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Application filed by Харківський Фізико-Технічний Інститут, Харьковский физико-технический институтfiledCriticalХарківський Фізико-Технічний Інститут
Priority to UA3309414ApriorityCriticalpatent/UA11900A1/en
Publication of UA11900A1publicationCriticalpatent/UA11900A1/en
Physical Or Chemical Processes And Apparatus
(AREA)
Abstract
The method for gas protection of HF-plasmotron discharging chamber walls with an axial input of dispersed treated material is provided for supply a flow of orifice gas along its wall. With the purpose of resource plasmotron enhancement and upgrading treated material by means of edging it from the chamber the orifice gas is supplied to the discharging chamber in direction, opposite to the movement of the dispersed material.
UA3309414A1981-06-251981-06-25Method for gas protection of rf-plasmotron discharging chamber
UA11900A1
(en)
Bulk goods silo with ventilation system - includes ventilation pipe fitted with closure element controllable jointly with outlet from silo and outlet chambers