US20120194217A1 - Input/output core design and method of manufacture therefor - Google Patents

Input/output core design and method of manufacture therefor Download PDF

Info

Publication number
US20120194217A1
US20120194217A1 US13/443,691 US201213443691A US2012194217A1 US 20120194217 A1 US20120194217 A1 US 20120194217A1 US 201213443691 A US201213443691 A US 201213443691A US 2012194217 A1 US2012194217 A1 US 2012194217A1
Authority
US
United States
Prior art keywords
input
output
sides
substrate
layout boundary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US13/443,691
Inventor
Mark F. Turner
Jeff S. Brown
Paul Dorweiler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bell Semiconductor LLC
Original Assignee
LSI Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LSI Corp filed Critical LSI Corp
Priority to US13/443,691 priority Critical patent/US20120194217A1/en
Assigned to LSI CORPORATION reassignment LSI CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: BROWN, JEFF S., DORWEILER, PAUL, TURNER, MARK F.
Publication of US20120194217A1 publication Critical patent/US20120194217A1/en
Assigned to DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT reassignment DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT PATENT SECURITY AGREEMENT Assignors: AGERE SYSTEMS LLC, LSI CORPORATION
Assigned to AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. reassignment AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: LSI CORPORATION
Assigned to LSI CORPORATION, AGERE SYSTEMS LLC reassignment LSI CORPORATION TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS (RELEASES RF 032856-0031) Assignors: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Assigned to BELL SEMICONDUCTOR, LLC reassignment BELL SEMICONDUCTOR, LLC ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD., BROADCOM CORPORATION
Assigned to CORTLAND CAPITAL MARKET SERVICES LLC, AS COLLATERAL AGENT reassignment CORTLAND CAPITAL MARKET SERVICES LLC, AS COLLATERAL AGENT SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: BELL NORTHERN RESEARCH, LLC, BELL SEMICONDUCTOR, LLC, HILCO PATENT ACQUISITION 56, LLC
Assigned to BELL SEMICONDUCTOR, LLC, BELL NORTHERN RESEARCH, LLC, HILCO PATENT ACQUISITION 56, LLC reassignment BELL SEMICONDUCTOR, LLC SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CORTLAND CAPITAL MARKET SERVICES LLC
Abandoned legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04042Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • H01L2224/05554Shape in top view being square
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H01L2224/061Disposition
    • H01L2224/0612Layout
    • H01L2224/0613Square or rectangular array
    • H01L2224/06133Square or rectangular array with a staggered arrangement, e.g. depopulated array
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H01L2224/061Disposition
    • H01L2224/0612Layout
    • H01L2224/0613Square or rectangular array
    • H01L2224/06134Square or rectangular array covering only portions of the surface to be connected
    • H01L2224/06135Covering only the peripheral area of the surface to be connected, i.e. peripheral arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H01L2224/061Disposition
    • H01L2224/0612Layout
    • H01L2224/0615Mirror array, i.e. array having only a reflection symmetry, i.e. bilateral symmetry
    • H01L2224/06153Mirror array, i.e. array having only a reflection symmetry, i.e. bilateral symmetry with a staggered arrangement, e.g. depopulated array
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48153Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being arranged next to each other, e.g. on a common substrate
    • H01L2224/48175Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being arranged next to each other, e.g. on a common substrate the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits

Definitions

  • This application is directed, in general, to integrated circuit chip design, and more specifically to input/output core design, and a method of manufacture therefore.
  • I/O Input/Output core
  • designers physically design their I/O's to pack the most connections between the IC and the package in the smallest amount of area.
  • IC interfaces have become a limiting factor, as many packages require the chip I/O's to be surrounding the functional area of the IC along the outer edges of the die.
  • area grows faster than the length of the periphery of the die. For instance, when comparing a die that is one cm on a side to a die that is two cm on a side, the two cm die will have roughly four times the area for logic (four square centimeters versus one square centimeter) but only two times the periphery for I/O (8 cm versus 4 cm). Because of this, I/O's have tended to be physically designed tall and skinny—the narrower the better—to maximize the number of connections possible in the same amount of length along the perimeter of the die.
  • the tall and skinny I/O layout requires the I/O be rotated 90 degrees for placement along the sides of the die, and 180 degrees for placement along the top of the die.
  • process design rules have added constraints to the physical layout of the transistors on a die, one of which is that all transistor gates must be oriented in the same direction (e.g., vertical). It is difficult, however, to accommodate these constraints.
  • the orientation constraint can be accommodated by designing a special I/O layout for each side of the die, one that has the tall and skinny layout with the transistors similarly oriented. This is undesirable because of the time and expense required to do such.
  • the orientation constraint can be accommodated by not rotating the I/O by 90 degrees along the sides of the design, thereby effectively making the I/O short and fat along the sides, and thereby reducing the number of I/O's surrounding the chip. This is undesirable for obvious reasons.
  • I/O design that addresses the problems experienced by current I/O designs, including one that accommodates the need for symmetric transistor layout, while maintaining or even improving I/O packing density.
  • the input/output cell in one example, includes an input/output layout boundary delineated on a substrate, wherein the input/output layout boundary defines a first side parallel and opposing a second side, and a third side parallel and opposing a fourth side, wherein the first and second sides are substantially perpendicular the third and fourth sides.
  • the input/output cell in this example, further includes input/output transistors positioned within the input/output layout boundary over the substrate.
  • the input/output cell in this example, further includes first and second power conductors and first and second ground conductors located over the substrate, the first power conductor and first ground conductor extending entirely between the first and second sides and the second power conductor and second ground conductor extending entirely between the third and fourth sides.
  • an integrated circuit chip in this example, includes core logic circuitry positioned over a substrate and within a core logic layout boundary delineated on the substrate, and an array of input/output cells substantially surrounding and abutting the core logic layout boundary.
  • each of the input/output cells includes input/output transistors oriented in a same direction as the other input/output transistors in the array.
  • each input/output cell in this example further includes 1) an input/output layout boundary delineated on the substrate, wherein the input/output layout boundary defines a first side parallel and opposing a second side, a third side parallel and opposing a fourth side, wherein the first and second sides are substantially perpendicular the third and fourth sides, 2) first and second power conductors located over the substrate, the first power conductor extending entirely between the first and second sides and the second power conductor extending entirely between the third and fourth sides, 3) first and second ground conductors located over the substrate, the first ground conductor extending entirely between the first and second sides and the second ground conductor extending entirely between the third and fourth sides, and 4) a bond pad located within the input/output layout boundary over the substrate.
  • FIG. 1 illustrates an I/O cell designed and manufactured in accordance with the disclosure
  • FIG. 2 illustrates an I/O cell designed and manufactured in accordance with another embodiment of the disclosure
  • FIG. 3 illustrates four I/O cells each of which has been manufactured in accordance with the disclosure
  • FIG. 4 illustrates an integrated circuit (IC) chip designed and manufactured in accordance with the principles of the disclosure.
  • FIG. 5 illustrates an integrated circuit (IC) chip designed and manufactured in accordance with another embodiment of the disclosure.
  • the present disclosure is based in part, on the acknowledgement that by using a simple set of layout rules, a single I/O cell design can be used for all four sides of a core logic die, without violating transistor gate directionality rules, and maintaining or improving I/O cell density.
  • the disclosure recognizes that by making the power and ground conductors (e.g., rails) connectable on all four sides of the I/O layout boundary, the I/O cells can be stacked both vertically and horizontally.
  • a pair of signal pins may be located on two perpendicular sides of the I/O layout boundary, also allowing the I/O cells to be stacked vertically and horizontally.
  • the disclosure has also recognized that by making the bond pad layout boundary square, and in one example positioned in a corner of the I/O cell, improved I/O cell density can be obtained. Similar benefits are achieved by making the I/O layout boundary square.
  • the I/O cell 100 initially includes a substrate 110 .
  • the substrate 110 may be any substrate currently known or hereafter used in integrated circuits, including any substrate currently known or hereafter used in the manufacture of I/O cells.
  • the I/O layout boundary 120 defines a first side 122 that is parallel and opposing a second side 124 , as well as a third side 126 that is parallel and apposing a fourth side 128 .
  • the first and second sides 122 , 124 are perpendicular to the third and fourth sides 126 , 128 .
  • the I/O layout boundary 120 forms a square. Nevertheless, as shown in the I/O cell 200 of FIG. 2 , the I/O layout boundary 220 may embrace other shapes, including that of a rectangle.
  • I/O layout boundary means an actual or theoretical boundary encompassing all the features of a single, and often repeatable, I/O cell. For instance, certain embodiments exist wherein an array of I/O cells are stacked both horizontally and vertically around core logic circuitry. In this embodiment, a physical boundary between the different I/O cells may not exist, as they are all being formed on the same substrate. Notwithstanding the absence of a physical boundary, each of the different I/O cells would undoubtedly still have an I/O layout boundary.
  • the I/O cell 100 of FIG. 1 further includes I/O transistors 130 positioned within the I/O layout boundary 120 .
  • each of the transistors 130 is oriented in the same direction.
  • each of the transistors 130 in the embodiment of FIG. 1 is oriented in a vertical direction.
  • the orientation of the transistors 130 in adjacent I/O cells will often repeat, for example regardless of the side of the core logic layout boundary the specific I/O cell is positioned. Stated another way, certain embodiments of the disclosure will require all I/O transistors in an entire integrated circuit (IC) chip to have the same orientation.
  • IC integrated circuit
  • the I/O cell 100 of FIG. 1 further includes a bond pad 140 positioned within the I/O layout boundary 120 .
  • the bond pad 140 in the embodiment of FIG. 1 , is in the shape of a square. Nevertheless, other different embodiments exist wherein other shaped bond pads may be used.
  • the bond pad 140 is positioned proximate a corner of the I/O layout boundary 120 .
  • the phrase “proximate a corner of the I/O layout boundary” means that the bond pad 140 is positioned more near two perpendicular sides of the I/O layout boundary 120 than the two remaining sides. For example, in the embodiment of FIG.
  • the bond pad 140 is located proximate the corner formed by the second and fourth sides 124 , 128 , and thus would be distal the corner formed by the first and third sides 122 , 126 .
  • the bond pad 140 being positioned proximate a corner of the I/O layout boundary 120 , at least two sides of the bond pad 140 may face the I/O transistors 130 .
  • the I/O transistors 130 may be proximate multiple sides of the bond pad 140 , as opposed to only a single side of the bond pad as used in prior art structures.
  • the I/O cell of FIG. 1 further includes first and second power conductors 150 , 155 (e.g., rails) positioned over the substrate 110 .
