US20010053964A1 - Method of forming a pattern using proximity-effect-correction - Google Patents
Method of forming a pattern using proximity-effect-correction Download PDFInfo
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- US20010053964A1 US20010053964A1 US09/116,375 US11637598A US2001053964A1 US 20010053964 A1 US20010053964 A1 US 20010053964A1 US 11637598 A US11637598 A US 11637598A US 2001053964 A1 US2001053964 A1 US 2001053964A1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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Definitions
- the present invention relates to a system and method for correcting pattern data of an integrated circuit or the like so as to cancel the light proximity effects.
- the present invention also relates to a method of forming a pattern using such a method for correcting the light proximity effects.
- an LSI pattern such as that shown in FIG. 29A is designed using a CAD system or a similar tool and corresponding LSI pattern data is produced.
- the designed LSI pattern includes a plurality of rectangular patterns 291 .
- Electron beam exposure is then performed according to the designed pattern data so as to produce a mask including a plurality of patterns 292 as shown in FIG. 29B.
- a wafer is exposed to ultraviolet light through the mask thereby transferring the pattern 292 formed on the mask onto the wafer.
- the pattern transferred to the wafer becomes different from the mask pattern consisting of rectangular patterns 292 owing to diffraction of light in that corners of rectangles are rounded as shown in FIG. 29C. If the wafer is etched or subjected to a similar process using the transferred pattern 293 , then the resultant pattern 294 formed on the wafer has further deformation due to the micro coding effect as shown in FIG. 29D. If the wafer is then subjected to an oxidation process to form a LOCOS isolation structure, the pattern is deformed further owing to the so-called bird's beak effect.
- a light proximity correction system including: a design data input unit for inputting design data of a circuit pattern; a data compression unit for compressing the design data input via the design data input unit; an optical image formation unit for forming an optical projection image used to transfer a pattern onto a wafer according to the design data input via the design data input unit; a prediction unit for predicting the size of the pattern which will be transferred onto the wafer, the prediction being performed on the basis of the projection image formed by the optical image formation unit; a comparison unit for calculating the difference between the size of the transferred pattern predicted by the prediction unit and the size of the pattern designated by the design data input via the design data input unit; a correction unit for correcting the design data compressed by the data compression unit by an amount equal to the difference determined by the comparison unit; a data expansion unit for expanding the data corrected by the correction unit; and a corrected data output unit for outputting the data expanded by the data expansion unit.
- a light proximity correction method including the steps of: compressing design data of a circuit pattern; forming an optical projection image used to transfer a pattern onto a wafer according to the design data; predicting the size of the pattern which will be transferred onto the wafer, the prediction being performed on the basis of the projection image formed in the previous step; correcting the design data by an amount equal to the difference between the predicted size of the transferred pattern and the size of the pattern designated by the design data; expanding the corrected data; and outputting the expanded data.
- a method of forming a pattern including the steps of: correcting the light proximity effect which occurs during a process of transferring a pattern onto a wafer, the correction of the light proximity effect being performed on the basis of design data of a circuit pattern, thereby generating corrected data; performing electron beam exposure according to the corrected data thereby producing a mask pattern; performing light exposure through the mask pattern thereby transferring the mask pattern onto a wafer; and processing the wafer using the transferred mask pattern.
- FIGS. 1A to 1 E are schematic representations of a series of processing steps of forming a pattern according to a first embodiment of the present invention
- FIG. 2 is a block diagram of a light proximity correction system according to a second embodiment of the present invention.
- FIG. 3 is a flow chart illustrating an operation relating to the second embodiment of the present invention.
- FIG. 4 is a block diagram of a light proximity correction system according to a third embodiment of the present invention.
- FIG. 5 is a flow chart illustrating an operation relating to the third embodiment of the present invention.
- FIGS. 6, 7A, and 7 B are schematic representations of correction methods according to fourth and fifth embodiments, respectively, of the present invention.
- FIGS. 8A to 13 B are schematic representations of correction methods according to seventh to twelfth embodiments, respectively, of the present invention.
- FIGS. 14 and 15 are block diagrams of an optical image calculation unit and an optical image measurement unit, respectively, of a correction system according to a third embodiment of the present invention.
- FIG. 16 is a schematic representation of a correction method according to a twenty-second embodiment of the present invention.
- FIGS. 17A to 18 B are schematic representations of a correction method according to a twenty-third embodiment of the present invention.
- FIGS. 19A to 21 are schematic representations of correction methods according to twenty-seventh to twenty-ninth embodiments, respectively, of the present invention.
- FIGS. 22 to 28 B are schematic representations of correction methods according to thirty-third to thirty-ninth embodiments, respectively, of the present invention.
- FIGS. 29A to 29 D are schematic representations of a series of processing steps of forming a pattern according to a conventional technique
- FIG. 30 is a schematic representation of a correction method according to the thirteenth embodiment of the present invention.
- FIG. 31 is a schematic representation of a correction method according to the fourteenth embodiment of the present invention.
- FIG. 32 is a schematic representation of a correction method modified from the fourteenth embodiment of the present invention.
- FIGS. 33 and 34 are schematic representations of a correction method according to a twenty-fourth embodiment of the present invention.
- FIGS. 35A to 36 are schematic representations of correction methods according to twenty-fifth and twenty-sixth embodiments, respectively, of the present invention.
- FIGS. 37A to 39 C are schematic representations of correction methods according to thirtieth and thirty-second embodiments, respectively, of the present invention.
- FIGS. 40A and 40C are schematic representations of a correction method according to a forty-second embodiment of the present invention.
- FIGS. 41A and 44B are schematic representations of a correction method according to a sixth embodiment of the present invention.
- FIG. 45 is a schematic representation of a correction method according to a fifteenth embodiment of the present invention.
- FIG. 46 is a schematic representation of a correction method modified from the fifteenth embodiment of the present invention.
- FIGS. 47 and 48 are schematic representations of correction methods according to a sixteenth and seventeenth embodiments, respectively, of the present invention.
- FIG. 49 is a schematic representation of a correction method according to an eighteenth embodiment of the present invention.
- FIG. 50 is a schematic representation of a correction method modified from the eighteenth embodiment of the present invention.
- FIG. 51 is a schematic representation of a correction method according to a nineteenth embodiment of the present invention.
- FIG. 52 is a schematic representation of a correction method according to a twentieth embodiment of the present invention.
- FIG. 53 is a schematic representation of a correction method modified from the twentieth embodiment of the present invention.
- FIG. 54 is a schematic representation of a correction method according to a forty-first embodiment of the present invention.
- FIG. 1 is a schematic diagram illustrating a series of processing steps for forming a pattern according to a first embodiment of the present invention.
- an LSI pattern such as that shown in FIG. 1A is designed using a CAD system or a similar tool so as to produce corresponding LSI pattern data consisting of a plurality of rectangular patterns 11 .
- the designed data is then corrected according to the light proximity correction method which will be described in detail later so as to obtain light-proximity-corrected data as shown in FIG. 1B.
- the light-proximity-corrected data consists of a plurality of patterns 12 corresponding to the plurality of rectangular patterns 11 in the design data wherein each pattern 12 has auxiliary patterns 121 added at each corner so as to correct for pattern deformation due to diffraction of light which occurs during a process for transferring the pattern onto a wafer.
- Electron beam exposure is then performed using the light-proximity-corrected data described above so that a mask including a plurality of patterns 13 is produced as shown in FIG. 1C.
- a wafer is then exposed to ultraviolet light through this mask thereby transferring the patterns 13 formed on the mask onto the wafer.
- FIG. 1D patterns 14 are formed on the wafer in such a manner that the auxiliary patterns disposed at four corners at each rectangle are removed as a result of diffraction of light and thus the resultant shape of each pattern 14 becomes a rectangle.
- the etched patterns 15 become such as those shown in FIG. 1E.
- the etched patterns 15 differ from the transferred patterns 14 shown in FIG. 1D owing to the micro loading effect, the deformation is much smaller and thus the pattern is much closer to the design pattern than in the case of the pattern 294 shown in FIG. 29D which is formed according to the conventional technique.
- the final pattern has higher accuracy than the pattern formed according to the conventional technique.
- FIG. 2 is a block diagram illustrating a light proximity correction system used to accomplish the light proximity correction in the pattern formation process described in the first embodiment.
- Design data of an integrated circuit pattern produced with a CAD system is input to the systems via a design data input unit 1 .
- the design data input unit 1 is connected to a data compression unit 2 which performs data compression, in an pre-processing step, on the input data.
- the output of the data compression unit 2 is connected to an optical image calculation unit 3 for calculating an image which will be projected onto a wafer in a pattern transfer process.
- the output of the optical image calculation unit 3 is connected to a pattern prediction unit 4 for predicting the pattern which will be formed in a resist as a result of the pattern transfer process.
- the pattern prediction unit 4 and the design data input unit 1 are connected to a comparison unit 5 for comparing the predicted pattern with the design data.
- the output of the comparison unit 5 is connected to a correction unit 6 for performing light proximity correction.
- the output of the correction unit 6 is connected to a judgement unit 7 for judging whether the correction amount is within an allowable range.
- the output of the judgement unit is connected to a data expansion unit 8 for expanding the data.
- the output of the data expansion unit 8 is connected to a correction data output unit 9 .
- the output of the judgement unit 7 is also connected to the optical image calculation unit 3 .
- the optical image calculation unit 3 serves as an optical image formation unit defined above in the first aspect of the invention.
- FIG. 3 is a flow chart illustrating the correction method using the light proximity correction system described above.
- Design data produced with a CAD system or the like is input via the design data input unit 1 , and then compressed by the data compression unit 2 in a pre-processing step (step S 1 ).
- the optical image calculation unit 3 then calculates an image which will be projected onto a wafer from the compressed data (step S 2 ).
- the pattern prediction unit 4 predicts the size of a pattern which will be finally obtained after a pattern transfer process (step S 3 ).
- the comparison unit 5 compares the predicted pattern size with the size of the designed pattern which was input via the design data input unit 1 , and outputs an correction amount which is a difference between the predicted pattern size and the designed value (step S 4 ).
- the correction unit 6 corrects the compressed data according to the correction amount given by the comparison unit 5 (step S 5 ).
- the judgement unit 7 judges whether the correction amount is within the predefined allowable range (step S 6 ). If the correction amount is not within the allowable range, it is considered that the correction is not good enough, and thus the process returns to step S 2 so as to calculate the projection image again and correct the data again in steps S 3 to S 5 . Steps S 2 to S 6 are performed repeatedly until the correction value falls within the allowable range. If it is concluded in step S 6 that the correction amount has fallen within the allowable range, it is considered that the light proximity correction is properly completed. Thus the data expansion unit 8 expands the data (step S 7 ) and the corrected data is output via the correction data output unit 9 (step S 8 ). The corrected data is input to an electron beam exposure apparatus (not shown) for producing a mask.
- FIG. 4 is a block diagram of a light proximity correction system according to a third embodiment of the present invention.
- This system according to the third embodiment is the same as that according to the first embodiment shown in FIG. 2 except that the optical image calculation unit 3 is replaced by an optical image measurement unit 10 serving as the optical image formation unit defined in the first aspect of the invention.
- the optical image measurement unit 10 includes an optical system for measuring the image projected onto a wafer via a mask produced according to the design data.
- the pattern image which will be projected onto a wafer is calculated in step S 2 by means of software with the optical image calculation unit 3 from the compressed data.
- the projected image is measured by means of hardware with the optical image measurement unit 10 in step S 9 after the data compression in step S 1 , as shown in FIG. 5.
- steps S 1 , S 3 to S 8 are the same as the corresponding steps of the second embodiment.
- optical system of the optical image measurement unit 10 is constructed so that the requirements described below are satisfied:
- ⁇ 1, ⁇ 1, m1, and NA1 are parameters relating to a stepper (step-and-repeat projection tool) wherein ⁇ 1 is the wavelength of light, ⁇ 1 is the spatial coherence, m1 is the magnification, and NA1 is the numerical aperture, and ⁇ 2, ⁇ 2, m2, and NA2 are parameters relating to the optical system of the optical image measurement unit 10 wherein ⁇ 2 is the wavelength of light, ⁇ 2 is the spatial coherence, m2 is the magnification, and NA2 is the numerical aperture.
- the employment of such an optical system allows high accuracy measurement of the diffraction effects of light arising in the pattern transfer process and it is possible to reduce the time required to perform the correction process.
- the data compression unit 2 may divide the design data into a plurality of data blocks 6 a to 6 i as shown in FIG. 6 so that optical proximity correction is performed separately for each of the data blocks.
- a buffer area is disposed around each data block so that the influence of pattern elements in neighboring data blocks can be taken into account via the buffer areas in the correction of pattern elements included in each data block.
- FIG. 6 for example, there is a buffer area 60 e around a data block 6 e. It is judged whether the buffer area 60 e include some pattern elements that can have proximity effects on pattern elements in the data block 6 .
- the data compression unit 2 calculates the distance between a side and another side facing the former side for every side and for every pattern element in each data block described in the fourth embodiment so as to check whether there is a data block which includes sides the distance between which is less than a predetermined threshold. If it turns out that some data blocks include such sides, then those data blocks are subjected to the correction process whereas data blocks including no such sides are not subjected to the correction process. In the example of a data block shown in FIG. 7A including patterns 7 a and 7 b, whereas the distance A is large, distances B and C are smaller than the threshold, and thus light proximity correction should be performed on this data block. Therefore, this data block is subjected to the correction process.
