TWM653534U - Gasification processing system - Google Patents
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- TWM653534U TWM653534U TW112211962U TW112211962U TWM653534U TW M653534 U TWM653534 U TW M653534U TW 112211962 U TW112211962 U TW 112211962U TW 112211962 U TW112211962 U TW 112211962U TW M653534 U TWM653534 U TW M653534U
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- 238000002309 gasification Methods 0.000 title claims abstract description 100
- 238000012545 processing Methods 0.000 title claims abstract description 18
- 239000002912 waste gas Substances 0.000 claims abstract description 34
- 239000007789 gas Substances 0.000 claims description 112
- 238000009423 ventilation Methods 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 20
- 238000010438 heat treatment Methods 0.000 claims description 17
- 238000006243 chemical reaction Methods 0.000 claims description 15
- 239000000428 dust Substances 0.000 claims description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- 238000004821 distillation Methods 0.000 claims description 12
- 239000003054 catalyst Substances 0.000 claims description 10
- 238000004062 sedimentation Methods 0.000 claims description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 229930195733 hydrocarbon Natural products 0.000 claims description 4
- 150000002430 hydrocarbons Chemical class 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 150000001247 metal acetylides Chemical class 0.000 abstract 1
- 239000002699 waste material Substances 0.000 description 20
- 230000000694 effects Effects 0.000 description 10
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Abstract
Description
本創作是關於一種燃燒系統，特別是一種氣化處理系統，用以氣化一被處理物、分選該被處理物氣化後之多種產物、以及解離該些產物中的有毒氣體。 This invention relates to a combustion system, in particular a gasification treatment system, for gasifying a processed material, sorting multiple products after the processed material is gasified, and decomposing toxic gases in these products.
現今，廢棄物處理通常是先經過焚化處理再進行掩埋。在焚化處理中，利用高溫焚燒廢棄物，可以減少廢棄物的重量和體積，因此大大地減少廢棄物被掩埋的佔有空間。 Nowadays, waste disposal usually involves incineration before landfill. In incineration, the waste is burned at high temperatures to reduce its weight and volume, thus greatly reducing the space occupied by the waste in landfills.
然而，進行焚化處理所需的焚化爐設備費用不菲、單位容積建廠成本高，需要較大投資。並且，廢棄物的焚化處理僅僅是一種中間處理，最後產生的有毒廢氣、懸浮微粒、以及無機物的殘渣仍然需要經過其他妥善的處理，對環境仍是一種負擔。 However, the incinerator equipment required for incineration is expensive, the unit capacity construction cost is high, and a large investment is required. Moreover, the incineration of waste is only an intermediate treatment. The toxic waste gas, suspended particles, and inorganic residues produced in the end still need to be properly treated in other ways, which is still a burden on the environment.
隨著廢棄物處理量逐年增多，焚化爐的焚化處理負荷也就日益龐大。過多的廢棄物處理量將會影響焚化爐壽命，而新設焚化爐也會受到環保人士的抗議而遲遲無法興建，使得廢棄物處理的量能更是捉襟見肘。因此，新型態的廢棄物處理方式，例如氣化處理，應運而生。 As the amount of waste to be treated increases year by year, the incineration load of incinerators is also increasing. Excessive waste treatment will affect the life of the incinerator, and new incinerators will be protested by environmentalists and cannot be built, making the capacity of waste treatment even more stretched. Therefore, new types of waste treatment methods, such as gasification treatment, came into being.
氣化處理是利用熱裂解的原理，讓廢棄物進行更有效的分解。熱裂解有別於傳統的焚化處理的高溫燃燒，是讓廢棄物在有限度的隔絕氧氣或是空氣的情況下進行反應。氣化處理的優點在於其可回收有用的反應副產物(例如金屬物或化合物)，對於能源回收有相當助益、擁有高效率低污染的優勢。因此，氣化處理將成為未來廢棄物處理之再生能源利用的主流技術。 Gasification treatment uses the principle of thermal cracking to decompose waste more effectively. Thermal cracking is different from the high-temperature combustion of traditional incineration treatment. It allows waste to react under limited isolation from oxygen or air. The advantage of gasification treatment is that it can recycle useful reaction byproducts (such as metals or compounds), which is very helpful for energy recovery and has the advantages of high efficiency and low pollution. Therefore, gasification treatment will become the mainstream technology for renewable energy utilization in waste treatment in the future.
氣化處理雖然可以減少廢棄物處理過後的無機物、並且產生有用的反應副產物，但是氣化處理的過程中仍然會產出部分有毒氣體。 Although gasification can reduce inorganic matter after waste treatment and produce useful reaction by-products, some toxic gases will still be produced during the gasification process.
為解決習知技術在廢棄物氣化處理過程中所面臨的問題，本創作提出一種氣化處理系統，除了氣化處理廢棄物之外、還能夠分選廢棄物氣化後之多種產物、以及解離該些產物中的有毒氣體。 In order to solve the problems faced by conventional technologies in the process of waste gasification treatment, this invention proposes a gasification treatment system that, in addition to gasifying waste, can also sort out various products after waste gasification and decompose toxic gases in these products.
