TWM639986U - Inert gas supply cylinder - Google Patents
Inert gas supply cylinder Download PDFInfo
- Publication number
- TWM639986U TWM639986U TW111208034U TW111208034U TWM639986U TW M639986 U TWM639986 U TW M639986U TW 111208034 U TW111208034 U TW 111208034U TW 111208034 U TW111208034 U TW 111208034U TW M639986 U TWM639986 U TW M639986U
- Authority
- TW
- Taiwan
- Prior art keywords
- inert gas
- gas supply
- movable nozzle
- cylinder body
- cylinder
- Prior art date
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Telephone Function (AREA)
Abstract
Description
本創作,是關於在半導體製造裝置的裝載埠被使用的惰性氣體供給氣缸。 This invention relates to an inert gas supply cylinder used in the loading port of a semiconductor manufacturing apparatus.
過去已知有在半導體製造裝置的裝載埠具備有將氮氣等的惰性氣體供給到晶圓收納容器的內部的惰性氣體供給氣缸。該惰性氣體供給氣缸相對於被配置在晶圓收納容器的底部的閥機構進行抵接及分開。 Previously, it was known that semiconductor manufacturing apparatuses had loading terminals equipped with inert gas supply cylinders that supplied inert gases, such as nitrogen, to the interior of wafer storage containers. These inert gas supply cylinders abutted and disengaged from a valve mechanism located at the bottom of the wafer storage container.
例如在日本特許第5958446號公報記載有被裝載埠裝置所使用的氣體供給排出機構。該氣體供給排出機構具備將氣體流通噴嘴可在軸向移動地作支承的殼體部、殼體部具有藉由氣體流通噴嘴的凸緣部被區劃成兩個壓力調整室的壓力室。又,該氣體供給排出機構具有與壓力室的位置關係被配置的狀態被配置的氣體流通室,氣體流通噴嘴的一方的開口部可與容器的閥抵接,氣體流通噴嘴的另一方的開口部為在氣體流通室內。 For example, Japanese Patent No. 5958446 discloses a gas supply and discharge mechanism used in a loading port device. This gas supply and discharge mechanism includes a housing portion that supports a gas flow nozzle axially, and a pressure chamber divided into two pressure adjustment chambers by the flange of the gas flow nozzle. Furthermore, the gas supply and discharge mechanism has a gas flow chamber configured in relation to the position of the pressure chamber, with one opening of the gas flow nozzle abutting against a valve of the container, and the other opening of the gas flow nozzle located within the gas flow chamber.
在上述氣體供給排出機構,藉由通過壓力調整用路徑(配管)增減兩個壓力調整室的一方的壓力,能使氣體流通噴嘴移動。又,氣體流通噴嘴與容器的閥抵接的狀態下,藉由從被連接於氣體流通室的氣體供給排出配管供給惰性氣體,將惰性氣體導入容器的內部。 In the aforementioned gas supply and discharge mechanism, the gas flow nozzle can be moved by increasing or decreasing the pressure of one of the two pressure adjustment chambers via a pressure adjustment path (pipeline). Furthermore, with the gas flow nozzle in contact with the valve of the container, inert gas is supplied from the gas supply and discharge pipe connected to the gas flow chamber, guiding the inert gas into the interior of the container.
上述氣體供給排出機構,是壓力調整用配管及氣體供給排出配管皆被固定於殼體部者,而不會有隨著氣體流通噴嘴的移動而欲使該等的配管一起動的力作用的情況。然而,因為除了兩個壓力調整室之外配置有氣體流通室,所以,會有裝置大型化的顧慮。 The aforementioned gas supply and discharge mechanism has both the pressure regulating piping and the gas supply and discharge piping fixed to the housing, eliminating the force required to move these piping sections with the movement of the gas flow nozzle. However, because a gas flow chamber is included in addition to the two pressure regulating chambers, there is a concern about the potential for larger device size.
本創作之目的在解決上述的課題。 The purpose of this work is to solve the aforementioned problems.