- FIG. 41A illustrate a diffraction pattern of a variable light source having a light shielding part in the form of straight lines
- FIG. 41B illustrate a diffraction pattern of a variable light source having a light shielding part in the form of crosses.
- the diffraction patterns are of a zeroth-order light source image 411 or 421 and first-order light source images 412 or 422 formed on the pupil plane 410 wherein these figures describe diffraction patterns under the critical conditions where two-light-ray interference occurs between the zeroth-order light source image 411 or 421 and either one of two first-order light source images 412 , 422 .
- the period L2 corresponding to the cutoff frequency of the two-light-ray interference can be described as follows:
- ⁇ is the wavelength of light
- ⁇ is the spatial coherence
- NA is the numerical aperture
- FIGS. 41C and 41D illustrates diffraction patterns of variable light sources having light shielding parts in the forms of straight lines and crosses, respectively, for the cases of critical conditions in which three-light-ray interference occurs among the zeroth-order light source image 411 or 421 and first-order light source images 412 and 413 or 422 and 423 formed on the pupil plane 410 .
- the period L3 corresponding to the cutoff frequency of the three-light-ray interference can be described as follows:
- ⁇ b is the spatial coherence of the light source image associated with the light shielding part.
- FIG. 42A illustrates the light proximity effects on the finally-obtained width of lines having a width of 0.35 ⁇ m for various space widths when a normal light source is used
- FIG. 42B illustrates the light proximity effects on the finally-obtained width of spaces having a width of 0.35 ⁇ m for various line widths.
- “small” denotes a pattern having a size smaller than the period L2. The conditions are adjusted using a “small” pattern so that the finally-obtained line and space widths of such small patterns are maintained unchanged without being influenced by the light proximity effects.
- the “middle” pattern refers to a pattern having a size in the range from the period L2 to L3, and the “large” pattern refers to a pattern having a size greater than the period L3.
- the finally-obtained line and space widths become different from the designed values. Therefore, light proximity correction is required for the conditions where the line or space width is equal to the “middle” or “large” pattern, as represented by symbols in FIG. 44A.
- FIGS. 43A and 43B illustrate the light proximity effects for the cases where a variable light source is used.
- “small”, “middle”, and “large” patterns refer to those patterns having sizes less than the period L2, in the range from the period L2 to L3, and greater than the period L3, respectively, as in the case of the normal light source described above.
- the conditions are also adjusted using a “small” pattern so that the finally-obtained line and space widths of such small patterns are maintained unchanged without being influenced by the light proximity effects.
- the variable light source as can be seen from FIG.
- the finally-obtained width of lines with spaces corresponding to the “middle” pattern which can have two-light-ray interference are also maintained unchanged without being influenced by the light proximity effects.
- the finally-obtained widths of patterns having the other sizes deviate from the designed values.
- the light proximity correction is required when the line width is equal to that of the “middle” or “large” pattern, and the space width is equal to that of the “large” pattern whereas the light proximity correction is not required when the space width is equal to that of the “middle” pattern, as represented by symbols ⁇ in FIG. 44B.
- light-masking patterns having a size less than the period L3 corresponding to the cutoff frequency of the three-light-ray interference may be considered to require no correction in the data compression process.
- the finally-obtained widths of lines with spaces corresponding to the “large” pattern have a substantially constant deviation as shown in FIG. 43A.
- correction for these patterns can be easily performed only by adding a constant correction value to the pattern sizes.
- a pattern to be processed includes an array consisting of a plurality of identical cells arranged side by side
- one cell for example a cell 100 shown in FIG. 10A selected from the array is first subjected to a light proximity correction process so that a corrected pattern 101 is obtained as shown in FIG. 10B, and then the corrected pattern is expanded into an array form in such a manner as shown in FIG. 10C.
- This technique make it possible to reduce the time required for the correction process.
- the pattern to be processed is a memory cell array consisting of a memory cell pattern 110 arranged in a periodic fashion as shown in FIG. 11, the pattern is divided into data blocks 11 a in the data compression process in such a manner that the divided blocks 11 a have periodicity corresponding to the periodicity of the memory cell pattern.
- This allows use of periodic boundary conditions and thus there is no needs to dispose buffer areas as opposed to the embodiment described in connection with FIG. 6.
- the periodicity allows effective use of fast Fourier transformation (FFT) and thus a further reduction in the processing time can be achieved.
- FFT fast Fourier transformation
- a data block includes a plurality of pattern elements 121 to 125 lying adjacent to each other as shown in FIG. 12A
- these pattern elements 121 to 125 are combined into one pattern element in the form of a polygon 126 in the data compression process, as shown in FIG. 12B. This allows the data to be compressed more effectively so that redundant sides included in a pattern are removed and thus redundant correction processes are prevented.
- the data compression process describes the pattern using a pattern element 138 which defines the outer periphery of the whole patterns including the pattern elements 131 to 137 and also using pattern elements 139 a and 139 b which define inner space patterns, as shown in FIG. 13B. This makes it easier to perform correction processing on a pattern including a space pattern inside it.
- the optical image calculation unit 3 shown in FIG. 2 may be formed with a plurality of CPUs 141 to 145 connected to each other in a parallel fashion as shown in FIG. 14.
- the design data which has been compressed by the data compression unit 2 is divided into a plurality of portions and each portion is processed in parallel by CPUs 141 - 145 .
- the calculation results are finally integrated so as to obtain complete correction data.
- the parallel processing according to the present embodiment results in a great reduction in the time required for the processing. For example, if five CPUs are used as shown in FIG. 14, the processing speed becomes five times faster than that of a system including only one CPU.
- the CPU 141 may be used as a master processor which serves as the data compression unit 2 , the data expansion unit 8 , and the correction data output unit 9 shown in FIG. 2, while the CPUs 142 - 145 may be used as slave processors which serve as the optical image calculation unit 3 , the pattern prediction unit 4 , the comparison unit 5 , the correction unit 6 , and the judgement unit 7 shown in FIG. 2.
- the processing is performed according to a procedure shown in FIG. 30.
- CAD data representing a mask pattern is input as design data to the master processor.
- the master processor divides the received CAD data into a plurality of data blocks and compresses the data of each data block in such a manner that there is no redundancy in the data.
- the master processor then creates buffer areas around individual data blocks. Then, data representing optical characteristics of an exposure system (not shown) as well as an exposure result of a reference pattern is input to the master processor. From the exposure result of the reference pattern, the master processor determines the relationship between the reference pattern and its optical image in particular the light intensity threshold which is set so that pattern prediction can be properly performed. The master processor also performs calculations which are common for all data blocks, and transmits the calculation results as well as the relationship described above to the plurality of slave processors.
- the master processor establishes synchronization with the slave processors and then waits for a signal transmitted by a slave processor.
- the master processor Upon reception of a ready-to-start signal transmitted by a slave processor, the master processor transmits a start-of-process command together with data of a data block to be processed by the slave processor to the slave processor. If the master processor receives an end-of-calculation signal from a slave processor, the master processor receives a calculation result from that slave processor and stores it. When all data has been processed, the master processor sends an end-of-process command to all slave processors so as to complete the all processes. On the other hand, if there is still data which has not been processed, the master processor waits for another signal transmitted from a slave processor.
- slave processors When slave processors receive a start-of-process command and data of an assigned data block from the master processor, the slave processors perform a calculation regarding an optical image and then perform correction relating to it. If the correction amount falls within the allowable range, then the slave processors compress the corrected data and transmit the calculation results together with an end-of-calculation signal to the master processor.
- the outermost loop in the flow chart shown in FIG. 3 is performed in parallel by a plurality of slave processors and thus a great reduction in the processing time is achieved.
- the relationship between the reference pattern and the optical image thereof may be determined as follows. First, as shown in FIG. 31, the size of a resist pattern which is formed by actually performing exposure of the reference pattern is measured.
- the master processor calculates the optical image of the reference pattern determined from the reference mask data and retrieves the optical intensity Ix at an edge of the reference pattern. Then, the master processor determines the deviation ⁇ of the measured size of the resist pattern from the size of the reference pattern, and retrieves the light intensity Iy of the optical image of the reference pattern at the position where the above-described deviation occurs.
- the master processor further determines the relationship between the light intensities Ix and Iy by means of the least square fitting method.
- the slave processors determine threshold values which depend on the light intensities Ix at edges using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- This technique allows the system to flexibly deal with variations in the resist process for various types of resists. As a result, it is possible to perform high accuracy correction for various resist process conditions and for various types of resists.
- the size of the resist pattern may be replaced by the size of the etched pattern formed by an etching process after the exposure of the reference pattern, as shown in FIG. 32.
- the variations arising during the etching process may also be incorporated in the correction and thus more precise correction can be achieved.
- the relationship between the reference mask data and the produced mask pattern may be used instead of using the relationship between the reference pattern and the optical image thereof.
- the reference pattern is first formed by performing electron beam exposure with the reference mask data and the size of resultant reference pattern is measured.
- the master processor calculates an electron beam exposure pattern from the reference mask data and retrieves the electron beam exposure pattern Ix near a mask edge of the electron beam exposure pattern.
- the master processor determines the deviation ⁇ of the measured size of the reference pattern from the size of the electron beam exposure pattern, and retrieves the electron beam exposure pattern Iy at the position where the above deviation ⁇ occurs.
- the master processor determines the relationship between Ix and Iy by means of the least square fitting method.
- the slave processors determine threshold values, which depend on the electron beam exposure pattern Ix near the edge, using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- the electron beam exposure may be replaced by laser beam exposure.
- the relationship between the reference pattern formed by performing laser beam exposure using the reference mask data and the laser beam exposure pattern calculated from the reference mask data is determined so that only the proximity effect relating to the laser beam exposure onto a mask can be evaluated separately from the other proximity effects and it can be incorporated in the correction process.
- the relationship between the pattern size of the reference pattern and the pattern size of a resist pattern which is formed by actually exposing a resist to the reference pattern may be used.
- a reference pattern obtained according to the fifteenth embodiment is used to expose a resist so as to form a resist pattern, and the pattern size of the resultant resist pattern is measured.
- the master processor calculates an optical image from the pattern size obtained by measuring the reference mask data and retrieves the optical image Ix near a mask edge of the optical image.
- the master processor determines the difference ⁇ between the measured size of the resist pattern and the size of the reference pattern, and then retrieves the optical image Iy at the position at which the above-described difference ⁇ occurs. Furthermore, the master processor determines the relationship between Ix and Iy by means of the least square fitting method.
- the slave processors determine threshold values, which depend on the optical image Ix in an adjacent area, using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- the relationship between the size of a resist pattern and the size of an etching pattern formed by performing an etching process using the resist pattern may be used.
- an etching pattern is formed by actually performing an etching process using a reference resist pattern obtained according to for example the sixteenth embodiment, and the size of the etching pattern obtained is measured.
- the master processor calculates an etching pattern from the pattern size obtained by measuring the reference resist pattern, and retrieves the etchant concentration Ix near the resist edge.
- the master processor determines the deviation ⁇ of the measured size of the etching pattern from the size of the reference resist pattern, and retrieves the etchant concentration Iy at the position where the above-described deviation ⁇ occurs.
- the master processor determines the relationship between Ix and Iy by means of the least square fitting method.
- the slave processors determine threshold values, which depend on the etchant concentration Ix in an adjacent region, using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- the master processor determines the deviation ⁇ of the measured size of the resist pattern from the reference mask data, and then retrieves the optical image Iy at the position where the above-described deviation ⁇ occurs.
- the master processor determines the relationship between Ix and Iy by means of the least square fitting method.
- the slave processors determine threshold values, which depend on the optical image Ix in an adjacent region, using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- the electron beam exposure may be replaced by laser beam exposure.
- a reference pattern is formed by actually performing laser beam exposure according to the reference mask data, and a resist pattern is then formed by exposing a resist to the obtained reference pattern. Then, the relationship between the resist pattern and an optical image calculated from a laser beam exposure pattern which is calculated from the reference mask data is determined.
- complex effects of the laser beam proximity effect which occurs when the laser beam exposure is performed according to the reference mask data and the light proximity effect which occurs when the mask pattern is transferred onto a wafer by means of optical lithography can be evaluated, and these effects can be incorporated into the correction process.
- the relationship between the size of a reference pattern and the size of an etching pattern formed by performing an etching process using a resist pattern formed by exposing a resist to the reference pattern may be used.
- a resist pattern is formed by actually exposing a resist to a reference pattern obtained according to for example the fifteenth embodiment, and an etching pattern is then formed by performing an etching process using the obtained resist pattern.
- the pattern size of the resultant etching pattern is then measured.
- the master processor calculates an optical image from a pattern size obtained by measuring the reference pattern, and further calculates an etching pattern from the above optical image.
- the master processor then retrieves the etchant concentration Ix near a resist edge.
- the master processor determines the deviation ⁇ of the measured size of the etching pattern from the reference pattern, and then retrieves the etchant concentration Iy at the position where the above-described deviation ⁇ occurs.