該氣化處理系統，包含一進料裝置、一氣化裝置、一出料分選裝置、以及一廢氣處理裝置。該進料裝置用以輸送一被處理物，包含一第一氣流倍增器，該第一氣流倍增器包含環形設置的多個第一通氣孔道，一第一氣體經由該些第一通氣孔道注入該第一氣流倍增器之內。該氣化裝置與該進料裝置連接，用以氣化該被處理物，包含一旋轉爐管，該旋轉爐管的內壁設有一螺旋狀導板。該出料分選裝置與該氣化裝置連接，用以收集氣化後的該被處理物所形成的一第一廢氣與碳化物，該第一廢氣經由該出料分選裝置過濾為一第二廢氣。該廢氣處理裝置與該出料分選裝置連接，用以處理該第二廢氣，包含一電漿輸入源，該電漿輸入源輸入一電漿與該第二廢氣混和並且解離該第二廢氣。 The gasification treatment system includes a feeding device, a gasification device, a discharge sorting device, and a waste gas treatment device. The feeding device is used to transport a processed object, and includes a first gas flow multiplier. The first gas flow multiplier includes a plurality of first ventilation holes arranged in an annular shape, and a first gas is injected into the first gas flow multiplier through the first ventilation holes. The gasification device is connected to the feeding device, and is used to gasify the processed object. It includes a rotary furnace tube, and the inner wall of the rotary furnace tube is provided with a spiral guide plate. The discharge sorting device is connected to the gasification device, and is used to collect a first waste gas and carbide formed by the gasified processed object. The first waste gas is filtered by the discharge sorting device to become a second waste gas. The exhaust gas treatment device is connected to the discharge sorting device for treating the second exhaust gas, and includes a plasma input source, which inputs a plasma to mix with the second exhaust gas and decompose the second exhaust gas.
在該氣化處理系統的一較佳實施例中，當該第一氣體經由該第一氣流倍增器的該些第一通氣孔道注入該第一氣流倍增器之內時，該第一氣流倍增器產生一第一牽引氣流，以牽引該進料裝置中的該被處理物朝向該氣化裝置移動。 In a preferred embodiment of the gasification treatment system, when the first gas is injected into the first gas flow multiplier through the first ventilation holes of the first gas flow multiplier, the first gas flow multiplier generates a first entrainment gas flow to entrain the processed material in the feed device to move toward the gasification device.
在該氣化處理系統的一較佳實施例中，該進料裝置還包含一渦輪扇葉組，與該第一氣流倍增器連接，用以分散該被處理物。 In a preferred embodiment of the gasification treatment system, the feed device further includes a turbine blade assembly connected to the first air flow multiplier to disperse the treated material.
在該氣化處理系統的一較佳實施例中，該廢氣處理裝置還包含一第二氣流倍增器，與該電漿輸入源連接，並且包含環形設置的多個第二通氣孔道，一第二氣體經由該些第二通氣孔道注入該第二氣流倍增器之內，該第二廢氣經由該第二氣流倍增器與該電漿接觸並且解離。 In a preferred embodiment of the gasification treatment system, the exhaust gas treatment device further includes a second air flow multiplier connected to the plasma input source and including a plurality of second ventilation holes arranged in an annular shape, a second gas is injected into the second air flow multiplier through the second ventilation holes, and the second exhaust gas contacts and dissociates with the plasma through the second air flow multiplier.
在該氣化處理系統的一較佳實施例中，當該第二氣體經由該第二氣流倍增器的該些第二通氣孔道注入該第二氣流倍增器之內時，該第二氣流倍增器產生一第二牽引氣流，以牽引該電漿與該第二廢氣混和。 In a preferred embodiment of the gasification treatment system, when the second gas is injected into the second gas flow multiplier through the second ventilation holes of the second gas flow multiplier, the second gas flow multiplier generates a second entrained gas flow to entrain the plasma to mix with the second exhaust gas.
在該氣化處理系統的一較佳實施例中，該第一氣體包含氮氣。 In a preferred embodiment of the gasification process system, the first gas comprises nitrogen.
在該氣化處理系統的一較佳實施例中，該第二氣體包含氬氣。 In a preferred embodiment of the gasification processing system, the second gas comprises argon.
在該氣化處理系統的一較佳實施例中，該進料裝置還包含一旋轉下料閥，該第一氣流倍增器與該旋轉下料閥連接。 In a preferred embodiment of the gasification processing system, the feeding device further includes a rotary discharge valve, and the first air flow multiplier is connected to the rotary discharge valve.
在該氣化處理系統的一較佳實施例中，該氣化裝置還包含一加熱器，加熱該旋轉爐管以及該旋轉爐管內部的該被處理物。 In a preferred embodiment of the gasification treatment system, the gasification device further includes a heater for heating the rotary furnace tube and the processed material inside the rotary furnace tube.
