US20050219743A1 - Perpendicular write head with tapered main pole - Google Patents
Perpendicular write head with tapered main pole Download PDFInfo
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- US20050219743A1 US20050219743A1 US10/818,577 US81857704A US2005219743A1 US 20050219743 A1 US20050219743 A1 US 20050219743A1 US 81857704 A US81857704 A US 81857704A US 2005219743 A1 US2005219743 A1 US 2005219743A1
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- layer
- pole
- write head
- microns
- magnetic
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/147—Structure or manufacture of heads, e.g. inductive with cores being composed of metal sheets, i.e. laminated cores with cores composed of isolated magnetic layers, e.g. sheets
- G11B5/1475—Assembling or shaping of elements
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
- G11B5/3143—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding
- G11B5/3146—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding magnetic layers
- G11B5/315—Shield layers on both sides of the main pole, e.g. in perpendicular magnetic heads
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49043—Depositing magnetic layer or coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49043—Depositing magnetic layer or coating
- Y10T29/49044—Plural magnetic deposition layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49043—Depositing magnetic layer or coating
- Y10T29/49046—Depositing magnetic layer or coating with etching or machining of magnetic material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49048—Machining magnetic material [e.g., grinding, etching, polishing]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49048—Machining magnetic material [e.g., grinding, etching, polishing]
- Y10T29/49052—Machining magnetic material [e.g., grinding, etching, polishing] by etching
Definitions
- the invention relates to the general field of magnetic disk systems with particular reference to perpendicular write poles and controlling flux therefrom.
- SP single-pole
- SUL magnetically soft underlayer
- perpendicular recording system the capability of providing a larger write field (than that of a ring head) to enable writing into the relatively thick media with high anisotropy constant.
- the latter quality leads one to assume better thermal stability associated with perpendicular recording.
- this advantage is diminished as the dimension of the pole tip is reduced to increase the areal recording density [1]. So, the tradeoff between head writing field and thermal stability may still limit the achievable areal density for perpendicular recording.
- FIG. 1 is a schematic representation of a typical single pole vertical recording system of the prior art. Seen there is single write pole 13 whose ABS (air bearing surface) moves parallel, and close to, the surface of recording medium 16 . The latter comprises an upper, high coercivity, layer (not shown) on a magnetically soft underlayer. Coils 12 generate magnetic flux in yoke 14 which passes through main pole 14 into tip 13 and then into media 16 (where a bit is written). The magnetic circuit is completed by flux that passes through the soft under layer and then back into return pole 15 . The space enclosed by the yoke and poles is normally filled with insulating material 17 .
- FIG. 2 is a front view of the structure shown in FIG. 1 when viewed along direction 18 .
- FIG. 3 An enlarged view of the write and return poles is shown in FIG. 3 .
- the main pole 13 is about 0.1 to 0.4 microns thick at the ABS 19 .
- the main pole is made of a high moment material, such as CoFe having a saturation magnetization, Bs, of about 2.4 T, but, in practice, this main pole does not saturate, except at the pole tip region.
- Bs saturation magnetization
- the maximum write field in the media is mainly determined by the saturation level of the pole tip and the solid angle opened by the ABS of the pole tip.
- the present invention discloses a novel structure for a perpendicular write head that overcomes these problems.
- Another object of at least one embodiment of the present invention has been to provide a process for manufacturing said vertical writer.
- a further object of at least one embodiment of the present invention has been that said process introduce little or no changes to current processes for manufacturing vertical writers.
- a vertical main pole whose thickness has its conventional value a short distance from the tip but that tapers down to a significantly reduced value as it approaches the tip.
- the distance over which this tapering takes place is about 0.1 to 4 microns.
- a trench is etched, using ion milling, partly into the yoke region and partly into the insulated coil well. Said trench has sides whose slope is carefully controlled through adjustment of the angle of incidence of the ion beam, this slope determining the afore-mentioned taper.
- a second high moment layer is deposited to complete formation of the pole tip. After an appropriate lapping step to define the ABS, the process is complete.
- FIG. 1 shows a single vertical pole magnetic writer of the prior art.
- FIG. 2 is a head-on view of the structure of FIG. 1 .
- FIG. 3 is a closer view of the pole tip portion of a vertical writer
- FIG. 4 shows the starting point for the process of the present invention.
- FIGS. 5 and 6 illustrate formation and filling of a trench with a high moment material.
- FIG. 7 shows deposition of a second layer of high moment material over the afore-mentioned first layer.
- FIG. 8 shows the final structure
- FIG. 9 compares the magnitude and spatial distribution of the head field in a device made according to the present invention with two prior art devices.
- FIG. 10 is a cross-section of the write head, including an ABS level shield.
- FIG. 11 is an ABS view of FIG. 10 for a single trailing edge shield.
- FIG. 12 is said ABS view for a shield that surrounds the main pole on three sides.
- FIG. 13 is an example of a tapered main pole at a trailing edge combined with a trailing shield
- FIGS. 14-20 illustrate the process for making the structure shown in FIG. 13 .
- the process of the present invention begins with the formation of return pole layer 15 on a substrate (not shown).
- Layer 15 is any of Ni, Fe, or Co, or their alloys and it is deposited to a thickness between about 0.5 and 5 microns.
- This is followed by the formation of magnetic yoke 14 that includes a well within which is coil 12 embedded in layer of insulation 17 .
- Yoke 14 is a material such as Ni, Fe, Co, or their alloys.
- trench 51 is formed as shown in FIG. 5 .
- Ion beam milling is most commonly used to form said trench whose depth is typically between about 0.1 and 2 microns, this depth being controlled through adjustment of the ion beam's dose and duration.
- Walls 52 of trench 51 have sloping sides as shown in the figure. The sides of the trench slope at an angle between about 15 and 65 degrees from vertical, slope angle being controlled through adjustment of the ion beam's angle of incidence.
- Trench 52 is then overfilled with layer 61 of a material capable of a magnetic moment of at least 1.8 T and is then planarized until insulation layer 17 is just exposed, as illustrated in FIG. 6 .
- Layer 61 should have high B s and is any of Ni, Fe, or Co, or their alloys.
- layer 71 of a material capable of a magnetic moment of at least 2 T is deposited.
- Layer 71 is any of Ni, Fe, or Co, or their alloys. This essentially completes formation of the magnetic write head which, as can be seen, now includes a tapered single vertical pole. All that remains to be done is to form air bearing surface 19 through planarizing in a plane normal to the upper surface of layer 71 .
