US20070018333A1 - Semiconductor packaging device and manufacture thereof - Google Patents

Semiconductor packaging device and manufacture thereof Download PDF

Info

Publication number
US20070018333A1
US20070018333A1 US11/470,870 US47087006A US2007018333A1 US 20070018333 A1 US20070018333 A1 US 20070018333A1 US 47087006 A US47087006 A US 47087006A US 2007018333 A1 US2007018333 A1 US 2007018333A1
Authority
US
United States
Prior art keywords
chip
pads
insulating layer
carrier
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US11/470,870
Inventor
Chen-Jung Tsai
Jui-Chung Lee
Chih-Wen Lin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Macronix International Co Ltd
Original Assignee
Macronix International Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Macronix International Co Ltd filed Critical Macronix International Co Ltd
Priority to US11/470,870 priority Critical patent/US20070018333A1/en
Publication of US20070018333A1 publication Critical patent/US20070018333A1/en
Abandoned legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5389Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • H01L23/49816Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/19Manufacturing methods of high density interconnect preforms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0652Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next and on each other, i.e. mixed assemblies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0556Disposition
    • H01L2224/0557Disposition the external layer being disposed on a via connection of the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0556Disposition
    • H01L2224/05571Disposition the external layer being disposed in a recess of the surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/05573Single external layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/12105Bump connectors formed on an encapsulation of the semiconductor or solid-state body, e.g. bumps on chip-scale packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L2224/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
    • H01L2224/241Disposition
    • H01L2224/24135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/24137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73267Layer and HDI connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701Low temperature co-fired ceramic [LTCC]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1515Shape
    • H01L2924/15153Shape the die mounting substrate comprising a recess for hosting the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15172Fan-out arrangement of the internal vias
    • H01L2924/15174Fan-out arrangement of the internal vias in different layers of the multilayer substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15192Resurf arrangement of the internal vias
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1532Connection portion the connection portion being formed on the die mounting surface of the substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/156Material
    • H01L2924/15786Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
    • H01L2924/15787Ceramics, e.g. crystalline carbides, nitrides or oxides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape
    • H01L2924/1816Exposing the passive side of the semiconductor or solid-state body
    • H01L2924/18162Exposing the passive side of the semiconductor or solid-state body of a chip with build-up interconnect

