US20080264567A1 - Dry etching method and apparatus for performing dry etching - Google Patents

Dry etching method and apparatus for performing dry etching Download PDF

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US20080264567A1
US20080264567A1 US12/153,725 US15372508A US2008264567A1 US 20080264567 A1 US20080264567 A1 US 20080264567A1 US 15372508 A US15372508 A US 15372508A US 2008264567 A1 US2008264567 A1 US 2008264567A1
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cooling
temperature
cooling path
lower electrode
path
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US12/153,725
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Sang-Kwon Kim
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DB HiTek Co Ltd
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Dongbu Electronics Co Ltd
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Publication of US20080264567A1 publication Critical patent/US20080264567A1/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Definitions

  • the present invention relates to a dry etching method and an apparatus for performing dry etching, and more particularly to the dry etching method and apparatus including multiple cooling paths.
  • Equipment for manufacturing semiconductor devices is generally classified as either equipment for preceding processes or equipment for subsequent processes.
  • the equipment for preceding processes is used to form a photoresist pattern on a semiconductor substrate, such as coating a photoresist layer, exposing, and developing.
  • the equipment for subsequent processes is used for various processes related to a patterned substrate, such as an ion implantation process wherein impurity ions are implanted into the patterned substrate, an etching process wherein a target layer is selectively removed by using the photoresist pattern, a deposit process wherein a thin film is deposited on the semiconductor substrate, and a metallization process wherein a circuit pattern is interconnected.
  • Etching is generally performed by either a wet etching apparatus or a dry etching apparatus.
  • the known dry etching apparatus includes a lower electrode disposed opposite an upper electrode in an etching chamber.
  • a wafer is loaded on the lower electrode, and process gases are supplied and converted into plasma by the upper electrode.
  • FIG. 1 shows an example of a lower electrode in the known dry etching apparatus.
  • the lower electrode 102 defines cooling paths 104 in which cooling gas flows.
  • a clamping part 106 presses a wafer W loaded on the lower electrode 102 , such that the wafer W is held on the lower electrode 102 , and is cooled by the cooling gas flowing in the cooing paths 104 during etching of the wafer W.
  • the uniformity in the thickness of the remaining layer after the etching process depends on process conditions, such as a source power of the dry etching apparatus, chamber pressure, ratio of process gases, and uniformity of an etch target layer.
  • the uniformity in thickness of the remaining layer is also largely dependent on a rear surface temperature of the wafer.
  • FIG. 2 is a graph showing etch rate and uniformity in thickness of the remaining layer on the wafer as a function of the rear surface temperature of the wafer. As shown in FIG. 2 , both the etch rate and the uniformity in the thickness of the remaining layer are increased as the rear surface temperature of the wafer is increased.
  • FIG. 3 is a graph showing simulated data of the thickness of the remaining layer as a function of position after etching with the known dry etching apparatus. As shown in FIG. 3 , the remaining layer is not uniformly thick.
  • the temperature of the lower electrode is uniform over the entire rear surface of the wafer.
  • uniformity, or lack thereof, of the deposited etch target layer is not accounted for during the setting of process conditions.
  • the uniformity of the deposited etch target layer affects the uniformity in the thickness of the remaining layer. Therefore, it is difficult to improve the uniformity in the thickness of the remaining layer.
  • an object of the present invention is to provide a dry etching method that includes loading a wafer on a lower electrode having at least two cooling paths. Cooling fluids having different temperatures are supplied to each of the cooling paths of the lower electrode so that the multiple cooling paths are at different temperatures from one another. The wafer is etched during cooling.
  • the present invention further provides an apparatus for performing dry etching.
  • a lower electrode defining at least two cooling paths is disposed in an etching chamber.
  • An upper electrode, which is configured to convert process gases into plasma, is disposed above the lower electrode.
  • a fluid supply device is configured to supply cooling fluids having different predetermined temperatures to the cooling paths.