- the final structure is seen in FIG. 8 .
- FIG. 9 compares calculated plots of the head field (in Tesla) as a function its downtrack position (in microns) for three cases:
- a main pole designed according to the teachings of the present invention (curve 93 ) achieves a head field even larger than that of the thicker, but conventional, pole with less erasure problems for the same head skew angle because of smaller pole thickness at the ABS.
- the concept of a tapered main pole is not limited to only single pole perpendicular writers, but is also applicable to a shielded pole type perpendicular write head, a cross-section of which is shown in FIG. 10 with the shield being designated as element 25 .
- Shield designs may vary. For example, in FIG. 11 we show an ABS view of shield 26 which is located on only one side (the trailing edge), while in FIG. 12 we show shield 27 that surrounds the main pole on three sides (trailing edge and two sides in the cross-track).
- a tapered main pole at a trailing edge is disclosed here, as shown in FIG. 13 .
- the trailing shield is tapered to the same angle as the main pole, thereby maintaining a constant horizontal distance 131 therefrom.
- FIG. 14 shows the starting point for manufacturing the writer once the reader structure has been completed.
- isolation 41 layer (usually Al 2 O 3 , between about 1 and 3 um thick) is deposited on the top reader shield 42 , followed by layer 43 of high Bs materials (Co, Fe and their alloys, Bs ⁇ 2.4T, thickness about 0.2 to 2 um), which will eventually form the main pole.
- Bs materials Co, Fe and their alloys, Bs ⁇ 2.4T, thickness about 0.2 to 2 um
- non-magnetic layer 141 (usually Al 2 O 3 , 0.03 to 0.2 um thick) is deposited to serve as the gap between the trailing shield and main pole.
- trailing shield 135 (alloys of Co, Fe, Ni, Bs around 1.0-2.0T) is deposited on top of gap layer 141 .
- coils 12 are made. Then the whole structure is filled with Al 2 O 3 and polished to expose the top surface of the trailing shield.
Abstract
Prior art designs of single pole writers have been limited by premature saturation at the tip. This limits the head field that can be achieved without simultaneously widening the write profile. This problem has bee solved by means of a vertical main pole whose thickness has its conventional value a short distance from the tip but that tapers down to a significantly reduced value as it approaches the tip. A process for manufacturing this tapered tip design is also presented.
Description
- The invention relates to the general field of magnetic disk systems with particular reference to perpendicular write poles and controlling flux therefrom.
- One of the key advantages of single-pole (SP) head/media, with a magnetically soft underlayer (SUL) and perpendicular recording system, is the capability of providing a larger write field (than that of a ring head) to enable writing into the relatively thick media with high anisotropy constant. The latter quality leads one to assume better thermal stability associated with perpendicular recording. However, this advantage is diminished as the dimension of the pole tip is reduced to increase the areal recording density [1]. So, the tradeoff between head writing field and thermal stability may still limit the achievable areal density for perpendicular recording.
-
FIG. 1 is a schematic representation of a typical single pole vertical recording system of the prior art. Seen there issingle write pole 13 whose ABS (air bearing surface) moves parallel, and close to, the surface ofrecording medium 16. The latter comprises an upper, high coercivity, layer (not shown) on a magnetically soft underlayer.Coils 12 generate magnetic flux inyoke 14 which passes throughmain pole 14 intotip 13 and then into media 16 (where a bit is written). The magnetic circuit is completed by flux that passes through the soft under layer and then back intoreturn pole 15. The space enclosed by the yoke and poles is normally filled withinsulating material 17. -
FIG. 2 is a front view of the structure shown inFIG. 1 when viewed alongdirection 18. - An enlarged view of the write and return poles is shown in
FIG. 3 . In this prior art design, themain pole 13 is about 0.1 to 0.4 microns thick at theABS 19. The main pole is made of a high moment material, such as CoFe having a saturation magnetization, Bs, of about 2.4 T, but, in practice, this main pole does not saturate, except at the pole tip region. Thus the maximum write field in the media is mainly determined by the saturation level of the pole tip and the solid angle opened by the ABS of the pole tip. - To increase the write field, large W and t and small NH are preferred (as defined in
FIGS. 1 and 2 ). However, for ultra-high density recording, track width W is limited by the track density requirement. To have good control of track width W, NH cannot be reduced to the extent desired due to the rounding effect of the photo mask used to pattern it. A small neck height also increases the side-fringing field and causes adjacent track erasure (ATE) [2]. - A large pole width t will result in head skew problems [3]. Thus better methods for compensating field loss at ultra-high recording densities are essential. The present invention discloses a novel structure for a perpendicular write head that overcomes these problems.
-
- (1) Z. Bai, and J.-G. Zhu, “Micromagnetics of Perpendicular Write Heads with Small Pole-Tip Dimensions”, J. Appl. Phys, vol. 91, 6833 (2001).
- (2) J. Schare, L. Guan, J. G. Zhu, and M. Kryder, “Design Considerations for Single-Pole Type Write Heads”, IEEE Tran. Magn., May, 2003
- (3) R. Wood, T. Sonobe, Z. Jin, and B. Wilson, “Perpendicular recording: the promise and the problems”, J. Magn. Magn. Mater., vol 235, 1 (2001)
- A routine search of the prior art was performed with the following references of interest being found:
-
- U.S. Pat. No. 5,600,519 (Heim et al) discloses a tapered main pole as does U.S. Pat. No. 5,173,821 (Maloney).
- It has been an object of at least one embodiment of the present invention to provide a single pole vertical write head having both a large head field as well as good spatial resolution.
- Another object of at least one embodiment of the present invention has been to provide a process for manufacturing said vertical writer.
- A further object of at least one embodiment of the present invention has been that said process introduce little or no changes to current processes for manufacturing vertical writers.
- These objects have been achieved by means of a vertical main pole whose thickness has its conventional value a short distance from the tip but that tapers down to a significantly reduced value as it approaches the tip. Typically, the distance over which this tapering takes place is about 0.1 to 4 microns. In order to manufacture this structure, a trench is etched, using ion milling, partly into the yoke region and partly into the insulated coil well. Said trench has sides whose slope is carefully controlled through adjustment of the angle of incidence of the ion beam, this slope determining the afore-mentioned taper. After the trench has been just filled with a high moment layer, a second high moment layer is deposited to complete formation of the pole tip. After an appropriate lapping step to define the ABS, the process is complete.
