US11322561B2 - Photoresist composition, pixel definition layer, display substrate and method for preparing the same, and display device - Google Patents

Photoresist composition, pixel definition layer, display substrate and method for preparing the same, and display device Download PDF

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US11322561B2
US11322561B2 US16/394,401 US201916394401A US11322561B2 US 11322561 B2 US11322561 B2 US 11322561B2 US 201916394401 A US201916394401 A US 201916394401A US 11322561 B2 US11322561 B2 US 11322561B2
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temperature
pixel definition
definition layer
photoresist composition
lyophobic
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US20200035765A1 (en
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Wei Li
Jingjing XIA
Bin Zhou
Jun Cheng
Yingbin HU
Wei Song
Guangyao Li
Biao Luo
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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Assigned to HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD. reassignment HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CHENG, JUN, HU, Yingbin, LI, Guangyao, LI, WEI, LUO, BIAO, SONG, WEI, XIA, Jingjing, ZHOU, BIN
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • H01L27/3246—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • H01L27/3283—
    • H01L51/0005—
    • H01L51/0018—
    • H01L51/0021—
    • H01L51/0026—
    • H01L51/004—
    • H01L51/56—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/141—Organic polymers or oligomers comprising aliphatic or olefinic chains, e.g. poly N-vinylcarbazol, PVC or PTFE
    • H01L2251/556—
    • H01L51/5221—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/361—Temperature
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/82—Cathodes

Definitions

  • the present disclosure relates to the field of display, in particular to a photoresist composition, a pixel definition layer, a display substrate and a method for preparing the same, and a display device.
  • OLEDs organic light-emitting diodes
  • inkjet printing technology of the solution process is used to accurately drop a solution of luminescent materials into a sub-pixel region, and the solvent is volatilized to form a film.
  • inkjet printing is suitable for macromolecular luminescent materials and small molecule luminescent materials, has a high material utilization rate, a low equipment cost, a high productivity, and is easy to produce large-scale and large-sized products.
  • Inkjet printing technology requires to prepare a pixel definition layer on the electrodes of the substrate in advance to define an accurate flowing of ink into a designated pixel region.
  • the top region of the pixel definition layer needs to have lyophobic property to prevent the ink from spreading in the top region, thereby contaminating adjacent pixel regions.
  • the bottom region of the pixel definition layer needs to exhibit lyophilic property to the ink, to ensure that the ink spreads evenly inside the pixel opening region to form a film layer having a uniform thickness. Therefore, the desired pixel definition layer should have a gradient change from lyophobic property to lyophilic property from top to bottom.
  • a pixel definition layer is often formed by using two or more layers of materials having different lyophilic and lyophobic properties. This method is complicated, and thus limits the application of inkjet printing technology.
  • the present disclosure provides a photoresist composition, including: 5 to 25 wt % of polymethacrylate; 1 to 15 wt % of a lyophobic compound; 1 to 5 wt % of a temperature sensitive polymer; 0.5 to 2 wt % of a photoinitiator; and 0.1 to 1 wt % of a monomer.
  • the photoresist composition includes: 5 to 25 wt % of polymethacrylate; 3 to 10 wt % of the lyophobic compound; 3 to 5 wt % of the temperature sensitive polymer; 0.5 to 2 wt % of the photoinitiator; and 0.1 to 1 wt % of the monomer.
  • a mass ratio of the lyophobic compound to the temperature sensitive polymer is 1:1 to 3:1.
  • a mass ratio of the lyophobic compound to the temperature sensitive polymer is 1:1 to 2:1.
  • composition further includes 0.1 to 1 wt % of an additive and a balance of a solvent.
  • the temperature sensitive polymer is poly(N-isopropylacrylamide) or oligomeric polyethyleneglycol methyl ether methacrylate.
  • the lyophobic compound is fluorine-containing polymethyl methacrylate.
  • the photoinitiator is one or more of nitroaniline, anthraquinone, benzophenone, and N-acetyl-4-nitronaphthylamine.
  • the monomer is one or more of dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, polyurethane acrylate, and ethoxylated pentaerythritol tetraacrylate.
  • the additive is one or more of a polymerization inhibitor, a leveling agent, an antifoaming agent, and a stabilizer.
  • the polymerization inhibitor may include one or more of hydroquinone, 2-sec-butyl-4,6-dinitrophenol, p-tert-butyl catechol, and 2,5-di-tert-butyl hydroquinone.
  • the leveling agent may include acrylic compounds, organosilicone compounds, fluorocarbon compounds, and the like.
  • the antifoaming agent may include emulsified silicone oil, high-carbon alcohol fatty acid ester complex, polyoxyethylene polyoxypropylene pentaerythritol ether, polyoxyethylene polyoxypropylene ether, polyoxypropylene glycerol ether, polyoxypropylene polyoxyethylene glycerol ether, polydimethylsiloxane and the like.
  • the stabilizer may be at least one of isoamylol, n-hexanol, glycerol, or n-hexane.
  • the solvent is one or more of N-methylpyrrolidone, glycol ether, ethylene glycol alkyl ether acetate, diethylene glycol, propylene glycol monomethyl ether acetate, ethoxyethyl acetate, dimethoxyacetaldehyde, propylene glycol methyl ether acetate, ethyl 3-ethoxypropionate, propylene glycol methyl ether, and ethylene glycol ethyl ether acetate.
  • the present disclosure provides a pixel definition layer, including the photoresist composition of the above technical solution, the pixel definition layer exhibiting a lyophobic property at a first temperature and a lyophilic property at a second temperature.
  • the temperature sensitive polymer is poly(N-isopropylacrylamide), and the first temperature is higher than the second temperature.