本創作的惰性氣體供給氣缸,係具備有:氣缸體與可動噴嘴和惰性氣體供給軸。可動噴嘴具有沿軸向貫穿的氣體通路,且是以可在軸向移動地被氣缸體所支承,可動噴嘴的軸向一端部從氣缸體的軸向一端部突出。氣缸體具有和在氣缸體與可動噴嘴之間被區劃形成的壓力室連通的作動埠。惰性氣體供給軸被安裝在氣缸體的軸向另一端部,並被插通到可動噴嘴的氣體通路內。 This invention relates to an inert gas supply cylinder, comprising: a cylinder body, a movable nozzle, and an inert gas supply shaft. The movable nozzle has an axially extending gas passage and is axially movably supported by the cylinder body, with one axial end of the movable nozzle protruding from the other axial end of the cylinder body. The cylinder body has an actuation port communicating with a pressure chamber partitioned between the cylinder body and the movable nozzle. The inert gas supply shaft is mounted at the other axial end of the cylinder body and is inserted into the gas passage of the movable nozzle.
根據上述惰性氣體供給氣缸,由於惰性氣體供給軸被插通到可動噴嘴的氣體通路內,所以,可緊緻地構成惰性氣體供給氣缸整體。又由於惰性氣體供給軸被安裝在氣缸體,所以,惰性氣體供給用的配管被保持在穩定 的位置。 According to the aforementioned inert gas supply cylinder, since the inert gas supply shaft is inserted into the gas passage of the movable nozzle, the entire inert gas supply cylinder can be tightly assembled. Furthermore, since the inert gas supply shaft is mounted on the cylinder body, the piping for inert gas supply is maintained in a stable position.
本創作的惰性氣體供給氣缸,由於具備有被插通到可動噴嘴的氣體通路內的惰性氣體供給軸,所以,可緊緻地構成裝置整體。又,由於惰性氣體供給軸與氣缸體一體被連結,所以,不會有對惰性氣體供給用的配管施加不合理的力的情況。 This inert gas supply cylinder features an inert gas supply shaft that is inserted into the gas passage of a movable nozzle, allowing it to be tightly integrated into the overall device. Furthermore, because the inert gas supply shaft is integrally connected to the cylinder body, there is no risk of applying unreasonable forces to the inert gas supply piping.
與添附的圖面協同由接下來的合適的實施的形態例的說明,應該能更明白上述的目的、特徵及優點。 The objectives, features, and advantages described above should become clearer through the following explanation of appropriate implementation examples, in conjunction with the attached drawings.
10:惰性氣體供給氣缸 10: Inert gas supply cylinder
12:氣缸體 12: Cylinder Block
144:第1段部(段部) 144: 1st Dan (Duan)
16:作動埠 16: Port
18:制動器 18: Brakes
24:第1密封構件(密封構件) 24: First sealing component (sealing component)
26:第2密封構件(密封構件) 26: Second sealing component (sealing component)
28:可動噴嘴 28: Movable nozzle
284:凸緣部 284: Protruding flange
30:氣體通路 30: Gas pathway
32:第3密封構件(密封構件) 32: Third sealing component (sealing component)
34:惰性氣體供給軸 34: Inert gas supply shaft
38:壓力室 38: Pressure Chamber
44:轉接器 44: Adapter
[圖1]為本創作的實施形態的惰性氣體供給氣缸的剖視圖。 [Figure 1] is a cross-sectional view of the inert gas supply cylinder of the embodiment of this invention.
[圖2]為可動噴嘴朝上方移動時的圖1的惰性氣體供給氣缸的剖視圖。 [Figure 2] is a cross-sectional view of the inert gas supply cylinder of Figure 1 when the movable nozzle moves upward.
以下的說明中,使用關於上下的字詞時,方便上是說明圖面上的方向,而不是限定各構件的實際的配置等。 In the following explanation, the terms "up" and "down" are used for convenience in describing the orientation on the drawing, rather than specifying the actual arrangement of the components.
本創作的實施形態的惰性氣體供給氣缸10,是在半導體製造裝置的裝載埠為了將氮氣等的惰性氣體供給到晶圓收納容器而被使用。如圖1及圖2所示,惰性氣體供給氣缸10具備有:氣缸體12與可動噴嘴28和惰性氣體供 給軸34。 The inert gas supply cylinder 10 of this invention is used in the loading port of a semiconductor manufacturing apparatus to supply inert gases such as nitrogen to a wafer storage container. As shown in Figures 1 and 2, the inert gas supply cylinder 10 includes: a cylinder body 12, a movable nozzle 28, and an inert gas supply shaft 34.