- the master processor determines the relationship between Ix and Iy by means of the least square fitting method.
- the slave processors determine threshold values, which depend on the etchant concentration Ix in an adjacent region, using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- the relationship between the reference pattern and the optical image thereof instead of using the relationship between the reference pattern and the optical image thereof, it is also possible to employ the relationship between the reference mask data and an etching pattern obtained by performing an etching process using a resist pattern transferred from a mask pattern formed by performing electron beam exposure according to the reference mask data.
- a reference pattern is formed by actually performing electron beam exposure according to the reference mask data, and then a resist is exposed to this reference pattern so as to obtain a resist pattern.
- an etching pattern is formed by performing an etching process using the resist pattern and the size of the resultant etching pattern is measured.
- the master processor calculates an electron beam exposure pattern from the reference mask data, and further calculates an optical image.
- the master processor calculates an etching pattern from the optical image.
- the master processor then retrieves the etchant concentration Ix near a mask edge of the resist pattern.
- the master processor determines the deviation ⁇ of the measured size of the etching pattern from the reference mask data, and then retrieves the etchant concentration Iy at the position where the above-described deviation ⁇ occurs.
- the master processor determines the relationship between Ix and Iy by means of the least square fitting method.
- the slave processors determine threshold values, which depend on the etchant concentration Ix in an adjacent region, using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- the electron beam exposure may be replaced by laser beam exposure.
- a reference pattern is formed by actually performing laser beam exposure and then a resist is exposed to this reference pattern so as to obtain a resist pattern.
- an etching pattern is formed by performing an etching process using the resist pattern and the size of the resultant etching pattern is measured.
- the master processor calculates a laser beam exposure pattern from the reference mask data, and further calculates an optical image.
- the master processor then calculates an etching pattern from the above optical image, and thus the relationship between the calculated etching pattern and the actual etching pattern is determined.
- the optical image measurement unit 10 shown in FIG. 4 may be constructed with a plurality of optical systems 151 to 155 as shown in FIG. 15.
- the design data compressed by the data compression unit 2 is divided into a plurality of data blocks, and these data blocks are measured separately in a parallel fashion by the optical systems 151 to 155 . Then, the measured results are combined so as to obtain corrected data.
- the parallel processing according to this embodiment results in an increase in the processing speed. For example, if five optical systems are used as shown in FIG. 15, the processing speed becomes five times faster than in the case where only one optical system is used.
- an projection image is formed from a mask pattern 161 based on design data, and then, in a transfer pattern prediction process, the pattern prediction unit 4 predicts the mask edge position assuming that the mask edge is located at the position where the light intensity is equal to a predefined threshold I TH and thus predicts the pattern size of a transferred pattern 162 formed in a resist or the like on the surface of a wafer.
- the correction amount is given by the distance D between the predicted mask edge and the actual mask edge of the mask pattern 161 based on the design data.
- the threshold I TH is set to a light intensity which is 0.20 to 0.40 times the light intensity of a flat pattern having no edges.
- the mask edge is predicted on the basis of the threshold I TH without performing a resist development calculation. This results in a reduction in the processing time.
- the threshold I TH may be adjusted depending on the light intensity in areas near sides of a pattern element to be corrected.
- a mask pattern 171 shown in FIG. 17A has a narrow light transmission pattern element. Therefore, the light intensity near the sides (edges) to be corrected becomes lower than in the case of a wider light transmission pattern element.
- the threshold I TH is set to a higher value.
- the threshold I TH is set to a lower value in this case.
- transferred patterns 172 , 174 , 182 , and 184 are predicted taking into account the conditions near the sides to be corrected thereby quickly achieving high accuracy pattern prediction.
- the threshold I TH may be adjusted depending on the two-dimensional light intensity distribution near sides to be corrected. For example, when a rectangular pattern such as that shown in FIG. 33 is to be corrected, the light intensity distribution near a point Pa at a corner of the rectangular pattern 330 is different from that near a point Pb on a side. Therefore, the correction amount for the point Pa is different from that for the point Pb. To avoid the above problem, a plurality of monitor points Pm are disposed near the points Pa and Pb whereby two-dimensional light intensity distribution is monitored and it is detected whether the points Pa and Pb are located at a corner or on a side.
- the correction amount D4 should be greater than the correction amount D3 for a point on a side so as to cancel the effects of etching, development, and the like. Therefore, the threshold I TH is set to a low value in this case.
- the two-dimensional conditions of a pattern are taken into account in the pattern prediction so that high accuracy pattern prediction is achieved.
- the threshold I TH may be adjusted depending on whether there is some pattern element near a side to be corrected.
- a mask pattern 351 shown in FIG. 35A there are no pattern elements near a side 351 a to be corrected.
- a mask pattern 353 shown in FIG. 35B there is a pattern element near a side 353 a to be corrected.
- the light intensity in an area on the right of the side 353 a becomes lower.
- monitor points Pm are disposed on the right and left of a side of a pattern element to be corrected so as to detect whether there is another pattern element near the side.
- the sum of the light intensities at the right and left monitor points Pm has a large value, and thus it is concluded that there is no pattern element near the side under the consideration and the threshold I TH is set to a large value.
- the sum of the light intensities at the right and left monitor points Pm has a small value, and thus it is concluded that there is another pattern element near the side under the consideration and the threshold I TH is set to a small value. This offers further high accuracy in the pattern prediction.
- the threshold I TH may also be adjusted depending on the light intensity of an optical image obtained under a defocusing condition relative to the light intensity of the optical image obtained under a best focusing condition. As shown in FIG. 36, the light intensity Id of an optical image under a defocusing condition is calculated, and it is determined whether the light intensity Id is greater than the light intensity Ib of an optical image under a best focus condition. If the light intensity Id under the defocusing condition is greater than the light intensity Ib under the best focus condition, the size of a resist pattern will become small. Therefore, the threshold I TH is set to a low value so as to prevent the resist pattern size from becoming small.
- the threshold I TH is set to a large value so as to prevent the resist pattern size from becoming large.
- the threshold I TH may be adjusted depending on the slope of the projection image near the predicted mask edge. Afterward, the mask edge is predicted again using the new threshold value I TH obtained by the above adjustment. As shown in FIGS. 19A and 19B, thresholds I TH are adjusted depending on the slopes of projection images near the mask edges of mask patterns 191 and 193 obtained in the first prediction. the edges of projection images are predicted again using the new thresholds I TH thereby predicting transferred patterns 192 and 194 .
- the slope of a projection image that is, the slope of light intensity, can be taken into account in the pattern prediction. As a result, it is possible to achieve high accuracy pattern prediction.
- the pattern prediction unit 4 simulates the development process of a resist on the surface of a wafer.
- a transferred pattern 202 is then predicted from the simulation result.
- the variations in the process conditions such as an exposure amount and development time can be easily taken into account in the pattern prediction so that high accuracy pattern prediction can be achieved.
- the pattern prediction unit 4 converts the above projection image to a distribution 212 of development time required to develop a resist on the surface of a wafer.
- the pattern prediction unit 4 further integrates the distribution 212 in a one-dimensional fashion thereby performing quasi-development.
- a transferred pattern 213 is then predicted from the result of the quasi-development.
- pattern prediction can be performed more easily and more quickly than prediction is performed on the basis of simulation of development.
- the threshold I TH may be adjusted depending on the reflectivity of an underlying substrate coated with a resist into which a pattern is to be formed. As shown in FIG. 37A, in the case where an underlying substrate 371 is made of a material such as WSi having a low reflectivity, the light reflected by the substrate 371 has a less influence on the exposure, and therefore the size of the resist pattern becomes greater when a positive-type resist is used.
- the threshold I TH is set to a high value for an underlying substrate having a low reflectivity as in the case of FIG. 37A, and the threshold I TH is set to a low value for an underlying substrate having a high reflectivity as in the case of FIG. 37B.
- the effect of the reflectivity of the underlying substrate is taken into account in the prediction of a transferred pattern and thus it is possible to achieve high accuracy and high processing speed in the pattern prediction.
- the threshold I TH may be adjusted depending on steps formed on an underlying substrate coated with a resist into which a pattern is to be formed.
- steps formed on an underlying substrate coated with a resist into which a pattern is to be formed In the example shown in FIG. 38A, an opening 382 and steps are formed on an under lying substrate 381 and the opening 382 and the steps are covered with a resist 383 wherein the thickness of the resist in the opening 382 is greater than that of the other portions.
- the threshold I TH for the thick area is set to a large value.
- the threshold I TH may be adjusted depending on halation produced on the surface of an underlying substrate coated with a resist into which a pattern is to be formed. For example, there is a large step 393 at the boundary between a memory cell area 391 and a peripheral circuit area 392 as shown in FIG. 39A. If bit lines 394 are formed in such a manner that they extend from the memory cell area 391 to the peripheral circuit area 392 across the step 393 , halation occurs at the step 393 and a part of light is reflected in a horizontal direction as shown in FIG. 39B.
- the threshold I TH for the area near the step is set to a lower value than for the other areas.
- the effect of halation at steps on an underlying substrate is taken into account in the prediction of a transferred pattern and thus it is possible to achieve high accuracy in the pattern prediction.
- the correction unit 6 divides each side of a pattern element 231 shown in FIG. 23A into a plurality of segments as shown in FIG. 23B, then performs correction separately on each segment.
- each dividing point 232 has two data for individual segments sharing that dividing point so that each segment can be corrected independently without affecting adjacent segments.
- this embodiment offers high-accuracy correction.
- the correction unit 6 corrects each side of a pattern element which should be corrected in a direction which is limited only to the direction perpendicular to each side For example, a side 242 of a pre-corrected pattern element 241 shown in FIG. 24A, is corrected in a direction perpendicular to this side 242 so as to obtain a corrected pattern element 243 having a side 244 .
- correction produces no slanted sides and thus data can be compressed effectively and electron beam exposure can be performed at a high processing speed.
- the correction unit 6 may skip that side (edge) without performing correction. For example, if a mask pattern 252 includes thin pattern elements arranged close to each other as shown in FIG. 25, the transferred pattern 252 becomes unclear and thus inaccurate. In this case, the edge gradient of the projection image of the mask pattern 251 becomes less steep.
- the side is skipped without being subjected to correction thereby preventing invalid correction. This offers high reliability in the light proximity correction.
- the correction unit 6 may skip that side (edge) without performing correction.
- the side 263 shown in the circle 262 is located inside a pattern element 261 and therefore this side 263 does not require light proximity correction and this side 263 should be skipped in the correction process.
- the light intensity of the projection image of the 263 is very low as shown in FIG. 26B because the side 262 is located inside the pattern element 261 .
- the side is skipped in the correction process so that invalid correction is prevented and high reliability is achieved in the light proximity correction.
- the correction unit 6 detects that a correction amount obtained is greater than a predefined upper limit, the correction unit 6 considers the correction to be invalid and employs a value equal to the upper limit as the correction amount. For example, as shown in FIG. 27A, if the correction amount D1 for a side 272 of a pattern element 271 is greater than an upper limit D2, the correction amount D1 is replaced by the upper limit D2 so that the side 272 becomes a side 274 in the corrected pattern element 273 as shown in FIG. 27B. This prevents invalid correction and thus offers high reliability in the light proximity correction.
- the correction unit 6 may remove redundant points which lie on the same line after correcting a side of a pattern. For example, as shown in FIG. 28A, after a correction process, a pattern 281 has redundant points 282 to 285 lying on lines, wherein these redundant points 282 to 295 are no longer necessary after the completion of the correction process. Therefore, the correction unit 6 removes these points 282 to 285 and produces a pattern such as that shown in FIG. 28B.
- data can be compressed in an effective fashion, and iterative calculations in the correction process can be performed in a short time.
- step S 6 in the embodiment 2 or 3 if the correction amount is not within the allowable range, a projection image is generated and correction is performed again.
- the correction amount is judged after all sides have been corrected separately, and the correction procedure is repeated as required. This results in an increase in the correction processing speed. Furthermore, since each side is corrected independently, there is little possibility that the correction becomes asymmetric, and thus it is possible to achieve high reliability in the correction process.
- the correction amount is evaluated. If it is detected that the correction amount for a certain data block is not within an allowable range, then such a data block may be extracted and stored in a separate file whereas the corrected data of the data blocks which have succeeded in obtaining a correction amount within the allowable range is output.
- a resist pattern is predicted by means of optical calculation, and the predicted resist pattern is evaluated by comparing it with the mask data. That is, the difference between the size of the predicted pattern and the size designated by the mask data is determined as the correction amount. If the correction amount is greater than 10% of the minimum size for example 0.3 ⁇ m, then data blocks having such a correction amount are extracted and stored in a separate file.
- the present invention provides not only a full-automatic light proximity correction system in which correction is performed from block to block, but also a semiautomatic light proximity correction system with which an operator can manually correct the extracted data. This is especially useful to achieve effective correction when the full-automatic system is not good enough particularly for a special pattern, or when it is desirable to monitor the optical image during a correction process.
- a correction process is performed. After that, in the data expansion process (step S 7 ), if the buffer area around each data block is removed as shown in FIG. 40B and the corrected data including no buffer area is stored, then the data can be expanded as shown in FIG. 40C with more-effectively compressed corrected data.