在該氣化處理系統的一較佳實施例中，該氣化裝置的該加熱器還包含多個加熱源，用以分區域加熱該旋轉爐管以及該旋轉爐管內部的該被處理物。 In a preferred embodiment of the gasification treatment system, the heater of the gasification device also includes a plurality of heating sources for heating the rotary furnace tube and the processed material inside the rotary furnace tube in different regions.
在該氣化處理系統的一較佳實施例中，該出料分選裝置還包含一沉積槽，用以收集氣化後的該被處理物所形成的該碳化物。 In a preferred embodiment of the gasification treatment system, the discharge sorting device also includes a sedimentation tank for collecting the carbide formed by the treated material after gasification.
在該氣化處理系統的一較佳實施例中，該出料分選裝置還包含一旋風集塵器，與該沉積槽連接，用以收集懸浮於該第一廢氣的該碳化物。 In a preferred embodiment of the gasification treatment system, the discharge sorting device also includes a cyclone dust collector connected to the sedimentation tank to collect the carbide suspended in the first exhaust gas.
在該氣化處理系統的一較佳實施例中，該出料分選裝置還包含一分餾塔，與該旋風集塵器連接，用以分餾並且收集該第一廢氣中的碳氫化合物。 In a preferred embodiment of the gasification treatment system, the discharge sorting device also includes a distillation tower connected to the cyclone dust collector for distilling and collecting hydrocarbons in the first exhaust gas.
在該氣化處理系統的一較佳實施例中，該廢氣處理裝置還包含一觸媒反應腔，用以氧化或還原未解離的該第二廢氣。 In a preferred embodiment of the gasification treatment system, the exhaust gas treatment device further includes a catalyst reaction chamber for oxidizing or reducing the undissociated second exhaust gas.
在該氣化處理系統的一較佳實施例中，該廢氣處理裝置還包含一泵浦，與該觸媒反應腔連接，該泵浦抽氣以使該廢氣處理裝置內部壓力小於大氣壓力。 In a preferred embodiment of the gasification treatment system, the exhaust gas treatment device also includes a pump connected to the catalyst reaction chamber, and the pump evacuates air so that the internal pressure of the exhaust gas treatment device is less than the atmospheric pressure.
在本創作中，該進料裝置的該第一氣流倍增器以及該渦輪扇葉組能夠增加該被處理物進入該旋轉爐管的動能以及受熱面積；該氣化裝置中該旋轉爐管的該螺旋狀導板能夠給予該被處理物更好的熱傳效果；該出料分選裝置能有效過濾並且收集該被處理物經過氣化處理過後的固體；該廢氣處理裝置的該電漿輸入源以及該第二氣流倍增器能夠將該被處理物經過氣化處理過後的有毒氣體轉化為無毒氣體。本創作的該氣化處理系統，除了能夠解決習知技術在廢棄物氣化處理過程中所面臨的問題，還能夠進一步提升廢棄物氣化處理的效率。 In the present invention, the first airflow multiplier and the turbine blade assembly of the feeding device can increase the kinetic energy and heating area of the processed material entering the rotary furnace tube; the spiral guide plate of the rotary furnace tube in the gasification device can provide the processed material with a better heat transfer effect; the discharge sorting device can effectively filter and collect the solids of the processed material after gasification treatment; the plasma input source and the second airflow multiplier of the exhaust gas treatment device can convert the toxic gas of the processed material after gasification treatment into non-toxic gas. This gasification treatment system of this invention can not only solve the problems faced by conventional technologies in the waste gasification treatment process, but also further improve the efficiency of waste gasification treatment.
01:被處理物 01: Objects to be processed
02:碳化物 02:Carbide
03:第一廢氣 03: The first waste gas
04:第二廢氣 04: The second waste gas
100:進料裝置 100: Feeding device
110:第一氣流倍增器 110: First airflow multiplier
111:第一通氣孔道 111: First ventilation channel
120:渦輪扇葉組 120: Turbine blade assembly
130:旋轉下料閥 130: Rotary discharge valve
200:氣化裝置 200: Gasification device
210:旋轉爐管 210: Rotary furnace tube
211:螺旋狀導板 211: Spiral guide plate
220:加熱器 220: Heater
221:加熱源 221:Heating source
300:出料分選裝置 300: Discharging and sorting device
310:沉積槽 310: Sedimentation tank
320:旋風集塵器 320: Cyclone dust collector
330:分餾塔 330: Distillation tower
400:廢氣處理裝置 400: Waste gas treatment device
410:電漿輸入源 410: Plasma input source
411:電漿 411: Plasma
420:第二氣流倍增器 420: Second airflow multiplier
421:第二通氣孔道 421: Second ventilation channel
430:觸媒反應腔 430: Catalyst reaction chamber
440:泵浦 440: Pump
F1:第一牽引氣流 F1: First traction airflow
F2:第二牽引氣流 F2: Second induced airflow
G1:第一氣體 G1: First gas
G2:第二氣體 G2: Second gas
R1:第一旋轉方向 R1: First rotation direction
R2:第二旋轉方向 R2: Second rotation direction
θ:第二通氣孔道的中心軸與第二氣流倍增器的中心軸的夾角 θ: The angle between the central axis of the second ventilation channel and the central axis of the second air flow multiplier
圖1為本創作之氣化處理系統之結構示意圖。 Figure 1 is a schematic diagram of the structure of the gasification treatment system of this invention.