Definitions

  • the invention relates to a stacking semiconductor packaging device and manufacture thereof, and more particularly relates to a structure of flip chip ball grid array (FCBGA) and manufacture thereof.
  • FCBGA flip chip ball grid array
  • the bonding pads on ICs need to be rearranged for an array by a redistribution process, followed by the formation of under-bumping-metallization layer and solder bumps.
  • PCB general print circuit board
  • a flip chip is first affixed to a build-up substrate, followed by fanning-out the I/O pins of the flip chip to become great-pitch-distribution area.
  • FCBGA Improved structure of FCBGA and manufacture thereof.
  • the redistribution and solder-bump process for a conventional structure of FCBGA are simplified and integrated into the fan-out process of build-up substrate.
  • a chip is prevented from affixing to a PCB directly such that a thickness of the novel packing structure is minimum and met with the requirement of heat radiation.
  • a semiconductor packaging device comprises a carrier having at least a cavity or a slot thereon. At least a chip has a back surface and an active surface with a plurality of first bonding pads. The chip is affixed to the cavity to expose the active surface.
  • a first insulating layer is on the active surface and the carrier, which comprises first plating through holes connected to first bonding pads and via the first insulating layer.
  • a multi-layer structure on the first insulating layer comprises a plurality of conductive layout lines, second plating through holes therein, and a second insulating layer, exposed ball pads, and flip-chip pads thereon.
  • the first plating through holes are electrically connected with the conductive layout lines, the second plating through holes, the exposed ball pads, and the flip-chip pads.
  • the first solder balls are affixed to the ball pads, and at least a second chip is affixed to the flip-chip pads through a plurality of second solder balls.
  • FIG. 1 is a flow chart illustrating the manufacture process in accordance with the present invention
  • FIG. 2 is a plane view illustrating the arrangement of the chips and the carrier in accordance with the present invention
  • FIG. 3 is a cross-sectional schematic diagram illustrating the packaging chip cut with line 2 A- 2 A in FIG. 2 ;
  • FIG. 4 is a cross-sectional schematic diagrams illustrating the packaging chip cut with line 2 A- 2 A in FIG. 2 ;
  • FIG. 5A is a cross-sectional schematic diagram illustrating the packaging chip cut with line 2 A- 2 A in FIG. 2 ;
  • FIG. 5B is a cross-sectional schematic diagram illustrating the packaging chip cut with line 2 A- 2 A in FIG. 2 ;
  • FIG. 6A is a cross-sectional schematic diagram illustrating the packaging chip cut with line 2 A- 2 A in FIG. 2 ;
  • FIG. 6B is a cross-sectional schematic diagram illustrating the packaging chip cut with line 2 A- 2 A in FIG. 2 ;
  • FIG. 7A is a cross-sectional schematic diagram illustrating the packaging chip cut with line 3 A- 3 A in FIG. 2 ;
  • FIG. 7B is a cross-sectional schematic diagram illustrating the packaging chip cut with line 3 A- 3 A in FIG. 2 ;
  • FIG. 7C is a cross-sectional schematic diagram illustrating the packaging chip cut with line 3 A- 3 A in FIG. 2 ;
  • FIG. 7D is a cross-sectional schematic diagram illustrating the packaging chip cut with line 3 A- 3 A in FIG. 2 .
  • a semiconductor packaging device comprises a carrier having at least a cavity or a slot thereon. At least a chip has a back surface and an active surface with a plurality of first bonding pads. The chip is affixed to the cavity to expose the active surface.
  • a first insulating layer is on the active surface and the carrier, which comprises first plating through holes connected to first bonding pads and via the first insulating layer.
  • a multi-layer structure on the first insulating layer comprises a plurality of conductive layout lines, second plating through holes therein, and a second insulating layer, exposed ball pads, and flip-chip pads thereon.
  • the first plating through holes are electrically connected with the conductive layout lines, the second plating through holes, the exposed ball pads, and the flip-chip pads.
  • the first solder balls are affixed to the ball pads, and at least a second chip is affixed to the flip-chip pads through a plurality of second solder balls.
  • FIG. 1 is a flow chart illustrating the manufacture process in accordance with the present invention.
  • One embodiment of the present invention is a manufacture process of FCBGA.
  • a wafer is first grinded and the dies (chips) on the grinded wafer are sawed (step 50 ).
  • the chips are attached to a carrier having multitudes of cavities or slots (step 51 ), wherein the active surfaces of the chips are faced upwards and the back surfaces/sidewalls of the chips are affixed to the cavities with adhesive.
  • the carrier can be made of silicon, ceramic, glass, or organic substrate, and so on.
  • an insulating layer is coated on the active surfaces of the chips and the surface of the carrier, and thereafter multitudes of bonding pads on the surroundings of the active surfaces are exposed (step 52 ).
  • the coating of the insulating layer can be implemented by conventional process of semiconductor film. And the insulating layer provides protection and planarization for the chips and the carrier. Furthermore, multitudes of first conductive via holes (plating through holes) are made in the insulating layer (step 53 ), wherein the first conductive holes are located corresponding to the bonding pads on the chip.
  • a layout for second conductive via holes and a multi-layer circuit are implemented on the insulating layer (step 54 ).
  • the multi-layer circuit connects electrically the first via holes with the second via holes.
  • the re-distribution is implemented (step 55 ), wherein those re-distributed bonding pads are located corresponding to the second conductive via holes and aligned to a great-pitch array on a substrate. It can be implemented by conventional redistribution process and the process of under bump metallization. That is, a single/multi-layer film with predetermined circuit and plating through holes is used to adhered to the adhesive on the chips and the carrier, wherein the plating through holes are connected to the bonding pads of the chip.
