US10412866B2 - Cover film - Google Patents

Cover film Download PDF

Info

Publication number
US10412866B2
US10412866B2 US15/971,129 US201815971129A US10412866B2 US 10412866 B2 US10412866 B2 US 10412866B2 US 201815971129 A US201815971129 A US 201815971129A US 10412866 B2 US10412866 B2 US 10412866B2
Authority
US
United States
Prior art keywords
layer
electromagnetic shielding
cover film
powder
electromagnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US15/971,129
Other versions
US20180255668A1 (en
Inventor
Chih-Ming Lin
Hui-Feng Lin
Chien-Hui Lee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asia Electronic Material Co Ltd
Original Assignee
Asia Electronic Material Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN201410545233.XA external-priority patent/CN105578851A/en
Application filed by Asia Electronic Material Co Ltd filed Critical Asia Electronic Material Co Ltd
Priority to US15/971,129 priority Critical patent/US10412866B2/en
Assigned to ASIA ELECTRONIC MATERIAL CO., LTD. reassignment ASIA ELECTRONIC MATERIAL CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: LEE, CHIEN-HUI, LIN, CHIH-MING, LIN, Hui-feng
Publication of US20180255668A1 publication Critical patent/US20180255668A1/en
Application granted granted Critical
Publication of US10412866B2 publication Critical patent/US10412866B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073Shielding materials
    • H05K9/0081Electromagnetic shielding materials, e.g. EMI, RFI shielding
    • H05K9/0088Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a plurality of shielding layers; combining different shielding material structure
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0216Reduction of cross-talk, noise or electromagnetic interference
    • H05K1/0218Reduction of cross-talk, noise or electromagnetic interference by printed shielding conductors, ground planes or power plane