  • the present disclosure provides an organic electroluminescent display substrate, including the pixel definition layer of the above technical solution.
  • the present disclosure provides a method for preparing an organic electroluminescent display substrate, including: coating the photoresist composition of the above technical solution on a substrate, followed by removing solvents and curing, and patterning the cured photoresist composition to form a pixel definition layer, in which the pixel definition layer defines a plurality of pixel regions; placing ink into the plurality of pixel regions through an inkjet printing process at a first temperature; spreading the ink at a second temperature, removing solvents and baking to form an organic functional layer, in which pixel definition layer exhibits a lyophobic property at a first temperature and a lyophilic property at a second temperature; and evaporating a cathode layer on the pixel definition layer and the organic functional layer to form the organic electroluminescent display substrate.
  • the method further includes performing a vacuum evacuation treatment at a second temperature for 30 to 60 seconds to spread the ink.
  • the present disclosure also provides a display device, including the organic electroluminescence display substrate of the above technical solution.
  • FIG. 1 is a flow chart showing the preparation of an organic electroluminescence display substrate.
  • FIGS. 2 to 6 are schematic views showing the preparation of an organic functional layer through an inkjet printing process.
  • An embodiment of the present disclosure discloses a photoresist composition, including: 5 to 25 wt % of polymethacrylate; 1 to 15 wt % of a lyophobic compound; 1 to 5 wt % of a temperature sensitive polymer; 0.5 to 2 wt % of a photoinitiator; 0.1 to 1 wt % of a monomer; 0.1 to 1 wt % of additives; and a balance of a solvent.
  • the lyophobic compound and the temperature sensitive polymer are used in combination, to achieve different lyophilic property and lyophobic property at different temperatures.
  • the lyophobic compound is fluorine-containing polymethyl methacrylate.
  • the temperature sensitive polymer is poly(N-isopropylacrylamide) or oligomeric polyethyleneglycol methyl ether methacrylate.
  • the temperature sensitive polymer can exhibit a reversible transition between hydrophilicity and hydrophobicity at different temperatures. Under a low temperature conditions, the temperature sensitive polymer can exhibit lyophilic property by forming hydrogen bonds. Under high temperature conditions, the hydrophobic interaction gradually plays a major role due to the destruction of hydrogen bonds, and thus it exhibited a lyophobic property.
  • the inventor had found that the lyophobic property of the temperature sensitive polymer is not strong, in particular to after being added to the photoresist composition, and did not allow the photoresist composition to exhibit a better lyophobic property.
  • the lyophobic property of the photoresist composition can be improved by adding a lyophobic compound to the temperature sensitive polymer.
  • a mass ratio of the lyophobic compound to the temperature sensitive polymer is 1:1 to 3:1.
  • the polymethacrylate may generally be polymethyl methacrylate.
  • the photoinitiator may be one or more of nitroaniline, anthraquinone, benzophenone, and N-acetyl-4-nitronaphthylamine.
  • the monomer may be one or more of dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, polyurethane acrylate, and ethoxylated pentaerythritol tetraacrylate.
  • the additive may be one or more of a polymerization inhibitor, a leveling agent, an antifoaming agent, and a stabilizer.
  • the polymerization inhibitor includes one or more of hydroquinone, 2-sec-butyl-4,6-dinitrophenol, p-tert-butyl catechol, and 2,5-di-tert-butyl hydroquinone.
  • the leveling agent includes an acrylic compound, an organosilicone compound, a fluorocarbon compound, and the like.
  • the antifoaming agent includes emulsified silicone oil, high-carbon alcohol fatty acid ester complex, polyoxyethylene polyoxypropylene pentaerythritol ether, polyoxyethylene polyoxypropylene ether, polyoxypropylene glycerol ether, polyoxypropylene polyoxyethylene glycerol ether, polydimethylsiloxane and the like.
  • the stabilizer is at least one of isoamylol, n-hexanol, glycerol, or n-hexane.
  • the solvent may be one or more of N-methylpyrrolidone, glycol ether, ethylene glycol alkyl ether acetate, diethylene glycol, propylene glycol monomethyl ether acetate, ethoxyethyl acetate, dimethoxyacetaldehyde, propylene glycol methyl ether acetate, ethyl 3-ethoxypropionate, propylene glycol methyl ether, and ethylene glycol ethyl ether acetate.
  • the photoinitiator initiates a crosslinking reaction between the monomer and the polymethacrylate to form a film layer structure after curing.
  • the lyophobic compound and the temperature sensitive polymer are distributed in the film layer structure.
  • the embodiment of the present disclosure discloses a pixel definition layer that is made of the photoresist composition of the above technical solution, the pixel definition layer exhibiting a lyophobic property at a first temperature and a lyophilic property at a second temperature.
  • the pixel definition layer defines a plurality of pixel regions, including a plurality of spacer substrates, and the pixel spacer regions are arranged between the spacer substrates.
  • the pixel definition layer is made of the photoresist composition of the above technical solution, and exhibits a lyophobic property at a first temperature and a lyophilic property at a second temperature.
  • the lyophobic compound is fluorine-containing polymethyl methacrylate.
  • the temperature sensitive polymer is poly(N-isopropylacrylamide) or oligomeric polyethyleneglycol methyl ether methacrylate.
  • the first temperature is higher than the second temperature.
  • a mass ratio of the lyophobic compound to the temperature sensitive polymer is 1:1 to 3:1.
  • the two substances in this ratio range are guaranteed to maintain the lyophobic property at the first temperature and to be converted to the lyophilic property at the second temperature.
  • the pixel definition layer exhibits a lyophobic property at a first temperature.