筒狀的氣缸體12具有沿軸向(上下方向)貫穿的氣缸孔14。氣缸孔14具有:第1大徑部141、從第1大徑部141經第1段部144和上方連接的第2大徑部142、以及從第1大徑部141經第2段部145和下方連接的小徑部143。第2大徑部142的內徑比第1大徑部141的內徑更大,小徑部143的內徑比第1大徑部141的內徑更小。 The cylindrical cylinder block 12 has a cylinder bore 14 extending axially (vertically). The cylinder bore 14 has: a first large diameter portion 141; a second large diameter portion 142 extending from the first large diameter portion 141 through a first segment 144 and connecting upwards; and a small diameter portion 143 extending from the first large diameter portion 141 through a second segment 145 and connecting downwards. The inner diameter of the second large diameter portion 142 is larger than the inner diameter of the first large diameter portion 141, and the inner diameter of the small diameter portion 143 is smaller than the inner diameter of the first large diameter portion 141.
筒狀的可動噴嘴28,是可在軸向(上下方向)移動地被氣缸體12所支承。可動噴嘴28在內部具有成為惰性氣體的通路的氣體通路30,氣體通路30沿軸向貫穿可動噴嘴28。可動噴嘴28具備:第1大徑部281、經由從第1大徑部281朝外方突出的凸緣部284和上方連接的第2大徑部282、以及從第1大徑部281經段部285和下方連接的小徑部283。第2大徑部282的外徑比第1大徑部281的外徑更大,小徑部283的外徑比第1大徑部281的外徑更小。可動噴嘴28的第2大徑部282的一部分從氣缸體12朝上方突出。 The cylindrical movable nozzle 28 is supported by the cylinder body 12 and is movable in the axial direction (vertical direction). The movable nozzle 28 has a gas passage 30 inside, which serves as a passage for inert gas, and the gas passage 30 extends axially through the movable nozzle 28. The movable nozzle 28 includes: a first large diameter portion 281, a second large diameter portion 282 connected above by a flange portion 284 protruding outward from the first large diameter portion 281, and a small diameter portion 283 connected below by a section portion 285 from the first large diameter portion 281. The outer diameter of the second large diameter portion 282 is larger than the outer diameter of the first large diameter portion 281, and the outer diameter of the small diameter portion 283 is smaller than the outer diameter of the first large diameter portion 281. A portion of the second large diameter section 282 of the movable nozzle 28 protrudes upward from the cylinder block 12.
在氣缸體12安裝有第1密封構件24及第2密封構件26。第1密封構件24,是從氣缸孔14的小徑部143的壁面向可動噴嘴28的小徑部283突出,抵接在可動噴嘴28的小徑部283。第2密封構件26,是從氣缸孔14的第1大徑部141的壁面向可動噴嘴28的第1大徑部281突出,抵接在可動噴嘴28的第1大徑部281。 A first sealing member 24 and a second sealing member 26 are installed in the cylinder block 12. The first sealing member 24 protrudes from the wall of the small-diameter portion 143 of the cylinder bore 14 towards the small-diameter portion 283 of the movable nozzle 28, and abuts against the small-diameter portion 283 of the movable nozzle 28. The second sealing member 26 protrudes from the wall of the first large-diameter portion 141 of the cylinder bore 14 towards the first large-diameter portion 281 of the movable nozzle 28, and abuts against the first large-diameter portion 281 of the movable nozzle 28.
壓力室38,是在第1密封構件24與第2密封構件26之間的區域,藉由氣缸孔14的壁面及可動噴嘴28的外 周面被區劃形成。氣缸體12具備和壓力室38連通的作動埠16。作動埠16的一端,是在氣缸體12的外面開口,作動埠16的另一端延伸到氣缸孔14的小徑部143。壓力室38,是藉由第1密封構件24從可動噴嘴28的氣體通路30被保持氣密,藉由第2密封構件26從外部被保持氣密。 The pressure chamber 38, located between the first sealing member 24 and the second sealing member 26, is defined by the wall of the cylinder bore 14 and the outer peripheral surface of the movable nozzle 28. The cylinder body 12 has an actuation port 16 communicating with the pressure chamber 38. One end of the actuation port 16 opens to the outside of the cylinder body 12, and the other end extends to the small diameter 143 of the cylinder bore 14. The pressure chamber 38 is kept airtight by the first sealing member 24 through the gas passage 30 of the movable nozzle 28, and by the second sealing member 26 from the outside.
