US20120021502A1 - Sensor for fast detection of e-coli - Google Patents
Sensor for fast detection of e-coli Download PDFInfo
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- US20120021502A1 US20120021502A1 US13/187,587 US201113187587A US2012021502A1 US 20120021502 A1 US20120021502 A1 US 20120021502A1 US 201113187587 A US201113187587 A US 201113187587A US 2012021502 A1 US2012021502 A1 US 2012021502A1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/76—Chemiluminescence; Bioluminescence
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
- G01N33/50—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
- G01N33/53—Immunoassay; Biospecific binding assay; Materials therefor
- G01N33/543—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
- G01N33/54366—Apparatus specially adapted for solid-phase testing
- G01N33/54373—Apparatus specially adapted for solid-phase testing involving physiochemical end-point determination, e.g. wave-guides, FETS, gratings
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S436/00—Chemistry: analytical and immunological testing
- Y10S436/805—Optical property
Definitions
- the present disclosure relates to detection of E - Coli bacteria, and, more particularly, to a micro/nanoscale textured sensor for rapid chemiluminescence response.
- E - Coli is a very commonly observed bacteria in the food items such as peanut butter and spinach, etc., and consumption of E - Coli can lead to different types of health disorders, for example diarrhea.
- a fast sensor that can reliably detect the E - Coli in food, water and other media would avoid many health hazards in a short notice.
- a simple and quick way to sensing E - Coli bacteria is through enzymatic chemiluminescence procedures.
- the enzyme ⁇ -Galactosidase released by E - Coli as a part of its metabolic process can be a very useful biomarker.
- the chemiluminescent substrate for ⁇ -Galactosidase is phenyl galactose-substituted dioxetane [References 2 and 3].
- the Lumi Gal° 530 a commercial formulation of 4-methoxy-4-(3-b-D-galactosidephenyl)spiro[1,2-dioxetane-3,2′-adamantane] can also be a best substitute for the detection and quantification of ⁇ -Galactosidase activity [Reference 4].
- the chemical reaction between the enzyme ⁇ -Galactosidase and dioxetane substrate results in the emission of a light wavelength around 530 nm and thus emitted light could be detected by a photodetector or luminometer to determine the presence of E - Coli.
- Biosensors employing above discussed biomarker and assay have enabled rapid detection of E - Coli [Reference 2].
- the surface of the silicon wafer has a subwavelength structure that is smaller than the wavelength of the emitted light, a strong absorption effect can be produced.
- the reflectance of the surface is severely diminished with increased pore depth as exemplified in FIG. 2 . Therefore, control of the depth, size and separation between these structures is critical for the efficacy of the sensor.
- the pores on the silicon surface can be produced in KOH or NaOH etchant.
- KOH or NaOH etchant Although such an alkaline etching technique is simple and low cost, it has drawbacks of being time consuming, requires heating and yields poor uniformity.
- the etching solution must be mechanically agitated for better uniformity of the textured structure on silicon surface.
- the presence of alkali metal ions in KOH or NaOH etchant is incompatible with bacteria proliferation, and may be detrimental to the efficacy of the sensor.
- a micro/nanoscale textured sensor assembly for fast detection E - Coli bacteria comprises a support substrate and a coating with geometrical characteristics to enhance chemiluminescence response.
- the deposition technique can be a plasma or similar technology and can employ a solid or gaseous precursor material.
- the surface texturing technique can employ a laser, an electron beam, a plasma beam or any other intense heat source.
- Biomarker substrate mixture An example of the Biomarker substrate mixture is Lumi Gal° 530 and a polymyxin-B-sulfate solution, which is also referred sometimes as “Substrate Mixture” in this whole document.
- Functionalization of the biochip is done with the above mentioned “biomarker substrate mixture”, for an overnight period in a refrigerator at 4-6° C. in order to facilitate the marker diffusion and adsorption into the sensor surface.