  • the ink does not spread over the top of the pixel definition layer, and the ink directly falls inside the plurality of pixel regions defined by the pixel definition layer, thereby avoiding cross coloring.
  • the pixel definition layer exhibits a lyophilic property and the ink can spread evenly throughout the plurality of pixel regions.
  • the present disclosure provides an organic electroluminescent display substrate, including the pixel definition layer of the above technical solution.
  • the present disclosure provides a method for preparing an organic electroluminescent display substrate (see FIG. 1 for the detailed procedures), including the following steps.
  • Step S 1 coating the photoresist composition on a substrate, as shown in FIG. 2 ; followed by removing solvents and curing, and patterning the cured photoresist composition to form a pixel definition layer, in which the pixel definition layer defines a plurality of pixel regions, as shown in FIG. 3 .
  • the photoresist composition includes: 5 to 25 wt % of polymethacrylate; 1 to 15 wt % of a lyophobic compound; 1 to 5 wt % of a temperature sensitive polymer; and 0.5 to 2 wt % of a photoinitiator; 0.1 to 1 wt % of a monomer; and 0.1 to 1 wt % of an additive and a balance of a solvent.
  • Step S 2 placing ink into the plurality of pixel regions through an inkjet printing process at a first temperature, as shown in FIG. 4 ; spreading the ink at a second temperature, as shown in FIG. 5 ; and removing the solvents and baking to form an organic functional layer, as shown in FIG. 6 .
  • the lyophobic compound is fluorine-containing polymethyl methacrylate.
  • the first temperature may optionally be 35 to 60° C., and further optionally be 40° C.
  • the pixel definition layer exhibits a strong lyophobic property.
  • the second temperature may optionally be 20 to 30° C., and further optionally be 23° C.
  • the temperature is adjusted to the second temperature, due to the poly(N-isopropylacrylamide) is more lyophilic, the pixel definition layer exhibits lyophilic property.
  • Step S 3 evaporating a cathode layer on the pixel definition layer and the organic functional layer to form the organic electroluminescent display substrate.
  • the present disclosure also provides a display device, including the organic electroluminescence display substrate of the above technical solution.
  • the photoresist composition the pixel definition layer, the method for preparing the same and the application provided by the present disclosure will be described in detail in the following Examples, but the protection scope of the present disclosure is not limited by the following Examples.
  • the components were mixed according to the components and their ratios shown in Table 1 to achieve a photoresist composition.
  • the photoresist composition prepared in Example 1 was coated on a substrate, followed by removing solvents and curing, and the cured photoresist composition was patterned to form a pixel definition layer, the pixel definition layer defining a plurality of pixel regions.
  • Ink was placed into the plurality of pixel regions through an inkjet printing process at a temperature of 35 to 40° C. At this time, the pixel definition layer exhibited a lyophobic property, which avoided contamination of the ink in adjacent pixel regions.
  • the temperature was reduced to 20 to 30° C., and the ink was spread under vacuum evacuation conditions, in which the time for vacuum evacuation was 30 to 60 seconds. At this temperature, the pixel definition layer exhibited a lyophilic property, and the ink was easily spread evenly, and the film formation was very uniform. Then the solvent was further removed by pumping, and still maintained at 20 to 30° C. The residual solvent was removed by baking at a high temperature to form an organic functional layer.
  • a cathode layer was evaporated on the pixel definition layer and the organic functional layer to form the organic electroluminescent display substrate.
  • the change in the contact angle of the formed pixel definition layer was tested.
  • the contact angle of the water droplet was 127° at 40° C.
  • the contact angle of the water drop was 77° at 23° C.
  • the experimental results show that the pixel definition layer formed by the photoresist composition exhibited a lyophobic property at 40° C. and exhibited a lyophilic property at 23° C.
  • the photoresist composition prepared in Examples 2 to 10 were coated on a substrate, followed by removing solvents and curing, and the cured photoresist composition was patterned to form a pixel definition layer, the pixel definition layer defining a plurality of pixel regions.
  • Ink was placed into the plurality of pixel regions through an inkjet printing process at a temperature of 35 to 40° C. At this time, the pixel definition layer exhibited a lyophobic property, which avoided contamination of the ink in adjacent pixel regions.
  • the temperature was reduced to 20 to 30° C., and the ink was spread the under vacuum evacuation conditions, in which the time for vacuum evacuation was 30 to 60 seconds. At this temperature, the pixel definition layer exhibited a lyophilic property, and the ink was easily spread evenly, and the film formation was very uniform. Then the solvent was further removed by pumping, and still maintained at 20 to 30° C. The residual solvent was removed by baking at a high temperature to form an organic functional layer.
  • a cathode layer was evaporated on the pixel definition layer and the organic functional layer to form the organic electroluminescent display substrate.
  • the experimental results show that the pixel definition layer formed by the photoresist composition exhibited a lyophobic property at 40° C. and exhibited a lyophilic property at 23° C.
  • This Example provides an inkjet printing OLED display device, in which the pixel definition layer structure was prepared by using any of the photoresist compositions of Examples 1 to 10, and the inkjet printing process was performed by using the print OLED production method.
  • the components were mixed according to the components and their ratios shown in Table 3 to achieve a photoresist composition.
  • the photoresist compositions prepared in Comparative Examples 1 to 3 were separately coated on a substrate, followed by removing solvents and curing, and the cured photoresist composition was patterned to form a pixel definition layer, the pixel definition layer defining a plurality of pixel regions.
  • the pixel definition layer formed by the photoresist composition of Comparative Example 1 had a contact angle of 154°, showing a lyophobic property.
  • An inkjet printing process was performed on the pixel definition layer, and the ink was not easily spread.
