US20030136481A1 - Ti-Ni-based shape-memory alloy and method of manufacturing same - Google Patents
Ti-Ni-based shape-memory alloy and method of manufacturing same Download PDFInfo
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- US20030136481A1 US20030136481A1 US10/281,143 US28114302A US2003136481A1 US 20030136481 A1 US20030136481 A1 US 20030136481A1 US 28114302 A US28114302 A US 28114302A US 2003136481 A1 US2003136481 A1 US 2003136481A1
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- 229910004337 Ti-Ni Inorganic materials 0.000 title claims abstract description 17
- 229910011209 Ti—Ni Inorganic materials 0.000 title claims abstract description 17
- KHYBPSFKEHXSLX-UHFFFAOYSA-N iminotitanium Chemical compound [Ti]=N KHYBPSFKEHXSLX-UHFFFAOYSA-N 0.000 title claims abstract description 17
- 229910001285 shape-memory alloy Inorganic materials 0.000 title claims abstract description 9
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000002244 precipitate Substances 0.000 claims abstract description 16
- 239000010936 titanium Substances 0.000 claims abstract description 8
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 6
- 230000001427 coherent effect Effects 0.000 claims abstract description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 19
- 239000000956 alloy Substances 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 16
- 239000010409 thin film Substances 0.000 claims description 12
- 239000000203 mixture Substances 0.000 abstract description 6
- 229910000808 amorphous metal alloy Inorganic materials 0.000 abstract description 3
- 238000011084 recovery Methods 0.000 description 9
- 230000035882 stress Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000001000 micrograph Methods 0.000 description 3
- 238000000137 annealing Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000006355 external stress Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 229910002070 thin film alloy Inorganic materials 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C14/00—Alloys based on titanium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/10—Amorphous alloys with molybdenum, tungsten, niobium, tantalum, titanium, or zirconium or Hf as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/006—Resulting in heat recoverable alloys with a memory effect
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/89—Deposition of materials, e.g. coating, cvd, or ald
- Y10S977/891—Vapor phase deposition
Definitions
- the present invention relates to a Ti—Ni-based shape-memory alloy and a method of manufacturing same. More particularly, the present invention relates to a novel Ti—Ni-based shape-memory alloy which is useful as an actuator for a micro-valve or a micro-machine without the need for a strict control of composition and which has a largely improved shape-memory property, and a method of manufacturing same.
- Ti—Ni-based alloy As an alloy having shape-memory properties, Ti—Ni-based alloy has conventionally been known. A method of manufacturing this Ti—Ni-based alloy into a thin-film alloy is also known.
- the thin-film shape-memory alloy is expected to be applicable to various precision areas.
- a method for improving shape-memory properties such as shape recovering ability and recovery strain is known, which comprises crystallizing an amorphous alloy thin film vapor-deposited by sputtering, for example, by annealing the thin film at a temperature higher than the crystallization temperature, and then heat-treating the film at various temperatures.
- the conventional technique has problems such that the improving effect of shape-memory properties is not sufficient, that the above-mentioned method for improving these properties requires strict control of the chemical composition of the Ti—Ni-based alloy, and furthermore, that two-stage heat treatments are required. Under such circumstances, therefore, it is very difficult even to obtain a limited improvement of shape-memory properties and to reduce the manufacturing cost.
- the present invention has an object to provide a novel Ti—Ni-based shape-memory alloy which overcomes these drawbacks in the conventional technology as described above and allows remarkable improvement of shape-memory properties by a simple means, and a method of manufacturing same.
- the present invention provides a Ti—Ni-based shape-memory alloy having a titanium content within a range of from 50 to 66 atomic %, wherein subnanometric precipitates generating coherent elastic strains in the parent phase are distributed.
- the present invention provides also a method of manufacturing the above-mentioned alloy, which comprises the step of heat-treating an amorphous Ti—Ni-based alloy at a temperature within a range of from 600 to 800 K.
- FIG. 1 shows a high-resolution electron photomicrograph illustrating the structure of an alloy thin film as an example of the present invention.
- FIG. 2 shows an enlarged micrograph of the framed region of FIG. 1, revealing subnanometric plate precipitates and coherent elastic strains.
- FIG. 3 shows various curves illustrating the results of thermal cycle tests under constant loads.
- FIG. 4 shows a curve illustrating the relationship between maximum shape recovery strain and the heat treatment temperature.
- FIG. 5 shows the relationship between a load (external stress) and shape recovery strain for various heat treatment temperature.
- FIG. 6 shows the relationship between critical stress for slip and the heat treatment temperature.
- the present invention makes it possible to remarkably improve shape-memory properties such as shape recovering ability and recovery strain through the construction as described above.
- a special nanometer-scale precipitate is distributed in the parent phase thereof, and this precipitate produces a coherent elastic strain between the precipitate and the parent phase.