  • the present invention further provides a method of etching a semiconductor that includes cooling a first portion of the semiconductor to a first temperature, cooling a second portion of the semiconductor to a second temperature, and etching a layer of the semiconductor during cooling of the first and second portions.
  • the present invention still further provides an etching apparatus including an upper electrode disposed in an upper portion of an etching chamber, and a lower electrode disposed in a lower portion of the etching chamber opposite the upper electrode.
  • the lower electrode defines first and second cooling path.
  • a first fluid supply device is configured to supply a first coolant at a first temperature to the first cooling path.
  • a second fluid supply device is configured to supply a second coolant at a second temperature to the second cooling path.
  • FIG. 1 is a schematic diagram showing a lower electrode of a known dry etching apparatus.
  • FIG. 2 is a graph showing etch rate and uniformity in thickness of a remaining layer on a wafer as a function of the rear surface temperature of the wafer.
  • FIG. 3 is a graph showing simulated data of the thickness of the remaining layer as a function of position on the wafer after the etching process by the known dry etching apparatus.
  • FIG. 4 is a graph showing measured data of a thickness distribution of an etch target layer after the layer is formed to have a predetermined thickness.
  • FIG. 5 is a schematic diagram of a dry etching apparatus according to the present invention.
  • FIG. 6 is a graph showing measured data of a thickness distribution of the etch target layer after the layer is etched by the apparatus of FIG. 5 .
  • FIG. 4 is a graph showing measured data of an oxide layer thickness distribution in a wafer after the oxide layer is formed to have a predetermined thickness of about 8000 ⁇ .
  • the thickness of the oxide layer is 8200 ⁇ at a central portion of the wafer and 8600 ⁇ at a peripheral portion of the wafer.
  • the oxide layer as an etch target layer, is thicker at the peripheral portion than at the central portion. Therefore, the thickness of the etch target layer can be non-uniform even before an etching process is performed.
  • the present invention uses the dry etching apparatus as shown in FIG. 5 .
  • the dry etching apparatus includes a lower electrode 12 located in an etching chamber 10 .
  • An upper electrode 14 for converting process gases into plasma is located in an upper part of the chamber 10 , opposite the lower electrode 12 .
  • One or more process gases are supplied to the upper electrode 14 by an inflow pipe 16 .
  • the lower electrode 12 has at least two cooling paths, and preferably three cooling paths including a central path, an edge path, and a middle path located between the central and edge paths.
  • the multiple cooling paths of the lower electrode 12 are connected to multiple inflow pipes 18 a , 18 b and 18 c , respectively.
  • the inflow pipes 18 a , 18 b and 18 c are connected to a fluid supply device 18 for supplying cooling fluids having different predetermined temperatures to each of the inflow pipes 18 a , 18 b , and 18 c.
  • a cooling fluid having a temperature of 10° C. can be supplied to the central portion of the lower electrode 12 by the inflow pipe 18 a
  • a cooling fluid having a temperature of 20° C. can be supplied to the middle portion of the lower electrode 12 by the inflow pipe 18 c
  • a cooling fluid having a temperature of 30° C. can be supplied to the edge portion of the lower electrode 12 by the inflow pipe 18 b.
  • the dry etching apparatus uses cooling fluids having different temperatures because the etch rate increases as the rear surface temperature of the wafer increases, as shown in FIG. 2 .
  • the peripheral portion of the wafer, where the etch target layer is thicker is etched to a greater degree than the central portion of the wafer.
  • FIG. 6 is a graph showing measured data of a thickness distribution of the etch target layer after the layer is etched by the dry etching apparatus of the present invention.
  • a process gas of C 4 F 8 is flowed at 16 sccm
  • Ar is flowed at 380 sccm
  • O 2 is flowed at 5 sccm
  • CO is flowed at 300 sccm.
  • the pressure of the process chamber is maintained at a level of 55 mTorr, and source power is maintained at 1700 MW.
  • dry etching in accordance with the present invention provides an improvement in the uniformity in thickness of the remaining layer as compared to the known dry etching method.
  • selective etching performed in consideration of the variation in the thickness of the etch target layer can be performed by cooling different portions of the wafer to different temperatures.
  • the uniformity in the thickness of the remaining layer after etching can be improved.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