  • the pixel definition layer formed of the photoresist composition of Comparative Example 2 had a contact angle of 85° at a temperature of 40° C., and a contact angle of 69° at a temperature of 23° C., and the lyophobic property was not strong.
  • the inkjet printing process was performed on the pixel definition layer, and the ink tended to contaminate adjacent pixel regions.
  • the pixel definition layer formed of the photoresist composition of Comparative Example 3 had a contact angle of 158° at a temperature of 40° C., and a contact angle of 126° at a temperature of 23° C., and the lyophilic property was not strong.
  • the inkjet printing process was performed on the pixel definition layer, and the ink was not easily spread.
  • the pixel definition layer of the present disclosure is made of the photoresist composition, which exhibits a lyophobic property at a first temperature, and exhibits a lyophilic property at a second temperature.
  • the photoresist composition includes: 5 to 25 wt % of polymethacrylate; 1 to 15 wt % of a lyophobic compound; 1 to 5 wt % of a temperature sensitive polymer; and 0.5 to 2 wt % of a photoinitiator; 0.1 to 1 wt % of a monomer; and 0.1 to 1 wt % of additive and a balance of a solvent.
  • the photoresist composition includes a lyophobic compound and a temperature sensitive polymer.
  • the pixel definition layer made of the photoresist composition exhibits lyophobicity at a first temperature.
  • the inkjet printing process is performed at the first temperature, it can prevent the ink from spreading and remaining on top of the pixel definition layer, thereby avoiding cross coloring.
  • the pixel definition layer exhibited a lyophilic property, ensuring uniform spreading of the ink in the plurality of pixel regions, improving film uniformity, thereby improving the display effect and product quality of the OLED substrate.

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Abstract

The present disclosure provides a photoresist composition, a pixel definition layer, a display substrate and a method for preparing the same, and a display device. The photoresist composition includes: 5 to 25 wt % of polymethacrylate; 1 to 15 wt % of a lyophobic compound; 1 to 5 wt % of a temperature sensitive polymer; 0.5 to 2 wt % of a photoinitiator; and 0.1 to 1 wt % of a monomer.

Description

CROSS-REFERENCE TO RELATED APPLICATION
This application claims priority to Chinese Patent Application No. 201810844368.4 filed on Jul. 27, 2018, which is incorporated herein by reference in its entirety.
TECHNICAL FIELD
The present disclosure relates to the field of display, in particular to a photoresist composition, a pixel definition layer, a display substrate and a method for preparing the same, and a display device.
BACKGROUND
Methods for preparing organic electroluminescent layers of organic light-emitting diodes (OLEDs) are mainly an evaporation process and a solution process.
The inkjet printing technology of the solution process is used to accurately drop a solution of luminescent materials into a sub-pixel region, and the solvent is volatilized to form a film. As compared with vacuum evaporation technology, inkjet printing is suitable for macromolecular luminescent materials and small molecule luminescent materials, has a high material utilization rate, a low equipment cost, a high productivity, and is easy to produce large-scale and large-sized products.
Inkjet printing technology requires to prepare a pixel definition layer on the electrodes of the substrate in advance to define an accurate flowing of ink into a designated pixel region. The top region of the pixel definition layer needs to have lyophobic property to prevent the ink from spreading in the top region, thereby contaminating adjacent pixel regions. At the same time, the bottom region of the pixel definition layer needs to exhibit lyophilic property to the ink, to ensure that the ink spreads evenly inside the pixel opening region to form a film layer having a uniform thickness. Therefore, the desired pixel definition layer should have a gradient change from lyophobic property to lyophilic property from top to bottom.
In the related art, in order to distinguish the pixel definition layer at the top from the lyophilic and lyophobic regions at the bottom, a pixel definition layer is often formed by using two or more layers of materials having different lyophilic and lyophobic properties. This method is complicated, and thus limits the application of inkjet printing technology.
SUMMARY
The present disclosure provides a photoresist composition, including: 5 to 25 wt % of polymethacrylate; 1 to 15 wt % of a lyophobic compound; 1 to 5 wt % of a temperature sensitive polymer; 0.5 to 2 wt % of a photoinitiator; and 0.1 to 1 wt % of a monomer.
In an exemplary embodiment, the photoresist composition includes: 5 to 25 wt % of polymethacrylate; 3 to 10 wt % of the lyophobic compound; 3 to 5 wt % of the temperature sensitive polymer; 0.5 to 2 wt % of the photoinitiator; and 0.1 to 1 wt % of the monomer.
Optionally, a mass ratio of the lyophobic compound to the temperature sensitive polymer is 1:1 to 3:1.
Further optionally, a mass ratio of the lyophobic compound to the temperature sensitive polymer is 1:1 to 2:1.
Further, the composition further includes 0.1 to 1 wt % of an additive and a balance of a solvent.
Optionally, the temperature sensitive polymer is poly(N-isopropylacrylamide) or oligomeric polyethyleneglycol methyl ether methacrylate.
Optionally, the lyophobic compound is fluorine-containing polymethyl methacrylate.
Optionally, the photoinitiator is one or more of nitroaniline, anthraquinone, benzophenone, and N-acetyl-4-nitronaphthylamine.
Optionally, the monomer is one or more of dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, polyurethane acrylate, and ethoxylated pentaerythritol tetraacrylate.