Definitions

  • the present disclosure relates to a cover film, and more particularly, to a cover film with an electromagnetic shielding property.
  • FPCB flexible printed circuit boards
  • wirings are designed to be more aggregated such that the spacing between two adjacent wires is smaller.
  • the problem of electromagnetic interference would get worse due to the decreased spacing, the higher operating frequency, and the unreasonable circuit arrangement.
  • an electromagnetic shielding layer is added on a cover film or a solder resist which is attached on a circuit board by glue for shielding electromagnetic interference from outside or internal signal noises. Nevertheless, the process is more complex and time-consuming, and results in lack of protection for the electromagnetic shielding layer. Therefore, there is a need to develop a thinner cover film for shielding electromagnetic interference.
  • the present disclosure provides a cover film, comprising a conductive adhesive layer, an electromagnetic shielding layer formed on the conductive adhesive layer, and an insulating layer formed on the electromagnetic shielding layer, wherein the electromagnetic shielding layer has a thickness of from 0.01 to 25 micrometers.
  • the thickness of the electromagnetic shielding layer is from 0.01 to 1.5 micrometers.
  • a thickness of the insulating layer is between 3 to 75 micrometers.
  • the insulating layer comprises a first polymer and an additive dispersed in the first polymer, wherein a content of the additive is between 3 wt % to 15 wt % of the insulating layer, and wherein the first polymer is at least one selected from the group consisting of an epoxy resin, an acrylic resin and a combination thereof, and the additive is at least one selected from the group consisting of carbon powder, titanium dioxide, a colorant, a pigment and a combination thereof.
  • the electromagnetic shielding layer is made of metal or a resin containing metal powder. In an embodiment, the electromagnetic shielding layer is formed on the conductive adhesive layer by coating, vapor deposition or magnetron sputtering.
  • a thickness of the conductive adhesive layer is between 3 to 50 micrometers, wherein the conductive adhesive layer comprises a second polymer and at least one conductive powder dispersed in the second polymer, and wherein a content of the conductive powder is between 0.5 wt % to 90 wt % of the conductive adhesive layer.
  • the second polymer is at least one selected from the group consisting of an epoxy resin, a poly-p-xylene resin, a bismaleimide resin, a polyimide resin, an acrylic resin, a urethane resin, a silicon rubber-based resin and a combination thereof.
  • the second polymer is an epoxy resin or an acrylic resin.
  • the at least one conductive powder is at least one selected from the group consisting of gold powder, silver powder, copper powder, nickel powder, aluminum powder, silver coated copper powder, silver coated nickel powder, copper-nickel alloy, iron powder, iron-based alloy, silver-copper alloy, tin-copper alloy, gold plated nickel powder, and silver plated copper powder.
  • the cover film further comprises an electromagnetic absorption layer formed between the electromagnetic shielding layer and the insulating layer, wherein the electromagnetic absorption layer has a thickness of from 0.1 to 25 micrometers.
  • the electromagnetic absorption layer comprises a third polymer and at least one magnetic powder dispersed in the third polymer, wherein a content of the at least one magnetic powder is between 50 wt % to 90 wt % of the electromagnetic absorption layer, and the electromagnetic absorption layer is formed by filling, laminating or coating.
  • the at least one magnetic powder is at least one selected from the group consisting of iron oxide, iron-silicon-aluminum alloy, permalloy (iron-nickel alloy), and iron-silicon-chrome-nickel alloy.
  • the third polymer is selected from the group consisting of an epoxy resin, a poly-p-xylene resin, a bismaleimide resin, a polyimide resin, an acrylic resin, a urethane resin and a silicon rubber-based resin and a combination thereof.
  • the third polymer is an epoxy resin or an acrylic resin.
  • the cover film further comprises a release layer formed under the conductive adhesive layer such that the conductive adhesive layer is sandwiched between the electromagnetic shielding layer and the release layer, wherein the release layer has a thickness of from 25 to 100 micrometers.
  • the release layer is a polyethylene terephthalate (PET) fluorine release film, a PET silicone oil release film, a PET matte release film or a polyethylene release film.
  • an overall thickness of the FPCB can be reduced through forming the thinner interposed electromagnetic shielding layer having a thickness of from 0.01 to 25 micrometers.
  • the electromagnetic shielding layer can be formed by coating, vapor deposition or magnetron sputtering in one single process such that the process of the cover film is simplified.
  • the cover film of the present disclosure has an effect of preventing not only electromagnetic interference resulting from the internal signal transmission but also electromagnetic spillover by forming the electromagnetic absorption layer having a thickness of from 0.1 to 25 micrometers with a limited increased thickness.
  • FIG. 1 is a cross-sectional schematic view of a cover film according to a first embodiment of the present disclosure
  • FIG. 2 is a cross-sectional schematic view of a cover film according to another example of the first embodiment of the present disclosure
  • FIG. 3 is a cross-sectional schematic view of a cover film according to a second embodiment of the present disclosure.
  • FIG. 4 is a cross-sectional schematic view of a cover film according to another example of the second embodiment of the present disclosure.
  • FIG. 1 is a cross-sectional schematic view of a cover film 1 of the present disclosure, comprising a conductive adhesive layer 11 , an electromagnetic shielding layer 12 formed on the conductive adhesive layer 11 , and an insulating layer 13 formed on the electromagnetic shielding layer 12 , wherein the electromagnetic shielding layer 12 has a thickness of from 0.01 to 25 micrometers.
  • the insulating layer 13 having a thickness of from 3 to 75 micrometers.
  • the insulating layer 13 comprises a first polymer and an additive dispersed in the first polymer, wherein a content of the additive is between 3 wt % to 15 wt % of the insulating layer.
  • the first polymer is at least one selected from the group consisting of an epoxy resin, an acrylic resin and a combination thereof.
  • the electromagnetic shielding layer 12 having a thickness of from 0.01 to 25 micrometers is formed on the conductive adhesive layer 11 , and the thickness of the electromagnetic shielding layer 12 is preferably from 0.01 to 1.5 micrometers.
  • the conductive adhesive layer 11 has a thickness of from 3 to 50 micrometers and comprises a second polymer and at least one conductive powder dispersed in the second polymer, wherein a content of the conductive powder is between 0.5 wt % to 90 wt % of the conductive adhesive layer.
  • the second polymer is at least one selected from the group consisting of an epoxy resin, a poly-p-xylene resin, a bismaleimide resin, a polyimide resin, an acrylic resin, a urethane resin and a silicon rubber-based resin and a combination thereof.
  • the second polymer is an epoxy resin or an acrylic resin.
