US20120257305A1 - Pmr write head with assisted magnetic layer - Google Patents
Pmr write head with assisted magnetic layer Download PDFInfo
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- US20120257305A1 US20120257305A1 US13/066,178 US201113066178A US2012257305A1 US 20120257305 A1 US20120257305 A1 US 20120257305A1 US 201113066178 A US201113066178 A US 201113066178A US 2012257305 A1 US2012257305 A1 US 2012257305A1
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- 230000005291 magnetic effect Effects 0.000 title claims abstract description 136
- 238000000034 method Methods 0.000 claims abstract description 26
- 239000000696 magnetic material Substances 0.000 claims abstract description 24
- 229910018979 CoPt Inorganic materials 0.000 claims abstract description 6
- 229910005335 FePt Inorganic materials 0.000 claims abstract description 5
- 238000000151 deposition Methods 0.000 claims description 8
- 229910017112 Fe—C Inorganic materials 0.000 claims description 5
- 238000007747 plating Methods 0.000 claims description 5
- 229910003321 CoFe Inorganic materials 0.000 claims description 4
- 230000005415 magnetization Effects 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 230000004907 flux Effects 0.000 abstract description 18
- 239000010410 layer Substances 0.000 description 91
- 230000008569 process Effects 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000010884 ion-beam technique Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000002131 composite material Substances 0.000 description 4
- 238000003801 milling Methods 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910019233 CoFeNi Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
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- 239000002356 single layer Substances 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
- G11B5/3143—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding
- G11B5/3146—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding magnetic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
- G11B5/3143—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding
- G11B5/3146—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding magnetic layers
- G11B5/315—Shield layers on both sides of the main pole, e.g. in perpendicular magnetic heads
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
Definitions
- the invention relates to a thin magnetic film with an anisotropic magnetic property that is added to the trailing side of a main pole and thereby provides additional magnetic charge on the ABS surface to improve writability and field gradient.
- AWA all wrapped around shield writer
- BPI bits per inch
- TPI tracks per inch
- the gap between the main pole and all shields, including the write gap adjoining the trailing shield, side gaps to the side shields, and lead gap next to the leading shield must be as narrow as possible.
- the material used for conventional AWA shields is a soft magnetic material without preferred anisotropy. Therefore, narrowing the gap between a shield and main pole will only lead to an unwanted flux path from the main pole to the shield which in turn reduces the writability (magnetic field) of the writer on magnetic recording media. This dilemma is considered one of the most significant challenges to improving current writer designs and performance.
- a conventional PMR writer 1 comprising a main pole 11 and shield 12 that can represent a trailing shield, side shield, or leading shield depending on the direction of movement of the writer over magnetic medium 10 during a write process.
- Magnetic charges 7 a, 8 a of opposite sign are shown on an air bearing surface (ABS) side of the shield 12 , and main pole 11 , respectively, and are responsible during a write process for the preferred direction 5 of flux Bs 1 from the main pole to the magnetic medium, and returning from the magnetic medium to the shield.
- Magnetic flux Bs 0 is provided to the main pole from coils (not shown).
- U.S. Patent Application 2010/0157484 shows a magnetic field auxiliary pole and a non-magnetic layer stacked on the main pole to increase field strength and gradient.
- the stacked layers are recessed from the ABS and are not expected to entirely prevent flux leakage from the main pole to an adjacent trailing shield.
- a trailing shield is shown with multiple layers and is separated from the trailing side of a main pole by a gap layer.
- U.S. Pat. No. 7,657,992 discloses a small trailing shield stitched onto the main pole at the ABS but separated from the main pole by a write gap layer.
- U.S. Pat. No. 6,530,141 describes a magnetic pole construction resulting in a high field gradient.
- a composite grain of easy plane material (CoIr with negative Ku) and perpendicular anisotropy material (CoPt with positive Ku) are used in a magnetic medium to improve the head field gradient and amplitude as described by Park et al in “A novel crystalline soft magnetic intermediate layer for perpendicular recording media”, Journal of Applied Physics, 105, 07B723 (2009), and in “Co-7% Ir Soft Magnetic Intermediate Layer for Perpendicular Media”, IEEE Transactions on Magnetics, Vol. 46, No. 6, June 2010.
- One objective of the present invention is to provide additional magnetic charge at the trailing edge of the recording field to improve field amplitude and field gradient at the ABS and thereby increase BPI as required for high area density PMR writers.
- Another objective of the present invention is to provide a method of forming a PMR writer with improved field amplitude and field gradient according to the first objective.
- the first objective is achieved with a magnetic assist layer formed on a trailing side of a main pole and adjoining a write gap layer.
- the magnetic assist layer has a width in a cross-track direction that is essentially equal to that of the main pole track width, a thickness in a down track direction of 5 to 20 nm, and extends a distance of 100 to 500 nm from the ABS toward a back end of the PMR writer.
- the magnetic assist layer is comprised of an anisotropic magnetic material.
- the magnetic assist layer (MAL) has a negative crystalline anisotropy energy constant ( ⁇ Ku) at room temperature.
- the magnetic assist layer has a positive crystalline anisotropy constant (+Ku).
- a magnetic assist layer with a ( ⁇ Ku) energy constant may be deposited on a seed layer such as Ru that aligns the c-axis (hard axis) of the hexagonal crystalline MAL structure toward the main pole.
- the c-axis (hard axis) is preferably aligned toward the main pole for a MAL with ( ⁇ Ku) energy constant while the c-axis is preferably vertical to the ABS for a MAL with a (+Ku) energy constant.