  • step 56 the packaging chips are grinded and sawed followed by attaching multitudes of solder balls to the predetermined location (the locations of re-distributed pads and the second via holes) and reflow (step 57 ).
  • the attachment of the solder balls can be implemented by conventional methods for ball grid array.
  • the chips and the carriers can be grinded to a predetermined packaging thickness.
  • FIG. 2 is a plane view illustrating the arrangement of the chips and the carrier in accordance with the present invention. Depicted in FIG. 2 , there are multitudes of cavities 10 (or slots) on the carrier 11 , in which each one is fitted for one chip. The back surfaces of the chips are affixed to the bottoms of the cavities with adhesive, as well as the sidewalls of the chips to the sidewalls of the cavities.
  • FIG. 3 , FIG. 4 , FIG. 5A and FIG. 5B are cross-sectional views illustrating the packaging chip cut with line 2 A- 2 A of FIG. 2 . Depicted in FIG. 3 , solder balls are distributed on the surrounding of the chip. After the chip 20 is placed in the carrier 11 and affixed by an adhesive 19 , an insulating layer 14 is formed on the active surface 30 of the chip 20 and the carrier 11 where the bonding pads 21 of the chip 20 are exposed. Multitudes of plating through holes 22 in the insulating layer 14 are connected with the bonding pads 21 .
  • a multi-layer film 15 with predetermined circuit 23 (connected to the plating through holes 22 ) is on the insulating layer 14 and thereafter another insulating layer 16 is formed on the multi-layer film 15 only to expose the pads 18 of the plating through holes 22 and multitudes of flip-chip pads 43 .
  • both the pads 18 and the flip-chip pads 43 are distributed above the carrier 11 , the chip 20 , or both.
  • one or more chips are stacked by the flip-chip technology and affixed through the bonding pads 41 of the chips 40 , solder balls 42 , and the flip-chip pads 43 .
  • the solder balls 17 are affixed to the pads 18 of the plating through holes.
  • the chips 40 would have the sizes similar to or different from the chip 20 has.
  • the pad redistribution, bumping, and fan-out processes for the chips can be implemented at one time.
  • One of advantages of the present invention is to avoid the direct chip attachment to a print circuit board for fear of poor reliability. Furthermore, the packaging thickness is minimum and the heat radiation is improved. On the other hand, it is not necessary to polish the chips so thin to meet the limitation of the stacked height. Furthermore, it is not necessary for the present invention to have any space for associating the wire-bonding process, such that the stacked height is further reduced.
  • the thickness of a carrier 13 is almost equal to one of the chip 20 such that the back surface 31 of the chip 20 is exposed and only the sidewall of the chip 20 is affixed to the carrier 13 .
  • the chips 40 are affixed below the carrier 13 .
  • the carrier 11 could comprise predetermined circuits 26 , and solder pads 24 (exposed by an insulating layer 25 ), when the carrier 11 is made of organic material.
  • the active surface 30 of the chip 20 is connected electrically to the conductive via predetermined circuit 26 of the carrier 11 through the circuit layout 23 of the multi-layer film 15 and the plating through holes 22 in the insulating layer 14 .
  • Multitudes of solder balls 17 are affixed to the solder pads 24 of the carrier 11 .
  • flip-chip bonding pads 43 are connected to the plating through holes in the insulating layer 16 , whereby they are further connected to the solder balls 42 on the chips 40 through the bonding pads 41 .
  • FIG. 5B is also a cross-sectional view illustrating the packaging chip cut with line 2 A- 2 A in FIG. 2 .
  • the chip 20 is exposed the back surface 31 out.
  • FIG. 6A is a cross-sectional view illustrating the packaging chip cut with line 2 A- 2 A in FIG. 2 .
  • the carrier 13 is made of an organic material so as to have the predetermined circuit 26 therein and solder pads 24 thereon.
  • the active surface 30 of the chip 20 are connected to the solder pads 24 of the carrier 13 through the multi-layer film 15 .
  • the solder balls 17 are affixed to the solder pads 24 on the carrier 13 surrounding the back surface 31 of the chip.
  • Two chips 40 have the solder balls 42 affixed to the bonding pads 41 , then the solder balls 42 are affixed to the flip-chip bonding pads 43 on the insulating layer 16 .
  • FIG. 6B is also a cross-sectional view illustrating the packaging chip cut with line 2 A- 2 A in FIG. 2 .
  • the chip 20 is exposed the back surface 31 out.
  • FIG. 7A is a cross-sectional view illustrating the packaging chip cut with line 3 A- 3 A in FIG. 2 .
  • the thickness of the carrier 11 is equal to that of the chip 20 .
  • Two chips 20 are affixed to the sidewall of the carrier 13 with their individual sidewall, and exposed their individual back surface 31 out.
  • the two chips 20 can have electric interconnection (not shown in figure) through the multi-layer film 15 with its predetermined circuit 23 with which the chips 40 are also connected.
  • the carrier 13 in the embodiment is also made of the organic material that can have predetermined layout.
  • the solder balls 17 are distributed on the carrier 13 that is at the same side with the back surface 31 of the chip 20 .
  • FIG. 7B is also a cross-sectional view illustrating the packaging chip cut with line 3 A- 3 A in FIG. 2 .
  • the carrier 13 comprises predetermined circuits 26 and solder pads 24 within an insulating layer 25 .
  • FIG. 7C is a cross-sectional view illustrating the packaging chip cut with line 3 A- 3 A in FIG. 2 .
  • the chips 20 are not exposed the back surfaces 31 out.
  • FIG. 7D is a cross-sectional view illustrating the packaging chip cut with line 3 A- 3 A in FIG. 2 .
  • the chips 20 are not exposed the back surfaces 31 out.
  • the carrier 13 comprises predetermined circuits 26 and solder pads 24 .