  • the at least one conductive powder is at least one selected from the group consisting of gold powder, silver powder, copper powder, nickel powder, aluminum powder, silver coated copper powder, silver coated nickel powder, copper-nickel alloy, iron powder, iron-based alloys, silver-copper alloy, tin-copper alloy, gold plated nickel powder, and silver plated copper powder.
  • the cover film 2 of the present disclosure further comprises a release layer 10 formed under the conductive adhesive layer 11 such that the conductive adhesive layer 11 is sandwiched between the electromagnetic shielding layer 12 and the release layer 10 .
  • the release layer 10 is then removed.
  • a cover film 3 further comprises an electromagnetic absorption layer 14 formed between the electromagnetic shielding layer 12 and the insulating layer 13 .
  • the electromagnetic absorption layer 14 has a thickness of from 0.1 to 25 micrometers.
  • the electromagnetic absorption layer 14 comprises a third polymer and at least one magnetic powder dispersed in the third polymer, wherein the at least one magnetic powder is at least one selected from the group consisting of iron oxide, iron-silicon-aluminum alloy, permalloy (iron-nickel alloy), and iron-silicon-chrome-nickel alloy.
  • the third polymer is at least one selected from the group consisting of an epoxy resin, a poly-p-xylene resin, a bismaleimide resin, a polyimide resin, an acrylic resin, a urethane resin, a silicon rubber-based resin and a combination thereof. More preferably, the third polymer is an epoxy resin or an acrylic resin.
  • the structure of the cover film 3 of this embodiment is similar to that of the cover film 1 of the first embodiment, and the difference is in that the additional electromagnetic absorption layer 14 having a thickness of from 0.1 to 25 micrometers is interposed between the insulating layer 13 and the electromagnetic shielding layer 12 .
  • the electromagnetic shielding layer 12 has a thickness of from 0.01 to 1.5 micrometers, and the electromagnetic shielding layer 12 is made of metal such as gold, copper, zinc, nickel or aluminum.
  • a conductive adhesive layer 11 is formed under the electromagnetic shielding layer 12 , and a thickness of the conductive adhesive layer 11 is from 3 to 50 micrometers.
  • the conductive adhesive layer 11 comprises a second polymer and at least one conductive powder dispersed in the second polymer, wherein a content of the conductive powder is between 0.5 wt % to 90 wt % of the conductive adhesive layer.
  • the second polymer is at least one selected from the group consisting of an epoxy resin, a poly-p-xylene resin, a bismaleimide resin, a polyimide resin, an acrylic resin, a urethane resin, a silicon rubber-based resin and a combination thereof.
  • the second polymer is an epoxy resin or an acrylic resin.
  • the at least one conductive powder is at least one selected from the group consisting of gold powder, silver powder, copper powder, nickel powder, aluminum powder, silver coated copper powder, silver coated nickel powder, copper-nickel alloy, iron powder, iron-based alloy, silver-copper alloy, tin-copper alloy, gold plated nickel powder, and silver plated copper powder.
  • the cover film 4 of the present disclosure further comprises a release layer 10 formed under the conductive adhesive layer 11 such that the conductive adhesive layer 11 is sandwiched between the electromagnetic shielding layer 12 and the release layer 10 .
  • the release layer 10 is then removed.
  • cover films of the present disclosure were made according to the thickness described in Table 1 and the manufacturing method described below.
  • an insulating layer comprising an epoxy resin (Dupont; APLUS-1) and titanium dioxide powder (Dupont; R906) dispersed in the epoxy resin was provided, wherein a content of the titanium dioxide powder is 10 wt % of the insulating layer.
  • an acrylic resin (Asia Electronic Materials Co., Ltd., AEM Co.; RD0351) containing 85 wt % of silver coated copper powder (AEM Co.; EI-0007) was coated on the insulating layer.
  • the acrylic resin was baked at a temperature of 50° C. for 5 minutes to form an electromagnetic shielding layer having a thickness as shown in Table 1.
  • a conductive paint was coated on the electromagnetic shielding layer, wherein the conductive paint was prepared through mixing an epoxy resin (Dupont; APLUS-1) and a metal powder (Union Chemical Ind. Co. Ltd.; A-3). The conductive paint was dried to form the conductive adhesive layer having a content of 60 wt % of the metal powder.
  • the cover film of the first embodiment of the present disclosure was then obtained.
  • the cover films of Examples 3 to 5 were prepared according to the method described in Examples 1 and 2, except that 10 wt % of titanium dioxide powder was replaced by 15 wt % of carbon black (CABOT company; REGAL®400R).
  • a release layer (Mitsubishi; F38) was attached under the conductive adhesive layer in Examples 4 and 5.
  • the cover films of Examples 6 to 7 were prepared according to the thickness described in Table 1 below and the manufacturing method previously described, except that an electromagnetic absorption layer was formed prior to the formation of the electromagnetic shielding layer.
  • the electromagnetic absorption layer comprising an acrylic resin, and 85 wt % of iron-silicon-aluminum alloy (Sanyo; HY-008) was formed followed by applying the resin mixture and baking at a temperature of 50° C. for 5 minutes. Then, the electromagnetic shielding layer and the conductive adhesive layer were formed sequentially to obtain the cover film of the second embodiment.
  • the cover films of Examples 8 to 10 were prepared according to the method described in Examples 6 and 7, except that 10 wt % of titanium dioxide powder was replaced by 15 wt % of carbon black (CABOT company; REGAL® 400R).
  • a release layer (Mitsubishi; F38) was attached on the conductive adhesive layer in Examples 9 and 10.
  • the cover film of the Comparative Example 1 was prepared according to the method described in Example 1 above and the thickness described in Table 1 below, except that no electromagnetic shielding layer was formed and the insulating layer was made of polyurethane (Uncore Company; XC0208BB2500).
  • the mechanical property and electrical property of the cover films of Examples 1 to 10 and Comparative example 1 were measured.
  • the test items include thermal stress, dielectric loss, dielectric constant and electromagnetic shielding efficiency.
  • the dielectric loss and dielectric constant were measured by a cavity resonator (Waveguide Resonators) according to the measurement of ASTM 2520, and the thermal stress and the electromagnetic shielding efficiency were measured in accordance with the following conditions.
  • a coaxial transmission line holder and network analyzer (Wiltron 37225B) were used to measure the electromagnetic shielding efficiency under an operating frequency of from 30 MHz to 1.5 GHz and 40 MHz to 13.5 GHz.
  • the sample was pre-dried in an oven (at 121° C. to 149° C.) for 6 hours, and the sample was removed from the oven to cool down to room temperature. Then, the sample was exposed to solder float at 288° C. for 10 seconds, followed by observation as to whether the exterior appearance of the sample changes visually.
  • Table 2 The results were summarized in Table 2.
  • each of the cover films of Examples 1 to 3 has a lower dielectric constant and dielectric loss in comparison with the cover film of Comparative Example 1.
  • the cover films of Examples 6 to 10 show a limited increasing trend in dielectric constant and dielectric loss.
  • the cover films of Examples 6 to 10 show a superior characteristic of electromagnetic shielding.