  • the first and second power conductors 150 , 155 in the embodiment of FIG. 1 each extend entirely between opposing sides of the I/O layout boundary 120 .
  • the first power conductor 150 might extend entirely between the first side 122 and the second side 124
  • the second power conductor 155 might extend entirely between the third side 126 and the fourth side 128 .
  • the I/O cell 100 of FIG. 1 further includes first and second ground conductors 160 , 165 (e.g., rails) positioned over the substrate 110 .
  • the first ground conductor 160 might extend entirely between the first side 122 and the second side 124
  • the second ground conductor 165 might extend entirely between the third side 126 and the fourth side 128 .
  • the first power conductor 150 and first ground conductor 155 could be located on a given metal level of the I/O cell 100 , wherein the second power conductor 155 and second ground conductor 165 might be located on a different metal level of the I/O cell 100 .
  • the first power conductor 150 and first ground conductor 160 could be formed on metal level-3, and then the second power conductor 155 and second ground conductor 165 might be formed on subsequent metal level-4.
  • vias 170 , 175 could be used to interconnect the first power conductor 150 to the second power conductor 155 and the first ground conductor 160 to the second ground conductor 165 , respectively.
  • the position, location and size of the first and second power and ground conductors 150 , 155 , 160 , 165 provide for increased metal routing area. Accordingly, an I/O cell manufactured in accordance with this disclosure, such as the I/O cell 100 , may experience improved current carrying capacity, as compared to its prior art counterparts.
  • the I/O cell 100 of FIG. 1 further includes first and second signal pins 180 , 185 located over the substrate 110 .
  • the first signal pin 180 is located proximate the first side 122 and the second signal pin 185 is located proximate the third side 126 . While it is less important which side number the first and second signal pins 180 , 185 are located, it is more important that the first and second signal pins 180 , 185 are positioned such that regardless of whether the I/O cell 100 is being located on a horizontal side of the core logic layout boundary or a vertical size of the core logic layout boundary, at least one of the first or second signal pins 180 , 185 faces the core logic layout boundary.
  • first or second signal pins 180 , 185 should face the core logic circuitry.
  • the first and second signal pins 180 , 185 may be located on any layer of the I/O cell 100 .
  • An I/O cell such as the I/O cell 100 of FIG. 1
  • an I/O cell such as the I/O cell 100 of FIG. 1
  • transistor level features such as the transistors themselves (e.g., including source/drain features, gate oxides, and gate electrodes)
  • a dielectric layer could then be formed over the transistor level features, upon which the first power conductor and first ground conductor could be formed.
  • the first power conductor and first ground conductor in accordance with the disclosure, would typically extend entirely between the first and second sides of the I/O layout boundary.
  • first and second signal pins could be formed.
  • the bond pads would likely be formed in a subsequent metal level as the first and second signal pins.
  • FIG. 3 illustrated are four I/O cells 310 , 320 , 330 , 340 , each of which has been manufactured in accordance with the disclosure.
  • FIG. 3 is being used to illustrate that a single I/O cell design can be used in four different orientations, all of which are acceptable as they do not violate existing transistor gate directionality rules.
  • I/O cell 310 which includes its bond pad 312 in the upper left hand corner of its I/O layout boundary, as well as its transistors 314 being positioned vertically.
  • I/O cell 320 is just a mirror image of I/O cell 310 , taken about the line 350 .
  • I/O cell 340 is just a mirror image of I/O cell 310 , taken about the line 360 .
  • I/O cell 330 is just a mirror image of I/O cell 320 , taken about the line 360 .
  • the IC chip 400 initially includes a substrate 410 .
  • the substrate 410 may be similar to the substrate 110 illustrated in FIG. 1 .
  • Delineated on the substrate 110 is a core logic layout boundary 420 , in this embodiment including a first side 422 , a second opposing side 424 , a third side 426 and a fourth opposing side 428 .
  • the core logic layout boundary 420 in accordance with the disclosure, includes core logic circuitry (not shown) located therein and over the substrate 410 . As the core logic circuitry is well known in the art, no further discussion regarding the same is needed.
  • the core logic layout boundary 420 can include either an actual or a theoretical boundary encompassing all the features of the core logic circuitry. Accordingly, certain embodiments exist wherein a physical boundary is present separating the core logic circuitry contained within the core logic layout boundary 420 and the devices (e.g., I/O circuitry) surrounding the core logic circuitry. More often than not, however, no boundary exists, as the core logic circuitry and surrounding circuitry (e.g., the I/O circuitry) are formed on a single semiconductor substrate.
  • the IC chip 400 of FIG. 4 further includes a first 4 ⁇ 1 array 440 of I/O cells 430 along the first side 422 of the core logic layout boundary 420 , a second 4 ⁇ 1 array 450 of I/O cells 430 along the second side 424 of the core logic layout boundary 420 , a third 1 ⁇ 4 array 460 of I/O cells 430 along the third side 426 of the core logic layout boundary 420 , and a fourth 1 ⁇ 4 array 470 of I/O cells 430 along the fourth side 428 of the core logic layout boundary 420 .
  • the first, second, third and fourth arrays 440 , 450 , 460 , 470 substantially surround and abut the core logic layout boundary 420 .
  • each of the I/O cells 430 includes an I/O layout boundary including bond pads, as well as I/O transistors oriented in the same direction as the other I/O transistors in the first, second, third and fourth arrays 440 , 450 , 460 , 470 .
  • Each of the I/O cells 430 additionally includes a first signal pin located proximate a side of the I/O layout boundary abutting the core logic layout boundary 420 , as well as a second signal pin located proximate a side of the I/O layout boundary perpendicular the side of the I/O layout boundary abutting the core logic layout boundary 420 .
  • Each of the I/O cells 430 may additionally include first and second power conductors extending entirely between first and second opposing sides thereof and third and fourth opposing sides thereof, respectively. Similarly, each of the I/O cells 430 may include first and second ground conductors extending entirely between first and second opposing sides thereof and third and fourth opposing sides thereof, respectively.
  • first and second power conductors extending entirely between first and second opposing sides thereof and third and fourth opposing sides thereof, respectively.
  • first and second ground conductors extending entirely between first and second opposing sides thereof and third and fourth opposing sides thereof, respectively.
  • the corners of the IC chip 400 have been left blank. This represents just one embodiment. In another embodiment, the corners of the IC chip 400 are employed with additional bond pads, but without additional I/O transistors. In yet another embodiment, the corners of the IC chip 400 would have I/O cells 430 of their own, in effect providing even more I/O cells per given area of the core logic layout boundary 420 .
  • I/O cell A fairly specific I/O cell has been described with regard to the embodiment of FIG. 4 . Notwithstanding, those skilled in the art understand that other embodiments exist wherein the I/O cell used in the IC chip may differ from that disclosed with regard to FIG. 4 . For instance, any I/O cell manufactured in accordance with this disclosure could be used within the IC chip 400 of FIG. 4 without departing from the spirit thereof.
  • FIG. 5 illustrated is an embodiment of an alternative IC chip 500 design.
  • the IC chip 500 of FIG. 5 is very similar to the IC chip 400 of FIG. 4 , with the exception that the IC chip 500 includes a second array of I/O cells 520 surrounding the first array of I/O cells 510 .
  • the second array of I/O cells 520 is substantially surrounding the first array of I/O cells 510
  • the first array of I/O cells 510 is substantially surrounding the core logic circuitry 530 .
  • this configuration allows for doubling the number of I/O cells associated with the IC chip 500 .
  • the IC chip 500 of FIG. 5 further includes external connections 540 , for example lead frame connections, which are coupled to the bond pads of the arrays of I/O cells 510 , 520 .
  • wire bonds 550 couple the external connections 540 and the arrays of I/O cells 510 , 520 .
  • the positioning of the I/O cells in the first array 510 and second array 520 can be rearranged to improve wire bond spacing, and therefore reduce the likelihood that signals travelling over the different wire bonds 550 will cross.