圖2為本創作之氣化處理系統中的一進料裝置之結構示意圖。 Figure 2 is a schematic diagram of the structure of a feed device in the gasification treatment system of this invention.
圖3為本創作之氣化處理系統中的一廢氣處理裝置之結構示意圖。 Figure 3 is a schematic diagram of the structure of a waste gas treatment device in the gasification treatment system of this invention.
為了讓本創作之上述及其他目的、特徵、優點能更明顯易懂，下文將特舉本創作較佳實施例，並配合所附圖式，作詳細說明如下。 In order to make the above and other purposes, features, and advantages of this creation more clearly understood, the following will specifically cite the preferred implementation examples of this creation and provide detailed descriptions with the attached diagrams as follows.
請參照圖1，其為本創作之氣化處理系統之結構示意圖。該氣化處理系統，包含一進料裝置100、一氣化裝置200、一出料分選裝置300、以及一廢氣處理裝置400。 Please refer to Figure 1, which is a schematic diagram of the structure of the gasification treatment system of this invention. The gasification treatment system includes a feeding device 100, a gasification device 200, a discharge sorting device 300, and a waste gas treatment device 400.
該進料裝置100用以輸送一被處理物01(例如：廢棄物)，並且包含一第一氣流倍增器110。該第一氣流倍增器110包含環形設置的多個第一通氣孔道111，一第一氣體G1經由該些第一通氣孔道111注入該第一氣流倍增器110之內。 The feeding device 100 is used to transport a processed object 01 (e.g., waste), and includes a first air flow multiplier 110. The first air flow multiplier 110 includes a plurality of first ventilation channels 111 arranged in an annular shape, and a first gas G1 is injected into the first air flow multiplier 110 through the first ventilation channels 111.
該進料裝置100還包含一渦輪扇葉組120。該渦輪扇葉組120，與該第一氣流倍增器110連接，用以分散該被處理物01。 The feeding device 100 also includes a turbine blade assembly 120. The turbine blade assembly 120 is connected to the first air flow multiplier 110 to disperse the processed object 01.
該氣化裝置200與該進料裝置100連接，用以氣化該被處理物01。該氣化裝置200包含一旋轉爐管210。該旋轉爐管210的內壁設有一螺旋狀導板211。 The gasification device 200 is connected to the feeding device 100 to gasify the processed material 01. The gasification device 200 includes a rotary furnace tube 210. The inner wall of the rotary furnace tube 210 is provided with a spiral guide plate 211.
該氣化裝置200還包含一加熱器220。該加熱器220用於加熱該旋轉爐管210以及該旋轉爐管210內部的該被處理物01。 The gasification device 200 also includes a heater 220. The heater 220 is used to heat the rotary furnace tube 210 and the processed object 01 inside the rotary furnace tube 210.
請配合參照圖2，其為本創作之氣化處理系統中的該進料裝置100之結構示意圖。在一實施例中，該進料裝置100還包含一旋轉下料閥130，該第一 氣流倍增器110與該旋轉下料閥130連接。當該被處理物01被投入該進料裝置100時，首先儲存於該旋轉下料閥130。而該旋轉下料閥130的葉輪設計，用以連續釋放成堆的該被處理物01，並且維持該進料裝置100後端的該氣化裝置200的氣密性。該旋轉下料閥130使用變頻馬達驅動葉輪，透過葉輪旋轉的速度可以調整該被處理物01的下料量，操作維護方便。 Please refer to Figure 2, which is a schematic diagram of the structure of the feed device 100 in the gasification treatment system of the present invention. In one embodiment, the feed device 100 also includes a rotary discharge valve 130, and the first airflow multiplier 110 is connected to the rotary discharge valve 130. When the treated object 01 is put into the feed device 100, it is first stored in the rotary discharge valve 130. The impeller design of the rotary discharge valve 130 is used to continuously release the piled treated object 01 and maintain the airtightness of the gasification device 200 at the rear end of the feed device 100. The rotary discharge valve 130 uses a variable frequency motor to drive the impeller, and the discharge amount of the treated object 01 can be adjusted by the speed of the impeller rotation, which is convenient for operation and maintenance.