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Laminated Bodies (AREA)

Abstract

The present disclosure provides a cover film, including a conductive adhesive layer, an electromagnetic shielding layer formed on the conductive adhesive layer, and an insulating layer formed on the electromagnetic shielding layer. The electromagnetic shielding layer has a thickness of from 0.01 to 25 micrometers, such that the cover film can shield electromagnetic interference through the thinner interposed electromagnetic shielding layer.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a Divisional of application Ser. No. 14/882,753 filed on Oct. 14, 2015, the entire contents of which are incorporated herein by reference.
This application is based upon and claims the benefit of priority from Chinese Patent Applications No. 201410545233.X and 201420596633.9, both filed Oct. 15, 2014, the entire contents of which are incorporated herein by reference.
BACKGROUND OF THE INVENTION 1. Field of the Invention
The present disclosure relates to a cover film, and more particularly, to a cover film with an electromagnetic shielding property.
2. Description of Related Art
Recently, it has become a trend to develop in small consumer electronics with compact size, light weight as well as degrees of freedom. Therefore, flexible printed circuit boards (FPCB) are utilized in smart phone and touch panel due to the characteristics of light weight, thinness, high degrees of freedom and flexibility.
In order to properly operate with high speed transmission of signals, wirings are designed to be more aggregated such that the spacing between two adjacent wires is smaller. However, the problem of electromagnetic interference would get worse due to the decreased spacing, the higher operating frequency, and the unreasonable circuit arrangement.
In some designs, an electromagnetic shielding layer is added on a cover film or a solder resist which is attached on a circuit board by glue for shielding electromagnetic interference from outside or internal signal noises. Nevertheless, the process is more complex and time-consuming, and results in lack of protection for the electromagnetic shielding layer. Therefore, there is a need to develop a thinner cover film for shielding electromagnetic interference.
SUMMARY OF THE INVENTION
The present disclosure provides a cover film, comprising a conductive adhesive layer, an electromagnetic shielding layer formed on the conductive adhesive layer, and an insulating layer formed on the electromagnetic shielding layer, wherein the electromagnetic shielding layer has a thickness of from 0.01 to 25 micrometers.
In one preferable embodiment, the thickness of the electromagnetic shielding layer is from 0.01 to 1.5 micrometers.
In an embodiment, a thickness of the insulating layer is between 3 to 75 micrometers.
In an embodiment, the insulating layer comprises a first polymer and an additive dispersed in the first polymer, wherein a content of the additive is between 3 wt % to 15 wt % of the insulating layer, and wherein the first polymer is at least one selected from the group consisting of an epoxy resin, an acrylic resin and a combination thereof, and the additive is at least one selected from the group consisting of carbon powder, titanium dioxide, a colorant, a pigment and a combination thereof.
In an embodiment, the electromagnetic shielding layer is made of metal or a resin containing metal powder. In an embodiment, the electromagnetic shielding layer is formed on the conductive adhesive layer by coating, vapor deposition or magnetron sputtering.
In an embodiment, a thickness of the conductive adhesive layer is between 3 to 50 micrometers, wherein the conductive adhesive layer comprises a second polymer and at least one conductive powder dispersed in the second polymer, and wherein a content of the conductive powder is between 0.5 wt % to 90 wt % of the conductive adhesive layer. In one preferred embodiment, the second polymer is at least one selected from the group consisting of an epoxy resin, a poly-p-xylene resin, a bismaleimide resin, a polyimide resin, an acrylic resin, a urethane resin, a silicon rubber-based resin and a combination thereof. Preferably, the second polymer is an epoxy resin or an acrylic resin.
In an embodiment, the at least one conductive powder is at least one selected from the group consisting of gold powder, silver powder, copper powder, nickel powder, aluminum powder, silver coated copper powder, silver coated nickel powder, copper-nickel alloy, iron powder, iron-based alloy, silver-copper alloy, tin-copper alloy, gold plated nickel powder, and silver plated copper powder.
In another embodiment, the cover film further comprises an electromagnetic absorption layer formed between the electromagnetic shielding layer and the insulating layer, wherein the electromagnetic absorption layer has a thickness of from 0.1 to 25 micrometers.
In an embodiment, the electromagnetic absorption layer comprises a third polymer and at least one magnetic powder dispersed in the third polymer, wherein a content of the at least one magnetic powder is between 50 wt % to 90 wt % of the electromagnetic absorption layer, and the electromagnetic absorption layer is formed by filling, laminating or coating.
In an embodiment, the at least one magnetic powder is at least one selected from the group consisting of iron oxide, iron-silicon-aluminum alloy, permalloy (iron-nickel alloy), and iron-silicon-chrome-nickel alloy. In one embodiment, the third polymer is selected from the group consisting of an epoxy resin, a poly-p-xylene resin, a bismaleimide resin, a polyimide resin, an acrylic resin, a urethane resin and a silicon rubber-based resin and a combination thereof. Preferably, the third polymer is an epoxy resin or an acrylic resin.
In another embodiment, the cover film further comprises a release layer formed under the conductive adhesive layer such that the conductive adhesive layer is sandwiched between the electromagnetic shielding layer and the release layer, wherein the release layer has a thickness of from 25 to 100 micrometers. In a preferred embodiment, the release layer is a polyethylene terephthalate (PET) fluorine release film, a PET silicone oil release film, a PET matte release film or a polyethylene release film.
According to the present disclosure, an overall thickness of the FPCB can be reduced through forming the thinner interposed electromagnetic shielding layer having a thickness of from 0.01 to 25 micrometers. Furthermore, the electromagnetic shielding layer can be formed by coating, vapor deposition or magnetron sputtering in one single process such that the process of the cover film is simplified.