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Wire Bonding (AREA)

Abstract

A semiconductor packaging device comprises a carrier having at least a cavity/a slot thereon, at least a chip has a back surface and an active surface with a plurality of first bonding pads. The chip is affixed to the cavity to expose the active surface. A first insulating layer is on the active surface and the carrier comprises first plating through holes connected to first bonding pads and via the first insulating layer. A multi-layer structure on the first insulating layer comprises a plurality of conductive layout lines, second plating through holes therein, and a second insulating layer, exposed ball pads, and flip-chip pads thereon. The first plating through holes are electrically connected with the conductive layout lines, the second plating through holes, the exposed ball pads, and the flip-chip pads. The first solder balls are affixed to the ball pads.

Description

    CROSS-REFERENCE TO RELATED APPLICATIONS
  • This application is a continuation application of U.S. application Ser. No. 10/131,485 filed Apr. 25, 2002, the disclosure of which is hereby incorporated by reference herein in its entirety.
  • BACKGROUND OF THE INVENTION
  • 1. Field of the Invention
  • The invention relates to a stacking semiconductor packaging device and manufacture thereof, and more particularly relates to a structure of flip chip ball grid array (FCBGA) and manufacture thereof.
  • 2. Description of the Prior Art
  • In packaging manufacture, especially in packaging manufacture of FCBGA for integrated circuits (ICs) of high-density I/O or few I/O on small area, the bonding pads on ICs need to be rearranged for an array by a redistribution process, followed by the formation of under-bumping-metallization layer and solder bumps. Due to the limitation of general print circuit board (PCB) on the high-density I/O layout of integrated circuits, a flip chip is first affixed to a build-up substrate, followed by fanning-out the I/O pins of the flip chip to become great-pitch-distribution area.
  • However, due to the small solder bumps on the flip chips and the difference of thermal expansion between the solder bumps and the BT substrate, it is necessary to fill the gaps among the flip chip, solder bumps, and a general substrate with underfilled gel on consideration of reliability. Thus, the consumptions of time and cost for such a process are high.
  • SUMMARY OF THE INVENTION
  • It is one object of the present invention to provide a semiconductor packaging and manufacture thereof. An additionally high-cost fan-out process and thereto relative steps are not necessary for the present invention.
  • Improved structure of FCBGA and manufacture thereof. The redistribution and solder-bump process for a conventional structure of FCBGA are simplified and integrated into the fan-out process of build-up substrate.
  • It is further object of the present invention to provide a novel packaging structure with improved reliability and manufacture thereof. A chip is prevented from affixing to a PCB directly such that a thickness of the novel packing structure is minimum and met with the requirement of heat radiation.
  • In the present invention, a semiconductor packaging device comprises a carrier having at least a cavity or a slot thereon. At least a chip has a back surface and an active surface with a plurality of first bonding pads. The chip is affixed to the cavity to expose the active surface. A first insulating layer is on the active surface and the carrier, which comprises first plating through holes connected to first bonding pads and via the first insulating layer. A multi-layer structure on the first insulating layer comprises a plurality of conductive layout lines, second plating through holes therein, and a second insulating layer, exposed ball pads, and flip-chip pads thereon. The first plating through holes are electrically connected with the conductive layout lines, the second plating through holes, the exposed ball pads, and the flip-chip pads. The first solder balls are affixed to the ball pads, and at least a second chip is affixed to the flip-chip pads through a plurality of second solder balls. Such architecture integrates the redistribution and fan-out process, which simplifies the conventional process for flip-chip ball grid array.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • A better understanding of the invention may be derived by reading the following detailed description with reference to the accompanying drawings wherein:
  • FIG. 1 is a flow chart illustrating the manufacture process in accordance with the present invention;
  • FIG. 2 is a plane view illustrating the arrangement of the chips and the carrier in accordance with the present invention;
  • FIG. 3 is a cross-sectional schematic diagram illustrating the packaging chip cut with line 2A-2A in FIG. 2;
  • FIG. 4 is a cross-sectional schematic diagrams illustrating the packaging chip cut with line 2A-2A in FIG. 2;
  • FIG. 5A is a cross-sectional schematic diagram illustrating the packaging chip cut with line 2A-2A in FIG. 2;
  • FIG. 5B is a cross-sectional schematic diagram illustrating the packaging chip cut with line 2A-2A in FIG. 2;
  • FIG. 6A is a cross-sectional schematic diagram illustrating the packaging chip cut with line 2A-2A in FIG. 2;
  • FIG. 6B is a cross-sectional schematic diagram illustrating the packaging chip cut with line 2A-2A in FIG. 2;
  • FIG. 7A is a cross-sectional schematic diagram illustrating the packaging chip cut with line 3A-3A in FIG. 2;
  • FIG. 7B is a cross-sectional schematic diagram illustrating the packaging chip cut with line 3A-3A in FIG. 2;
  • FIG. 7C is a cross-sectional schematic diagram illustrating the packaging chip cut with line 3A-3A in FIG. 2; and
  • FIG. 7D is a cross-sectional schematic diagram illustrating the packaging chip cut with line 3A-3A in FIG. 2.
  • DESCRIPTION OF THE PREFERRED EMBODIMENT
  • While the invention is described in terms of a single preferred embodiment, those skilled in the art will recognize that many devices described below can be altered as well as other substitutions with same function and can be freely made without departing from the spirit and scope of the invention.
  • Furthermore, there is shown a representative portion of semiconductor packaging of the present invention in enlarged. The drawings are not necessarily to scale for clarify of illustration and should not be interpreted in a limiting sense. Furthermore, the present invention can be applied on various multichip devices or packages.
  • In the present invention, a semiconductor packaging device comprises a carrier having at least a cavity or a slot thereon. At least a chip has a back surface and an active surface with a plurality of first bonding pads. The chip is affixed to the cavity to expose the active surface. A first insulating layer is on the active surface and the carrier, which comprises first plating through holes connected to first bonding pads and via the first insulating layer. A multi-layer structure on the first insulating layer comprises a plurality of conductive layout lines, second plating through holes therein, and a second insulating layer, exposed ball pads, and flip-chip pads thereon. The first plating through holes are electrically connected with the conductive layout lines, the second plating through holes, the exposed ball pads, and the flip-chip pads. The first solder balls are affixed to the ball pads, and at least a second chip is affixed to the flip-chip pads through a plurality of second solder balls. Such architecture integrates the redistribution and fan-out process, which simplifies the conventional process for flip-chip ball grid array.
  • FIG. 1 is a flow chart illustrating the manufacture process in accordance with the present invention. One embodiment of the present invention is a manufacture process of FCBGA. A wafer is first grinded and the dies (chips) on the grinded wafer are sawed (step 50). The chips are attached to a carrier having multitudes of cavities or slots (step 51), wherein the active surfaces of the chips are faced upwards and the back surfaces/sidewalls of the chips are affixed to the cavities with adhesive. Furthermore, the carrier can be made of silicon, ceramic, glass, or organic substrate, and so on. Next, an insulating layer is coated on the active surfaces of the chips and the surface of the carrier, and thereafter multitudes of bonding pads on the surroundings of the active surfaces are exposed (step 52). The coating of the insulating layer can be implemented by conventional process of semiconductor film. And the insulating layer provides protection and planarization for the chips and the carrier. Furthermore, multitudes of first conductive via holes (plating through holes) are made in the insulating layer (step 53), wherein the first conductive holes are located corresponding to the bonding pads on the chip.
