Национальный Научный Центр "Харьковский Физико-Технический Институт"
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Priority to UAA201202591ApriorityCriticalpatent/UA104205C2/en
Publication of UA104205C2publicationCriticalpatent/UA104205C2/en
The invention relates to field of plasma processing of products and can be used as a source of plasma for simulation of spacecraft reentry process. A plasma accelerator comprises a vacuum chamber, wherein gas ports are inserted through an end flange, the ports are provided with valves on ends. It also comprises a cathode, with cylindrical part, at the end of which bent bars are fixed, arch side of which is faced to vacuum chamber surface, and an anode comprising bars, which enclose the cathode along cylindrical surface in a manner that forms a spark gap in the location points of the arch bars – lamels. The vacuum chamber is enclosed by at least two magnet coils in the area of discharge gap. A cylindrical hollow for supplying gas to the camera is performed in the cathode. At the end of the chamber a pulse valve is located, which is meant for supplying gas in direction perpendicular to the longitudinal axis of the accelerator. All ports have length that provides location of the pulse valves within the hollow of transversal cross-section in the beginning of discharge gap. The technical result of the invention is obtaining continuous high-energy plasma flow of high density.
Method and device for generating a plasma excited by microwave energy in the electron cyclotron resonance (ecr) domain, in order to carry out a surface treatment or produce a coating around a filiform element.