TWM638239U - Vertical wetting process device - Google Patents
Vertical wetting process device Download PDFInfo
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- TWM638239U TWM638239U TW111210630U TW111210630U TWM638239U TW M638239 U TWM638239 U TW M638239U TW 111210630 U TW111210630 U TW 111210630U TW 111210630 U TW111210630 U TW 111210630U TW M638239 U TWM638239 U TW M638239U
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Abstract
本創作提供一種立式濕製程裝置,其包含一輸送機構、一水平軌道、一吊架及至少一噴灑器。輸送機構包含並列配置的複數輥軸。水平軌道設置在輸送機構上方,水平軌道具有一導引槽道。吊架包含一框體以及設置在框體的複數夾具,該些夾具排列呈間隔配置的二豎列,吊架承載於該些輥軸之上,且吊架的頂部被限制在導引槽道中。噴灑器設置在輸送機構的一側且朝向吊架配置。藉此避免沾附在夾具上的製程藥液垂流至夾具所夾持的基板表面之中央。 The invention provides a vertical wet process device, which includes a conveying mechanism, a horizontal track, a hanger and at least one sprinkler. The conveying mechanism includes a plurality of rollers arranged in parallel. The horizontal track is arranged above the conveying mechanism, and the horizontal track has a guiding channel. The hanger includes a frame and a plurality of fixtures arranged on the frame. These fixtures are arranged in two vertical rows at intervals. The hanger is carried on the rollers, and the top of the hanger is limited in the guide channel. . The sprinkler is arranged on one side of the conveying mechanism and is arranged towards the hanger. In this way, the process liquid adhering to the jig is prevented from flowing down to the center of the surface of the substrate held by the jig.
Description
本創作係有關於基板表面加工,尤其是一種立式濕製程裝置。 This creation is about substrate surface processing, especially a vertical wet process device.
現今的用於基板表面加工的立式濕製程的裝置一般以一吊架吊掛基板,吊架頂部設有排列為一橫列的複數夾具,藉由夾具夾持基板的頂邊而將基板吊掛在吊架中。吊架被輸送通過噴灑器,噴灑器對基板噴灑製程藥液以加工基板表面。沾附在夾具上的製程藥液容易沿著基板表面垂流而使沾附在基板表面的製程藥液分佈不均,進而降低製良率。 Today's vertical wet process devices for substrate surface processing generally use a hanger to hang the substrate. The top of the hanger is equipped with a plurality of fixtures arranged in a row, and the substrate is suspended by the fixture clamping the top edge of the substrate. Hang in hanger. The hanger is conveyed through the sprayer, and the sprayer sprays the process liquid on the substrate to process the surface of the substrate. The process chemical solution adhering to the jig tends to flow vertically along the surface of the substrate, which makes the distribution of the process chemical solution adhering to the substrate surface uneven, thereby reducing the yield rate.
有鑑於此,本創作人遂針對上述現有技術,特潛心研究並配合學理的運用,盡力解決上述之問題點,即成為本創作人改良之目標。 In view of this, the author of the present invention, aiming at the above-mentioned prior art, devoted himself to the research and cooperated with the application of theories, and tried his best to solve the above-mentioned problems, which became the goal of the author's improvement.
本創作提供一種立式濕製程裝置,其包含一輸送機構、一水平軌道、一吊架及至少一噴灑器。輸送機構包含並列配置的複數輥軸。水平軌道設置在輸送機構上方,水平軌道具有一導引槽道。吊架包含一框體以及設置在框體的複數夾具,該些夾具排列呈間隔配置的二豎列,吊架承載於該些輥軸之上,且吊架的頂部被限制在導引槽道中。噴灑器設置在輸送機構的一側且朝向吊架配置。 The invention provides a vertical wet process device, which includes a conveying mechanism, a horizontal track, a hanger and at least one sprinkler. The conveying mechanism includes a plurality of rollers arranged in parallel. The horizontal track is arranged above the conveying mechanism, and the horizontal track has a guiding channel. The hanger includes a frame and a plurality of fixtures arranged on the frame. These fixtures are arranged in two vertical rows at intervals. The hanger is carried on the rollers, and the top of the hanger is limited in the guide channel. . The sprinkler is arranged on one side of the conveying mechanism and is arranged towards the hanger.