- biomarker substrate mixture for an overnight period in a refrigerator at 4-6° C. in order to facilitate the marker diffusion and adsorption into the sensor surface.
- FIG. 1 is an exemplary illustration of micromachined substrate or wafer or coating showing reflection of light from a patterned surface with specific pore width and pore height;
- FIG. 2 is an exemplary illustration showing the reflectance from a micromachined substrate or wafer or coating with increasing pore depths in the visible spectrum;
- FIG. 3 shows an example of Si sensor prepared employing a DC plasma spray deposition and laser patterning technique, according to the teachings of this disclosure
- FIG. 4 is an exemplary illustration of a fabrication scheme for developing ultrafine/nanostructured sensor employing a deposition and patterning technique
- FIG. 5 shows an exemplary chemiluminescence response in the presence of E - Coli bacteria and biomarker substrate employing a sample of the Si sensor developed following the teachings of this disclosure.
- the present invention provides a process and/or a sensor for fast detection of a pathogen such as E - Coli .
- the present invention has use as a sensor.
- the process includes providing a substrate and depositing a coating onto the substrate, the coating having an outer surface.
- a textured outer surface is produced thereon, the textured outer surface having a plurality of hills and valleys such that a generally high surface area is produced with a nominal spacing between the plurality of hills and/or the plurality of valleys that minimizes internal scattering of a predetermined electromagnetic radiation wavelength and thus maximizes reflection of the predetermined electromagnetic radiation wavelength.
- the coating can be a silicon coating and/or a biomarker substrate can be applied to the textured outer surface of the coating.
- a sensor manufactured according to the present invention can reflect at least 4000 relative luminescence units (RLUs) of electromagnetic radiation having a wavelength of approximately 530 nanometers after a solution containing an E - Coli concentration of 10 7 colony-forming units per milliliter (CFU/ml) is placed onto the sensor for at least 60 seconds.
- RLUs relative luminescence units
- a biomarker substrate containing dioxetane can result in an enzymatic reaction with the E - Coli such that electromagnetic radiation having a wavelength of approximately 530 nanometers is produced from the reaction.
- the senor can reflect at least 5000 RLUs of electromagnetic radiation having a wavelength of approximately 530 nanometers after a solution containing an E - Coli concentration of 10 7 CFU/ml is placed onto the sensor for at least 60 seconds, whereas in other instances the sensor reflects at least 6000 RLUs under the same conditions.
- the sensor can reflect at least 6000 RLUs, at least 8000 RLUs in other instances, and/or at least 10000 RLUs. It is appreciated that such luminescence counts can be two times, three times, and/or four times greater than current state of the art sensors. As such, the process for manufacturing a sensor for fast detection of a pathogen according to the present invention provides an unexpected and dramatic increase in luminescence detection.
- the coating can be deposited onto the substrate using a technique such as electrochemical deposition, laser ablation, thermal spray deposition, plasma deposition, physical vapor deposition, chemical vapor deposition, and/or combinations thereof.
- the textured outer surface can be produced by rapidly melting and quenching a plurality of discrete locations on the outer surface of the coating.
- the rapid melting and quenching of the plurality of discrete locations on the outer surface of the coating can be produced using a heat source such as a laser, an electron beam, a plasma, and the like.
- the duly reflected light 103 represents the reflectance behavior of the patterned or textured structure 101 .
- an appropriate combination of pore width 104 and pore depth 105 can yield high reflectance from a textured or patterned surface while providing large surface area desired for fast chemiluminescence response. Furthermore, such desired patterned surface can be effectively processed by non-chemical etching processes according to the current teachings.
- a Si biochip 300 comprises a cylindrical substrate 301 , a silicon coating 302 deposited employing plasma spray technique and silicon powder precursor, followed by a subsequent laser beam irradiation to develop the patterned surface with the desired attributes.
- 303 is an exemplary patterned Si structure viewed under a scanning electron microscope.