As such, the cover film of the present disclosure has an effect of preventing not only electromagnetic interference resulting from the internal signal transmission but also electromagnetic spillover by forming the electromagnetic absorption layer having a thickness of from 0.1 to 25 micrometers with a limited increased thickness.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a cross-sectional schematic view of a cover film according to a first embodiment of the present disclosure;
FIG. 2 is a cross-sectional schematic view of a cover film according to another example of the first embodiment of the present disclosure;
FIG. 3 is a cross-sectional schematic view of a cover film according to a second embodiment of the present disclosure; and
FIG. 4 is a cross-sectional schematic view of a cover film according to another example of the second embodiment of the present disclosure.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
The detailed description of the present disclosure is illustrated by the following specific examples. Persons skilled in the art can conceive the other advantages and effects of the present disclosure based on the content contained in the specification of the present disclosure. It should be noted that all the drawings are not intended to limit the present disclosure. Various modifications and variations can be made without departing from the spirit of the present disclosure. Further, terms such as “first,” “second,” “on,” “a,” etc. are merely for illustrative purposes and should not be construed to limit the scope of the present disclosure.
First Embodiment
FIG. 1 is a cross-sectional schematic view of a cover film 1 of the present disclosure, comprising a conductive adhesive layer 11, an electromagnetic shielding layer 12 formed on the conductive adhesive layer 11, and an insulating layer 13 formed on the electromagnetic shielding layer 12, wherein the electromagnetic shielding layer 12 has a thickness of from 0.01 to 25 micrometers.
In this embodiment, the insulating layer 13 having a thickness of from 3 to 75 micrometers is provided. The insulating layer 13 comprises a first polymer and an additive dispersed in the first polymer, wherein a content of the additive is between 3 wt % to 15 wt % of the insulating layer. In a preferred embodiment, the first polymer is at least one selected from the group consisting of an epoxy resin, an acrylic resin and a combination thereof.
Further, the electromagnetic shielding layer 12 having a thickness of from 0.01 to 25 micrometers is formed on the conductive adhesive layer 11, and the thickness of the electromagnetic shielding layer 12 is preferably from 0.01 to 1.5 micrometers.
The conductive adhesive layer 11 has a thickness of from 3 to 50 micrometers and comprises a second polymer and at least one conductive powder dispersed in the second polymer, wherein a content of the conductive powder is between 0.5 wt % to 90 wt % of the conductive adhesive layer. In a preferred embodiment, the second polymer is at least one selected from the group consisting of an epoxy resin, a poly-p-xylene resin, a bismaleimide resin, a polyimide resin, an acrylic resin, a urethane resin and a silicon rubber-based resin and a combination thereof. Preferably, the second polymer is an epoxy resin or an acrylic resin.
Also, the at least one conductive powder is at least one selected from the group consisting of gold powder, silver powder, copper powder, nickel powder, aluminum powder, silver coated copper powder, silver coated nickel powder, copper-nickel alloy, iron powder, iron-based alloys, silver-copper alloy, tin-copper alloy, gold plated nickel powder, and silver plated copper powder.
Referring to FIG. 2, in order to keep adhesiveness of the conductive adhesive layer 11, the cover film 2 of the present disclosure further comprises a release layer 10 formed under the conductive adhesive layer 11 such that the conductive adhesive layer 11 is sandwiched between the electromagnetic shielding layer 12 and the release layer 10. When the cover film 2 is needed to be attached to FPCB, the release layer 10 is then removed.
Second Embodiment
As shown in FIG. 3, a cover film 3 according to the present disclosure further comprises an electromagnetic absorption layer 14 formed between the electromagnetic shielding layer 12 and the insulating layer 13. In this embodiment, the electromagnetic absorption layer 14 has a thickness of from 0.1 to 25 micrometers.
In this embodiment, the electromagnetic absorption layer 14 comprises a third polymer and at least one magnetic powder dispersed in the third polymer, wherein the at least one magnetic powder is at least one selected from the group consisting of iron oxide, iron-silicon-aluminum alloy, permalloy (iron-nickel alloy), and iron-silicon-chrome-nickel alloy.
In this embodiment, the third polymer is at least one selected from the group consisting of an epoxy resin, a poly-p-xylene resin, a bismaleimide resin, a polyimide resin, an acrylic resin, a urethane resin, a silicon rubber-based resin and a combination thereof. More preferably, the third polymer is an epoxy resin or an acrylic resin.
The structure of the cover film 3 of this embodiment is similar to that of the cover film 1 of the first embodiment, and the difference is in that the additional electromagnetic absorption layer 14 having a thickness of from 0.1 to 25 micrometers is interposed between the insulating layer 13 and the electromagnetic shielding layer 12.
Preferably, the electromagnetic shielding layer 12 has a thickness of from 0.01 to 1.5 micrometers, and the electromagnetic shielding layer 12 is made of metal such as gold, copper, zinc, nickel or aluminum.
In the embodiment, a conductive adhesive layer 11 is formed under the electromagnetic shielding layer 12, and a thickness of the conductive adhesive layer 11 is from 3 to 50 micrometers. The conductive adhesive layer 11 comprises a second polymer and at least one conductive powder dispersed in the second polymer, wherein a content of the conductive powder is between 0.5 wt % to 90 wt % of the conductive adhesive layer. In a preferred embodiment, the second polymer is at least one selected from the group consisting of an epoxy resin, a poly-p-xylene resin, a bismaleimide resin, a polyimide resin, an acrylic resin, a urethane resin, a silicon rubber-based resin and a combination thereof. More preferably, the second polymer is an epoxy resin or an acrylic resin. The at least one conductive powder is at least one selected from the group consisting of gold powder, silver powder, copper powder, nickel powder, aluminum powder, silver coated copper powder, silver coated nickel powder, copper-nickel alloy, iron powder, iron-based alloy, silver-copper alloy, tin-copper alloy, gold plated nickel powder, and silver plated copper powder.
