TWM639285U - Substrate cutting device - Google Patents
Substrate cutting device Download PDFInfo
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- TWM639285U TWM639285U TW111212071U TW111212071U TWM639285U TW M639285 U TWM639285 U TW M639285U TW 111212071 U TW111212071 U TW 111212071U TW 111212071 U TW111212071 U TW 111212071U TW M639285 U TWM639285 U TW M639285U
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- high beam
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Dicing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Abstract
一種基板的切割裝置,包括:第1刀具與第2刀具,設置成刻劃平行於遠光裝置4的移動方向的切割線;複數個標尺,在與該遠光裝置4的長邊方向相對的該工作台A的側面支撐該基板時成為基準;以及控制部,計算出刻劃時該遠光裝置的長邊方向與預設的基準的偏差量,並修正第1刀具及第2刀具的位置。本創作能解決在主玻璃基板上沒有如形成在液晶面板上那樣的作為基準的對準標記(Alignment Mark),以及在切割加工精度內沒有形成切割線的問題。A cutting device for a substrate, comprising: a first cutter and a second cutter set to mark a cutting line parallel to the moving direction of the high beam device 4; The side surface of the table A supports the substrate as a reference; and the control unit calculates the amount of deviation between the long side direction of the high beam device and the preset reference when marking, and corrects the positions of the first tool and the second tool . This invention can solve the problem that there is no alignment mark (Alignment Mark) as a reference on the main glass substrate as formed on the liquid crystal panel, and the cutting line is not formed within the cutting processing accuracy.
Description
本創作是關於一種切割裝置,該切割裝置是在基板(例如玻璃等)的每個邊緣(四個邊緣)刻劃出用於切邊(Cutting Edges)的切割線。The invention relates to a cutting device, which is used to draw a cutting line for cutting edges (Cutting Edges) on each edge (four edges) of a substrate (such as glass, etc.).
為了在玻璃等基板的四個邊緣切邊作為前置處理,需要對切割線進行刻劃的加工。In order to trim the four edges of substrates such as glass as a pre-processing, it is necessary to process the dicing line.
因此,液晶的主板玻璃基板的尺寸例如為短邊2200 mm×長邊2500 mm的大尺寸。Therefore, the size of the main glass substrate of the liquid crystal is, for example, a large size of 2200 mm on the short side x 2500 mm on the long side.
作為加工該大尺寸基板的前置處理,在該基板的每個邊緣(四個邊緣)刻劃了用於切邊的切割線。 [專利文獻] As a pre-processing of processing the large-sized substrate, a cutting line for edge trimming was drawn on each edge (four edges) of the substrate. [Patent Document]
專利文獻1:日本新型專利第3216017號公報Patent Document 1: Japanese Patent No. 3216017
順便一提,根據專利文獻1的裝置,在工作台上供給液晶面板,用攝像機讀取液晶面板的對準標記加以運算並在基板的上面刻劃切割線。Incidentally, according to the apparatus of
另一方面,存在一個問題,也就是在主板玻璃基板上沒有形成如液晶面板上那樣作為基準的對準標記,且無法在切割加工精度內形成切割線的問題。On the other hand, there is a problem that no alignment mark as a reference like that on a liquid crystal panel is formed on the main glass substrate, and that cutting lines cannot be formed within the precision of the cutting process.
因此,本創作的目的在於在切割裝置上搭載有基準標尺,並提高主玻璃基板的切割加工精度。Therefore, an object of the invention is to mount a reference scale on a cutting device and improve the cutting accuracy of a main glass substrate.
為解決上述課題的本創作採用的裝置包括:工作台,設置成支撐基板,該基板是供應與放置於該工作台的上面;平行兩條的第1引導裝置,設置在該工作台的左右方向上的兩邊外側;遠光裝置,設置成由該第1引導裝置導引,且在左右方向上藉由第1行走裝置而移動;第1滑塊與第2滑塊,設置成在軌道上滑動自如地卡合,同時藉由第2行走裝置在該些第1引導裝置之間來回地移動,其中,該軌道設置在該遠光裝置兩端之間;第1刀具與第2刀具,刻畫與該基板的該遠光裝置的移動方向平行的切割線,該第1滑塊與該第2滑塊分別設置成藉由升降裝置升降;複數個標尺,在與該遠光裝置的長邊方向相對的該工作台的側面支撐該基板時成為基準;以及控制部,計算出刻畫時之該遠光裝置的長邊方向與預設的基準的偏差量,並修正該第1刀具和該第2刀具的位置。The device used in this creation to solve the above problems includes: a workbench, which is set to support the substrate, and the substrate is supplied and placed on the workbench; two parallel first guide devices are arranged in the left and right directions of the workbench The outer sides on both sides; the high beam device is set to be guided by the first guide device and moved in the left and right direction by the first traveling device; the first slider and the second slider are set to slide on the track Engage freely, and at the same time, move back and forth between the first guide devices by the second traveling device, wherein the track is arranged between the two ends of the high beam device; the first cutter and the second cutter, depicting and The cutting line parallel to the moving direction of the high beam device of the substrate, the first slider and the second slider are respectively arranged to be raised and lowered by the lifting device; a plurality of scales are opposite to the long side direction of the high beam device The side surface of the workbench supports the substrate as a reference; and the control unit calculates the amount of deviation between the long side direction of the high beam device and the preset reference when marking, and corrects the first tool and the second tool s position.