Abstract

One aspect provides an input/output cell. The input/output cell, in one example, includes an input/output layout boundary delineated on a substrate, wherein the input/output layout boundary defines a first side parallel and opposing a second side, a third side parallel and opposing a fourth side, wherein the first and second sides are substantially perpendicular the third and fourth sides. The input/output cell, in this example, further includes input/output transistors positioned within the input/output layout boundary over the substrate. The input/output cell, in this example, further includes first and second power conductors and first and second ground conductors located over the substrate, the first power conductor and first ground conductor extending entirely between the first and second sides and the second power conductor and second ground conductor extending entirely between the third and fourth sides.

Description

    CROSS-REFERENCE TO RELATED APPLICATIONS
  • This application is a continuation of U.S. patent application Ser. No. 12/947,948, entitled “INPUT/OUTPUT CORE DESIGN AND METHOD OF MANUFACTURE THEREFOR”, filed on Nov. 17, 2010. The above-listed application is commonly assigned with the present invention and is incorporated herein by reference as if reproduced herein in its entirety.
  • TECHNICAL FIELD
  • This application is directed, in general, to integrated circuit chip design, and more specifically to input/output core design, and a method of manufacture therefore.
  • BACKGROUND
  • Input/Output core (I/O) designers physically design their I/O's to pack the most connections between the IC and the package in the smallest amount of area. Over time, IC interfaces have become a limiting factor, as many packages require the chip I/O's to be surrounding the functional area of the IC along the outer edges of the die. Unfortunately, area grows faster than the length of the periphery of the die. For instance, when comparing a die that is one cm on a side to a die that is two cm on a side, the two cm die will have roughly four times the area for logic (four square centimeters versus one square centimeter) but only two times the periphery for I/O (8 cm versus 4 cm). Because of this, I/O's have tended to be physically designed tall and skinny—the narrower the better—to maximize the number of connections possible in the same amount of length along the perimeter of the die.
  • The tall and skinny I/O layout requires the I/O be rotated 90 degrees for placement along the sides of the die, and 180 degrees for placement along the top of the die. Of recent, however, process design rules have added constraints to the physical layout of the transistors on a die, one of which is that all transistor gates must be oriented in the same direction (e.g., vertical). It is difficult, however, to accommodate these constraints. For example, the orientation constraint can be accommodated by designing a special I/O layout for each side of the die, one that has the tall and skinny layout with the transistors similarly oriented. This is undesirable because of the time and expense required to do such. Alternatively, the orientation constraint can be accommodated by not rotating the I/O by 90 degrees along the sides of the design, thereby effectively making the I/O short and fat along the sides, and thereby reducing the number of I/O's surrounding the chip. This is undesirable for obvious reasons.
  • Accordingly, what is needed in the art is an I/O design that addresses the problems experienced by current I/O designs, including one that accommodates the need for symmetric transistor layout, while maintaining or even improving I/O packing density.
  • SUMMARY
  • One aspect provides an input/output cell. The input/output cell, in one example, includes an input/output layout boundary delineated on a substrate, wherein the input/output layout boundary defines a first side parallel and opposing a second side, and a third side parallel and opposing a fourth side, wherein the first and second sides are substantially perpendicular the third and fourth sides. The input/output cell, in this example, further includes input/output transistors positioned within the input/output layout boundary over the substrate. The input/output cell, in this example, further includes first and second power conductors and first and second ground conductors located over the substrate, the first power conductor and first ground conductor extending entirely between the first and second sides and the second power conductor and second ground conductor extending entirely between the third and fourth sides.
  • In another aspect, a method for manufacturing the aforementioned input/output cell is provided. In yet another aspect, an integrated circuit chip is provided. The integrated circuit chip, in this example, includes core logic circuitry positioned over a substrate and within a core logic layout boundary delineated on the substrate, and an array of input/output cells substantially surrounding and abutting the core logic layout boundary. In this example, each of the input/output cells includes input/output transistors oriented in a same direction as the other input/output transistors in the array. Moreover, each input/output cell in this example further includes 1) an input/output layout boundary delineated on the substrate, wherein the input/output layout boundary defines a first side parallel and opposing a second side, a third side parallel and opposing a fourth side, wherein the first and second sides are substantially perpendicular the third and fourth sides, 2) first and second power conductors located over the substrate, the first power conductor extending entirely between the first and second sides and the second power conductor extending entirely between the third and fourth sides, 3) first and second ground conductors located over the substrate, the first ground conductor extending entirely between the first and second sides and the second ground conductor extending entirely between the third and fourth sides, and 4) a bond pad located within the input/output layout boundary over the substrate.
  • BRIEF DESCRIPTION
  • Reference is now made to the following descriptions taken in conjunction with the accompanying drawings, in which:
  • FIG. 1 illustrates an I/O cell designed and manufactured in accordance with the disclosure;
  • FIG. 2 illustrates an I/O cell designed and manufactured in accordance with another embodiment of the disclosure;
  • FIG. 3 illustrates four I/O cells each of which has been manufactured in accordance with the disclosure;
  • FIG. 4 illustrates an integrated circuit (IC) chip designed and manufactured in accordance with the principles of the disclosure; and
  • FIG. 5 illustrates an integrated circuit (IC) chip designed and manufactured in accordance with another embodiment of the disclosure.
  • DETAILED DESCRIPTION
  • The present disclosure is based in part, on the acknowledgement that by using a simple set of layout rules, a single I/O cell design can be used for all four sides of a core logic die, without violating transistor gate directionality rules, and maintaining or improving I/O cell density. With this acknowledgement, the disclosure recognizes that by making the power and ground conductors (e.g., rails) connectable on all four sides of the I/O layout boundary, the I/O cells can be stacked both vertically and horizontally. In concert with the power and ground conductors being connectable on all four sides, a pair of signal pins may be located on two perpendicular sides of the I/O layout boundary, also allowing the I/O cells to be stacked vertically and horizontally. The disclosure has also recognized that by making the bond pad layout boundary square, and in one example positioned in a corner of the I/O cell, improved I/O cell density can be obtained. Similar benefits are achieved by making the I/O layout boundary square.
  • Turning to FIG. 1, illustrated is an I/O cell 100 designed and manufactured in accordance with the disclosure. The I/O cell 100 initially includes a substrate 110. The substrate 110 may be any substrate currently known or hereafter used in integrated circuits, including any substrate currently known or hereafter used in the manufacture of I/O cells.
  • Delineated on the substrate 110 in the embodiment of FIG. 1 is an I/O layout boundary 120. The I/O layout boundary 120 defines a first side 122 that is parallel and opposing a second side 124, as well as a third side 126 that is parallel and apposing a fourth side 128. In the embodiment of FIG. 1, the first and second sides 122, 124 are perpendicular to the third and fourth sides 126, 128. Likewise, in the embodiment of FIG. 1, the I/O layout boundary 120 forms a square. Nevertheless, as shown in the I/O cell 200 of FIG. 2, the I/O layout boundary 220 may embrace other shapes, including that of a rectangle.
  • The term “I/O layout boundary” as used herein, means an actual or theoretical boundary encompassing all the features of a single, and often repeatable, I/O cell. For instance, certain embodiments exist wherein an array of I/O cells are stacked both horizontally and vertically around core logic circuitry. In this embodiment, a physical boundary between the different I/O cells may not exist, as they are all being formed on the same substrate. Notwithstanding the absence of a physical boundary, each of the different I/O cells would undoubtedly still have an I/O layout boundary.
  • The I/O cell 100 of FIG. 1 further includes I/O transistors 130 positioned within the I/O layout boundary 120. In the example of FIG. 1, each of the transistors 130 is oriented in the same direction. For example, each of the transistors 130 in the embodiment of FIG. 1 is oriented in a vertical direction. In accordance with known transistor gate directionality rules, the orientation of the transistors 130 in adjacent I/O cells will often repeat, for example regardless of the side of the core logic layout boundary the specific I/O cell is positioned. Stated another way, certain embodiments of the disclosure will require all I/O transistors in an entire integrated circuit (IC) chip to have the same orientation.
  • The I/O cell 100 of FIG. 1 further includes a bond pad 140 positioned within the I/O layout boundary 120. The bond pad 140, in the embodiment of FIG. 1, is in the shape of a square. Nevertheless, other different embodiments exist wherein other shaped bond pads may be used. Likewise, the bond pad 140 is positioned proximate a corner of the I/O layout boundary 120. As used herein, the phrase “proximate a corner of the I/O layout boundary” means that the bond pad 140 is positioned more near two perpendicular sides of the I/O layout boundary 120 than the two remaining sides. For example, in the embodiment of FIG. 1, the bond pad 140 is located proximate the corner formed by the second and fourth sides 124, 128, and thus would be distal the corner formed by the first and third sides 122, 126. As a result of the bond pad 140 being positioned proximate a corner of the I/O layout boundary 120, at least two sides of the bond pad 140 may face the I/O transistors 130. Stated another way, the I/O transistors 130 may be proximate multiple sides of the bond pad 140, as opposed to only a single side of the bond pad as used in prior art structures.