Referring to FIG. 4, in order to keep adhesiveness of the conductive adhesive layer 11, the cover film 4 of the present disclosure further comprises a release layer 10 formed under the conductive adhesive layer 11 such that the conductive adhesive layer 11 is sandwiched between the electromagnetic shielding layer 12 and the release layer 10. When the cover film 4 is needed to be attached to FPCB, the release layer 10 is then removed.
Examples 1 to 2: The Manufacture of the Cover Film of the First Embodiment of the Present Disclosure
The cover films of the present disclosure were made according to the thickness described in Table 1 and the manufacturing method described below.
First, an insulating layer comprising an epoxy resin (Dupont; APLUS-1) and titanium dioxide powder (Dupont; R906) dispersed in the epoxy resin was provided, wherein a content of the titanium dioxide powder is 10 wt % of the insulating layer. Then, an acrylic resin (Asia Electronic Materials Co., Ltd., AEM Co.; RD0351) containing 85 wt % of silver coated copper powder (AEM Co.; EI-0007) was coated on the insulating layer. Afterwards, the acrylic resin was baked at a temperature of 50° C. for 5 minutes to form an electromagnetic shielding layer having a thickness as shown in Table 1. Subsequently, a conductive paint was coated on the electromagnetic shielding layer, wherein the conductive paint was prepared through mixing an epoxy resin (Dupont; APLUS-1) and a metal powder (Union Chemical Ind. Co. Ltd.; A-3). The conductive paint was dried to form the conductive adhesive layer having a content of 60 wt % of the metal powder. The cover film of the first embodiment of the present disclosure was then obtained.
Examples 3 to 5: The Manufacture of the Cover Film of the First Embodiment of the Present Disclosure
The cover films of Examples 3 to 5 were prepared according to the method described in Examples 1 and 2, except that 10 wt % of titanium dioxide powder was replaced by 15 wt % of carbon black (CABOT company; REGAL®400R).
In addition, a release layer (Mitsubishi; F38) was attached under the conductive adhesive layer in Examples 4 and 5.
Examples 6 to 7: The Manufacture of the Cover Film of the Second Embodiment of the Present Disclosure
First, the cover films of Examples 6 to 7 were prepared according to the thickness described in Table 1 below and the manufacturing method previously described, except that an electromagnetic absorption layer was formed prior to the formation of the electromagnetic shielding layer. The electromagnetic absorption layer comprising an acrylic resin, and 85 wt % of iron-silicon-aluminum alloy (Sanyo; HY-008) was formed followed by applying the resin mixture and baking at a temperature of 50° C. for 5 minutes. Then, the electromagnetic shielding layer and the conductive adhesive layer were formed sequentially to obtain the cover film of the second embodiment.
Examples 8 to 10: The Manufacture of the Cover Film of the Second Embodiment of the Present Disclosure
The cover films of Examples 8 to 10 were prepared according to the method described in Examples 6 and 7, except that 10 wt % of titanium dioxide powder was replaced by 15 wt % of carbon black (CABOT company; REGAL® 400R).
In addition, a release layer (Mitsubishi; F38) was attached on the conductive adhesive layer in Examples 9 and 10.
Comparative Example 1
The cover film of the Comparative Example 1 was prepared according to the method described in Example 1 above and the thickness described in Table 1 below, except that no electromagnetic shielding layer was formed and the insulating layer was made of polyurethane (Uncore Company; XC0208BB2500).
TABLE 1
Thickness (μm)
Electro- Electro-
Conductive magnetic magnetic
adhesive shielding absorption Insulating Release
layer layer layer layer layer
Example 1 3 1 3
Example 2 4 2 3
Example 3 5 3 4
Example 4 6 4 5 50
Example 5 7 5 6 50
Example 6 8 6 5 7
Example 7 9 7 6 8
Example 8 10 8 7 9
Example 9 11 9 8 10 50
Example 10 12 10 9 11 50
Comparative 25 20 75
Example 1
Test Example
The mechanical property and electrical property of the cover films of Examples 1 to 10 and Comparative example 1 were measured. The test items include thermal stress, dielectric loss, dielectric constant and electromagnetic shielding efficiency. The dielectric loss and dielectric constant were measured by a cavity resonator (Waveguide Resonators) according to the measurement of ASTM 2520, and the thermal stress and the electromagnetic shielding efficiency were measured in accordance with the following conditions.
The Electromagnetic Shielding Efficiency:
According to the measurement of ASTM D4935-99, a coaxial transmission line holder and network analyzer (Wiltron 37225B) were used to measure the electromagnetic shielding efficiency under an operating frequency of from 30 MHz to 1.5 GHz and 40 MHz to 13.5 GHz.
Test of the Thermal Stress:
According to the measurement of IPC-TM-650-2.4.13, the sample was pre-dried in an oven (at 121° C. to 149° C.) for 6 hours, and the sample was removed from the oven to cool down to room temperature. Then, the sample was exposed to solder float at 288° C. for 10 seconds, followed by observation as to whether the exterior appearance of the sample changes visually. The results were summarized in Table 2.
TABLE 2
Electromagnetic
Dielectric Dielectric shielding
constant loss efficiency Thermal
(Dk) (Df) (dB) stress test*
Example 1 2.5 0.025 −50
Example 2 2.6 0.032 −50
Example 3 2.7 0.031 −50
Example 4 2.8 0.037 −50
Example 5 2.9 0.041 −50
Example 6 3.0 0.044 −55
Example 7 3.1 0.056 −55
Example 8 3.2 0.064 −55
Example 9 3.3 0.087 −55
Example 10 3.4 0.089 −55
Comparative 4.5 0.2 −42
Example 1
*∘No change
As illustrated in the result of Table 2, each of the cover films of Examples 1 to 3 has a lower dielectric constant and dielectric loss in comparison with the cover film of Comparative Example 1. Although the thickness of each of the cover films of Examples 6 to 10 is higher and an additional electromagnetic absorption layer is attached, the cover films of Examples 6 to 10 show a limited increasing trend in dielectric constant and dielectric loss. In addition, the cover films of Examples 6 to 10 show a superior characteristic of electromagnetic shielding.
The above-described descriptions of the specific embodiments are intended to illustrate the preferred implementation according to the present disclosure but are not intended to limit the scope of the present disclosure. Accordingly, all modifications and variations completed by those with ordinary skill in the art should fall within the scope of present disclosure defined by the appended claims.