- the magnetic assist layer is totally soft in a 2D plane orthogonal to the hard axis which means the magnetization of the MAL can be easily induced in any direction orthogonal to the hard axis with a weak magnetic field.
- magnetic charges are minimized on the trailing side of the MAL facing the trailing shield such that flux loss from the main pole to the trailing shield is insignificant thereby increasing field amplitude and field gradient at the ABS
- the shield structure may comprise a trailing shield, leading shield, and side shields.
- the trailing shield may be a composite with a first layer adjoining the write gap made of a high Ms (24 kG) magnetic material and a second (19 kG) magnetic layer formed on a side of the first layer that faces away from the main pole.
- the shield structure may be an AWA design that completely surrounds the main pole.
- the main pole may have both of a tapered leading side and a tapered trailing side.
- a magnetic assist layer made of an anisotropic magnetic material is formed on a portion of the main pole trailing side and extends from the ABS toward the back end of the main pole.
- the MAL is formed along the tapered trailing side of the main pole and continues along a portion of the trailing side that connects the tapered trailing side with a back end of the main pole.
- the present invention also encompasses a second embodiment wherein the magnetic assist layer is formed only along the tapered trailing side of the main pole.
- a method for forming a PMR writer with a magnetic assist layer comprised of an anisotropic magnetic material adjoining a trailing side of a main pole is provided.
- a leading shield and a side shield layer made of an isotropic soft magnetic material are sequentially formed on a substrate.
- An opening with sidewalls is formed in the side shield to expose a portion of the leading shield top surface.
- Side gap and leading gap layers are conformally deposited in the opening followed by plating the main pole to fill the opening.
- a taper may be formed on the main pole trailing side by ion beam milling.
- a non-magnetic seed layer, and an anisotropic ( ⁇ Ku) magnetic assist layer are sequentially deposited on a portion of the main pole trailing side including the trailing edge.
- an anisotropic (+Ku) magnetic assist layer is directly deposited on the main pole trailing side by an oblique sputtering method.
- the write gap is deposited on the magnetic assist layer.
- the trailing shield is plated on the write gap to complete the shield structure.
- FIG. 1 is an oblique view of a prior art PMR writer where there is considerable flux loss from the main pole in a direction toward an adjacent shield.
- FIG. 2 is an oblique view of a PMR writer with a shield made of an anisotropic magnetic material to minimize flux leakage from the main pole to an adjacent shield.
- FIG. 3 is a cross-sectional view of a PMR writer structure previously fabricated by the inventors that has a composite trailing shield and a leading shield adjacent to a main pole with tapered leading and trailing sides.
- FIG. 4 is a cross-sectional view of a PMR writer formed according to an embodiment of the present invention wherein a magnetic assist layer made of an anisotropic magnetic material is formed along a trailing side of a main pole.
- FIG. 5 is an ABS view of the embodiment depicted in FIG. 4 and further includes side shields that connect with the trailing shield and leading shield.
- FIG. 6 is a cross-sectional view of a PMR writer according to a second embodiment of the present invention wherein a magnetic assist layer comprising an anisotropic magnetic material is formed only along a tapered trailing side of a main pole.
- FIG. 7 is a plot of vertical magnetic field vs. down-track position for the PMR writer structures depicted in FIGS. 3 and 4 .
- FIGS. 8-12 show intermediate steps during the fabrication of the PMR writer depicted in FIG. 4 .
- FIG. 13 shows an alternative method of forming a magnetic assist layer made of an anisotropic magnetic material on a main pole trailing side.
- the present invention is a PMR writer design which takes advantage of the discovery that an anisotropic magnetic material may be used as a magnetic assist layer on a main pole trailing side to minimize flux loss from the main pole to a trailing shield and thereby maximize the flux field and field gradient at the main pole interface with the ABS.
- an anisotropic magnetic material may be used as a magnetic assist layer on a main pole trailing side to minimize flux loss from the main pole to a trailing shield and thereby maximize the flux field and field gradient at the main pole interface with the ABS.
- the exemplary embodiment depicts a trapezoidal shaped main pole at the ABS, the present invention also encompasses other main pole shapes.
- the main pole may have one or both of a tapered trailing edge and a tapered leading edge.
- Width in the context of shield structures and layers defined herein refers to a distance in a cross-track direction, and thickness or depth relates to a distance in a down-track direction.
- the gap layer as illustrated herein may not have a
- a shield 20 made of anisotropic magnetic material and formed adjacent to a main pole 11 may be used to maximize the magnetic charges 7 a, 8 a at the ABS of shield 20 , and main pole 11 , respectively.
- the magnetic field Bs 1 at the ABS is maximized compared with the condition previously shown in FIG. 1 and the gap between main pole and trailing shield may be reduced with a minimum amount of flux loss to enable a significant gain in BPI for advanced PMR writer designs.
- additional PMR writer designs where an anisotropic magnetic layer is placed at other locations adjacent to a main pole to prevent flux loss to a trailing shield and increase the flux field and field gradient at the ABS.
- FIG. 3 a cross-sectional view of a PMR writer previously fabricated by the inventors is shown having a main pole 9 formed along an ABS 50 - 50 and a trailing shield and leading shield 42 formed on either side of the main pole along the cross-track (x-axis) direction.
- the y-axis is the down-track direction while the z-axis direction is toward the back end 9 v of the main pole.
- Main pole 9 has a trailing edge 9 t and leading edge 9 e at the ABS, and is separated from leading shield 42 by a lead gap 47 .