-
FIG. 1 shows a single vertical pole magnetic writer of the prior art. -
FIG. 2 is a head-on view of the structure ofFIG. 1 . -
FIG. 3 is a closer view of the pole tip portion of a vertical writerFIG. 4 shows the starting point for the process of the present invention. -
FIGS. 5 and 6 illustrate formation and filling of a trench with a high moment material. -
FIG. 7 shows deposition of a second layer of high moment material over the afore-mentioned first layer. -
FIG. 8 shows the final structure. -
FIG. 9 compares the magnitude and spatial distribution of the head field in a device made according to the present invention with two prior art devices. -
FIG. 10 is a cross-section of the write head, including an ABS level shield. -
FIG. 11 is an ABS view ofFIG. 10 for a single trailing edge shield. -
FIG. 12 is said ABS view for a shield that surrounds the main pole on three sides. -
FIG. 13 is an example of a tapered main pole at a trailing edge combined with a trailing shieldFIGS. 14-20 illustrate the process for making the structure shown inFIG. 13 . - We will disclose the present invention through a description of a process for its manufacture. This description will also serve to make clear the structure of the present invention.
- Referring now to
FIG. 4 , the process of the present invention begins with the formation ofreturn pole layer 15 on a substrate (not shown).Layer 15 is any of Ni, Fe, or Co, or their alloys and it is deposited to a thickness between about 0.5 and 5 microns. This is followed by the formation ofmagnetic yoke 14 that includes a well within which iscoil 12 embedded in layer ofinsulation 17.Yoke 14 is a material such as Ni, Fe, Co, or their alloys. - Now follows a key novel feature, namely the formation of
trench 51, as shown inFIG. 5 . Ion beam milling is most commonly used to form said trench whose depth is typically between about 0.1 and 2 microns, this depth being controlled through adjustment of the ion beam's dose and duration.Walls 52 oftrench 51 have sloping sides as shown in the figure. The sides of the trench slope at an angle between about 15 and 65 degrees from vertical, slope angle being controlled through adjustment of the ion beam's angle of incidence. -
Trench 52 is then overfilled withlayer 61 of a material capable of a magnetic moment of at least 1.8 T and is then planarized untilinsulation layer 17 is just exposed, as illustrated inFIG. 6 .Layer 61 should have high Bs and is any of Ni, Fe, or Co, or their alloys. - Next, as seen in
FIG. 7 ,layer 71 of a material capable of a magnetic moment of at least 2 T, is deposited.Layer 71 is any of Ni, Fe, or Co, or their alloys. This essentially completes formation of the magnetic write head which, as can be seen, now includes a tapered single vertical pole. All that remains to be done is to formair bearing surface 19 through planarizing in a plane normal to the upper surface oflayer 71. The final structure is seen inFIG. 8 . -
FIG. 9 compares calculated plots of the head field (in Tesla) as a function its downtrack position (in microns) for three cases: Curve 91 is a conventional straight pole design having t=0.2 microns.Curve 92 is a straight main pole having t=0.4 microns, while curve 93 is for a tapered main pole (present invention) (t1=t2=0.2 microns, and NH=0). These data make it clear that the head field can be increased by providing a thicker main pole (curve 92) but this comes with an accompanying problem that the head field could erase data on adjacent tracks when the head is skewed. On the other hand, a main pole designed according to the teachings of the present invention (curve 93) achieves a head field even larger than that of the thicker, but conventional, pole with less erasure problems for the same head skew angle because of smaller pole thickness at the ABS. - The concept of a tapered main pole is not limited to only single pole perpendicular writers, but is also applicable to a shielded pole type perpendicular write head, a cross-section of which is shown in
FIG. 10 with the shield being designated aselement 25. Shield designs may vary. For example, inFIG. 11 we show an ABS view ofshield 26 which is located on only one side (the trailing edge), while inFIG. 12 we showshield 27 that surrounds the main pole on three sides (trailing edge and two sides in the cross-track). - In addition to the previously described tapered main pole structure at a leading edge, a tapered main pole at a trailing edge, combined with trailing
shield 135, is disclosed here, as shown inFIG. 13 . Note that the trailing shield is tapered to the same angle as the main pole, thereby maintaining a constanthorizontal distance 131 therefrom. - The major process steps to make this trailing-edge-tapered main pole with trailing shield are illustrated in
FIGS. 14-20 .FIG. 14 shows the starting point for manufacturing the writer once the reader structure has been completed. First,isolation 41 layer (usually Al2O3, between about 1 and 3 um thick) is deposited on thetop reader shield 42, followed bylayer 43 of high Bs materials (Co, Fe and their alloys, Bs ˜2.4T, thickness about 0.2 to 2 um), which will eventually form the main pole. InFIG. 15 , an etching process similar to that shown inFIG. 5 , is applied to formtrench 151, whose slope angle defines the taper angle of the main pole. Subsequently, the process to define main pole track width is applied so the front geometry of the main pole (as inFIG. 2 ) is formed. InFIG. 16 non-magnetic layer 141 (usually Al2O3, 0.03 to 0.2 um thick) is deposited to serve as the gap between the trailing shield and main pole. InFIG. 17 , trailing shield 135 (alloys of Co, Fe, Ni, Bs around 1.0-2.0T) is deposited on top ofgap layer 141. InFIG. 18 , coils 12 are made. Then the whole structure is filled with Al2O3 and polished to expose the top surface of the trailing shield. InFIG. 19 , the return pole (alloys of Co, Fe, Ni, Bs around 1.0-2.0T, thickness=0.5-5.0 um) is deposited and connected with the trailing shield. Finally, inFIG. 20 , lapping is applied to define the ABS of the head.
Claims (33)
1. A method to increase a head field from a single vertical pole, having an air bearing surface, comprising:
tapering said pole whereby, over a distance of between about 0.1 and 4 microns, its thickness is reduced from between about 0.2 and 2 microns to a lesser thickness of between about 0.1 and 0.4 microns; and
whereby said lesser thickness extends from said air bearing surface for a distance of no more than about 0.2 and 0.4 microns.
2. The method of claim 1 wherein said increased head field is between about 0.1 and 0.3 T.
3. The method of claim 1 wherein said tapered pole is selected from the group consisting of Ni, Fe, Co, and their alloys.