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Abstract
A method of correcting light proximity effects includes the steps of: compressing design data of a circuit pattern (step S1); generating a projection image which is formed during a process of transferring a pattern onto a wafer, the projection image being generated according to the design data (step S2); predicting the size of the transferred pattern, said prediction being performed from the projection image (step S3); calculating the difference between the predicted size of the transferred pattern and the pattern size designated by the design data (step S4); correcting the compressed design data by an amount equal to the above-described difference (step S5); judging whether the correction amount is within an allowable range (step S6); expanding the corrected data after the correction amount has fallen within the allowable range (step S7); and outputting the resultant data (step S8).
Description
- 1. Field of the Invention
- The present invention relates to a system and method for correcting pattern data of an integrated circuit or the like so as to cancel the light proximity effects. The present invention also relates to a method of forming a pattern using such a method for correcting the light proximity effects.
- 2. Description of the Related Art
- Referring to FIGS. 29A to29D, a conventional LSI production process will be described below. First, an LSI pattern such as that shown in FIG. 29A is designed using a CAD system or a similar tool and corresponding LSI pattern data is produced. The designed LSI pattern includes a plurality of
rectangular patterns 291. Electron beam exposure is then performed according to the designed pattern data so as to produce a mask including a plurality ofpatterns 292 as shown in FIG. 29B. A wafer is exposed to ultraviolet light through the mask thereby transferring thepattern 292 formed on the mask onto the wafer. However, the pattern transferred to the wafer becomes different from the mask pattern consisting ofrectangular patterns 292 owing to diffraction of light in that corners of rectangles are rounded as shown in FIG. 29C. If the wafer is etched or subjected to a similar process using the transferredpattern 293, then theresultant pattern 294 formed on the wafer has further deformation due to the micro coding effect as shown in FIG. 29D. If the wafer is then subjected to an oxidation process to form a LOCOS isolation structure, the pattern is deformed further owing to the so-called bird's beak effect. - In production of an integrated circuit such as an LSI, the pattern deformation accumulates via a series of various production processes as described above, and the actual size of the pattern obtained at the end of the production processes are generally different from the designed size.
- In recent years, with the reduction in the size of patterns of integrated circuits, it is required to control the pattern size more precisely. In practice, however, there occurs pattern deformation such as that described above during production processes, and electrical characteristics of devices and various margins are influenced by the pattern deformation to a degree that cannot be neglected.
- It is a general object of the present invention to solve the problems described above. More specifically, it is an object of the present invention to provide a light proximity effect correction apparatus and method for alleviating the deformation of patterns due to the light proximity effects during production processes of an integrated circuit.
- It is another object of the present invention to provide a method of forming a pattern according to such a method of correcting the light proximity effects.
- According to a first aspect of the present invention, there is provided a light proximity correction system including: a design data input unit for inputting design data of a circuit pattern; a data compression unit for compressing the design data input via the design data input unit; an optical image formation unit for forming an optical projection image used to transfer a pattern onto a wafer according to the design data input via the design data input unit; a prediction unit for predicting the size of the pattern which will be transferred onto the wafer, the prediction being performed on the basis of the projection image formed by the optical image formation unit; a comparison unit for calculating the difference between the size of the transferred pattern predicted by the prediction unit and the size of the pattern designated by the design data input via the design data input unit; a correction unit for correcting the design data compressed by the data compression unit by an amount equal to the difference determined by the comparison unit; a data expansion unit for expanding the data corrected by the correction unit; and a corrected data output unit for outputting the data expanded by the data expansion unit.
- According to a second aspect of the present invention, there is provided a light proximity correction method, including the steps of: compressing design data of a circuit pattern; forming an optical projection image used to transfer a pattern onto a wafer according to the design data; predicting the size of the pattern which will be transferred onto the wafer, the prediction being performed on the basis of the projection image formed in the previous step; correcting the design data by an amount equal to the difference between the predicted size of the transferred pattern and the size of the pattern designated by the design data; expanding the corrected data; and outputting the expanded data.
- According to a third aspect of the present invention, there is provided a method of forming a pattern, including the steps of: correcting the light proximity effect which occurs during a process of transferring a pattern onto a wafer, the correction of the light proximity effect being performed on the basis of design data of a circuit pattern, thereby generating corrected data; performing electron beam exposure according to the corrected data thereby producing a mask pattern; performing light exposure through the mask pattern thereby transferring the mask pattern onto a wafer; and processing the wafer using the transferred mask pattern.
- FIGS. 1A to1E are schematic representations of a series of processing steps of forming a pattern according to a first embodiment of the present invention;
- FIG. 2 is a block diagram of a light proximity correction system according to a second embodiment of the present invention;
- FIG. 3 is a flow chart illustrating an operation relating to the second embodiment of the present invention;
- FIG. 4 is a block diagram of a light proximity correction system according to a third embodiment of the present invention;
- FIG. 5 is a flow chart illustrating an operation relating to the third embodiment of the present invention;
- FIGS. 6, 7A, and7B are schematic representations of correction methods according to fourth and fifth embodiments, respectively, of the present invention;
- FIGS. 8A to13B are schematic representations of correction methods according to seventh to twelfth embodiments, respectively, of the present invention;
- FIGS. 14 and 15 are block diagrams of an optical image calculation unit and an optical image measurement unit, respectively, of a correction system according to a third embodiment of the present invention;
- FIG. 16 is a schematic representation of a correction method according to a twenty-second embodiment of the present invention;
- FIGS. 17A to18B are schematic representations of a correction method according to a twenty-third embodiment of the present invention;
- FIGS. 19A to21 are schematic representations of correction methods according to twenty-seventh to twenty-ninth embodiments, respectively, of the present invention;
- FIGS.22 to 28B are schematic representations of correction methods according to thirty-third to thirty-ninth embodiments, respectively, of the present invention;
- FIGS. 29A to29D are schematic representations of a series of processing steps of forming a pattern according to a conventional technique;
- FIG. 30 is a schematic representation of a correction method according to the thirteenth embodiment of the present invention;
- FIG. 31 is a schematic representation of a correction method according to the fourteenth embodiment of the present invention;
- FIG. 32 is a schematic representation of a correction method modified from the fourteenth embodiment of the present invention;
- FIGS. 33 and 34 are schematic representations of a correction method according to a twenty-fourth embodiment of the present invention;
- FIGS. 35A to36 are schematic representations of correction methods according to twenty-fifth and twenty-sixth embodiments, respectively, of the present invention;
- FIGS. 37A to39C are schematic representations of correction methods according to thirtieth and thirty-second embodiments, respectively, of the present invention;
- FIGS. 40A and 40C are schematic representations of a correction method according to a forty-second embodiment of the present invention;
- FIGS. 41A and 44B are schematic representations of a correction method according to a sixth embodiment of the present invention;
- FIG. 45 is a schematic representation of a correction method according to a fifteenth embodiment of the present invention;
- FIG. 46 is a schematic representation of a correction method modified from the fifteenth embodiment of the present invention;
- FIGS. 47 and 48 are schematic representations of correction methods according to a sixteenth and seventeenth embodiments, respectively, of the present invention;
- FIG. 49 is a schematic representation of a correction method according to an eighteenth embodiment of the present invention;
- FIG. 50 is a schematic representation of a correction method modified from the eighteenth embodiment of the present invention;
- FIG. 51 is a schematic representation of a correction method according to a nineteenth embodiment of the present invention;
- FIG. 52 is a schematic representation of a correction method according to a twentieth embodiment of the present invention;
- FIG. 53 is a schematic representation of a correction method modified from the twentieth embodiment of the present invention; and
- FIG. 54 is a schematic representation of a correction method according to a forty-first embodiment of the present invention;
- Referring to the accompanying drawings, preferred embodiments of the present invention will be described below.
-
Embodiment 1 - FIG. 1 is a schematic diagram illustrating a series of processing steps for forming a pattern according to a first embodiment of the present invention. First, an LSI pattern such as that shown in FIG. 1A is designed using a CAD system or a similar tool so as to produce corresponding LSI pattern data consisting of a plurality of
rectangular patterns 11. The designed data is then corrected according to the light proximity correction method which will be described in detail later so as to obtain light-proximity-corrected data as shown in FIG. 1B. The light-proximity-corrected data consists of a plurality ofpatterns 12 corresponding to the plurality ofrectangular patterns 11 in the design data wherein eachpattern 12 hasauxiliary patterns 121 added at each corner so as to correct for pattern deformation due to diffraction of light which occurs during a process for transferring the pattern onto a wafer. - Electron beam exposure is then performed using the light-proximity-corrected data described above so that a mask including a plurality of
patterns 13 is produced as shown in FIG. 1C. A wafer is then exposed to ultraviolet light through this mask thereby transferring thepatterns 13 formed on the mask onto the wafer. As a result, as shown in FIG. 1D,patterns 14 are formed on the wafer in such a manner that the auxiliary patterns disposed at four corners at each rectangle are removed as a result of diffraction of light and thus the resultant shape of eachpattern 14 becomes a rectangle. - If the wafer is etched using the transferred
patterns 14, the etchedpatterns 15 become such as those shown in FIG. 1E. Although the etchedpatterns 15 differ from the transferredpatterns 14 shown in FIG. 1D owing to the micro loading effect, the deformation is much smaller and thus the pattern is much closer to the design pattern than in the case of thepattern 294 shown in FIG. 29D which is formed according to the conventional technique. Whereas additional deformation occurs in the pattern when the wafer is further subjected to an oxidation process to form a LOCOS isolation structure, the final pattern has higher accuracy than the pattern formed according to the conventional technique. -
Embodiment 2 - FIG. 2 is a block diagram illustrating a light proximity correction system used to accomplish the light proximity correction in the pattern formation process described in the first embodiment. Design data of an integrated circuit pattern produced with a CAD system is input to the systems via a design
data input unit 1. The designdata input unit 1 is connected to adata compression unit 2 which performs data compression, in an pre-processing step, on the input data. The output of thedata compression unit 2 is connected to an optical image calculation unit 3 for calculating an image which will be projected onto a wafer in a pattern transfer process. The output of the optical image calculation unit 3 is connected to apattern prediction unit 4 for predicting the pattern which will be formed in a resist as a result of the pattern transfer process. Thepattern prediction unit 4 and the designdata input unit 1 are connected to acomparison unit 5 for comparing the predicted pattern with the design data. The output of thecomparison unit 5 is connected to acorrection unit 6 for performing light proximity correction. The output of thecorrection unit 6 is connected to a judgement unit 7 for judging whether the correction amount is within an allowable range. The output of the judgement unit is connected to adata expansion unit 8 for expanding the data. The output of thedata expansion unit 8 is connected to a correctiondata output unit 9. The output of the judgement unit 7 is also connected to the optical image calculation unit 3. The optical image calculation unit 3 serves as an optical image formation unit defined above in the first aspect of the invention. - FIG. 3 is a flow chart illustrating the correction method using the light proximity correction system described above. Design data produced with a CAD system or the like is input via the design
data input unit 1, and then compressed by thedata compression unit 2 in a pre-processing step (step S1). The optical image calculation unit 3 then calculates an image which will be projected onto a wafer from the compressed data (step S2). Furthermore, on the basis of the calculated image to be projected, thepattern prediction unit 4 predicts the size of a pattern which will be finally obtained after a pattern transfer process (step S3). Thecomparison unit 5 compares the predicted pattern size with the size of the designed pattern which was input via the designdata input unit 1, and outputs an correction amount which is a difference between the predicted pattern size and the designed value (step S4). Thecorrection unit 6 corrects the compressed data according to the correction amount given by the comparison unit 5 (step S5). - Then the judgement unit7 judges whether the correction amount is within the predefined allowable range (step S6). If the correction amount is not within the allowable range, it is considered that the correction is not good enough, and thus the process returns to step S2 so as to calculate the projection image again and correct the data again in steps S3 to S5. Steps S2 to S6 are performed repeatedly until the correction value falls within the allowable range. If it is concluded in step S6 that the correction amount has fallen within the allowable range, it is considered that the light proximity correction is properly completed. Thus the
data expansion unit 8 expands the data (step S7) and the corrected data is output via the correction data output unit 9 (step S8). The corrected data is input to an electron beam exposure apparatus (not shown) for producing a mask. - As described above, since data correction is performed according to the result of comparison between the predicted pattern and the designed pattern after the data is compressed by the
data compression unit 2, a reduction in the correction calculation time is achieved. Furthermore, data correction is performed repeatedly until the correction amount falls within the allowable range so that the final pattern size has a required accuracy. - Embodiment 3
- FIG. 4 is a block diagram of a light proximity correction system according to a third embodiment of the present invention. This system according to the third embodiment is the same as that according to the first embodiment shown in FIG. 2 except that the optical image calculation unit3 is replaced by an optical
image measurement unit 10 serving as the optical image formation unit defined in the first aspect of the invention. The opticalimage measurement unit 10 includes an optical system for measuring the image projected onto a wafer via a mask produced according to the design data. In the case of the second embodiment described above, the pattern image which will be projected onto a wafer is calculated in step S2 by means of software with the optical image calculation unit 3 from the compressed data. In the third embodiment, however, the projected image is measured by means of hardware with the opticalimage measurement unit 10 in step S9 after the data compression in step S1, as shown in FIG. 5. In FIG. 5, steps S1, S3 to S8 are the same as the corresponding steps of the second embodiment. - The optical system of the optical
image measurement unit 10 is constructed so that the requirements described below are satisfied: - μ1=μ2; σ1=σ2; m1·NA1=m2·NA2
- where λ1, σ1, m1, and NA1 are parameters relating to a stepper (step-and-repeat projection tool) wherein λ1 is the wavelength of light, σ1 is the spatial coherence, m1 is the magnification, and NA1 is the numerical aperture, and λ2, σ2, m2, and NA2 are parameters relating to the optical system of the optical
image measurement unit 10 wherein λ2 is the wavelength of light, σ2 is the spatial coherence, m2 is the magnification, and NA2 is the numerical aperture. The employment of such an optical system allows high accuracy measurement of the diffraction effects of light arising in the pattern transfer process and it is possible to reduce the time required to perform the correction process. -
Embodiment 4 - In the data compression process in the second or third embodiment, the
data compression unit 2 may divide the design data into a plurality of data blocks 6 a to 6 i as shown in FIG. 6 so that optical proximity correction is performed separately for each of the data blocks. In the case where the design data is divided into a plurality of data blocks, a buffer area is disposed around each data block so that the influence of pattern elements in neighboring data blocks can be taken into account via the buffer areas in the correction of pattern elements included in each data block. In FIG. 6, for example, there is abuffer area 60 e around a data block 6 e. It is judged whether thebuffer area 60 e include some pattern elements that can have proximity effects on pattern elements in thedata block 6. According to the judgment result, it is decided which side of the data block 6 e should be corrected. This technique allows each data block to be corrected separately and thus makes it possible to independently perform light proximity correction on a plurality of data blocks at the same time in a parallel fashion thereby reducing the time required for the correction process. -
Embodiment 5 - The
data compression unit 2 calculates the distance between a side and another side facing the former side for every side and for every pattern element in each data block described in the fourth embodiment so as to check whether there is a data block which includes sides the distance between which is less than a predetermined threshold. If it turns out that some data blocks include such sides, then those data blocks are subjected to the correction process whereas data blocks including no such sides are not subjected to the correction process. In the example of a data block shown in FIG.7A including patterns pattern element 7 c is long enough and there are no opposite sides located nearer to each other than the threshold, and thus it is concluded that this data block needs no correction. As a result, no correction is performed on this data block. In this embodiment, as described above, it is judged whether correction is required or not for each data block and thus it is possible to reduce the time required for the correction process. -
Embodiment 6 - In the case where an exposure system including a variable light source is employed, a light shielding part is disposed in a secondary light source plane and therefore a diffraction image of the light source is formed on the pupil plane of the exposure apparatus. For example, FIG. 41A illustrate a diffraction pattern of a variable light source having a light shielding part in the form of straight lines, and FIG. 41B illustrate a diffraction pattern of a variable light source having a light shielding part in the form of crosses. In FIGS. 41A and 41B, the diffraction patterns are of a zeroth-order
light source image light source images pupil plane 410 wherein these figures describe diffraction patterns under the critical conditions where two-light-ray interference occurs between the zeroth-orderlight source image light source images - The period L2 corresponding to the cutoff frequency of the two-light-ray interference can be described as follows:
- L2=λ/(σ+1)NA
- where λ is the wavelength of light, σ is the spatial coherence, and NA is the numerical aperture. That is, if the size of a pattern is greater than the period L2, then at least two light rays can interfere with each other.