- a composite trailing shield comprised of a high Ms (24 kG) magnetic shield layer 49 formed adjacent to a write shield 45 and a 19 kG magnetic shield layer 43 adjoining the high Ms layer on a side that faces away from the main pole.
- side 43 s of the 19 kG magnetic shield layer that interfaces with high Ms shield layer 49 , and side 49 s of the high Ms shield layer that interfaces with write gap 45 may be formed substantially parallel to tapered trailing side 9 c 2 .
- a first embodiment of the present invention that retains all of the features of the PMR writer in FIG. 3 and also has a magnetic assist layer 3 made of an anisotropic magnetic material formed on tapered trailing side 9 c 2 and along a portion of trailing side 9 f 2 which is aligned perpendicular to the ABS.
- the magnetic assist layer has an anisotropy ( ⁇ Ku) energy constant with a hard axis aligned toward the main pole 9 .
- the magnetic assist layer may be comprised of a material such as CoPt or FePt having an anisotropy (+Ku) energy constant with a hard axis in a direction perpendicular to the ABS.
- the magnetic assist layer is comprised of a first section 3 a that extends from the ABS 50 - 50 to a corner 3 c where the tapered trailing side terminates, and a second section 3 b which extends from the corner 3 c to an end 3 e which is a distance d along trailing side 9 f 2 .
- end 3 e is a distance of 100 to 500 nm from the ABS.
- magnetic assist layer 3 has a thickness in a y-axis direction of 5 to 20 nm.
- the write gap 45 has a thickness of about 20 to 30 nm between magnetic assist layer section 3 a and side 49 s of the first trailing shield layer. Note that FIG.
- the magnetic assist layer 3 also provides an improvement in writability in an embodiment (not shown) wherein the trailing shield is a single layer made of isotropic magnetic material such as CoFeNi or CoFe.
- the first embodiment anticipates that the shield structure further includes side shields 44 that connect with first trailing shield layer 49 and leading shield 42 to form an AWA shield structure.
- the magnetic assist layer 3 of the present invention is equally beneficial in increasing flux amplitude and improving field gradient at the ABS if a partial side shield structure is employed.
- the plane 2 - 2 bisects the main pole in a down-track (y-axis) direction.
- the main pole 9 has a trapezoidal shape with a leading edge 9 e having a smaller width in a cross-track (x-axis) direction than the trailing edge 9 t.
- Main pole 9 may include a seed layer (not shown) along sides 9 s 1 , 9 s 2 and along leading edge 9 e that facilitates a deposition method wherein main pole material is plated in an opening (not shown) bounded by side gaps 41 and lead gap 47 .
- the side gap has a uniform width in the x-axis direction and conforms to the shape of the sides 9 s 1 , 9 s 2 .
- a write gap 45 having a width w that adjoins a top surface of each side gap 41 and interfaces with the magnetic assist layer (MAL) 3 along a side of the MAL that faces away from the trailing edge 9 t .
- the write gap may be comprised of the same dielectric material as in the side gap.
- a leading gap 47 interfaces with the leading edge 9 e and adjoins a bottom surface of each side gap.
- the width of the trailing edge 9 t is referred to as the track width TW and is preferably the same as the width of the magnetic assist layer 3 .
- the magnetic assist layer may be formed only along tapered trailing side 9 c 2 and terminates at corner 3 c where trailing side 9 f 2 connects with tapered trailing side 9 c 2 .
- the alternative embodiment in FIG. 6 is the same as the first embodiment in FIG. 4 except the magnetic assist layer is shortened in vertical height with respect to the ABS and is not formed along the section of trailing side 9 f 2 that is perpendicular to the ABS 50 - 50 .
- a non-magnetic seed layer 62 may be formed between the MAL 3 and the main pole 9 in order to induce the hard axis of the MAL in a direction perpendicular to the trailing edge 9 t and perpendicular to tapered trailing side 9 c 2 , and to trailing side 9 f 2 ( FIG. 4 ). Furthermore, the non-magnetic layer 62 prevents exchange coupling between the magnetic assist layer and the isotropic magnetic material in the main pole.
- the non-magnetic seed layer is made of Ru with a thickness from 5 to 20 Angstroms.
- the non-magnetic seed layer is omitted and a hard axis is induced in the magnetic assist layer 3 by sputter depositing the MAL at a tilted angle with respect to the ABS.
- the magnetic assist layer is preferably comprised of an anisotropic magnetic material which may have a ( ⁇ Ku) crystalline energy constant such as hcp-CoIr wherein the Ir content is from 10 to 40 atomic %, and preferably between 17 and 22 atomic %, dhcp-CoFe, a′-Fe—C, or NiAs-type Mn 50 Sb 50 .
- the present invention also anticipates that the magnetic assist layer may be comprised of an anisotropic magnetic material such as CoPt or FePt with a (+Ku) crystalline energy constant.
- the write gap thickness may be thinner than in prior art shield designs thereby enabling a higher BPI than previously realized.
- side shields 44 adjoin side gap 41 on either side of main pole 9 , and leading shield 42 interfaces with leading gap 47 and side shields in FIG. 5 .
- a bottom surface of first trailing shield layer 49 contacts side shield sections 44 at distances greater than 1 ⁇ 2 w from the center plane 2 - 2 .
- Side shields 44 and leading shield 42 may be formed of the same soft magnetic material as in second trailing shield layer 43 .
- FIG. 7 a plot of vertical magnetic field profile along the down-track direction is shown for the PMR writers in FIG. 3 (solid line) and in FIG. 4 (dashed line), respectively.