4. The method of claim 1 wherein, at its tip, said tapered pole has a moment of at least 1.8 T.
5. A process to manufacture a magnetic write head, having a tapered single vertical pole, comprising:
on a substrate, depositing a return pole layer;
forming, on said return pole layer, a magnetic yoke that includes a well within which is a coil embedded in a layer of insulation that shares a common first upper surface with said yoke;
forming a trench, having sloping sides and a depth, that extends downwards from said first upper surface;
overfilling said trench with a first layer of a material that has a moment of at least 1.8 T and then planarizing until said first upper surface is just exposed, thereby forming a second upper surface;
then depositing a layer of a second material having a moment of at least 2 T, thereby forming said magnetic write head, including said tapered single vertical pole; and
forming an air bearing surface by planarizing in a plane normal to said upper surfaces.
6. The process described in claim 5 wherein said return pole is deposited to a thickness between about 0.5 and 5 microns.
7. The process described in claim 5 wherein said return pole is a material selected from the group consisting of Ni, Fe, Co, and their alloys.
8. The process described in claim 5 wherein said coil well is formed to a depth of between about 0.5 and 4 microns.
9. The process described in claim 5 wherein said insulating layer is aluminum oxide.
10. The process described in claim 5 wherein ion beam milling is used to form said trench.
11. The process described in claim 5 wherein the depth of said trench is between about 0.2 and 3 microns.
12. The process described in claim 11 wherein said trench depth is controlled through adjustment of said ion beam's dose and duration.
13. The process described in claim 5 wherein the sides of the trench slope at an angle between about 15 and 65 degrees from vertical.
14. The process described in claim 13 wherein said slope angle is controlled through adjustment of said ion beam's angle of incidence.
15. The process described in claim 5 wherein said yoke is a material selected from the group consisting of Ni, Fe, Co, and their alloys.
16. The process described in claim 5 wherein said first layer of a material that has a moment of at least 1.8 T is a material selected from the group consisting of Ni, Fe, Co, and their alloys.
17. The process described in claim 5 wherein said second layer of a material that has a moment of at least 2 T is a material selected from the group consisting of Ni, Fe, Co, and their alloys.
18. The process described in claim 5 wherein said return pole layer is located behind a trailing edge of said vertical pole.
19. The process described in claim 5 wherein said return pole layer is located in front of a leading edge of said vertical pole.
20. A magnetic write head, having a tapered single vertical pole, comprising:
a return pole layer on a substrate;
on said return pole layer, a magnetic yoke that includes a well within which is a coil embedded in a layer of insulation that shares a common first upper surface with said yoke;
a trench, having sloping sides and a depth, that extends downwards from said first upper surface;
said trench being exactly filled with a first layer of a material capable of a magnetic moment of at least 1.8 T and a second upper surface;
on said second upper surface, a layer of a second material having a capable of a magnetic moment of at least 2 T; and
an air bearing surface in a plane normal to said upper surfaces.
21. The magnetic write head described in claim 20 wherein said return pole is deposited to a thickness between about 0.5 and 5 microns.
22. The magnetic write head described in claim 20 wherein said return pole is a material selected from the group consisting of Ni, Fe, Co, and their alloys.
23. The magnetic write head described in claim 20 wherein said coil well has a depth of between about 0.5 and 4 microns.
24. The magnetic write head described in claim 20 wherein said insulating layer is aluminum oxide.
25. The magnetic write head described in claim 20 wherein the depth of said trench is between about 0.2 and 3 microns.
26. The magnetic write head described in claim 20 wherein the sides of the trench slope at an angle between about 15 and 65 degrees from vertical.
27. The magnetic write head described in claim 20 wherein said yoke is a material selected from the group consisting of Ni, Fe, Co, and their alloys.
28. The magnetic write head described in claim 20 wherein said first layer of a material that is capable of a magnetic moment of at least 1.8 T is a material selected from the group consisting of Ni, Fe, Co, and their alloys.
29. The magnetic write head described in claim 20 wherein said second layer of a material that is capable of a magnetic moment of at least 2 T is a material selected from the group consisting of Ni, Fe, Co, and their alloys.
30. A magnetic write head, having an ABS, a main pole, and a trailing edge, comprising:
said trailing edge being tapered at an angle of 15 to 60 degrees from vertical;
wherein said taper of the trailing edge begins at a distance of less than about 0.3 microns from said ABS;
wherein said taper of the trailing edge is present over a distance of up to about 2 microns from said ABS;
behind said main pole, a trailing shield having a thickness between about 0.05 and 0.5 microns;
wherein there is a constant horizontal separation between said main pole and said trailing shield; and
wherein said shield is tapered at an angle equal to said main pole taper angle.
31. The magnetic write head described in claim 30 wherein said constant separation between said main pole and said trailing shield is between about 0.02 and 0.2 microns.