- FIGS. 41C and 41D illustrates diffraction patterns of variable light sources having light shielding parts in the forms of straight lines and crosses, respectively, for the cases of critical conditions in which three-light-ray interference occurs among the zeroth-order
light source image light source images pupil plane 410. The period L3 corresponding to the cutoff frequency of the three-light-ray interference can be described as follows: - L3=λ/(1−σb)NA
- where σb is the spatial coherence of the light source image associated with the light shielding part. Thus if the pattern size is greater than the period L3, three-light-ray interference occurs.
- FIG. 42A illustrates the light proximity effects on the finally-obtained width of lines having a width of 0.35 μm for various space widths when a normal light source is used, and FIG. 42B illustrates the light proximity effects on the finally-obtained width of spaces having a width of 0.35 μm for various line widths. In FIGS. 42A and 42B, “small” denotes a pattern having a size smaller than the period L2. The conditions are adjusted using a “small” pattern so that the finally-obtained line and space widths of such small patterns are maintained unchanged without being influenced by the light proximity effects. The “middle” pattern refers to a pattern having a size in the range from the period L2 to L3, and the “large” pattern refers to a pattern having a size greater than the period L3. In the cases of these patterns, the finally-obtained line and space widths become different from the designed values. Therefore, light proximity correction is required for the conditions where the line or space width is equal to the “middle” or “large” pattern, as represented by symbols in FIG. 44A.
- FIGS. 43A and 43B illustrate the light proximity effects for the cases where a variable light source is used. Also in these cases, “small”, “middle”, and “large” patterns refer to those patterns having sizes less than the period L2, in the range from the period L2 to L3, and greater than the period L3, respectively, as in the case of the normal light source described above. The conditions are also adjusted using a “small” pattern so that the finally-obtained line and space widths of such small patterns are maintained unchanged without being influenced by the light proximity effects. In the variable light source, as can be seen from FIG. 43A, the finally-obtained width of lines with spaces corresponding to the “middle” pattern which can have two-light-ray interference are also maintained unchanged without being influenced by the light proximity effects. However, the finally-obtained widths of patterns having the other sizes deviate from the designed values. Thus, the light proximity correction is required when the line width is equal to that of the “middle” or “large” pattern, and the space width is equal to that of the “large” pattern whereas the light proximity correction is not required when the space width is equal to that of the “middle” pattern, as represented by symbols ∘ in FIG. 44B.
- Therefore, when a variable light source is employed, light-masking patterns having a size less than the period L3 corresponding to the cutoff frequency of the three-light-ray interference may be considered to require no correction in the data compression process.
- Furthermore, the finally-obtained widths of lines with spaces corresponding to the “large” pattern have a substantially constant deviation as shown in FIG. 43A. As a result, when those patterns having a size less than a value defining a threshold requiring the light proximity correction, and the opposite sides are located at an interval greater than the period L3 corresponding to the three-light-ray interference cutoff frequency, correction for these patterns can be easily performed only by adding a constant correction value to the pattern sizes.
- Embodiment 7
- In the data compression process, if a pattern element has a large size lying across a plurality of data blocks as shown in FIG. 8A, only those data blocks including a part of a side of the pattern element are subjected to the correction process, whereas those data blocks including no side of the pattern element are not subjected to the correction process because light proximity effects cannot occur in data blocks which have no side. Thus, those data blocks which require no correction can be skipped in the correction process. As a result, a great reduction in the correction time is achieved.
-
Embodiment 8 - In the data compression process, if a plurality of data blocks include a pattern element identical to each other, only one of them is subjected to the correction process, and the others are skipped in the correction process. For example, in the example shown at the top of FIG. 9A, a rectangle extends in a horizontal direction across data blocks9 a to 9 e, and the
blocks data blocks 9 c and 9 d. Thus, in this embodiment, when a pattern such as that shown in FIG. 9A is given, it is required to perform correction only on the data blocks 9 a, 9 b, and 9 e-9 m. - As a result, the time required for the correction process can be reduced.
-
Embodiment 9 - In the data compression process, If a pattern to be processed includes an array consisting of a plurality of identical cells arranged side by side, one cell for example a
cell 100 shown in FIG. 10A selected from the array is first subjected to a light proximity correction process so that a correctedpattern 101 is obtained as shown in FIG. 10B, and then the corrected pattern is expanded into an array form in such a manner as shown in FIG. 10C. This technique make it possible to reduce the time required for the correction process. -
Embodiment 10 - When the pattern to be processed is a memory cell array consisting of a
memory cell pattern 110 arranged in a periodic fashion as shown in FIG. 11, the pattern is divided into data blocks 11 a in the data compression process in such a manner that the dividedblocks 11 a have periodicity corresponding to the periodicity of the memory cell pattern. This allows use of periodic boundary conditions and thus there is no needs to dispose buffer areas as opposed to the embodiment described in connection with FIG. 6. Furthermore, the periodicity allows effective use of fast Fourier transformation (FFT) and thus a further reduction in the processing time can be achieved. -
Embodiment 11 - In the case where a data block includes a plurality of
pattern elements 121 to 125 lying adjacent to each other as shown in FIG. 12A, thesepattern elements 121 to 125 are combined into one pattern element in the form of apolygon 126 in the data compression process, as shown in FIG. 12B. This allows the data to be compressed more effectively so that redundant sides included in a pattern are removed and thus redundant correction processes are prevented. -
Embodiment 12 - In the case where a data block includes a plurality of
pattern elements 131 to 137 surrounding a space pattern as shown in FIG. 13A, the data compression process describes the pattern using apattern element 138 which defines the outer periphery of the whole patterns including thepattern elements 131 to 137 and also usingpattern elements -
Embodiment 13 - The optical image calculation unit3 shown in FIG. 2 may be formed with a plurality of
CPUs 141 to 145 connected to each other in a parallel fashion as shown in FIG. 14. The design data which has been compressed by thedata compression unit 2 is divided into a plurality of portions and each portion is processed in parallel by CPUs 141-145. The calculation results are finally integrated so as to obtain complete correction data. The parallel processing according to the present embodiment results in a great reduction in the time required for the processing. For example, if five CPUs are used as shown in FIG. 14, the processing speed becomes five times faster than that of a system including only one CPU. - Alternatively, the
CPU 141 may be used as a master processor which serves as thedata compression unit 2, thedata expansion unit 8, and the correctiondata output unit 9 shown in FIG. 2, while the CPUs 142-145 may be used as slave processors which serve as the optical image calculation unit 3, thepattern prediction unit 4, thecomparison unit 5, thecorrection unit 6, and the judgement unit 7 shown in FIG. 2. In this case, the processing is performed according to a procedure shown in FIG. 30. First, CAD data representing a mask pattern is input as design data to the master processor. The master processor divides the received CAD data into a plurality of data blocks and compresses the data of each data block in such a manner that there is no redundancy in the data. The master processor then creates buffer areas around individual data blocks. Then, data representing optical characteristics of an exposure system (not shown) as well as an exposure result of a reference pattern is input to the master processor. From the exposure result of the reference pattern, the master processor determines the relationship between the reference pattern and its optical image in particular the light intensity threshold which is set so that pattern prediction can be properly performed. The master processor also performs calculations which are common for all data blocks, and transmits the calculation results as well as the relationship described above to the plurality of slave processors. - The master processor establishes synchronization with the slave processors and then waits for a signal transmitted by a slave processor. Upon reception of a ready-to-start signal transmitted by a slave processor, the master processor transmits a start-of-process command together with data of a data block to be processed by the slave processor to the slave processor. If the master processor receives an end-of-calculation signal from a slave processor, the master processor receives a calculation result from that slave processor and stores it. When all data has been processed, the master processor sends an end-of-process command to all slave processors so as to complete the all processes. On the other hand, if there is still data which has not been processed, the master processor waits for another signal transmitted from a slave processor.
- When slave processors receive a start-of-process command and data of an assigned data block from the master processor, the slave processors perform a calculation regarding an optical image and then perform correction relating to it. If the correction amount falls within the allowable range, then the slave processors compress the corrected data and transmit the calculation results together with an end-of-calculation signal to the master processor.
- In this embodiment, as described above, the outermost loop in the flow chart shown in FIG. 3 is performed in parallel by a plurality of slave processors and thus a great reduction in the processing time is achieved.
-
Embodiment 14 - In the thirteenth embodiment described above, the relationship between the reference pattern and the optical image thereof may be determined as follows. First, as shown in FIG. 31, the size of a resist pattern which is formed by actually performing exposure of the reference pattern is measured. The master processor calculates the optical image of the reference pattern determined from the reference mask data and retrieves the optical intensity Ix at an edge of the reference pattern. Then, the master processor determines the deviation Δ of the measured size of the resist pattern from the size of the reference pattern, and retrieves the light intensity Iy of the optical image of the reference pattern at the position where the above-described deviation occurs. The master processor further determines the relationship between the light intensities Ix and Iy by means of the least square fitting method. The slave processors determine threshold values which depend on the light intensities Ix at edges using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- This technique allows the system to flexibly deal with variations in the resist process for various types of resists. As a result, it is possible to perform high accuracy correction for various resist process conditions and for various types of resists.
- In an alternative mode, the size of the resist pattern may be replaced by the size of the etched pattern formed by an etching process after the exposure of the reference pattern, as shown in FIG. 32. In this case, the variations arising during the etching process may also be incorporated in the correction and thus more precise correction can be achieved.