  • A layout for second conductive via holes and a multi-layer circuit are implemented on the insulating layer (step 54). The multi-layer circuit connects electrically the first via holes with the second via holes. Next, the re-distribution is implemented (step 55), wherein those re-distributed bonding pads are located corresponding to the second conductive via holes and aligned to a great-pitch array on a substrate. It can be implemented by conventional redistribution process and the process of under bump metallization. That is, a single/multi-layer film with predetermined circuit and plating through holes is used to adhered to the adhesive on the chips and the carrier, wherein the plating through holes are connected to the bonding pads of the chip. Then another adhesive is coated on the single/multi-layer film and the pads of the plating through holes are exposed. Furthermore, one or more chips similar or different in sizes are stacked on the above-mentioned structure by the flip-chip technology (step 56). Next, the packaging chips are grinded and sawed followed by attaching multitudes of solder balls to the predetermined location (the locations of re-distributed pads and the second via holes) and reflow (step 57). The attachment of the solder balls can be implemented by conventional methods for ball grid array. Furthermore, the chips and the carriers can be grinded to a predetermined packaging thickness.
  • FIG. 2 is a plane view illustrating the arrangement of the chips and the carrier in accordance with the present invention. Depicted in FIG. 2, there are multitudes of cavities 10 (or slots) on the carrier 11, in which each one is fitted for one chip. The back surfaces of the chips are affixed to the bottoms of the cavities with adhesive, as well as the sidewalls of the chips to the sidewalls of the cavities.
  • FIG. 3, FIG. 4, FIG. 5A and FIG. 5B are cross-sectional views illustrating the packaging chip cut with line 2A-2A of FIG. 2. Depicted in FIG. 3, solder balls are distributed on the surrounding of the chip. After the chip 20 is placed in the carrier 11 and affixed by an adhesive 19, an insulating layer 14 is formed on the active surface 30 of the chip 20 and the carrier 11 where the bonding pads 21 of the chip 20 are exposed. Multitudes of plating through holes 22 in the insulating layer 14 are connected with the bonding pads 21. A multi-layer film 15 with predetermined circuit 23 (connected to the plating through holes 22) is on the insulating layer 14 and thereafter another insulating layer 16 is formed on the multi-layer film 15 only to expose the pads 18 of the plating through holes 22 and multitudes of flip-chip pads 43. To be specific, both the pads 18 and the flip-chip pads 43 are distributed above the carrier 11, the chip 20, or both.
  • Next, one or more chips are stacked by the flip-chip technology and affixed through the bonding pads 41 of the chips 40, solder balls 42, and the flip-chip pads 43. Then the solder balls 17 are affixed to the pads 18 of the plating through holes. To be specific, the chips 40 would have the sizes similar to or different from the chip 20 has. Furthermore, it is necessary for the solder balls 17 to have a vertical height thicker than the height summation of the chips 40, bonding pads 41, and the solder balls 43, and so on. Thus, the pad redistribution, bumping, and fan-out processes for the chips can be implemented at one time. One of advantages of the present invention is to avoid the direct chip attachment to a print circuit board for fear of poor reliability. Furthermore, the packaging thickness is minimum and the heat radiation is improved. On the other hand, it is not necessary to polish the chips so thin to meet the limitation of the stacked height. Furthermore, it is not necessary for the present invention to have any space for associating the wire-bonding process, such that the stacked height is further reduced.
  • Shown in FIG. 4 similar to FIG. 3, the thickness of a carrier 13 is almost equal to one of the chip 20 such that the back surface 31 of the chip 20 is exposed and only the sidewall of the chip 20 is affixed to the carrier 13. The chips 40 are affixed below the carrier 13.
  • Depicted FIG. 5A, in addition to the back surface 31 of the chip 20 in the cavity of the carrier 11, the carrier 11 could comprise predetermined circuits 26, and solder pads 24 (exposed by an insulating layer 25), when the carrier 11 is made of organic material. The active surface 30 of the chip 20 is connected electrically to the conductive via predetermined circuit 26 of the carrier 11 through the circuit layout 23 of the multi-layer film 15 and the plating through holes 22 in the insulating layer 14. Multitudes of solder balls 17 are affixed to the solder pads 24 of the carrier 11. Next, there are multitudes of flip-chip bonding pads 43 are connected to the plating through holes in the insulating layer 16, whereby they are further connected to the solder balls 42 on the chips 40 through the bonding pads 41.
  • FIG. 5B is also a cross-sectional view illustrating the packaging chip cut with line 2A-2A in FIG. 2. The chip 20 is exposed the back surface 31 out.
  • FIG. 6A is a cross-sectional view illustrating the packaging chip cut with line 2A-2A in FIG. 2. Beside of the equal thickness of the chip 20 and the carrier 13, the carrier 13 is made of an organic material so as to have the predetermined circuit 26 therein and solder pads 24 thereon. The active surface 30 of the chip 20 are connected to the solder pads 24 of the carrier 13 through the multi-layer film 15. The solder balls 17 are affixed to the solder pads 24 on the carrier 13 surrounding the back surface 31 of the chip. Two chips 40 have the solder balls 42 affixed to the bonding pads 41, then the solder balls 42 are affixed to the flip-chip bonding pads 43 on the insulating layer 16.
  • FIG. 6B is also a cross-sectional view illustrating the packaging chip cut with line 2A-2A in FIG. 2. The chip 20 is exposed the back surface 31 out.
  • FIG. 7A is a cross-sectional view illustrating the packaging chip cut with line 3A-3A in FIG. 2. In this embodiment, the thickness of the carrier 11 is equal to that of the chip 20. Two chips 20 are affixed to the sidewall of the carrier 13 with their individual sidewall, and exposed their individual back surface 31 out. One of advantages in the embodiment, the two chips 20 can have electric interconnection (not shown in figure) through the multi-layer film 15 with its predetermined circuit 23 with which the chips 40 are also connected. To be specific, the carrier 13 in the embodiment is also made of the organic material that can have predetermined layout. The solder balls 17 are distributed on the carrier 13 that is at the same side with the back surface 31 of the chip 20.
  • FIG. 7B is also a cross-sectional view illustrating the packaging chip cut with line 3A-3A in FIG. 2. The carrier 13 comprises predetermined circuits 26 and solder pads 24 within an insulating layer 25.
  • FIG. 7C is a cross-sectional view illustrating the packaging chip cut with line 3A-3A in FIG. 2. The chips 20 are not exposed the back surfaces 31 out.
  • FIG. 7D is a cross-sectional view illustrating the packaging chip cut with line 3A-3A in FIG. 2. The chips 20 are not exposed the back surfaces 31 out. The carrier 13 comprises predetermined circuits 26 and solder pads 24.
  • While this invention has been described with reference to illustrative embodiments, this description is not intended to be construed in a limiting sense. Various modifications and combinations of the illustrative embodiments, as well as other embodiments of the invention, will be apparent to persons skilled in the art upon reference to the description. It is therefore intended that the appended claims encompass any such modifications or embodiments.