本創作一實施例中,吊架包含一底座,底座設置在框體的底部且底座承載於該些輥軸之上。各輥軸的側面分別凸設有用於承載底座的一承載 部。各輥軸的分別設有一對擋牆,且吊架能夠被限制在該對擋牆之間。承載部配置在該對擋牆之間。底座樞接框體。 In an embodiment of the present invention, the hanger includes a base, the base is arranged at the bottom of the frame and the base is carried on the rollers. The sides of each roller shaft are protrudingly provided with a bearing for carrying the base respectively. department. Each roller shaft is respectively provided with a pair of retaining walls, and the hanger can be limited between the pair of retaining walls. The bearing part is arranged between the pair of retaining walls. The base is pivotally connected to the frame.
本創作一實施例中,輸送機構包含一馬達以及一傳動軸,馬達連動傳動軸,且傳動軸分別嚙合各輥軸。導引槽道的二端分別具有一擴張口。水平軌道包含一對平行間隔配置的水平桿,且導引槽道形成在該對水平桿之間。水平軌道的各端,該對水平桿分別偏移而分離形成擴張口。吊架包含一對平行間隔配置的立桿,該些夾具的一部份配置在其中一立桿上,該些夾具的其餘部份配置另一立桿上。 In an embodiment of the present invention, the conveying mechanism includes a motor and a transmission shaft, the motor drives the transmission shaft, and the transmission shaft engages with each roller respectively. The two ends of the guide channel respectively have an expansion opening. The horizontal track includes a pair of parallel and spaced horizontal rods, and the guide channel is formed between the pair of horizontal rods. At each end of the horizontal track, the pair of horizontal rods are respectively offset and separated to form expansion openings. The hanger includes a pair of vertical poles arranged in parallel and spaced apart, a part of the clamps is disposed on one of the vertical poles, and the rest of the clamps are disposed on the other vertical pole.
本創作的立式濕製程裝置,其夾具排列呈豎列可以限制沾附在夾具的製程藥液只滴落在基板的邊緣,以確保基板的中央被均勻加工,基板的邊緣為廢料區,因此能夠提升製程良率。 In the vertical wet process device of this invention, the fixtures are arranged in vertical columns to limit the process liquid attached to the fixtures from dripping only on the edge of the substrate, so as to ensure that the center of the substrate is processed evenly, and the edge of the substrate is a waste area, so It can improve the process yield.
10:基板 10: Substrate
100:輸送機構 100: conveying mechanism
110:輥軸 110: roller shaft
111:承載部 111: bearing part
112:擋牆 112: retaining wall
120:馬達 120: motor
130:傳動軸 130: drive shaft
200:水平軌道 200: horizontal track
201:導引槽道 201: Guide channel
202:擴張口 202: Expansion mouth
210:水平桿 210: horizontal bar
300:吊架 300: hanger
310:框體 310: frame
311:立桿 311: Pole
320:夾具 320: fixture
330:底座 330: base
400:噴灑器 400: Sprinkler
圖1係本創作一實施例之立式濕製程裝置之立體示意圖。 Fig. 1 is a three-dimensional schematic diagram of a vertical wet process device according to an embodiment of the present invention.
圖2係本創作一實施例之立式濕製程裝置之一側視圖。 Fig. 2 is a side view of a vertical wet process device according to an embodiment of the invention.
圖3係圖2之局部放大圖。 Fig. 3 is a partially enlarged view of Fig. 2 .
圖4係本創作一實施例之立式濕製程裝置之另一側視圖。 Fig. 4 is another side view of the vertical wet process device of an embodiment of the invention.
圖5係圖4之局部放大圖。 Fig. 5 is a partially enlarged view of Fig. 4 .
圖6係本創作之立式濕製程裝置之另一實施方式示意圖。 Fig. 6 is a schematic diagram of another embodiment of the vertical wet process device of the present invention.
圖7係本創作之立式濕製程裝置之使用狀態示意圖。 Fig. 7 is a schematic diagram of the use state of the vertical wet process device of the invention.