- the current teachings provide manufacturing schemes to fabricate the sensor using an appropriate precursor which is deposited by an additive process and simultaneously/subsequently treated by an energy beam to develop the desired textured surface.
- the manufacturing scheme comprises a surface preparation step, followed by a deposition step and finally a surface patterning step.
- the substrate 401 is used to deposit a precursor 403 to form a thin layer 402 employing an additive process 404 .
- the thin layer 402 is subsequently textured 406 , employing an energy beam 405 .
- the additive process 404 can be a vapor deposition or a spray deposition technique including, but not limited to, DC plasma, induction plasma, electron beam deposition, laser beam deposition, chemical vapor deposition (CVD) and plasma enhanced CVD (PECVD) technique.
- the precursor material 403 can be a solid, or a liquid or a gas or their combination.
- the surface patterning step 3 can be provided with a heat source 405 that is capable of treating the deposited material, layer by layer, nearly simultaneously as the layers are deposited by the additive process 404 on the substrate.
- the energy source can be a laser, plasma, electron, radiation or convection heat source. That is, the energy output from a heat source 405 can be directed to coating deposited on a substrate using the methods set forth herein.
- each thinly-deposited layer on a substrate can be immediately modified, tailored, or otherwise processed by the heat source 405 in a simple and simultaneous manner.
- the heat source 405 is disposed adjacent or integrally formed with additive device 404 to impart energy upon the substrate being processed.
- the energy beam can assume either a Gaussian energy distribution or rectangular energy distribution.
- the surface patterning step involves fast melting of the surface layers of 402 following rapid quenching to develop patterned or textured surfaces 406 for enhanced reflectance and large surface area for sensor applications.
- FIG. 5 shows an exemplary application of the patterned Si structure 303 for sensing E - Coli bacteria following fictionalization process with the said “biomarker mixture” or “substrate mixture”.
- the intensity or counts of emitted light photons ( ⁇ ⁇ 530 nm) measured in relative light units as a function of time. Initial 60 seconds is an incubation period during which the photon counts are not measured. The Incubation period provides enough time for the E - Coli to release the ⁇ -Galactosidase enzyme and thus facilitate for the chemical reaction between the enzyme and biomarker substrate mixture either on the sensor surface or in the liquid state to start emit the light photons through chemiluminescence phenomenon.
- Curve 501 presents the luminescence counts from the functionalized sensor in the absence of E - Coli .
- Curve 502 presents the luminescence counts from the “Substrate Mixture and 10 7 CFU/ml E - Coli ” in the absence of the sensor.
- Curve 503 indicates the emitted photon intensity when the sensor and E - Coli interact inside the “Substrate Mixture” for a concentration of 10 7 CFU/ml.
- first, second, third, etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, layers and/or sections should not be limited by these terms. These terms may be only used to distinguish one element, component, region, layer or section from another region, layer or section. Terms such as “first”, “second” and other numerical terms when used herein do not imply a sequence or order unless clearly indicated by the context. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the example embodiments.
- Spatially relative terms such as “inner”, “outer”, “beneath”, “below”, “lower”, “above”, “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. Spatially relative terms may be intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as “below” or “beneath” other elements or features would then be oriented “above” the other elements or features. Thus, the example term “below” can encompass both an orientation of above and below. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
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Abstract
Description
- This application claims the benefit of U.S. Provisional Patent Application No. 61/366,638, filed on Jul. 22, 2010. The entire disclosures of the above application are incorporated herein by reference.
- The present disclosure relates to detection of E-Coli bacteria, and, more particularly, to a micro/nanoscale textured sensor for rapid chemiluminescence response.
- This section provides background information related to the present disclosure which is not necessarily prior art.
- Among different types of food, water and other edible contaminations, the bacterial contamination is more commonly observed. The survival and growth of bacteria are always dependent on suitable ambient temperature, atmospheric conditions, moisture and the nutrients provided.
- E-Coli is a very commonly observed bacteria in the food items such as peanut butter and spinach, etc., and consumption of E-Coli can lead to different types of health disorders, for example diarrhea.