  • The I/O cell of FIG. 1 further includes first and second power conductors 150, 155 (e.g., rails) positioned over the substrate 110. The first and second power conductors 150, 155 in the embodiment of FIG. 1, each extend entirely between opposing sides of the I/O layout boundary 120. For instance, the first power conductor 150 might extend entirely between the first side 122 and the second side 124, and the second power conductor 155 might extend entirely between the third side 126 and the fourth side 128. The I/O cell 100 of FIG. 1 further includes first and second ground conductors 160, 165 (e.g., rails) positioned over the substrate 110. The first and second ground conductors 160, 165 in the embodiment of FIG. 1, each also extend entirely between opposing sides of the I/O layout boundary 120. For instance, the first ground conductor 160 might extend entirely between the first side 122 and the second side 124, and the second ground conductor 165 might extend entirely between the third side 126 and the fourth side 128.
  • In the embodiment of FIG. 1, the first power conductor 150 and first ground conductor 155 could be located on a given metal level of the I/O cell 100, wherein the second power conductor 155 and second ground conductor 165 might be located on a different metal level of the I/O cell 100. For example, the first power conductor 150 and first ground conductor 160 could be formed on metal level-3, and then the second power conductor 155 and second ground conductor 165 might be formed on subsequent metal level-4. In this configuration, vias 170, 175 could be used to interconnect the first power conductor 150 to the second power conductor 155 and the first ground conductor 160 to the second ground conductor 165, respectively.
  • In the embodiment of FIG. 1, the position, location and size of the first and second power and ground conductors 150, 155, 160, 165 provide for increased metal routing area. Accordingly, an I/O cell manufactured in accordance with this disclosure, such as the I/O cell 100, may experience improved current carrying capacity, as compared to its prior art counterparts.
  • The I/O cell 100 of FIG. 1 further includes first and second signal pins 180, 185 located over the substrate 110. In the embodiment shown, the first signal pin 180 is located proximate the first side 122 and the second signal pin 185 is located proximate the third side 126. While it is less important which side number the first and second signal pins 180, 185 are located, it is more important that the first and second signal pins 180, 185 are positioned such that regardless of whether the I/O cell 100 is being located on a horizontal side of the core logic layout boundary or a vertical size of the core logic layout boundary, at least one of the first or second signal pins 180, 185 faces the core logic layout boundary. State another way, regardless of the orientation of the I/O cell 100, at least one of the first or second signal pins 180, 185 should face the core logic circuitry. The first and second signal pins 180, 185, may be located on any layer of the I/O cell 100.
  • An I/O cell, such as the I/O cell 100 of FIG. 1, may be manufactured using a variety of different processes and steps. Nevertheless, in one embodiment an I/O cell, such as the I/O cell 100 of FIG. 1, could be manufactured by first providing a substrate. After providing the substrate, transistor level features, such as the transistors themselves (e.g., including source/drain features, gate oxides, and gate electrodes), could be formed in/on/over the substrate. A dielectric layer could then be formed over the transistor level features, upon which the first power conductor and first ground conductor could be formed. The first power conductor and first ground conductor, in accordance with the disclosure, would typically extend entirely between the first and second sides of the I/O layout boundary. Subsequent thereto, another dielectric layer could be formed over the first power conductor and first ground conductor. Vias could then be formed through this dielectric layer to contact the first power conductor and first ground conductor. A second power conductor and second ground conductor may then be formed on the second dielectric layer, aligned with the vias. Thereafter, the first and second signal pins could be formed. The bond pads would likely be formed in a subsequent metal level as the first and second signal pins.
  • Turning to FIG. 3, illustrated are four I/ O cells 310, 320, 330, 340, each of which has been manufactured in accordance with the disclosure. FIG. 3 is being used to illustrate that a single I/O cell design can be used in four different orientations, all of which are acceptable as they do not violate existing transistor gate directionality rules. Take for example I/O cell 310, which includes its bond pad 312 in the upper left hand corner of its I/O layout boundary, as well as its transistors 314 being positioned vertically. As is evident, I/O cell 320 is just a mirror image of I/O cell 310, taken about the line 350. Similarly, I/O cell 340 is just a mirror image of I/O cell 310, taken about the line 360. Likewise, I/O cell 330 is just a mirror image of I/O cell 320, taken about the line 360.
  • Turning to FIG. 4, illustrated is an integrated circuit (IC) chip 400 designed and manufactured in accordance with the principles of the disclosure. The IC chip 400 initially includes a substrate 410. The substrate 410 may be similar to the substrate 110 illustrated in FIG. 1. Delineated on the substrate 110 is a core logic layout boundary 420, in this embodiment including a first side 422, a second opposing side 424, a third side 426 and a fourth opposing side 428. The core logic layout boundary 420, in accordance with the disclosure, includes core logic circuitry (not shown) located therein and over the substrate 410. As the core logic circuitry is well known in the art, no further discussion regarding the same is needed.
  • As discussed above with regard to the I/O boundary of FIG. 1, the core logic layout boundary 420 can include either an actual or a theoretical boundary encompassing all the features of the core logic circuitry. Accordingly, certain embodiments exist wherein a physical boundary is present separating the core logic circuitry contained within the core logic layout boundary 420 and the devices (e.g., I/O circuitry) surrounding the core logic circuitry. More often than not, however, no boundary exists, as the core logic circuitry and surrounding circuitry (e.g., the I/O circuitry) are formed on a single semiconductor substrate.
  • The IC chip 400 of FIG. 4 further includes a first 4×1 array 440 of I/O cells 430 along the first side 422 of the core logic layout boundary 420, a second 4×1 array 450 of I/O cells 430 along the second side 424 of the core logic layout boundary 420, a third 1×4 array 460 of I/O cells 430 along the third side 426 of the core logic layout boundary 420, and a fourth 1×4 array 470 of I/O cells 430 along the fourth side 428 of the core logic layout boundary 420. The first, second, third and fourth arrays 440, 450, 460, 470 substantially surround and abut the core logic layout boundary 420.
  • In accordance with one embodiment of the disclosure, each of the I/O cells 430 includes an I/O layout boundary including bond pads, as well as I/O transistors oriented in the same direction as the other I/O transistors in the first, second, third and fourth arrays 440, 450, 460, 470. Each of the I/O cells 430 additionally includes a first signal pin located proximate a side of the I/O layout boundary abutting the core logic layout boundary 420, as well as a second signal pin located proximate a side of the I/O layout boundary perpendicular the side of the I/O layout boundary abutting the core logic layout boundary 420.
  • Each of the I/O cells 430 may additionally include first and second power conductors extending entirely between first and second opposing sides thereof and third and fourth opposing sides thereof, respectively. Similarly, each of the I/O cells 430 may include first and second ground conductors extending entirely between first and second opposing sides thereof and third and fourth opposing sides thereof, respectively. When the I/O cells 430 are positioned in the first, second, third and fourth arrays 440, 450, 460, 470 as shown in FIG. 4, associated ones of the power conductors and ground conductors in the adjacent I/O cells 430 contact one another. Accordingly, power and ground conductors, in one embodiment, may extend entirely along the length of the first, second, third and fourth arrays 440, 450, 460, 470.
  • In the embodiment of FIG. 4, the corners of the IC chip 400 have been left blank. This represents just one embodiment. In another embodiment, the corners of the IC chip 400 are employed with additional bond pads, but without additional I/O transistors. In yet another embodiment, the corners of the IC chip 400 would have I/O cells 430 of their own, in effect providing even more I/O cells per given area of the core logic layout boundary 420.
  • A fairly specific I/O cell has been described with regard to the embodiment of FIG. 4. Notwithstanding, those skilled in the art understand that other embodiments exist wherein the I/O cell used in the IC chip may differ from that disclosed with regard to FIG. 4. For instance, any I/O cell manufactured in accordance with this disclosure could be used within the IC chip 400 of FIG. 4 without departing from the spirit thereof.
  • Turning now to FIG. 5, illustrated is an embodiment of an alternative IC chip 500 design. The IC chip 500 of FIG. 5 is very similar to the IC chip 400 of FIG. 4, with the exception that the IC chip 500 includes a second array of I/O cells 520 surrounding the first array of I/O cells 510. For instance, in the embodiment of FIG. 5 the second array of I/O cells 520 is substantially surrounding the first array of I/O cells 510, and the first array of I/O cells 510 is substantially surrounding the core logic circuitry 530. As one would expect after viewing FIG. 5, this configuration allows for doubling the number of I/O cells associated with the IC chip 500.
  • The IC chip 500 of FIG. 5 further includes external connections 540, for example lead frame connections, which are coupled to the bond pads of the arrays of I/ O cells 510, 520. In the embodiment of FIG. 5, wire bonds 550 couple the external connections 540 and the arrays of I/ O cells 510, 520. As is evident in FIG. 5, the positioning of the I/O cells in the first array 510 and second array 520 can be rearranged to improve wire bond spacing, and therefore reduce the likelihood that signals travelling over the different wire bonds 550 will cross.
  • Those skilled in the art to which this application relates will appreciate that other and further additions, deletions, substitutions and modifications may be made to the described embodiments.