未圖示的氣壓供給用的配管被連接於作動埠16。從未圖示的氣體供給源作為正壓的氣壓通過該配管被供給到作動埠16,而從未圖示的負壓源作為負壓的氣壓通過該配管被供給到作動埠16。若對作動埠16供給氣壓,則可動噴嘴28,是藉由相當於可動噴嘴28的段部285的面積差進行作用的氣壓朝上下方向移動。具體而言,若對作動埠16供給作為正壓的氣壓,則可動噴嘴28朝上方移動,若對作動埠16供給作為負壓的氣壓,則可動噴嘴28朝下方移動。 A pneumatic supply piping (not shown) is connected to the actuation port 16. Positive pressure pneumatics from a pneumatic supply source (not shown) is supplied to the actuation port 16 through this piping, while negative pressure pneumatics from a negative pressure source (not shown) is supplied to the actuation port 16 through the same piping. When pneumatic pressure is supplied to the actuation port 16, the movable nozzle 28 moves vertically by means of the area difference corresponding to the segment 285 of the movable nozzle 28. Specifically, if positive pressure is supplied to the actuation port 16, the movable nozzle 28 moves upward; if negative pressure is supplied to the actuation port 16, the movable nozzle 28 moves downward.
氣缸孔14的第2大徑部142經由第3段部146和氣缸孔14的上側開口端接連。環狀的制動器18,是經由C環等的第1擋圈20,朝第3段部146被推壓而被安裝於氣缸體12。止動件18的內徑比第2大徑部142的內徑更小,制動器18從氣缸孔14朝內方突出。 The second major diameter portion 142 of the cylinder bore 14 is connected to the upper open end of the cylinder bore 14 via the third section 146. The annular brake 18 is installed in the cylinder block 12 by being pushed towards the third section 146 via a first retaining ring 20 such as a C-ring. The inner diameter of the stop member 18 is smaller than the inner diameter of the second major diameter portion 142, and the brake 18 protrudes inward from the cylinder bore 14.
可動噴嘴28朝上方的移動,是藉由可動噴嘴28的凸緣部284抵接在擋止器18而被約束。又,可動噴嘴28朝下方的移動,是藉由可動噴嘴28的凸緣部284抵接在氣缸孔14的第1段部144而被約束。當可動噴嘴28的凸緣部284抵接在止動件18時,可動噴嘴28從氣缸體12朝上方突 出的長度為最大(參照圖2)。當可動噴嘴28的凸緣部284抵接在氣缸孔14的第1段部144時,可動噴嘴28從氣缸體12朝上方突出的長度為最小(參照圖1)。 The upward movement of the movable nozzle 28 is restrained by the flange 284 of the movable nozzle 28 abutting against the stopper 18. Similarly, the downward movement of the movable nozzle 28 is restrained by the flange 284 of the movable nozzle 28 abutting against the first section 144 of the cylinder bore 14. When the flange 284 of the movable nozzle 28 abuts against the stopper 18, the upward protrusion of the movable nozzle 28 from the cylinder body 12 is at its maximum (see Figure 2). When the flange 284 of the movable nozzle 28 abuts against the first section 144 of the cylinder bore 14, the upward protrusion of the movable nozzle 28 from the cylinder body 12 is at its minimum (see Figure 1).
在氣缸體12的下端安裝有將惰性氣體導入可動噴嘴28的氣體通路30用的惰性氣體供給軸34。惰性氣體供給軸34具有:被固定於氣缸體12的凸緣部341、從凸緣部341朝上方延伸的插通部342、以及從凸緣部341朝下方延伸的連接部343。插通部342被插通到可動噴嘴28的氣體通路30。接頭構件40被連接於連接部343。惰性氣體供給軸34具有:插通部342、凸緣部341以及將連接部343朝上下方向作貫穿氣體通路36。 An inert gas supply shaft 34 for introducing inert gas into the gas passage 30 of the movable nozzle 28 is installed at the lower end of the cylinder body 12. The inert gas supply shaft 34 has: a flange portion 341 fixed to the cylinder body 12; an insertion portion 342 extending upward from the flange portion 341; and a connecting portion 343 extending downward from the flange portion 341. The insertion portion 342 is inserted into the gas passage 30 of the movable nozzle 28. A connector member 40 is connected to the connecting portion 343. The inert gas supply shaft 34 has: the insertion portion 342, the flange portion 341, and a gas passage 36 that extends vertically through the connecting portion 343.