在圖2中，該進料裝置100的該第一氣流倍增器110是一種利用康達效應(Coanda effect)的氣體放大器(air amplifier)。當該第一氣體G1經由環形設置的該些第一通氣孔道111由外界向內地注入到該第一氣流倍增器110之內時，由於康達效應的氣體附壁效果，注入該第一氣流倍增器110的該第一氣體G1便會產生一第一牽引氣流F1。如此一來，該第一氣流倍增器110所產生的該第一牽引氣流F1能夠牽引該進料裝置100中的該被處理物01朝向該進料裝置100後端的該氣化裝置200移動、進入該旋轉爐管210。同時，由於該被處理物01朝向該氣化裝置200是跟隨該第一牽引氣流F1移動，因此該被處理物01被送入該旋轉爐管210的進料速度便可以透過該第一牽引氣流F1的流率調整。 In FIG. 2 , the first air flow multiplier 110 of the feed device 100 is an air amplifier using the Coanda effect. When the first gas G1 is injected into the first air flow multiplier 110 from the outside through the first air vents 111 arranged in an annular shape, the first gas G1 injected into the first air flow multiplier 110 will generate a first entrained air flow F1 due to the gas wall attachment effect of the Coanda effect. In this way, the first entrained air flow F1 generated by the first air flow multiplier 110 can entrain the processed object 01 in the feed device 100 to move toward the gasification device 200 at the rear end of the feed device 100 and enter the rotary furnace tube 210. At the same time, since the processed object 01 moves toward the gasification device 200 following the first entrained airflow F1, the feed rate of the processed object 01 fed into the rotary furnace tube 210 can be adjusted by the flow rate of the first entrained airflow F1.
在一實施例中，該第一氣體G1包含氮氣。該第一氣體G1不僅僅是注入該第一氣流倍增器110以協助產生該第一牽引氣流F1，包含氮氣的該第一氣體G1為該被處理物01用以隔絕氧氣。在該氣化裝置200的前端的該進料裝置100充滿氮氣，並且利用飽含氮氣的該第一牽引氣流F1牽引該被處理物01進入該氣化裝置200，能夠減少並限制氧氣與該被處理物01於該氣化裝置200的氣化過程中產生反應。 In one embodiment, the first gas G1 contains nitrogen. The first gas G1 is not only injected into the first gas multiplier 110 to assist in generating the first entrained gas flow F1, but the first gas G1 containing nitrogen is used to isolate the processed object 01 from oxygen. The feed device 100 at the front end of the gasification device 200 is filled with nitrogen, and the first entrained gas flow F1 saturated with nitrogen is used to entrain the processed object 01 into the gasification device 200, which can reduce and limit the reaction between oxygen and the processed object 01 during the gasification process of the gasification device 200.
請參照圖1，該氣化裝置200的該加熱器220還包含多個加熱源221，用以分區域加熱該旋轉爐管210以及該旋轉爐管210內部的該被處理物01。本創 作的該氣化裝置200的該加熱器220具有多區加熱控制與監控的功能，藉由該些加熱源221，則可以針對該旋轉爐管210的前後不同區域分別控制溫度。並且，不同種類的該被處理物01具有不同的吸熱與放熱反應，這也需要有對應的加熱設定。具有分區域加熱該旋轉爐管210功能的該些加熱源221能夠因應不同的加熱需求，即時改變不同區域的加熱溫度。同時，該加熱器220也具有的自動調校功能，當目標溫度設定值發生變更時會收集資料並建立模型執行調校，計算合理的加熱電能、提出成分異常警訊。 Please refer to FIG. 1 , the heater 220 of the gasification device 200 further includes a plurality of heat sources 221 for heating the rotary furnace tube 210 and the processed object 01 inside the rotary furnace tube 210 in different zones. The heater 220 of the gasification device 200 of the present invention has the function of multi-zone heating control and monitoring. By means of the heat sources 221, the temperature of different zones in front and behind the rotary furnace tube 210 can be controlled respectively. Moreover, different types of processed objects 01 have different endothermic and exothermic reactions, which also require corresponding heating settings. The heat sources 221 with the function of heating the rotary furnace tube 210 in different zones can instantly change the heating temperature of different zones in response to different heating requirements. At the same time, the heater 220 also has an automatic adjustment function. When the target temperature setting value changes, it will collect data and build a model to perform adjustments, calculate reasonable heating power, and issue abnormal component warnings.
為了最佳化該氣化裝置200進行的氣化處理效率，除了監控與調整該加熱器220的該些加熱源221以外，本創作還可以監控與調整：受該第一牽引氣流F1牽引的該被處理物01的進料速度、該渦輪扇葉組120中複數渦輪扇葉的交錯頻率、該旋轉爐管210的轉速等。在一實施例中，本創作可以進一步包括一光譜儀(圖中未示出)電性連接於本創作中各裝置，透過光譜儀可以獲得各裝置(例如該氣化裝置200)的光譜資料並以生成一分析結果。再者，根據分析結果控制該旋轉爐管210的轉速及/或該加熱器220的溫度，實際應用時可以根據需求調整光譜儀連接的裝置，本創作並不以此為限。 In order to optimize the gasification processing efficiency of the gasification device 200, in addition to monitoring and adjusting the heat sources 221 of the heater 220, the present invention can also monitor and adjust: the feed rate of the processed object 01 attracted by the first induced airflow F1, the staggered frequency of the plurality of turbine blades in the turbine blade assembly 120, the rotation speed of the rotary furnace tube 210, etc. In one embodiment, the present invention can further include a spectrometer (not shown in the figure) electrically connected to each device in the present invention, and the spectrometer can be used to obtain the spectral data of each device (such as the gasification device 200) and generate an analysis result. Furthermore, the speed of the rotary furnace tube 210 and/or the temperature of the heater 220 are controlled according to the analysis results. In actual application, the device connected to the spectrometer can be adjusted according to needs, but this invention is not limited to this.