Claims (3)

What is claimed is:
1. A cover film, comprising:
a conductive adhesive layer;
an electromagnetic shielding layer formed on the conductive adhesive layer and having a thickness of 0.01 to 25 micrometers;
an electromagnetic absorption layer formed on the electromagnetic shielding layer, wherein the electromagnetic shielding layer is sandwiched between the conductive adhesive layer and the electromagnetic absorption layer, and wherein the electromagnetic absorption layer has a thickness of from 0.1 to 25 micrometers; and
an insulating layer formed on the electromagnetic shielding layer, wherein the electromagnetic absorption layer is sandwiched between the electromagnetic shielding layer and the insulating layer.
2. The cover film of claim 1, wherein the electromagnetic absorption layer comprises a third polymer and at least one magnetic powder dispersed in the third polymer.
3. The cover film of claim 2, wherein the at least one magnetic powder is at least one selected from the group consisting of iron oxide, iron-silicon-aluminum alloy, permalloy (iron-nickel alloy), and iron-silicon-chrome-nickel alloy.
US15/971,129 2014-10-15 2018-05-04 Cover film Active US10412866B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US15/971,129 US10412866B2 (en) 2014-10-15 2018-05-04 Cover film

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
CN201410545233.XA CN105578851A (en) 2014-10-15 2014-10-15 Thin-type high-transmission electromagnetic-absorbing screened film and manufacturing method thereof
CN201420596633.9U CN204104291U (en) 2014-10-15 2014-10-15 Slimming high-transmission electromagnetic absorption screened film
CN201420596633U 2014-10-15
CN201420596633.9 2014-10-15
CN201410545233 2014-10-15
CN201410545233.X 2014-10-15
US14/882,753 US20160113162A1 (en) 2014-10-15 2015-10-14 Cover film
US15/971,129 US10412866B2 (en) 2014-10-15 2018-05-04 Cover film

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US14/882,753 Division US20160113162A1 (en) 2014-10-15 2015-10-14 Cover film

Publications (2)

Publication Number Publication Date
US20180255668A1 US20180255668A1 (en) 2018-09-06
US10412866B2 true US10412866B2 (en) 2019-09-10

Family

ID=52272683

Family Applications (2)

Application Number Title Priority Date Filing Date
US14/882,753 Abandoned US20160113162A1 (en) 2014-10-15 2015-10-14 Cover film
US15/971,129 Active US10412866B2 (en) 2014-10-15 2018-05-04 Cover film

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US14/882,753 Abandoned US20160113162A1 (en) 2014-10-15 2015-10-14 Cover film

Country Status (2)

Country Link
US (2) US20160113162A1 (en)
CN (1) CN204104291U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11006554B1 (en) * 2018-03-14 2021-05-11 Guangzhou Fang Bang Electronic Co., Ltd. Electromagnetic interference shielding film, circuit board, and preparation method for electromagnetic interference shielding film

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105578851A (en) * 2014-10-15 2016-05-11 昆山雅森电子材料科技有限公司 Thin-type high-transmission electromagnetic-absorbing screened film and manufacturing method thereof
JP5861790B1 (en) * 2015-02-25 2016-02-16 東洋インキScホールディングス株式会社 Electromagnetic shielding sheet, electromagnetic shielding wiring circuit board, and electronic equipment
CN106281072A (en) * 2015-05-21 2017-01-04 斯迪克新型材料(江苏)有限公司 The pressure-sensitive pad pasting of anti-electromagnetic-radiation type
CN105517422A (en) * 2016-01-15 2016-04-20 深圳市金凯新瑞光电股份有限公司 Composite film material
CN110235537B (en) * 2017-03-13 2021-09-24 麦克赛尔控股株式会社 Electromagnetic wave absorbing sheet
US9963111B1 (en) * 2017-08-29 2018-05-08 Harmoniks, Inc. Combustion engine electromagnetic energy disruptor
US10757836B2 (en) * 2017-12-04 2020-08-25 Channell Commercial Corporation Solar/heat shield for pedestal housings used with active electronic devices and/or heat sensitive components
CN109247003A (en) * 2018-04-12 2019-01-18 庆鼎精密电子(淮安)有限公司 Electromagnetic shielding film and preparation method thereof
TWI787258B (en) * 2018-05-02 2022-12-21 日商麥克賽爾股份有限公司 Electromagnetic wave absorbing sheet
DE102019118092A1 (en) * 2019-07-04 2021-01-07 Carl Freudenberg Kg Process for the production of a component shielded from electromagnetic radiation
CN111410920A (en) * 2020-03-23 2020-07-14 苏州微邦材料科技有限公司 Wave-absorbing shielding adhesive film and preparation method thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030155143A1 (en) * 2002-02-15 2003-08-21 Tadashi Fujieda Electromagnetic wave absorption material and an associated device
JP2004095566A (en) 2002-07-08 2004-03-25 Tatsuta Electric Wire & Cable Co Ltd Shield film, shielded flexible printed wiring board, and their manufacturing methods