- the write gap thickness is held constant at 26 nm and the track width is 60 nm.
- the results (dashed line) that represent an embodiment of the present invention were generated with an assisted magnetic layer thickness of 5 nm, and a vertical height (distance between ABS and end of MAL) of 200 nm.
- the overwrite is improved by 4 dB with the example in FIG. 4 when the magnetic assist layer has a 1 Telsa Ms and 1 Telsa Hk along a direction perpendicular to the ABS.
- a gain in both field amplitude and field gradient is observed for the design with the magnetic assist layer. Additional improvement may be realized with adjustments in the geometry of the magnetic assist layer and in its magnetic property.
- FIG. 8 an ABS view of an intermediate structure formed during the fabrication of a PMR writer according to the first embodiment ( FIG. 4 ) is shown.
- a leading shield 42 and side shield layer 44 are sequentially formed on a substrate (not shown) by a conventional plating method.
- an opening (not shown) that is bounded by sidewalls 44 s and top surface 42 s is formed in the side shield layer 44 by a well known photoresist patterning and ion beam milling (IBE) sequence.
- IBE photoresist patterning and ion beam milling
- a dielectric material is deposited in the opening to form lead gap 47 on a portion of top surface 42 s , and to form a side gap 41 on sidewalls 44 s.
- main pole 9 is plated on side gap 41 and lead gap 47 to fill the opening.
- a chemical mechanical polish (CMP) process is used to form a main pole top surface including trailing edge 9 t that is coplanar with top surfaces of side shields 44 and side gaps 41 .
- a photoresist layer 48 is coated on the side shields, side gaps, and main pole and then patterned to form an opening 52 that uncovers a portion of main pole top surface including leading edge 9 t .
- An ion beam milling process that comprises ion beams 50 is employed to taper the trailing side ( 9 f 2 in FIG. 4 ) and form a tapered side 9 c 2 having a taper angle ⁇ 2 as depicted in FIG. 3 .
- the tapered leading side 9 c 1 connected to leading side 9 f 1 may be formed by a standard process prior to ion beam milling process which tapers the trailing side.
- photoresist layer 48 remains in place while a non-magnetic seed layer 62 preferably made of Ru is sputter deposited on the tapered side 9 c 1 within opening 52 according to one process flow sequence.
- the magnetic assist layer 3 is sputter deposited on the non-magnetic seed layer.
- the MAL is made of Co 83 Ir 17 although an Ir content between 10 and 40 atomic % is also acceptable.
- the MAL 3 and non-magnetic seed layer 62 have essentially the same width as the TW for trailing edge 9 t.
- the photoresist mask 48 is now removed by a standard method.
- a second photoresist layer 60 is coated on side shields 44 , side gaps 41 , and on magnetic assist layer 3 , and is then patterned to form an opening 61 which uncovers the MAL and a top surface 41 t of each side gap.
- the size of the opening 61 corresponds to the desired width w (and length in a z-axis direction which is not shown) of the subsequently deposited write gap.
- a write gap layer is deposited by an atomic layer deposition (ALD) method to form a conformal write gap 45 on the tapered main pole trailing side 9 c 2 (not shown) including magnetic assist layer 3 , and on side gap top surfaces 41 t .
- ALD atomic layer deposition
- the write gap has a thickness of about 20 to 30 nm above the side gap 41 .
- the second photoresist layer is stripped by a conventional process.
- the high Ms (24 kG) trailing shield layer 49 is plated by a well known method followed by plating the 19 kG trailing shield layer 43 to complete the shield structure for the PMR writer.
- FIG. 13 an alternative process flow sequence that relates to a magnetic assist layer having a (+Ku) crystalline energy constant is shown and begins with the intermediate structure shown in FIG. 8 .
- a non-magnetic seed layer is not deposited and the MAL 3 made of CoPt or FePt, for example, is deposited by a tilted (oblique) angle sputter deposition method.
- the resulting magnetic assist layer is exchange coupled with the main pole 9 and has anisotropy induced in a direction perpendicular to the ABS along a z-axis direction.
- FIGS. 10-12 are followed to form the write gap and trailing shield structure.
- the advantages of the present invention are that flux leakage from a main pole to a trailing shield is significantly reduced compared with prior art shield designs such that BPI is improved to enable higher performance in advanced PMR writer designs. Furthermore, write field amplitude and field gradient are improved over a prior art design that does not have a magnetic assist feature on the main pole when a constant write gap distance is employed.
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Abstract
Description
- This application is related to the following: Docket # HT10-031, Ser. No. ______; filing date ______; assigned to a common assignee, and herein incorporated by reference in its entirety.
- The invention relates to a thin magnetic film with an anisotropic magnetic property that is added to the trailing side of a main pole and thereby provides additional magnetic charge on the ABS surface to improve writability and field gradient.
- In today's perpendicular magnetic recording (PMR) technology, an all wrapped around (AWA) shield writer is widely used by the major hard disk drive (HDD) manufacturers. The function of a trailing shield in an AWA structure is to improve the magnetic field gradient along a down track direction which is a key requirement for high bits per inch (BPI). Meanwhile, side shields and a leading shield serve to define a narrower writer bubble which is important for realizing higher tracks per inch (TPI). In order to achieve higher area density (i.e. higher BPI and TPI) in advanced writer designs, the gap between the main pole and all shields, including the write gap adjoining the trailing shield, side gaps to the side shields, and lead gap next to the leading shield must be as narrow as possible. However, the material used for conventional AWA shields is a soft magnetic material without preferred anisotropy. Therefore, narrowing the gap between a shield and main pole will only lead to an unwanted flux path from the main pole to the shield which in turn reduces the writability (magnetic field) of the writer on magnetic recording media. This dilemma is considered one of the most significant challenges to improving current writer designs and performance.