如圖1所示，該出料分選裝置300與該氣化裝置200連接，用以收集氣化後的該被處理物01所形成的一第一廢氣03與碳化物02，該第一廢氣03經由該出料分選裝置300過濾為一第二廢氣04。 As shown in FIG1 , the discharge sorting device 300 is connected to the gasification device 200 to collect a first waste gas 03 and carbide 02 formed by the gasified processed material 01. The first waste gas 03 is filtered by the discharge sorting device 300 to become a second waste gas 04.
在一實施例中，該出料分選裝置300還包含一沉積槽310，用以收集氣化後的該被處理物01所形成的該碳化物02。在該被處理物01所形成的該碳化物02中比重較重的固體將會受到重力影響而沉積於該沉積槽中310，以方便固體的該碳化物02回收。 In one embodiment, the discharge sorting device 300 further includes a sedimentation tank 310 for collecting the carbide 02 formed by the processed material 01 after gasification. The heavier solids in the carbide 02 formed by the processed material 01 will be affected by gravity and settle in the sedimentation tank 310 to facilitate the recovery of the solid carbide 02.
在一實施例中，該出料分選裝置300還包含一旋風集塵器320，與該沉積槽連接，用以收集懸浮於該第一廢氣03的該碳化物02。懸浮於該第一廢氣03的該碳化物02隨著氣體沿切線方向進入該旋風集塵器320內，並且在該旋風集塵器320內旋轉。懸浮於該第一廢氣03的該碳化物02受離心力的影響，偏離流線沿徑、往該旋風集塵器320的內壁移動。當該旋風集塵器320內壁的該碳化物02累積到一定重量後，將會受到重力影響而滑落到該旋風集塵器320底部。 In one embodiment, the discharging and sorting device 300 further includes a cyclone dust collector 320, which is connected to the sedimentation tank and is used to collect the carbide 02 suspended in the first exhaust gas 03. The carbide 02 suspended in the first exhaust gas 03 enters the cyclone dust collector 320 along the tangential direction of the gas and rotates in the cyclone dust collector 320. The carbide 02 suspended in the first exhaust gas 03 is affected by the centrifugal force, deviates from the streamline and moves along the diameter toward the inner wall of the cyclone dust collector 320. When the carbide 02 on the inner wall of the cyclone dust collector 320 accumulates to a certain weight, it will be affected by gravity and slide to the bottom of the cyclone dust collector 320.
在一實施例中，該出料分選裝置300還包含一分餾塔330，與該旋風集塵器320連接，用以分餾並且收集該第一廢氣03中的碳氫化合物。利用分子大小不同，沸點不同的原理，該分餾塔330將該第一廢氣03中的該碳氫化合物予以分離。 In one embodiment, the discharge sorting device 300 further includes a distillation tower 330 connected to the cyclone dust collector 320 for distilling and collecting hydrocarbons in the first exhaust gas 03. The distillation tower 330 separates the hydrocarbons in the first exhaust gas 03 based on the principle of different molecular sizes and different boiling points.
在該分餾塔330中，位置愈高，溫度愈低。該第一廢氣03在上升途中會逐步液化、冷卻、以及凝結成液體餾份。分子較小、沸點較低的氣態餾份則慢慢地向上移動、在該分餾塔330的高層凝結。分子較大、沸點較高的液態餾份則凝結在該分餾塔330的底部。不同餾份在該分餾塔330的各層收集，並且分別自該分餾塔330輸送出來。經過該分餾塔330分餾出的產物是石油化學的原料，可以再製成許多化學品。 In the distillation tower 330, the higher the position, the lower the temperature. The first exhaust gas 03 will gradually liquefy, cool, and condense into liquid distillates on the way up. The gaseous distillates with smaller molecules and lower boiling points will slowly move upward and condense at the upper layers of the distillation tower 330. The liquid distillates with larger molecules and higher boiling points will condense at the bottom of the distillation tower 330. Different distillates are collected at each layer of the distillation tower 330 and transported out of the distillation tower 330 respectively. The products distilled out of the distillation tower 330 are raw materials for petrochemicals and can be made into many chemicals.
如圖1所示，該廢氣處理裝置400與該出料分選裝置300連接，用以處理該第二廢氣04。該廢氣處理裝置400包含一電漿輸入源410。該電漿輸入源410輸入一電漿411與該第二廢氣04混和並且解離該第二廢氣04。 As shown in FIG. 1 , the exhaust gas treatment device 400 is connected to the discharge sorting device 300 to treat the second exhaust gas 04. The exhaust gas treatment device 400 includes a plasma input source 410. The plasma input source 410 inputs a plasma 411 to mix with the second exhaust gas 04 and decompose the second exhaust gas 04.