A dry etching method includes loading a wafer on a lower electrode having at least two cooling paths. Cooling fluids having different temperatures are supplied to each of the cooling paths of the lower electrode so that the multiple cooling paths are at different temperatures from one another. The wafer is etched during cooling.

Description

    BACKGROUND OF THE INVENTION
  • (a) Field of the Invention
  • The present invention relates to a dry etching method and an apparatus for performing dry etching, and more particularly to the dry etching method and apparatus including multiple cooling paths.
  • (b) Discussion of the Related Art
  • Equipment for manufacturing semiconductor devices is generally classified as either equipment for preceding processes or equipment for subsequent processes. The equipment for preceding processes is used to form a photoresist pattern on a semiconductor substrate, such as coating a photoresist layer, exposing, and developing. In contrast, the equipment for subsequent processes is used for various processes related to a patterned substrate, such as an ion implantation process wherein impurity ions are implanted into the patterned substrate, an etching process wherein a target layer is selectively removed by using the photoresist pattern, a deposit process wherein a thin film is deposited on the semiconductor substrate, and a metallization process wherein a circuit pattern is interconnected.
  • Etching is generally performed by either a wet etching apparatus or a dry etching apparatus. The known dry etching apparatus includes a lower electrode disposed opposite an upper electrode in an etching chamber. In the known dry etching apparatus, a wafer is loaded on the lower electrode, and process gases are supplied and converted into plasma by the upper electrode.
  • FIG. 1 shows an example of a lower electrode in the known dry etching apparatus. As shown in the figure, the lower electrode 102 defines cooling paths 104 in which cooling gas flows. A clamping part 106 presses a wafer W loaded on the lower electrode 102, such that the wafer W is held on the lower electrode 102, and is cooled by the cooling gas flowing in the cooing paths 104 during etching of the wafer W.
  • When the known dry etching apparatus is used to etch the wafer W, the uniformity in the thickness of the remaining layer after the etching process depends on process conditions, such as a source power of the dry etching apparatus, chamber pressure, ratio of process gases, and uniformity of an etch target layer. The uniformity in thickness of the remaining layer is also largely dependent on a rear surface temperature of the wafer.
  • FIG. 2 is a graph showing etch rate and uniformity in thickness of the remaining layer on the wafer as a function of the rear surface temperature of the wafer. As shown in FIG. 2, both the etch rate and the uniformity in the thickness of the remaining layer are increased as the rear surface temperature of the wafer is increased.
  • FIG. 3 is a graph showing simulated data of the thickness of the remaining layer as a function of position after etching with the known dry etching apparatus. As shown in FIG. 3, the remaining layer is not uniformly thick.
  • As described above, in the known dry etching apparatus the temperature of the lower electrode is uniform over the entire rear surface of the wafer. However, uniformity, or lack thereof, of the deposited etch target layer is not accounted for during the setting of process conditions. The uniformity of the deposited etch target layer affects the uniformity in the thickness of the remaining layer. Therefore, it is difficult to improve the uniformity in the thickness of the remaining layer.
    • SUMMARY OF THE INVENTION
  • To address the above-described and other problems, it is an object of the present invention is to provide a dry etching method that includes loading a wafer on a lower electrode having at least two cooling paths. Cooling fluids having different temperatures are supplied to each of the cooling paths of the lower electrode so that the multiple cooling paths are at different temperatures from one another. The wafer is etched during cooling.
  • The present invention further provides an apparatus for performing dry etching. A lower electrode defining at least two cooling paths is disposed in an etching chamber. An upper electrode, which is configured to convert process gases into plasma, is disposed above the lower electrode. A fluid supply device is configured to supply cooling fluids having different predetermined temperatures to the cooling paths.
  • The present invention further provides a method of etching a semiconductor that includes cooling a first portion of the semiconductor to a first temperature, cooling a second portion of the semiconductor to a second temperature, and etching a layer of the semiconductor during cooling of the first and second portions.
  • The present invention still further provides an etching apparatus including an upper electrode disposed in an upper portion of an etching chamber, and a lower electrode disposed in a lower portion of the etching chamber opposite the upper electrode. The lower electrode defines first and second cooling path. A first fluid supply device is configured to supply a first coolant at a first temperature to the first cooling path. A second fluid supply device is configured to supply a second coolant at a second temperature to the second cooling path.