氣缸孔14的小徑部143經由錐狀的第4段部147和氣缸孔14的下側開口端接連。惰性氣體供給軸34的凸緣部341,是經由C環等形成的第2擋圈22,朝第4段部147被推壓而被安裝於氣缸體12。在惰性氣體供給軸34的凸緣部341的外周安裝有第3密封構件32。可動噴嘴28的氣體通路30,是第3密封構件32從外部被保持氣密。 The small-diameter portion 143 of the cylinder bore 14 is connected to the lower open end of the cylinder bore 14 via a tapered fourth section 147. The flange portion 341 of the inert gas supply shaft 34 is mounted to the cylinder body 12 by being pushed towards the fourth section 147 by a second retaining ring 22 formed by a C-ring, etc. A third sealing member 32 is installed on the outer periphery of the flange portion 341 of the inert gas supply shaft 34. The gas passage 30 of the movable nozzle 28 is kept airtight from the outside by the third sealing member 32.
接頭構件40具有和惰性氣體供給軸34的氣體通路36直角交叉的惰性氣體供給埠42。未圖示惰性氣體供給用的配管被連接於接頭構件40,氮氣等的惰性氣體從未圖示惰性氣體供給源通過該配管被供給到接頭構件40的惰性氣體供給埠42。 The connector 40 has an inert gas supply port 42 that intersects at a right angle with the gas passage 36 of the inert gas supply shaft 34. A piping (not shown) for inert gas supply is connected to the connector 40, and inert gases such as nitrogen are supplied to the inert gas supply port 42 of the connector 40 from an inert gas supply source (not shown) via this piping.
可抵接於未圖示晶圓收納容器的轉接器44藉由螺合等的手段被安裝在可動噴嘴28的上端部(軸向一端 部)。轉接器44,是在內部具有和可動噴嘴28的氣體通路30連通的氣體通路46。當轉接器44的上面和晶圓收納容器的下面抵接時,被供給到接頭構件40的惰性氣體供給埠42的惰性氣體,是經由惰性氣體供給軸34的氣體通路36、可動噴嘴28的氣體通路30以及轉接器44的氣體通路46被供給到晶圓收納容器的內部。在本實施形態,雖在可動噴嘴28的上端部安裝有轉接器44,可是,轉接器44不是必須必要的構件,也可讓可動噴嘴28的上端部和晶圓收納容器抵接。 An adapter 44, which can abut against a wafer housing container (not shown), is mounted on the upper end (axial end) of a movable nozzle 28 by means of screwing or the like. The adapter 44 has a gas passage 46 inside that communicates with the gas passage 30 of the movable nozzle 28. When the upper part of the adapter 44 abuts against the lower part of the wafer housing container, the inert gas supplied to the inert gas supply port 42 of the connector 40 is supplied to the inside of the wafer housing container via the gas passage 36 of the inert gas supply shaft 34, the gas passage 30 of the movable nozzle 28, and the gas passage 46 of the adapter 44. In this embodiment, although an adapter 44 is installed at the upper end of the movable nozzle 28, the adapter 44 is not a necessary component, and the upper end of the movable nozzle 28 can also abut against the wafer storage container.
惰性氣體供給氣缸10,是例如將接頭構件40固定於裝載埠(未圖示)被使用。氣缸體12、惰性氣體供給軸34及接頭構件40互相被一體的連結。因此,在惰性氣體供給氣缸的動作時,氣壓供給用的配管及惰性氣體供給用的配管皆被保持在穩定的位置。也可將氣缸體12或惰性氣體供給軸34固定在裝載埠取代將接頭構件40固定在裝載埠。 The inert gas supply cylinder 10 is used, for example, by fixing the connector 40 to the loading port (not shown). The cylinder body 12, the inert gas supply shaft 34, and the connector 40 are integrally connected to each other. Therefore, when the inert gas supply cylinder is actuated, both the air pressure supply piping and the inert gas supply piping are held in a stable position. Alternatively, the cylinder body 12 or the inert gas supply shaft 34 can be fixed to the loading port instead of fixing the connector 40 to the loading port.