參閱圖1至圖5,本創作之一實施例提供一種立式濕製程裝置,其用於矩形基板10的立式濕製程表面處理。基板10呈矩形,然而本創作不限定基板10之形式,例如可以是金屬板、玻璃板或電路板。
Referring to FIG. 1 to FIG. 5 , an embodiment of the present invention provides a vertical wet process device for vertical wet process surface treatment of a
本創作之濕製程裝置包含一輸送機構100、一水平軌道200、一吊架300及一噴灑器400。
The wet process device of the present invention includes a
輸送機構100包含並列配置的複數輥軸110,該些輥軸110排列呈一列。各輥軸110分別設有一對間隔配置的擋牆112。輸送機構100包含一馬達120以及一傳動軸130,馬達120連動傳動軸130,且傳動軸130分別嚙合各輥軸110。
The
水平軌道200設置在輸送機構100上方且平行於該列輥軸110。水平軌道200具有一導引槽道201,於本實施例中,水平軌道200包含一對平行間隔配置的水平桿210,且導引槽道201形成在該對水平桿210之間。導引槽道201的二端分別具有一擴張口202。具體而言,在水平軌道200的各端,該對桿體分別偏移而分離形成擴張口202。
The
吊架300用於吊掛基板10,於本實施例中吊架300包含一框體310以及設置在框體310的複數夾具320,該些夾具320排列呈間隔配置的二豎列以用於夾持基板10的二側對邊。具體而言,吊架300的框體310設置有一對平行間隔配置的立桿311,該些夾具320的一部份配置在其中一立桿311上,該些夾具320的其餘部份配置另一立桿311上,藉此使得該些夾具320排列呈間隔配置的二豎列。
The
吊架300承載於該些輥軸110之上,且吊架300的頂部被限制在水平軌道200的導引槽道201中,吊架300的底部則被限制在輸送機構100的該對擋牆112之間,當輥軸110轉動時吊架300能夠被該些輥軸110推動輸送。導引槽道201
的二端具有擴張口202,當吊架300被置入導引槽道201時能夠被擴張口202逆導而易於置入。該對擋牆112及吊架300底部之具體配置詳述如後。
The
於本實施中,吊架300可以包含一底座330,底座330設置在框體310的底部且底座330承載於該些輥軸110之上。具體而言,底座330樞接框體310而能夠在輸送過程中避免框體310晃動。各輥軸110的側面分別凸設有至少一承載部111,承載部111環繞其所在的輥軸110且位於該對擋牆112之間而能夠在輥軸110旋轉時用於承載吊架300的底座330。於本實施中,該對擋牆112之間配置有一對承載部111配置,但本創作不限定承載部111的數量。
In this implementation, the
吊架300及輥軸110的配置不僅限於前述實施例,另參閱圖6所示,也可以將吊架300的框體310直接承載於輥軸110上且夾持在擋牆112之間。
The arrangement of the
參閱圖2、4、7所示,噴灑器400設置在輸送機構100的一側且朝向吊架300配置。於本實施例中設置有多個噴灑器400,而且該些噴灑器400可以依據製程的需求分別配置在輸送機構100的二側。基板10被吊掛在吊架300中且藉由輸送機構100推進吊架300,並藉由水平軌道200導引吊架300而使基板10通過噴灑器400。噴灑器400對基板10噴灑製程藥液以加工基板10表面。夾具320排列呈豎列可以限制沾附在夾具320的製程藥液只滴落在基板10的邊緣,以確保基板10的中央被均勻加工,基板10的邊緣為廢料區,因此滴落在基板10上的製程藥液不會造成製程良率降低,相較於現有技術提升了製程良率。
Referring to FIGS. 2 , 4 , and 7 , the
以上所述僅為本創作之較佳實施例,非用以限定本創作之專利範圍,其他運用本創作之專利精神之等效變化,均應俱屬本創作之專利範圍。 The above descriptions are only preferred embodiments of this creation, and are not intended to limit the patent scope of this creation. Other equivalent changes that use the patent spirit of this creation should all fall within the patent scope of this creation.
10:基板 10: Substrate
100:輸送機構 100: conveying mechanism
110:輥軸 110: roller shaft
120:馬達 120: motor
130:傳動軸 130: drive shaft
200:水平軌道 200: horizontal track
201:導引槽道 201: Guide channel
202:擴張口 202: Expansion mouth
210:水平桿 210: horizontal bar
300:吊架 300: hanger
310:框體 310: frame
311:立桿 311: Pole
320:夾具 320: fixture
330:底座 330: base
Claims (11)
Priority Applications (1)
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TW111210630U TWM638239U (en) | 2022-09-29 | 2022-09-29 | Vertical wetting process device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW111210630U TWM638239U (en) | 2022-09-29 | 2022-09-29 | Vertical wetting process device |
Publications (1)
Publication Number | Publication Date |
---|---|
TWM638239U true TWM638239U (en) | 2023-03-01 |
Family
ID=86691128
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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TW111210630U TWM638239U (en) | 2022-09-29 | 2022-09-29 | Vertical wetting process device |
Country Status (1)
Country | Link |
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TW (1) | TWM638239U (en) |
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2022
- 2022-09-29 TW TW111210630U patent/TWM638239U/en unknown
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