Optionally, the additive is one or more of a polymerization inhibitor, a leveling agent, an antifoaming agent, and a stabilizer. For example, the polymerization inhibitor may include one or more of hydroquinone, 2-sec-butyl-4,6-dinitrophenol, p-tert-butyl catechol, and 2,5-di-tert-butyl hydroquinone. The leveling agent may include acrylic compounds, organosilicone compounds, fluorocarbon compounds, and the like. The antifoaming agent may include emulsified silicone oil, high-carbon alcohol fatty acid ester complex, polyoxyethylene polyoxypropylene pentaerythritol ether, polyoxyethylene polyoxypropylene ether, polyoxypropylene glycerol ether, polyoxypropylene polyoxyethylene glycerol ether, polydimethylsiloxane and the like. The stabilizer may be at least one of isoamylol, n-hexanol, glycerol, or n-hexane. Optionally, the solvent is one or more of N-methylpyrrolidone, glycol ether, ethylene glycol alkyl ether acetate, diethylene glycol, propylene glycol monomethyl ether acetate, ethoxyethyl acetate, dimethoxyacetaldehyde, propylene glycol methyl ether acetate, ethyl 3-ethoxypropionate, propylene glycol methyl ether, and ethylene glycol ethyl ether acetate.
The present disclosure provides a pixel definition layer, including the photoresist composition of the above technical solution, the pixel definition layer exhibiting a lyophobic property at a first temperature and a lyophilic property at a second temperature.
Optionally, the temperature sensitive polymer is poly(N-isopropylacrylamide), and the first temperature is higher than the second temperature.
The present disclosure provides an organic electroluminescent display substrate, including the pixel definition layer of the above technical solution.
The present disclosure provides a method for preparing an organic electroluminescent display substrate, including: coating the photoresist composition of the above technical solution on a substrate, followed by removing solvents and curing, and patterning the cured photoresist composition to form a pixel definition layer, in which the pixel definition layer defines a plurality of pixel regions; placing ink into the plurality of pixel regions through an inkjet printing process at a first temperature; spreading the ink at a second temperature, removing solvents and baking to form an organic functional layer, in which pixel definition layer exhibits a lyophobic property at a first temperature and a lyophilic property at a second temperature; and evaporating a cathode layer on the pixel definition layer and the organic functional layer to form the organic electroluminescent display substrate.
Optionally, the method further includes performing a vacuum evacuation treatment at a second temperature for 30 to 60 seconds to spread the ink.
The present disclosure also provides a display device, including the organic electroluminescence display substrate of the above technical solution.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a flow chart showing the preparation of an organic electroluminescence display substrate.
FIGS. 2 to 6 are schematic views showing the preparation of an organic functional layer through an inkjet printing process.
 DETAILED DESCRIPTION
In order to better understand the present disclosure, the optional embodiments of the present disclosure will be described below in combination with Examples, but it should be understood that these descriptions are merely used to further illustrate the features and advantages of the present disclosure and are not intended to limit the present disclosure.
An embodiment of the present disclosure discloses a photoresist composition, including: 5 to 25 wt % of polymethacrylate; 1 to 15 wt % of a lyophobic compound; 1 to 5 wt % of a temperature sensitive polymer; 0.5 to 2 wt % of a photoinitiator; 0.1 to 1 wt % of a monomer; 0.1 to 1 wt % of additives; and a balance of a solvent.
In the present disclosure, the lyophobic compound and the temperature sensitive polymer are used in combination, to achieve different lyophilic property and lyophobic property at different temperatures.
Optionally, the lyophobic compound is fluorine-containing polymethyl methacrylate.
Optionally, the temperature sensitive polymer is poly(N-isopropylacrylamide) or oligomeric polyethyleneglycol methyl ether methacrylate. The temperature sensitive polymer can exhibit a reversible transition between hydrophilicity and hydrophobicity at different temperatures. Under a low temperature conditions, the temperature sensitive polymer can exhibit lyophilic property by forming hydrogen bonds. Under high temperature conditions, the hydrophobic interaction gradually plays a major role due to the destruction of hydrogen bonds, and thus it exhibited a lyophobic property. Through extensive experiments, the inventor had found that the lyophobic property of the temperature sensitive polymer is not strong, in particular to after being added to the photoresist composition, and did not allow the photoresist composition to exhibit a better lyophobic property. The lyophobic property of the photoresist composition can be improved by adding a lyophobic compound to the temperature sensitive polymer.
Optionally, a mass ratio of the lyophobic compound to the temperature sensitive polymer is 1:1 to 3:1.
In the present disclosure, the polymethacrylate may generally be polymethyl methacrylate.
The photoinitiator may be one or more of nitroaniline, anthraquinone, benzophenone, and N-acetyl-4-nitronaphthylamine.
The monomer may be one or more of dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, polyurethane acrylate, and ethoxylated pentaerythritol tetraacrylate.
The additive may be one or more of a polymerization inhibitor, a leveling agent, an antifoaming agent, and a stabilizer. For example, the polymerization inhibitor includes one or more of hydroquinone, 2-sec-butyl-4,6-dinitrophenol, p-tert-butyl catechol, and 2,5-di-tert-butyl hydroquinone. The leveling agent includes an acrylic compound, an organosilicone compound, a fluorocarbon compound, and the like. The antifoaming agent includes emulsified silicone oil, high-carbon alcohol fatty acid ester complex, polyoxyethylene polyoxypropylene pentaerythritol ether, polyoxyethylene polyoxypropylene ether, polyoxypropylene glycerol ether, polyoxypropylene polyoxyethylene glycerol ether, polydimethylsiloxane and the like. The stabilizer is at least one of isoamylol, n-hexanol, glycerol, or n-hexane.
The solvent may be one or more of N-methylpyrrolidone, glycol ether, ethylene glycol alkyl ether acetate, diethylene glycol, propylene glycol monomethyl ether acetate, ethoxyethyl acetate, dimethoxyacetaldehyde, propylene glycol methyl ether acetate, ethyl 3-ethoxypropionate, propylene glycol methyl ether, and ethylene glycol ethyl ether acetate.