該廢氣處理裝置400還包含一第二氣流倍增器420。該第二氣流倍增器420與該電漿輸入源410連接，並且包含環形設置的多個第二通氣孔道421，一第二氣體G2經由該些第二通氣孔道421注入該第二氣流倍增器420之內。該第 二廢氣04經由該第二氣流倍增器420與該電漿411接觸並且解離。當該電漿411與該第二廢氣04混和時，首先受到該電漿411的高能量而發生磁電能量解離。並且，該電漿411與該第二廢氣04在該第二氣流倍增器420中來回碰撞，產生第二輪的解離效果。 The waste gas treatment device 400 also includes a second air flow multiplier 420. The second air flow multiplier 420 is connected to the plasma input source 410 and includes a plurality of second ventilation holes 421 arranged in an annular shape. A second gas G2 is injected into the second air flow multiplier 420 through the second ventilation holes 421. The second waste gas 04 contacts and dissociates with the plasma 411 through the second air flow multiplier 420. When the plasma 411 and the second waste gas 04 are mixed, the plasma 411 is first subjected to the high energy of the plasma 411 and magnetoelectric energy dissociation occurs. In addition, the plasma 411 and the second waste gas 04 collide back and forth in the second air flow multiplier 420, producing a second round of dissociation effect.
請配合參照圖3，其為本創作之氣化處理系統中的該廢氣處理裝置400之結構示意圖。該廢氣處理裝置400的該第二氣流倍增器420同樣是一種利用康達效應的氣體放大器。當該第二氣體G2經由環形設置的該些第二通氣孔道421由外界向內地注入到該第二氣流倍增器420之內時，由於康達效應的氣體附壁效果，注入該第二氣流倍增器420的該第二氣體G2便會產生一第二牽引氣流F2。如此一來，該第二氣流倍增器420所產生的該第二牽引氣流F2能夠牽引電漿輸入源410輸入的該電漿411與該第二廢氣04於該第二氣流倍增器420的後端混和。 Please refer to FIG. 3, which is a schematic diagram of the structure of the waste gas treatment device 400 in the gasification treatment system of the present invention. The second gas flow multiplier 420 of the waste gas treatment device 400 is also a gas amplifier using the Coanda effect. When the second gas G2 is injected into the second gas flow multiplier 420 from the outside through the second ventilation channels 421 arranged in an annular shape, due to the gas wall attachment effect of the Coanda effect, the second gas G2 injected into the second gas flow multiplier 420 will generate a second entrained gas flow F2. In this way, the second entrained airflow F2 generated by the second airflow multiplier 420 can entrain the plasma 411 input from the plasma input source 410 and the second exhaust gas 04 to mix at the rear end of the second airflow multiplier 420.
並且，由於該第二氣流倍增器420與該電漿輸入源410之間屬於低壓區，所以能有效降低該電漿411的工作壓力、提高該電漿411移動的平均路徑。同時，該電漿411皆依同方向的路徑移動以及加速，該電漿411的阻抗降低，可以提高粒子撞擊該第二廢氣04能量。 Furthermore, since the area between the second airflow multiplier 420 and the plasma input source 410 is a low-pressure area, the working pressure of the plasma 411 can be effectively reduced and the average path of the plasma 411 can be increased. At the same time, the plasma 411 moves and accelerates along the same path, and the impedance of the plasma 411 is reduced, which can increase the energy of particles impacting the second exhaust gas 04.
在一實施例中，該第二氣體G2包含氬氣。該第二氣體G2不僅僅是注入該第二氣流倍增器420以協助產生該第二牽引氣流F2，包含氬氣的該第二氣體G2與該電漿411混和、控制該電漿411流量，並且促使該電漿411以一預定角度碰撞該第二廢氣04。 In one embodiment, the second gas G2 contains argon. The second gas G2 is not only injected into the second gas multiplier 420 to assist in generating the second entrained gas flow F2, but the second gas G2 containing argon is mixed with the plasma 411, controls the flow rate of the plasma 411, and causes the plasma 411 to collide with the second exhaust gas 04 at a predetermined angle.
如圖3所示，在一實施例中，該廢氣處理裝置400還包含一觸媒反應腔430。該觸媒反應腔430用以氧化或還原未解離的該第二廢氣04。部分未於第一 時間於與該電漿411發生反應並且解離的該第二廢氣04能在該觸媒反應腔430進行二次反應。 As shown in FIG. 3 , in one embodiment, the exhaust gas treatment device 400 further includes a catalyst reaction chamber 430. The catalyst reaction chamber 430 is used to oxidize or reduce the undissociated second exhaust gas 04. Part of the second exhaust gas 04 that has not reacted with the plasma 411 and dissociated in the first time can undergo a secondary reaction in the catalyst reaction chamber 430.