- Detection of E-Coli through usual standard biochemical testing procedures requires longer times (e.g.: 8 to 48 hrs) [Reference 1].
- A fast sensor that can reliably detect the E-Coli in food, water and other media would avoid many health hazards in a short notice.
- A simple and quick way to sensing E-Coli bacteria is through enzymatic chemiluminescence procedures. For example, the enzyme β-Galactosidase released by E-Coli as a part of its metabolic process can be a very useful biomarker.
- The chemiluminescent substrate for β-Galactosidase is phenyl galactose-substituted dioxetane [
References 2 and 3]. - The Lumi Gal° 530, a commercial formulation of 4-methoxy-4-(3-b-D-galactosidephenyl)spiro[1,2-dioxetane-3,2′-adamantane] can also be a best substitute for the detection and quantification of β-Galactosidase activity [Reference 4].
- The chemical reaction between the enzyme β-Galactosidase and dioxetane substrate results in the emission of a light wavelength around 530 nm and thus emitted light could be detected by a photodetector or luminometer to determine the presence of E-Coli.
- Biosensors employing above discussed biomarker and assay have enabled rapid detection of E-Coli [Reference 2].
- The efficacy and response time of such biosensors are highly dependent on the surface textures of the sensor; micro/nanostructured surfaces with high reflectance are desired.
- In recent years, many studies have been performed on the surface texture of silicon wafer. The purpose is to produce a micro/nanostructure on the surface of silicon wafer, to increase the surface area considerably, and thus enhance the physiochemical process.
- However, when the surface of the silicon wafer has a subwavelength structure that is smaller than the wavelength of the emitted light, a strong absorption effect can be produced.
- Referring to
FIG. 1 , the reflectance of the surface is severely diminished with increased pore depth as exemplified inFIG. 2 . Therefore, control of the depth, size and separation between these structures is critical for the efficacy of the sensor. - The pores on the silicon surface can be produced in KOH or NaOH etchant. Although such an alkaline etching technique is simple and low cost, it has drawbacks of being time consuming, requires heating and yields poor uniformity. The etching solution must be mechanically agitated for better uniformity of the textured structure on silicon surface. Besides, the presence of alkali metal ions in KOH or NaOH etchant is incompatible with bacteria proliferation, and may be detrimental to the efficacy of the sensor.
- This section provides a general summary of the disclosure, and is not a comprehensive disclosure of its full scope or all of its features.
- A micro/nanoscale textured sensor assembly for fast detection E-Coli bacteria is disclosed. The sensor assembly comprises a support substrate and a coating with geometrical characteristics to enhance chemiluminescence response.
- Further, a method to achieve such ultrafine textured coating is also disclosed. The method comprises an appropriate material (e.g., silicon) being deposited using a deposition technique on a substrate and simultaneously/subsequently treated to achieve the desired topology that enhances the chemiluminescence response.
- The deposition technique can be a plasma or similar technology and can employ a solid or gaseous precursor material.
- The surface texturing technique can employ a laser, an electron beam, a plasma beam or any other intense heat source.
- Thus prepared biochip is functionalized using a “Biomarker substrate mixture”. An example of the Biomarker substrate mixture is Lumi Gal° 530 and a polymyxin-B-sulfate solution, which is also referred sometimes as “Substrate Mixture” in this whole document. Functionalization of the biochip is done with the above mentioned “biomarker substrate mixture”, for an overnight period in a refrigerator at 4-6° C. in order to facilitate the marker diffusion and adsorption into the sensor surface. Thus functionalized biochip is ready for detection of E-Coli.
- Further applicability will become apparent from the description provided herein. The description and specific examples in this summary are intended for purposes of illustration only and are not intended to limit the scope of the present disclosure.
- The figures and drawings described herein are for illustrative purposes only of selected embodiments and not all possible implementations, and are not intended to limit the scope of the present disclosure.