-
Embodiment 15 - In the thirteenth embodiment described above, instead of using the relationship between the reference pattern and the optical image thereof, the relationship between the reference mask data and the produced mask pattern may be used. In this case, ss shown in FIG. 45, the reference pattern is first formed by performing electron beam exposure with the reference mask data and the size of resultant reference pattern is measured. The master processor calculates an electron beam exposure pattern from the reference mask data and retrieves the electron beam exposure pattern Ix near a mask edge of the electron beam exposure pattern. Then, the master processor determines the deviation Δ of the measured size of the reference pattern from the size of the electron beam exposure pattern, and retrieves the electron beam exposure pattern Iy at the position where the above deviation Δ occurs. The master processor determines the relationship between Ix and Iy by means of the least square fitting method. The slave processors determine threshold values, which depend on the electron beam exposure pattern Ix near the edge, using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- According to the present embodiment, it becomes possible to evaluate only the proximity effect arising when the electron beam exposure onto a mask is performed separately from the other proximity effects, and incorporate this proximity effect in the correction process.
- Alternatively, as shown in FIG. 46, the electron beam exposure may be replaced by laser beam exposure. In this case, the relationship between the reference pattern formed by performing laser beam exposure using the reference mask data and the laser beam exposure pattern calculated from the reference mask data is determined so that only the proximity effect relating to the laser beam exposure onto a mask can be evaluated separately from the other proximity effects and it can be incorporated in the correction process.
- Embodiment 16
- In the thirteenth embodiment described above, instead of using the relationship between the reference pattern and the optical image thereof, the relationship between the pattern size of the reference pattern and the pattern size of a resist pattern which is formed by actually exposing a resist to the reference pattern may be used. In this case, as shown in FIG. 47, for example a reference pattern obtained according to the fifteenth embodiment is used to expose a resist so as to form a resist pattern, and the pattern size of the resultant resist pattern is measured. The master processor calculates an optical image from the pattern size obtained by measuring the reference mask data and retrieves the optical image Ix near a mask edge of the optical image. The master processor determines the difference Δ between the measured size of the resist pattern and the size of the reference pattern, and then retrieves the optical image Iy at the position at which the above-described difference Δ occurs. Furthermore, the master processor determines the relationship between Ix and Iy by means of the least square fitting method. The slave processors determine threshold values, which depend on the optical image Ix in an adjacent area, using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- In this embodiment, as described above, only the proximity effect that occurs when a mask pattern is transferred onto a wafer can be evaluated separately from the other proximity effects and this effect can be incorporated in the correction process.
-
Embodiment 17 - In the thirteenth embodiment described above, instead of using the relationship between the reference pattern and the optical image thereof, the relationship between the size of a resist pattern and the size of an etching pattern formed by performing an etching process using the resist pattern may be used. In this case, as shown in FIG. 48, an etching pattern is formed by actually performing an etching process using a reference resist pattern obtained according to for example the sixteenth embodiment, and the size of the etching pattern obtained is measured. The master processor calculates an etching pattern from the pattern size obtained by measuring the reference resist pattern, and retrieves the etchant concentration Ix near the resist edge. Then, the master processor determines the deviation Δ of the measured size of the etching pattern from the size of the reference resist pattern, and retrieves the etchant concentration Iy at the position where the above-described deviation Δ occurs. The master processor determines the relationship between Ix and Iy by means of the least square fitting method. The slave processors determine threshold values, which depend on the etchant concentration Ix in an adjacent region, using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- In this embodiment, as described above, only the micro loading effect that occurs during an etching process can be evaluated separately from the other effects and this effect can be incorporated in the correction process.
- Embodiment 18
- In the thirteenth embodiment described above, instead of using the relationship between the reference pattern and the optical image thereof, it is possible to employ the relationship between reference mask data, and a resist pattern obtained by transferring a mask pattern formed by performing electron beam exposure according to the reference mask data. In this case, as shown in FIG. 49, a reference pattern is formed by actually performing electron beam exposure according to the reference mask data, and a resist pattern is then formed by exposing a resist to the obtained reference pattern. The size of the obtained resist pattern is then measured. The master processor calculates an electron beam exposure pattern from the reference mask data, and further calculates an optical image. Then, the master processor retrieves the optical image Ix near a mask edge of the optical image. The master processor determines the deviation Δ of the measured size of the resist pattern from the reference mask data, and then retrieves the optical image Iy at the position where the above-described deviation Δ occurs. The master processor determines the relationship between Ix and Iy by means of the least square fitting method. The slave processors determine threshold values, which depend on the optical image Ix in an adjacent region, using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- In this embodiment, as described above, complex effects of the electron beam proximity effect which occurs when electron beam exposure is performed according to the reference mask data and the light proximity effect which occurs when the mask pattern is transferred onto a wafer by means of optical lithography can be evaluated, and these effects can be incorporated into the correction process.
- In a modified mode of the present embodiment, as shown in FIG. 50, the electron beam exposure may be replaced by laser beam exposure. In this case, a reference pattern is formed by actually performing laser beam exposure according to the reference mask data, and a resist pattern is then formed by exposing a resist to the obtained reference pattern. Then, the relationship between the resist pattern and an optical image calculated from a laser beam exposure pattern which is calculated from the reference mask data is determined. In this modified mode, complex effects of the laser beam proximity effect which occurs when the laser beam exposure is performed according to the reference mask data and the light proximity effect which occurs when the mask pattern is transferred onto a wafer by means of optical lithography can be evaluated, and these effects can be incorporated into the correction process.
- Embodiment 19
- In the thirteenth embodiment described above, instead of using the relationship between the reference pattern and the optical image thereof, the relationship between the size of a reference pattern and the size of an etching pattern formed by performing an etching process using a resist pattern formed by exposing a resist to the reference pattern may be used. In this case, as shown in FIG. 51, a resist pattern is formed by actually exposing a resist to a reference pattern obtained according to for example the fifteenth embodiment, and an etching pattern is then formed by performing an etching process using the obtained resist pattern. The pattern size of the resultant etching pattern is then measured. The master processor calculates an optical image from a pattern size obtained by measuring the reference pattern, and further calculates an etching pattern from the above optical image. The master processor then retrieves the etchant concentration Ix near a resist edge. The master processor determines the deviation Δ of the measured size of the etching pattern from the reference pattern, and then retrieves the etchant concentration Iy at the position where the above-described deviation Δ occurs. The master processor determines the relationship between Ix and Iy by means of the least square fitting method. The slave processors determine threshold values, which depend on the etchant concentration Ix in an adjacent region, using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- In this embodiment, as described above, complex effects of the light proximity effect and the micro loading effect which occur during the optical pattern transferring process and during the etching process can be evaluated, and these effects can be incorporated into the correction process.
- Embodiment 20
- In the thirteenth embodiment described above, instead of using the relationship between the reference pattern and the optical image thereof, it is also possible to employ the relationship between the reference mask data and an etching pattern obtained by performing an etching process using a resist pattern transferred from a mask pattern formed by performing electron beam exposure according to the reference mask data. In this case, as shown in FIG. 52, a reference pattern is formed by actually performing electron beam exposure according to the reference mask data, and then a resist is exposed to this reference pattern so as to obtain a resist pattern. Furthermore, an etching pattern is formed by performing an etching process using the resist pattern and the size of the resultant etching pattern is measured. The master processor calculates an electron beam exposure pattern from the reference mask data, and further calculates an optical image. Then, the master processor calculates an etching pattern from the optical image. The master processor then retrieves the etchant concentration Ix near a mask edge of the resist pattern. The master processor determines the deviation Δ of the measured size of the etching pattern from the reference mask data, and then retrieves the etchant concentration Iy at the position where the above-described deviation Δ occurs. The master processor determines the relationship between Ix and Iy by means of the least square fitting method. The slave processors determine threshold values, which depend on the etchant concentration Ix in an adjacent region, using the relationship determined by the master processor, and perform correction processing using the above threshold values.
- In this embodiment, as described above, it is possible to evaluate complex effects of the electron beam proximity effect, the light proximity effect and the micro loading effect, which occur during the electron beam exposure, optical pattern transferring, and etching processes, and these effects can be incorporated into the correction process.
- Alternatively, as shown in FIG. 53, the electron beam exposure may be replaced by laser beam exposure. In this case, a reference pattern is formed by actually performing laser beam exposure and then a resist is exposed to this reference pattern so as to obtain a resist pattern. Furthermore, an etching pattern is formed by performing an etching process using the resist pattern and the size of the resultant etching pattern is measured. The master processor calculates a laser beam exposure pattern from the reference mask data, and further calculates an optical image. The master processor then calculates an etching pattern from the above optical image, and thus the relationship between the calculated etching pattern and the actual etching pattern is determined. In this embodiment, as described above, it is possible to evaluate complex effects of the laser beam proximity effect, the light proximity effect and the micro loading effect, which occur during the laser beam exposure, optical pattern transferring, and etching processes, and these effects can be incorporated into the correction process.
- Embodiment 21
- The optical
image measurement unit 10 shown in FIG. 4 may be constructed with a plurality ofoptical systems 151 to 155 as shown in FIG. 15. The design data compressed by thedata compression unit 2 is divided into a plurality of data blocks, and these data blocks are measured separately in a parallel fashion by theoptical systems 151 to 155. Then, the measured results are combined so as to obtain corrected data. The parallel processing according to this embodiment results in an increase in the processing speed. For example, if five optical systems are used as shown in FIG. 15, the processing speed becomes five times faster than in the case where only one optical system is used. -
Embodiment 22 - In this embodiment, as shown in FIG. 16, an projection image is formed from a
mask pattern 161 based on design data, and then, in a transfer pattern prediction process, thepattern prediction unit 4 predicts the mask edge position assuming that the mask edge is located at the position where the light intensity is equal to a predefined threshold ITH and thus predicts the pattern size of a transferredpattern 162 formed in a resist or the like on the surface of a wafer. The correction amount is given by the distance D between the predicted mask edge and the actual mask edge of themask pattern 161 based on the design data. The threshold ITH is set to a light intensity which is 0.20 to 0.40 times the light intensity of a flat pattern having no edges. In this embodiment, as described above, the mask edge is predicted on the basis of the threshold ITH without performing a resist development calculation. This results in a reduction in the processing time. - Embodiment 23
- In the
previous embodiment 22, the threshold ITH may be adjusted depending on the light intensity in areas near sides of a pattern element to be corrected. For example, amask pattern 171 shown in FIG. 17A has a narrow light transmission pattern element. Therefore, the light intensity near the sides (edges) to be corrected becomes lower than in the case of a wider light transmission pattern element. In this case, the threshold ITH is set to a higher value. In contrast, when the light transmission part of a pattern element is wide as inmask patterns patterns - Embodiment 24
- In the
embodiment 22 described above, the threshold ITH may be adjusted depending on the two-dimensional light intensity distribution near sides to be corrected. For example, when a rectangular pattern such as that shown in FIG. 33 is to be corrected, the light intensity distribution near a point Pa at a corner of therectangular pattern 330 is different from that near a point Pb on a side. Therefore, the correction amount for the point Pa is different from that for the point Pb. To avoid the above problem, a plurality of monitor points Pm are disposed near the points Pa and Pb whereby two-dimensional light intensity distribution is monitored and it is detected whether the points Pa and Pb are located at a corner or on a side. If it is detected that a point is located at a corner, the correction amount D4 should be greater than the correction amount D3 for a point on a side so as to cancel the effects of etching, development, and the like. Therefore, the threshold ITH is set to a low value in this case. In this embodiment, as described above, the two-dimensional conditions of a pattern are taken into account in the pattern prediction so that high accuracy pattern prediction is achieved. - Embodiment 25
- In the
embodiment 22 described above, the threshold ITH may be adjusted depending on whether there is some pattern element near a side to be corrected. For example, in the case of amask pattern 351 shown in FIG. 35A, there are no pattern elements near a side 351 a to be corrected. In contrast, in the case of amask pattern 353 shown in FIG. 35B, there is a pattern element near aside 353 a to be corrected. In this case, the light intensity in an area on the right of theside 353 a becomes lower. To avoid the above problem, monitor points Pm are disposed on the right and left of a side of a pattern element to be corrected so as to detect whether there is another pattern element near the side. In the case of themask pattern 351, the sum of the light intensities at the right and left monitor points Pm has a large value, and thus it is concluded that there is no pattern element near the side under the consideration and the threshold ITH is set to a large value. On the other hand, in the case of themask pattern 353, the sum of the light intensities at the right and left monitor points Pm has a small value, and thus it is concluded that there is another pattern element near the side under the consideration and the threshold ITH is set to a small value. This offers further high accuracy in the pattern prediction. - Embodiment 26
- In the
embodiment 22 described above, the threshold ITH may also be adjusted depending on the light intensity of an optical image obtained under a defocusing condition relative to the light intensity of the optical image obtained under a best focusing condition. As shown in FIG. 36, the light intensity Id of an optical image under a defocusing condition is calculated, and it is determined whether the light intensity Id is greater than the light intensity Ib of an optical image under a best focus condition. If the light intensity Id under the defocusing condition is greater than the light intensity Ib under the best focus condition, the size of a resist pattern will become small. Therefore, the threshold ITH is set to a low value so as to prevent the resist pattern size from becoming small. On the other hand, If the light intensity Id under the defocusing condition is smaller than the light intensity Ib under the best focus condition, the resist pattern size will become larger. In this case, the threshold ITH is set to a large value so as to prevent the resist pattern size from becoming large. Thus, in this embodiment, the focusing margin is effectively expanded. - Embodiment 27