- coherent elastic strain means an elastic strain caused by connection of the slightly different crystal lattice of the precipitate with that of the parent phase.
- an alloy having such a feature is manufactured by applying a heat treatment to an amorphous alloy at a temperature within a range of from 600 to 800 K.
- the heat treatment temperature is limited within the range of from 600 to 800 K, and the specimen must be heated directly from the amorphous state, in the present case, from the as-deposited state.
- Typical heat treatment conditions are, for example, as follows:
- Atmosphere Vacuum or an inert gas such as argon
- Heating rate 5 to 50 K/minute
- Cooling Rapid cooling.
- the amorphous Ti—Ni-based alloy may be manufactured, for example, by the vapor deposition process into a thin film, or by any other appropriate method, and there is no particular limitation in this respect.
- the alloy of the invention in the form of a thin film is expected to be used in such applications as an actuator for a micro-valve or a micro-machine hereafter, and is therefore a very important material.
- the manufacturable thin film thickness covers a range from under 5 ⁇ m to 10 ⁇ m in general.
- FIG. 1 illustrates an example of electronmicrograph thereof.
- FIG. 2 is an enlarged micrograph thereof.
- a number of thin plate precipitates are produced and distributed in the parent phase. These precipitates appear along the ⁇ 100 ⁇ bcc plane of the parent phase bcc(B2 type), and take the form of a disk having a thickness of about 0.5 nm (2 to 3 lattice planes) and a radius of from about 5 to 10 nm.
- the precipitates are distributed at intervals of about 10 nm, i.e., in a nanometer scale.
- the precipitate was confirmed to be Ti-rich by EDS analysis of field emission electron microscope.
- FIG. 3 shows the result. As shown in this figure, there is no permanent strain under loads of up to 240 MPa, and a large shape recovery strain as 6% is available.
- FIG. 4 illustrates the result of evaluation of the relationship between the heat-treatment temperature and the maximum shape recovery strain, indicating availability of a recovery strain of 5 to 6% through an annealing at a temperature within a range of from 700 to 800 K.
- FIG. 5 shows the relationship between shape recovery strain and stress under load, various heat treatments.
- FIG. 5 reveals that a recovery strain of at least 4.5% is obtained with a stress range of from 200 to 670 MPa.
- the maximum loadable stress is 670 MPa.
- FIG. 6 illustrates the effect of the heat-treatment temperature on the maximum stress loadable within a range in which a permanent strain (slip deformation) is not introduced into the sample.
- shape-memory properties are remarkably improved through a heat-treatment at a temperature of from 600 to 800 K without the need for strictly controlling the composition or heat treatment. It is also possible to largely reduce the manufacturing cost.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Micromachines (AREA)
Abstract
To remarkably improve shape-memory properties without the need for strictly controlling the composition, the present invention provides a Ti—Ni-based shape-memory alloy having a titanium content within a range of from 50 to 55 atomic %, which comprises an amorphous alloy heat-treated at a temperature of from 600 to 800 K, in which subnanometric precipitates generating coherent elastic strains are formed and distributed in the bcc parent phase(B2).
Description
- This is a divisional of Ser. No. 08/768,467, filed Dec. 18, 1996.
- The present invention relates to a Ti—Ni-based shape-memory alloy and a method of manufacturing same. More particularly, the present invention relates to a novel Ti—Ni-based shape-memory alloy which is useful as an actuator for a micro-valve or a micro-machine without the need for a strict control of composition and which has a largely improved shape-memory property, and a method of manufacturing same.
- As an alloy having shape-memory properties, Ti—Ni-based alloy has conventionally been known. A method of manufacturing this Ti—Ni-based alloy into a thin-film alloy is also known.
- The thin-film shape-memory alloy is expected to be applicable to various precision areas. In the case of Ti—Ni-based shape-memory alloy thin film, a method for improving shape-memory properties such as shape recovering ability and recovery strain is known, which comprises crystallizing an amorphous alloy thin film vapor-deposited by sputtering, for example, by annealing the thin film at a temperature higher than the crystallization temperature, and then heat-treating the film at various temperatures.
- However, the conventional technique has problems such that the improving effect of shape-memory properties is not sufficient, that the above-mentioned method for improving these properties requires strict control of the chemical composition of the Ti—Ni-based alloy, and furthermore, that two-stage heat treatments are required. Under such circumstances, therefore, it is very difficult even to obtain a limited improvement of shape-memory properties and to reduce the manufacturing cost.
- Therefore, the present invention has an object to provide a novel Ti—Ni-based shape-memory alloy which overcomes these drawbacks in the conventional technology as described above and allows remarkable improvement of shape-memory properties by a simple means, and a method of manufacturing same.