32. The magnetic write head described in claim 30 further comprising one or more side shields around said main pole.
33. The magnetic write head described in claim 30 further comprising:
a return pole;
on said return pole, a magnetic yoke that includes a well within which is a coil embedded in a layer of insulation having a first upper surface;
a trench, having a floor and a sloping sidewall, formed from said first upper surface;
a first layer of a material, capable of a magnetic moment of at least 1.8 T, that more than fills said trench and that has a second upper surface; and
on said second upper surface, a layer of a second material capable of a magnetic moment of at least 2 T.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/818,577 US20050219743A1 (en) | 2004-04-06 | 2004-04-06 | Perpendicular write head with tapered main pole |
JP2005110396A JP2005302281A (en) | 2004-04-06 | 2005-04-06 | Method for increasing head magnetic field, magnetic recording head, and method for manufacturing thereof |
US12/384,691 US7777987B2 (en) | 2004-04-06 | 2009-04-08 | Perpendicular write head with tapered main pole |
US12/384,742 US7777988B2 (en) | 2004-04-06 | 2009-04-08 | Perpendicular write head with tapered main pole |
US12/384,761 US7934310B2 (en) | 2004-04-06 | 2009-04-08 | Process to manufacture a magnetic write head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/818,577 US20050219743A1 (en) | 2004-04-06 | 2004-04-06 | Perpendicular write head with tapered main pole |
Related Child Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/384,761 Division US7934310B2 (en) | 2004-04-06 | 2009-04-08 | Process to manufacture a magnetic write head |
US12/384,691 Division US7777987B2 (en) | 2004-04-06 | 2009-04-08 | Perpendicular write head with tapered main pole |
US12/384,742 Division US7777988B2 (en) | 2004-04-06 | 2009-04-08 | Perpendicular write head with tapered main pole |
Publications (1)
Publication Number | Publication Date |
---|---|
US20050219743A1 true US20050219743A1 (en) | 2005-10-06 |
Family
ID=35054009
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/818,577 Abandoned US20050219743A1 (en) | 2004-04-06 | 2004-04-06 | Perpendicular write head with tapered main pole |
US12/384,761 Expired - Lifetime US7934310B2 (en) | 2004-04-06 | 2009-04-08 | Process to manufacture a magnetic write head |
US12/384,742 Expired - Lifetime US7777988B2 (en) | 2004-04-06 | 2009-04-08 | Perpendicular write head with tapered main pole |
US12/384,691 Expired - Lifetime US7777987B2 (en) | 2004-04-06 | 2009-04-08 | Perpendicular write head with tapered main pole |
Family Applications After (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/384,761 Expired - Lifetime US7934310B2 (en) | 2004-04-06 | 2009-04-08 | Process to manufacture a magnetic write head |
US12/384,742 Expired - Lifetime US7777988B2 (en) | 2004-04-06 | 2009-04-08 | Perpendicular write head with tapered main pole |
US12/384,691 Expired - Lifetime US7777987B2 (en) | 2004-04-06 | 2009-04-08 | Perpendicular write head with tapered main pole |
Country Status (2)
Country | Link |
---|---|
US (4) | US20050219743A1 (en) |
JP (1) | JP2005302281A (en) |
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US20090268344A1 (en) * | 2008-04-29 | 2009-10-29 | Headway Technologies, Inc. | Graded bevel tapered write pole design for field enhancement |
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US7924528B2 (en) | 2007-09-05 | 2011-04-12 | Headway Technologies, Inc. | Magnetic head for perpendicular magnetic recording and method of manufacturing same |
US20110097601A1 (en) * | 2009-10-26 | 2011-04-28 | Headway Technologies, Inc. | Wrap-around shielded writer with highly homogeneous shield material |
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US20110132869A1 (en) * | 2009-12-09 | 2011-06-09 | Liubo Hong | Magnetic write head manufactured by damascene process producing a tapered write pole with a non-magnetic step and non-magnetic bump |
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Citations (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5173821A (en) * | 1991-03-18 | 1992-12-22 | Unisys Corporation | Adaptive-gap magnetic recording and reading head |
US5600519A (en) * | 1995-03-06 | 1997-02-04 | International Business Machines Corporation | Controlled saturation thin film magnetic write head |
US5995343A (en) * | 1997-02-14 | 1999-11-30 | Fujitsu Limited | Magnetic headwith specified tapered pole tip width ratio |
US6330127B1 (en) * | 1998-07-30 | 2001-12-11 | Tdk Corporation | Thin film magnetic head and method of manufacturing same |
US6381093B2 (en) * | 1997-10-01 | 2002-04-30 | Tdk Corporation | Thin film magnetic head with magnetic films with increasing widths from a surface facing a recording medium |
US6525904B1 (en) * | 1999-06-25 | 2003-02-25 | Tdk Corporation | Thin film magnetic head with precisely controlled pole width and method of manufacturing same |
US6665144B2 (en) * | 2001-02-13 | 2003-12-16 | Sae Magnetics (H.K.) Ltd. | Thin film magnetic head and method of making wherein the head includes a magnetic layer including an underlayer and a coating layer with each having a uniform width portion and a wider portion |
US6693768B1 (en) * | 2000-03-15 | 2004-02-17 | Seagate Technology Llc | Perpendicular magnetic recording head having a flux focusing main pole |
US20040047079A1 (en) * | 2002-09-09 | 2004-03-11 | Hitachi, Ltd. | Magnetic head for perpendicular recording |
US6710973B2 (en) * | 2000-09-18 | 2004-03-23 | Hitachi, Ltd. | Single pole type recording head including tapered edges |
US20040150912A1 (en) * | 2003-01-22 | 2004-08-05 | Yoshiaki Kawato | Thin film perpendicular magnetic recording head, their fabrication process and magnetic disk drive using it |
US20040233578A1 (en) * | 2003-05-23 | 2004-11-25 | Kaizhong Gao | Tapered single pole magnetic heads for perpendicular magnetic recording |
US6995949B2 (en) * | 2002-02-14 | 2006-02-07 | Hitachi, Ltd. | Magnetic heads for perpendicular recording and magnetic recording disk apparatus using the same |
US7012784B2 (en) * | 1999-07-08 | 2006-03-14 | Tdk Corporation | Thin-film magnetic head and method of manufacturing same |
US7054106B2 (en) * | 2002-08-26 | 2006-05-30 | Hitachi Global Storage Technologies Japan, Ltd. | Magnetic head and magnetic storage apparatus |
US7061717B2 (en) * | 2003-05-22 | 2006-06-13 | Headway Technologies, Inc. | Yoke structure with constricted width |
US7093348B2 (en) * | 1999-11-12 | 2006-08-22 | Tdk Corporation | Method of manufacturing a thin film magnetic head |
US7100266B2 (en) * | 2001-05-16 | 2006-09-05 | Seagate Technology Llc | Method of forming a beveled writing pole of a perpendicular writing element |
US7100267B2 (en) * | 2000-03-30 | 2006-09-05 | Kabushiki Kaisha Toshiba | Magnetic head, method for producing same, and magnetic recording and/or reproducing system |
US7113366B1 (en) * | 2002-11-07 | 2006-09-26 | Western Digital (Fremont), Inc. | Double-nosed inductive transducer with reduced off-track writing |
US7159302B2 (en) * | 2004-03-31 | 2007-01-09 | Hitachi Global Storage Technologies Netherlands B.V. | Method for manufacturing a perpendicular write head |
US7185415B2 (en) * | 2003-08-29 | 2007-03-06 | Hitachi Global Storage Technologies Netherlands B.V. | Method for forming a magnetic head having a flux shaping layer |
US7196871B2 (en) * | 2003-09-26 | 2007-03-27 | Hitachi Global Storage Technologies Netherlands B.V. | Head for perpendicular recording with a floating trailing shield |
US7212379B2 (en) * | 2004-03-31 | 2007-05-01 | Hitachi Global Storage Technologies Netherlands B.V. | Perpendicular magnetic recording head with flare and taper configurations |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62200517A (en) * | 1986-02-27 | 1987-09-04 | Alps Electric Co Ltd | Vertical magnetic recording magnetic head and its manufacture |
US6963141B2 (en) * | 1999-12-31 | 2005-11-08 | Jung-Yu Lee | Semiconductor package for efficient heat spreading |
US6501619B1 (en) * | 2000-04-27 | 2002-12-31 | Shipley Company, L.L.C. | Inductive magnetic recording head having inclined magnetic read/write pole and method of making same |
JP2002092820A (en) | 2000-09-20 | 2002-03-29 | Toshiba Corp | Perpendicular recording magnetic head and magnetic disk device |
JP3629431B2 (en) | 2001-01-15 | 2005-03-16 | アルプス電気株式会社 | Method for manufacturing soft magnetic film and method for manufacturing thin film magnetic head |
JP4004017B2 (en) | 2001-06-18 | 2007-11-07 | Tdk株式会社 | Manufacturing method of thin film magnetic head |
JP2003016608A (en) | 2001-06-28 | 2003-01-17 | Tdk Corp | Thin film magnetic head and its manufacturing method |
WO2003060883A1 (en) * | 2002-01-08 | 2003-07-24 | Seagate Technology Llc | Low saturation induction material for magnetic recording head write pole |
JP2004127480A (en) | 2002-08-02 | 2004-04-22 | Furumura Ichiro | Recording head for high density perpendicular magnetic recording |
US7324304B1 (en) * | 2003-11-20 | 2008-01-29 | Maxtor Corporation | Tapered write pole for reduced skew effect |
US7233457B2 (en) * | 2003-12-16 | 2007-06-19 | Seagate Technology Llc | Head for perpendicular recording with reduced erasure |
US7420809B2 (en) * | 2004-06-22 | 2008-09-02 | Lsi Corporation | Heat spreader in integrated circuit package |
JP2006139831A (en) * | 2004-11-10 | 2006-06-01 | Alps Electric Co Ltd | Perpendicular magnetic recording head and its manufacturing method |
-
2004
- 2004-04-06 US US10/818,577 patent/US20050219743A1/en not_active Abandoned
-
2005
- 2005-04-06 JP JP2005110396A patent/JP2005302281A/en active Pending
-
2009
- 2009-04-08 US US12/384,761 patent/US7934310B2/en not_active Expired - Lifetime
- 2009-04-08 US US12/384,742 patent/US7777988B2/en not_active Expired - Lifetime
- 2009-04-08 US US12/384,691 patent/US7777987B2/en not_active Expired - Lifetime
Patent Citations (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5173821A (en) * | 1991-03-18 | 1992-12-22 | Unisys Corporation | Adaptive-gap magnetic recording and reading head |
US5600519A (en) * | 1995-03-06 | 1997-02-04 | International Business Machines Corporation | Controlled saturation thin film magnetic write head |
US5995343A (en) * | 1997-02-14 | 1999-11-30 | Fujitsu Limited | Magnetic headwith specified tapered pole tip width ratio |
US6381093B2 (en) * | 1997-10-01 | 2002-04-30 | Tdk Corporation | Thin film magnetic head with magnetic films with increasing widths from a surface facing a recording medium |
US6330127B1 (en) * | 1998-07-30 | 2001-12-11 | Tdk Corporation | Thin film magnetic head and method of manufacturing same |
US6441995B1 (en) * | 1998-07-30 | 2002-08-27 | Tdk Corporation | Thin film magnetic head and method of manufacturing same |
US6525904B1 (en) * | 1999-06-25 | 2003-02-25 | Tdk Corporation | Thin film magnetic head with precisely controlled pole width and method of manufacturing same |
US7012784B2 (en) * | 1999-07-08 | 2006-03-14 | Tdk Corporation | Thin-film magnetic head and method of manufacturing same |
US7093348B2 (en) * | 1999-11-12 | 2006-08-22 | Tdk Corporation | Method of manufacturing a thin film magnetic head |
US6693768B1 (en) * | 2000-03-15 | 2004-02-17 | Seagate Technology Llc | Perpendicular magnetic recording head having a flux focusing main pole |
US7100267B2 (en) * | 2000-03-30 | 2006-09-05 | Kabushiki Kaisha Toshiba | Magnetic head, method for producing same, and magnetic recording and/or reproducing system |
US7006326B2 (en) * | 2000-09-18 | 2006-02-28 | Hitachi, Ltd. | Single pole type recording head with tapered edges |
US6710973B2 (en) * | 2000-09-18 | 2004-03-23 | Hitachi, Ltd. | Single pole type recording head including tapered edges |
US7133252B2 (en) * | 2000-09-18 | 2006-11-07 | Hitachi Global Storage Technologies Japan, Ltd. | Single pole type recording head with trailing side tapered edges |
US6665144B2 (en) * | 2001-02-13 | 2003-12-16 | Sae Magnetics (H.K.) Ltd. | Thin film magnetic head and method of making wherein the head includes a magnetic layer including an underlayer and a coating layer with each having a uniform width portion and a wider portion |
US20060256471A1 (en) * | 2001-05-16 | 2006-11-16 | Seagate Technology Llc | Magnetic writing pole and a perpendicular writing element |
US7100266B2 (en) * | 2001-05-16 | 2006-09-05 | Seagate Technology Llc | Method of forming a beveled writing pole of a perpendicular writing element |
US6995949B2 (en) * | 2002-02-14 | 2006-02-07 | Hitachi, Ltd. | Magnetic heads for perpendicular recording and magnetic recording disk apparatus using the same |
US7054106B2 (en) * | 2002-08-26 | 2006-05-30 | Hitachi Global Storage Technologies Japan, Ltd. | Magnetic head and magnetic storage apparatus |
US7038881B2 (en) * | 2002-09-09 | 2006-05-02 | Hitachi, Ltd. | Magnetic head for perpendicular recording including a main pole having a pole tip with three tapered sides |
US20040047079A1 (en) * | 2002-09-09 | 2004-03-11 | Hitachi, Ltd. | Magnetic head for perpendicular recording |
US7113366B1 (en) * | 2002-11-07 | 2006-09-26 | Western Digital (Fremont), Inc. | Double-nosed inductive transducer with reduced off-track writing |
US20040150912A1 (en) * | 2003-01-22 | 2004-08-05 | Yoshiaki Kawato | Thin film perpendicular magnetic recording head, their fabrication process and magnetic disk drive using it |
US7061717B2 (en) * | 2003-05-22 | 2006-06-13 | Headway Technologies, Inc. | Yoke structure with constricted width |
US20040233578A1 (en) * | 2003-05-23 | 2004-11-25 | Kaizhong Gao | Tapered single pole magnetic heads for perpendicular magnetic recording |
US7185415B2 (en) * | 2003-08-29 | 2007-03-06 | Hitachi Global Storage Technologies Netherlands B.V. | Method for forming a magnetic head having a flux shaping layer |
US7196871B2 (en) * | 2003-09-26 | 2007-03-27 | Hitachi Global Storage Technologies Netherlands B.V. | Head for perpendicular recording with a floating trailing shield |
US7159302B2 (en) * | 2004-03-31 | 2007-01-09 | Hitachi Global Storage Technologies Netherlands B.V. | Method for manufacturing a perpendicular write head |
US7212379B2 (en) * | 2004-03-31 | 2007-05-01 | Hitachi Global Storage Technologies Netherlands B.V. | Perpendicular magnetic recording head with flare and taper configurations |
Cited By (63)
Publication number | Priority date | Publication date | Assignee | Title |
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US20070247747A1 (en) * | 2003-11-20 | 2007-10-25 | Maxtor Corporation | Tapered write pole for reduced skew effect |
US7430095B2 (en) * | 2003-11-20 | 2008-09-30 | Maxtor Corporation | Tapered write pole for reduced skew effect |
US7715152B2 (en) * | 2003-12-24 | 2010-05-11 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic recording head for perpendicular recording, fabrication process, and magnetic disk storage apparatus mounting the magnetic head |
US20050141137A1 (en) * | 2003-12-24 | 2005-06-30 | Hitachi Global Storage Technologies Netherlands, B.V. | Magnetic recording head for perpendicular recording, fabrication process, and magnetic disk storage apparatus mounting the magnetic head |
US20060018699A1 (en) * | 2004-07-22 | 2006-01-26 | Rak Roman P | Keyboard apparatus |
US7978430B2 (en) * | 2004-07-30 | 2011-07-12 | Hitachi Global Storage Technologies Netherlands B.V. | Apparatus for providing a reverse air bearing surface head with trailing shield design for perpendicular recording |
US20080002292A1 (en) * | 2004-07-30 | 2008-01-03 | Hitachi Global Storage Technologies Netherlands B.V. | Method And Apparatus For Providing A Reverse Air Bearing Surface Head With Trailing Shield Design For Perpendicular Recording |
US8042259B2 (en) | 2005-01-11 | 2011-10-25 | Samsung Electronics Co., Ltd. | Method of manufacturing a magnetic recording head |
US7903372B2 (en) * | 2005-01-11 | 2011-03-08 | Samsung Electronics Co., Ltd. | Magnetic recording head and method of manufacturing the same |
US20100147792A1 (en) * | 2005-01-11 | 2010-06-17 | Samsung Electronics Co., Ltd. | Magnetic recording head and method of manufacturing the same |
US20060158780A1 (en) * | 2005-01-11 | 2006-07-20 | Samsung Electronics Co., Ltd. | Magnetic recording head and method of manufacturing the same |
US7639452B2 (en) * | 2005-03-07 | 2009-12-29 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic head for perpendicular recording and fabrication process |
US20060198050A1 (en) * | 2005-03-07 | 2006-09-07 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic head for perpendicular recording and fabrication process |
US20060203384A1 (en) * | 2005-03-09 | 2006-09-14 | Hitachi Global Storage Technologies Netherlands B. V. | Perpendicular magnetic recording head for high frequency drive |
US7646564B2 (en) * | 2005-03-09 | 2010-01-12 | Hitachi Global Storage Technologies Netherlands B.V. | Perpendicular magnetic recording head for high frequency drive |
US20080316653A1 (en) * | 2007-06-21 | 2008-12-25 | Headway Technologies, Inc. | Magnetic head for perpendicular magnetic recording and method of manufacturing same |
US7916425B2 (en) * | 2007-06-21 | 2011-03-29 | Headway Technologies, Inc. | Magnetic head having angled pole portions |
US20090059438A1 (en) * | 2007-08-31 | 2009-03-05 | Tdk Corporation | Thin-film magnetic head with perpendicular magnetic recording structure, magnetic head assembly with the thin-film magnetic head, magnetic disk drive apparatus with the magnetic head assembly, and manufacturing method of thin-film magnetic head with perpendicular magnetic recording structure |
US8102623B2 (en) * | 2007-08-31 | 2012-01-24 | Tdk Corporation | Thin-film magnetic head with a magnetic pole having an inclined step at its top end section surface, magnetic head assembly with the thin-film magnetic head, magnetic disk drive apparatus with the magnetic head assembly, and manufacturing method of thin-film magnetic head |
US7924528B2 (en) | 2007-09-05 | 2011-04-12 | Headway Technologies, Inc. | Magnetic head for perpendicular magnetic recording and method of manufacturing same |
US20090067098A1 (en) * | 2007-09-12 | 2009-03-12 | Samsung Electronics Co., Ltd. | Perpendicular magnetic recording head and method of manufacturing the same |
US20090103211A1 (en) * | 2007-10-23 | 2009-04-23 | Tsung Yuan Chen | Perpendicular magnetic recording head having a short throat height wrap around trailing shield |
US8111479B2 (en) | 2007-10-23 | 2012-02-07 | Hitachi Global Storage Technologies Netherlands B.V. | Perpendicular magnetic recording head having a notched trailing shield |
US20090116145A1 (en) * | 2007-11-02 | 2009-05-07 | Headway Technologies, Inc. | Perpendicular shield pole writer with tapered main pole and tapered non-magnetic top shaping layer |
US8238056B2 (en) | 2007-11-02 | 2012-08-07 | Headway Technologies, Inc. | Perpendicular shield pole writer with tapered main pole and tapered non-magnetic top shaping layer |