- In the
embodiment 22 described above, the threshold ITH may be adjusted depending on the slope of the projection image near the predicted mask edge. Afterward, the mask edge is predicted again using the new threshold value ITH obtained by the above adjustment. As shown in FIGS. 19A and 19B, thresholds ITH are adjusted depending on the slopes of projection images near the mask edges ofmask patterns patterns - Embodiment 28
- In this embodiment, as shown in FIG. 20, after generating a projection image on the basis of a
mask pattern 201, thepattern prediction unit 4 simulates the development process of a resist on the surface of a wafer. A transferredpattern 202 is then predicted from the simulation result. In this embodiment, as can be seen from the above discussion, the variations in the process conditions such as an exposure amount and development time can be easily taken into account in the pattern prediction so that high accuracy pattern prediction can be achieved. -
Embodiment 29 - In this embodiment, as shown in FIG. 21, after generating a projection image on the basis of a
mask pattern 211, thepattern prediction unit 4 converts the above projection image to a distribution 212 of development time required to develop a resist on the surface of a wafer. Thepattern prediction unit 4 further integrates the distribution 212 in a one-dimensional fashion thereby performing quasi-development. A transferredpattern 213 is then predicted from the result of the quasi-development. In this embodiment, as described above, pattern prediction can be performed more easily and more quickly than prediction is performed on the basis of simulation of development. - Embodiment 30
- In the transfer pattern prediction step after generating a projection image from a mask pattern based on design data, the threshold ITH may be adjusted depending on the reflectivity of an underlying substrate coated with a resist into which a pattern is to be formed. As shown in FIG. 37A, in the case where an
underlying substrate 371 is made of a material such as WSi having a low reflectivity, the light reflected by thesubstrate 371 has a less influence on the exposure, and therefore the size of the resist pattern becomes greater when a positive-type resist is used. On the other hand, if anunderlying substrate 372 is made of a material such as Al having a high reflectivity, the light reflected by thesubstrate 372 has a considerable contribution to exposure and therefore the size of the resist patter becomes smaller when a positive-type resist is used. In view of the above, the threshold ITH is set to a high value for an underlying substrate having a low reflectivity as in the case of FIG. 37A, and the threshold ITH is set to a low value for an underlying substrate having a high reflectivity as in the case of FIG. 37B. In this embodiment, as described above, the effect of the reflectivity of the underlying substrate is taken into account in the prediction of a transferred pattern and thus it is possible to achieve high accuracy and high processing speed in the pattern prediction. - Embodiment 31
- In the transfer pattern prediction step after generating a projection image from a mask pattern based on design data, the threshold ITH may be adjusted depending on steps formed on an underlying substrate coated with a resist into which a pattern is to be formed. In the example shown in FIG. 38A, an
opening 382 and steps are formed on an under lyingsubstrate 381 and theopening 382 and the steps are covered with a resist 383 wherein the thickness of the resist in theopening 382 is greater than that of the other portions. In such a case, the threshold ITH for the thick area is set to a large value. In this embodiment, as described above, the effects of steps on an underlying substrate and the local variations in resist thickness are taken into account in the prediction of a transferred pattern and thus it is possible to achieve high accuracy in the pattern prediction. -
Embodiment 32 - In the transfer pattern prediction step after generating a projection image from a mask pattern based on design data, the threshold ITH may be adjusted depending on halation produced on the surface of an underlying substrate coated with a resist into which a pattern is to be formed. For example, there is a
large step 393 at the boundary between amemory cell area 391 and aperipheral circuit area 392 as shown in FIG. 39A. If bit lines 394 are formed in such a manner that they extend from thememory cell area 391 to theperipheral circuit area 392 across thestep 393, halation occurs at thestep 393 and a part of light is reflected in a horizontal direction as shown in FIG. 39B. In view of the above fact, the threshold ITH for the area near the step is set to a lower value than for the other areas. In this embodiment, as described above, the effect of halation at steps on an underlying substrate is taken into account in the prediction of a transferred pattern and thus it is possible to achieve high accuracy in the pattern prediction. - Embodiment 33
- The optical image calculation unit3 of the
embodiment 2 may calculate a projection image as follows. First, light intensities at predefined mesh points are calculated. Then, as shown in FIG. 22, the light intensity I at an arbitrary point P(x, y) is calculated from the already-determined light intensities at four neighboring points Pi(xi, yi) (i=1, 2, 3, 4) by means of interpolation according to the following equation: - I=Σi(Wi·Ii)
- where Wi=(1−|xi−x|)(1−|yi−y|). Thus, according to this method of calculating a projection image, it is possible to calculate the light intensity at an arbitrary point, even at a point on a boundary line of the mesh. As a result, it is possible to obtain a high-accuracy projection image.
- Embodiment 34
- In the data correction processing in the
embodiment 2 or 3, thecorrection unit 6 divides each side of apattern element 231 shown in FIG. 23A into a plurality of segments as shown in FIG. 23B, then performs correction separately on each segment. In this embodiment, eachdividing point 232 has two data for individual segments sharing that dividing point so that each segment can be corrected independently without affecting adjacent segments. Thus, this embodiment offers high-accuracy correction. - Embodiment 35
- In the data correction process, the
correction unit 6 corrects each side of a pattern element which should be corrected in a direction which is limited only to the direction perpendicular to each side For example, aside 242 of apre-corrected pattern element 241 shown in FIG. 24A, is corrected in a direction perpendicular to thisside 242 so as to obtain a correctedpattern element 243 having aside 244. In this technique, correction produces no slanted sides and thus data can be compressed effectively and electron beam exposure can be performed at a high processing speed. - Embodiment 36
- In the data correction process, if the edge gradient of the projection image of a pattern is steeper than a predetermined degree, the
correction unit 6 may skip that side (edge) without performing correction. For example, if amask pattern 252 includes thin pattern elements arranged close to each other as shown in FIG. 25, the transferredpattern 252 becomes unclear and thus inaccurate. In this case, the edge gradient of the projection image of themask pattern 251 becomes less steep. In this embodiment, as described above, when the edge gradient of the projection image of a pattern is steeper than a predetermined degree, the side is skipped without being subjected to correction thereby preventing invalid correction. This offers high reliability in the light proximity correction. - Embodiment 37
- In the data correction process, if the light intensity of the projection image of a pattern is less than a predetermined threshold for a certain side of the pattern, the
correction unit 6 may skip that side (edge) without performing correction. In FIG. 26A, for example, theside 263 shown in thecircle 262 is located inside apattern element 261 and therefore thisside 263 does not require light proximity correction and thisside 263 should be skipped in the correction process. In such a case, the light intensity of the projection image of the 263 is very low as shown in FIG. 26B because theside 262 is located inside thepattern element 261. In this embodiment, as described above if the light intensity of the projection image of a side of a pattern is less than a threshold I0, the side is skipped in the correction process so that invalid correction is prevented and high reliability is achieved in the light proximity correction. - Embodiment 38
- In the data correction process, if the
correction unit 6 detects that a correction amount obtained is greater than a predefined upper limit, thecorrection unit 6 considers the correction to be invalid and employs a value equal to the upper limit as the correction amount. For example, as shown in FIG. 27A, if the correction amount D1 for aside 272 of apattern element 271 is greater than an upper limit D2, the correction amount D1 is replaced by the upper limit D2 so that theside 272 becomes aside 274 in the correctedpattern element 273 as shown in FIG. 27B. This prevents invalid correction and thus offers high reliability in the light proximity correction. -
Embodiment 39 - In the data correction process, the
correction unit 6 may remove redundant points which lie on the same line after correcting a side of a pattern. For example, as shown in FIG. 28A, after a correction process, apattern 281 hasredundant points 282 to 285 lying on lines, wherein theseredundant points 282 to 295 are no longer necessary after the completion of the correction process. Therefore, thecorrection unit 6 removes thesepoints 282 to 285 and produces a pattern such as that shown in FIG. 28B. Thus, in this embodiment, data can be compressed in an effective fashion, and iterative calculations in the correction process can be performed in a short time. - Embodiment 40
- In step S6 in the
embodiment 2 or 3, if the correction amount is not within the allowable range, a projection image is generated and correction is performed again. In this embodiment, instead of judging the correction amount each time a side is corrected and iterating the correction process, the correction amount is judged after all sides have been corrected separately, and the correction procedure is repeated as required. This results in an increase in the correction processing speed. Furthermore, since each side is corrected independently, there is little possibility that the correction becomes asymmetric, and thus it is possible to achieve high reliability in the correction process. - Embodiment 41
- In the
embodiment 2 or 3, after dividing the design data into a plurality of data blocks and calculating the correction amount for each data block, the correction amount is evaluated. If it is detected that the correction amount for a certain data block is not within an allowable range, then such a data block may be extracted and stored in a separate file whereas the corrected data of the data blocks which have succeeded in obtaining a correction amount within the allowable range is output. For example, as shown in FIG. 54, after performing pre-processing on the mask data, a resist pattern is predicted by means of optical calculation, and the predicted resist pattern is evaluated by comparing it with the mask data. That is, the difference between the size of the predicted pattern and the size designated by the mask data is determined as the correction amount. If the correction amount is greater than 10% of the minimum size for example 0.3 μm, then data blocks having such a correction amount are extracted and stored in a separate file. - This makes it possible to extract only those regions which need correction or have a too small process margin from an LSI pattern including a huge amount of data. This technique is especially useful for random logic circuits to improve the development efficiency. The data which has been extracted for the correction in the above-described manner is subjected to the pre-processing using optical parameters and the calculated projection image and the corresponding mask data are displayed. Referring to the corrected data of the data blocks which have already succeeded in achieving a correction amount within the allowable range, it is determined whether or not correction is needed judging from the displayed projection image. If correction is needed, correction is performed manually, and the mask data and the projection image are displayed again for reevaluation. The manual correction and the displaying of the mask data and the projection image are performed repeatedly until it is judged that no further correction is needed. When it is conclude that no further correction is needed, the resultant corrected data is output.
- As described above, the present invention provides not only a full-automatic light proximity correction system in which correction is performed from block to block, but also a semiautomatic light proximity correction system with which an operator can manually correct the extracted data. This is especially useful to achieve effective correction when the full-automatic system is not good enough particularly for a special pattern, or when it is desirable to monitor the optical image during a correction process.
- Embodiment 42
- In the
embodiment 2 or 3, as described in FIG. 40A, after dividing the design data into a plurality of data blocks and disposing abuffer area 402 around each data block 401, a correction process is performed. After that, in the data expansion process (step S7), if the buffer area around each data block is removed as shown in FIG. 40B and the corrected data including no buffer area is stored, then the data can be expanded as shown in FIG. 40C with more-effectively compressed corrected data.
Claims (52)
1. A light proximity correction system comprising:
a design data input unit for inputting design data of a circuit pattern;
a data compression unit for compressing the design data input via said design data input unit;
an optical image formation unit for forming an optical projection image used to transfer a pattern onto a wafer according to the design data input via said design data input unit;
a prediction unit for predicting the size of the pattern which will be transferred onto the wafer, said prediction being performed on the basis of the projection image formed by said optical image formation unit;
a comparison unit for calculating the difference between the size of the transfer pattern predicted by said prediction unit and the size of the pattern designated by the design data input via said design data input unit;
a correction unit for correcting the design data compressed by said data compression unit by an amount equal to the difference determined by said comparison unit;
a data expansion unit for expanding the data corrected by said correction unit; and
a corrected data output unit for outputting the data expanded by said data expansion unit.
2. A system according to , further comprising a judgement unit for judging whether the correction amount used by said correction unit is within an allowable range, and making said optical image formation unit to reform the projection image according to the corrected data if said correction amount is not within said allowable range, whereas said judgement unit outputs said corrected data to said data expansion unit if said correction amount is within said allowable range.
claim 1
3. A system according to , wherein said optical image formation unit includes a CPU for determining the projection image by means of calculation process.
claim 1
4. A system according to , wherein said optical image formation unit includes a plurality of CPUs for dividing the design data into plural parts and performing the calculating process on the divided design data in a parallel fashion.
claim 3
5. A system according to , wherein said optical image formation unit includes an optical system for measuring the projection image.
claim 1
6. A system according to , wherein said optical image formation unit includes a plurality of optical systems for dividing the design data into plural parts and measuring the projection image corresponding to the divided design data in a parallel fashion.
claim 5
7. A system according to , including:
claim 1
a master CPU forming said data compression unit, data expansion unit, and corrected data output unit said master CPU being adapted to divide the design data into a plurality of data blocks and perform a process which is common for all data blocks: and
a plurality of slave CPUs forming said optical image formation unit, prediction unit, comparison unit, and correction unit, said plurality of slave CPUs being adapted to perform optical calculations regarding the corresponding data blocks in a parallel fashion using the result of said common process given by said master CPU and transmit the results of the calculations to said master CPU.
8. A light proximity correction method comprising the steps of:
compressing design data of a circuit pattern;
forming an optical projection image used to transfer a pattern onto a wafer according to the design data;
predicting the size of the pattern which will be transferred onto the wafer, said prediction being performed on the basis of said projection image formed in the previous step;
correcting the design data by an amount equal to the difference between the predicted size of the transfer pattern and the size of the pattern designated by the design data;
expanding the corrected data; and
outputting the expanded data.