-
FIG. 1 is an exemplary illustration of micromachined substrate or wafer or coating showing reflection of light from a patterned surface with specific pore width and pore height; -
FIG. 2 is an exemplary illustration showing the reflectance from a micromachined substrate or wafer or coating with increasing pore depths in the visible spectrum; -
FIG. 3 shows an example of Si sensor prepared employing a DC plasma spray deposition and laser patterning technique, according to the teachings of this disclosure; -
FIG. 4 is an exemplary illustration of a fabrication scheme for developing ultrafine/nanostructured sensor employing a deposition and patterning technique; and -
FIG. 5 shows an exemplary chemiluminescence response in the presence of E-Coli bacteria and biomarker substrate employing a sample of the Si sensor developed following the teachings of this disclosure. - Corresponding reference numerals indicate corresponding parts throughout the several views of the drawings.
- The present invention provides a process and/or a sensor for fast detection of a pathogen such as E-Coli. As such, the present invention has use as a sensor.
- The process includes providing a substrate and depositing a coating onto the substrate, the coating having an outer surface. During and/or after the coating is deposited onto the substrate, a textured outer surface is produced thereon, the textured outer surface having a plurality of hills and valleys such that a generally high surface area is produced with a nominal spacing between the plurality of hills and/or the plurality of valleys that minimizes internal scattering of a predetermined electromagnetic radiation wavelength and thus maximizes reflection of the predetermined electromagnetic radiation wavelength. In some instances, the coating can be a silicon coating and/or a biomarker substrate can be applied to the textured outer surface of the coating.
- For example and for illustrative purposes only, a sensor manufactured according to the present invention can reflect at least 4000 relative luminescence units (RLUs) of electromagnetic radiation having a wavelength of approximately 530 nanometers after a solution containing an E-Coli concentration of 107 colony-forming units per milliliter (CFU/ml) is placed onto the sensor for at least 60 seconds. In such an instance, a biomarker substrate containing dioxetane can result in an enzymatic reaction with the E-Coli such that electromagnetic radiation having a wavelength of approximately 530 nanometers is produced from the reaction.
- In some instances, the sensor can reflect at least 5000 RLUs of electromagnetic radiation having a wavelength of approximately 530 nanometers after a solution containing an E-Coli concentration of 107 CFU/ml is placed onto the sensor for at least 60 seconds, whereas in other instances the sensor reflects at least 6000 RLUs under the same conditions.
- In the event that a solution containing an E-Coli concentration of 107 CFU/ml is placed onto the sensor for at least 120 seconds, the sensor can reflect at least 6000 RLUs, at least 8000 RLUs in other instances, and/or at least 10000 RLUs. It is appreciated that such luminescence counts can be two times, three times, and/or four times greater than current state of the art sensors. As such, the process for manufacturing a sensor for fast detection of a pathogen according to the present invention provides an unexpected and dramatic increase in luminescence detection.
- The coating can be deposited onto the substrate using a technique such as electrochemical deposition, laser ablation, thermal spray deposition, plasma deposition, physical vapor deposition, chemical vapor deposition, and/or combinations thereof. In addition, the textured outer surface can be produced by rapidly melting and quenching a plurality of discrete locations on the outer surface of the coating. The rapid melting and quenching of the plurality of discrete locations on the outer surface of the coating can be produced using a heat source such as a laser, an electron beam, a plasma, and the like.
- Non-limiting embodiments will now be described more fully with reference to the accompanying drawings.