    • BRIEF DESCRIPTION OF THE DRAWINGS
  • The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate an embodiment of the invention, and together with the description serve to explain principles of the invention.
  • FIG. 1 is a schematic diagram showing a lower electrode of a known dry etching apparatus.
  • FIG. 2 is a graph showing etch rate and uniformity in thickness of a remaining layer on a wafer as a function of the rear surface temperature of the wafer.
  • FIG. 3 is a graph showing simulated data of the thickness of the remaining layer as a function of position on the wafer after the etching process by the known dry etching apparatus.
  • FIG. 4 is a graph showing measured data of a thickness distribution of an etch target layer after the layer is formed to have a predetermined thickness.
  • FIG. 5 is a schematic diagram of a dry etching apparatus according to the present invention.
  • FIG. 6 is a graph showing measured data of a thickness distribution of the etch target layer after the layer is etched by the apparatus of FIG. 5.
    •  DETAILED DESCRIPTION OF THE INVENTION
  • An exemplary embodiment of the present invention is described below with reference to the accompanying drawings.
  • FIG. 4 is a graph showing measured data of an oxide layer thickness distribution in a wafer after the oxide layer is formed to have a predetermined thickness of about 8000 Å. According to the data, the thickness of the oxide layer is 8200 Å at a central portion of the wafer and 8600 Å at a peripheral portion of the wafer. Thus, as indicated in FIG. 4, the oxide layer, as an etch target layer, is thicker at the peripheral portion than at the central portion. Therefore, the thickness of the etch target layer can be non-uniform even before an etching process is performed.
  • To prevent a deterioration of thickness uniformity of a remaining layer after etching due to the non-uniformity in thickness of the etch target layer (i.e., due to a non-uniformity in the thickness of the layer to be etched before etching), the present invention uses the dry etching apparatus as shown in FIG. 5.
  • As shown in FIG. 5, the dry etching apparatus includes a lower electrode 12 located in an etching chamber 10. An upper electrode 14 for converting process gases into plasma is located in an upper part of the chamber 10, opposite the lower electrode 12. One or more process gases are supplied to the upper electrode 14 by an inflow pipe 16.
  • The lower electrode 12 has at least two cooling paths, and preferably three cooling paths including a central path, an edge path, and a middle path located between the central and edge paths. The multiple cooling paths of the lower electrode 12 are connected to multiple inflow pipes 18 a, 18 b and 18 c, respectively.
  • The inflow pipes 18 a, 18 b and 18 c are connected to a fluid supply device 18 for supplying cooling fluids having different predetermined temperatures to each of the inflow pipes 18 a, 18 b, and 18 c.
  • For example, a cooling fluid having a temperature of 10° C. can be supplied to the central portion of the lower electrode 12 by the inflow pipe 18 a, a cooling fluid having a temperature of 20° C. can be supplied to the middle portion of the lower electrode 12 by the inflow pipe 18 c, and a cooling fluid having a temperature of 30° C. can be supplied to the edge portion of the lower electrode 12 by the inflow pipe 18 b.
  • The dry etching apparatus according to the present invention uses cooling fluids having different temperatures because the etch rate increases as the rear surface temperature of the wafer increases, as shown in FIG. 2.
  • Therefore, by using the dry etching apparatus according to the present invention, the peripheral portion of the wafer, where the etch target layer is thicker, is etched to a greater degree than the central portion of the wafer. By this arrangement, uniformity in the thickness of the remaining layer is improved.
  • FIG. 6 is a graph showing measured data of a thickness distribution of the etch target layer after the layer is etched by the dry etching apparatus of the present invention. In the etching process, a process gas of C4F8 is flowed at 16 sccm, Ar is flowed at 380 sccm, O2 is flowed at 5 sccm, and CO is flowed at 300 sccm. The pressure of the process chamber is maintained at a level of 55 mTorr, and source power is maintained at 1700 MW.
  • As indicated by a comparison of FIG. 3 to FIG. 6, dry etching in accordance with the present invention provides an improvement in the uniformity in thickness of the remaining layer as compared to the known dry etching method.
  • As described above, selective etching performed in consideration of the variation in the thickness of the etch target layer can be performed by cooling different portions of the wafer to different temperatures. By this arrangement, the uniformity in the thickness of the remaining layer after etching can be improved.
  • The above discussion is directed to a preferred embodiment of the invention. It is to be understood, however, that the invention is not limited to the disclosed embodiment. Rather, the invention is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims.
  • The present application claims priority to, and incorporates by reference herein in its entirety, Korean patent application no. 10-2004-0110601, filed on Dec. 22, 2004.