Claims (15)

1. An input/output cell, comprising:
an input/output layout boundary delineated on a substrate, wherein the input/output layout boundary defines a first side parallel and opposing a second side, a third side parallel and opposing a fourth side, wherein the first and second sides are substantially perpendicular the third and fourth sides;
input/output transistors positioned within the input/output layout boundary over the substrate;
first and second power conductors located over the substrate, the first power conductor extending entirely between the first and second sides and the second power conductor extending entirely between the third and fourth sides; and
first and second ground conductors located over the substrate, the first ground conductor extending entirely between the first and second sides and the second ground conductor extending entirely between the third and fourth sides.
2. The input/output cell recited in claim 1, further including a bond pad positioned within the input/output layout boundary over the substrate.
3. The input/output cell recited in claim 2, wherein the bond pad is square.
4. The input/output cell recited in claim 2, wherein two edges of the bond pad face the input/output transistors.
5. The input/output cell recited in claim 2, wherein the bond pad is positioned proximate a corner of the input/output layout boundary.
6. The input/output cell recited in claim 1, wherein the input/output layout boundary forms a rectangle.
7. The input/output cell recited in claim 1, wherein the input/output layout boundary forms a square.
8. The input/output cell recited in claim 1, further including a first signal pin located proximate the first side and a second signal pin located proximate the third side.
9. The input/output cell recited in claim 1, wherein each of the input/output transistors is oriented in a same direction.
10. A method for manufacturing an input/output cell, comprising:
delineating an input/output layout boundary on a substrate, wherein the input/output layout boundary defines a first side parallel and opposing a second side, a third side parallel and opposing a fourth side, wherein the first and second sides are substantially perpendicular the third and fourth sides;
positioning input/output transistors within the input/output layout boundary over the substrate;
forming first and second power conductors over the substrate, the first power conductor extending entirely between the first and second sides and the second power conductor extending entirely between the third and fourth sides; and
forming first and second ground conductors over the substrate, the first ground conductor extending entirely between the first and second sides and the second ground conductor extending entirely between the third and fourth sides.
11. The method recited in claim 10 further including creating a bond pad within the input/output layout boundary over the substrate, at least two edges of the bond pad facing the input/output transistors.
12. The method recited in claim 11, wherein the bond pad is square.
13. The method recited in claim 11, wherein the bond pad is positioned proximate a corner of the input/output layout boundary.
14. The method recited in claim 10, wherein the input/output layout boundary forms a square.
15. The method recited in claim 10, further including creating a first signal pin proximate the first side and a second signal pin proximate the third side.
US13/443,691 2010-11-17 2012-04-10 Input/output core design and method of manufacture therefor Abandoned US20120194217A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US13/443,691 US20120194217A1 (en) 2010-11-17 2012-04-10 Input/output core design and method of manufacture therefor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/947,948 US8289051B2 (en) 2010-11-17 2010-11-17 Input/output core design and method of manufacture therefor
US13/443,691 US20120194217A1 (en) 2010-11-17 2012-04-10 Input/output core design and method of manufacture therefor