- Referring to
FIG. 1 , internal flux loss is depicted in aconventional PMR writer 1 comprising amain pole 11 andshield 12 that can represent a trailing shield, side shield, or leading shield depending on the direction of movement of the writer overmagnetic medium 10 during a write process.Magnetic charges shield 12, andmain pole 11, respectively, and are responsible during a write process for thepreferred direction 5 of flux Bs1 from the main pole to the magnetic medium, and returning from the magnetic medium to the shield. Magnetic flux Bs0 is provided to the main pole from coils (not shown). As the gap (distance) between main pole and shield becomes smaller, flux loss Bs2 in adirection 6 from main pole to shield becomes more severe due to magnetic charges 7 b, 8 b on opposing sides of the shield, and main pole, respectively. Consequently, the write field Bs1 on the magnetic recording medium will be degraded. With the constraint of write field amplitude on themagnetic medium 10, further reduction of the gap between main pole and shields is not productive which limits achieving a higher recording area density. In particular, decreasing the write gap between main pole and trailing shield has been an effective way in improving field gradient and BPI during the past few years. However, current technology does not enable further field gradient improvement when the write gap shrinks below 20 nm. One possible reason is the magnetic charges 7 b, 8 b for main pole and trailing shield are more concentrated on opposing sides as pictured inFIG. 1 than on the ABS surface when the write gap becomes too narrow in conventional designs. Thus, an improved writer design is needed to minimize flux loss Bs2 and maximize write field Bs1. - A search of the prior art revealed the following references. U.S. Patent Application 2010/0157484 shows a magnetic field auxiliary pole and a non-magnetic layer stacked on the main pole to increase field strength and gradient. However, the stacked layers are recessed from the ABS and are not expected to entirely prevent flux leakage from the main pole to an adjacent trailing shield.
- In U.S. Patent Application 2010/0149687, a trailing shield is shown with multiple layers and is separated from the trailing side of a main pole by a gap layer.
- U.S. Pat. No. 7,657,992 discloses a small trailing shield stitched onto the main pole at the ABS but separated from the main pole by a write gap layer.
- U.S. Pat. No. 6,530,141 describes a magnetic pole construction resulting in a high field gradient.
- A. Hashimoto et al. describe the use of a negative Ku magnetic material in “A soft magnetic underlayer with negative uniaxial magnetocrystalline anisotropy for suppression of spike noise and wide adjacent track erasure in perpendicular magnetic recording media”, Journal of Applied Physics, 99, 08Q907 (2006).
- A composite grain of easy plane material (CoIr with negative Ku) and perpendicular anisotropy material (CoPt with positive Ku) are used in a magnetic medium to improve the head field gradient and amplitude as described by Park et al in “A novel crystalline soft magnetic intermediate layer for perpendicular recording media”, Journal of Applied Physics, 105, 07B723 (2009), and in “Co-7% Ir Soft Magnetic Intermediate Layer for Perpendicular Media”, IEEE Transactions on Magnetics, Vol. 46, No. 6, June 2010.
- Takahashi et al. discuss structural and magnetic analyses of a′-Fe—C films in “Magnetocrystalline Anisotropy for a′-Fe—C and a′-Fe—N Films”, IEEE Transactions on Magnetics, Vol. 37, No. 4, July 2001.
- One objective of the present invention is to provide additional magnetic charge at the trailing edge of the recording field to improve field amplitude and field gradient at the ABS and thereby increase BPI as required for high area density PMR writers.
- Another objective of the present invention is to provide a method of forming a PMR writer with improved field amplitude and field gradient according to the first objective.
- According to the embodiments of the present invention, the first objective is achieved with a magnetic assist layer formed on a trailing side of a main pole and adjoining a write gap layer. The magnetic assist layer has a width in a cross-track direction that is essentially equal to that of the main pole track width, a thickness in a down track direction of 5 to 20 nm, and extends a distance of 100 to 500 nm from the ABS toward a back end of the PMR writer. Preferably, the magnetic assist layer is comprised of an anisotropic magnetic material. In one embodiment, the magnetic assist layer (MAL) has a negative crystalline anisotropy energy constant (−Ku) at room temperature. Alternatively, the magnetic assist layer has a positive crystalline anisotropy constant (+Ku). A magnetic assist layer with a (−Ku) energy constant may be deposited on a seed layer such as Ru that aligns the c-axis (hard axis) of the hexagonal crystalline MAL structure toward the main pole. The c-axis (hard axis) is preferably aligned toward the main pole for a MAL with (−Ku) energy constant while the c-axis is preferably vertical to the ABS for a MAL with a (+Ku) energy constant. Thus, magnetization of the magnetic assist layer can only be induced in a direction toward the main pole with a strong magnetic field. Furthermore, the magnetic assist layer is totally soft in a 2D plane orthogonal to the hard axis which means the magnetization of the MAL can be easily induced in any direction orthogonal to the hard axis with a weak magnetic field. As a result, magnetic charges are minimized on the trailing side of the MAL facing the trailing shield such that flux loss from the main pole to the trailing shield is insignificant thereby increasing field amplitude and field gradient at the ABS
- According to a first embodiment, the shield structure may comprise a trailing shield, leading shield, and side shields. Moreover, the trailing shield may be a composite with a first layer adjoining the write gap made of a high Ms (24 kG) magnetic material and a second (19 kG) magnetic layer formed on a side of the first layer that faces away from the main pole. In one aspect, the shield structure may be an AWA design that completely surrounds the main pole. Furthermore, the main pole may have both of a tapered leading side and a tapered trailing side. A key feature is that a magnetic assist layer made of an anisotropic magnetic material is formed on a portion of the main pole trailing side and extends from the ABS toward the back end of the main pole. In a first embodiment, the MAL is formed along the tapered trailing side of the main pole and continues along a portion of the trailing side that connects the tapered trailing side with a back end of the main pole. The present invention also encompasses a second embodiment wherein the magnetic assist layer is formed only along the tapered trailing side of the main pole.