9. A method according to , wherein said step of compressing the design data includes the step of dividing the design data into a plurality of data blocks.
claim 8
10. A method according to , wherein a buffer area is disposed around each said data block.
claim 9
11. A method according to , wherein it is judged whether pattern elements in each said data block have sides apart from each other by a distance equal to or less than a predetermined value and, if such sides are detected in a certain data block, said data block is considered to be a block which should be subjected to the correction process, whereas if no such sides are detected in a data block, said data block is considered to be a block which does not need the correction process.
claim 9
12. A method according to , wherein only those data blocks including a side of a pattern element are subjected to the correction process, and data blocks including no side of a pattern element are skipped in the correction process.
claim 9
13. A method according to , wherein if a plurality of data blocks include an identical pattern element, only one of those data blocks is subjected to the correction process, and the correction result is applied to the other of those data blocks.
claim 9
14. A method according to , wherein the design data is divided into a plurality of data blocks in such a manner that the divided blocks have periodicity equal to the periodicity of a memory cell pattern of the design data of a memory cell array.
claim 9
15. A method according to , wherein a plurality of pattern elements located adjacent to each other in each said data block are combined into a polygon.
claim 9
16. A method according to , wherein when a plurality of pattern elements located adjacent to each other in each said data block are combined, if the resultant pattern includes a space area inside the pattern, said resultant pattern is described by a pattern element that defines the outer periphery and a pattern element that defines the inner space area.
claim 9
17. A method according to , wherein when a variable light source is employed in an exposure apparatus, a light-masking pattern having a size less than a period corresponding to three-light-ray cutoff frequency is skipped in the correction process.
claim 9
18. A method according to , wherein when a variable light source is employed in an exposure apparatus, if sides are apart from each other by a distance that is equal to or less than said predetermined value and that is equal to or greater than a period corresponding to three-light-ray cutoff frequency, then those sides are corrected by adding a constant correction amount.
claim 11
19. A method according to , wherein in the step of predicting the size of a transfer pattern, a mask edge is predicted from the projection image by employing a predetermined light intensity as a threshold value.
claim 8
20. A method according to , wherein said threshold value is adjusted depending on the light intensity near a side of a pattern to be corrected.
claim 19
21. A method according to , wherein said threshold value is adjusted depending on the two-dimensional light intensity distribution near a side of a pattern to be corrected.
claim 19
22. A method according to , wherein said threshold value is adjusted depending on whether there is a pattern element adjacent to a side of a pattern to be corrected.
claim 19
23. A method according to , wherein said threshold value is adjusted depending on the light intensity of an optical image under a defocusing condition relative to the light intensity of the optical image under a best focusing condition.
claim 19
24. A method according to , wherein said threshold value is adjusted depending on the reflectivity of an underlying substrate onto which a pattern is to be transferred.
claim 19
25. A method according to , wherein said threshold value is adjusted depending on a step formed on an underlying substrate onto which a pattern is to be transferred.
claim 19
26. A method according to , wherein said threshold value is adjusted depending on halation occurring at the surface of an underlying substrate onto which a pattern is to be transferred.
claim 19
27. A method according to , wherein said threshold value is adjusted depending on the relationship between a resist pattern which is formed by actually exposing a resist to a reference pattern and an optical image of the reference pattern, said optical image being calculated from reference mask data.
claim 19
28. A method according to , wherein said threshold value is adjusted depending on the relationship between an etching pattern, which is formed by actually exposing a resist to a reference pattern and further performing an etching process, and an etching pattern calculated from an optical image of the reference pattern, said optical image being calculated from reference mask data.
claim 19
29. A method according to , wherein said threshold value is adjusted depending on the relationship between a reference pattern, which is formed by actually performing electron beam exposure according to reference mask data, and an electron beam exposure pattern calculated from the reference mask data.
claim 19
30. A method according to , wherein said threshold value is adjusted depending on the relationship between a reference pattern, which is formed by actually performing laser beam exposure according to reference mask data, and a laser beam exposure pattern calculated from the reference mask data.
claim 19
31. A method according to , wherein said threshold value is adjusted depending on the relationship between a resist pattern, which is formed by actually exposing a resist to reference pattern, and an optical image calculated from a pattern size obtained by measuring the reference pattern.
claim 19
32. A method according to , wherein said threshold value is adjusted depending on the relationship between an etching pattern, which is formed by actually exposing a resist to a reference pattern and further performing an etching process using said resist pattern, and an etching pattern calculated from a pattern size obtained by measuring said resist pattern.
claim 19
33. A method according to , wherein said threshold value is adjusted depending on the relationship between a resist pattern, which is formed by actually exposing a resist to a reference pattern, said reference pattern being formed by actually performing electron beam exposure according to reference mask data, and an optical image calculated from an electron beam exposure pattern, said electron beam exposure pattern being calculated from the reference mask data.
claim 19
34. A method according to , wherein said threshold value is adjusted depending on the relationship between a resist pattern, which is formed by actually exposing a resist to a reference pattern, said reference pattern being formed by actually performing laser beam exposure according to reference mask data, and an optical image calculated from a laser beam exposure pattern, said laser beam exposure pattern being calculated from the reference mask data.
claim 19
35. A method according to , wherein said threshold value is adjusted depending on the relationship between an etching pattern, which is formed by actually exposing a resist to a reference pattern and further performing an etching process, and an etching pattern calculated from an optical image, said optical image being calculated from a pattern size obtained by measuring the reference pattern.
claim 19
36. A method according to , wherein said threshold value is adjusted depending on the relationship between an etching pattern, which is formed by actually exposing a resist to a reference pattern and further performing an etching process, said reference pattern being formed by actually performing electron beam exposure according to a reference mask data, and an etching pattern calculated from an optical image, said optical image being calculated from an electron beam exposure pattern, said electron beam exposure pattern being calculated from said reference mask data.
claim 19
37. A method according to , wherein said threshold value is adjusted depending on the relationship between an etching pattern, which is formed by actually exposing a resist to a reference pattern and further performing an etching process, said reference pattern being formed by actually performing laser beam exposure according to a reference mask data, and an etching pattern calculated from an optical image, said optical image being calculated from a laser beam exposure pattern, said laser beam exposure pattern being calculated from said reference mask data.
claim 19
38. A method according to , wherein said step of predicting the size of a transfer pattern includes the steps of:
claim 8
predicting a mask edge from the projection image by employing a predetermined light intensity as a threshold value;
adjusting said threshold value depending on the gradient of the projection image at said predicted mask edge; and
predicting a mask edge using the adjusted threshold value;
thereby predicting the size of the transfer pattern.
39. A method according to , wherein said step of predicting the size of a transfer pattern includes the steps of:
claim 8
simulating a process of developing a resist disposed on the surface of a wafer; and
predicting the size of the transfer pattern from an edge position obtained in said simulating step.
40. A method according to , wherein said step of predicting the size of a transfer pattern includes the steps of:
claim 8
converting said projection image to a developing time distribution required to develop a resist disposed on the surface of a wafer;
simulating a development process by performing one-dimensional integration on said developing time; and
predicting the size of the transfer pattern from an edge position obtained in said simulating step.
41. A method according to , wherein said step of forming a projection image includes the step of calculating the light intensity I at a point P(x, y) from light intensities at four neighboring points Pi(xi, yi) (i=1, 2, 3, 4) selected so that said point P(x, y) is present inside a rectangle formed by said four neighboring points Pi(xi, yi) (i=1, 2, 3, 4), said calculation of the light intensity I at the point P(x, y) being performed by means of interpolation according to the following equations:
claim 8
I=Σi(Wi·Ii), and Wi=(1−|xi−x|) (1−|yi−y|).
42. A method according to , wherein said step of correcting the design data includes the step of:
claim 8
dividing a side to be corrected into a plurality of segments in such a manner that each dividing point has two data so that both segments sharing one dividing point have their own data.
43. A method according to , wherein in said step of correcting the design data, each side is corrected in a direction perpendicular to said each side.
claim 8
44. A method according to , wherein in said step of correcting the design data, if the gradient of the projection image at a side of a pattern element is less than a predetermined value, said side is skipped so that said side is not subjected to the correction process.
claim 8
45. A method according to , wherein in said step of correcting the design data, if the light intensity of the projection image at a side of a pattern element is less than a predetermined value, said side is skipped so that said side is not subjected to the correction process.
claim 8
46. A method according to , wherein in said step of correcting the design data, an upper limit of a correction amount is set, and if it is detected that a calculated correction amount is greater than an upper limit, correction is performed in such a manner that the correction amount is equal to said upper limit.
claim 8
47. A method according to , wherein said step of correcting the design data includes the steps of:
claim 8
correcting each side of a pattern element which should be corrected; and then
removing redundant points lying on the same line.
48. A method according to , wherein said step of correcting the design data includes the steps of:
claim 8
separately correcting all sides which should be corrected;
judging whether the correction amounts are within an allowable range;
forming a projection image again according to the corrected data, if some correction amount is not within the allowable range; and
expanding the corrected data and outputting the resultant data, if the correction amounts are within the allowable range.
49. A method according to , wherein said step of compressing the design data includes the steps of:
claim 48
dividing the design data into a plurality of data blocks;
judging the correction amount for each data bock;
extracting a data block having a correction amount which is not within an allowable range and storing the extracted data block into a separate file; and
performing correction again on the extracted data block according to the corrected data.
50. A method according to , wherein:
claim 49
the mask data of the data block extracted into the separate file is corrected manually;
a projection image is formed using the manually-corrected data;
it is determined whether further correction is needed judging from said projection image;
if it is concluded that further correction is needed, processing including said manual correction, formation of a projection image, and judgement are performed repeatedly until it is concluded that no further correction is needed;
and the corrected data which has been considered to need no further correction is expanded and then output.
51. A method according to , wherein in the step of expanding the corrected data, the expansion of the corrected data is performed after removing the buffer areas disposed around individual data blocks.
claim 10
52. A method of forming a pattern comprising the steps of:
correcting the light proximity effect which occurs during a process of transferring a pattern onto a wafer, said correction of the light proximity effect being performed on the basis of design data of a circuit pattern, thereby generating corrected data;
performing electron beam exposure according to said corrected data thereby producing a mask pattern;
performing light exposure through said mask pattern thereby transferring said mask pattern onto a wafer; and
processing said wafer using the transferred mask pattern.
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US09/116,375 US6453274B2 (en) | 1994-09-16 | 1998-07-16 | Method of forming a pattern using proximity-effect-correction |
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JP6-221956 | 1995-02-28 | ||
JP7-40255 | 1995-02-28 | ||
JP20483795A JPH08297692A (en) | 1994-09-16 | 1995-08-10 | Device and method for correcting optical proximity, and pattern forming method |
JP7-204837 | 1995-08-10 | ||
US08/529,177 US5815685A (en) | 1994-09-16 | 1995-09-15 | Apparatus and method for correcting light proximity effects by predicting mask performance |
US09/116,375 US6453274B2 (en) | 1994-09-16 | 1998-07-16 | Method of forming a pattern using proximity-effect-correction |
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US09/116,375 Expired - Lifetime US6453274B2 (en) | 1994-09-16 | 1998-07-16 | Method of forming a pattern using proximity-effect-correction |
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- 1995-09-15 US US08/529,177 patent/US5815685A/en not_active Expired - Fee Related
- 1995-09-16 KR KR1019950030333A patent/KR0156792B1/en not_active IP Right Cessation
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US20020188925A1 (en) * | 2001-04-11 | 2002-12-12 | Mizuho Higashi | Pattern-creating method, pattern-processing apparatus and exposure mask |
US20030170551A1 (en) * | 2002-03-06 | 2003-09-11 | Fujitsu Limited | Proximity effect correction apparatus, proximity effect correction method, storage medium , and computer program product |
US7047516B2 (en) * | 2002-03-06 | 2006-05-16 | Fujitsu Limited | Proximity effect correction apparatus, proximity effect correction method, storage medium, and computer program product |
US20060129967A1 (en) * | 2004-12-13 | 2006-06-15 | Satoshi Tanaka | System, method and program for generating mask data, exposure mask and semiconductor device in consideration of optical proximity effects |
US7716628B2 (en) * | 2004-12-13 | 2010-05-11 | Kabushiki Kaisha Toshiba | System, method and program for generating mask data, exposure mask and semiconductor device in consideration of optical proximity effects |
US20140065548A1 (en) * | 2012-08-29 | 2014-03-06 | Canon Kabushiki Kaisha | Lithography apparatus and article manufacturing method using same |
US9053548B2 (en) * | 2012-08-29 | 2015-06-09 | Canon Kabushiki Kaisha | Lithography apparatus including display unit for updating data and article manufacturing method using same |
Also Published As
Publication number | Publication date |
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DE19534132A1 (en) | 1996-04-11 |
KR960011567A (en) | 1996-04-20 |
KR0156792B1 (en) | 1998-11-16 |
TW288154B (en) | 1996-10-11 |
US6453274B2 (en) | 2002-09-17 |
US5815685A (en) | 1998-09-29 |
JPH08297692A (en) | 1996-11-12 |
DE19534132B4 (en) | 2005-06-09 |
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