- With particular reference to
FIG. 1 , for anincoming light 102 falling on a surface or wafer orcoating 101 having a periodic patterned structure withspecific pore width 104 andpore depth 105, the duly reflected light 103 represents the reflectance behavior of the patterned ortextured structure 101. - As shown in
FIG. 2 , the reflectance behavior in thevisible spectrum pore depth 105 of thecoating 101. As thepore depth 105 increases while keeping thepore width 104 constant, the reflectance is severely reduced due to internal scattering and absorption of the light within the pores. Compared to the reflectance of aflat surface 201, the reflectance from the patternedsurfaces pore depth 105. - According to the teachings of the present disclosure, an appropriate combination of
pore width 104 andpore depth 105 can yield high reflectance from a textured or patterned surface while providing large surface area desired for fast chemiluminescence response. Furthermore, such desired patterned surface can be effectively processed by non-chemical etching processes according to the current teachings. - In some embodiments of the present teachings as shown in
FIG. 3 , aSi biochip 300 comprises acylindrical substrate 301, asilicon coating 302 deposited employing plasma spray technique and silicon powder precursor, followed by a subsequent laser beam irradiation to develop the patterned surface with the desired attributes. 303 is an exemplary patterned Si structure viewed under a scanning electron microscope. - With particular reference to
FIG. 4 , the current teachings provide manufacturing schemes to fabricate the sensor using an appropriate precursor which is deposited by an additive process and simultaneously/subsequently treated by an energy beam to develop the desired textured surface. As schematically shown inFIG. 4 , the manufacturing scheme comprises a surface preparation step, followed by a deposition step and finally a surface patterning step. Thesubstrate 401 is used to deposit aprecursor 403 to form athin layer 402 employing anadditive process 404. Thethin layer 402 is subsequently textured 406, employing anenergy beam 405. - According to the principles of the present teachings, the
additive process 404 can be a vapor deposition or a spray deposition technique including, but not limited to, DC plasma, induction plasma, electron beam deposition, laser beam deposition, chemical vapor deposition (CVD) and plasma enhanced CVD (PECVD) technique. Similarly, theprecursor material 403 can be a solid, or a liquid or a gas or their combination. - The
surface patterning step 3 can be provided with aheat source 405 that is capable of treating the deposited material, layer by layer, nearly simultaneously as the layers are deposited by theadditive process 404 on the substrate. The energy source can be a laser, plasma, electron, radiation or convection heat source. That is, the energy output from aheat source 405 can be directed to coating deposited on a substrate using the methods set forth herein. In this regard, each thinly-deposited layer on a substrate can be immediately modified, tailored, or otherwise processed by theheat source 405 in a simple and simultaneous manner. Specifically, theheat source 405 is disposed adjacent or integrally formed withadditive device 404 to impart energy upon the substrate being processed. In some embodiments of the present teachings the energy beam can assume either a Gaussian energy distribution or rectangular energy distribution. - The surface patterning step involves fast melting of the surface layers of 402 following rapid quenching to develop patterned or
textured surfaces 406 for enhanced reflectance and large surface area for sensor applications. -
FIG. 5 shows an exemplary application of the patternedSi structure 303 for sensing E-Coli bacteria following fictionalization process with the said “biomarker mixture” or “substrate mixture”. The intensity or counts of emitted light photons (λ˜530 nm) measured in relative light units as a function of time. Initial 60 seconds is an incubation period during which the photon counts are not measured. The Incubation period provides enough time for the E-Coli to release the β-Galactosidase enzyme and thus facilitate for the chemical reaction between the enzyme and biomarker substrate mixture either on the sensor surface or in the liquid state to start emit the light photons through chemiluminescence phenomenon.Curve 501 presents the luminescence counts from the functionalized sensor in the absence of E-Coli.Curve 502 presents the luminescence counts from the “Substrate Mixture and 107 CFU/ml E-Coli” in the absence of the sensor.Curve 503 indicates the emitted photon intensity when the sensor and E-Coli interact inside the “Substrate Mixture” for a concentration of 107 CFU/ml. The interaction between the “Substrate Mixture” and E-Coli, and the interaction between the “Sensor” and E-Coli, take place when the β-Galactosidase enzyme released by the E-Coli reacted with the “Substrate Mixture” and/or functionalized sensor surface. Based on these curves, thecurve 502 emits lower photon intensity/counts compared to thecurve 503 for a same concentration of E-Coli bacteria of 107 CFU/ml. Thus enhanced efficiency of the sensor shows faster response and fast detection of E-Coli bacteria just after the incubation period compared to the only “Substrate Mixture”. - The described methods, techniques, analogies, apparatus, measurements, data, designs, geometries, illustrations, components and the sensors are example only. The details presented are understood by those skilled as examples only. Therefore, the methods, apparatus and designs and sensors for monitoring and detecting the E-Coli have been described with reference to preferred embodiments. Also, the unforeseen or unanticipated changes or alternatives, modifications, improvements and variations of the current teachings therein may be subsequently appreciated or made by those skilled in the art without departing from the scope of the invention are also intended to be encompassed by the following claims.