如上所述,通過本創作的基板的切割裝置,由於在既定次數的刻劃後修正了切割線的偏差量,因此能夠高精度地將玻璃基板切割成既定的尺寸。As described above, with the substrate cutting device of the present invention, since the deviation of the cutting line is corrected after a predetermined number of scribing, the glass substrate can be cut into a predetermined size with high precision.
另外,由於在與遠光裝置的長邊方向相對的工作台的側面的邊緣安裝有標尺,因此能夠高精度地進行基板的定位。In addition, since the scale is attached to the edge of the side surface of the table facing the longitudinal direction of the high beam device, the positioning of the substrate can be performed with high precision.
以下,參考附圖對本創作的實施例進行說明。第1圖所示的A是用於承載供應而放置在上面的例如玻璃基板a的工作台。Hereinafter, embodiments of the present invention will be described with reference to the drawings. A shown in FIG. 1 is a table for placing, for example, a glass substrate a on which is supplied.
作為上述基板a,例如短邊為2200 mm、長邊為2500 mm的大尺寸的液晶的主基板,並例如用供給機械等供應而放置在作為機台(stage)的工作台A上,被供給的基板a能夠被吸引保持在工作台A上。作為該吸引保持裝置,如習知技術所述,在中空的吸引式工作台A的上面板上設置有無數個小孔(未圖示),並將基板a吸引保持在工作台A的上面板上。As the above-mentioned substrate a, for example, a large-sized liquid crystal main substrate with a short side of 2200 mm and a long side of 2500 mm is supplied, for example, by a supply machine or the like, placed on a table A as a machine (stage), and supplied. The substrate a can be attracted and held on the table A. As the suction and holding device, as described in the prior art, numerous small holes (not shown) are provided on the upper panel of the hollow suction workbench A, and the substrate a is sucked and held on the upper panel of the workbench A. superior.
另外,工作台A的移動方向兩側設有兩條平行的第1引導裝置1。作為上述第1引導裝置1,鋪置有兩條平行的軌道。In addition, two parallel
而且,在第1引導裝置1上以滑動自如方式卡合兩端的滑塊2,並設置由第1行走裝置3往X方向移動的遠光裝置4。Furthermore,
作為遠光裝置4的第1行走裝置3,在圖示的情況下,內螺紋7被支撐在從門形的遠光裝置4的兩端且在不與第1引導裝置1或工作台A干涉的位置處向下延伸的腳材6的下端,藉由馬達9可反向驅動擰住在該內螺紋7上的外螺紋8讓遠光裝置4移動,但行走裝置並不限於圖示。As the first running
另外,遠光裝置4上設有沿工作台A上的基板a的上面的左右方向(X方向)刻劃切割線X1的第1刀具10和刻劃切割線X2的第2刀具11。In addition, the
上述第1刀具10和第2刀具11,如第2圖所示,其中第1滑塊13及第2滑塊14以滑動自如方式卡合在設於遠光裝置4兩端間的導軌12上,同時由該第1滑塊13及第2滑塊14支撐的線性馬達作為第2行走裝置15並可往Y方向來移動。並不限定這種行走裝置,也可採用其他方式。Above-mentioned
又,第1刀具10和第2刀具11作為支撐在第1滑塊13和第2滑塊14上的升降裝置,分別設有氣缸(Cylinder)16而升降。Also, the
於是,作為第1行走裝置3,是藉由馬達9的運轉,讓第1刀具10及第2刀具11在X方向上移動,並在基板a的上面劃線,分別形成有切割線X1及切割線X2。Therefore, as the
另外,在第1滑塊13及第2滑塊14上,分別設置有在X、Y、Z方向上微調攝像機24的位置的X機台23、Y機台22、Z機台21。由第1刀具10和第2刀具11分別形成的切割線X1和切割線X2可以分別以手動方式對準攝像機24的電子線。In addition, an
首先,作為初始設定,將切割線X1和切割線X2之間的距離(間距間的距離)作為數據輸入到控制部50,並在設置於與工作台A的遠光裝置4相對的面的標尺保持座26上,設置有長約200 mm的標尺25。First, as an initial setting, the distance between the cutting line X1 and the cutting line X2 (distance between pitches) is input as data into the
然後,調整第1刀具10和第2刀具11沿Y方向的位置,以使切割線X1和切割線X2分別位於標尺25的設置範圍內。Then, the positions of the
標尺25是玻璃基板a在X方向上定位的基準,較佳為玻璃標尺。The
另外,在控制部50中具備有圖像處理裝置51,處理由攝像機24所拍攝的圖像,使電子線能夠識別切割線X1和切割線X2的各自的中央。In addition, the
首先,遠光裝置4往X方向移動,並在玻璃基板a的端面部附近停止。藉由氣缸16使第1刀具10和第2刀具11下降到玻璃基板a上,在切割線X1和切割線X2上劃線後,使第1刀具10和第2刀具11上升,使遠光裝置4往與被刻劃的X方向的劃線方向相反的方向移動。攝像機24在捕捉切割線X1及切割線X2的位置上停止然後進行圖像處理,檢測預設的基準位置和切割線的Y方向的偏移量。First, the
之後,使第1刀具10和第2刀具11往Y方向移動,以修正由控制部50檢測出的偏移量。After that, the
可以在每次進行刻劃時執行第1刀具10和第2刀具11往Y方向的這種移動,也可以依每次設定次數而進行。Such movement of the
另外,在說明中,雖說明了刻劃切割線X1和切割線X2這兩條切割線的情況,但也可以至少追加一個以上的滑塊來測量複數條切割線進行修正。In addition, in the description, although two cutting lines, the cutting line X1 and the cutting line X2, are described, it is also possible to add at least one slider to measure a plurality of cutting lines for correction.