- A method is provided for forming a PMR writer with a magnetic assist layer comprised of an anisotropic magnetic material adjoining a trailing side of a main pole. According to one embodiment, a leading shield and a side shield layer made of an isotropic soft magnetic material are sequentially formed on a substrate. An opening with sidewalls is formed in the side shield to expose a portion of the leading shield top surface. Side gap and leading gap layers are conformally deposited in the opening followed by plating the main pole to fill the opening. After a CMP process to planarize the main pole, a taper may be formed on the main pole trailing side by ion beam milling. Then a non-magnetic seed layer, and an anisotropic (−Ku) magnetic assist layer are sequentially deposited on a portion of the main pole trailing side including the trailing edge. Alternatively, an anisotropic (+Ku) magnetic assist layer is directly deposited on the main pole trailing side by an oblique sputtering method. Subsequently, the write gap is deposited on the magnetic assist layer. Finally, the trailing shield is plated on the write gap to complete the shield structure.
-
FIG. 1 is an oblique view of a prior art PMR writer where there is considerable flux loss from the main pole in a direction toward an adjacent shield. -
FIG. 2 is an oblique view of a PMR writer with a shield made of an anisotropic magnetic material to minimize flux leakage from the main pole to an adjacent shield. -
FIG. 3 is a cross-sectional view of a PMR writer structure previously fabricated by the inventors that has a composite trailing shield and a leading shield adjacent to a main pole with tapered leading and trailing sides. -
FIG. 4 is a cross-sectional view of a PMR writer formed according to an embodiment of the present invention wherein a magnetic assist layer made of an anisotropic magnetic material is formed along a trailing side of a main pole. -
FIG. 5 is an ABS view of the embodiment depicted inFIG. 4 and further includes side shields that connect with the trailing shield and leading shield. -
FIG. 6 is a cross-sectional view of a PMR writer according to a second embodiment of the present invention wherein a magnetic assist layer comprising an anisotropic magnetic material is formed only along a tapered trailing side of a main pole. -
FIG. 7 is a plot of vertical magnetic field vs. down-track position for the PMR writer structures depicted inFIGS. 3 and 4 . -
FIGS. 8-12 show intermediate steps during the fabrication of the PMR writer depicted inFIG. 4 . -
FIG. 13 shows an alternative method of forming a magnetic assist layer made of an anisotropic magnetic material on a main pole trailing side. - The present invention is a PMR writer design which takes advantage of the discovery that an anisotropic magnetic material may be used as a magnetic assist layer on a main pole trailing side to minimize flux loss from the main pole to a trailing shield and thereby maximize the flux field and field gradient at the main pole interface with the ABS. Although the exemplary embodiment depicts a trapezoidal shaped main pole at the ABS, the present invention also encompasses other main pole shapes. Furthermore, the main pole may have one or both of a tapered trailing edge and a tapered leading edge. Width in the context of shield structures and layers defined herein refers to a distance in a cross-track direction, and thickness or depth relates to a distance in a down-track direction. The gap layer as illustrated herein may not have a uniform thickness and the write gap portion between the main pole and trailing shield is typically thinner than the lead gap.
- Referring to
FIG. 2 , we described in related patent application HT10-031 how ashield 20 made of anisotropic magnetic material and formed adjacent to amain pole 11 may be used to maximize themagnetic charges shield 20, andmain pole 11, respectively. In the absence of a strong magnetic field, there are essentially no magnetic charges formed on a side of the shield facing the main pole which prevents a portion of magnetic field Bs0 from being diverted to the shield. Thus, the magnetic field Bs1 at the ABS is maximized compared with the condition previously shown inFIG. 1 and the gap between main pole and trailing shield may be reduced with a minimum amount of flux loss to enable a significant gain in BPI for advanced PMR writer designs. Herein, we disclose additional PMR writer designs where an anisotropic magnetic layer is placed at other locations adjacent to a main pole to prevent flux loss to a trailing shield and increase the flux field and field gradient at the ABS. - Referring to
FIG. 3 , a cross-sectional view of a PMR writer previously fabricated by the inventors is shown having amain pole 9 formed along an ABS 50-50 and a trailing shield and leadingshield 42 formed on either side of the main pole along the cross-track (x-axis) direction. The y-axis is the down-track direction while the z-axis direction is toward theback end 9 v of the main pole. In the exemplary embodiment, there is a tapered leading side 9c 1 formed at an angle θ1 with respect to a plane B-B aligned perpendicular to the ABS, and connected to a leading side 9f 1 which terminates at theback end 9 v. There is also a tapered trailing side 9c 2 formed at an angle θ2 of about 0 to 45 degrees, and preferably 25 to 30 degrees, with respect to a plane A-A aligned perpendicular to the ABS, and connected to a trailing side 9f 2 that terminates at the back end.Main pole 9 has a trailingedge 9 t andleading edge 9 e at the ABS, and is separated from leadingshield 42 by alead gap 47. In the exemplary embodiment, there is a composite trailing shield comprised of a high Ms (24 kG)magnetic shield layer 49 formed adjacent to awrite shield 45 and a 19 kGmagnetic shield layer 43 adjoining the high Ms layer on a side that faces away from the main pole. In one aspect,side 43 s of the 19 kG magnetic shield layer that interfaces with highMs shield layer 49, andside 49 s of the high Ms shield layer that interfaces withwrite gap 45 may be formed substantially parallel to tapered trailing side 9c 2. - Referring to
