0.07 g Se forming deposition ink N.
- On a molybdenum-coated glass, one layer of ink M was spun at 800 rpm followed by six layers spun at 600 rpm and one layer of ink N spun at 500 rpm and annealed on a covered hot plate at a maximum temperature above 540 C.
- Solar cells were fabricated from the above-described Cu2ZnSn(Se,S)4 films by deposition of 60 nm CdS buffer layer by chemical bath deposition, 100 nm insulating ZnO and 130 nm ITO (indium-doped zinc oxide) by sputtering, followed by Ni/Al metal contacts deposited by electron-beam evaporation.
- Device photovoltaic efficiency measured at 1.5 AM conditions was 10.4%, with Voc=0.478 V, Jsc=33.8 mA/cm2, Fill Factor=64.4%.
-
FIG. 4 provides a scanning electron micrograph of the S—Se kesterite film. Large-grain void-free layers was observed, which is generally considered desirable for photovoltaic devices. - X-ray diffraction patterns of the obtained films matched kesterite phase (
FIG. 1 ). SEM images indicate large-grain void-free layers desirable for photovoltaic devices (FIGS. 2 , 3). - The present invention has been described with particular reference to the preferred embodiments. It should be understood that variations and modifications thereof can be devised by those skilled in the art without departing from the spirit and scope of the present invention. Accordingly, the present invention embraces all such alternatives, modifications and variations that fall within the scope of the appended claims.
Claims (6)
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US9502600B2 (en) * | 2011-06-17 | 2016-11-22 | The Regents Of The University Of California | Inorganic solution and solution process for electronic and electro-optic devices |
US9618841B2 (en) | 2014-06-09 | 2017-04-11 | Boe Technology Group Co., Ltd. | Cu2Zn0.14Sn0.25Te2.34 nanocrystalline solution, its preparation method, photosensitive resin solution, method for forming black matrix, and color filter substrate |
CN104031459B (en) * | 2014-06-09 | 2016-05-11 | 京东方科技集团股份有限公司 | A kind of Cu2Zn0.14Sn0.25Te2.34The preparation method of nanocrystal solution and preparation method, photosensitive resin solution, black matrix, color membrane substrates |
KR101708282B1 (en) * | 2014-09-29 | 2017-02-20 | 이화여자대학교 산학협력단 | Solar cell using -based film and preparing method of the same |
US9917216B2 (en) | 2014-11-04 | 2018-03-13 | International Business Machines Corporation | Flexible kesterite photovoltaic device on ceramic substrate |
US9530908B2 (en) | 2014-11-13 | 2016-12-27 | International Business Machines Corporation | Hybrid vapor phase-solution phase growth techniques for improved CZT(S,Se) photovoltaic device performance |
US10217888B2 (en) | 2016-10-06 | 2019-02-26 | International Business Machines Corporation | Solution-phase inclusion of silver into chalcogenide semiconductor inks |
CN110867383B (en) * | 2019-11-21 | 2023-05-30 | 中国电子科技集团公司第十八研究所 | Method for preparing copper zinc tin sulfide film absorption layer by three-step vulcanization process |
CN110819958A (en) * | 2019-11-28 | 2020-02-21 | 河北大学 | Method for changing electrical properties of antimony selenide film and antimony selenide solar cell |
RU2744157C1 (en) * | 2020-07-14 | 2021-03-03 | Федеральное государственное бюджетное учреждение науки Институт проблем химической физики Российской Академии наук (ФГБУН ИПХФ РАН) | Method of producing photosensitive kesterite films |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3014779A (en) * | 1956-10-05 | 1961-12-26 | Merck & Co Inc | Selenides and methods of making same |
CN102557117A (en) * | 2012-03-08 | 2012-07-11 | 桂林理工大学 | Method for thermally synthesizing Cu2ZnSnS4 semiconductor material by solvent through microwaves |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6548751B2 (en) | 2000-12-12 | 2003-04-15 | Solarflex Technologies, Inc. | Thin film flexible solar cell |
US6784358B2 (en) | 2002-11-08 | 2004-08-31 | The Boeing Co. | Solar cell structure utilizing an amorphous silicon discrete by-pass diode |
WO2009086161A1 (en) * | 2007-12-20 | 2009-07-09 | Cima Nanotech Israel Ltd. | Transparent conductive coating with filler material |
US9231214B2 (en) | 2008-04-08 | 2016-01-05 | The Regents Of The University Of California | Photovoltaic devices including self-assembling fullerene derivatives for improved efficiencies |
US8802483B2 (en) * | 2008-06-18 | 2014-08-12 | The Board Of Trustees Of The Leland Stanford Junior University | Self-organizing nanostructured solar cells |
US20120060928A1 (en) * | 2009-05-21 | 2012-03-15 | E.I. Du Pont De Nemours And Company | Processes for preparing copper tin sulfide and copper zinc tin sulfide films |
US20110094557A1 (en) * | 2009-10-27 | 2011-04-28 | International Business Machines Corporation | Method of forming semiconductor film and photovoltaic device including the film |
US10147604B2 (en) * | 2009-10-27 | 2018-12-04 | International Business Machines Corporation | Aqueous-based method of forming semiconductor film and photovoltaic device including the film |
AU2010343092A1 (en) * | 2009-12-28 | 2012-08-16 | Nanosolar, Inc. | Low cost solar cells formed using a chalcogenization rate modifier |
US20110232758A1 (en) * | 2010-03-25 | 2011-09-29 | Rohm And Haas Electronic Materials Llc | Thin film photovoltaic cell |
US20110312120A1 (en) * | 2010-06-22 | 2011-12-22 | Reel Solar, Inc. | Absorber repair in substrate fabricated photovoltaics |
-
2012
- 2012-10-04 US US13/644,672 patent/US9252304B2/en not_active Expired - Fee Related
-
2015
- 2015-01-29 US US14/608,600 patent/US20150135994A1/en not_active Abandoned
- 2015-01-29 US US14/608,597 patent/US20150144177A1/en not_active Abandoned
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3014779A (en) * | 1956-10-05 | 1961-12-26 | Merck & Co Inc | Selenides and methods of making same |
CN102557117A (en) * | 2012-03-08 | 2012-07-11 | 桂林理工大学 | Method for thermally synthesizing Cu2ZnSnS4 semiconductor material by solvent through microwaves |
Non-Patent Citations (2)
Title |
---|
Mitzi et al "High mobility ultrathin semiconducting films prepared vy spin coating", Nature, Vol 428 (March 2004) pp299-303. * |
Teodor et al "High efficiency solar cell with earth-abundant liquid processed absorber", Adv. Mater., 2010, 22, E156-159. * |
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US20140096826A1 (en) | 2014-04-10 |
US9252304B2 (en) | 2016-02-02 |
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