- The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting. As used herein, the singular forms “a”, “an” and “the” may be intended to include the plural forms as well, unless the context clearly indicates otherwise. The terms “comprises”, “comprising”, “including” and “having” are inclusive and therefore specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof. The method steps, processes, and operations described herein are not to be construed as necessarily requiring their performance in the particular order discussed or illustrated, unless specifically identified as an order of performance. It is also to be understood that additional or alternative steps may be employed.
- When an element or layer is referred to as being “on”, “engaged to”, “connected to” or “coupled to” another element or layer, it may be directly on, engaged, connected or coupled to the other element or layer, or intervening elements or layers may be present. In contrast, when an element is referred to as being “directly on”, “directly engaged to”, “directly connected to” or “directly coupled to” another element or layer, there may be no intervening elements or layers present. Other words used to describe the relationship between elements should be interpreted in a like fashion (e.g., “between” versus “directly between”, “adjacent” versus “directly adjacent”, etc.). As used herein, the term “and/or” includes any and all combinations of one or more of the associated listed items.
- Although the terms first, second, third, etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, layers and/or sections should not be limited by these terms. These terms may be only used to distinguish one element, component, region, layer or section from another region, layer or section. Terms such as “first”, “second” and other numerical terms when used herein do not imply a sequence or order unless clearly indicated by the context. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the example embodiments.
- Spatially relative terms, such as “inner”, “outer”, “beneath”, “below”, “lower”, “above”, “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. Spatially relative terms may be intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as “below” or “beneath” other elements or features would then be oriented “above” the other elements or features. Thus, the example term “below” can encompass both an orientation of above and below. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
-
- 1. Evangelyn C. Alocilja, Stephen M. Radke, “Market analysis of biosensors for food safety”, Biosensors and Bioelectronics 18 (2003) 841-846.
- 2. Schaap, A. P., DeSilva, R., Akhavan, H., Handley, R. S., (1991)—“Chemical and enzymatic triggering of 1,2-dioxetanes: Structural effects on chemiluminescence efficiency”. In: Stanley, P. E., Cricka, L. J. (Eds.), Bioluminescence and Chemiluminescence Current Status. Wiley, Chichester, pp. 103-106.
- 3. Finny P. Mathew, Evangelyn C. Alocilja, “Porous silicon-based biosensor for pathogen detection”, Biosensors and Bioelectronics 20 (2005), pp. 1656-1661.
- 4. Beale, E. G., Deeb, B. A., Handley, R. S., Akhavan Tafti, H., Schaap, A. P., “A rapid and simple chemiluminescent assay for Escherichia coli beta-galactosidase”, Biotechniques 12 (3) (1992), pp. 320-332.