FIG. 4 , a first embodiment of the present invention is shown that retains all of the features of the PMR writer inFIG. 3 and also has amagnetic assist layer 3 made of an anisotropic magnetic material formed on tapered trailing side 9 c 2 and along a portion of trailing side 9f 2 which is aligned perpendicular to the ABS. According to one embodiment, the magnetic assist layer has an anisotropy (−Ku) energy constant with a hard axis aligned toward themain pole 9. Alternatively, the magnetic assist layer may be comprised of a material such as CoPt or FePt having an anisotropy (+Ku) energy constant with a hard axis in a direction perpendicular to the ABS. In one aspect, the magnetic assist layer is comprised of afirst section 3 a that extends from the ABS 50-50 to acorner 3 c where the tapered trailing side terminates, and a second section 3 b which extends from thecorner 3 c to anend 3 e which is a distance d along trailing side 9f 2. Preferably,end 3 e is a distance of 100 to 500 nm from the ABS. Moreover,magnetic assist layer 3 has a thickness in a y-axis direction of 5 to 20 nm. Typically, thewrite gap 45 has a thickness of about 20 to 30 nm between magneticassist layer section 3 a andside 49 s of the first trailing shield layer. Note thatFIG. 4 is a cross-sectional view taken along the plane 2-2 in the ABS view illustrated inFIG. 5 . It should be understood that themagnetic assist layer 3 also provides an improvement in writability in an embodiment (not shown) wherein the trailing shield is a single layer made of isotropic magnetic material such as CoFeNi or CoFe. - Referring to
FIG. 5 , the first embodiment anticipates that the shield structure further includes side shields 44 that connect with first trailingshield layer 49 and leadingshield 42 to form an AWA shield structure. However, it should be understood that themagnetic assist layer 3 of the present invention is equally beneficial in increasing flux amplitude and improving field gradient at the ABS if a partial side shield structure is employed. The plane 2-2 bisects the main pole in a down-track (y-axis) direction. In the exemplary embodiment, themain pole 9 has a trapezoidal shape with aleading edge 9 e having a smaller width in a cross-track (x-axis) direction than the trailingedge 9 t. Sloped sides 9s 1, 9s 2 of the main pole are adjoined by aside gap 41 made of a dielectric material.Main pole 9 may include a seed layer (not shown) along sides 9s 1, 9s 2 and along leadingedge 9 e that facilitates a deposition method wherein main pole material is plated in an opening (not shown) bounded byside gaps 41 andlead gap 47. In the exemplary embodiment, the side gap has a uniform width in the x-axis direction and conforms to the shape of the sides 9s 1, 9s 2. There is also awrite gap 45 having a width w that adjoins a top surface of eachside gap 41 and interfaces with the magnetic assist layer (MAL) 3 along a side of the MAL that faces away from the trailingedge 9 t. The write gap may be comprised of the same dielectric material as in the side gap. A leadinggap 47 interfaces with theleading edge 9 e and adjoins a bottom surface of each side gap. Thus, there is a gap layer completely surroundingmain pole 9 but the thickness along the plane 2-2 is typically less for thewrite gap 45 than for leadinggap 47. The width of the trailingedge 9 t is referred to as the track width TW and is preferably the same as the width of themagnetic assist layer 3. - In an alternative embodiment shown in
FIG. 6 , the magnetic assist layer may be formed only along tapered trailing side 9 c 2 and terminates atcorner 3 c where trailing side 9f 2 connects with tapered trailing side 9c 2. In other words, the alternative embodiment inFIG. 6 is the same as the first embodiment inFIG. 4 except the magnetic assist layer is shortened in vertical height with respect to the ABS and is not formed along the section of trailing side 9f 2 that is perpendicular to the ABS 50-50. - According to embodiments relating to a magnetic assist layer made of an anisotropy (−Ku) magnetic material, a non-magnetic seed layer 62 (
FIG. 9 ) may be formed between theMAL 3 and themain pole 9 in order to induce the hard axis of the MAL in a direction perpendicular to the trailingedge 9 t and perpendicular to tapered trailing side 9c 2, and to trailing side 9 f 2 (FIG. 4 ). Furthermore, thenon-magnetic layer 62 prevents exchange coupling between the magnetic assist layer and the isotropic magnetic material in the main pole. Preferably, the non-magnetic seed layer is made of Ru with a thickness from 5 to 20 Angstroms. Optionally, the non-magnetic seed layer is omitted and a hard axis is induced in themagnetic assist layer 3 by sputter depositing the MAL at a tilted angle with respect to the ABS. - A key feature is that the magnetic assist layer is preferably comprised of an anisotropic magnetic material which may have a (−Ku) crystalline energy constant such as hcp-CoIr wherein the Ir content is from 10 to 40 atomic %, and preferably between 17 and 22 atomic %, dhcp-CoFe, a′-Fe—C, or NiAs-type Mn50Sb50. The present invention also anticipates that the magnetic assist layer may be comprised of an anisotropic magnetic material such as CoPt or FePt with a (+Ku) crystalline energy constant. As a result of incorporating a
