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Application filed by Іван Федорович Миронюк, Иван Федорович Миронюк, Олексій Олексійович Чуйко, Алексей Алексеевич Чуйко, Богдан Миколайович Яремчук, Богдан Николаевич Яремчук, Володимир Михайлович Огенко, Владимир Михайлович ОгенкоfiledCriticalІван Федорович Миронюк
Priority to UA98031164ApriorityCriticalpatent/UA30347C2/en
Publication of UA30347C2publicationCriticalpatent/UA30347C2/en
A process and a device for producing superfine silicon dioxide consists in its production from silicon tetrachloride, hydrogen and gas containing oxygen by means of their feeding for mixing, their mixing and burning of the reaction mixture produced in the flame that is formed as a ring enveloped in a hydrogen layer. Dry air compressed to the total pressure of 0,218–0,318 MPa is used as a gas containing oxygen and a gas-jet injector torch with Laval nozzle is used as a device for feeding the reaction mixture components for mixing, their mixing and feeding for their burning in the flame tube. The process proposed and the device for its implementation allows one to simplify the torch, increase the output of superfine silicon dioxide at least up to 139-166 bkg/h and ensure the necessary specific surface of the product in the range of 150 to 420 m2/g.
UA98031164A1998-03-051998-03-05Process for producing superfine silicon dioxide and device for its implementation
UA30347C2
(en)