- As means to solve the above-mentioned problems, the present invention provides a Ti—Ni-based shape-memory alloy having a titanium content within a range of from 50 to 66 atomic %, wherein subnanometric precipitates generating coherent elastic strains in the parent phase are distributed.
- Further, the present invention provides also a method of manufacturing the above-mentioned alloy, which comprises the step of heat-treating an amorphous Ti—Ni-based alloy at a temperature within a range of from 600 to 800 K.
- FIG. 1 shows a high-resolution electron photomicrograph illustrating the structure of an alloy thin film as an example of the present invention.
- FIG. 2 shows an enlarged micrograph of the framed region of FIG. 1, revealing subnanometric plate precipitates and coherent elastic strains.
- FIG. 3 shows various curves illustrating the results of thermal cycle tests under constant loads.
- FIG. 4 shows a curve illustrating the relationship between maximum shape recovery strain and the heat treatment temperature.
- FIG. 5 shows the relationship between a load (external stress) and shape recovery strain for various heat treatment temperature.
- FIG. 6 shows the relationship between critical stress for slip and the heat treatment temperature.
- The present invention makes it possible to remarkably improve shape-memory properties such as shape recovering ability and recovery strain through the construction as described above.
- As to the chemical composition itself of the alloy, other elements may be added or mixed as impurities to this alloy comprising Ti (titanium) and Ni (nickel), so far as these elements do not impair the shape-memory properties of the invention.
- With a titanium content of under 50 atomic %, it becomes difficult to achieve the object of the invention, and it is also the case with a titanium content of over 66 atomic %.
- In the target alloy, a special nanometer-scale precipitate is distributed in the parent phase thereof, and this precipitate produces a coherent elastic strain between the precipitate and the parent phase. The term “coherent elastic strain” as herein used means an elastic strain caused by connection of the slightly different crystal lattice of the precipitate with that of the parent phase. In the present invention, an alloy having such a feature is manufactured by applying a heat treatment to an amorphous alloy at a temperature within a range of from 600 to 800 K.
- The heat treatment temperature is limited within the range of from 600 to 800 K, and the specimen must be heated directly from the amorphous state, in the present case, from the as-deposited state. Typical heat treatment conditions are, for example, as follows:
- Time: 10 minutes to 3 hours
- Atmosphere: Vacuum or an inert gas such as argon
- Heating rate: 5 to 50 K/minute
- Cooling: Rapid cooling.
- Needless to mention, these conditions are not limitative. In the already crystallized Ti—Ni-based alloy, generation and distribution of the above-mentioned precipitate are not observed by this heat treatment, and a remarkable improvement of properties is unavailable. With a temperature of over 800 K, an appropriate precipitate is not formed. With a temperature of under 600 K, diffusion of atoms becomes slower, and no precipitate is generated within a practicable period of time. In both cases, a remarkable improving effect of the properties is unavailable.
- The amorphous Ti—Ni-based alloy may be manufactured, for example, by the vapor deposition process into a thin film, or by any other appropriate method, and there is no particular limitation in this respect.
- It should particularly be noted that the alloy of the invention in the form of a thin film is expected to be used in such applications as an actuator for a micro-valve or a micro-machine hereafter, and is therefore a very important material. The manufacturable thin film thickness covers a range from under 5 μm to 10 μm in general.
- The alloy and the manufacturing method thereof of the present invention are now described further in detail by means of examples. The invention is not, however, limited by the following examples.
- Using a Ti—Ni target material, thin films of an amorphous Ti—Ni alloy containing 48.2 atomic % Ni were formed on a glass substrate by argon ion sputtering. The thickness of the films was about 7 μm and its composition was determined by electron probe X-ray microanalysis.
- A thin film heat-treated at 745 K for 1 hr was observed by means of a high-resolution electron microscope. FIG. 1 illustrates an example of electronmicrograph thereof. FIG. 2 is an enlarged micrograph thereof. As is known from the micrographs of FIGS. 1 and 2, a number of thin plate precipitates are produced and distributed in the parent phase. These precipitates appear along the {100}bcc plane of the parent phase bcc(B2 type), and take the form of a disk having a thickness of about 0.5 nm (2 to 3 lattice planes) and a radius of from about 5 to 10 nm. The precipitates are distributed at intervals of about 10 nm, i.e., in a nanometer scale. The precipitate was confirmed to be Ti-rich by EDS analysis of field emission electron microscope.
- For a specimen heat-treated at 765 K for 1 hr, changes in elongation were evaluated through thermal cycles under various loads. This specimen contained the same kind of precipitates as mentioned above. FIG. 3 shows the result. As shown in this figure, there is no permanent strain under loads of up to 240 MPa, and a large shape recovery strain as 6% is available.
- FIG. 4 illustrates the result of evaluation of the relationship between the heat-treatment temperature and the maximum shape recovery strain, indicating availability of a recovery strain of 5 to 6% through an annealing at a temperature within a range of from 700 to 800 K.