magnetic assist layer 3 adjacent to a trailing side of the main pole, the write gap thickness may be thinner than in prior art shield designs thereby enabling a higher BPI than previously realized. Note that side shields 44adjoin side gap 41 on either side ofmain pole 9, and leadingshield 42 interfaces with leadinggap 47 and side shields inFIG. 5 . A bottom surface of first trailingshield layer 49 contactsside shield sections 44 at distances greater than ½ w from the center plane 2-2. Side shields 44 and leadingshield 42 may be formed of the same soft magnetic material as in secondtrailing shield layer 43. - Referring to
FIG. 7 , a plot of vertical magnetic field profile along the down-track direction is shown for the PMR writers inFIG. 3 (solid line) and inFIG. 4 (dashed line), respectively. In each case, the write gap thickness is held constant at 26 nm and the track width is 60 nm. The results (dashed line) that represent an embodiment of the present invention were generated with an assisted magnetic layer thickness of 5 nm, and a vertical height (distance between ABS and end of MAL) of 200 nm. The overwrite is improved by 4 dB with the example inFIG. 4 when the magnetic assist layer has a 1 Telsa Ms and 1 Telsa Hk along a direction perpendicular to the ABS. A gain in both field amplitude and field gradient is observed for the design with the magnetic assist layer. Additional improvement may be realized with adjustments in the geometry of the magnetic assist layer and in its magnetic property. - Referring to
FIG. 8 , an ABS view of an intermediate structure formed during the fabrication of a PMR writer according to the first embodiment (FIG. 4 ) is shown. A leadingshield 42 andside shield layer 44 are sequentially formed on a substrate (not shown) by a conventional plating method. Next, an opening (not shown) that is bounded by sidewalls 44 s andtop surface 42 s is formed in theside shield layer 44 by a well known photoresist patterning and ion beam milling (IBE) sequence. A dielectric material is deposited in the opening to formlead gap 47 on a portion oftop surface 42 s, and to form aside gap 41 onsidewalls 44 s. Thereafter,main pole 9 is plated onside gap 41 andlead gap 47 to fill the opening. Typically, a chemical mechanical polish (CMP) process is used to form a main pole top surface including trailingedge 9 t that is coplanar with top surfaces of side shields 44 andside gaps 41. Aphotoresist layer 48 is coated on the side shields, side gaps, and main pole and then patterned to form anopening 52 that uncovers a portion of main pole top surface including leadingedge 9 t. An ion beam milling process that comprises ion beams 50 is employed to taper the trailing side (9f 2 inFIG. 4 ) and form a tapered side 9c 2 having a taper angle θ2 as depicted inFIG. 3 . Note that the tapered leading side 9c 1 connected to leading side 9f 1 may be formed by a standard process prior to ion beam milling process which tapers the trailing side. - Referring to
FIG. 9 ,photoresist layer 48 remains in place while anon-magnetic seed layer 62 preferably made of Ru is sputter deposited on the tapered side 9c 1 within opening 52 according to one process flow sequence. Next, themagnetic assist layer 3 is sputter deposited on the non-magnetic seed layer. In a preferred embodiment, the MAL is made of Co83Ir17 although an Ir content between 10 and 40 atomic % is also acceptable. TheMAL 3 andnon-magnetic seed layer 62 have essentially the same width as the TW for trailingedge 9 t. Thephotoresist mask 48 is now removed by a standard method. - Referring to
FIG. 10 , asecond photoresist layer 60 is coated on side shields 44,side gaps 41, and onmagnetic assist layer 3, and is then patterned to form anopening 61 which uncovers the MAL and atop surface 41 t of each side gap. The size of theopening 61 corresponds to the desired width w (and length in a z-axis direction which is not shown) of the subsequently deposited write gap. - Referring to
FIG. 11 , a write gap layer is deposited by an atomic layer deposition (ALD) method to form aconformal write gap 45 on the tapered main pole trailing side 9 c 2 (not shown) includingmagnetic assist layer 3, and on side gap top surfaces 41 t. Preferably, the write gap has a thickness of about 20 to 30 nm above theside gap 41. Thereafter, the second photoresist layer is stripped by a conventional process. - Referring to
FIG. 12 , the high Ms (24 kG) trailingshield layer 49 is plated by a well known method followed by plating the 19 kG trailingshield layer 43 to complete the shield structure for the PMR writer. - Referring to
FIG. 13 , an alternative process flow sequence that relates to a magnetic assist layer having a (+Ku) crystalline energy constant is shown and begins with the intermediate structure shown inFIG. 8 . In this case, a non-magnetic seed layer is not deposited and theMAL 3 made of CoPt or FePt, for example, is deposited by a tilted (oblique) angle sputter deposition method. The resulting magnetic assist layer is exchange coupled with themain pole 9 and has anisotropy induced in a direction perpendicular to the ABS along a z-axis direction. Thereafter, the processes described with respect toFIGS. 10-12 are followed to form the write gap and trailing shield structure. - The advantages of the present invention are that flux leakage from a main pole to a trailing shield is significantly reduced compared with prior art shield designs such that BPI is improved to enable higher performance in advanced PMR writer designs. Furthermore, write field amplitude and field gradient are improved over a prior art design that does not have a magnetic assist feature on the main pole when a constant write gap distance is employed.
- While this invention has been particularly shown and described with reference to, the preferred embodiment thereof, it will be understood by those skilled in the art that various changes in form and details may be made without departing from the spirit and scope of this invention.
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