Under ultraviolet light irradiation, the photoinitiator initiates a crosslinking reaction between the monomer and the polymethacrylate to form a film layer structure after curing. The lyophobic compound and the temperature sensitive polymer are distributed in the film layer structure.
The embodiment of the present disclosure discloses a pixel definition layer that is made of the photoresist composition of the above technical solution, the pixel definition layer exhibiting a lyophobic property at a first temperature and a lyophilic property at a second temperature.
In the present disclosure, the pixel definition layer defines a plurality of pixel regions, including a plurality of spacer substrates, and the pixel spacer regions are arranged between the spacer substrates. The pixel definition layer is made of the photoresist composition of the above technical solution, and exhibits a lyophobic property at a first temperature and a lyophilic property at a second temperature.
In the photoresist composition, the lyophobic compound is fluorine-containing polymethyl methacrylate. Optionally, the temperature sensitive polymer is poly(N-isopropylacrylamide) or oligomeric polyethyleneglycol methyl ether methacrylate.
When the temperature sensitive polymer is poly(N-isopropylacrylamide), the first temperature is higher than the second temperature.
Optionally, a mass ratio of the lyophobic compound to the temperature sensitive polymer is 1:1 to 3:1. The two substances in this ratio range are guaranteed to maintain the lyophobic property at the first temperature and to be converted to the lyophilic property at the second temperature.
In the present disclosure, the pixel definition layer exhibits a lyophobic property at a first temperature. When the inkjet printing process is performed at the first temperature, the ink does not spread over the top of the pixel definition layer, and the ink directly falls inside the plurality of pixel regions defined by the pixel definition layer, thereby avoiding cross coloring. At the second temperature, the pixel definition layer exhibits a lyophilic property and the ink can spread evenly throughout the plurality of pixel regions.
The present disclosure provides an organic electroluminescent display substrate, including the pixel definition layer of the above technical solution.
The present disclosure provides a method for preparing an organic electroluminescent display substrate (see FIG. 1 for the detailed procedures), including the following steps.
Step S1: coating the photoresist composition on a substrate, as shown in FIG. 2; followed by removing solvents and curing, and patterning the cured photoresist composition to form a pixel definition layer, in which the pixel definition layer defines a plurality of pixel regions, as shown in FIG. 3.
The photoresist composition includes: 5 to 25 wt % of polymethacrylate; 1 to 15 wt % of a lyophobic compound; 1 to 5 wt % of a temperature sensitive polymer; and 0.5 to 2 wt % of a photoinitiator; 0.1 to 1 wt % of a monomer; and 0.1 to 1 wt % of an additive and a balance of a solvent.
Step S2: placing ink into the plurality of pixel regions through an inkjet printing process at a first temperature, as shown in FIG. 4; spreading the ink at a second temperature, as shown in FIG. 5; and removing the solvents and baking to form an organic functional layer, as shown in FIG. 6.
Optionally, the lyophobic compound is fluorine-containing polymethyl methacrylate. When the temperature sensitive polymer is poly(N-isopropylacrylamide), the first temperature may optionally be 35 to 60° C., and further optionally be 40° C. At the first temperature, the pixel definition layer exhibits a strong lyophobic property.
The second temperature may optionally be 20 to 30° C., and further optionally be 23° C. When the temperature is adjusted to the second temperature, due to the poly(N-isopropylacrylamide) is more lyophilic, the pixel definition layer exhibits lyophilic property.
Optionally, performing a vacuum evacuation treatment at a second temperature for 30 to 60 seconds to spread the ink.
Step S3: evaporating a cathode layer on the pixel definition layer and the organic functional layer to form the organic electroluminescent display substrate.
The present disclosure also provides a display device, including the organic electroluminescence display substrate of the above technical solution.
In order to further understand the present disclosure, the photoresist composition, the pixel definition layer, the method for preparing the same and the application provided by the present disclosure will be described in detail in the following Examples, but the protection scope of the present disclosure is not limited by the following Examples.
Unless otherwise indicated, the experimental methods used in the following examples are conventional methods.
Unless otherwise indicated, the materials, the reagents and the like used in the following examples are commercially available.
Examples 1 to 10: Preparation of Photoresist Compositions
The components were mixed according to the components and their ratios shown in Table 1 to achieve a photoresist composition.
TABLE 1
fluorine- dipenta-
containing poly(N- erythritol organo-
polymethyl polymethyl isopropyl- nitro- penta- hydro- silicone emulsified N-methyl-
methacrylate methacrylate acrylamide) aniline acrylate quinone compound silicone isoamylol pyrrolidone
(wt %) (wt %) (wt %) (wt %) (wt %) (wt %) (wt %) oil (wt %) (wt %) (wt %)
Example 1  5% 15% 5%   1% 0.1% 0.1% 0.1% — — balance
Example 2  5% 10% 5%   1% 0.1% 0.1% 0.1% — — balance
Example 3  5%  5% 5%   1% 0.1% 0.1% 0.1% — — balance
Example 4  5%  5% 3%   1% 0.1% 0.1% 0.1% — — balance
Example 5  5%  3% 1%   1% 0.1% 0.1% 0.1% — — balance
Example 6  5%  3% 3%   1% 0.1% 0.1% 0.1% — — balance
Example 7  5%  1% 1%   1% 0.1% 0.1% 0.1% — — balance
Example 8 10% 10% 5% 0.5% 0.1% 0.5% — 0.1% — balance
Example 9 20%  3% 3% 1.5%   1% 0.1% 0.1% 0.1% 0.1% balance
Example 10 25%  1% 1% 0.5% 0.1% — 0.1% 0.1% balance
Example 11: Preparation of Organic Electroluminescent Display Substrate
The photoresist composition prepared in Example 1 was coated on a substrate, followed by removing solvents and curing, and the cured photoresist composition was patterned to form a pixel definition layer, the pixel definition layer defining a plurality of pixel regions.