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US12/947,948 Continuation US8289051B2 (en) 2010-11-17 2010-11-17 Input/output core design and method of manufacture therefor

Publications (1)

Publication Number Publication Date
US20120194217A1 true US20120194217A1 (en) 2012-08-02

Family

ID=46047201

Family Applications (2)

Application Number Title Priority Date Filing Date
US12/947,948 Expired - Fee Related US8289051B2 (en) 2010-11-17 2010-11-17 Input/output core design and method of manufacture therefor
US13/443,691 Abandoned US20120194217A1 (en) 2010-11-17 2012-04-10 Input/output core design and method of manufacture therefor

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US12/947,948 Expired - Fee Related US8289051B2 (en) 2010-11-17 2010-11-17 Input/output core design and method of manufacture therefor

Country Status (1)

Country Link
US (2) US8289051B2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8289051B2 (en) * 2010-11-17 2012-10-16 Lsi Corporation Input/output core design and method of manufacture therefor
US20120241972A1 (en) * 2011-03-24 2012-09-27 Taiwan Semiconductor Manufacturing Company, Ltd. Layout scheme for an input output cell
US9935052B1 (en) * 2014-11-26 2018-04-03 Altera Corporation Power line layout in integrated circuits
US10693468B2 (en) * 2017-06-28 2020-06-23 Texas Instruments Incorporated Integrated circuit and process for family of digital logic functions
CN109390304B (en) * 2018-10-11 2024-02-09 长鑫存储技术有限公司 Semiconductor structure, memory device, semiconductor device and manufacturing method thereof
WO2020073901A1 (en) * 2018-10-11 2020-04-16 Changxin Memory Technologies, Inc. Semiconductor structure, memory device, semiconductor device and method of manufacturing the same
US11222691B2 (en) * 2020-03-09 2022-01-11 Mediatek Inc. Double-pitch-layout techniques and apparatus thereof

Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5612631A (en) * 1985-03-29 1997-03-18 Advanced Micro Devices, Inc. An I/O macrocell for a programmable logic device
US5982193A (en) * 1997-12-22 1999-11-09 Vantis Corporation Input/output block (IOB) connections to MaxL lines, nor lines and dendrites in FPGA integrated circuits
US6078068A (en) * 1998-07-15 2000-06-20 Adaptec, Inc. Electrostatic discharge protection bus/die edge seal
US6191612B1 (en) * 1998-11-19 2001-02-20 Vantis Corporation Enhanced I/O control flexibility for generating control signals
US6218859B1 (en) * 1998-05-26 2001-04-17 Altera Corporation Programmable logic device having quadrant layout
US6218857B1 (en) * 1998-11-24 2001-04-17 Vantis Corporation Variable sized line driving amplifiers for input/output blocks (IOBs) in FPGA integrated circuits
US6271679B1 (en) * 1999-03-24 2001-08-07 Altera Corporation I/O cell configuration for multiple I/O standards
US6489688B1 (en) * 2001-05-02 2002-12-03 Zeevo, Inc. Area efficient bond pad placement
US6768142B2 (en) * 2002-05-08 2004-07-27 Lsi Logic Corporation Circuit component placement
US6798069B1 (en) * 2003-03-28 2004-09-28 Lsi Logic Corporation Integrated circuit having adaptable core and input/output regions with multi-layer pad trace conductors
US6861868B1 (en) * 2001-12-14 2005-03-01 Lattice Semiconductor Corp. High speed interface for a programmable interconnect circuit
US20050169042A1 (en) * 2001-11-22 2005-08-04 Fujitsu Limited Multi-threshold MIS integrated circuit device and circuit design method thereof
US7034570B2 (en) * 1999-03-24 2006-04-25 Altera Corporation I/O cell configuration for multiple I/O standards
US7346876B2 (en) * 2002-09-04 2008-03-18 Darien K. Wallace ASIC having dense mask-programmable portion and related system development method
US7808117B2 (en) * 2006-05-16 2010-10-05 Freescale Semiconductor, Inc. Integrated circuit having pads and input/output (I/O) cells
US7969184B1 (en) * 2007-09-06 2011-06-28 Tabula, Inc. Configurable high speed high voltage input/output circuit for an IC
US8289051B2 (en) * 2010-11-17 2012-10-16 Lsi Corporation Input/output core design and method of manufacture therefor

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5859547A (en) 1996-12-20 1999-01-12 Translogic Technology, Inc. Dynamic logic circuit
JP4546288B2 (en) * 2005-02-28 2010-09-15 株式会社リコー Differential output circuit and semiconductor device having the differential output circuit
US20070187808A1 (en) 2006-02-16 2007-08-16 Easic Corporation Customizable power and ground pins