Claims (6)

1. An interface for chip assembly comprising,
a first insulating layer comprising a plurality of first connectors for connecting to a first chip;
a second insulating layer comprising a plurality of second connectors for connecting to a second chip and a plurality of third connectors for connecting to a circuit board; and
a third insulating layer between said first and second insulating layers, comprising a plurality of conductive layout lines for arranging the connection between said first, second, and third connectors.
2. An interface for chip assembly as claimed in claim 1, wherein said first insulating layer is affixed to a carrier which comprises said first chip.
3. An interface for chip assembly as claimed in claim 1, wherein said plurality of first connectors are connecting to said first chip via bonding pads.
4. An interface for chip assembly as claimed in claim 1, wherein said plurality of second connectors are connecting to said second chip via a ball grid array.
5. An interface for chip assembly as claimed in claim 1, wherein said plurality of third connectors are connecting to said circuit board via a ball grid array.
6. An interface for chip assembly as claimed in claim 5, wherein height of said ball grid array is higher than said second chip.
US11/470,870 2002-04-25 2006-09-07 Semiconductor packaging device and manufacture thereof Abandoned US20070018333A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US11/470,870 US20070018333A1 (en) 2002-04-25 2006-09-07 Semiconductor packaging device and manufacture thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/131,485 US7122904B2 (en) 2002-04-25 2002-04-25 Semiconductor packaging device and manufacture thereof
US11/470,870 US20070018333A1 (en) 2002-04-25 2006-09-07 Semiconductor packaging device and manufacture thereof

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US10/131,485 Continuation US7122904B2 (en) 2002-04-25 2002-04-25 Semiconductor packaging device and manufacture thereof

Publications (1)

Publication Number Publication Date
US20070018333A1 true US20070018333A1 (en) 2007-01-25

Family

ID=29248588

Family Applications (2)

Application Number Title Priority Date Filing Date
US10/131,485 Expired - Lifetime US7122904B2 (en) 2002-04-25 2002-04-25 Semiconductor packaging device and manufacture thereof
US11/470,870 Abandoned US20070018333A1 (en) 2002-04-25 2006-09-07 Semiconductor packaging device and manufacture thereof

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US10/131,485 Expired - Lifetime US7122904B2 (en) 2002-04-25 2002-04-25 Semiconductor packaging device and manufacture thereof

Country Status (1)