Ink was placed into the plurality of pixel regions through an inkjet printing process at a temperature of 35 to 40° C. At this time, the pixel definition layer exhibited a lyophobic property, which avoided contamination of the ink in adjacent pixel regions.
The temperature was reduced to 20 to 30° C., and the ink was spread under vacuum evacuation conditions, in which the time for vacuum evacuation was 30 to 60 seconds. At this temperature, the pixel definition layer exhibited a lyophilic property, and the ink was easily spread evenly, and the film formation was very uniform. Then the solvent was further removed by pumping, and still maintained at 20 to 30° C. The residual solvent was removed by baking at a high temperature to form an organic functional layer.
A cathode layer was evaporated on the pixel definition layer and the organic functional layer to form the organic electroluminescent display substrate.
The change in the contact angle of the formed pixel definition layer was tested. The contact angle of the water droplet was 127° at 40° C., and the contact angle of the water drop was 77° at 23° C. The experimental results show that the pixel definition layer formed by the photoresist composition exhibited a lyophobic property at 40° C. and exhibited a lyophilic property at 23° C.
Examples 12 to 20: Preparation of Organic Electroluminescent Display Substrate
The photoresist composition prepared in Examples 2 to 10 were coated on a substrate, followed by removing solvents and curing, and the cured photoresist composition was patterned to form a pixel definition layer, the pixel definition layer defining a plurality of pixel regions.
Ink was placed into the plurality of pixel regions through an inkjet printing process at a temperature of 35 to 40° C. At this time, the pixel definition layer exhibited a lyophobic property, which avoided contamination of the ink in adjacent pixel regions.
The temperature was reduced to 20 to 30° C., and the ink was spread the under vacuum evacuation conditions, in which the time for vacuum evacuation was 30 to 60 seconds. At this temperature, the pixel definition layer exhibited a lyophilic property, and the ink was easily spread evenly, and the film formation was very uniform. Then the solvent was further removed by pumping, and still maintained at 20 to 30° C. The residual solvent was removed by baking at a high temperature to form an organic functional layer.
A cathode layer was evaporated on the pixel definition layer and the organic functional layer to form the organic electroluminescent display substrate.
The contact angle changes of the formed pixel definition layers were tested separately, and the contact angles of the water droplets at 40° C. and 23° C. were as shown in Table 2 below.
TABLE 2
water droplet contact angle water droplet contact angle
in degree (at 40° C.) in degree (at 23° C.)
Example 2 120 75
Example 3 113 73
Example 4 115 73
Example 5 112 74
Example 6 112 71
Example 7 110 71
Example 8 118 72
Example 9 112 72
Example 10 110 71
The experimental results show that the pixel definition layer formed by the photoresist composition exhibited a lyophobic property at 40° C. and exhibited a lyophilic property at 23° C.
Example 21: Display Device
This Example provides an inkjet printing OLED display device, in which the pixel definition layer structure was prepared by using any of the photoresist compositions of Examples 1 to 10, and the inkjet printing process was performed by using the print OLED production method.
Comparative Examples 1 to 3
The components were mixed according to the components and their ratios shown in Table 3 to achieve a photoresist composition.
TABLE 3
fluorine- dipenta-
containing poly(N- erythritol organo-
polymethyl polymethyl isopropyl- nitro- penta- hydro- silicone emulsified N-methyl-
methacrylate methacrylate acrylamide) aniline acrylate quinone compound silicone isoamylol pyrrolidone
(wt %) (wt %) (wt %) (wt %) (wt %) (wt %) (wt %) oil (wt %) (wt %) (wt %)
Comparative 5% 10% — 1% 0.1% 0.1% 0.1% — — balance
Example 1
Comparative 5% — 5% 1% 0.1% 0.1% 0.1% — — balance
Example 2
Comparative 5% 25% 5% 1% 0.1% 0.1% 0.1% — — balance
Example 3
The photoresist compositions prepared in Comparative Examples 1 to 3 were separately coated on a substrate, followed by removing solvents and curing, and the cured photoresist composition was patterned to form a pixel definition layer, the pixel definition layer defining a plurality of pixel regions.
The contact angle of the pixel definition layer was tested, and the water droplet contact angles at 40° C. and 23° C. are shown in Table 4 below.
TABLE 4
water droplet contact angle water droplet contact angle
(at 40° C.) (at 23° C.)
Comparative 154°
Example 1
Comparative  85°  69°
Example 2
Comparative 158° 126°
Example 3
As can be seen from Table 4, the pixel definition layer formed by the photoresist composition of Comparative Example 1 had a contact angle of 154°, showing a lyophobic property. An inkjet printing process was performed on the pixel definition layer, and the ink was not easily spread.
The pixel definition layer formed of the photoresist composition of Comparative Example 2 had a contact angle of 85° at a temperature of 40° C., and a contact angle of 69° at a temperature of 23° C., and the lyophobic property was not strong. The inkjet printing process was performed on the pixel definition layer, and the ink tended to contaminate adjacent pixel regions.
The pixel definition layer formed of the photoresist composition of Comparative Example 3 had a contact angle of 158° at a temperature of 40° C., and a contact angle of 126° at a temperature of 23° C., and the lyophilic property was not strong. The inkjet printing process was performed on the pixel definition layer, and the ink was not easily spread.