- FIG. 5 shows the relationship between shape recovery strain and stress under load, various heat treatments.
- FIG. 5 reveals that a recovery strain of at least 4.5% is obtained with a stress range of from 200 to 670 MPa. The maximum loadable stress is 670 MPa.
- FIG. 6 illustrates the effect of the heat-treatment temperature on the maximum stress loadable within a range in which a permanent strain (slip deformation) is not introduced into the sample.
- It is confirmed, from the example as described above, that the invention permits remarkable improvement of shape-memory properties as compared with the conventional process.
- According to the present invention, shape-memory properties are remarkably improved through a heat-treatment at a temperature of from 600 to 800 K without the need for strictly controlling the composition or heat treatment. It is also possible to largely reduce the manufacturing cost.
Claims (4)
1. A method of manufacturing a Ti—Ni-based shape-memory alloy having a titanium content within a range of from 50 to 66 atomic %, which comprises the step of forming and distributing a nanometer-scale precipitate generating a coherent elastic strain in a mother phase through a heat treatment of an amorphous Ti—Ni-based alloy at a temperature within a range of from 600 to 800 K.
2. The manufacturing method as claimed in claim 1 , wherein said heat treatment is carried out in a single run.
3. The manufacturing method as claimed in claim 1 , wherein said alloy is in a thin film shape.
4. The manufacturing method as claimed in claim 2 , wherein said alloy is in a thin film shape.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/281,143 US20030136481A1 (en) | 1996-03-22 | 2002-10-28 | Ti-Ni-based shape-memory alloy and method of manufacturing same |
US10/810,838 US20040177904A1 (en) | 1996-03-22 | 2004-03-29 | Ti-Ni-based shape-memory alloy and method of manufacturing same |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP066820/1996 | 1996-03-22 | ||
JP8066820A JP2899682B2 (en) | 1996-03-22 | 1996-03-22 | Ti-Ni based shape memory alloy and method for producing the same |
US08/768,467 US6001195A (en) | 1996-03-22 | 1996-12-18 | Ti-Ni-based shape-memory alloy and method of manufacturing same |
US32501799A | 1999-06-03 | 1999-06-03 | |
US09/808,046 US20010009169A1 (en) | 1996-03-22 | 2001-03-15 | Ti-Ni-based shape-memory alloy and method of manufacturing same |
US10/281,143 US20030136481A1 (en) | 1996-03-22 | 2002-10-28 | Ti-Ni-based shape-memory alloy and method of manufacturing same |
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US09/808,046 Continuation US20010009169A1 (en) | 1996-03-22 | 2001-03-15 | Ti-Ni-based shape-memory alloy and method of manufacturing same |
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US10/810,838 Continuation US20040177904A1 (en) | 1996-03-22 | 2004-03-29 | Ti-Ni-based shape-memory alloy and method of manufacturing same |
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US08/768,467 Expired - Fee Related US6001195A (en) | 1996-03-22 | 1996-12-18 | Ti-Ni-based shape-memory alloy and method of manufacturing same |
US09/808,046 Abandoned US20010009169A1 (en) | 1996-03-22 | 2001-03-15 | Ti-Ni-based shape-memory alloy and method of manufacturing same |
US10/281,143 Abandoned US20030136481A1 (en) | 1996-03-22 | 2002-10-28 | Ti-Ni-based shape-memory alloy and method of manufacturing same |
US10/810,838 Abandoned US20040177904A1 (en) | 1996-03-22 | 2004-03-29 | Ti-Ni-based shape-memory alloy and method of manufacturing same |
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US08/768,467 Expired - Fee Related US6001195A (en) | 1996-03-22 | 1996-12-18 | Ti-Ni-based shape-memory alloy and method of manufacturing same |
US09/808,046 Abandoned US20010009169A1 (en) | 1996-03-22 | 2001-03-15 | Ti-Ni-based shape-memory alloy and method of manufacturing same |
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1996
- 1996-03-22 JP JP8066820A patent/JP2899682B2/en not_active Expired - Lifetime
- 1996-12-18 US US08/768,467 patent/US6001195A/en not_active Expired - Fee Related
-
2001
- 2001-03-15 US US09/808,046 patent/US20010009169A1/en not_active Abandoned
-
2002
- 2002-10-28 US US10/281,143 patent/US20030136481A1/en not_active Abandoned
-
2004
- 2004-03-29 US US10/810,838 patent/US20040177904A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP2899682B2 (en) | 1999-06-02 |
US20040177904A1 (en) | 2004-09-16 |
US6001195A (en) | 1999-12-14 |
US20010009169A1 (en) | 2001-07-26 |
JPH09256086A (en) | 1997-09-30 |
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