Country Link
US (2) US7122904B2 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080001296A1 (en) * 2005-04-18 2008-01-03 Chao-Chun Tu Bond pad structures and semiconductor devices using the same
US20110042824A1 (en) * 2009-08-20 2011-02-24 Fujitsu Limited Multi-chip module and method of manufacturing the same
US20130228911A1 (en) * 2010-12-03 2013-09-05 Mathew J. Manusharow Low-profile microelectronic package, method of manufacturing same, and electronic assembly containing same
US20140117530A1 (en) * 2012-10-26 2014-05-01 Infineon Technologies Ag Semiconductor Devices and Methods for Manufacturing Semiconductor Devices
US9293419B2 (en) * 2014-04-17 2016-03-22 Panasonic Intellectual Property Management Co., Ltd. Semiconductor package and semiconductor device
US20170018507A1 (en) * 2010-06-02 2017-01-19 STATS ChipPAC Pte. Ltd. Semiconductor Device and Method of Forming EMI Shielding Layer with Conductive Material Around Semiconductor Die
US9847284B2 (en) * 2013-01-29 2017-12-19 Apple Inc. Stacked wafer DDR package
WO2018182597A1 (en) * 2017-03-29 2018-10-04 Intel Corporation Microelectronic device with embedded die substrate on interposer
CN110828496A (en) * 2019-11-15 2020-02-21 华天科技(昆山)电子有限公司 Semiconductor device and method for manufacturing the same

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW560698U (en) * 2002-09-09 2003-11-01 Via Tech Inc Structure of chip package
TWI312569B (en) * 2006-10-12 2009-07-21 Siliconware Precision Industries Co Ltd Semiconductor package on which a semiconductor device is stacked and production method thereof
GB2459251A (en) * 2008-04-01 2009-10-21 Sharp Kk Semiconductor nanowire devices
GB2458907A (en) * 2008-04-01 2009-10-07 Sharp Kk Device interconnects
JP5078808B2 (en) * 2008-09-03 2012-11-21 ラピスセミコンダクタ株式会社 Manufacturing method of semiconductor device
US8399983B1 (en) * 2008-12-11 2013-03-19 Xilinx, Inc. Semiconductor assembly with integrated circuit and companion device
US8258010B2 (en) * 2009-03-17 2012-09-04 Stats Chippac, Ltd. Making a semiconductor device having conductive through organic vias
KR101665556B1 (en) * 2009-11-19 2016-10-13 삼성전자 주식회사 Semiconductor package having multi pitch ball land
US8405229B2 (en) * 2009-11-30 2013-03-26 Endicott Interconnect Technologies, Inc. Electronic package including high density interposer and circuitized substrate assembly utilizing same
US8759209B2 (en) * 2010-03-25 2014-06-24 Stats Chippac, Ltd. Semiconductor device and method of forming a dual UBM structure for lead free bump connections
TWI509712B (en) * 2012-01-20 2015-11-21 Dawning Leading Technology Inc Chip size package structure and chip size package method thereof
US9881894B2 (en) 2012-03-08 2018-01-30 STATS ChipPAC Pte. Ltd. Thin 3D fan-out embedded wafer level package (EWLB) for application processor and memory integration
US20130277855A1 (en) * 2012-04-24 2013-10-24 Terry (Teckgyu) Kang High density 3d package
US20140001623A1 (en) * 2012-06-28 2014-01-02 Pramod Malatkar Microelectronic structure having a microelectronic device disposed between an interposer and a substrate
KR101419600B1 (en) * 2012-11-20 2014-07-17 앰코 테크놀로지 코리아 주식회사 Package of finger print sensor and fabricating method thereof
US9401350B1 (en) * 2015-07-29 2016-07-26 Qualcomm Incorporated Package-on-package (POP) structure including multiple dies
KR20170075125A (en) * 2015-12-22 2017-07-03 에스케이하이닉스 주식회사 Semiconductor package and method for the same
US10366968B2 (en) * 2016-09-30 2019-07-30 Intel IP Corporation Interconnect structure for a microelectronic device
WO2018165819A1 (en) * 2017-03-13 2018-09-20 深圳修远电子科技有限公司 Circuit line connection method
WO2018165818A1 (en) * 2017-03-13 2018-09-20 深圳修远电子科技有限公司 Circuit fanning out method
CN112420679B (en) * 2020-11-20 2023-03-21 中国电子科技集团公司第二十九研究所 Radio frequency module three-dimensional stacking structure and manufacturing method thereof

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5353498A (en) * 1993-02-08 1994-10-11 General Electric Company Method for fabricating an integrated circuit module
US5524339A (en) * 1994-09-19 1996-06-11 Martin Marietta Corporation Method for protecting gallium arsenide mmic air bridge structures
US5760478A (en) * 1996-08-20 1998-06-02 International Business Machines Corporation Clock skew minimization system and method for integrated circuits
US6075712A (en) * 1999-01-08 2000-06-13 Intel Corporation Flip-chip having electrical contact pads on the backside of the chip
US6140707A (en) * 1998-05-07 2000-10-31 3M Innovative Properties Co. Laminated integrated circuit package
US6271469B1 (en) * 1999-11-12 2001-08-07 Intel Corporation Direct build-up layer on an encapsulated die package
US20020074652A1 (en) * 2000-12-15 2002-06-20 Pierce John L. Method, apparatus and system for multiple chip assemblies
US6489686B2 (en) * 1999-12-21 2002-12-03 International Business Machines Corporation Multi-cavity substrate structure for discrete devices
US6521984B2 (en) * 2000-11-07 2003-02-18 Mitsubishi Denki Kabushiki Kaisha Semiconductor module with semiconductor devices attached to upper and lower surface of a semiconductor substrate