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030155143A1 (en) * 2002-02-15 2003-08-21 Tadashi Fujieda Electromagnetic wave absorption material and an associated device
JP2004095566A (en) 2002-07-08 2004-03-25 Tatsuta Electric Wire & Cable Co Ltd Shield film, shielded flexible printed wiring board, and their manufacturing methods

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
English translation of JP 2004-295566. *
Final Office Action for U.S. Appl. No. 14/882,753, dated Feb. 7, 2018.
Non-Final Office Action for U.S. Appl. No. 14/882,753 dated Sep. 5, 2017.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11006554B1 (en) * 2018-03-14 2021-05-11 Guangzhou Fang Bang Electronic Co., Ltd. Electromagnetic interference shielding film, circuit board, and preparation method for electromagnetic interference shielding film

Also Published As

Publication number Publication date
US20160113162A1 (en) 2016-04-21
CN204104291U (en) 2015-01-14
US20180255668A1 (en) 2018-09-06

Similar Documents

Publication Publication Date Title
US10412866B2 (en) Cover film
JP6923644B2 (en) Electromagnetic wave shield film and its manufacturing method
JP2019083205A (en) Shield film, shielded printed wiring board, and method for manufacturing shield film
TWI598033B (en) Electromagnetic shielding sheet,printed ?????????????????????????????????????????????????????????? circuit board having electromagnetic ?????????????????????????????????????????????????????????? shielding structure and electronic device
US9609792B2 (en) Electromagnetic wave shielding film and method for producing a circuit board comprising the shielding film
KR101160497B1 (en) Flat cable
JP2020524414A (en) Electromagnetic shield film, circuit board, and method for manufacturing electromagnetic shield film
WO2014010342A1 (en) Shield film and shield printed wiring board
US20150305144A1 (en) Shield film and shield printed wiring board
TWI606472B (en) Electronic circuit package using composite magnetic sealing material
JP5743500B2 (en) Electromagnetic wave shielding material for FPC
JP2014090162A (en) Cover lay film and flexible printed wiring board
US20130048344A1 (en) High frequency circuit board
CN103929933B (en) Structure for inhibition of electromagnetic wave interference and flexible printed circuit comprising same
CN103717050A (en) Thin-type flexible thermally-cured electromagnetic shielding glue film
JP2011159879A (en) Flexible printed wiring board with shield, method for manufacturing the same, and electronic apparatus
US20170034915A1 (en) Small electronic component, electronic circuit board, and method of manufacturing small electronic component
CN202121860U (en) Flexible circuit board used for precision electronic device
US11690207B2 (en) Magnetic shield material
TWM527127U (en) Structure of cover film
JP2010177472A (en) Shield type flexible printed wiring board, manufacturing method thereof, and electronic apparatus
CN203105046U (en) Structure for inhibition of electromagnetic wave interference, and flexible printed circuit comprising the same
KR20170136065A (en) Electromagnetic wave shielding and heat-radiation sheet
KR101965610B1 (en) High frequency noise shielding film and method for manufacturing the same
TWI671004B (en) Electromagnetic interference (emi) shielding film

Legal Events

Date Code Title Description
AS Assignment

Owner name: ASIA ELECTRONIC MATERIAL CO., LTD., TAIWAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:LIN, CHIH-MING;LIN, HUI-FENG;LEE, CHIEN-HUI;REEL/FRAME:045715/0613

Effective date: 20151113

FEPP Fee payment procedure

Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: SMALL ENTITY

FEPP Fee payment procedure

Free format text: ENTITY STATUS SET TO SMALL (ORIGINAL EVENT CODE: SMAL); ENTITY STATUS OF PATENT OWNER: SMALL ENTITY

STPP Information on status: patent application and granting procedure in general

Free format text: FINAL REJECTION MAILED

STPP Information on status: patent application and granting procedure in general

Free format text: RESPONSE AFTER FINAL ACTION FORWARDED TO EXAMINER

STPP Information on status: patent application and granting procedure in general

Free format text: NOTICE OF ALLOWANCE MAILED -- APPLICATION RECEIVED IN OFFICE OF PUBLICATIONS

STPP Information on status: patent application and granting procedure in general

Free format text: PUBLICATIONS -- ISSUE FEE PAYMENT VERIFIED

STCF Information on status: patent grant

Free format text: PATENTED CASE

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 4TH YR, SMALL ENTITY (ORIGINAL EVENT CODE: M2551); ENTITY STATUS OF PATENT OWNER: SMALL ENTITY

Year of fee payment: 4