As compared to the related art, the pixel definition layer of the present disclosure is made of the photoresist composition, which exhibits a lyophobic property at a first temperature, and exhibits a lyophilic property at a second temperature. The photoresist composition includes: 5 to 25 wt % of polymethacrylate; 1 to 15 wt % of a lyophobic compound; 1 to 5 wt % of a temperature sensitive polymer; and 0.5 to 2 wt % of a photoinitiator; 0.1 to 1 wt % of a monomer; and 0.1 to 1 wt % of additive and a balance of a solvent. The photoresist composition includes a lyophobic compound and a temperature sensitive polymer. The pixel definition layer made of the photoresist composition exhibits lyophobicity at a first temperature. Thus, when the inkjet printing process is performed at the first temperature, it can prevent the ink from spreading and remaining on top of the pixel definition layer, thereby avoiding cross coloring. At the second temperature, the pixel definition layer exhibited a lyophilic property, ensuring uniform spreading of the ink in the plurality of pixel regions, improving film uniformity, thereby improving the display effect and product quality of the OLED substrate.
The description of the above Examples is merely used for helping to understand the method according to the present disclosure and its core idea. It should be noted that a person skilled in the art may make further improvements and modifications to the disclosure without departing from the principle of the present disclosure, and these improvements and modifications shall also fall within the scope of the present disclosure.
The above description of the disclosed Examples allows one skilled in the art to implement or use the present disclosure. Various modifications to these Examples would be apparent to one skilled in the art, and the general principles defined herein may be applied to other Examples without departing from the spirit or scope of the disclosure. Therefore, the present disclosure will not be limited to the Examples shown herein, but should conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims (14)

What is claimed is:
1. A pixel definition layer, used in inkjet printing to prepare OLED devices, comprising a photoresist composition, the pixel definition layer exhibiting a lyophobic property at a first temperature and a lyophilic property at a second temperature,
wherein the photoresist composition comprises: 5 to 25 wt % of polymethacrylate, 1 to 15 wt % of a lyophobic compound, 1 to 5 wt % of a temperature sensitive polymer, 0.5 to 2 wt % of a photoinitiator, and 0.1 to 1 wt % of a monomer;
wherein the temperature sensitive polymer is poly(N-isopropylacrylamide), and the first temperature is higher than the second temperature;
wherein the lyophobic compound is fluorine-containing polymethyl methacrylate; and
wherein a mass ratio of the lyophobic compound to the temperature sensitive polymer is 1:1 to 3:1.
2. An organic electroluminescent display substrate, comprising the pixel definition layer of claim 1.
3. A method for preparing an organic electroluminescent display substrate, comprising:
coating a photoresist composition on a substrate, followed by removing solvents and curing, and patterning the cured photoresist composition to form a pixel definition layer, wherein the pixel definition layer defines a plurality of pixel regions, wherein the photoresist composition comprises 5 to 25 wt % of polymethacrylate, 1 to 15 wt % of a lyophobic compound, 1 to 5 wt % of a temperature sensitive polymer, 0.5 to 2 wt % of a photoinitiator, and 0.1 to 1 wt % of a monomer, wherein the temperature sensitive polymer is poly(N-isopropylacrylamide), and the first temperature is higher than the second temperature;
placing ink into the plurality of pixel regions through an inkjet printing process at a first temperature;
spreading the ink at a second temperature, removing solvents and baking to form an organic functional layer, wherein the pixel definition layer exhibits a lyophobic property at a first temperature and a lyophilic property at a second temperature;
evaporating a cathode layer on the pixel definition layer and the organic functional layer to form the organic electroluminescent display substrate; and
wherein a mass ratio of the lyophobic compound to the temperature sensitive polymer is 1:1 to 3:1.
4. The method of claim 3, further comprising performing a vacuum evacuation treatment at a second temperature for 30 to 60 seconds to spread the ink.
5. The method of claim 3, wherein the temperature sensitive polymer is poly(N-isopropylacrylamide), and the first temperature is 35 to 60 ° C.
6. The method of claim 3, wherein the second temperature is 20 to 30 ° C.
7. A display device, comprising the organic electroluminescent display substrate of claim 2.
8. The pixel definition layer of claim 1, wherein the photoresist composition comprises: 5 to 25 wt % of polymethacrylate; 3 to 10 wt % of the lyophobic compound; 3 to 5 wt % of the temperature sensitive polymer; 0.5 to 2 wt % of the photoinitiator; and 0.1 to 1 wt % of the monomer.
9. The pixel definition layer of claim 1, wherein a mass ratio of the lyophobic compound to the temperature sensitive polymer is 1:1 to 2:1.
10. The pixel definition layer of claim 1, wherein the photoresist composition further comprises 0.1 to 1 wt % of an additive and a balance of a solvent.
11. The pixel definition layer of claim 1, wherein the photoinitiator is one or more of nitroaniline, anthraquinone, benzophenone, and N-acetyl-4-nitronaphthylamine.
12. The pixel definition layer of claim 1, wherein the monomer is one or more of dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, polyurethane acrylate, and ethoxylated pentaerythritol tetraacrylate.
13. The pixel definition layer of claim 10, wherein the additive is one or more of a polymerization inhibitor, a leveling agent, an antifoaming agent, and a stabilizer.
14. The pixel definition layer of claim 10, wherein the solvent is one or more of N-methylpyrrolidone, glycol ether, ethylene glycol alkyl ether acetate, diethylene glycol, propylene glycol monomethyl ether acetate, ethoxyethyl acetate, dimethoxyacetaldehyde, propylene glycol methyl ether acetate, ethyl 3-ethoxypropionate, propylene glycol methyl ether, and ethylene glycol ethyl ether acetate.
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