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5353498A (en) * 1993-02-08 1994-10-11 General Electric Company Method for fabricating an integrated circuit module
US5524339A (en) * 1994-09-19 1996-06-11 Martin Marietta Corporation Method for protecting gallium arsenide mmic air bridge structures
US5760478A (en) * 1996-08-20 1998-06-02 International Business Machines Corporation Clock skew minimization system and method for integrated circuits
US6140707A (en) * 1998-05-07 2000-10-31 3M Innovative Properties Co. Laminated integrated circuit package
US6075712A (en) * 1999-01-08 2000-06-13 Intel Corporation Flip-chip having electrical contact pads on the backside of the chip
US6271469B1 (en) * 1999-11-12 2001-08-07 Intel Corporation Direct build-up layer on an encapsulated die package
US6489686B2 (en) * 1999-12-21 2002-12-03 International Business Machines Corporation Multi-cavity substrate structure for discrete devices
US6521984B2 (en) * 2000-11-07 2003-02-18 Mitsubishi Denki Kabushiki Kaisha Semiconductor module with semiconductor devices attached to upper and lower surface of a semiconductor substrate
US20020074652A1 (en) * 2000-12-15 2002-06-20 Pierce John L. Method, apparatus and system for multiple chip assemblies

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080001296A1 (en) * 2005-04-18 2008-01-03 Chao-Chun Tu Bond pad structures and semiconductor devices using the same
US7646087B2 (en) * 2005-04-18 2010-01-12 Mediatek Inc. Multiple-dies semiconductor device with redistributed layer pads
US20110042824A1 (en) * 2009-08-20 2011-02-24 Fujitsu Limited Multi-chip module and method of manufacturing the same
US8368230B2 (en) * 2009-08-20 2013-02-05 Fujitsu Limited Electronic part and method of manufacturing the same
US10643952B2 (en) * 2010-06-02 2020-05-05 Jcet Semiconductor (Shaoxing) Co., Ltd. Semiconductor device and method of forming EMI shielding layer with conductive material around semiconductor die
US20170018507A1 (en) * 2010-06-02 2017-01-19 STATS ChipPAC Pte. Ltd. Semiconductor Device and Method of Forming EMI Shielding Layer with Conductive Material Around Semiconductor Die
US20130228911A1 (en) * 2010-12-03 2013-09-05 Mathew J. Manusharow Low-profile microelectronic package, method of manufacturing same, and electronic assembly containing same
US20140117530A1 (en) * 2012-10-26 2014-05-01 Infineon Technologies Ag Semiconductor Devices and Methods for Manufacturing Semiconductor Devices
US9385075B2 (en) * 2012-10-26 2016-07-05 Infineon Technologies Ag Glass carrier with embedded semiconductor device and metal layers on the top surface
US9847284B2 (en) * 2013-01-29 2017-12-19 Apple Inc. Stacked wafer DDR package
US9293419B2 (en) * 2014-04-17 2016-03-22 Panasonic Intellectual Property Management Co., Ltd. Semiconductor package and semiconductor device
WO2018182597A1 (en) * 2017-03-29 2018-10-04 Intel Corporation Microelectronic device with embedded die substrate on interposer
US11430740B2 (en) 2017-03-29 2022-08-30 Intel Corporation Microelectronic device with embedded die substrate on interposer
US11894311B2 (en) 2017-03-29 2024-02-06 Intel Corporation Microelectronic device with embedded die substrate on interposer
US12046560B2 (en) 2017-03-29 2024-07-23 Intel Corporation Microelectronic device with embedded die substrate on interposer
CN110828496A (en) * 2019-11-15 2020-02-21 华天科技(昆山)电子有限公司 Semiconductor device and method for manufacturing the same

Also Published As

Publication number Publication date
US7122904B2 (en) 2006-10-17
US20030201521A1 (en) 2003-10-30

Similar Documents

Publication Publication Date Title
US20070018333A1 (en) Semiconductor packaging device and manufacture thereof
US11929349B2 (en) Semiconductor device having laterally offset stacked semiconductor dies
US6294406B1 (en) Highly integrated chip-on-chip packaging
US6369448B1 (en) Vertically integrated flip chip semiconductor package
US6437990B1 (en) Multi-chip ball grid array IC packages
US7253511B2 (en) Semiconductor multipackage module including die and inverted land grid array package stacked over ball grid array package
US7095105B2 (en) Vertically stacked semiconductor device
US8269326B2 (en) Semiconductor device assemblies
US10083919B2 (en) Packaging for high speed chip to chip communication
KR100269528B1 (en) High performance, low cost multi-chip module package
US20070257348A1 (en) Multiple chip package module and method of fabricating the same
JP2012160707A (en) Multilayer semiconductor chip, semiconductor device, and manufacturing method for these
US6294838B1 (en) Multi-chip stacked package
KR20120029169A (en) Print circuit board having hexagonal bump pad for substrate of semiconductor package and semiconductor package having the same
CN115132593A (en) Three-dimensional packaging structure and preparation method thereof
US6977436B2 (en) Semiconductor packaging device
US7235870B2 (en) Microelectronic multi-chip module
US9048223B2 (en) Package structure having silicon through vias connected to ground potential
US20070252256A1 (en) Package-on-package structures
US20230378072A1 (en) Electronic package and manufacturing method thereof
KR20050027384A (en) Chip size package having rerouting pad and stack thereof

Legal Events

Date Code Title Description
STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION