US20040094764A1 - Active matrix type electro-optical device, and electronic apparatus - Google Patents
Active matrix type electro-optical device, and electronic apparatus Download PDFInfo
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- US20040094764A1 US20040094764A1 US10/673,243 US67324303A US2004094764A1 US 20040094764 A1 US20040094764 A1 US 20040094764A1 US 67324303 A US67324303 A US 67324303A US 2004094764 A1 US2004094764 A1 US 2004094764A1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133553—Reflecting elements
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
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- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
- 1. Field of Invention
- The present invention relates to active matrix type electro-optical devices holding an electro-optical material on a substrate, and to an electronic apparatus using the same. More particularly, the invention relates to active matrix type reflective and transflective electro-optical devices.
- 2. Description of Related Art
- Electro-optical devices including liquid crystal devices have been used as direct viewing type display devices of various equipments. As illustrated in FIGS. 17 and 18, in an active matrix type reflective liquid crystal device, a thin film transistor (TFT)30 for pixel switching, an
irregularity forming film 13 a on which a plurality of irregularities consisting of protrusions or holes are dispersed, a light-reflectingfilm 8 a formed on theirregularity forming film 13 a, and atransparent pixel electrode 9 a are formed in each of a plurality ofpixels 100 a arranged in a matrix on a surface of aTFT array substrate 10. Irregularities of theirregularity forming film 13 a are reflected as anirregular pattern 8 g on the surface of the light-reflectingfilm 8 a. Accordingly, light incident from acounter substrate 20 is reflected by theTFT array substrate 10, and an image is displayed in a reflection mode by light emitted from thecounter substrate 20. - Here, when light reflected by the light-reflecting
film 8 a has strong orientation, viewing angle range dependence increases remarkably. That is, brightness is dependent upon an angle of viewing the image. Conventionally, a photo-resist resin made of an organic resin, such as an acryl resin, is coated thickly on the surface of a secondinterlayer insulating film 5, and then a lower irregularity-formation film 13 a including a plurality of irregularities consisting of protrusions or holes is formed from at the lower side of the light-reflectingfilm 8 a by patterning the photo-resist resin by using a photolithography method. Thereafter, an upper sideirregularity forming film 7 a is formed on the surface of the lower irregularity-formation film 13 a for the irregularities to become gentle, and theirregular pattern 8 a for scattering light are formed gently on the surface of the light-reflectingfilm 8 a formed on the upper sideirregularity forming film 7 a. - In such a
TFT array substrate 10, when a drain of thepixel switching TFT 30 is electrically connected to apixel electrode 9 a, adrain electrode 6 b is electrically connected through acontact hole 4 c formed on agate insulation film 2 and a firstinterlayer insulating film 4 to a drain region of theTFT 30 in thewhole pixels 100 a. In addition, the light-reflectingfilm 8 a is electrically connected to thedrain electrode 6 b through a contact hole 5 c formed on the secondinterlayer insulating film 5 and the upper sideirregularity forming film 7 a in a position substantially overlapping with thecontact hole 4 c. Thepixel electrode 9 a made of an indium tin oxide (ITO) film is electrically connected to the light-reflectingfilm 8 a. - In such an electro-optical device, there was a problem in that if the
irregular pattern 8 g on the surface of the light-reflectingfilm 8 a is formed identically in eachpixel 100 a, interference occurs with respect to the reflected light from the light-reflectingfilm 8 a to reduce display quality. Therefore, it is preferable that theirregular pattern 8 g be formed differently in eachpixel 100 a. - However, even if the
irregular patterns 8 g are formed differently in eachpixel 100 a, in the conventional electro-optical devices, formation positions ofcontact holes 5 d become completely in thewhole pixels 100 a (for example, see Japanese Unexamined Patent Application Publication No. 10-123508). - As a result, the conventional electro-optical device has a disadvantage in that reflected light from the slanted surface of the wall of the
contact holes 5 d interferes in pixel units. - In consideration of the problems described above, an object of the present invention is to provide an active matrix type electro-optical device and an electronic apparatus which can prevent light interference due to the contact holes.
- Another object of the present invention is to provide an active matrix type electro-optical device which can prevent interference of the reflected light from a light-reflecting film, and an electronic apparatus using the same.
- To solve these problems, the present invention provides an active matrix type electro-optical device having, in each of a plurality of pixels arranged in a matrix on a substrate holding an electro-optical material, a thin film transistor for pixel switching, an irregularity forming film on which a plurality of irregularities consisting of protrusions or holes are dispersed, and a light-reflecting film formed on the irregularity forming film. The light-reflecting film having on its surface an irregular pattern for scattering light due to the irregularity forming film, and the light-reflecting film being formed in contact holes which are formed in an interlayer insulating film. When the pixels are grouped into a plurality of units of n×m pixels, the patterns of contact hole formation-position can be different in each of the units.
- According to the present invention, patterns of the contact-hole formation position are different in each unit, and thus the contact holes are not repeated when the electro-optical device is viewed from any angle. Therefore, the reflected light from the light-reflecting film do not interfere due to the contact holes and their peripheral parts.
- Preferably, in the present invention, contact-hole formation positions are different for each pixel in the unit.
- Preferably, in the present invention, the contact-hole formation positions of the pixels located in the same positions in the units are different for each unit.
- According to another aspect of the invention, an active matrix type electro-optical device can include, in each of a plurality of pixels arranged in a matrix on a substrate holding an electro-optical material, a thin film transistor for pixel switching, an irregularity forming film on which a plurality of irregularities consisting of protrusions or holes are dispersed, and a light-reflecting film formed on the irregularity forming film. The light-reflecting film having on its surface an irregular pattern for scattering light due to the irregularity forming film, and the light-reflecting film being formed in contact holes which are formed in an interlayer insulating film. When the plurality of pixels can be grouped into a plurality of units of n×m pixels, contact-hole formation positions are different for each unit.
- According to the present invention, because the contact hole positions of each pixel are different, even if the contact hole formation patterns are identical in the units, light interference for one pixel period can be extended to a unit period. As a result, it is possible to prevent interference.
- Preferably, in the present invention, the pixels have different patterns at least in the units, and irregular pattern positions are different in the units. According to the above structure, the same patterns are not repeated when the electro-optical device is viewed from any angle. Therefore, interference does not occur to the reflected light from the light-reflecting film.
- According to another aspect of the invention, an active matrix type electro-optical device can include, in each of a plurality of pixels arranged in a matrix on a substrate holding an electro-optical material, a thin film transistor for pixel switching, an irregularity forming film on which a plurality of irregularities consisting of protrusions or holes are dispersed, and a light-reflecting film formed on the irregularity forming film. The light-reflecting film having on its surface an irregular pattern for scattering light due to the irregularity forming film, and the light-reflecting film being formed in contact holes which are formed in an interlayer insulating film. Contact-hole formation positions can be different in each of the pixels.
- According to the present invention, patterns of the contact-hole formation position are different in each unit, and thus the contact holes are not repeated when the electro-optical device is viewed from any angle. Therefore, the reflected light from the light-reflecting film does not interfere due to the contact holes and their peripheral parts.
- Preferably, in the present invention, the pixels have different patterns. Identical irregular pattern is not repeated when the electro-optical device is viewed from any angle. Therefore, interference does not occur to the reflected light from the light-reflecting film.
- Preferably, in the present invention, a drain electrode is formed almost over the entire pixel at the lower side of the light-reflecting film in all of the pixels. Accordingly, even if the contact-hole formation positions are changed, drain electrode formation regions are not influenced.
- Preferably, in the present invention, the contact holes formed in each pixel have the same area.
- According to the present invention, an active matrix type electro-optical device is constructed such that liquid crystal is held as the electro-optical material between the substrate which is a first substrate and a second substrate facing the first substrate. Such an active matrix type electro-optical device is used as a display unit of electronic apparatuses such as cellular phones or mobile computers.
- The invention will be described with reference to the accompanying drawings, wherein like numerals reference like elements, and wherein:
- FIG. 1 is a plan view illustrating an active matrix type electro-optical device when seen from a counter substrate side;
- FIG. 2 is a cross-sectional view taken along the line H-H′ of FIG. 1;
- FIG. 3 is an equivalent circuit diagram illustrating various elements and wires formed in a plurality of pixels arranged in a matrix in the active matrix type electro-optical device;
- FIG. 4 is a plan view illustrating the construction of the pixels formed on a TFT array substrate in the active matrix type electro-optical device to which the present invention is applied;
- FIG. 5 is a cross-sectional view illustrating the pixels which are cut at a position corresponding to the line A-A′ of FIG. 4;
- FIGS.6(A) to (D) are cross-sectional views illustrating sequential steps of a method for manufacturing a TFT array substrate of the active matrix type electro-optical device to which the present invention is applied;
- FIGS.7(A) to (D) are cross-sectional views illustrating processes succeeding to the process of FIG. 6, in the method for manufacturing the TFT array substrate of the active matrix type electro-optical device to which the present invention is applied;
- FIGS.8(A) to (D) are cross-sectional views illustrating sequential steps of a method for manufacturing a TFT array substrate of the active matrix type electro-optical device to which the present invention is applied;
- FIG. 9 is an explanatory diagram illustrating a process of arranging different irregular pattern in each unit of the pixels and forming contact holes in different positions in the active matrix type electro-optical device to which the present invention is applied;
- FIG. 10 is an explanatory diagram illustrating differences of irregular pattern formed on the pixels and contact-hole formation positions in the active matrix type electro-optical device to which the present invention is applied;
- FIG. 11 is an explanatory diagram illustrating differences of irregular pattern formed on the pixels and contact-hole formation positions in the active matrix type electro-optical device to which the present invention is applied;
- FIG. 12 is an explanatory diagram illustrating differences of irregular pattern formed on the pixels and contact-hole formation positions in the active matrix type electro-optical device to which the present invention is applied;
- FIG. 13 is an explanatory diagram illustrating Delaunay triangle for measuring relative distance relations of irregularities;
- FIG. 14 is an explanatory diagram illustrating an example in that irregularities cut at the ends of the pixels;
- FIG. 15 is an exemplary block diagram illustrating a circuit structure of an electronic apparatus using the active matrix type electro-optical device according to the present invention as a display device;
- FIGS.16(A) and (B) are explanatory diagrams respectively illustrating a portable personal computer and a cellular phone as an example of the electronic apparatus using the active matrix type electro-optical device according to the present invention as the display device;
- FIG. 17 is plan view illustrating pixels of a TFT array substrate in a conventional active matrix type electro-optical device; and
- FIG. 18 is a cross-sectional view of a part of pixels in the conventional active matrix type electro-optical device.
- Hereinafter, embodiments of the present invention will be explained with reference to the accompanying drawings.
- FIG. 1 is an exemplary plan view illustrating structural elements of an electro-optical device to which the present invention is applied seen from a counter substrate side, FIG. 2 is a cross-sectional view taken along the line H-H′ of FIG. 1, and FIG. 3 is an equivalent circuit diagram illustrating various elements and wires of a plurality of pixels arranged in a matrix in an image display region of the electro-optical device. In the drawings used for the explanation of the embodiments, scales of each of layers and members are varied so as to make the size of each of layers and members recognizable in the drawings.
- Referring to FIGS. 1 and 2, in an electro-optical device100 (liquid crystal device) according to the embodiment, a TFT array substrate 10 (first substrate) and a counter substrate 20 (second substrate) are bonded by using a sealing
material 52, andliquid crystal 50 which is an electro-optical material is interposed between regions (liquid crystal sealing region) divided by the sealingmaterial 52. Aperipheral partition 53 made of a light shielding material can be formed in the inside region of a formation region of the sealingmaterial 52. A dataline driving circuit 101 and a mountingterminal 102 can be formed in an outside region of the sealingmaterial 52 along one side of theTFT array substrate 10, and a scanningline driving circuit 104 is formed along two sides adjacent to the side. A plurality ofwires 105 for connecting the scanningline driving circuits 104 provided at both sides of the image display region is formed along the remaining side of theTFT array substrate 10. In addition, a precharge circuit or test circuit can be provided by using the lower side of theperipheral partition 53. Aninter-substrate connecting material 106 for electrically connecting theTFT array substrate 10 to thecounter substrate 20 is formed in at least one corner of thecounter substrate 20. - For example, a TAB (tape automated bonding) substrate on which a driving LSI is mounted can be electrically mechanically connected to a terminal group formed at the periphery of the
TFT array substrate 10 through an anisotropic conductive film, instead of forming the data line drivingcircuit 101 and the scanningline driving circuits 104 on theTFT array substrate 10. A polarization film, a retardation film and a polarization plate are aligned in a certain direction of the electro-optical device 100 according to a type ofliquid crystal 50, namely an operation mode such as a TN (twisted nematic) mode and STN (super TN mode), or a normally white mode/normally black mode, which are not illustrated herein. - When the electro-
optical device 100 is intended to display colors, RGB color filters and their protection films are formed in a region of thecounter substrate 20 facing pixel electrodes (described hereinlater) of theTFT array substrate 10. - As illustrated in FIG. 3, a plurality of
pixels 100 a are formed in a matrix in the image display region of the electro-optical device 100 having above-described configuration. Apixel electrode 9 a and apixel switching TFT 30 for driving thepixel electrode 9 a are formed in each of thepixels 100 a.Data lines 6 a for supplying pixel signals S1, S2, . . . , Sn are electrically connected to sources of theTFTs 30. The pixel signals S1, S2, . . . , Sn recorded on thedata lines 6 a can be line-sequentially supplied in this order, or be supplied to the plurality ofdata lines 6 a which are adjacent to each other in group units.Scanning lines 3 a are electrically connected to gates of theTFTs 30. Scanning signals G1, G2, . . . , Gm are line-sequentially applied in this order to thescanning line 3 a at a predetermined timing in a pulsed way. Thepixel electrodes 9 a are electrically connected to drains of theTFTs 30, for turning on theTFT 30 functioning as a switching element for a predetermined time, to record the pixel signals S1, S2, . . . , Sn from thedata lines 6 a on each pixel at a predetermined timing. In this regard, the pixel signals S1, S2, . . . , Sn of predetermined level recorded on the liquid crystal through thepixel electrodes 9 a are held between thecounter substrate 20 of FIG. 2 and acounter electrode 21 for a predetermined time. - Here, the orientation or order of molecular groups of the
liquid crystal 50 is varied in accordance with an applied voltage level, to modulate light and display a grayscale. In the normally white mode, an amount of incident light passing through theliquid crystal 50 decreases in accordance with the applied voltage level. In the normally black mode, an amount of incident light passing through theliquid crystal 50 increases in accordance with the applied voltage level. As a result, light having a contrast according to the pixel signals S1, G2, . . . , Sn is emitted from the electro-optical device 100. - In order to prevent leakage of the held pixel signals S1, S2, . . . , Sn,
storage capacitors 60 can be added in parallel to the liquid crystal capacitors formed between thepixel electrodes 9 a and thecounter electrodes 21. For example, the voltage of thepixel electrode 9 a is held by thestorage capacitors 60 for a longer time than a transmission time of the source voltage by three digits. Accordingly, a holding property of electric charges is improved to embody a high contrast ratio of electro-optical device 100. As shown in FIG. 3, thestorage capacitor 60 can be formed between the liquid crystal capacitors andcapacitive lines 3 b which are a wire for forming thestorage capacitors 60 or precedingscanning lines 3 a. - FIG. 4 is a plan view illustrating the plurality of pixel groups which are adjacent to each other formed on the TFT array substrate used in the active matrix type electro-optical device, and FIG. 5 is a cross-sectional view illustrating part of pixels of electro-optical device cut in a position corresponding to the line A-A′ of FIG. 4.
- As depicted in FIG. 4,
pixel electrodes 9 a made of a plurality of transparent ITO films are formed in a matrix on theTFT array substrate 10, andpixel switching TFTs 30 are connected to each of thepixel electrodes 9 a, respectively. In addition, thedata lines 6 a,scanning lines 3 a andcapacitive lines 3 b are formed along the perpendicular and horizontal boundaries of thepixel electrodes 9 a. TheTFTs 30 are connected to thedata line 6 a and thescanning lines 3 a. Thescanning lines 3 a are extended to facechannel regions 1 a′ of theTFTs 30. - The data lines6 a are electrically connected to heavily doped
source regions 1 d of theTFTs 30 throughcontact holes 4 d, thepixel electrodes 9 a are electrically connected to thedrain electrodes 6 b of theTFTs 30 throughcontact holes 5 d, and thedrain electrodes 6 b are electrically connected to heavily dopeddrain regions 1 e of theTFTs 30 throughcontact holes 4 c. - In this embodiment, the
drain electrodes 6 b are formed almost over the entire pixel, and the contact holes 5 d are formed in a predetermined region in which thedrain regions 6 b have been formed. - The storage capacitors60 (storage capacitor elements) have a structure that a conductive extended part If of a
semiconductor film 1 for forming thepixel switching TFT 30 as a lower electrode 41 overlaps with thecapacitive line 3 b positioned on the same layer as thescanning line 3 a as an upper electrode. - As shown in FIG. 5, in a cross-section of a
pixel 100 a taken along the line A-A′, abase protection film 11 made of silicon oxide film (insulation film) with a thickness of 300 nm to 500 nm is formed on the surface of atransparent substrate 10′ which is a base of theTFT array substrate 10. An island shapedsemiconductor film 1 a with a thickness of 50 nm to 100 nm is formed on the surface of thebase protection film 11. A gate insulation film 2 a made of silicon oxide film with a thickness of 50 to 150 nm is formed on the surface of thesemiconductor film 1 a, and ascanning line 3 a with a thickness of 300 nm to 800 nm is formed on the surface of the gate insulation film 2 a as a gate electrode. A region of thesemiconductor film 1 a facing thescanning line 3 a through the gate insulation film 2 a is achannel region 1 a′. A source region having a lightly doped source region 1 b and a heavily dopedsource region 1 d is formed at one side of thechannel region 1 a′, and a drain region having a lightly doped drain region 1 c and a heavily dopeddrain region 1 e is formed at the other side of thechannel region 1 a′. - A first
interlayer insulating film 4 made of silicon oxide film with a thickness of 300 nm to 800 nm and a second interlayer insulating film 5 (surface protection film) made of silicon nitride film with a thickness of 100 nm to 300 nm are formed on the surface of thepixel switching TFT 30. Adata line 6 a with a thickness of 300 nm to 800 nm is formed on the surface of the firstinterlayer insulating film 4, and thedata line 6 a is electrically connected to the heavily dopedsource region 1 d through thecontact hole 4 d formed on the firstinterlayer insulating film 4. - A
drain electrode 6 b formed simultaneously with thedata line 6 a is formed on the surface of the firstinterlayer insulating film 4, and electrically connected to the heavily dopeddrain region 1 e through thecontact hole 4 c formed on the firstinterlayer insulating film 4. - A lower irregularity-
formation film 13 a made of a photoresist resin, such as an organic resin, and an upper sideirregularity forming film 7 a made of polysilazane or organic resin are formed sequentially on the secondinterlayer insulating film 5. A light-reflectingfilm 8 a made of an aluminum film and the like is formed on the surface of the upper irregularity-formation film 7 a. - A
transparent pixel electrode 9 a made of an ITO film is formed on the light-reflectingfilm 8 a. Thepixel electrode 9 a is directly stacked on the light-reflectingfilm 8 a to be electrically connected to the light-reflectingfilm 8 a. - Here, the light-reflecting
film 8 a is formed in thecontact hole 5 d formed in the upper sideirregularity forming film 7 a and the secondinterlayer insulating film 5, and electrically connected to thedrain electrode 6 b through thecontact hole 5 d. In addition, thepixel electrode 9 a made of an ITO film is electrically connected to thedrain electrode 6 b through the light-reflectingfilm 8 a. - The
drain electrode 6 b of theTFT 30 is formed almost over thewhole pixel 100 a at the lower side of the light-reflectingfilm 8 a. In this regard, as described in greater detail below, even if positions ofcontact hole 5 d are changed in eachpixel 100 a, formation positions or ranges of thedrain electrodes 6 b are not influenced. Moreover, even if thedrain electrode 6 b is formed in a wide range, an amount of light for display is not reduced at the lower side of the light-reflectingfilm 8 a. - An
alignment film 12 made of a polyimide film is formed on the surface of thepixel electrode 9 a. Thealignment film 12 is obtained by rubbing the polyimide film. - A
capacitive line 3 b positioned at the same layer as thescanning line 3 a is formed as an upper electrode to face theextended part 1 f (lower electrode) from the heavily dopeddrain region 1 e through an insulation film (dielectric film) which is simultaneously formed with a gate insulation film 2 a, to form anstorage capacitor 60. - Preferably, the
TFT 30 has the LDD structure as described above, but may have an offset structure which does not implant impurity ions into the regions corresponding to the lightly doped source region 1 b and the lightly doped drain region 1 c. TheTFT 30 may be a self-aligned TFT which forms heavily doped source and drain regions according to selfalignment by implanting heavily doped impurity ions by using the gate electrode (part ofscanning line 3 a) as a mask. - This embodiment has a single gate structure in which the gate electrode (scanning
line 3 a) of theTFT 30 is arranged between the source and drain regions. However, two or more gate electrodes can be arranged between the source and drain regions. Here, identical signals are supplied to the respective gate electrodes. When theTFT 30 is formed of a dual gate (double gate) or triple or more gate structure, leakage current is prevented in the junction of the channel and the source and drain regions, to reduce current consumption in a turning-off state. When at least one the gate electrode is formed in an LDD or offset structure, turning-off current can be considerably reduced, to be able to obtain a stabilized switching device. - As shown in FIGS. 4 and 5, in the
TFT array substrate 10, theirregular pattern 8 g havingconvex units 8 b andconcave units 8 c are formed in a region (light-reflecting film formation region) which is not included in the formation region of theTFT 30 on the surface of the light-reflectingfilm 8 a in the reflection region of eachpixel 100 a. In order to form such anirregular pattern 8 g, on theTFT array substrate 10 according to the present embodiment, the lower irregularity-formation films 13 a made of an organic photoresist resin are formed with a predetermined interval on the secondinterlayer insulating film 5 as a plurality of columnar protrusions (prominences and depressions) in a region overlapping with the light-reflectingfilm 8 a over a plane below the light-reflectingfilm 8 a. The upper sideirregularity forming film 7 a made of an insulating film which is formed of fluidity material, such as polysilazane or organic resin, is stacked on the lower irregularity-formation film 13 a. Therefore, theirregular patterns 8 g corresponding to the irregularities of the lower irregularity-formation film 13 a are formed on the surface of thereflection film 8 a. Edges of the lower irregularity-formation film 13 a are not protruded from theirregular pattern 8 g by the upper sideirregularity forming film 7 a. - In addition, instead of forming the upper side
irregularity forming film 7 a, by performing a baked process after forming the lower irregularity-formation film 13 a, the edges of the irregularities of the lower irregularity-formation film 13 a may be formed to become gentle. - Here, the columnar protrusions forming the irregularities of the
irregularity forming film 13 a are formed in a circular or polygonal plane shape. The columnar protrusions forming the irregularities of the lower irregularity-formation film 13 a have different types having different plane sizes, but are illustrated to have the same size in FIGS. 4 and 5. The shape, size and distribution of theirregular pattern 8 g are determined by the shape, size and distribution of the lower irregularity-formation film 13 a composing the columnar protrusions. - Referring to FIG. 5, on the
counter substrate 20, thelight shielding film 23, called as a black matrix or black stripe, is formed in the regions facing the perpendicular and horizontal boundaries of thepixel electrodes 9 a formed on theTFT array substrate 10. Thecounter electrode 21 made of an ITO film is formed on thelight shielding film 23. Thealignment film 22 made of a polyimide film is formed on thecounter electrode 21. Thealignment film 22 is formed by rubbing the polyimide film. - A method for manufacturing the
TFT array substrate 10 will be explained with reference to FIGS. 6 to 8. FIGS. 6 to 8 are cross-sectional views illustrating sequential steps of the method for manufacturing theTFT array substrate 10, and especially illustrating sections of the TFT formation region and the light-reflecting film formation region. - When the
TFT array substrate 10 of this embodiment is manufactured, a method referred as a low temperature process is adopted to form theTFT 30. This process has been well known, and thus only the steps relating to the characteristics of theTFT array substrate 10 of this embodiment will be explained. - As depicted in FIG. 6(A), in order to manufacture the
TFT array substrate 10 of this embodiment, theTFT 30 is formed on the surface of thesubstrate 10 such, as a glass, aconductive film 6 composing thedata lines 6 a (source electrode) and the like is formed on the surface of the firstinterlayer insulating film 4 with a thickness of 300 nm to 800 nm by using a sputtering method, and then a resistmask 555 is formed by using a photolithography method. Theconductive film 6 is made of an aluminum film, a tantalum film, a molybdenum film or an alloy film containing any of the above metal films as a main element. - Subsequently, a dry etching process is performed on the
conductive film 6 by the resistmask 555, and thedata line 6 a and thedrain electrode 6 b are formed as shown in FIG. 6(B). - As illustrated in FIG. 6(C), the second
interlayer insulating film 5 made of a silicon nitride film is formed with a thickness of 100 nm to 300 nm on the surfaces of thedata line 6 a and thedrain electrode 6 b by using a CVD method, and a resistmask 556 for forming the contact hole on the secondinterlayer insulating film 5 is formed by using a photolithography method. - A dry etching process is performed on the second
interlayer insulating film 5 by the resistmask 556, and thecontact hole 5 d is formed in the region of the secondinterlayer insulating film 5 corresponding to thedrain electrode 6 b as shown in FIG. 6(D). - As shown in FIG. 7(A), the
organic photoresist resin 13 is coated thick on the surface of the secondinterlayer insulating film 5, and exposed by anexposure mask 510. Here, a negative or positive resin can be used as thephotoresist resin 13, but in FIG. 7(A), the positive type resin is used as thephotoresist resin 13. Ultraviolet rays are irradiated to a portion where thephotoresist resin 13 is desired to be removed through a light-transmittingpart 511 of theexposure mask 510. - As depicted in FIG. 7(B), the lower irregularity-
formation films 13 a having the columnar protrusions and thecontact hole 5 d as explained with reference to FIG. 5 are formed in the region overlapping with the light-reflectingfilm 8 a over a plane at the lower side of light-reflectingfilm 8 a by developing the exposedphotoresist resin 13. - As illustrated in FIG. 7(C), perhydro polysilazane or a composition containing the same is coated on the surfaces of the second
interlayer insulating film 5 and the lower irregularity-formation films 13 a, and then is baked. Otherwise, as shown in FIG. 7(D), amaterial 7 having fluidity, such as an organic resin is coated, patterned by using a photolithography method, or exposed and developed to form the upper sideirregularity forming film 7 a having thecontact hole 5 d. - Here, perhydro polysilazane is a kind of organic polysilazane which is an application type coating material and is transformed into a silicon oxide film by being baked in atmosphere. For example, polysilazane of Tonen Corp. is an inorganic polymer including —(SiH2 NH)— as a unit, and is soluble in an organic solution such as xylene. Accordingly, when polysilazane is coated by a spin coating method (for example, at 2000 rpm, for 20 seconds) by using an organic solvent solution (20% xylene solution) of the inorganic polymer as a coating solution and baked in atmosphere at 450° C., it reacts with moisture or oxygen, therefore a fine amorphous silicon oxide film equivalent to or more than a silicon oxide film formed by a CVD process can be obtained.
- Here, the upper side
irregularity forming film 7 a is formed by coating a material having fluidity. Thus, gentleirregular pattern 8 g without edges is formed on the surface of the upper sideirregularity forming film 7 a by moderately smoothing the irregularities of the lower irregularity-formation film 13 a. - In order to form the gentle
irregular pattern 8 g without forming the upper sideirregularity forming film 7 a, a bake process is performed as shown in FIG. 7(B), to make gentle the edges of the lower irregularity-formation film 13 a. - Referring to FIG. 8(A), the metal film8 having reflectivity, such as an aluminum film, is formed on the surface of the upper side
irregularity forming film 7 a by a sputtering method, and then a resistmask 557 is formed by using a photolithography method. - An etching process is performed on the metal film8 by the resist
mask 557. As shown in FIG. 8(B), the light-reflectingfilm 8 a is left in a certain region.Irregular patterns 8 g of 500 nm and above or 800 nm and above are formed on the surface of the light-reflectingfilm 8 a by the lower irregularity-formation film 13 a. In addition, theirregular pattern 8 g becomes gentle without edges due to the upper sideirregularity forming film 7 a. - As depicted in FIG. 8(C), ITO film9 having a thickness of 40 nm to 200 nm is formed on the surface of the light-reflecting
film 8 a by using a sputtering method, followed by forming a resistmask 558 by using a photolithography method. - An etching process is performed on the ITO film9 by the resist
mask 558. As illustrated in FIG. 8(D), thepixel electrode 9 a is formed to be electrically connected to thedrain electrode 6 b through thecontact hole 5 d. - As shown in FIG. 5, the polyimide film (alignment film12) is then formed on the surface of the
pixel electrode 9 a. In this regard, polyimide varnish prepared by dissolving 5 to 10 wt % of polyimide or polyamide acid in solvent such as butyl cellosolve or n-methyl pyrrolidone is flexo-printed, then heated and hardened (baked). The substrate on which the polyimide film has been formed is rubbed by a puff cloth including rayon fibers in a certain direction, so that polyimide molecules can be aligned in a certain direction near the surface. As a result, liquid crystal molecules can be arranged in a certain direction due to interreaction between the filled liquid crystal molecules and polyimide molecules. Thus, manufacturing of theTFT array substrate 10 is finished. - FIG. 9 is an explanatory diagram illustrating the condition in which, when the plurality of pixels are grouped into a plurality of units on the TFT array substrate, irregular pattern shapes are different for the pixels at least in the units, and irregular pattern positions are different in the units. FIGS.10 to 12 are explanatory diagrams illustrating the irregular pattern adhered to the TFT array substrate of the active matrix type electro-optical device according to the embodiment. FIG. 13 is an explanatory diagram illustrating Delaunay diagram for measuring relative distance relations of the irregularities.
- In the active matrix type electro-
optical device 100 in this embodiment, the light-reflectingfilm 8 a made of an aluminum film is formed at the lower side of thepixel electrode 9 a. Accordingly, light incident from thecounter substrate 20 can be reflected by theTFT array substrate 10, and emitted from thecounter substrate 20. Here, when optical modulation is performed on eachpixel 100 a by theliquid crystal 50, a desired image is displayed by using external light (reflection mode). - In this embodiment, the lower irregularity-
formation film 13 a is formed in the region at the lower side of the light-reflectingfilm 8 a where the lower irregularity-formation film 13 a overlaps therewith over a plane, and theirregular pattern 8 g for scattering light is formed on the surface of the light-reflectingfilm 8 a by using irregularities corresponding to the lower irregularity-formation film 13 a. In addition, edges of the lower irregularity-formation film 13 a are not protruded from theirregular pattern 8 g by the upper sideirregularity forming film 7 a. Therefore, when an image is displayed in the reflection mode, an image is displayed by using scattering the reflected light. As a result, viewing angle range dependence is reduced. - However, when the
irregular pattern 8 g on the light-reflectingfilm 8 a is identical in eachpixel 100 a, the reflected light from the light-reflectingfilm 8 a interferes. - As shown in FIG. 9, the plurality of
pixels 100 a formed in a matrix are grouped into n×m pixels inmultiple units 10 la, 102 a, 103 a, . . . and theirregular pattern 8 g are formed in different shapes in eachpixel 100 a at least in theunits 10 la, 102 a, 103 a, . . . . - That is, when the lower irregularity-
formation film 13 a is formed in eachpixel 100 a, anexposure mask 510 is designed to formirregular pattern 8 g (irregular pattern A to L) by varying the shape, size and distribution of the columnar protrusions (prominences and depressions) formed by the lower irregularity-formation film 13 a in thepixels 100 a of theunits 10 la, 102 a, 103 a, . . . . - Here, the irregularities have a different plane size, but are illustrated to have the same size in FIGS. 4 and 5.
- Positions of the irregular pattern A to L are different in the
units first unit 101 a, the irregular pattern A, the irregular pattern B, the irregular pattern C, . . . are formed from the left to right direction of the top end, in thesecond unit 102 a, the irregular pattern G, the irregular pattern A, the irregular pattern H, . . . are formed from the left to right direction of the top end, and in thethird unit 103 a, the irregular pattern E, the irregular pattern J, the irregular pattern A, . . . are formed from the left to right direction of the top end. - In order to form the plurality of irregular pattern, when the
exposure mask 510 of FIG. 7(A) is designed, for example, thepixel 100 a of FIG. 10(A) is designated as areference pixel 100 a′, and the irregularities of the irregular pattern A formed in thereference pixel 100 a′ are rotated on a certain position O1 of the pixel region as indicated by an arrow X, to form the irregular pattern B, C, . . . of FIGS. 10(B) and (C) in theother pixels 100 a. As a result, differentirregular pattern 8 g are formed in eachpixel 100 a. - Here, the rotation center O1 is set in the pixel region. In this case, the rotation center is preferably set in a position deviated from the center of the lower irregularity-
formation film 13 a composing the irregularities. In addition, the rotation center is preferably set in a position deviated from the circular shape defining the outer circumference of the lower irregularity-formation film 13 a. Accordingly, if determined as mentioned above, it is possible to prevent the lower irregularity-formation film 13 a from being formed in the rotation center region in each irregular pattern A to L. The rotation center can be moved while the irregularities are rotated on the position O1. - When the
exposure mask 510 is designed, for example, thepixel 100 a of FIG. 11(A) is designated as areference pixel 100 a′, and the irregularities of the irregular pattern A formed in thereference pixel 100 a′ are rotated on a certain position O2 outside of the pixel region as indicated by an arrow X, to form the irregular pattern B, C, . . . of FIGS. 11(B) and (C) in theother pixels 100 a. As a result, differentirregular pattern 8 g may be formed in eachpixel 100 a. The rotation center can be moved while the irregularities are rotated on the position O2. - When the
exposure mask 510 is designed, for example, thepixel 100 a of FIG. 12(A) is designated as areference pixel 100 a′, and the irregularities of the irregular pattern A formed in thereference pixel 100 a′ are rotated on aposition 03 where thecontact hole 4 c is formed in the pixel region as indicated by an arrow X, to form the irregular pattern B, C, . . . of FIGS. 12(B) and (C) in theother pixels 100 a. Therefore, differentirregular pattern 8 g are formed in eachpixel 100 a. - In the thus constructed active matrix type electro-
optical device 100 using the aboveTFT array substrate 10, theirregular pattern 8 g are formed in different shapes in eachpixel 100 a of theunits irregular pattern 8 g are different in theunits irregular pattern 8 g is not repeated when the electro-optical device 100 is viewed from any angle. As a result, interference does not occur to the reflected light from the light-reflectingfilm 8 a. - In this embodiment, in order to form the
irregular pattern 8 g having different shapes in eachpixel 100 a, theirregular pattern 8 g obtained by rotating the irregularities of thereference pixel 100 a′ on a certain position are formed indifferent pixels 100 a. Therefore, differences of the shape, size or distribution of the lower irregularity-formation film 13 a are controlled in eachpixel 100 a. Because the irregularities of thereference pixel 100 a′ are rotated and then transferred to thepixel 100 a, differences of the shape, size or distribution of the lower irregularity-formation film 13 a formed on thereference pixel 100 a′ is the same level as theother pixel 100 a, so differences are small. - In this embodiment, a plurality of lower irregularity-
formation films 13 a having different plane sizes is formed in one pixel. A number of the lower irregularity-formation films 13 a having the same size in one pixel is identical in thewhole pixels 100 a. - A ratio of the irregularities that a gradient of a slanted surface formed at the side of the lower irregularity-
formation film 13 a exits within a certain angle range, for example, a ratio of the irregularities that the gradient of the slanted surface formed at the sides of the irregularities exists within the certain angle range is 5% or less in thepixels 100 a. - Moreover, differences of an area of the lower
irregularity forming films 13 a are 10% or less between thepixels 100 a. - As illustrated in FIG. 13, when the Delaunay diagram is drawn from position coordinates of the center of the lower side plurality of
irregularity forming films 13 a, differences of a length of the Delaunay line (adjacent distance of center coordinates) are below 10% in thepixels 100 a. - Therefore, when seen from a slanted direction of 10 to 30° from a normal line direction of the TFT array substrate, differences of reflection luminance exist within 5% in the patterns, to prevent luminance heterogeneity between the pixels.
- As depicted in FIG. 14, when the lower irregularity-
formation film 13 a is cut at the end of thepixel 100 a, the cut part is included in the opposite side. Accordingly, a sum of the areas of the lowerirregularity forming films 13 a is preferably integer times of a normal area. With this arrangement, even if the lower irregularity-formation film 13 a is cut at the side of thepixel 100 a, a number and area of the lower irregularity-formation films 13 a can be substantially identical in one pixel. - In this embodiment, the
contact hole 5 d formation positions are made different in eachpixel 100 a as shown in FIG. 4, by using the irregular pattern design technique of FIGS. 9 to 12. In other words, when patterns of the contact-hole formation position of eachpixel 100 a are designed, as shown in FIG. 9, the plurality ofpixels 100 a formed in a matrix are grouped into a plurality ofunits film 8 a is designed to form the contract holes 5 d in different positions in eachpixel 100 a of theunits contact hole 5 d formation positions of theunits units - The
contact hole 5 d formation positions of thepixels 100 a formed in the same positions of theunits units - In order to form the plurality of kinds of formation position patterns, for example, in this embodiment, the
pixel 100 a of FIG. 10(A) is designated as areference pixel 100 a′, and the position of thecontact hole 5 d formed in thereference pixel 100 a′ is moved by rotating on a certain position O1 in the pixel region as indicated by an arrow X, thus obtained forming positions of thecontact hole 5 d of FIGS. 10(B) and (C) are applied to theother pixels 100 a. As a result, the contact holes 5 d of thepixels 100 a have the same area, but different formation positions. Here, the rotation center can be moved while the forming position of thecontact hole 5 d is rotated on the position O1. - In addition, the
pixel 100 a of FIG. 11(A) is designated as areference pixel 100 a′, and the forming position of thecontact hole 5 d formed in thereference pixel 100 a′ is moved by rotating on a certain position O2 out of the pixel region as indicated by an arrow X, thus obtained forming positions of thecontact hole 5 d of FIGS. 11(B) and (C) are applied to theother pixels 100 a. Accordingly, the contact holes 5 d of thepixels 100 a have different formation positions. Here, the rotation center can be moved while the forming position of thecontact hole 5 d is rotated on the position O2. - The
pixel 100 a of FIG. 12(A) is designated as areference pixel 100 a′, and the position of thecontact hole 5 d formed in thereference pixel 100 a′ is moved by rotating on acontact hole 4c formation position 03 in the pixel region as indicated by an arrow X, thus obtained forming positions of thecontact hole 5 d of FIGS. 12(B) and (C) are applied to theother pixels 100 a. As a result, the contact holes 5 d of thepixels 100 a have different formation positions. - In the active matrix type electro-
optical device 100 using theTFT array substrate 10 according to the present embodiment, thecontact hole 5 d formation positions are different in eachpixel 100 a of theunits contact hole 5 d are different in theunits contact hole 5 d formation positions of thepixels 100 a formed in the same positions of theunits units pixel 100 a when the electro-optical device 100 is viewed from any angle. As a result, even though thelight reflecting film 8 a is formed in thecontact hole 5 d, interference due to the reflected light from the slanted surface of the inner wall of thecontact hole 5 d does not occur. - In this embodiment, in order to form the contact holes5 d in different positions in each
pixel 100 a, the position of thecontact hole 5 d of thereference pixel 100 a′ is moved by rotating on a certain position or moved by combination of rotation and parallel translation, to form the contact holes 5 d in theother pixels 100 a. Therefore, the contact holes 5 d have different formation positions but the same area in eachpixel 100 a. Moreover, the relative positions between the contact holes 5 d and the columnar protrusions composing the irregularities of the lower irregularity forming film 13 d are identical in eachpixel 100 a. - The lower irregularity-
formation film 13 a forming the circular columnar protrusion having, for example, the circular plane shape has been explained. However, it should be understood that the plane shape of the columnar protrusion can be hexagonal, octagonal, or other polygonal shape. Here, the plane shape is preferably circular, regular hexagonal or regular octagonal in consideration of mask data and scattering properties. Further, holes may be formed instead of the columnar protrusion. - In this embodiment, the contact holes5 d are formed in different positions in the units, and the
contact hole 5 d formation position patterns are different in the units. However, it should be understood that thecontact hole 5 d formation positions can be different in each of the plurality of the pixels. - In addition, the contact-hole formation positions are different in each pixel of the units, but the contact hole formation patterns can be identical in the units. Thus, one pixel period of light interference can be extended to a unit period, to restrict interference.
- In this embodiment, further, the irregular pattern shapes are different in each pixel of the units, and the irregular pattern positions are different in the units. However, the irregular pattern can be formed in different shapes in each of the plurality of the pixels.
- In this embodiment, further, the present invention is applied to the total reflection type electro-optical device, but can be applied to the transflective type electro-optical device by forming a light-transmitting hole on a part of the light-reflecting film.
- In addition, in this embodiment, the
pixel electrode 8 a made of an ITO film is formed on the light-reflectingfilm 8 a applicable for both the total reflection type and transfiective optical type. However, in the total reflection type electro-optical device, the light-reflecting film can be used as the pixel electrode, and the light-reflecting film can be formed on the pixel electrode made of an ITO film. In addition, the ITO film can be formed merely in the light-transmitting region. In this case, it is preferable that an overlapping region of the ITO film and the reflection film is formed on the boundary between a light-transmitting region and a reflection region, and the ITO film is formed at the upper or lower side of the reflection film and electrically connected thereto. In any case, if the light-reflecting film is formed in the contact hole, application of the present invention is effective. - The reflective or transflective matrix type electro-
optical device 100 thus constructed can be used as a display unit of various electronic apparatuses, an example of which will be explained with reference to FIGS. 15, 16(A), and 16(B). - FIG. 15 is an exemplary block diagram illustrating a circuit structure of the electronic apparatus using the active matrix type electro-optical device as a display device. Referring to FIG. 15, the electronic apparatus can include a display
information output source 70, a displayinformation processing circuit 71, apower source circuit 72, atiming generator 73 and aliquid crystal device 74. Theliquid crystal device 74 can include a liquidcrystal display panel 75 and a drivingcircuit 76. The active matrix type electro-optical device 100 can be used as theliquid crystal device 74. - The display
information output source 70 includes a memory such as a ROM (Read Only Memory) and a RAM (Random Access Memory), a storage unit such as disks, and a synchronous circuit for synchronously outputting a digital image signal and supplies display information such as image signal of a certain format to the displayinformation processing circuit 71 according to various clock signals generated by thetiming generator 73. - The display
information processing circuit 71 has various known circuits such as a serial-parallel transformation circuit, an amplification/inversion circuit, a rotation circuit, a gamma correction circuit and a clamp circuit. The displayinformation processing circuit 71 processes inputted display information and supplies the image signal to the drivingcircuit 76 with the clock signal CLK. Thepower source circuit 72 supplies a predetermined voltage to the constitutional elements. - FIG. 16(A) illustrates a portable personal computer as one example of the electronic apparatus according to the invention. The
personal computer 80 shown here includes amain body unit 82 having akeyboard 81 and a liquidcrystal display unit 83. The liquidcrystal display unit 83 includes the aforementioned active matrix type electro-optical device 100. - FIG. 16(B) illustrates a cellular phone as another example of the electronic apparatus according to the invention. The
cellular phone 90 includes a plurality ofoperation buttons 91 and a display unit including the aforementioned active matrix type electro-optical device 100. - As discussed above, in accordance with the present invention, the contact-hole formation positions are different in each pixel, and thus the contact holes are not repeated in the same positions of the pixels when the electro-optical device is viewed from any angle. Even if the light-reflecting film is formed in the contact hole, interference due to the reflected light from the slanted part of the inner wall of the contact hole does not occur.
- While this invention has been described in conjunction with specific embodiments thereof, it is evident that many alternatives, modifications, and variations will be apparent to those skilled in the art. Accordingly, preferred embodiments of the invention as set forth herein are intended to be illustrative, not limiting. Various changes may be made without departing from the spirit and scope of the invention.
Claims (16)
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US10/673,243 Expired - Lifetime US7157739B2 (en) | 2002-09-30 | 2003-09-30 | Active matrix type electro-optical device with patterns of contact hole formation-positions and electronic apparatus |
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US (1) | US7157739B2 (en) |
KR (1) | KR100575575B1 (en) |
CN (1) | CN1266534C (en) |
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US20170084870A1 (en) * | 2015-09-18 | 2017-03-23 | Samsung Display Co., Ltd. | Organic light emitting device and display device including same |
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US8093803B2 (en) * | 2009-03-17 | 2012-01-10 | Seiko Epson Corporation | Electro-optical device, electronic device, and method for manufacturing electro-optical device |
CN109884831A (en) * | 2019-03-06 | 2019-06-14 | 京东方科技集团股份有限公司 | Reflection type display device, display panel and its manufacturing method |
GB2610736A (en) * | 2020-12-25 | 2023-03-15 | Boe Technology Group Co Ltd | Display substrate, display panel, and display apparatus |
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US20020070454A1 (en) * | 2000-11-30 | 2002-06-13 | Seiko Epson Corporation | SOI substrate, element substrate, semiconductor device, electro-optical apparatus, electronic equipment, method of manufacturing the SOI substrate, method of manufacturing the element substrate, and method of manufacturing the electro-optical apparatus |
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JP3213242B2 (en) | 1996-10-23 | 2001-10-02 | シャープ株式会社 | Reflection plate, reflection type liquid crystal display device and method of manufacturing the same |
JP3203331B2 (en) | 1998-05-29 | 2001-08-27 | 松下電器産業株式会社 | Reflective liquid crystal display |
JP3308498B2 (en) | 1998-07-31 | 2002-07-29 | 富士通株式会社 | LCD panel |
JP2000221494A (en) | 1999-01-28 | 2000-08-11 | Kyocera Corp | Reflective liquid crystal display device |
JP3471246B2 (en) | 1999-03-29 | 2003-12-02 | シャープ株式会社 | Manufacturing method of liquid crystal display device |
JP3372907B2 (en) | 1999-09-10 | 2003-02-04 | 京セラ株式会社 | Manufacturing method of liquid crystal display device |
JP3962191B2 (en) | 1999-11-29 | 2007-08-22 | 旭硝子株式会社 | Manufacturing method of light-reflective substrate and reflection type liquid crystal display device using the same |
JP2001194662A (en) | 2000-01-14 | 2001-07-19 | Nec Corp | Reflection type liquid crystal display device and its manufacturing method |
JP2001215529A (en) | 2000-02-03 | 2001-08-10 | Matsushita Electric Ind Co Ltd | Reflection type liquid crystal display device |
JP2002014211A (en) | 2000-04-24 | 2002-01-18 | Matsushita Electric Ind Co Ltd | Reflector, reflection type liquid crystal display device, its manufacturing method, optical member, display device, illuminator and wave member |
JP3365409B2 (en) | 2000-11-08 | 2003-01-14 | 日本電気株式会社 | Reflector, reflection type liquid crystal display device and method for manufacturing the same |
JP4993830B2 (en) | 2000-11-11 | 2012-08-08 | 三星電子株式会社 | Reflective liquid crystal display device and manufacturing method thereof |
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JP3866522B2 (en) | 2001-02-14 | 2007-01-10 | 日本電気株式会社 | Active matrix liquid crystal display device and manufacturing method thereof |
JP2002258320A (en) | 2001-02-28 | 2002-09-11 | Nec Corp | Liquid crystal display device |
JP3990141B2 (en) | 2001-11-08 | 2007-10-10 | Nec液晶テクノロジー株式会社 | Liquid crystal display |
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- 2003-08-27 TW TW092123646A patent/TWI227460B/en not_active IP Right Cessation
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US20020070454A1 (en) * | 2000-11-30 | 2002-06-13 | Seiko Epson Corporation | SOI substrate, element substrate, semiconductor device, electro-optical apparatus, electronic equipment, method of manufacturing the SOI substrate, method of manufacturing the element substrate, and method of manufacturing the electro-optical apparatus |
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US20170084870A1 (en) * | 2015-09-18 | 2017-03-23 | Samsung Display Co., Ltd. | Organic light emitting device and display device including same |
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US7157739B2 (en) | 2007-01-02 |
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