本實施形態的惰性氣體供給氣缸10,是如以上所構成者,以下針對其作用進行說明。如圖1所示,將對作動埠16供給負壓,使可動噴嘴28移動到最下方的狀態(可動噴嘴28從氣缸體12朝上方突出的長度為最小的狀態)稱為初期狀態。在該初期狀態,惰性氣體沒有被供給到接頭構件40的惰性氣體供給埠42。 The inert gas supply cylinder 10 of this embodiment is configured as described above, and its function will be explained below. As shown in FIG1, the state in which negative pressure is supplied to the actuation port 16, causing the movable nozzle 28 to move to its lowest position (the length of the movable nozzle 28 protruding upward from the cylinder body 12 is at its minimum) is called the initial state. In this initial state, inert gas is not supplied to the inert gas supply port 42 of the connector member 40.
從上述初期狀態,將供給到作動埠16的氣壓從負壓切換到正壓時,可動噴嘴28朝向上方被驅動(參照 圖2)。當可動噴嘴28朝向預定量上方移動時,被安裝在可動噴嘴28的轉接器44和晶圓收納容器抵接。預先調整初期狀態中的轉接器44的上面與晶圓收納容器的下面之間隔,以使可動噴嘴28的凸緣部284和止動件18抵接的同時,轉接器44和晶圓收納容器抵接。也可在可動噴嘴28的凸緣部284和止動件18抵接之前,使轉接器44和晶圓收納容器抵接。 From the initial state described above, when the air pressure supplied to the actuation port 16 is switched from negative pressure to positive pressure, the movable nozzle 28 is driven upwards (see Figure 2). As the movable nozzle 28 moves upwards in a predetermined manner, the adapter 44 mounted on the movable nozzle 28 comes into contact with the wafer storage container. The gap between the top of the adapter 44 and the bottom of the wafer storage container in the initial state is pre-adjusted so that the adapter 44 and the wafer storage container abut simultaneously with the flange 284 of the movable nozzle 28 abutting the stop 18. Alternatively, the adapter 44 and the wafer storage container can abut before the flange 284 of the movable nozzle 28 abuts the stop 18.
轉接器44和晶圓收納容器抵接之後,從惰性氣體供給源將惰性氣體供給到接頭構件40的惰性氣體供給埠42。該惰性氣體,是經由惰性氣體供給軸34的氣體通路36、可動噴嘴28的氣體通路30及轉接器44的氣體通路46被供給到晶圓收納容器的內部。此外,被裝設在晶圓收納容器的底部的未圖示的閥機構,是形成利用惰性氣體的壓力被開啟。 After the adapter 44 and the wafer housing container come into contact, inert gas is supplied from an inert gas supply source to the inert gas supply port 42 of the connector 40. This inert gas is supplied to the interior of the wafer housing container via the gas passage 36 of the inert gas supply shaft 34, the gas passage 30 of the movable nozzle 28, and the gas passage 46 of the adapter 44. Furthermore, a valve mechanism (not shown) installed at the bottom of the wafer housing container is opened by the pressure of the inert gas.
當朝晶圓收納容器內的惰性氣體的填充完成時,停止對接頭構件40的惰性氣體供給埠42的惰性氣體的供給。之後,將供給到作動埠16的氣壓從正壓切換到負壓。藉此,可動噴嘴28朝向下方被驅動而回到初期狀態。 Once the inert gas filling within the wafer housing is complete, the inert gas supply to the inert gas supply port 42 of the connector component 40 is stopped. Then, the gas pressure supplied to the actuation port 16 is switched from positive pressure to negative pressure. This drives the movable nozzle 28 downwards, returning it to its initial state.
根據本實施形態的惰性氣體供給氣缸10,由於惰性氣體供給軸34被插通到可動噴嘴28的氣體通路30內,所以,可緊緻地構成惰性氣體供給氣缸10整體。又,由於惰性氣體供給軸34被安裝在氣缸體12,所以,惰性氣體供給用的配管被保持在穩定的位置。 According to this embodiment of the inert gas supply cylinder 10, since the inert gas supply shaft 34 is inserted into the gas passage 30 of the movable nozzle 28, the inert gas supply cylinder 10 can be tightly assembled as a whole. Furthermore, since the inert gas supply shaft 34 is mounted on the cylinder body 12, the piping for inert gas supply is held in a stable position.
本創作不限於上述的實施形態,在不偏離本 創作之要旨的情況下,能採用各種的構造。 This work is not limited to the above-described embodiments; various structures may be employed without departing from the essence of this work.
10:惰性氣體供給氣缸 10: Inert gas supply cylinder
12:氣缸體 12: Cylinder Block
14:氣缸孔 14: Cylinder bore
16:作動埠 16: Port
18:制動器 18: Brakes
20:第1擋圈 20: First shift ring
22:第2擋圈 22: Second lap
24:第1密封構件(密封構件) 24: First sealing component (sealing component)
26:第2密封構件(密封構件) 26: Second sealing component (sealing component)
28:可動噴嘴 28: Movable nozzle
30:氣體通路 30: Gas pathway
32:第3密封構件(密封構件) 32: Third sealing component (sealing component)
34:惰性氣體供給軸 34: Inert gas supply shaft
36:氣體通路 36: Gas pathway
38:壓力室 38: Pressure Chamber
40:接頭構件 40: Joint components
42:惰性氣體供給埠 42: Inert gas supply port
44:轉接器 44: Adapter
46:氣體通路 46: Gas Pathway
141:第1大徑部 141: First Major Path
142:第2大徑部 142: Second Major Path
143:小徑部 143: Minor Path Section
144:第1段部(段部) 144: 1st Dan (Duan)
145:第2段部 145:Part 2
146:第3段部 146:Part 3
147:第4段部 147: Section 4
281:第1大徑部 281: First Major Path
282:第2大徑部 282: Second Major Path
283:小徑部 283: Minor Path Section
284:凸緣部 284: Protruding flange
285:段部 285: Section
341:凸緣部 341: Protruding flange
342:插通部 342: Insertion Section
343:連接部 343: Connecting Part
Claims (6)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021-003256 | 2021-08-23 | ||
| JP2021003256U JP3234746U (en) | 2021-08-23 | 2021-08-23 | Inert gas supply cylinder |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWM639986U true TWM639986U (en) | 2023-04-21 |
Family
ID=78275622
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW111208034U TWM639986U (en) | 2021-08-23 | 2022-07-27 | Inert gas supply cylinder |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP3234746U (en) |
| CN (1) | CN217946223U (en) |
| TW (1) | TWM639986U (en) |
-
2021
- 2021-08-23 JP JP2021003256U patent/JP3234746U/en active Active
-
2022
- 2022-07-27 TW TW111208034U patent/TWM639986U/en unknown
- 2022-08-22 CN CN202222211413.7U patent/CN217946223U/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP3234746U (en) | 2021-11-04 |
| CN217946223U (en) | 2022-12-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8770361B2 (en) | Residual pressure holding valve and suspension strut | |
| US6877715B2 (en) | Vacuum regulating valve | |
| US7401760B2 (en) | Vacuum regulating valve | |
| US20090288723A1 (en) | Valve device | |
| US20150033941A1 (en) | Linear actuator and vacuum control device | |
| CN103430118B (en) | Pilot operated pressure reducing valve | |
| KR20160049987A (en) | Throttle valve | |
| JPS6149549B2 (en) | ||
| JP2007078175A (en) | Air-tight sealing valve for flow channel | |
| JP2006097896A (en) | Diaphragm valve | |
| US20170248274A1 (en) | Valve mechanism for high pressure tank and valve device for high pressure tank | |
| JPWO2019059136A1 (en) | Cylinder device with sequence valve | |
| KR20150018361A (en) | Automatic diaphragm valve for high pressure | |
| KR102476921B1 (en) | Valve actuating device with opening reduced speed | |
| TWM639986U (en) | Inert gas supply cylinder | |
| US20150060708A1 (en) | Bellows valve with valve body cylinder adapter | |
| US7021192B2 (en) | Cylinder apparatus | |
| JP2011143531A (en) | Clamp device | |
| CN112888865B (en) | Cylinder device | |
| US11572903B2 (en) | Pneumatic cylinder device with holding valve | |
| JP6567916B2 (en) | Coupling device | |
| JP2019193955A (en) | Positioning device | |
| JP7458019B2 (en) | On-off valve device | |
| WO2021220963A1 (en) | Valve | |
| CN113623181B (en) | Vacuum device |