US8379347B2 (en) | 2007-11-02 | 2013-02-19 | Headway Technologies, Inc. | Perpendicular shield pole writer with tapered main pole and tapered non-magnetic top shaping layer |
US20090268350A1 (en) * | 2008-04-25 | 2009-10-29 | Wen-Chien David Hsiao | Perpendicular write head having a trailing shield with a short gap, short throat and high apex angle for improved linear density recording |
US8553361B2 (en) | 2008-04-25 | 2013-10-08 | HGST Netherlands B.V. | Perpendicular write head having a trailing shield with a short gap, short throat and high apex angle for improved linear density recording |
US8970985B2 (en) * | 2008-04-29 | 2015-03-03 | Headway Technologies, Inc. | Graded bevel tapered write pole design for field enhancement |
US9070383B2 (en) * | 2008-04-29 | 2015-06-30 | Headway Technologies, Inc. | Graded bevel tapered write pole design for field enhancement |
US8625234B2 (en) * | 2008-04-29 | 2014-01-07 | Headway Technologies, Inc. | Graded bevel tapered write pole design for field enhancement |
US20090268344A1 (en) * | 2008-04-29 | 2009-10-29 | Headway Technologies, Inc. | Graded bevel tapered write pole design for field enhancement |
US20100155364A1 (en) * | 2008-12-24 | 2010-06-24 | Aron Pentek | Magnetic write head having a stepped trailing shield and write pole with a sloped trailing edge |
US8270110B2 (en) | 2008-12-29 | 2012-09-18 | Headway Technologies, Inc. | Magnetic head for perpendicular magnetic recording having side shield layer and method of manufacturing same |
US20100277832A1 (en) * | 2009-05-04 | 2010-11-04 | Headway Technologies, Inc. | PMR writer device with multi-level tapered write pole |
US8670212B2 (en) | 2009-05-04 | 2014-03-11 | Headway Technologies, Inc. | PMR writer device with multi-level tapered write pole |
US9025280B2 (en) | 2009-05-04 | 2015-05-05 | Headway Technologies, Inc. | PMR writer device with multi-level tapered write pole |
US9105287B2 (en) | 2009-05-04 | 2015-08-11 | Headway Technologies, Inc. | Method of forming a PMR writer device with multi-level tapered write pole |
US8264792B2 (en) | 2009-05-04 | 2012-09-11 | Headway Technologies, Inc. | PMR writer device with multi-level tapered write pole |
US8842389B2 (en) * | 2009-10-26 | 2014-09-23 | Headway Technologies, Inc. | Wrap-around shielded writer with highly homogeneous shield material |
US20110097601A1 (en) * | 2009-10-26 | 2011-04-28 | Headway Technologies, Inc. | Wrap-around shielded writer with highly homogeneous shield material |
US8347488B2 (en) | 2009-12-09 | 2013-01-08 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic write head manufactured by damascene process producing a tapered write pole with a non-magnetic step and non-magnetic bump |
US20110135959A1 (en) * | 2009-12-09 | 2011-06-09 | Liubo Hong | Pmr writer and method of fabrication |
US20110132869A1 (en) * | 2009-12-09 | 2011-06-09 | Liubo Hong | Magnetic write head manufactured by damascene process producing a tapered write pole with a non-magnetic step and non-magnetic bump |
US20110134569A1 (en) * | 2009-12-09 | 2011-06-09 | Allen Donald G | Pmr writer and method of fabrication |
US20110135962A1 (en) * | 2009-12-09 | 2011-06-09 | Liubo Hong | Pmr writer and method of fabrication |
US8451560B2 (en) | 2009-12-09 | 2013-05-28 | HGST Netherlands B.V. | Magnetic head with flared write pole with multiple non-magnetic layers thereover |
US8498078B2 (en) | 2009-12-09 | 2013-07-30 | HGST Netherlands B.V. | Magnetic head with flared write pole having multiple tapered regions |
US20110134568A1 (en) * | 2009-12-09 | 2011-06-09 | Yingjian Chen | Pmr writer and method of fabrication |
US8553360B2 (en) | 2009-12-09 | 2013-10-08 | HGST Netherlands B.V. | Magnetic recording head having write pole with higher magnetic moment towards trailing edge |
US8233235B2 (en) | 2009-12-09 | 2012-07-31 | Hitachi Global Storage Technologies Netherlands B.V. | PMR writer having a tapered write pole and bump layer and method of fabrication |
US20110141615A1 (en) * | 2009-12-10 | 2011-06-16 | Hitachi Global Storage Technologies Netherlands B. V. | Magnetic head for perpendicular recording |
US8537493B2 (en) * | 2009-12-10 | 2013-09-17 | HGST Netherlands B.V. | Magnetic head for perpendicular recording |
US20110146062A1 (en) * | 2009-12-17 | 2011-06-23 | Allen Donald G | Method for manufacturing a magnetic write head having a wrap around shield that is magnetically coupled with a leading magnetic shield |
US20110147222A1 (en) * | 2009-12-17 | 2011-06-23 | Aron Pentek | Method for manufacturing a perpendicular magnetic write head having a tapered write pole and a stepped wrap around side shield gap |
US8201320B2 (en) | 2009-12-17 | 2012-06-19 | Hitachi Global Storage Technologies Netherlands B.V. | Method for manufacturing a magnetic write head having a wrap around shield that is magnetically coupled with a leading magnetic shield |
US8323727B2 (en) | 2009-12-17 | 2012-12-04 | Hitachi Global Storage Technologies Netherlands B.V. | Method for manufacturing a perpendicular magnetic write head having a tapered write pole and a stepped wrap around side shield gap |
US8699184B2 (en) * | 2010-05-11 | 2014-04-15 | Seagate Technology Llc | Self-aligned bevels for write poles |
US8734894B2 (en) | 2010-05-11 | 2014-05-27 | Seagate Technology Llc | Self-aligned bevels for write poles |
US20130038965A1 (en) * | 2010-05-11 | 2013-02-14 | Seagate Technology Llc | Self-aligned bevels for write poles |
US8184399B2 (en) | 2010-09-27 | 2012-05-22 | Headway Technologies, Inc. | Magnetic write head with thin and thick portions for balancing writability and ate |
US20150002963A1 (en) * | 2013-06-28 | 2015-01-01 | Seagate Technology Llc | Write Gap Structure for a Magnetic Recording Head |
US9318131B2 (en) * | 2013-06-28 | 2016-04-19 | Seagate Technology Llc | Write gap structure for a magnetic recording head |
Also Published As
Publication number | Publication date |
---|---|
US7777987B2 (en) | 2010-08-17 |
US7934310B2 (en) | 2011-05-03 |
US20090201611A1 (en) | 2009-08-13 |
US20090207525A1 (en) | 2009-08-20 |
US7777988B2 (en) | 2010-08-17 |
US20090202728A1 (en) | 2009-08-13 |
JP2005302281A (en) | 2005-10-27 |
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