Claims (23)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/187,587 US8841119B2 (en) | 2010-07-22 | 2011-07-21 | Sensor for fast detection of E-coli |
BR112013001510A BR112013001510A2 (en) | 2010-07-22 | 2011-07-22 | process for manufacturing a sensor for rapid pathogen detection and a sensor for rapid pathogen detection |
MX2013000780A MX2013000780A (en) | 2010-07-22 | 2011-07-22 | Sensor for fast detection of e - coli. |
CN201180036209.8A CN103026208B (en) | 2010-07-22 | 2011-07-22 | For sensor and the manufacture method thereof of colibacillary quick detection |
PCT/US2011/045031 WO2012012732A2 (en) | 2010-07-22 | 2011-07-22 | Sensor for fast detection of e - coli |
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US36663810P | 2010-07-22 | 2010-07-22 | |
US13/187,587 US8841119B2 (en) | 2010-07-22 | 2011-07-21 | Sensor for fast detection of E-coli |
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US20120021502A1 true US20120021502A1 (en) | 2012-01-26 |
US8841119B2 US8841119B2 (en) | 2014-09-23 |
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US13/187,587 Expired - Fee Related US8841119B2 (en) | 2010-07-22 | 2011-07-21 | Sensor for fast detection of E-coli |
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US (1) | US8841119B2 (en) |
CN (1) | CN103026208B (en) |
BR (1) | BR112013001510A2 (en) |
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WO (1) | WO2012012732A2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101501117B1 (en) * | 2013-12-02 | 2015-03-12 | 황완석 | ECL biosensor based on CdSe QDs for determination of Alzheimer's disease and fabrication method thereof |
US20150234284A1 (en) * | 2012-03-23 | 2015-08-20 | Orafol Americas Inc. | Methods for fabricating retroreflector tooling and retroreflector microstructures and devices thereof |
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US5310686A (en) * | 1987-03-10 | 1994-05-10 | Ares Serono Research & Development Limited Partnership | Polymer-coated optical structures |
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JP2003035710A (en) * | 2001-07-24 | 2003-02-07 | Dainippon Printing Co Ltd | Substrate for biosensor and biosensor using the same |
CN1521266A (en) * | 2003-01-29 | 2004-08-18 | 陕西西大北美基因股份有限公司 | Pathogenic microorganism infection diagnosis type cell chip and method for preparing the same |
JP2005308407A (en) * | 2004-04-16 | 2005-11-04 | Olympus Corp | Chip for microarray, its manufacturing method and its detection method |
CN101446584A (en) * | 2007-11-27 | 2009-06-03 | 环国科技股份有限公司 | Biochip for filtering blood cell and preparation method thereof |
US20090219509A1 (en) | 2008-02-29 | 2009-09-03 | Hiroshi Nomura | Optical sensor with enhanced reflectance |
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2011
- 2011-07-21 US US13/187,587 patent/US8841119B2/en not_active Expired - Fee Related
- 2011-07-22 CN CN201180036209.8A patent/CN103026208B/en not_active Expired - Fee Related
- 2011-07-22 MX MX2013000780A patent/MX2013000780A/en active IP Right Grant
- 2011-07-22 WO PCT/US2011/045031 patent/WO2012012732A2/en active Application Filing
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US4882288A (en) * | 1984-09-14 | 1989-11-21 | North John R | Assay technique and equipment |
US5310686A (en) * | 1987-03-10 | 1994-05-10 | Ares Serono Research & Development Limited Partnership | Polymer-coated optical structures |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150234284A1 (en) * | 2012-03-23 | 2015-08-20 | Orafol Americas Inc. | Methods for fabricating retroreflector tooling and retroreflector microstructures and devices thereof |
US9910357B2 (en) * | 2012-03-23 | 2018-03-06 | Orafol Americas Inc. | Methods for fabricating tooling and sheeting |
KR101501117B1 (en) * | 2013-12-02 | 2015-03-12 | 황완석 | ECL biosensor based on CdSe QDs for determination of Alzheimer's disease and fabrication method thereof |
Also Published As
Publication number | Publication date |
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WO2012012732A2 (en) | 2012-01-26 |
CN103026208A (en) | 2013-04-03 |
CN103026208B (en) | 2015-09-09 |
WO2012012732A3 (en) | 2012-04-26 |
US8841119B2 (en) | 2014-09-23 |
MX2013000780A (en) | 2013-07-05 |
BR112013001510A2 (en) | 2016-06-07 |
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