Patent Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5612631A (en) * 1985-03-29 1997-03-18 Advanced Micro Devices, Inc. An I/O macrocell for a programmable logic device
US5982193A (en) * 1997-12-22 1999-11-09 Vantis Corporation Input/output block (IOB) connections to MaxL lines, nor lines and dendrites in FPGA integrated circuits
US6218859B1 (en) * 1998-05-26 2001-04-17 Altera Corporation Programmable logic device having quadrant layout
US6078068A (en) * 1998-07-15 2000-06-20 Adaptec, Inc. Electrostatic discharge protection bus/die edge seal
US6191612B1 (en) * 1998-11-19 2001-02-20 Vantis Corporation Enhanced I/O control flexibility for generating control signals
US6218857B1 (en) * 1998-11-24 2001-04-17 Vantis Corporation Variable sized line driving amplifiers for input/output blocks (IOBs) in FPGA integrated circuits
US7034570B2 (en) * 1999-03-24 2006-04-25 Altera Corporation I/O cell configuration for multiple I/O standards
US6271679B1 (en) * 1999-03-24 2001-08-07 Altera Corporation I/O cell configuration for multiple I/O standards
US6489688B1 (en) * 2001-05-02 2002-12-03 Zeevo, Inc. Area efficient bond pad placement
US20050169042A1 (en) * 2001-11-22 2005-08-04 Fujitsu Limited Multi-threshold MIS integrated circuit device and circuit design method thereof
US6861868B1 (en) * 2001-12-14 2005-03-01 Lattice Semiconductor Corp. High speed interface for a programmable interconnect circuit
US6768142B2 (en) * 2002-05-08 2004-07-27 Lsi Logic Corporation Circuit component placement
US7346876B2 (en) * 2002-09-04 2008-03-18 Darien K. Wallace ASIC having dense mask-programmable portion and related system development method
US6798069B1 (en) * 2003-03-28 2004-09-28 Lsi Logic Corporation Integrated circuit having adaptable core and input/output regions with multi-layer pad trace conductors
US7808117B2 (en) * 2006-05-16 2010-10-05 Freescale Semiconductor, Inc. Integrated circuit having pads and input/output (I/O) cells
US7969184B1 (en) * 2007-09-06 2011-06-28 Tabula, Inc. Configurable high speed high voltage input/output circuit for an IC
US8289051B2 (en) * 2010-11-17 2012-10-16 Lsi Corporation Input/output core design and method of manufacture therefor

Also Published As

Publication number Publication date
US20120119785A1 (en) 2012-05-17
US8289051B2 (en) 2012-10-16

Similar Documents

Publication Publication Date Title
US8289051B2 (en) Input/output core design and method of manufacture therefor
US10559503B2 (en) Methods, apparatus and system for a passthrough-based architecture
TWI406372B (en) Compact co-packaged semiconductor dies with elevation-adaptive interconnection plates
US9536881B2 (en) Semiconductor devices having fin shaped channels
US7485955B2 (en) Semiconductor package having step type die and method for manufacturing the same
KR102142366B1 (en) Semiconductor intergrated circuit device, method for fabricating the same, and semiconductort pachage
US9202784B2 (en) Semiconductor integrated circuit capacitance device
KR20160028991A (en) Semiconductor device and fabricating method thereof
US7786513B2 (en) Semiconductor integrated circuit device and power source wiring method therefor
US9054084B2 (en) Integrated circuit having staggered bond pads and I/O cells
US10121781B2 (en) 3D IC with serial gate MOS device, and method of making the 3D IC
US20210305278A1 (en) Semiconductor integrated circuit device
KR20150097539A (en) Landing structure for through-silicon via
KR20160118450A (en) Semiconductor device and method for manufacturing the same
US20130087881A1 (en) Semiconductor integrated circuit device
TW201427004A (en) Methods of using a trench salicide routing layer
TW202121650A (en) Highly regular logic design for efficient 3d integration related application data
CN111863736A (en) Package design for high speed low loss signal transfer and mitigating manufacturing risks and costs
US20040183103A1 (en) Semiconductor integrated circuit having an oblique global signal wiring and semiconductor integrated circuit wiring method
US11810920B2 (en) Integrated circuits including integrated standard cell structure
US8907492B2 (en) Semiconductor device
US20230317602A1 (en) Metal routing that overlaps nmos and pmos regions of a transistor
EP4203025A2 (en) Transition cells between design blocks on a wafer
CN108280317B (en) Display driving integrated circuit structure and manufacturing method thereof
US20240063223A1 (en) Staggered pitch stacked vertical transport field-effect transistors

Legal Events

Date Code Title Description
AS Assignment

Owner name: LSI CORPORATION, CALIFORNIA

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:TURNER, MARK F.;BROWN, JEFF S.;DORWEILER, PAUL;SIGNING DATES FROM 20101115 TO 20101116;REEL/FRAME:028022/0412

AS Assignment

Owner name: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AG

Free format text: PATENT SECURITY AGREEMENT;ASSIGNORS:LSI CORPORATION;AGERE SYSTEMS LLC;REEL/FRAME:032856/0031

Effective date: 20140506

AS Assignment

Owner name: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:LSI CORPORATION;REEL/FRAME:035390/0388

Effective date: 20140814

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION

AS Assignment

Owner name: AGERE SYSTEMS LLC, PENNSYLVANIA

Free format text: TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS (RELEASES RF 032856-0031);ASSIGNOR:DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT;REEL/FRAME:037684/0039

Effective date: 20160201

Owner name: LSI CORPORATION, CALIFORNIA

Free format text: TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS (RELEASES RF 032856-0031);ASSIGNOR:DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT;REEL/FRAME:037684/0039

Effective date: 20160201

AS Assignment

Owner name: BELL SEMICONDUCTOR, LLC, ILLINOIS

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.;BROADCOM CORPORATION;REEL/FRAME:044886/0001

Effective date: 20171208

AS Assignment

Owner name: CORTLAND CAPITAL MARKET SERVICES LLC, AS COLLATERA

Free format text: SECURITY INTEREST;ASSIGNORS:HILCO PATENT ACQUISITION 56, LLC;BELL SEMICONDUCTOR, LLC;BELL NORTHERN RESEARCH, LLC;REEL/FRAME:045216/0020

Effective date: 20180124

AS Assignment

Owner name: BELL NORTHERN RESEARCH, LLC, ILLINOIS

Free format text: SECURITY INTEREST;ASSIGNOR:CORTLAND CAPITAL MARKET SERVICES LLC;REEL/FRAME:060885/0001

Effective date: 20220401

Owner name: BELL SEMICONDUCTOR, LLC, ILLINOIS

Free format text: SECURITY INTEREST;ASSIGNOR:CORTLAND CAPITAL MARKET SERVICES LLC;REEL/FRAME:060885/0001

Effective date: 20220401

Owner name: HILCO PATENT ACQUISITION 56, LLC, ILLINOIS

Free format text: SECURITY INTEREST;ASSIGNOR:CORTLAND CAPITAL MARKET SERVICES LLC;REEL/FRAME:060885/0001

Effective date: 20220401