如上所述,設置基準的標尺以提高主玻璃基板的切斷加工精度,修正切割線的偏差量。As described above, the reference scale is provided to improve the cutting accuracy of the main glass substrate and to correct the deviation of the cutting line.
另外,於本說明書中雖說明了用於單向切邊的切割裝置的例子,但在第1次進行了單向劃線後,藉由第4圖所示的旋轉墊60使主玻璃基板a往上方退縮,旋轉90°後再次將主玻璃基板a保持在工作台A上。用校準攝像機61檢測出主玻璃基板a的端面,並用第5圖所示的工作台旋轉馬達62進行工作台A的角度校正。將第1刀具10及第2刀具11往Y方向移動到用於另一方向的切邊的既定位置,能夠進行用於另一方向的切邊的第二次劃線。In addition, although the example of the cutting device used for unidirectional trimming has been described in this specification, after the unidirectional scribing is performed for the first time, the main glass substrate a is moved by the
A:工作台 a:基板 X1、X2:切割線 1:第1引導裝置 2:滑塊 3:第1行走裝置 4 :遠光裝置 6:腳材 7:內螺紋 8:外螺紋 9:馬達 10:第1刀具 11:第2刀具 12:軌道 13:第1滑塊 14:第2滑塊 15:第2行走裝置 16:氣缸 21:X機台 22:Y機台 23:X機台 24:攝像機 25:標尺 26:標尺保持座 50:控制部 51:圖像處理裝置 60:旋轉墊 61:校準攝像機 62:工作台旋轉馬達A: workbench a: Substrate X1, X2: cutting line 1: 1st guide device 2: slider 3: The first traveling device 4 : high beam device 6: foot material 7: Internal thread 8: external thread 9: Motor 10: 1st tool 11: 2nd tool 12: track 13: 1st slider 14: 2nd slider 15: The second traveling device 16: Cylinder 21: X machine 22: Y machine 23: X machine 24: camera 25: Ruler 26: Scale holder 50: Control Department 51: Image processing device 60:Rotating Pad 61:Calibrate the camera 62: Table rotation motor
第1圖是說明本創作之一實施例的平面圖。 第2圖是上述的前視圖。 第3圖是表示在工作台上安裝了標尺的狀態的前視圖。 第4圖是說明本創作的另一實施例的俯視圖。 第5圖是第4圖的前視圖。 Figure 1 is a plan view illustrating one embodiment of the present invention. Fig. 2 is the above-mentioned front view. Fig. 3 is a front view showing a state where a scale is attached to a workbench. Figure 4 is a top view illustrating another embodiment of the invention. Fig. 5 is a front view of Fig. 4 .
A:工作台 A: workbench
a:基板 a: Substrate
X1、X2:切割線 X1, X2: cutting line
1:第1引導裝置 1: 1st guide device
2:滑塊 2: slider
4:遠光裝置 4: high beam device
10:第1刀具 10: 1st tool
11:第2刀具 11: 2nd tool
12:軌道 12: track
13:第1滑塊 13: 1st slider
14:第2滑塊 14: 2nd slider
16:氣缸 16: Cylinder
24:攝像機 24: camera
25:標尺 25: Ruler
50:控制部 50: Control Department
51:圖像處理裝置 51: Image processing device
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Application Number | Priority Date | Filing Date | Title |
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JP2022002076U JP3238790U (en) | 2022-06-22 | 2022-06-22 | substrate cutting equipment |
JP2022-002076 | 2022-06-22 |
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TWM639285U true TWM639285U (en) | 2023-04-01 |
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TW111212071U TWM639285U (en) | 2022-06-22 | 2022-11-03 | Substrate cutting device |
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CN (1) | CN218642633U (en) |
TW (1) | TWM639285U (en) |
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CN116239292B (en) * | 2023-03-28 | 2023-08-29 | 宁波旗滨光伏科技有限公司 | Cutting system and control method thereof |
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- 2022-06-22 JP JP2022002076U patent/JP3238790U/en active Active
- 2022-11-03 TW TW111212071U patent/TWM639285U/en unknown
- 2022-11-03 CN CN202222944942.8U patent/CN218642633U/en active Active
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JP3238790U (en) | 2022-08-19 |
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