Claims (13)

1-6. (canceled)
7. An apparatus for performing dry etching, comprising:
an etching chamber;
a lower electrode mounting a wafer having an etch-target layer thereon, the lower electrode comprising a plurality of cooling paths including a central cooling path and an edge cooling path;
an upper electrode disposed above the lower electrode; and
a fluid supply device configured to supply cooling fluids having different temperatures to each of the plurality of cooling paths.
8. The apparatus according to claim 7, wherein the lower electrode further comprising a middle cooling path located between the central cooling path and the edge cooling path.
9. The apparatus according to claim 8, wherein the fluid supply device comprises three inflow pipes configured to deliver the cooling fluids to the central cooling path, the edge cooling path, and the middle cooling path of the lower electrode.
10-16. (canceled)
17. An etching apparatus, comprising:
an etching chamber;
an upper electrode disposed in an upper portion of the etching chamber;
a lower electrode disposed in a lower portion of the etching chamber opposite the upper electrode, the lower electrode to mount a wafer having an etch-target layer therein the lower electrode defining first, second and third cooling paths, wherein the etch-target layer is thicker at an edge portion thereof than at a central portion at a central portion and a temperature of the cooling fluid supplied to the central cooling path is lower than that of the cooling fluid supplied to the edge cooling path;
a first fluid supply device configured to supply a first coolant at a first temperature to the first cooling path;
a second fluid supply device configured to supply a second coolant at a second temperature to the second cooling path; and
a third fluid supply device configured to supply a third coolant at a third temperature to the third cooling path.
18. (canceled)
19. The apparatus according to claim 9, wherein a temperature of the cooling fluid supplied to the edge cooling path is higher than a temperature of the cooling fluid supplied to the middle cooling path, and the temperature of the cooling fluid supplied to the middle cooling path is higher than a temperature of the cooling fluid supplied to the central cooling path.
20. The apparatus according to claim 19, wherein the temperature of the cooling fluid supplied to the edge cooling path is 30° C., the temperature of the cooling fluid supplied to the middle cooling path is 20° C., and the temperature of the cooling fluid supplied to the central cooling path is 10° C.
21. The apparatus according to claim 17, wherein the first cooling path is an edge cooling path, and the second cooling path is a central cooling path, and the third cooling path is located between the first cooling path and the second cooling path.
22. The apparatus according to claim 21, wherein the first temperature is greater than the second temperature.
23. The apparatus according to claim 22, wherein the third temperature is lower than the first temperature and greater than the second temperature.
24. The apparatus according to claim 23, wherein the first temperature is 30° C., and the second temperature is 20° C., and the third temperature is 10° C.
US12/153,725 2004-12-22 2008-05-23 Dry etching method and apparatus for performing dry etching Abandoned US20080264567A1 (en)

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US11/313,851 US7390751B2 (en) 2004-12-22 2005-12-22 Dry etching method and apparatus for performing dry etching
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US4275289A (en) * 1980-02-04 1981-06-23 Western Electric Company, Inc. Uniformly cooled plasma etching electrode
US5445709A (en) * 1992-11-19 1995-08-29 Hitachi, Ltd. Anisotropic etching method and apparatus
US5846375A (en) * 1996-09-26 1998-12-08 Micron Technology, Inc. Area specific temperature control for electrode plates and chucks used in semiconductor processing equipment
US5990016A (en) * 1996-12-24 1999-11-23 Samsung Electronics Co., Ltd. Dry etching method and apparatus for manufacturing a semiconductor device
US20040173311A1 (en) * 2003-03-04 2004-09-09 Tomoyoshi Ichimaru Plasma processing apparatus and method

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JPH05243191A (en) * 1992-02-26 1993-09-21 Nec Corp Dry etching device
JPH0917770A (en) * 1995-06-28 1997-01-17 Sony Corp Plasma treatment method and plasma apparatus used for it
JPH1140545A (en) * 1997-07-18 1999-02-12 Sony Corp Manufacture of semiconductor device
KR20000026696A (en) * 1998-10-22 2000-05-15 윤종용 Lower electrodes of etching equipment
JP4559595B2 (en) 2000-07-17 2010-10-06 東京エレクトロン株式会社 Apparatus for placing object to be processed and plasma processing apparatus
JP3817414B2 (en) * 2000-08-23 2006-09-06 株式会社日立製作所 Sample stage unit and plasma processing apparatus
KR20040059262A (en) * 2002-12-28 2004-07-05 동부전자 주식회사 multi channel cooling device and its method

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4275289A (en) * 1980-02-04 1981-06-23 Western Electric Company, Inc. Uniformly cooled plasma etching electrode
US5445709A (en) * 1992-11-19 1995-08-29 Hitachi, Ltd. Anisotropic etching method and apparatus
US5846375A (en) * 1996-09-26 1998-12-08 Micron Technology, Inc. Area specific temperature control for electrode plates and chucks used in semiconductor processing equipment
US5990016A (en) * 1996-12-24 1999-11-23 Samsung Electronics Co., Ltd. Dry etching method and apparatus for manufacturing a semiconductor device
US20040173311A1 (en) * 2003-03-04 2004-09-09 Tomoyoshi Ichimaru Plasma processing apparatus and method

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US7390751B2 (en) 2008-06-24
US20060130972A1 (en) 2006-06-22
KR20060072204A (en) 2006-06-28

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