在一實施例中，該廢氣處理裝置400還包含一泵浦440，與該觸媒反應腔430連接。該泵浦440抽氣以使該廢氣處理裝置400內部壓力小於大氣壓力。高抽氣流量的該泵浦440可維持該電漿411穩定解離該第二廢氣04的壓力環境，也是讓本創作的氣化處理系統維持在負壓狀態、避免汙染物逸散的重要設備。進一步地，本創作中各裝置(例如該進料裝置100、該氣化裝置200、該出料分選裝置300以及該廢氣處理裝置400等)可以分別包含至少一感測器(或感應裝置，圖中未示出)，藉由前述感測器的設置，本創作的氣化處理系統可以在該被處理物01被處理的各個階段進行回饋控制及調整，例如調整該第一氣流倍增器110或該第二氣流倍增器420的氣體流率、該進料裝置100的進料速度、該電漿411的環境參數等，本創作並不以此為限，藉此最佳化該電漿411與該第二廢氣04的反應效果。 In one embodiment, the exhaust gas treatment device 400 further includes a pump 440 connected to the catalyst reaction chamber 430. The pump 440 evacuates air to make the internal pressure of the exhaust gas treatment device 400 less than the atmospheric pressure. The pump 440 with a high exhaust flow rate can maintain the pressure environment of the plasma 411 to stably decompose the second exhaust gas 04, and is also an important device for maintaining the gasification treatment system of the present invention in a negative pressure state to prevent the escape of pollutants. Furthermore, each device in the present invention (such as the feed device 100, the gasification device 200, the discharge sorting device 300, and the waste gas treatment device 400, etc.) can include at least one sensor (or sensing device, not shown in the figure). By setting the aforementioned sensor, the gasification treatment system of the present invention can perform feedback control and adjustment at each stage of the treatment of the treated object 01, such as adjusting the gas flow rate of the first gas flow multiplier 110 or the second gas flow multiplier 420, the feed speed of the feed device 100, the environmental parameters of the plasma 411, etc. The present invention is not limited to this, thereby optimizing the reaction effect between the plasma 411 and the second waste gas 04.
在本創作中，該進料裝置100的該第一氣流倍增器110以及該渦輪扇葉組120能夠增加該被處理物01進入該旋轉爐管210的動能以及受熱面積；該氣化裝置200中該旋轉爐管210的該螺旋狀導板211能夠給予該被處理物01更好的熱傳效果；該出料分選裝置300能有效過濾並且收集該被處理物01經過氣化處理過後的固體；該廢氣處理裝置400的該電漿輸入源410以及該第二氣流倍增器420能夠將該被處理物01經過氣化處理過後的有毒氣體轉化為無毒氣體。本創作的該氣化處理系統，除了能夠解決習知技術在廢棄物氣化處理過程中所面臨的問題，還能夠進一步提升廢棄物氣化處理的效率。 In the present invention, the first airflow multiplier 110 and the turbine blade assembly 120 of the feeding device 100 can increase the kinetic energy and heating area of the processed object 01 entering the rotary furnace tube 210; the spiral guide plate 211 of the rotary furnace tube 210 in the gasification device 200 can provide the processed object 01 with a better heat transfer effect; the discharge sorting device 300 can effectively filter and collect the solids of the processed object 01 after gasification treatment; the plasma input source 410 and the second airflow multiplier 420 of the exhaust gas treatment device 400 can convert the toxic gas of the processed object 01 after gasification treatment into non-toxic gas. This gasification treatment system of this invention can not only solve the problems faced by conventional technologies in the waste gasification treatment process, but also further improve the efficiency of waste gasification treatment.
以上僅是本創作的較佳實施方式，應當指出，對於所屬技術領域的通常知識者，在不脫離本創作原理的前提下，還可以做出若干改進和潤飾，這些改進和潤飾也應視為本創作的保護範圍。 The above is only the best implementation method of this creation. It should be pointed out that people with ordinary knowledge in the relevant technical field can make some improvements and embellishments without departing from the principles of this creation. These improvements and embellishments should also be regarded as the protection scope of this creation.
01:被處理物 01: Objects to be processed
02:碳化物 02:Carbide
03:第一廢氣 03: The first waste gas
04:第二廢氣 04: The second waste gas
100:進料裝置 100: Feeding device
110:第一氣流倍增器 110: First airflow multiplier
111:第一通氣孔道 111: First ventilation channel
120:渦輪扇葉組 120: Turbine blade assembly
121:第一渦輪扇葉 121: First turbine blades
122:第二渦輪扇葉 122: Second turbine blades
130:旋轉下料閥 130: Rotary discharge valve
200:氣化裝置 200: Gasification device
210:旋轉爐管 210: Rotary furnace tube
211:螺旋狀導板 211: Spiral guide plate
220:加熱器 220: Heater
221:加熱源 221:Heating source
300:出料分選裝置 300: Discharging and sorting device
310:沉積槽 310: Sedimentation tank
320:旋風集塵器 320: Cyclone dust collector
330:分餾塔 330: Distillation tower
400:廢氣處理裝置 400: Waste gas treatment device
410:電漿輸入源 410: Plasma input source
411:電漿 411: Plasma
420:第二氣流倍增器 420: Second airflow multiplier
421:第二通氣孔道 421: Second ventilation channel
430:觸媒反應腔 430: Catalyst reaction chamber
440:泵浦 440: Pump
G1:第一氣體 G1: First gas
G2:第二氣體 G2: Second gas
Claims (15)
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWM653534U true TWM653534U (en) | 2024-04-01 |
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